JP2001507464A - 高分解能分光分析顕微方法および装置 - Google Patents
高分解能分光分析顕微方法および装置Info
- Publication number
- JP2001507464A JP2001507464A JP52350899A JP52350899A JP2001507464A JP 2001507464 A JP2001507464 A JP 2001507464A JP 52350899 A JP52350899 A JP 52350899A JP 52350899 A JP52350899 A JP 52350899A JP 2001507464 A JP2001507464 A JP 2001507464A
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- Prior art keywords
- sample
- probe
- thermal
- sample surface
- electromagnetic radiation
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N25/00—Investigating or analyzing materials by the use of thermal means
- G01N25/20—Investigating or analyzing materials by the use of thermal means by investigating the development of heat, i.e. calorimetry, e.g. by measuring specific heat, by measuring thermal conductivity
- G01N25/48—Investigating or analyzing materials by the use of thermal means by investigating the development of heat, i.e. calorimetry, e.g. by measuring specific heat, by measuring thermal conductivity on solution, sorption, or a chemical reaction not involving combustion or catalytic oxidation
- G01N25/4806—Details not adapted to a particular type of sample
- G01N25/4826—Details not adapted to a particular type of sample concerning the heating or cooling arrangements
- G01N25/4833—Details not adapted to a particular type of sample concerning the heating or cooling arrangements specially adapted for temperature scanning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N3/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N3/60—Investigating resistance of materials, e.g. refractory materials, to rapid heat changes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q30/00—Auxiliary means serving to assist or improve the scanning probe techniques or apparatus, e.g. display or data processing devices
- G01Q30/02—Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
- G01Q60/58—SThM [Scanning Thermal Microscopy] or apparatus therefor, e.g. SThM probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2203/00—Investigating strength properties of solid materials by application of mechanical stress
- G01N2203/02—Details not specific for a particular testing method
- G01N2203/026—Specifications of the specimen
- G01N2203/0286—Miniature specimen; Testing on microregions of a specimen
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/852—Manufacture, treatment, or detection of nanostructure with scanning probe for detection of specific nanostructure sample or nanostructure-related property
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/84—Manufacture, treatment, or detection of nanostructure
- Y10S977/849—Manufacture, treatment, or detection of nanostructure with scanning probe
- Y10S977/86—Scanning probe structure
- Y10S977/867—Scanning thermal probe
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Radiology & Medical Imaging (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Combustion & Propulsion (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.(a)サンプル表面上の位置に向けられる電磁放射ビームと、 (b)前記サンプル表面上の前記位置で前記電磁放射ビームが照射される位置 に配置される熱プローブと、 (c)前記熱プローブの温度および位置を制御するための手段と、 (d)前記熱プローブおよび前記照射する電磁放射ビームの位置に対して前記 サンプルを走査するための手段と、 (e)前記サンプルが走査され、前記熱プローブの温度が制御されている間に 前記サンプル上の複数の位置で分光データを得るための手段と、 (f)前記複数の分光データからサンプルの分光像を算出するための手段とを 具備する分光像形成装置。 2.前記電磁放射ビームを提供するための干渉計を具備し、前記分光データを 得るための手段がフーリエ変換干渉写真用の手段を具備する請求項1に記載の分 光像形成装置。 3.モノクロメータと変調器とを具備する請求項1に記載の分光像形成装置。 4.前記変調器が機械式チョッパである請求項3に記載の分光像形成装置。 5.前記電磁放射源がレーザである請求項1に記載の分光像形成装置。 6.前記熱プローブが受動熱プローブである請求項1に記載の分光像形成装置 。 7.前記熱プローブが能動熱プローブである請求項1に記載の分 光像形成装置。 8.前記熱プローブが点加熱源として機能する抵抗プローブであり、前記熱プ ローブは高周波でサンプル上の位置において温度を変調するのに用いられる請求 項1に記載の分光像形成装置。 9.さらに基準プローブを具備する請求項1に記載の分光像形成装置。 10.前記熱プローブが該熱プローブからの出力信号が示差信号となるように 示差の形態で接続される請求項9に記載の分光像形成装置。 11.熱像を得る方法であって、 (a)走査熱顕微鏡内にサンプルを配置する工程と、 (b)先端が前記サンプルの表面上にくるように熱プローブを位置決めする工 程と、 (c)電磁放射ビームを前記サンプル表面上の前記熱プローブの位置の前記サ ンプル表面に向ける工程と、 (d)前記熱プローブの先端の温度を制御し且つ測定し、前記サンプル上の前 記熱プローブの位置における前記電磁放射の吸収による前記サンプル表面の温度 上昇度合いの計測値を得る工程と、 (e)前記サンプル表面の温度上昇度合いの計測値を記録する工程と、 (f)前記サンプル表面に対して前記熱プローブと前記電磁放射ビームとを走 査し、前記熱プローブの位置の関数で温度上昇度合いの前記計測値を記録する工 程と、 (g)前記サンプル表面の少なくとも一つの熱像を算出する工程とを具備し、 熱像が前記サンプル表面での特性の違いに対応するコントラストを有する方法。 12.さらに前記サンプル表面上に基準熱プローブを位置決めす る工程を具備し、温度上昇度合いの測定値が前記基準熱プローブに対する前記熱 プローブの温度上昇差の計測値として記録される請求項11に記載の方法。 13.前記電磁放射ビームが干渉計により提供される請求項11に記載の方法 。 14.前記電磁ビームがモノクロメータにより提供される請求項11に記載の 方法。 15.前記電磁ビームがレーザにより提供される請求項11に記載の方法。 16.前記電磁ビームが変調される請求項11に記載の方法。 17.一つの電磁ビームが用られ、連続して得られる基準走査の温度上昇度合 いに対するサンプル走査の温度上昇度合いが計測される請求項11に記載の方法 。 18.サンプル表面の分光熱像を得る方法であって、 (a)走査熱顕微鏡内にサンプルを配置する工程と、 (b)走査鏡を有する干渉計からの電磁放射ビームを前記サンプル表面に向け る工程と、 (c)熱プローブの先端を前記サンプル表面上の前記電磁放射ビームが照射さ れる位置に位置決めする工程と、 (d)前記熱プローブの先端の温度を制御し且つ計測し、前記走鏡の位置の関 数として前記サンプル上における前記熱プローブの位置での電磁放射の吸収によ る前記サンプル表面の温度上昇度合いの計測値を得る工程と、 (e)前記サンプル表面の温度上昇度合いの計測値を記録する工程と、 (f)前記サンプル表面に対して前記熱プローブと前記電磁放射ビームとを走 査し、前記サンプル表面上の複数の位置における前記 走査鏡の位置の関数として温度上昇度合い干渉写真を記録する工程と、 (g)前記インフェログラムをスペクトルに変換する工程と、 (h)前記サンプル表面の分光熱像を算出する工程とを具備し、 前記熱像が前記サンプル表面での電磁放射の吸収における違いに起因するコン トラストを有する方法。 19.さらに基準スペクトルを得る工程を具備し、前記分光熱像を算出する工 程が前記基準スペクトルに対する前記工程(g)で得られたスペクトルの比を算 出する工程を具備する請求項18に記載の方法。 20.熱プローブを受動モードで用いて前記電磁放射の吸収を検出する工程を 具備する請求項18に記載の方法。 21.熱プローブを能動モードで用いて前記電磁放射の吸収を検出する工程を 具備する請求項18に記載の方法。 22.さらにサンプル表面の温度が対応して変調されるように前記熱プローブ の先端の温度を変調する工程を具備する請求項18に記載の方法。 23.さらに前記サンプル表面の異なる組成相を区別する工程を具備する請求 項22に記載の方法。 24.さらに温度変調の周波数を選択することにより物質の容積を選択する工 程を具備する請求項22に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US6355897P | 1997-10-28 | 1997-10-28 | |
US60/063,558 | 1997-10-28 | ||
PCT/GB1998/003184 WO1999022226A1 (en) | 1997-10-28 | 1998-10-26 | Method and apparatus for high spatial resolution spectroscopic microscopy |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001507464A true JP2001507464A (ja) | 2001-06-05 |
JP2001507464A5 JP2001507464A5 (ja) | 2006-01-05 |
JP4065336B2 JP4065336B2 (ja) | 2008-03-26 |
Family
ID=22050017
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52350899A Expired - Fee Related JP4065336B2 (ja) | 1997-10-28 | 1998-10-26 | 高分解能分光分析顕微方法および装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US6260997B1 (ja) |
EP (1) | EP0948741B1 (ja) |
JP (1) | JP4065336B2 (ja) |
DE (1) | DE69835803T2 (ja) |
WO (1) | WO1999022226A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10725033B2 (en) | 2012-01-31 | 2020-07-28 | Regents Of The University Of Minnesota | Lateral flow assays with thermal contrast readers |
US10816492B2 (en) | 2012-01-31 | 2020-10-27 | Regents Of The University Of Minnesota | Lateral flow assays with thermal contrast readers |
Families Citing this family (21)
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US6748334B1 (en) * | 1999-12-06 | 2004-06-08 | Jorge E. Perez | Specialty gas analysis system |
US7366704B2 (en) * | 2001-06-28 | 2008-04-29 | Waters Investments, Limited | System and method for deconvoluting the effect of topography on scanning probe microscopy measurements |
US20040105485A1 (en) * | 2002-07-29 | 2004-06-03 | Unaxis Usa, Inc. | Temperature compensation for acousto-optc devices |
US7023622B2 (en) * | 2002-08-06 | 2006-04-04 | Dmetrix, Inc. | Miniature microscope objective lens |
US7113651B2 (en) * | 2002-11-20 | 2006-09-26 | Dmetrix, Inc. | Multi-spectral miniature microscope array |
EP1422518A1 (en) * | 2002-11-20 | 2004-05-26 | Communaute Europeenne | Method and system for measuring the thermal diffusivity |
US7255474B2 (en) * | 2003-07-28 | 2007-08-14 | Symyx Technologies, Inc. | Parallel infrared spectroscopy apparatus and method |
WO2006107991A2 (en) * | 2005-04-05 | 2006-10-12 | Anasys Instruments | Method and apparatus for localized infrared spectroscopy and micro-tomography using a combination of thermal expansion and temperature change measurements |
JP4930508B2 (ja) * | 2006-06-13 | 2012-05-16 | 株式会社ニコン | 顕微鏡装置 |
US8402819B2 (en) * | 2007-05-15 | 2013-03-26 | Anasys Instruments, Inc. | High frequency deflection measurement of IR absorption |
US8528110B2 (en) * | 2008-06-06 | 2013-09-03 | Infinitesima Ltd. | Probe detection system |
US7977636B2 (en) * | 2008-08-12 | 2011-07-12 | Anasys Instruments, Inc. | Infrared imaging using thermal radiation from a scanning probe tip |
WO2011007168A2 (en) | 2009-07-13 | 2011-01-20 | Voak, Graham | Microspectroscopy apparatus and method |
US8823802B2 (en) * | 2009-10-15 | 2014-09-02 | University Of South Carolina | Multi-mode imaging in the thermal infrared for chemical contrast enhancement |
WO2014042771A2 (en) * | 2012-07-28 | 2014-03-20 | Harvard Bioscience, Inc. | Analytical methods |
WO2014138660A1 (en) | 2013-03-08 | 2014-09-12 | Bruker Nano, Inc. | Method and apparatus of physical property measurement using a probe-based nano-localized light source |
US10041866B2 (en) | 2015-04-24 | 2018-08-07 | University Of South Carolina | Reproducible sample preparation method for quantitative stain detection |
US9885147B2 (en) | 2015-04-24 | 2018-02-06 | University Of South Carolina | Reproducible sample preparation method for quantitative stain detection |
IT201700081124A1 (it) * | 2017-07-21 | 2019-01-21 | Andrea Martinelli | Strumento per analisi spettroscopiche in modulazione di temperatura |
DE102019203562B4 (de) * | 2019-03-15 | 2022-11-03 | Bruker Optics Gmbh & Co. Kg | Verfahren zur Ermittlung einer Korrekturgrößenfunktion und Verfahren zur Erzeugung eines frequenzkorrigierten Hyperspektralbildes |
DE102021127596A1 (de) | 2021-10-22 | 2023-04-27 | Linseis Messgeräte Gesellschaft mit beschränkter Haftung | Temperaturleitfähigkeitsmessgerät |
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1998
- 1998-10-23 US US09/178,349 patent/US6260997B1/en not_active Expired - Lifetime
- 1998-10-26 EP EP98950191A patent/EP0948741B1/en not_active Expired - Lifetime
- 1998-10-26 JP JP52350899A patent/JP4065336B2/ja not_active Expired - Fee Related
- 1998-10-26 WO PCT/GB1998/003184 patent/WO1999022226A1/en active IP Right Grant
- 1998-10-26 DE DE69835803T patent/DE69835803T2/de not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10725033B2 (en) | 2012-01-31 | 2020-07-28 | Regents Of The University Of Minnesota | Lateral flow assays with thermal contrast readers |
US10816492B2 (en) | 2012-01-31 | 2020-10-27 | Regents Of The University Of Minnesota | Lateral flow assays with thermal contrast readers |
Also Published As
Publication number | Publication date |
---|---|
DE69835803T2 (de) | 2007-09-13 |
WO1999022226A1 (en) | 1999-05-06 |
EP0948741B1 (en) | 2006-09-06 |
JP4065336B2 (ja) | 2008-03-26 |
US6260997B1 (en) | 2001-07-17 |
EP0948741A1 (en) | 1999-10-13 |
DE69835803D1 (de) | 2006-10-19 |
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