JP2001319850A5 - - Google Patents
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- Publication number
- JP2001319850A5 JP2001319850A5 JP2000135229A JP2000135229A JP2001319850A5 JP 2001319850 A5 JP2001319850 A5 JP 2001319850A5 JP 2000135229 A JP2000135229 A JP 2000135229A JP 2000135229 A JP2000135229 A JP 2000135229A JP 2001319850 A5 JP2001319850 A5 JP 2001319850A5
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- JP
- Japan
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000135229A JP2001319850A (en) | 2000-05-08 | 2000-05-08 | Liquid processing method, liquid processing device, and thin film formation system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000135229A JP2001319850A (en) | 2000-05-08 | 2000-05-08 | Liquid processing method, liquid processing device, and thin film formation system |
Publications (2)
Publication Number | Publication Date |
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JP2001319850A JP2001319850A (en) | 2001-11-16 |
JP2001319850A5 true JP2001319850A5 (en) | 2007-06-21 |
Family
ID=18643345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000135229A Withdrawn JP2001319850A (en) | 2000-05-08 | 2000-05-08 | Liquid processing method, liquid processing device, and thin film formation system |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001319850A (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008153450A (en) * | 2006-12-18 | 2008-07-03 | Tokyo Electron Ltd | Coating-film processing method and apparatus |
JP5025508B2 (en) | 2008-01-30 | 2012-09-12 | 東京エレクトロン株式会社 | Method for removing polysilicon film and storage medium |
JP5184476B2 (en) | 2009-09-17 | 2013-04-17 | 東京エレクトロン株式会社 | Substrate liquid processing method, substrate liquid processing apparatus, and storage medium |
JP5848004B2 (en) * | 2010-12-24 | 2016-01-27 | 北沢産業株式会社 | Cooking pot cleaning equipment |
JP5528486B2 (en) * | 2012-02-07 | 2014-06-25 | 東京エレクトロン株式会社 | Substrate processing apparatus, coating and developing apparatus including the same, and substrate processing method |
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2000
- 2000-05-08 JP JP2000135229A patent/JP2001319850A/en not_active Withdrawn