JP2001345454A5 - - Google Patents

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Publication number
JP2001345454A5
JP2001345454A5 JP2001086805A JP2001086805A JP2001345454A5 JP 2001345454 A5 JP2001345454 A5 JP 2001345454A5 JP 2001086805 A JP2001086805 A JP 2001086805A JP 2001086805 A JP2001086805 A JP 2001086805A JP 2001345454 A5 JP2001345454 A5 JP 2001345454A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001086805A
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Japanese (ja)
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JP2001345454A (ja
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Publication date
Application filed filed Critical
Priority to JP2001086805A priority Critical patent/JP2001345454A/ja
Priority claimed from JP2001086805A external-priority patent/JP2001345454A/ja
Publication of JP2001345454A publication Critical patent/JP2001345454A/ja
Publication of JP2001345454A5 publication Critical patent/JP2001345454A5/ja
Withdrawn legal-status Critical Current

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JP2001086805A 2000-03-27 2001-03-26 半導体装置およびその作製方法 Withdrawn JP2001345454A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001086805A JP2001345454A (ja) 2000-03-27 2001-03-26 半導体装置およびその作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000087660 2000-03-27
JP2000-87660 2000-03-27
JP2001086805A JP2001345454A (ja) 2000-03-27 2001-03-26 半導体装置およびその作製方法

Publications (2)

Publication Number Publication Date
JP2001345454A JP2001345454A (ja) 2001-12-14
JP2001345454A5 true JP2001345454A5 (enExample) 2008-02-28

Family

ID=26588513

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001086805A Withdrawn JP2001345454A (ja) 2000-03-27 2001-03-26 半導体装置およびその作製方法

Country Status (1)

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JP (1) JP2001345454A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4986337B2 (ja) * 2000-06-02 2012-07-25 株式会社半導体エネルギー研究所 半導体装置の作製方法
KR100454751B1 (ko) 2002-10-21 2004-11-03 삼성에스디아이 주식회사 듀얼 또는 멀티플 게이트를 사용하는 티에프티의 제조 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0677484A (ja) * 1992-08-27 1994-03-18 Sharp Corp 薄膜トランジスタ及びその製造方法
JP3778456B2 (ja) * 1995-02-21 2006-05-24 株式会社半導体エネルギー研究所 絶縁ゲイト型薄膜半導体装置の作製方法
JP3924828B2 (ja) * 1996-12-26 2007-06-06 セイコーエプソン株式会社 結晶性半導体膜の製造方法、および薄膜トランジスタの製造方法
JP4386978B2 (ja) * 1998-08-07 2009-12-16 株式会社半導体エネルギー研究所 半導体装置の作製方法

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