JP2001330819A - Liquid crystal display device - Google Patents

Liquid crystal display device

Info

Publication number
JP2001330819A
JP2001330819A JP2000151414A JP2000151414A JP2001330819A JP 2001330819 A JP2001330819 A JP 2001330819A JP 2000151414 A JP2000151414 A JP 2000151414A JP 2000151414 A JP2000151414 A JP 2000151414A JP 2001330819 A JP2001330819 A JP 2001330819A
Authority
JP
Japan
Prior art keywords
liquid crystal
display device
crystal display
thickness
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000151414A
Other languages
Japanese (ja)
Other versions
JP4968980B2 (en
Inventor
Katsumi Tsuchida
克巳 土田
Toshiaki Sasaki
俊明 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP2000151414A priority Critical patent/JP4968980B2/en
Publication of JP2001330819A publication Critical patent/JP2001330819A/en
Application granted granted Critical
Publication of JP4968980B2 publication Critical patent/JP4968980B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To unify the thickness of a liquid crystal layer over the entire display region. SOLUTION: A liquid crystal display device is characterized in the following. Two kinds of members formed by successively laminating electrodes and alignment layers on mother glasses are stuck to each other using a sealing part at a peripheral part of a display region and a dummy member at a non-display region and then the both mother glasses are cut at the non-display region to form the liquid crystal display device formed by sticking a signal electrode member formed by successively laminating plural signal electrodes and alignment layers on the glass substrate to a scanning electrode member formed by successively laminating plural scanning electrodes and alignment layers on the glass substrate via a liquid crystal layer enclosed by the sealing part and the thickness in the thickness direction of the liquid crystal layer is unified over the entire sealing part.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はたとえばカイラルネ
マチック液晶を用いたメモリー性双安定型液晶表示装置
など液晶層の厚みが小さく、面内にて均一化が求められ
る液晶表示装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device such as a memory-type bistable liquid crystal display device using chiral nematic liquid crystal, in which the thickness of a liquid crystal layer is small and uniformity in a plane is required.

【0002】[0002]

【従来の技術】近年、液晶層の厚みが小さく、面内にて
均一化が求められる液晶表示装置が市場のニーズとして
ある。このような液晶表示装置として、たとえばカイラ
ルネマチック液晶を用いたメモリー性双安定型液晶表示
装置の技術が提案されている(特開平7−248485
号公報参照)。
2. Description of the Related Art In recent years, there is a need in the market for a liquid crystal display device in which the thickness of a liquid crystal layer is small and uniformity in a plane is required. As such a liquid crystal display device, for example, a technique of a memory-type bistable liquid crystal display device using a chiral nematic liquid crystal has been proposed (Japanese Patent Laid-Open No. Hei 7-248485).
Reference).

【0003】このメモリー性双安定型液晶表示装置は、
リセットパルスと選択パルスとの間に遅延時間を導入し
た信号波形を設け、これによって遅延時間を短縮させる
というものである。
[0003] This memory-type bistable liquid crystal display device has:
A signal waveform having a delay time introduced between the reset pulse and the selection pulse is provided, thereby shortening the delay time.

【0004】すなわち、フレデリクス転移後の準安定状
態(0°あるいは360°)への移行にはバックフロー
現象が関係していると言われるが、この現象を最大限に
生かすために、リセットパルスと選択パルスとの間にイ
ンターバルを設けるというものであって、これによって
準安定状態へ移行しやすくなり、その結果、マトリック
ス駆動の1ラインあたりの書き込み時間(選択時間)が
短縮され、フリッカーレスのハイデューティな単純マト
リックス駆動を実現しようとするものである。
[0004] That is, it is said that the transition to the metastable state (0 ° or 360 °) after the Freedericks transition involves a backflow phenomenon. In order to make the most of this phenomenon, a reset pulse and a reset pulse are required. An interval is provided between the selected pulse and the selected pulse. This makes it easier to shift to a metastable state. As a result, the write time per line (selection time) of matrix driving is reduced, and a flicker-less high duty cycle is achieved. It is intended to realize a simple matrix drive.

【0005】[0005]

【発明が解決しようとする課題】このようなメモリー性
双安定型液晶表示装置は、液晶層厚を狭くするほどに、
選択時間が短縮できるので、液晶層厚を相当に小さくす
るとともに、その液晶層厚を液晶表示領域にわたって均
一にそろえる必要がある。
In such a memory-type bistable liquid crystal display device, as the thickness of the liquid crystal layer becomes smaller,
Since the selection time can be shortened, it is necessary to considerably reduce the thickness of the liquid crystal layer and to make the thickness of the liquid crystal layer uniform over the liquid crystal display area.

【0006】しかしながら、信号電極部材と走査電極部
材とを貼り合わせるに際し、表示領域および非表示領域
の双方の基板全面に同一径の球形スペーサを配している
にもかかわらず、基板に歪みが生じ、シール部が均一に
押しつぶされずに硬化し、これにより、表示領域のシー
ル部近傍は層厚が大きくなる傾向にあり、その結果、表
示領域内を所望とおりの薄さの厚みでもって、液晶層厚
を均一に設定することがむずかしかった。
However, when the signal electrode member and the scanning electrode member are bonded to each other, distortion occurs in the substrate even though spherical spacers having the same diameter are arranged on the entire surface of the substrate in both the display region and the non-display region. In this case, the seal portion is hardened without being uniformly crushed, whereby the layer thickness tends to be large near the seal portion in the display area. As a result, the liquid crystal layer has a desired thickness in the display area. It was difficult to set the thickness uniformly.

【0007】この課題を図4〜図6に示す液晶表示装置
P,P‘より説明する。信号電極部材と走査電極部材の
双方はマザーガラスより分断作成するが、このマザーガ
ラスより6個の液晶表示装置P,P‘が得られる場合を
説明する。
This problem will be described with reference to the liquid crystal display devices P and P ′ shown in FIGS. Although both the signal electrode member and the scanning electrode member are cut from the mother glass, a case where six liquid crystal display devices P and P 'are obtained from the mother glass will be described.

【0008】図4は分断前の液晶表示装置Pの平面図で
あり、図5は図4に示す切断面線b−b‘による概略断
面図である。また、図6についても図4に示す切断面線
b−b‘による液晶表示装置P‘の概略断面図である。
FIG. 4 is a plan view of the liquid crystal display device P before division, and FIG. 5 is a schematic sectional view taken along the line bb 'of FIG. FIG. 6 is also a schematic cross-sectional view of the liquid crystal display device P ′ taken along the line bb ′ shown in FIG.

【0009】この液晶表示装置Pによれば、透明基板1
の上に信号電極2と配向膜3とを順次積層形成し、これ
により、信号電極部材4をなす。また、透明基板5の上
にカラーフィルタ用の着色層6と遮光層7とを形成し、
これらの上にオーバーコート層8、走査電極9、配向膜
10とを順次積層し、これによって走査電極部材11と
なす。そして、信号電極部材4と走査電極部材11とを
液晶層12を介して、シール部13およびダミーシール
部14により貼り合わせる。15はスペーサ、16は表
示領域である。
According to the liquid crystal display device P, the transparent substrate 1
A signal electrode 2 and an alignment film 3 are sequentially formed on the substrate, thereby forming a signal electrode member 4. Further, a colored layer 6 for a color filter and a light shielding layer 7 are formed on the transparent substrate 5,
An overcoat layer 8, a scanning electrode 9, and an alignment film 10 are sequentially laminated on these, thereby forming a scanning electrode member 11. Then, the signal electrode member 4 and the scanning electrode member 11 are bonded via the liquid crystal layer 12 by the seal portion 13 and the dummy seal portion 14. Reference numeral 15 denotes a spacer, and reference numeral 16 denotes a display area.

【0010】しかしながら、上記のようにマザーガラス
を切断する前であれば、信号電極部材4と走査電極部材
11とを貼り合わせるに際し、シール部13を押しつぶ
すことで、基板に歪みが生じ、これにより、表示領域1
6のシール部13近傍は層厚が大きくなっていた。
However, before the mother glass is cut as described above, when the signal electrode member 4 and the scanning electrode member 11 are bonded to each other, the substrate is distorted by crushing the seal portion 13, thereby causing distortion. , Display area 1
In the vicinity of the seal portion 13 of No. 6, the layer thickness was large.

【0011】たとえば、シール材として三井化学(株)
製「ストライクボンドXN−21−S」を用いて、1.
0kg/cm2、150℃にて加圧・加熱すると、歪み
が生じて、加圧・加熱を解除した後にも、そのような歪
みが残っていた。
For example, as a sealing material, Mitsui Chemicals, Inc.
Using "STRIKE BOND XN-21-S" manufactured by KK
Pressing and heating at 0 kg / cm 2 and 150 ° C. caused distortion, and such distortion remained even after the pressing and heating were released.

【0012】上記構成においては、スペーサ15を用い
たが、これに代えて図6に示す液晶表示装置P‘のよう
に柱状スペーサ17を形成しても同様な課題がある。な
お、同図において図4と同一箇所には同一符号を記す。
In the above configuration, the spacer 15 is used. However, a similar problem occurs even when the columnar spacer 17 is formed as in the liquid crystal display device P 'shown in FIG. In the figure, the same parts as those in FIG. 4 are denoted by the same reference numerals.

【0013】かかる課題を解消するために、透明基板の
シール部が当る部分に深さ1.5μm程度の溝をフッ化
水素等を用いてエッチング処理でもって形成する技術が
提案されている(特開平8−211395号参照)。
In order to solve such a problem, there has been proposed a technique in which a groove having a depth of about 1.5 μm is formed by etching using a hydrogen fluoride or the like in a portion of the transparent substrate where the sealing portion contacts (see, for example, Japanese Patent Application Laid-Open Publication No. HEI 9-157556). See Heihei 8-21395).

【0014】しかしながら、このような溝を形成するこ
とで生産コストが上がり、しかも、高い精度にて溝を形
成することがむずかしく、溝全体を均一な深さにできな
いという課題がある。
However, there is a problem that forming such a groove increases the production cost, and it is difficult to form the groove with high accuracy, so that the entire groove cannot be formed to a uniform depth.

【0015】したがって本発明の目的は、液晶層厚の小
さい液晶表示装置において、その層厚を表示領域全体に
わたり均一化するとともに、生産コストを低減せしめた
液晶表示装置を提供することにある。
Accordingly, an object of the present invention is to provide a liquid crystal display device having a small liquid crystal layer thickness, in which the layer thickness is made uniform over the entire display area and the production cost is reduced.

【0016】本発明の他の目的は液晶層厚を一様に小さ
くして、フリッカーレスのハイデューティな単純マトリ
ックス駆動を実現したメモリー性双安定型の液晶表示装
置を提供することにある。
Another object of the present invention is to provide a memory-type bistable liquid crystal display device in which the thickness of a liquid crystal layer is made uniform and flickerless high-duty simple matrix driving is realized.

【0017】また、本発明の他の目的はセルギャップを
均一にして色ムラのない高品質な液晶表示装置を提供す
ることにある。
Another object of the present invention is to provide a high-quality liquid crystal display device having a uniform cell gap and no color unevenness.

【0018】[0018]

【課題を解決するための手段】本発明の液晶表示装置
は、マザーガラス上に電極と配向層とを順次積層してな
る2種類の部材を、表示領域の外周部ではシール部に
て、さらに非表示領域ではダミー部材でもって貼り合わ
せ、ついで双方のマザーガラスを非表示領域にて切断す
ることで、ガラス基板上に多数の信号電極と配向膜とを
順次積層してなる信号電極部材と、ガラス基板上に多数
の走査電極と配向膜とを順次積層してなる走査電極部材
とを、シール部にて囲まれた液晶層を介して貼り合わせ
るとともに、前記シール部の全体に対し液晶層厚方向の
厚みを揃えたことを特徴とする。
According to the liquid crystal display device of the present invention, two kinds of members formed by sequentially laminating an electrode and an alignment layer on a mother glass are further provided by a seal portion on the outer peripheral portion of the display region. In a non-display area, a signal electrode member in which a large number of signal electrodes and an alignment film are sequentially laminated on a glass substrate by bonding together with a dummy member, and then cutting both mother glasses in the non-display area, A scan electrode member formed by sequentially laminating a large number of scan electrodes and an alignment film on a glass substrate is bonded via a liquid crystal layer surrounded by a seal portion, and a liquid crystal layer thickness is applied to the entire seal portion. It is characterized by uniform thickness in the direction.

【0019】[0019]

【発明の実施の形態】まず、本発明の液晶表示装置の製
造方法を述べる。本例においては、カラー液晶表示装置
でもって例示する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS First, a method for manufacturing a liquid crystal display device according to the present invention will be described. In this example, a color liquid crystal display device is used as an example.

【0020】順次下記(a)〜(c)の各工程を経て作
製した一方部材と、マザーガラス上に電極と配向層とを
順次積層してなる他方部材とを表示領域の外周部ではシ
ール部にて、さらに非表示領域ではダミー部材でもって
貼り合わせ、ついで双方のマザーガラスを非表示領域に
て切断する。 (a)マザーガラス上の各表示領域に着色層を、さらに
各表示領域間の非表示領域にダミー層を形成する。 (b)上記各表示領域の着色層上に電極を形成する。 (c)上記電極上に配向膜を形成する。
The one member manufactured through the following steps (a) to (c) and the other member formed by sequentially laminating an electrode and an alignment layer on a mother glass are sealed at the outer peripheral portion of the display area. Then, in the non-display area, the two pieces of mother glass are cut in the non-display area using a dummy member. (A) A colored layer is formed in each display area on the mother glass, and a dummy layer is formed in a non-display area between the display areas. (B) An electrode is formed on the colored layer in each display area. (C) forming an alignment film on the electrode;

【0021】つぎに図1〜図3および図7〜図9によっ
て本発明の液晶表示装置A、Bの製造方法を詳述する。
Next, a method for manufacturing the liquid crystal display devices A and B according to the present invention will be described in detail with reference to FIGS. 1 to 3 and FIGS.

【0022】前記他方部材である信号電極部材と、前記
一方部材である走査電極部材の双方はマザーガラスから
なるが、1個のマザーガラスより分断作成することで6
個の液晶表示装置A、Bを作製する場合を例示する。
Both the signal electrode member as the other member and the scanning electrode member as the one member are made of mother glass.
A case where the liquid crystal display devices A and B are manufactured will be exemplified.

【0023】図1は分断前の基板平面図であり、図2と
図3はそれぞれ図1に示す切断面線a−a‘による概略
断面図である。また、図7〜図9はいずれも工程図であ
る。なお、図4および図5に示す液晶表示装置と同一箇
所には同一符号を付す。液晶表示装置Aの製法 図1と図2と図7により本発明の液晶表示装置Aの製法
を述べる。信号電極部材4については、マザーガラス
(たとえば300×360mm)である透明基板1の上
にITOなどからなる膜をスパッタリング法や蒸着にて
成膜し、ついでフォトリソグラフィにより一方に配列し
た多数の信号電極2を形成する。そして、この信号電極
2の上にポリイミド樹脂からなる樹脂を塗布でもって被
覆形成し、ついで一方向にラビング処理し、これによっ
て配向膜3となす。
FIG. 1 is a plan view of the substrate before division, and FIGS. 2 and 3 are schematic cross-sectional views taken along the line aa 'shown in FIG. 7 to 9 are process diagrams. The same parts as those of the liquid crystal display device shown in FIGS. 4 and 5 are denoted by the same reference numerals. Manufacturing Method of Liquid Crystal Display A The manufacturing method of the liquid crystal display A of the present invention will be described with reference to FIGS. Regarding the signal electrode member 4, a film made of ITO or the like is formed on a transparent substrate 1 which is a mother glass (for example, 300 × 360 mm) by a sputtering method or vapor deposition, and then a large number of signals arranged on one side by photolithography. The electrode 2 is formed. Then, a resin made of a polyimide resin is coated and formed on the signal electrode 2 and then rubbed in one direction, thereby forming the alignment film 3.

【0024】そして、このような設けた6個の表示領域
16に対し、それぞれ外周にそってシール部13を形成
する。このシール部13の形成と同時に、前記ダミー部
材であるダミーシール部14aも各表示領域16の間の
非表示領域に形成する。このダミーシール部14aはシ
ール部13と同じ材料にて設ければよい。たとえば、エ
ポキシ系樹脂やアクリル系樹脂等の熱硬化樹脂あるいは
紫外線硬化樹脂などがある。
Then, a seal portion 13 is formed along the outer periphery of each of the six display regions 16 provided as described above. Simultaneously with the formation of the seal portion 13, a dummy seal portion 14a as the dummy member is also formed in a non-display region between the display regions 16. The dummy seal portion 14a may be provided with the same material as the seal portion 13. For example, there is a thermosetting resin such as an epoxy resin or an acrylic resin, or an ultraviolet curable resin.

【0025】他方の走査電極部材11については、下記
(a)〜(b)の各工程を含む工程でもって作製する。(a)工程 マザーガラス(たとえば300×360mm)である透
明基板5を用意する。そして、透明基板5の上にクロム
やアルミニウム、銀などの金属膜を形成し、その後にフ
ォトリソグラフィにて所定のパターンからなる遮光膜7
(層厚1000Å〜3000Å)を設ける。このような
金属膜の遮光膜7に代えて黒色樹脂からなる遮光膜7
(層厚1.3〜1.5μm)を塗布形成してもよい。
The other scanning electrode member 11 is manufactured by a process including the following steps (a) and (b). (A) Process A transparent substrate 5 which is a mother glass (for example, 300 × 360 mm) is prepared. Then, a metal film of chromium, aluminum, silver, or the like is formed on the transparent substrate 5, and thereafter, a light shielding film 7 having a predetermined pattern is formed by photolithography.
(Layer thickness: 1000 to 3000 mm). Instead of such a metal film light shielding film 7, a light shielding film 7 made of black resin is used.
(Thickness: 1.3 to 1.5 μm).

【0026】そして、透明基板5の遮光膜7が形成され
ていない領域にカラーフィルタ用の着色層6(層厚1.
3〜1.5μm)を形成する。この着色層6は顔料分散
方式、すなわちあらかじめ顔料(赤、緑、青)により調
合された感光性レジストを基板上に塗布し、フォトリソ
グラフィにより形成する。
Then, a colored layer 6 for a color filter (having a thickness of 1....) Is formed in a region of the transparent substrate 5 where the light shielding film 7 is not formed.
3 to 1.5 μm). The coloring layer 6 is formed by a pigment dispersion method, that is, a method in which a photosensitive resist prepared in advance with a pigment (red, green, and blue) is applied on a substrate, and is formed by photolithography.

【0027】さらに非表示領域の上にダミー層18を形
成する。たとえば、アクリル系感光ポリマー、ポリイミ
ド系感光ポリマーなどからなるレジストを塗布し、フォ
トマスクを用いて露光し、現像することで、非表示領域
の上に遮光膜7もしくは着色層6とほぼ同じ厚みになる
ようにダミー層18を形成する。
Further, a dummy layer 18 is formed on the non-display area. For example, a resist composed of an acrylic photosensitive polymer, a polyimide photosensitive polymer, or the like is applied, exposed using a photomask, and developed, so that the light-shielding film 7 or the colored layer 6 has a thickness substantially equal to that of the non-display area. The dummy layer 18 is formed so as to be as follows.

【0028】つぎに遮光膜7と着色層6とダミー層18
との上にアクリル系樹脂からなるオーバーコート層8を
スピンナー方式で塗布し形成する。(b)工程 この工程においては、ITOなどからなる膜をスパッタ
リング法や蒸着にて成膜し、ついでフォトリソグラフィ
により一方に配列した多数の走査電極9を形成する。な
お、オーバーコート層8とITOなどからなる膜との間
に、密着性を向上させるために、SiO2やSiNから
なる層を形成する方が望ましい。(c)工程 そして、この走査電極9の上にポリイミド樹脂からなる
樹脂を塗布でもって被覆形成し、ついで一方向にラビン
グ処理し、これによって配向膜10となす。なお、走査
電極9は非表示領域にも同時形成するが、表示領域16
内の電極とは電気的に絶縁する。しかる後に樹脂からな
る球状のスペーサ15を多数個散布する。
Next, the light shielding film 7, the coloring layer 6, and the dummy layer 18
An overcoat layer 8 made of an acrylic resin is applied by a spinner method and formed on the substrate. (B) Step In this step, a film made of ITO or the like is formed by sputtering or vapor deposition, and then a number of scanning electrodes 9 arranged on one side are formed by photolithography. It is preferable to form a layer made of SiO 2 or SiN between the overcoat layer 8 and a film made of ITO or the like in order to improve adhesion. (C) Step Then, a resin made of a polyimide resin is coated on the scan electrode 9 by coating, and then rubbed in one direction, thereby forming an alignment film 10. Although the scanning electrodes 9 are formed simultaneously in the non-display area,
It is electrically insulated from the inner electrodes. Thereafter, a large number of spherical spacers 15 made of resin are sprayed.

【0029】以上の各工程(a)〜(c)を経た後に、
信号電極部材4と走査電極部材11とを層厚1.5μm
の液晶層12(室温でネマチック相を呈する液晶組成物
「E.Merck社製ZLI−1557」に光学活性添
加物「E.Merck社製S−811」を加えてヘリカ
ルピッチPを2.7μmに調整したもの)を介して、シ
ール部13およびダミーシール部14aにより貼り合わ
せる。
After the above steps (a) to (c),
The signal electrode member 4 and the scanning electrode member 11 have a layer thickness of 1.5 μm.
Liquid crystal layer 12 (a liquid crystal composition exhibiting a nematic phase at room temperature "ZLI-1557 manufactured by E. Merck") and an optically active additive "S-811 manufactured by E. Merck" were added to make the helical pitch P 2.7 μm. (Adjusted), and are bonded together by the seal portion 13 and the dummy seal portion 14a.

【0030】ついで、このような貼り合わせマザーガラ
ス基板を圧着し、非表示領域にて分断し、個々の液晶表
示装置Aに対しシール部13の一部の開孔より液晶材を
注入し、しかる後に、その注入口を封止する。この分断
部位は、シール部13とダミーシール部14aとの間に
する。
Next, such a bonded mother glass substrate is pressure-bonded, divided at a non-display area, and a liquid crystal material is injected into each liquid crystal display device A through a part of the opening of the seal portion 13. Later, the inlet is sealed. The dividing portion is provided between the seal portion 13 and the dummy seal portion 14a.

【0031】かくして上記製法により得られた液晶表示
装置Aによれば、非表示領域に遮光膜7もしくは着色層
6とほぼ同じ厚みになるようにダミー層18を形成した
ことで、信号電極部材4と走査電極部材11とを貼り合
わせるに際し、シール部13やダミーシール部14aが
均等に押しつぶされ硬化できるため、とくにシール部1
3の全体に対し液晶層厚方向の厚みを揃えられ、これに
よって基板に歪みが生じなくなる。
According to the liquid crystal display device A obtained by the above-described method, the dummy layer 18 is formed in the non-display area so as to have substantially the same thickness as the light-shielding film 7 or the colored layer 6, so that the signal electrode member 4 When the sealing portion 13 and the dummy sealing portion 14a are crushed and hardened evenly when the scanning electrode member 11 and the scanning electrode member 11 are bonded to each other,
3, the thickness of the liquid crystal layer in the thickness direction is made uniform, so that no distortion occurs in the substrate.

【0032】また、上記構成の液晶表示装置Aによれ
ば、さらに信号電極部材4と走査電極部材11のそれぞ
れの外側に偏光板を配設した構成であって、そして、カ
イラルネマチック液晶からなる液晶層12は初期状態で
ねじれ構造を有し、その初期状態にフレデリクス転移を
生じさせる電圧を印加した後に印加される電圧差によっ
て初期状態とは異なる2つの準安定状態を有するように
なしたメモリー性双安定型となる。
Further, according to the liquid crystal display device A having the above configuration, a polarizing plate is further provided outside each of the signal electrode member 4 and the scanning electrode member 11, and the liquid crystal is composed of a chiral nematic liquid crystal. The layer 12 has a twisted structure in an initial state, and has two metastable states different from the initial state due to a voltage difference applied after applying a voltage causing a Freedericks transition to the initial state. Bistable type.

【0033】たとえば初期状態でのツイスト角φ0
(=180°)に対してφ0+π(=360°)のねじ
れ状態が暗状態となるような両偏光板の位置関係(クロ
スニコル)にした場合に、明状態はツイスト角φ0−π
(=0°)である。
For example, the twist angle φ 0 in the initial state
When the twisted state of φ 0 + π (= 360 °) with respect to (= 180 °) is set to be a dark state and the positional relationship (crossed Nicols) of the two polarizing plates is set, the bright state has a twist angle φ 0 −π.
(= 0 °).

【0034】つぎにこの双安定型を利用する液晶表示装
置Aに対し、図10に示すように不安定状態(不安定領
域)を挟んで0°と360°との間でスイッチングす
る。
Next, the liquid crystal display device A using the bistable type is switched between 0 ° and 360 ° across an unstable state (unstable region) as shown in FIG.

【0035】このようなスイッチングをおこなった場
合、初期状態にフレデリクス転移を生じさせる電圧を印
加した後の選択電圧をV1より低くすると360°状
態、V2にまで高くすると0°状態、そして、Vl〜V
2との間にすると0°と360°が混在した不安定状態
が生じる。
When such switching is performed, the selection voltage after applying a voltage that causes the Freedericksz transition in the initial state is set to 360 ° when the selection voltage is lower than V1, 0 ° when the selection voltage is increased to V2, and Vl to V
If it is between 2, an unstable state in which 0 ° and 360 ° are mixed occurs.

【0036】たとえば、両偏光板クロスニコルにして、
初期状態でのツイスト角φ0(180°)に対してφ0
π(360°)のねじれ状態が暗状態、φ0−π(0
°)の状態が明状態であるとすると、不安定状態は2つ
の状態(明状態と黒状態)が混在しており、白〜黒の間
の状態を示す。また、このように2つの準安定状態を利
用するスイッチングは、図10に示すように選択電圧を
V3、V4にした関係を利用しても同様におこなわれ
る。
For example, by making both polarizing plates cross Nicol,
Φ 0 + for the initial twist angle φ 0 (180 °)
The twisted state of π (360 °) is a dark state, φ 0 −π (0
If the state of (°) is a bright state, the unstable state is a mixture of two states (bright state and black state), indicating a state between white and black. Further, the switching using the two metastable states as described above is similarly performed by using the relationship where the selection voltages are set to V3 and V4 as shown in FIG.

【0037】さらにまた、液晶表示装置Aのマトリクス
駆動を図11により述べる。走査電位をVS、信号電位
をVdとすると、0°状態を発現させるための選択パル
ス値(選択電圧)V1(=±|VS+Vd|)と、36
0°状態を発現させるための選択パルス値(選択電圧)
V2(=±|VS−Vd|)に対して、V2−V1=2
Vdとなる。そして、不安定領域の幅△1、△2の値に
おいて、2Vd>△1、△2の条件が満たされると、3
60°/0°状態が発現し、マトリクス駆動できる。液晶表示装置Bの製法 前記液晶表示装置Aにおいては、信号電極部材4と走査
電極部材11とを多数のスペーサ15を介して貼り合わ
せたが、これに代えて柱状スペーサを設けている。そし
て、非表示領域上のダミーシール部14aが前記ダミー
部材である。なお、液晶表示装置Aと同一箇所には同一
符号を付す。
Further, matrix driving of the liquid crystal display device A will be described with reference to FIG. Assuming that the scanning potential is VS and the signal potential is Vd, a selection pulse value (selection voltage) V1 (= ± | VS + Vd |) for expressing the 0 ° state, and 36
Selection pulse value (selection voltage) for developing 0 ° state
For V2 (= ± | VS−Vd |), V2−V1 = 2
Vd. When the condition of 2Vd> △ 1 and △ 2 is satisfied in the values of the widths △ 1 and △ 2 of the unstable region, 3
A 60 ° / 0 ° state is developed and matrix driving can be performed. Manufacturing method of liquid crystal display device B In the liquid crystal display device A, the signal electrode member 4 and the scanning electrode member 11 are bonded via a number of spacers 15, but a columnar spacer is provided instead. The dummy seal portion 14a on the non-display area is the dummy member. The same parts as those of the liquid crystal display device A are denoted by the same reference numerals.

【0038】図3は液晶表示装置Bのマザーガラス分断
前の断面図であり、図8は製造工程を示す。
FIG. 3 is a cross-sectional view of the liquid crystal display device B before the mother glass is divided, and FIG. 8 shows a manufacturing process.

【0039】信号電極部材4については、液晶表示装置
Aと同じ製法であり、マザーガラス(たとえば300×
360mm)である透明基板1の上に一方に配列した多
数の信号電極2を形成し、この信号電極2の上にポリイ
ミド樹脂からなる樹脂を塗布でもって被覆形成し、つい
で一方向にラビング処理し、これによって配向膜3とな
す。そして、6個の表示領域16に対し、同時にシール
部13とダミーシール部14aを形成する。
The signal electrode member 4 has the same manufacturing method as that of the liquid crystal display device A and has a mother glass (for example, 300 ×
A large number of signal electrodes 2 arranged on one side are formed on a transparent substrate 1 (360 mm), and a resin made of polyimide resin is coated on the signal electrodes 2 by coating, and then rubbed in one direction. Thus, an orientation film 3 is formed. Then, the seal portion 13 and the dummy seal portion 14a are simultaneously formed in the six display regions 16.

【0040】他方の走査電極部材11については、下記
(a)〜(b)の各工程を含む工程でもって作製する。(a)工程 マザーガラス(たとえば300×360mm)である透
明基板5の上にクロムやアルミニウム、銀などの金属膜
(層厚1000〜3000Å)、あるいは黒色樹脂(層
厚1.3〜1.5μm)などからなる遮光膜7を設け、
そして、遮光膜7が形成されていない領域にカラーフィ
ルタ用の着色層6(層厚1.3〜1.5μm)を形成す
る。さらに非表示領域の上にダミー層18を形成する。
つぎに遮光膜7と着色層6とダミー層18との上にアク
リル系樹脂からなるオーバーコート層8をスピンナー方
式で塗布し形成する。(b)工程 この工程においては、ITOなどからなる膜をスパッタ
リング法や蒸着にて成膜し、ついでフォトリソグラフィ
により一方に配列した多数の走査電極9を形成する。な
お、オーバーコート層8とITOなどからなる膜との間
に、密着性を向上させるために、SiO2やSiNから
なる層を形成する方が望ましい。(c)工程 そして、この走査電極9の上にポリイミド樹脂からなる
樹脂を塗布でもって被覆形成し、ついで一方向にラビン
グ処理し、これによって配向膜10となす。さらに走査
電極9の一部は非表示領域にも形成する。
The other scanning electrode member 11 is manufactured by a process including the following steps (a) and (b). (A) Process A metal film of chromium, aluminum, silver, or the like (thickness of 1000 to 3000 °) or a black resin (thickness of 1.3 to 1.5 μm) is formed on a transparent substrate 5 which is a mother glass (for example, 300 × 360 mm). ) Is provided,
Then, a colored layer 6 (thickness: 1.3 to 1.5 μm) for a color filter is formed in a region where the light shielding film 7 is not formed. Further, a dummy layer 18 is formed on the non-display area.
Next, an overcoat layer 8 made of an acrylic resin is applied on the light-shielding film 7, the colored layer 6, and the dummy layer 18 by a spinner method. (B) Step In this step, a film made of ITO or the like is formed by sputtering or vapor deposition, and then a number of scanning electrodes 9 arranged on one side are formed by photolithography. It is preferable to form a layer made of SiO 2 or SiN between the overcoat layer 8 and a film made of ITO or the like in order to improve adhesion. (C) Step Then, a resin made of a polyimide resin is coated on the scan electrode 9 by coating, and then rubbed in one direction, thereby forming an alignment film 10. Further, a part of the scanning electrode 9 is also formed in a non-display area.

【0041】しかる後に柱状スペーサ17を画素間の領
域(非画素領域)に、前記ダミー部材である柱状スペー
サ19をダミー層18の上に形成する。
Thereafter, the columnar spacer 17 is formed in the region between pixels (non-pixel region), and the columnar spacer 19 as the dummy member is formed on the dummy layer 18.

【0042】この柱状スペーサ17、19は、たとえば
アクリル系感光樹脂またはポリイミド系感光樹脂からな
るレジストを塗布し、フォトマスクを用いて露光し、現
像し、一様な厚みにそろえることで形成する。
The columnar spacers 17 and 19 are formed by applying a resist made of, for example, an acrylic photosensitive resin or a polyimide photosensitive resin, exposing using a photomask, developing, and uniforming the thickness.

【0043】以上の各工程(a)〜(c)を経た後に、
信号電極部材4と走査電極部材11とを層厚1.5μm
の液晶層12を介して、シール部13およびダミーシー
ル部14a、柱状スペーサ17、19により貼り合わせ
る。
After going through each of the above steps (a) to (c),
The signal electrode member 4 and the scanning electrode member 11 have a layer thickness of 1.5 μm.
Are adhered by the seal part 13 and the dummy seal part 14a and the columnar spacers 17 and 19 via the liquid crystal layer 12 of FIG.

【0044】ついで、このような貼り合わせマザーガラ
ス基板を圧着し、非表示領域にて分断し、個々の液晶表
示装置Bに対しシール部13の一部の開孔より液晶材を
注入し、しかる後に、その注入口を封止する。
Then, such a bonded mother glass substrate is pressure-bonded, divided at a non-display area, and a liquid crystal material is injected into each liquid crystal display device B through a part of the opening of the seal portion 13. Later, the inlet is sealed.

【0045】かくして上記製法により得られた液晶表示
装置Bによれば、非表示領域に遮光膜7もしくは着色層
6とほぼ同じ厚みになるようにダミー層18を、さらに
柱状スペーサ17、19を形成したことで、信号電極部
材4と走査電極部材11とを貼り合わせるに際し、シー
ル部13やダミーシール部14aが均等に押しつぶさ硬
化され、とくにシール部13の全体に対し液晶層厚方向
の厚みを揃えられ、これによって基板に歪みが生じなく
なる。
Thus, according to the liquid crystal display device B obtained by the above-described manufacturing method, the dummy layer 18 and the columnar spacers 17 and 19 are formed in the non-display area so as to have substantially the same thickness as the light shielding film 7 or the colored layer 6. In doing so, when the signal electrode member 4 and the scanning electrode member 11 are bonded to each other, the seal portion 13 and the dummy seal portion 14a are evenly crushed and hardened, and the thickness of the seal portion 13 in the liquid crystal layer thickness direction is made uniform. This eliminates distortion of the substrate.

【0046】しかも、液晶表示装置Bでは液晶表示装置
Aと比べても、柱状スペーサ17、19を形成したこと
で、散布にて配した球状のスペーサ15よりも均等に液
晶層内に設けられ、これにより、液晶層厚のバラツキ度
合いがさらに改善され、均等な層厚になる。
Further, in the liquid crystal display device B, even when compared with the liquid crystal display device A, the columnar spacers 17 and 19 are formed, so that the columnar spacers 17 and 19 are provided in the liquid crystal layer more uniformly than the spherical spacers 15 arranged by scattering. As a result, the degree of variation in the thickness of the liquid crystal layer is further improved, and the layer thickness becomes uniform.

【0047】また、上記構成の液晶表示装置Bについて
も、信号電極部材4と走査電極部材11のそれぞれの外
側に偏光板を配設した構成であって、そして、カイラル
ネマチック液晶からなる液晶層13は初期状態でねじれ
構造を有し、その初期状態にフレデリクス転移を生じさ
せる電圧を印加した後に印加される電圧差によって初期
状態とは異なる2つの準安定状態を有するようになした
メモリー性双安定型となる。
The liquid crystal display device B having the above configuration also has a configuration in which a polarizing plate is disposed outside each of the signal electrode member 4 and the scanning electrode member 11, and the liquid crystal layer 13 made of chiral nematic liquid crystal. Has a twisted structure in the initial state, and has two metastable states different from the initial state due to the voltage difference applied after applying a voltage that causes the Freedericksz transition in the initial state. Type.

【0048】また、前記ダミー層18は遮光膜7や着色
層6を形成した際に、そこにて使用したフォトマスクを
変更することで、それらと同一材でもって厚みを調整し
て成膜形成してもよい。この製造工程を図9に示す。
When the light shielding film 7 and the colored layer 6 are formed, the thickness of the dummy layer 18 is adjusted by changing the photomask used therewith so that the dummy layer 18 is formed of the same material as the dummy layer 18. May be. This manufacturing process is shown in FIG.

【0049】なお、本発明は上記のような実施形態例に
限定されるものではなく、本発明の要旨を逸脱しない範
囲内で種々の変更や改良等は何ら差し支えない。たとえ
ば、液晶層厚の小さいカイラルスメクティック液晶を用
いた強誘電性液晶表示装置や反強誘電性液晶表示装置に
おいても同じ作用効果がある。さらには液晶層厚が5μ
m程度の通常のSTN型やTN型の液晶表示装置であっ
ても同様の効果を奏する。しかも、実施例では、以下の
とおり、単純マトリックス駆動方式の構造にて説明した
が、その他の駆動方式、たとえばアクティブマトリック
ス駆動方式の構造でも同じ作用効果がある。
It should be noted that the present invention is not limited to the above embodiments, and various changes and improvements may be made without departing from the scope of the present invention. For example, the same operation and effect can be obtained in a ferroelectric liquid crystal display device or an antiferroelectric liquid crystal display device using a chiral smectic liquid crystal having a small liquid crystal layer thickness. Furthermore, the liquid crystal layer thickness is 5μ.
The same effect can be obtained even with a normal STN or TN type liquid crystal display device of about m. Moreover, in the embodiment, the structure of the simple matrix drive system has been described as follows, but the same operation and effect can be obtained by other drive systems, for example, the structure of the active matrix drive system.

【0050】[0050]

【実施例】本発明は非表示領域の上にダミー層18を形
成し、さらにダミーシール部14aや柱状スペーサ19
を設けたことで、表示領域16上の遮光膜7もしくは着
色層6の高さとそろえている。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, a dummy layer 18 is formed on a non-display area, and a dummy seal portion 14a and a columnar spacer 19 are formed.
Is provided, the height of the light-shielding film 7 or the coloring layer 6 on the display area 16 is made equal.

【0051】そこで、本発明者は液晶表示装置Bに対
し、透明基板5上における表示領域16の高さd1(走
査電極部材11の表示領域16における厚み)と、非表
示領域の高さd2(走査電極部材11の非表示領域にお
ける厚み)とを、幾とおりにも変えて、それぞれ信号電
極部材4と走査電極部材11とを層厚1.5μmの液晶
層12を介して、シール部13およびダミーシール部1
4aにより貼り合わせ、ついで、このような貼り合わせ
マザーガラス基板を圧着し、非表示領域にて分断し、さ
らに液晶材を注入し、液晶表示装置Bとなした。
Therefore, the present inventor has set the height d1 of the display area 16 on the transparent substrate 5 (the thickness of the scanning electrode member 11 in the display area 16) and the height d2 of the non-display area on the liquid crystal display device B. (The thickness of the scanning electrode member 11 in the non-display area) is changed in many ways, and the signal electrode member 4 and the scanning electrode member 11 are each separated via the liquid crystal layer 12 having a layer thickness of 1.5 μm. Dummy seal part 1
4a, the bonded mother glass substrate was bonded by pressure bonding, divided in a non-display area, and a liquid crystal material was injected to obtain a liquid crystal display device B.

【0052】高さd1、d2の測定については、触針を
測定対象物に接触させ、測定対象物を移動させること
で、触針の上下の触れを検出し、表面形状を測定すると
いうDEKTAK装置を用いて、各膜の厚みを測定し、
そこから基板構造を考慮し算出するという方法を用い
た。
For the measurement of the heights d1 and d2, a DEKTAK device for detecting the upper and lower touches of the stylus and measuring the surface shape by bringing the stylus into contact with the object to be measured and moving the object to be measured. Using, measure the thickness of each film,
Then, a method was used in which the calculation was performed in consideration of the substrate structure.

【0053】そして、これら各種液晶表示装置を評価
し、「良好」と「不良」に2分した。「良好」はフリッ
カーレスのハイデューティな単純マトリックス駆動を実
現し、これによって色ムラのない高品質が達成された場
合であり、「不良」はそのようなハイデューティな単純
マトリックス駆動とならず、色ムラが発生した場合であ
る。 ・d1−d2=2.1μm ⇒「不良」 ・d1−d2=1.8μm ⇒「不良」 ・d1−d2=1.6μm ⇒「不良」 ・d1−d2=1.4μm ⇒「不良」 ・d1−d2=1.2μm ⇒「良好」 ・d1−d2=1.1μm ⇒「良好」 ・d1−d2=1.0μm ⇒「良好」 ・d1−d2=0.9μm ⇒「良好」 ・d1−d2=―0.9μm ⇒「良好」 ・d1−d2=―1.0μm ⇒「良好」 ・d1−d2=―1.1μm ⇒「良好」 ・d1−d2=―1.2μm ⇒「良好」 ・d1−d2=―1.4μm ⇒「不良」 かくして│d1−d2│≦1.2に、好適には│d1−
d2│≦1.0に設定することで、フリッカーレスのハ
イデューティな単純マトリックス駆動を実現し、これに
よって色ムラのない高品質が達成された。
Then, these various liquid crystal display devices were evaluated and classified into “good” and “bad” for 2 minutes. "Good" indicates that flicker-less high-duty simple matrix driving is realized, thereby achieving high quality without color unevenness. This is the case where unevenness occurs. D1-d2 = 2.1 μm ⇒ “bad” d1-d2 = 1.8 μm ⇒ “bad” d1-d2 = 1.6 μm ⇒ “bad” d1-d2 = 1.4 μm ⇒ “bad” d1 −d2 = 1.2 μm ⇒ “good” d1-d2 = 1.1 μm ⇒ “good” d1-d2 = 1.0 μm ⇒ “good” d1-d2 = 0.9 μm ⇒ “good” d1-d2 = −0.9 μm ⇒ “good” d1-d2 = −1.0 μm ⇒ “good” d1-d2 = -1.1 μm ⇒ “good” d1-d2 = -1.2 μm ⇒ “good” d1 −d2 = −1.4 μm ⇒ “bad” Thus | d1-d2 | ≦ 1.2, preferably | d1-
By setting d2│ ≦ 1.0, a flickerless high-duty simple matrix drive was realized, thereby achieving high quality without color unevenness.

【0054】また、d1−d2=1.4〜2.1μmで
ある場合に、表示領域16の外周を起点にして、そこで
のセルギャップ差を0.00とした場合に、起点から表
示領域内に向けて、測定位置を移動させることで、セル
ギャップ差の変化を追ったところ、図12に示すような
結果が得られた。
When d1−d2 = 1.4 to 2.1 μm, the outer circumference of the display area 16 is used as a starting point, and when the cell gap difference there is set to 0.00, the display area is moved from the starting point to within the display area. When the change of the cell gap difference was followed by moving the measurement position toward, the result as shown in FIG. 12 was obtained.

【0055】また、シール部13の全体に対し液晶層厚
方向の厚み(シール高さ)を測定したところ、図15に
示すようにシール高さが液晶セル内側にいくほどに高く
なっている。
When the thickness of the entire seal portion 13 in the liquid crystal layer thickness direction (seal height) was measured, as shown in FIG. 15, the seal height increased toward the inside of the liquid crystal cell.

【0056】つぎにd1−d2=−1.2〜1.2μm
である場合に、同様に表示領域16の外周を起点にして
表示領域内に向けて、測定位置を移動させることで、セ
ルギャップ差の変化を追ったところ、図13に示すよう
な結果が得られた。
Next, d1−d2 = −1.2 to 1.2 μm
In the case of, by similarly moving the measurement position from the outer periphery of the display area 16 toward the inside of the display area and following the change of the cell gap difference, the result shown in FIG. 13 is obtained. Was done.

【0057】また、シール部を測定したところ、図16
に示すようにシール高さが一様に揃っている。シール高
さがシール幅600μmに対し0.05μm以下である
場合に、セルギャップ差が0.10μm以下の差になる
ことを確認した。
FIG. 16 shows the result of measurement of the seal portion.
As shown in the figure, the seal heights are uniform. When the seal height was 0.05 μm or less with respect to the seal width of 600 μm, it was confirmed that the cell gap difference was 0.10 μm or less.

【0058】さらにまた、d1−d2<―1.4μmで
ある場合に、表示領域16の外周を起点にして、同様に
セルギャップ差の変化を追ったところ、図14に示すよ
うな結果が得られた。
Further, when d1−d2 <−1.4 μm, the change in the cell gap difference was similarly traced starting from the outer periphery of the display area 16, and the result shown in FIG. 14 was obtained. Was done.

【0059】また、シール部の全体に対し液晶層厚方向
の厚み(シール高さ)を測定したところ、図17に示す
ようにシール高さが液晶セル内側にいくほどに低くなっ
ている。
When the thickness (seal height) of the entire seal portion in the thickness direction of the liquid crystal layer was measured, as shown in FIG. 17, the seal height became lower toward the inside of the liquid crystal cell.

【0060】これらの結果から明らかなとおり、d1−
d2=−1.2〜1.2μmにまで小さくすることで、
表示領域内のギャップ差が顕著に小さくなっていること
がわかる。
As is clear from these results, d1-
By reducing d2 to -1.2 to 1.2 μm,
It can be seen that the gap difference in the display area is significantly reduced.

【0061】以上のとおり、マザーガラス上に電極と配
向層とを順次積層してなる2種類の部材を、表示領域の
外周部ではシール部にて、さらに非表示領域ではダミー
部材でもって貼り合わせ、ついで双方のマザーガラスを
非表示領域にて切断した液晶表示装置A,Bによれば、
シール部の全体に対し液晶層厚方向の厚みを揃えること
ができ、これにより、基板に歪みが生じなくなった。
As described above, two types of members formed by sequentially laminating an electrode and an alignment layer on a mother glass are bonded together with a seal portion on the outer peripheral portion of the display region and a dummy member on the non-display region. According to the liquid crystal display devices A and B in which both mother glasses are cut in the non-display area,
The thickness of the liquid crystal layer in the thickness direction can be made uniform with respect to the entire seal portion, thereby preventing the substrate from being distorted.

【0062】[0062]

【発明の効果】以上のとおり、本発明の液晶表示装置に
よれば、マザーガラス上に電極と配向層とを順次積層し
てなる2種類の部材を、表示領域の外周部ではシール部
にて、さらに非表示領域ではダミー部材でもって貼り合
わせ、ついで双方のマザーガラスを非表示領域にて切断
することで、ガラス基板上に多数の信号電極と配向膜と
を順次積層してなる信号電極部材と、ガラス基板上に多
数の走査電極と配向膜とを順次積層してなる走査電極部
材とを、シール部にて囲まれた液晶層を介して貼り合わ
せるとともに、前記シール部の全体に対し液晶層厚方向
の厚みを揃えたことで、とくに液晶層厚の小さい液晶表
示装置において、その層厚を表示領域全体にわたり顕著
に均一化するとともに、生産コストが低減でき、これに
よって、高品質かつ高信頼性の液晶表示装置が提供でき
た。
As described above, according to the liquid crystal display device of the present invention, two types of members formed by sequentially laminating an electrode and an alignment layer on a mother glass are provided at the outer peripheral portion of the display region by a sealing portion. Further, in a non-display area, a signal electrode member is formed by laminating a number of signal electrodes and an orientation film on a glass substrate by laminating with a dummy member and then cutting both mother glasses in the non-display area. And a scanning electrode member formed by sequentially laminating a large number of scanning electrodes and an alignment film on a glass substrate via a liquid crystal layer surrounded by a sealing portion, and bonding the liquid crystal to the entire sealing portion. By aligning the thickness in the layer thickness direction, especially in a liquid crystal display device having a small liquid crystal layer thickness, the layer thickness can be remarkably uniformed over the entire display area, and the production cost can be reduced. High reliability liquid crystal display device could be provided.

【0063】また、本発明によれば、液晶層厚を一様に
小さくして、フリッカーレスのハイデューティな単純マ
トリックス駆動を実現したメモリー性双安定型の液晶表
示装置が提供できた。
Further, according to the present invention, it is possible to provide a memory-type bistable liquid crystal display device in which the thickness of the liquid crystal layer is made uniform and flickerless high-duty simple matrix driving is realized.

【0064】さらにまた、本発明においては、カラー液
晶表示用に対し優れた特性が得られ、セルギャップを均
一にして色ムラのない高品質な液晶表示装置が提供でき
た。
Further, in the present invention, a high-quality liquid crystal display device having excellent characteristics for color liquid crystal display and having a uniform cell gap and no color unevenness can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の液晶表示装置に係りマザーガラスの分
断前の平面図である。
FIG. 1 is a plan view of a liquid crystal display device of the present invention before a mother glass is divided.

【図2】図1に示す切断面線a−a‘による概略断面図
である。
FIG. 2 is a schematic cross-sectional view taken along the line aa ′ shown in FIG.

【図3】図1に示す切断面線a−a‘による概略断面図
である。
FIG. 3 is a schematic cross-sectional view taken along the line aa ′ of FIG. 1;

【図4】従来の液晶表示装置に係りマザーガラスの分断
前の平面図である。
FIG. 4 is a plan view of a conventional liquid crystal display device before a mother glass is divided.

【図5】図4に示す切断面線b−b‘による概略断面図
である。
FIG. 5 is a schematic sectional view taken along the line bb 'of FIG. 4;

【図6】図4に示す切断面線b−b‘による概略断面図
である。
FIG. 6 is a schematic cross-sectional view taken along the line bb ′ of FIG. 4;

【図7】本発明の液晶表示装置の製法に関する工程図で
ある。
FIG. 7 is a process chart relating to a method of manufacturing the liquid crystal display device of the present invention.

【図8】本発明の液晶表示装置の製法に関する工程図で
ある。
FIG. 8 is a process chart relating to a method for manufacturing the liquid crystal display device of the present invention.

【図9】本発明の液晶表示装置の製法に関する工程図で
ある。
FIG. 9 is a process chart relating to a method for manufacturing the liquid crystal display device of the present invention.

【図10】双安定型の液晶表示装置における選択電圧と
不安定状態(不安定領域)との関係を示す説明図であ
る。
FIG. 10 is an explanatory diagram showing a relationship between a selection voltage and an unstable state (unstable region) in a bistable liquid crystal display device.

【図11】双安定型の液晶表示装置におけるスイッチン
グ状態を示す説明図である。
FIG. 11 is an explanatory diagram showing a switching state in a bistable liquid crystal display device.

【図12】セルギャップ測定位置とギャップ差との関係
を示す線図である。
FIG. 12 is a diagram showing a relationship between a cell gap measurement position and a gap difference.

【図13】セルギャップ測定位置とギャップ差との関係
を示す線図である。
FIG. 13 is a diagram showing a relationship between a cell gap measurement position and a gap difference.

【図14】セルギャップ測定位置とギャップ差との関係
を示す線図である。
FIG. 14 is a diagram showing a relationship between a cell gap measurement position and a gap difference.

【図15】シール部の位置とシール高さとの関係を示す
線図である。
FIG. 15 is a diagram showing a relationship between a position of a seal portion and a seal height.

【図16】シール部の位置とシール高さとの関係を示す
線図である。
FIG. 16 is a diagram showing a relationship between a position of a seal portion and a seal height.

【図17】シール部の位置とシール高さとの関係を示す
線図である。
FIG. 17 is a diagram showing a relationship between a position of a seal portion and a seal height.

【符号の説明】 1,5 透明基板 信号電極 3,10 配向膜 4 信号電極部材 着色層 遮光層 11 順走査電極部材 12 液晶層 13 シール部 14、14a ダミーシール部 16 表示領域 17,19 柱状スペーサ 18 ダミー層DESCRIPTION OF SYMBOLS 1,5 Transparent substrate Signal electrode 3,10 Alignment film 4 Signal electrode member Coloring layer Light shielding layer 11 Forward scanning electrode member 12 Liquid crystal layer 13 Seal part 14,14a Dummy seal part 16 Display area 17,19 Column spacer 18 Dummy layer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】マザーガラス上に電極と配向層とを順次積
層してなる2種類の部材を、表示領域の外周部ではシー
ル部にて、さらに非表示領域ではダミー部材でもって貼
り合わせ、ついで双方のマザーガラスを非表示領域にて
切断することで、ガラス基板上に多数の信号電極と配向
膜とを順次積層してなる信号電極部材と、ガラス基板上
に多数の走査電極と配向膜とを順次積層してなる走査電
極部材とを、シール部にて囲まれた液晶層を介して貼り
合わせるとともに、前記シール部に対し液晶層厚方向の
厚みを揃えたことを特徴とする液晶表示装置。
1. Two kinds of members formed by sequentially laminating an electrode and an orientation layer on a mother glass are adhered by a seal portion in an outer peripheral portion of a display region and by a dummy member in a non-display region. By cutting both mother glasses in the non-display area, a signal electrode member formed by sequentially laminating a number of signal electrodes and an alignment film on a glass substrate, and a number of scanning electrodes and an alignment film on the glass substrate A liquid crystal display device characterized in that a scanning electrode member formed by successively laminating a liquid crystal layer and a sealing member are bonded together via a liquid crystal layer surrounded by a sealing portion, and the thickness of the sealing portion in the thickness direction of the liquid crystal layer is made uniform. .
JP2000151414A 2000-05-23 2000-05-23 Mother board for liquid crystal display device and liquid crystal display device Expired - Fee Related JP4968980B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000151414A JP4968980B2 (en) 2000-05-23 2000-05-23 Mother board for liquid crystal display device and liquid crystal display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000151414A JP4968980B2 (en) 2000-05-23 2000-05-23 Mother board for liquid crystal display device and liquid crystal display device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011051805A Division JP2011118430A (en) 2011-03-09 2011-03-09 Mother substrate for display device, and display device

Publications (2)

Publication Number Publication Date
JP2001330819A true JP2001330819A (en) 2001-11-30
JP4968980B2 JP4968980B2 (en) 2012-07-04

Family

ID=18656976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000151414A Expired - Fee Related JP4968980B2 (en) 2000-05-23 2000-05-23 Mother board for liquid crystal display device and liquid crystal display device

Country Status (1)

Country Link
JP (1) JP4968980B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006227232A (en) * 2005-02-17 2006-08-31 Dainippon Printing Co Ltd Color filter substrate and liquid crystal display panel
JP2011118430A (en) * 2011-03-09 2011-06-16 Kyocera Corp Mother substrate for display device, and display device

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08184823A (en) * 1994-10-31 1996-07-16 Alps Electric Co Ltd Color liquid crystal display element
JPH10123544A (en) * 1996-10-23 1998-05-15 Casio Comput Co Ltd Color liquid crystal display device and production thereof
JPH10123539A (en) * 1996-10-23 1998-05-15 Sharp Corp Production for liquid crystal display device
JPH1114953A (en) * 1997-06-20 1999-01-22 Matsushita Electric Ind Co Ltd Manufacture of multi-numbered liquid crystal display panel, and multi-numbered liquid crystal panel
JPH1164859A (en) * 1997-08-21 1999-03-05 Citizen Watch Co Ltd Liquid crystal display device and its manufacture
JPH11119230A (en) * 1997-10-14 1999-04-30 Toshiba Corp Liquid crystal display device and its production
JPH11167115A (en) * 1997-12-03 1999-06-22 Sharp Corp Manufacture of liquid crystal panel

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08184823A (en) * 1994-10-31 1996-07-16 Alps Electric Co Ltd Color liquid crystal display element
JPH10123544A (en) * 1996-10-23 1998-05-15 Casio Comput Co Ltd Color liquid crystal display device and production thereof
JPH10123539A (en) * 1996-10-23 1998-05-15 Sharp Corp Production for liquid crystal display device
JPH1114953A (en) * 1997-06-20 1999-01-22 Matsushita Electric Ind Co Ltd Manufacture of multi-numbered liquid crystal display panel, and multi-numbered liquid crystal panel
JPH1164859A (en) * 1997-08-21 1999-03-05 Citizen Watch Co Ltd Liquid crystal display device and its manufacture
JPH11119230A (en) * 1997-10-14 1999-04-30 Toshiba Corp Liquid crystal display device and its production
JPH11167115A (en) * 1997-12-03 1999-06-22 Sharp Corp Manufacture of liquid crystal panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006227232A (en) * 2005-02-17 2006-08-31 Dainippon Printing Co Ltd Color filter substrate and liquid crystal display panel
JP2011118430A (en) * 2011-03-09 2011-06-16 Kyocera Corp Mother substrate for display device, and display device

Also Published As

Publication number Publication date
JP4968980B2 (en) 2012-07-04

Similar Documents

Publication Publication Date Title
JP3565547B2 (en) Color liquid crystal display device and method of manufacturing the same
JPH08171086A (en) Liquid crystal display element and its production
KR19980064264A (en) Liquid Crystal Display and Manufacturing Method Thereof
JP2005292347A (en) Liquid crystal display device and manufacturing method of liquid crystal display device
JP2000310784A (en) Liquid crystal panel, color filter and their production
US8284371B2 (en) Liquid crystal display panel and fabricating method with spacer restricted to a central hole among two or more holes
KR19990036927A (en) Liquid Crystal Display and Manufacturing Method Thereof
JPH1138438A (en) Production of liquid crystal display device and tft array substrate used therefor
KR20070069829A (en) Liquid crystal display device and method for fabricating the same
JP2000019528A (en) Liquid crystal display device
JP4803861B2 (en) Manufacturing method of liquid crystal display device
JP2004334009A (en) Liquid crystal panel and its manufacturing method
TWI400526B (en) Substrate for a liquid crystal display device and liquid crystal display device having the same
JP2004191841A (en) Liquid crystal panel and its manufacturing method
JP2001330819A (en) Liquid crystal display device
KR100463793B1 (en) Liquid crystal display element
JP2004145084A (en) Liquid crystal panel and its manufacturing method
JP2011118430A (en) Mother substrate for display device, and display device
JP2003121860A (en) Liquid crystal display panel
JP4298055B2 (en) Liquid crystal panel and manufacturing method thereof
JPH11242229A (en) Liquid crystal display device
JP3210652B2 (en) Liquid crystal display panel manufacturing method
KR100296873B1 (en) Liquid crystal display and manufacturing method thereof
JPH1090700A (en) Liquid crystal element and its manufacture
JP3242017B2 (en) Electrode substrate, method of manufacturing the same, liquid crystal element using the electrode substrate, and method of manufacturing the same

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070320

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091002

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091026

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091209

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100525

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100715

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20101221

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110309

A911 Transfer of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20110315

A912 Removal of reconsideration by examiner before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A912

Effective date: 20110513

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120214

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120403

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150413

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees