JP2001320018A - Semiconductor device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a semiconductor device on an SOI substrate where ESD breakdown prevention and chipping prevention in dicing are carried out. SOLUTION: A pattern for laser trimming positioning consists of high- and low-light reflection factor regions, the high-light reflection factor region is formed by a high-light reflection factor film that is formed on a flat foundation, and the low-light reflection factor region is formed by a lattice, a stripe, or a high-light-reflection-factor film formed on a dot-shaped pattern for performing irregular reflection of light that is composed by the same polycrystalline silicon film as a fuse element for laser trimming. In addition, the fuse element for laser trimming is formed by the polycrystalline silicon film, and a bleeder resistor is formed by a single crystal silicon device formation layer on the SOI substrate.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a semiconductor device having a semiconductor integrated circuit formed on an SOI substrate.

[0002]

2. Description of the Related Art At present, semiconductor integrated circuits formed on SOI substrates are widely known. In particular, a high-speed MOS transistor has excellent characteristics compared to a conventional MOS transistor formed on a silicon substrate by utilizing a fully depleted mode.

On the other hand, in an analog semiconductor integrated circuit device, a laser trimming method for adjusting analog characteristics is known. For example, it is described in JP-A-5-13670. After two-dimensionally patterning an integrated circuit on a semiconductor wafer, electrical characteristics of each integrated circuit are measured in a wafer state. Next, for adjustment of analog characteristics, a fuse element provided on a part of the wiring is selected and cut by laser beam irradiation. With such a laser trimming method, the analog characteristics of the integrated circuit can be adjusted to desired characteristics by selecting the fuse element to be cut. In order to irradiate a predetermined fuse element with a laser beam, a positioning pattern is provided on the bare surface of the semiconductor wafer. FIG. 2A is a plan view of a conventional positioning pattern, FIG. 2B is a cross-sectional view of the conventional positioning pattern, and FIG. It is a figure which shows the light reflection amount change at the time of scanning along a linear direction. Conventional positioning patterns
A first insulating film 102 made of a silicon oxide film and a second insulating film 104 made of a PSG film or the like provided on a silicon substrate 101 are set as outer peripheral portions, and a square aluminum film 105 is arranged inside the first insulating film 102. . When the light beam is scanned along the direction B in FIG. 2A, a light reflection pattern as shown in FIG. 2C is obtained because the reflectance of the aluminum film 105 is high. The positional relationship between the positioning pattern and the fuse element made of the polycrystalline silicon film of the integrated circuit is determined at the time of design. Therefore, the coordinates of a desired fuse element can be calculated by detecting the positioning pattern by light beam irradiation, and the fuse element can be selectively trimmed by irradiating the position with a laser.

[0004]

However, the conventional SOI
In a semiconductor integrated circuit formed on a substrate, especially when a fully depleted mode is to be used, the thickness of a single crystal silicon device forming layer provided on a SOI substrate with a buried oxide film interposed therebetween must be less than about 1000 angstroms. Therefore, it has been difficult to provide a high-breakdown-voltage element or an ESD protection element for preventing ESD destruction (electrostatic destruction) in a thin single-crystal silicon device formation layer.

Further, in a conventional semiconductor integrated circuit formed on an SOI substrate, no consideration is given to scribing, and in the dicing process of cutting out an IC chip, there may be a problem such as cracking or chipping.

On the other hand, it is generally known that a fuse element is formed of a polycrystalline silicon film without being limited to an IC formed on an SOI substrate. In laser trimming, a fuse element and a thin film having a different positioning pattern are known. , Accurate positioning was not possible. That is, when the positioning pattern is detected by the aluminum pattern and the polycrystalline silicon film serving as the fuse element is laser-trimmed, the laser irradiation area 32 is displaced from the fuse element 31 as shown in FIG. Since the energy distribution of the laser irradiation region 32 is a Gaussian distribution, the energy intensity at the laser irradiation end is low. Therefore, in the wafer process, if there is a large misalignment between the patterning of the polycrystalline silicon film and the patterning of the aluminum film, there is a problem that the fuse element cannot be stably cut.
Reference numeral 33 denotes a base kogation, and reference numeral 34 denotes a portion where a fuse cut remains.

In addition, analog ICs such as voltage detectors often use a bleeder resistor composed of a plurality of polycrystalline silicon resistors, but the polycrystalline silicon resistors obtain the same resistance value due to the influence of grains. And it has been a bottleneck for producing a highly accurate analog IC.

An object of the present invention is to provide a high-precision analog I / O circuit in which a fully-depleted high-speed MOS transistor and a high-breakdown-voltage MOS transistor are mixedly mounted on an SOI substrate.
An object of the present invention is to provide a semiconductor device in which C is formed, which is resistant to ESD destruction and in which cracks and the like in a dicing process are prevented.

A further object of the present invention is to reduce the size of the fuse element region and reduce the cost by increasing the positioning accuracy of trimming.

[0010]

In order to solve the above problems, the present invention takes the following measures. (1) In a semiconductor integrated circuit formed on an SOI substrate, the semiconductor integrated circuit includes a laser trimming fuse element, a laser trimming positioning pattern, a fully depleted high-speed MOS transistor, and a high breakdown voltage MOS transistor.
A transistor, an ESD protection element, and a bleeder resistor formed by a plurality of resistors were formed. (2) The laser trimming positioning pattern is composed of a high light reflectivity region and a low light reflectivity region, and the high light reflectivity region is formed by a high light reflectivity film formed on a flat base and has a low light reflectivity. The rate region is formed by a high light reflectivity film formed on a lattice, stripe or dot-like pattern for irregularly reflecting light, which is formed of the same thin film as the fuse element for laser trimming (1).
The described semiconductor device was used. (3) The semiconductor device according to (1), wherein the fuse element for laser trimming is formed of a polycrystalline silicon film. (4) The polycrystalline silicon film forming the fuse element for laser trimming is the same film as the gate electrode of the fully depleted high-speed MOS transistor and the gate electrode of the high breakdown voltage MOS transistor. It was a semiconductor device. (5) A fully depleted high-speed MOS transistor is formed in a single crystal silicon device forming layer, and has a high breakdown voltage type MO transistor.
The semiconductor device according to (1), wherein the S transistor and the ESD protection element are formed on a silicon substrate from which a single-crystal silicon device formation layer on a SOI substrate and a buried oxide film have been removed. (6) The semiconductor device according to (1), wherein the bleeder resistor is formed of a single crystal silicon device forming layer. (7) The semiconductor device according to (1), wherein the single crystal silicon device formation layer and the buried oxide film are removed from the scribe region of the semiconductor integrated circuit.

[0011]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In a semiconductor integrated circuit formed on an SOI substrate, the semiconductor integrated circuit includes a laser trimming fuse element, a laser trimming positioning pattern, a fully depleted high-speed MOS transistor, and a high breakdown voltage. A type MOS transistor, an ESD protection element, and a bleeder resistor formed by a plurality of resistors were formed.

The laser trimming positioning pattern is
It consists of a high light reflectivity area and a low light reflectivity area, the high light reflectivity area is formed by a high light reflectivity film formed on a flat base, and the low light reflectivity area is formed by a laser trimming fuse element. It was formed by a high light reflectivity film formed on a lattice, stripe or dot pattern for irregular reflection of light composed of the same thin film. The laser trimming fuse element and the bleeder resistor are formed of a polycrystalline silicon device forming layer, and the laser trimming fuse element forms a gate electrode of a fully depleted high-speed MOS transistor and a gate electrode of a high breakdown voltage MOS transistor. And the same polycrystalline silicon film.

A fully depleted high-speed MOS transistor is formed in a single-crystal silicon device formation layer, and a high-breakdown-voltage MOS transistor and an ESD protection element are composed of a single-crystal silicon device formation layer and a buried oxide film on an SOI substrate. Was formed on the silicon substrate from which was removed.

Further, in the scribe region of the semiconductor integrated circuit, the single crystal silicon device forming layer and the buried oxide film were removed.

Thus, a semiconductor device in which a high-precision analog IC in which a fully-depleted high-speed MOS transistor and a high-breakdown-voltage MOS transistor are mixedly formed on an SOI substrate is formed. It can be provided in a form in which cracks and cracks of the slab are prevented.

In particular, the laser trimming positioning pattern is composed of a high light reflectance region and a low light reflectance region, and the high light reflectance region is formed by a high light reflectance film formed on a flat base, and has a low light reflectance. The refractive index region is formed by a high light reflectivity film formed on a lattice or stripe or dot-like pattern for diffusely reflecting light which is composed of the same polycrystalline silicon device forming layer as the laser trimming fuse element. . Therefore, the boundary between the high light reflectivity region and the low light reflectivity region, that is, the place where the light reflectivity changes sharply, is defined by the pattern formed by the single crystal silicon device forming layer, which is the same as the laser trimming fuse element. It will be. Thus, laser trimming can be performed accurately without being affected by misalignment in the wafer process.

[0017]

Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic sectional view of a semiconductor device according to the present invention. Each region will be described sequentially with reference to FIG.

First, the fully depleted high-speed MOS transistor region 201 will be described.

A buried oxide film 1 on a silicon substrate 101
The source region 201, the drain region 202, and the channel region 203 are formed in the single crystal silicon device formation layer 103 formed through the gate electrode 02. Further, a gate electrode 205 is disposed above the channel region 203 with a gate oxide film 206 interposed therebetween, forming a MOS transistor. Here, the single crystal silicon device forming layer 1
The film thickness of 03 is, for example, 50 so as to be completely depleted.
It is set to 0 angstroms.

Further, an aluminum film 105 is connected to the source region 201 and the drain region 202 via a contact hole 204 opened in the intermediate insulating film 104 made of a BPSG film or the like. In the high-speed MOS transistor region 201, a protective film 106 made of a silicon nitride film or the like is formed on the uppermost layer.

Here, the potential of the channel region 203 may be floating or fixed in some cases. Further, the source region 201 and the drain region 202
Is preferably formed so that their bottom sides are in contact with the buried oxide film 102 for the purpose of reducing the capacitance. However, the depletion layer is formed to a depth such that the depletion layer is in contact with the buried oxide film 102 when a voltage is applied. It may be separated from 102.

Next, a high breakdown voltage MOS transistor and ES
The D protection circuit region 310 will be described.

The source region 30 is formed on the silicon substrate 101.
1. A drain region 302 and a channel region 303 are formed, and a gate oxide film 30 is formed on the channel region 303.
6, a gate electrode 305 is arranged to form a MOS transistor.

Further, an aluminum film 105 is connected to the source region 301 and the drain region 302 via a contact hole 304 opened in the intermediate insulating film 104 made of a BPSG film or the like. A protection film 106 made of a silicon nitride film or the like is formed in the uppermost layer of the high-voltage MOS transistor and the ESD protection circuit region 310 as in the high-speed MOS transistor region 201.

Here, a high breakdown voltage MOS transistor and E
In the SD protection circuit region 310, unlike the high-speed MOS transistor region 201, the single crystal silicon device formation layer 1
03 and the buried oxide film 102 is removed, and an element is formed directly on the silicon substrate 101. Although not shown, a high breakdown voltage MO suitable for a high operating voltage such as a DDD structure or a LOCOS drain structure is provided.
An S transistor can be easily formed. Further, the gate oxide film 306 may be formed thicker than the gate oxide film 206 in the high-speed MOS transistor region 210. Also ES
Although a D protection circuit is not particularly shown, by forming it on the silicon substrate 101, an off-transistor, a diode, or the like having a heat capacity and a junction area with sufficient resistance to ESD can be formed. .

Next, the bleeder resistance region 410 will be described.

A buried oxide film 1 on a silicon substrate 101
A low-concentration impurity region 402 sandwiched between a pair of high-concentration impurity regions 401 is formed in the single-crystal silicon device formation layer 103 formed through the gate electrode 02, thereby forming a resistor. Although only one is shown here for simplicity,
Actually, a bleeder resistance is formed by a plurality of resistors.

Further, the high-concentration impurity region 401 has BP
The aluminum film 105 is connected via a contact hole 404 opened in the intermediate insulating film 104 made of an SG film or the like. Here, the aluminum film 105 connected to one high-concentration impurity region 401 is disposed so as to cover the low-concentration impurity region 402 that determines the resistance value of the resistor, thereby stabilizing the resistance value.

This is to prevent the resistance value of the resistor from changing due to the potential difference between the conductor close to the resistor and the resistor itself. Aluminum film 10 above resistor
The potential of 5 is not the power supply potential or the ground potential, but the potential of one end of the bleeder resistor. If all of the plurality of resistors forming the bleeder resistor are manufactured in the same manner, the position of the upper portion of each resistor is reduced. There is almost no potential difference between the aluminum film 105 and the resistor itself, and each resistor processed into the same size and shape has the same resistance value. By forming a bleeder resistance circuit using these resistors, highly accurate voltage division is possible.

Further, in the present invention, since the resistor is formed by the single-crystal silicon device forming layer 103 itself, the influence of the grain of the polycrystalline silicon thin film is eliminated as compared with the bleeder resistance of the conventional polycrystalline silicon thin film. And a more uniform resistor can be obtained. Therefore, it is possible to form a more accurate bleeder resistance circuit. Further, since the film thickness of the single crystal silicon device formation layer 103 is as thin as about 500 angstroms for the above-described complete depletion, a change in resistance value with temperature can be reduced.

In this embodiment, a case is described in which a resistor having a high resistance value is formed in which a low-concentration impurity region 402 is provided between a pair of high-concentration impurity regions 401. However, a high resistance value is not required. In use, the entire resistor may be formed of the high-concentration impurity region 401.

In the uppermost layer of the bleeder resistance region 410,
A protection film 106 made of a silicon nitride film or the like is formed.

Next, the fuse region 510 will be described.

A buried oxide film 1 on a silicon substrate 101
A polycrystalline silicon fuse 502 made of a polycrystalline silicon film 503 is formed through the intermediary layer 02.

The polycrystalline silicon fuse 502 is made of a material having a high impurity concentration in order to have good conductivity and to reduce the resistance value as much as possible.

Here, the polysilicon fuse 502 is connected to the gate electrode 20 of the high-speed MOS transistor region 210.
5 and the same film as the gate electrode 305 in the high-breakdown-voltage MOS transistor and the ESD protection circuit region 310 simplifies the manufacturing process.

Both ends of the polycrystalline silicon fuse 501 are connected to the aluminum film 10 through contact holes 504 opened in the intermediate insulating film 104 such as a BPSG film.
5 is connected. The protection film 106 formed of a silicon nitride film or the like formed on the uppermost layer of the fuse region 510 has a portion corresponding to the laser irradiation region 505 removed.
This is because the energy of the laser beam irradiated during laser trimming is absorbed by the protective film 106,
This is to prevent trouble in cutting the polycrystalline silicon fuse 502.

Next, the laser trimming positioning pattern area 610 will be described.

Here, the description will proceed with reference to FIG. 3 in addition to FIG. 3A is a plan view of the positioning pattern of the semiconductor device of the present invention, FIG. 3B is a cross-sectional view of the positioning pattern of the semiconductor device of the present invention, and FIG.
FIG. 7 is a diagram showing a change in the amount of light reflection when a light beam is scanned on the positioning pattern of the semiconductor device of the present invention. The light reflection amount is a value when scanning is performed along the line AA ′ in FIG.

The positioning pattern according to the present invention is shown in FIG.
As shown in (b), the light-reflecting region 106 is composed of a high-light-reflecting region 106 and a low-light-reflecting region 107 inside thereof.

Referring to FIGS. 3A and 3B, the structure of the positioning pattern of the present invention will be described.

A buried oxide film 1 on a silicon substrate 101
02 is formed, and a partially dot-shaped polycrystalline silicon film 503 is formed on the buried oxide film 102. In a region where the polycrystalline silicon film 503 is not formed, the flat buried oxide film 102 is exposed.
An intermediate insulating film 104 made of a BPSG film or the like is formed, and an aluminum film 105 is formed on the intermediate insulating film 104. Aluminum film 10 located above a region where dot-shaped polycrystalline silicon film 503 is formed
The surface of 5 is uneven due to the effect of the pattern of the polycrystalline silicon film 503, and the light applied to this portion is irregularly reflected. Therefore, this region can be used as the low light reflectance region 107. On the other hand, the polycrystalline silicon film 5
Aluminum film 105 on the region where 03 is not formed
Has a flat surface and can be a high light reflectance region 106.

When the light beam is scanned along the direction of the line AA 'in FIG. 3A, the amount of light reflection is, as shown in FIG. 3C, formed by the aluminum film 105 having a flat surface. It is large in the high light reflectivity region 106 to be formed, and small in the low light reflectivity region 107 formed by the aluminum film 105 having the uneven surface. FIG. 3 (a), (b)
In the examples of (c) and (c), the low light reflectance region 107 is formed by utilizing the irregular reflection of light. In order to cause irregular reflection of light, a dot-shaped pattern was formed by the polycrystalline silicon film 503 which is the same thin film as the polycrystalline silicon fuse 502. It is possible to cause irregular reflection of light even in patterns other than dots, such as grids and stripes,
A light reflection pattern as shown in FIG. 3C is obtained.

Since the intermediate insulating film 104 in FIG. 3B is not always necessary, it may be omitted in some cases. Further, instead of the aluminum film 105, a metal material such as tungsten, chromium, or gold may be used as the high light reflectance film.

As described above, the high light reflectance region 106
The boundary between the low-reflectivity region 107 and the polycrystalline silicon film 503 is the same thin film as the polycrystalline silicon fuse 502.
Therefore, it is possible to eliminate the problem of misalignment between the polycrystalline silicon forming the fuse element and the aluminum film forming the positioning pattern, which is a problem of the conventional positioning pattern.

FIG. 4A is a plan view of a positioning pattern according to a second embodiment of the semiconductor device of the present invention.
FIG. 4B is a sectional view of a positioning pattern according to a second embodiment of the semiconductor device of the present invention, and FIG. 4C is a diagram showing a light beam applied to the positioning pattern according to the second embodiment of the semiconductor device of the present invention. FIG. 6 is a diagram illustrating a change in the amount of light reflection when scanning is performed.
The light reflection amount is a value when scanning is performed in the direction of the line CC ′ in FIG. As in the first embodiment shown in FIGS. 3A to 3C, the positioning pattern of the second embodiment of the present invention includes a high light reflectance area 106 and a low light reflectance area 107 inside the high light reflectance area 106. It is composed of

The difference from the first embodiment is that the high light reflectance region 106 is formed by the aluminum film 105 located above the flat polycrystalline silicon film 503. If the high light reflectivity region 106 is formed of a high light reflectivity film on a flat base, it can fulfill its role, and such a configuration is also possible. The other description is replaced by the same reference numerals as in FIGS. 3A to 3C.

FIG. 5A is a plan view of a positioning pattern according to a third embodiment of the semiconductor device of the present invention.
FIG. 5B is a sectional view of a positioning pattern according to a third embodiment of the semiconductor device of the present invention, and FIG. 5C is a diagram showing a light beam applied to the positioning pattern according to the third embodiment of the semiconductor device of the present invention. FIG. 6 is a diagram illustrating a change in the amount of light reflection when scanning is performed.
The light reflection amount is a value when scanning is performed along the line DD ′ in FIG. 5A. The positioning pattern according to the third embodiment of the present invention has a configuration in which a low light reflectance area 107 is arranged outside and a high light reflectance area 106 is arranged inside.
As the positioning pattern, it is sufficient that one of the high light reflectance region 106 and the low light reflectance region 107 is sandwiched between the other regions, as shown in FIGS. 5 (a) to 5 (c). The third embodiment shows a case where the arrangement is opposite to that of the first embodiment shown in FIGS. 3A to 3C, and shows that such a configuration may be adopted. is there. The other description is replaced by the same reference numerals as in FIGS. 3A to 3C.

FIG. 6A is a plan view of a positioning pattern according to a fourth embodiment of the semiconductor device of the present invention.
FIG. 6B is a cross-sectional view of a positioning pattern according to a fourth embodiment of the semiconductor device of the present invention, and FIG. 6C is a diagram showing a light beam applied to the positioning pattern according to the fourth embodiment of the semiconductor device of the present invention. FIG. 6 is a diagram illustrating a change in the amount of light reflection when scanning is performed.
The light reflection amount is a value when scanning is performed along the EE ′ line direction in FIG. The positioning pattern according to the fourth embodiment of the present invention has a configuration in which a low light reflectance area 107 is arranged outside and a high light reflectance area 106 is arranged inside.

Similarly to the description of the third embodiment, the positioning pattern may be such that one of the high light reflectance area 106 and the low light reflectance area 107 is sandwiched between the other areas. The fourth embodiment shown in FIGS. 6 (a) to 6 (c) shows a case where the arrangement is opposite to that of the second embodiment shown in FIGS. 4 (a) to 4 (c). is there. The other description is replaced by the same reference numerals as in FIGS. 3A to 3C.

FIG. 7A is a plan view of a positioning pattern according to a fifth embodiment of the semiconductor device of the present invention.
FIG. 7B is a cross-sectional view of a positioning pattern according to a fifth embodiment of the semiconductor device of the present invention, and FIG. 7C is a diagram showing a light beam applied to the positioning pattern according to the fifth embodiment of the semiconductor device of the present invention. FIG. 6 is a diagram illustrating a change in the amount of light reflection when scanning is performed.
The light reflection amount is a value when scanning is performed along the line FF ′ in FIG. 7A.

In the fifth embodiment of the present invention, the buried oxide film 102 and the dot-like polycrystalline silicon film 503 are
It is formed in a form that matches. Polycrystalline silicon film 503
Since the dots are formed by the composite film of the buried oxide film 102 and the buried oxide film 102, the height of the dots is higher than in the first embodiment, and the height of the dots is higher than the region where the polycrystalline silicon film 503 is formed. Are also larger on the surface of the aluminum film 105 located at the position. For this reason, the light applied to this portion has a greater degree of irregular reflection than in the first embodiment, and the light reflectance is further reduced.

When the light beam is scanned in the direction of the line FF ′ in FIG. 7A, the amount of light reflection is, as shown in FIG. 7C, formed by the aluminum film 105 having a flat surface. It is large in the high light reflectivity region 106 to be formed, and small in the low light reflectivity region 107 formed by the aluminum film 105 having the uneven surface.

Here, since the dots are formed by the composite film of the polycrystalline silicon film 503 and the buried oxide film 102, the height of the dots is high and the light reflectance of the low light reflectance region 107 is further reduced. Therefore, the difference (contrast) between the light reflectance and the high light reflectance region 106 can be made large. This makes it difficult to be disturbed by external factors during positioning by laser scanning, thereby enabling more accurate positioning.

Although the fifth embodiment shows an example in which the dots are raised based on the first embodiment, the heights of the dots are similarly increased for the second to fourth embodiments. It is possible and effective. The same effect can be obtained not only in the dot shape but also in a stripe shape or a lattice shape.

For other explanations, see FIG.
The description is replaced by the same reference numerals as in (c).

FIG. 9 is a plan view of a fuse element laser-trapped using the positioning pattern of the semiconductor device of the present invention. The laser spot 32 can irradiate the center of the fuse element 31.

The semiconductor device of the present invention is very suitable for a semiconductor integrated circuit composed of semiconductor elements having large variations. For example, FIG. 10 is a block diagram of a voltage detection IC including a MOS transistor having a high withstand voltage. MOSIC
Have larger variations in analog characteristics than bipolar ICs. In particular, in the case of high withstand voltage characteristics, variations in analog characteristics are further increased due to a thick gate insulating film. Therefore, in the case of an analog MOSIC, a large fuse element area is required as shown in FIG. By providing ten or more fuse elements, analog characteristics with small variations can be obtained.

By using the positioning pattern of the present invention, the size of the fuse element can be reduced. Further, it is possible to dispose the fuse elements in two or more places by changing the direction in the plane.

The positioning pattern of the present invention can be provided in any of a scribe line, a semiconductor chip, and a TEG chip. When the semiconductor chip is arranged in a scrub line or a TEG chip, there is an effect of reducing the area of the semiconductor chip.

The present invention is suitable for an analog MOSIC, but can also be used for a digital IC. It is also suitable for realizing a high-density analog bipolar IC with very small variations.

In FIGS. 3 to 7 used for describing the laser trimming positioning pattern region 610, the intermediate insulating film 104 is not always necessary, and may be deleted in some cases. Aluminum film 1
Instead of 05, a metal material such as tungsten, chromium, or gold may be used as the high light reflectance film.

Next, the scribe area 801 will be described. In FIG. 1, a portion to be cut off in a later dicing step (a step of cutting out an IC chip) is a scribe region 801. Semiconductor integrated circuit internal area 701
From the end, the scribe area 801 starts. Here, in the scribe region 801, the single crystal silicon device formation layer 103 and the buried oxide film 102 have been removed. Desirably, as shown in FIG. 1, the film such as the intermediate insulating film 104, the aluminum film 105, and the protective film 106 is also removed.

This is because if the scribe region 801 which is a portion to be cut off in the dicing process and the semiconductor integrated circuit internal region 701 are connected by the continuous single-crystal silicon device forming layer 103, a variation in the dicing process causes When a force that causes damage such as cracking, chipping or the like acts, the semiconductor integrated circuit internal region 701 also cracks,
This is to prevent chipping or the like from propagating, destroying an important IC chip, or causing malfunction.

In particular, in the case of an IC fabricated on an SOI substrate, a thin buried oxide film 102 is formed on a silicon substrate 101.
In addition, since the shape has the single-crystal silicon device formation layer 103, the embedded oxide film 102 and the single-crystal silicon device formation layer 103, which are the upper layers, are likely to be cracked or chipped.

It is necessary to prevent the same and continuous films from being left between the scribe region 801 which is a dicing step in the dicing process and the semiconductor integrated circuit internal region 701 to be an IC chip. In particular, for an IC formed on an SOI substrate, as shown in FIG. 1, a scribe region 801 has a single crystal silicon device forming layer 103 and a buried oxide film 1.
02 needs to be removed. More desirably, as shown in FIG. 1, films such as the intermediate insulating film 104, the aluminum film 105, and the protective film 106 may be removed. When it is necessary to form various marks, test patterns, and the like in the scribe area 801, an area from which the corresponding film is once removed is provided between the scribe area 801 and the semiconductor integrated circuit internal area 701. Every
It is preferable that the same film does not continuously bridge the scribe region 801 and the semiconductor integrated circuit internal region 701.

[0067]

According to the present invention, a semiconductor integrated circuit formed on an SOI substrate includes a laser trimming fuse element, a laser trimming positioning pattern, a fully depleted high-speed MOS transistor, and a high breakdown voltage MOS transistor. , An ESD protection element and a bleeder resistor formed by a plurality of resistors.

The laser trimming positioning pattern is
It consists of a high light reflectivity area and a low light reflectivity area, the high light reflectivity area is formed by a high light reflectivity film formed on a flat base, and the low light reflectivity area is formed by a laser trimming fuse element. It was formed by a high light reflectivity film formed on a lattice, stripe or dot pattern for irregular reflection of light composed of the same thin film.

The fuse element for laser trimming and the pattern for laser trimming positioning were formed of a polycrystalline silicon film of the same material as the gate electrode of the fully depleted high-speed MOS transistor and the high breakdown voltage MOS transistor. The bleeder resistance was formed by a single crystal silicon device formation layer.

Further, a fully depleted high-speed MOS transistor is formed in a single crystal silicon device forming layer, and a high withstand voltage type MOS transistor and an ESD protection element are formed by SOI.
It was formed on a silicon substrate from which a single crystal silicon device formation layer and a buried oxide film on the substrate had been removed.

On the other hand, the scribe region of the semiconductor integrated circuit has a structure in which the single crystal silicon device formation layer and the buried oxide film are removed.

As a result, a semiconductor device in which a high-precision analog IC in which a fully-depleted high-speed MOS transistor and a high-breakdown-voltage MOS transistor are mixedly formed on an SOI substrate is formed. It can be provided in a form in which cracks and cracks of the slab are prevented.

In particular, the laser trimming positioning pattern comprises a high light reflectance region and a low light reflectance region, and the high light reflectance region is formed by a high light reflectance film formed on a flat base, and has a low light reflectance. The rate region was formed by a high light reflectance film formed on a lattice, stripe or dot-like pattern for irregularly reflecting light, which is composed of the same thin film as the fuse element for laser trimming. Therefore, the boundary between the high light reflectivity region and the low light reflectivity region, that is, the place where the light reflectivity changes steeply is defined by the pattern formed of the same polycrystalline silicon film as the laser trimming fuse element. . Thus, laser trimming can be performed accurately without being affected by misalignment in the wafer process.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view of a semiconductor device of the present invention.

2A is a plan view of a positioning pattern of the conventional semiconductor device, FIG. 2B is a cross-sectional view of the positioning pattern of the conventional semiconductor device, and FIG. a)
FIG. 7 is a diagram showing the amount of light reflection along the line BB ′ of FIG.

3A is a plan view of a positioning pattern of a first embodiment of the semiconductor device of the present invention, and FIG. 3B is a plan view of a positioning pattern of the first embodiment of the semiconductor device of the present invention; FIG. 3C is a diagram showing the amount of light reflection along the line AA ′ in FIG. 3A.

4A is a plan view of a positioning pattern according to a second embodiment of the semiconductor device of the present invention, and FIG. 4B is a plan view of a positioning pattern according to the second embodiment of the semiconductor device of the present invention; 4C is a cross-sectional view, and FIG. 4C is a diagram showing a light reflection amount along a line CC ′ in FIG.

FIG. 5A is a plan view of a positioning pattern of a third embodiment of the semiconductor device of the present invention, and FIG. 5B is a plan view of a positioning pattern of the third embodiment of the semiconductor device of the present invention; FIG. 5C is a diagram showing the amount of light reflection along the line DD ′ in FIG. 5A.

FIG. 6A is a plan view of a positioning pattern of a semiconductor device according to a fourth embodiment of the present invention, and FIG. 6B is a plan view of a positioning pattern of the fourth embodiment of the semiconductor device of the present invention. FIG. 7C is a diagram showing the amount of light reflection along the line EE ′ in FIG. 6A.

FIG. 7A is a plan view of a positioning pattern of a fifth embodiment of the semiconductor device of the present invention, and FIG. 7B is a plan view of the positioning pattern of the fifth embodiment of the semiconductor device of the present invention. FIG. 7C is a diagram showing the amount of light reflection along the line FF ′ in FIG. 7A.

FIG. 8 is a plan view of a fuse element of a conventional semiconductor device.

FIG. 9 is a plan view of a fuse element of the semiconductor device of the present invention.

FIG. 10 is a block diagram of a semiconductor device of the present invention. REFERENCE SIGNS LIST 31 fuse element 32 laser irradiation spot area 33 area where base burns 34 remaining part of fuse cut 101 silicon substrate 102 buried oxide film 103 single crystal silicon device formation layer 104 intermediate insulating film 105 aluminum film 106 high light reflectance region 107 low Light reflectivity region 201 Source region 202 Drain region 203 Channel region 204 Contact hole 205 Gate electrode 206 Gate oxide film 210 High speed MOS transistor region 301 Source region 302 Drain region 303 Channel region 304 Contact hole 305 Gate electrode 306 Gate oxide film 310 High breakdown voltage MOS transistor and ESD protection circuit region 401 High concentration impurity region 402 Low concentration impurity region 404 Contact hole 410 Bleeder Resistance region 502 polysilicon fuse 503 polycrystalline silicon film 504 a contact hole 505 laser radiation region 510 fuse region 610 laser trimming positioning pattern region 701 a semiconductor integrated circuit internal region 801 scribe region

──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI theme coat ゛ (Reference) H01L 27/12 H01L 27/08 311B 29/78 29/78 301K 29/786 613Z 21/336 627A F-term ( Reference) 5F038 AR01 AR09 AR21 AR26 AV03 BH07 CA13 DF01 DF12 EZ06 EZ20 5F040 DA01 DA23 DB01 DB06 DB10 DC01 EB12 ED09 EF13 EL01 EL03 EL04 EL06 5F048 AA02 AA05 AC01 AC10 BA09 BA16 BB16 BC07 BF02 CC04 CC06 CC18 DD22 CC02 DD02 GG12 GG25 HL03 NN01 NN02 NN22 NN24 NN71 NN74 QQ30

Claims (7)

[Claims] 1. A semiconductor integrated circuit formed on an SOI substrate, wherein the semiconductor integrated circuit includes a laser trimming fuse element, a laser trimming positioning pattern, a fully depleted high-speed MOS transistor, and a high withstand voltage type. A semiconductor device comprising: a MOS transistor; an ESD protection element; and a bleeder resistor formed by a plurality of resistors. 2. The laser trimming positioning pattern includes a high light reflectivity region and a low light reflectivity region, and the high light reflectivity region is formed by a high light reflectivity film formed on a flat base. The low light reflectivity region is formed by the high light reflectivity film formed on a lattice or stripe or dot-like pattern for diffusely reflecting light which is formed of the same thin film as the laser trimming fuse element. The semiconductor device according to claim 1, wherein: 3. The semiconductor device according to claim 1, wherein said laser trimming fuse element is formed of a polycrystalline silicon film. 4. The polycrystalline silicon film forming the laser trimming fuse element is the same film as the gate electrode of the fully depleted high-speed MOS transistor and the gate electrode of the high breakdown voltage MOS transistor. The semiconductor device according to claim 1, wherein: 5. The fully depleted high-speed MOS transistor is formed in the single crystal silicon device formation layer, and the high withstand voltage MOS transistor and an ESD protection element are connected to the single crystal on the SOI substrate. 2. The semiconductor device according to claim 1, wherein the semiconductor device is formed on a silicon substrate from which a silicon device formation layer and a buried oxide film have been removed. 6. The semiconductor device according to claim 1, wherein said bleeder resistor is formed of said single crystal silicon device forming layer. 7. The semiconductor device according to claim 1, wherein the scribe region of the semiconductor integrated circuit has the single crystal silicon device formation layer and the buried oxide film removed.