JP2001314979A - Method for producing ceramics and copper clad material - Google Patents
Method for producing ceramics and copper clad materialInfo
- Publication number
- JP2001314979A JP2001314979A JP2000131112A JP2000131112A JP2001314979A JP 2001314979 A JP2001314979 A JP 2001314979A JP 2000131112 A JP2000131112 A JP 2000131112A JP 2000131112 A JP2000131112 A JP 2000131112A JP 2001314979 A JP2001314979 A JP 2001314979A
- Authority
- JP
- Japan
- Prior art keywords
- ceramics
- copper
- amorphous alloy
- clad material
- melting point
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、セラミックスと銅
からなるクラッド材の製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a clad material composed of ceramics and copper.
【0002】[0002]
【従来の技術】セラミックスは各種の特徴を有し、広く
工業材料として使用されているが、機械加工性に劣り、
精密な加工を要する用途にはそれほど普及していない。
このセラミックスの加工性を補うために、良好な加工性
を有する金属を張り合わせることが考案されている。そ
して、これまでのところ蒸着などの金属を気相状態で付
着させることが可能となっている。2. Description of the Related Art Ceramics have various characteristics and are widely used as industrial materials, but have poor machinability,
It is not widely used for applications requiring precise processing.
In order to supplement the workability of this ceramic, it has been devised to bond a metal having good workability. So far, metal such as vapor deposition can be deposited in a gaseous state.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、上述の
方法では極めて薄く、例えば1mm以上に厚く金属を張
り合わせることが不可能であり、加工量が大きい分野へ
の応用は困難であった。本発明は、上記のような問題を
解決するために考案されたものであり、例えば1mm以
上の厚い金属とでもセラミックスに張り合わせることを
可能とし、十分な接合強度を有するクラッド材を製造可
能にすることを目的とする。However, in the above-mentioned method, it is impossible to bond a metal very thin, for example, to a thickness of 1 mm or more, and it has been difficult to apply the method to a field having a large processing amount. The present invention has been conceived in order to solve the above-mentioned problems, and for example, it has become possible to bond a thick metal of 1 mm or more to ceramics, and to produce a clad material having a sufficient bonding strength. The purpose is to do.
【0004】[0004]
【課題を解決するための手段】上記課題を解決するため
の本発明の要旨は、次の通りである。 (1)セラミックスと銅との間に、Ti,Zr,Hfの
うち少なくとも1種を10〜50at%含有し、残部がC
uおよび不可避的不純物からなるアモルファス合金を介
在させて、用いるアモルファス合金の融点以上、かつ該
銅の融点以下の温度で、3分以上2時間以下の範囲内加
熱することを特徴とするセラミックスと銅のクラッド材
製造方法。 (2)セラミックスと銅との間に、Ti,Zr,Hfの
うち少なくとも1種を10〜50at%含有し、かつV,
Nb,Cr,Mo,Mn,Niのうち少なくとも1種を
0.1〜10at%含有し、残部がCuおよび不可避的不
純物からなるアモルファス合金を介在させて、用いるア
モルファス合金の融点以上、かつ該銅の融点以下の温度
で、3分以上2時間以下の範囲内加熱することを特徴と
するセラミックスと銅のクラッド材製造方法。The gist of the present invention for solving the above problems is as follows. (1) Between ceramics and copper, at least one of Ti, Zr, and Hf is contained in an amount of 10 to 50 at%, and the balance is C
ceramics and copper which are heated at a temperature not lower than the melting point of the amorphous alloy to be used and not higher than the melting point of the copper for a period of not less than 3 minutes and not more than 2 hours by interposing an amorphous alloy comprising u and unavoidable impurities. Manufacturing method of clad material. (2) At least one of Ti, Zr, and Hf is contained between 10 and 50 at% between ceramics and copper;
It contains at least one of Nb, Cr, Mo, Mn, and Ni in an amount of 0.1 to 10 at%, and the balance is at least the melting point of the amorphous alloy used, A method for manufacturing a clad material of ceramics and copper, wherein the heating is performed at a temperature of not more than the melting point of not more than 3 minutes and not more than 2 hours.
【0005】[0005]
【発明の実施の形態】本発明の方法は、セラミックスに
張り合わせる金属として銅を採用し、かつ中間材として
所定のアモルファス合金をセラミックスと銅の間に介在
させて積層し、この積層材を加熱してアモルファス合金
だけを溶融させて液相拡散接合させることによりクラッ
ド材とする方法で、このようなクラッド材を製造するこ
とにより、セラミックスに厚い金属を張り合わせること
を実現させる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of the present invention employs copper as a metal to be bonded to ceramics, laminates a predetermined amorphous alloy as an intermediate material between ceramics and copper, and heats the laminated material. Then, only the amorphous alloy is melted and liquid-phase diffusion-bonded to form a clad material. By manufacturing such a clad material, it is possible to bond a thick metal to ceramics.
【0006】アモルファス合金による液相拡散接合を実
現するためには、セラミックと銅からなる該積層材を加
熱し、アモルファス合金が溶ける温度以上に加熱する必
要がある。但し、加熱温度はセラミックスと銅のいずれ
もが溶解しないようにするために、低い融点側である銅
の融点を加熱温度の上限とする。In order to realize liquid phase diffusion bonding using an amorphous alloy, it is necessary to heat the laminated material composed of ceramic and copper to a temperature higher than the melting temperature of the amorphous alloy. However, in order to prevent both ceramics and copper from melting, the heating temperature is set to the upper limit of the heating temperature at the lower melting point of copper.
【0007】さらに、十分な強度を有する液相拡散接合
を得るためには、上記加熱温度の領域においてある程度
保持する必要がある。アモルファス合金による液相拡散
接合は、アモルファス合金中の溶質元素が被接合材中に
拡散し、アモルファス合金自体の融点が上昇して凝固を
起こすことにより接合が発現するため、溶質元素の拡散
にある程度の時間を要するからである。本発明において
は、この時間を3分以上2時間以下とする。Further, in order to obtain a liquid-phase diffusion bond having a sufficient strength, it is necessary to maintain the above-mentioned heating temperature to some extent. In liquid phase diffusion bonding using an amorphous alloy, since the solute element in the amorphous alloy diffuses into the material to be joined and the melting point of the amorphous alloy itself increases to cause solidification, the bonding is developed. This is because it takes time. In the present invention, this time is set to 3 minutes or more and 2 hours or less.
【0008】この保持時間限定の理由について説明する
と、保持温度が高いほど保持時間を短くできるが、安定
した接合強度を得るには最低でも3分は必要である。逆
に、保持時間は長くする程良いが、過度の保持時間は時
間、製造コストの点から不利である。その点本発明で用
いるアモルファス合金の場合は、融点直上の温度で保持
したとしても2時間保持すれば充分である。[0008] The reason for the limitation of the holding time will be explained. The higher the holding temperature, the shorter the holding time, but at least 3 minutes are required to obtain a stable bonding strength. Conversely, a longer holding time is better, but an excessive holding time is disadvantageous in terms of time and manufacturing cost. In this regard, in the case of the amorphous alloy used in the present invention, it is sufficient to hold for 2 hours even if the temperature is held just above the melting point.
【0009】本発明において中間材として用いるアモル
ファス合金は、Ti,Zr,Hfのうち少なくとも1種
を10〜50at%含有し、又はそれらの合金に加えて
V,Nb,Cr,Mo,Mn,Niのうち少なくとも1
種を0.1〜10at%含有し、残部がCuおよび不可避
的不純物からなるアモルファス合金である。ここで、残
部をCuとしたのは、アモルファス形成及び接合強度を
得るためであり、不可避的不純物とはごく微量のFeや
窒素、酸素等のガス成分等である。これらのアモルファ
ス合金を用いることにより、安定して充分な接合強度が
得られる。The amorphous alloy used as the intermediate material in the present invention contains at least one of Ti, Zr, and Hf in an amount of 10 to 50 at%, or contains V, Nb, Cr, Mo, Mn, and Ni in addition to the alloy. At least one of
It is an amorphous alloy containing 0.1 to 10 at% of a seed, the balance being Cu and unavoidable impurities. Here, the remainder is made of Cu in order to obtain amorphous formation and bonding strength, and unavoidable impurities are trace amounts of gas components such as Fe, nitrogen, and oxygen. By using these amorphous alloys, a sufficient bonding strength can be obtained stably.
【0010】これらの合金において、それぞれの構成元
素の含有量を限定した理由は、以下の通りである。基本
的に液相拡散接合に用いる中間材は融点が低く、均一な
組成であることが望ましいから、本発明においてはアモ
ルファス合金を用いることが好ましい。よって、Ti,
Zr,Hfのうち少なくとも1種の含有量を10〜50
at%の範囲とした。また、アモルファス合金の融点は合
金成分によるが、このアモルファス合金の一層の低融点
化はV,Nb,Mo,Mn,Niのうち少なくとも1種
を0.1〜10at%の範囲で含有することで達成でき
る。The reasons for limiting the content of each constituent element in these alloys are as follows. Basically, it is desirable that the intermediate material used for the liquid phase diffusion bonding has a low melting point and a uniform composition. Therefore, in the present invention, it is preferable to use an amorphous alloy. Therefore, Ti,
The content of at least one of Zr and Hf is adjusted to 10 to 50.
At% range. Although the melting point of the amorphous alloy depends on the alloy components, the melting point of the amorphous alloy can be further reduced by containing at least one of V, Nb, Mo, Mn, and Ni in the range of 0.1 to 10 at%. Can be achieved.
【0011】このようなアモルファス合金を用いれば、
セラミックスと銅を液相拡散接合により、各種機械加工
に十分耐えられる程の高い接合強度を有するクラッド材
が製造でき、セラミックスに厚い金属を張り合わせるこ
とが可能となる。銅の厚さは任意に変えられるから、任
意の厚さの金属をセラミックスに張り合わせることがで
きる。When such an amorphous alloy is used,
By liquid phase diffusion bonding of ceramics and copper, a clad material having high bonding strength enough to withstand various types of machining can be manufactured, and a thick metal can be bonded to ceramics. Since the thickness of copper can be changed arbitrarily, a metal having an arbitrary thickness can be bonded to ceramics.
【0012】また、セラミックスと銅からなる積層材を
本発明の加熱条件範囲で保持する際は、10kPa程度
以上の加圧をすることが好ましい。もちろん、この程度
の加圧は母材の自重によっても実現できる。アモルファ
ス合金中の溶質元素が拡散するためには、被接合材同士
が接触していなければならず、これを実現するためには
ある程度の加圧が必要なためである。Further, when holding the laminated material composed of ceramics and copper in the heating condition range of the present invention, it is preferable to apply a pressure of about 10 kPa or more. Of course, this degree of pressure can also be achieved by the weight of the base material. This is because the materials to be joined must be in contact with each other in order for the solute element in the amorphous alloy to diffuse, and a certain degree of pressurization is required to realize this.
【0013】なお、本発明の方法によれば、セラミック
スおよび銅は板形状の他、管や任意の形状とすることが
でき、その表面形状に合わせた形状の両者を、アモルフ
ァス合金を介在させて液相拡散接合できる。しかも、得
られたクラッド材は強固な接合強度を有し、そのままの
形状で製品とすることができる。According to the method of the present invention, the ceramics and copper can be formed in a tube or any other shape in addition to the plate shape. Liquid phase diffusion bonding is possible. Moreover, the obtained clad material has strong bonding strength, and can be used as a product in the same shape.
【0014】本発明の方法において加熱は大気中で行う
ことができ、従来のような真空排気装置や非酸化性雰囲
気とするための雰囲気調整装置を有しない汎用の加熱装
置を使用できる。さらに、本発明の方法で用いるセラミ
ックスとしては、アルミナやマグネシア、さらには窒化
珪素などの各種定形型セラミックスを使用できる。In the method of the present invention, heating can be performed in the air, and a general-purpose heating device without a conventional vacuum exhaust device or an atmosphere adjusting device for providing a non-oxidizing atmosphere can be used. Further, as the ceramic used in the method of the present invention, various fixed ceramics such as alumina, magnesia, and silicon nitride can be used.
【0015】[0015]
【実施例】(実施例1)径30mm、長さ50mmの丸
棒形状のアルミナ1本と径30mm、長さ100mmの
丸棒形状の純銅2本を用い、図1のようにアルミナを中
央に上下に純銅を突き合わせ、アルミナと純銅との2ヶ
所の突き合わせ部に、中間材として表1中のNo.1〜
6に示すアモルファス合金箔を介在させて、2ヶ所の突
き合わせ部を加熱した。突き合わせ時の圧力は5MPa
とした。また、加熱は図1に示すように高周波誘導方式
により、大気中で行った。加熱時の昇温速度は約5℃/
分で、所定の温度まで加熱し、該温度で所定時間保持し
た後、放冷してクラッド材とした。なお、保持温度およ
び保持時間を併せて表1に示す。EXAMPLE 1 One round bar-shaped alumina having a diameter of 30 mm and a length of 50 mm and two pure coppers having a diameter of 30 mm and a length of 100 mm were used. As shown in FIG. Pure copper was butted up and down, and No. 1 in Table 1 was used as an intermediate material at two butted portions of alumina and pure copper. 1 to
The two butted portions were heated with the amorphous alloy foil shown in FIG. 6 interposed. The pressure during butting is 5MPa
And The heating was performed in the air by a high frequency induction method as shown in FIG. The heating rate during heating is about 5 ° C /
In a minute, the material was heated to a predetermined temperature, kept at that temperature for a predetermined time, and then allowed to cool to obtain a clad material. Table 1 also shows the holding temperature and the holding time.
【0016】得られたクラッド材について、インストロ
ン方式の引張試験機により引張試験を行った。得られた
結果を表1に示すが、すべてのサンプルともアルミナに
おける母材破断で、その強度は20MPa程度であっ
た。本発明の方法により、高い接合強度を示すクラッド
材が得られることがわかった。The obtained clad material was subjected to a tensile test using an Instron type tensile tester. The obtained results are shown in Table 1. All the samples were found to have a base material fracture in alumina, and the strength was about 20 MPa. It has been found that a clad material having high bonding strength can be obtained by the method of the present invention.
【0017】[0017]
【表1】 [Table 1]
【0018】(実施例2)径30mm、長さ50mmの
丸棒形状の窒化珪素1本と径30mm、長さ100mm
の丸棒形状の純銅2本を用い、実施例−1と同様の条件
で接合実験を行った。中間材としては、表1中のNo.
7〜12に示すアモルファス合金を用いた。得られたク
ラッド材について、実施例1と同様の方法で引張試験を
行った。その結果を表1に示すが、全てのサンプルとも
窒化珪素における母材破断であり、その強度は15MP
a程度であった。本発明の方法により、高い接合強度を
示すクラッド材が得られることがわかった。Example 2 One round bar-shaped silicon nitride having a diameter of 30 mm and a length of 50 mm and a diameter of 30 mm and a length of 100 mm
A bonding experiment was performed under the same conditions as in Example 1 using two round bar-shaped pure coppers. No. in Table 1 was used as the intermediate material.
The amorphous alloys 7 to 12 were used. The obtained clad material was subjected to a tensile test in the same manner as in Example 1. The results are shown in Table 1. As shown in Table 1, all the samples were fractured in the base material in silicon nitride, and the strength was 15MPa.
a. It has been found that a clad material having high bonding strength can be obtained by the method of the present invention.
【0019】[0019]
【発明の効果】本発明の方法によれば、厚い金属を張り
付けたセラミックスを安価かつ容易に製造可能になる。According to the method of the present invention, ceramics on which a thick metal is adhered can be manufactured at low cost and easily.
【図1】本発明法の例を示す斜視図である。FIG. 1 is a perspective view showing an example of the method of the present invention.
1:セラミックス 2:銅 3:中間材 4:加熱用コイル 1: Ceramics 2: Copper 3: Intermediate material 4: Heating coil
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C04B 37/02 C04B 37/02 B // B23K 35/30 310 B23K 35/30 310C Fターム(参考) 4E067 AA07 AA18 AB04 AC03 AD03 BA05 DC03 DC06 EB11 EC05 4G026 BA03 BB22 BF38 BF42 BG06 BG22 BG30 BH01 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C04B 37/02 C04B 37/02 B // B23K 35/30 310 B23K 35/30 310C F-term (reference) 4E067 AA07 AA18 AB04 AC03 AD03 BA05 DC03 DC06 EB11 EC05 4G026 BA03 BB22 BF38 BF42 BG06 BG22 BG30 BH01
Claims (2)
r,Hfのうち少なくとも1種を10〜50at%含有
し、残部がCuおよび不可避的不純物からなるアモルフ
ァス合金を介在させて、用いるアモルファス合金の融点
以上、かつ該銅の融点以下の温度で、3分以上2時間以
下の範囲内加熱することを特徴とするセラミックスと銅
のクラッド材製造方法。1. Ti, Z between ceramics and copper
At least one of r and Hf is contained in an amount of 10 to 50 at%, and the remainder is formed by interposing an amorphous alloy containing Cu and unavoidable impurities at a temperature not lower than the melting point of the amorphous alloy to be used and not higher than the melting point of copper. A method for producing a clad material of ceramics and copper, wherein heating is performed within a range of not less than minutes and not more than 2 hours.
r,Hfのうち少なくとも1種を10〜50at%含有
し、かつV,Nb,Cr,Mo,Mn,Niのうち少な
くとも1種を0.1〜10at%含有し、残部がCuおよ
び不可避的不純物からなるアモルファス合金を介在させ
て、用いるアモルファス合金の融点以上、かつ該銅の融
点以下の温度で、3分以上2時間以下の範囲内加熱する
ことを特徴とするセラミックスと銅のクラッド材製造方
法。2. Ti, Z between ceramics and copper
At least one of r and Hf is contained at 10 to 50 at%, and at least one of V, Nb, Cr, Mo, Mn and Ni is contained at 0.1 to 10 at%, and the balance is Cu and unavoidable impurities. A method for producing a clad material of ceramics and copper, comprising heating at a temperature not lower than the melting point of the amorphous alloy to be used and not higher than the melting point of the copper for 3 minutes to 2 hours with an amorphous alloy comprising .
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JP2000131112A JP4414556B2 (en) | 2000-04-28 | 2000-04-28 | Manufacturing method of clad material of ceramic and copper |
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JP2001314979A true JP2001314979A (en) | 2001-11-13 |
JP4414556B2 JP4414556B2 (en) | 2010-02-10 |
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ID=18640072
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010184283A (en) * | 2009-02-13 | 2010-08-26 | Nissan Motor Co Ltd | Joining method and joining structure for aluminum base material |
JP2010184284A (en) * | 2009-02-13 | 2010-08-26 | Nissan Motor Co Ltd | Method and structure for joining aluminum base material |
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CN102825354B (en) * | 2012-09-20 | 2015-08-05 | 北京科技大学 | A kind of C fcompound-the diffusion soldering method of/SiC ceramic based composites and titanium alloy |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2010184283A (en) * | 2009-02-13 | 2010-08-26 | Nissan Motor Co Ltd | Joining method and joining structure for aluminum base material |
JP2010184284A (en) * | 2009-02-13 | 2010-08-26 | Nissan Motor Co Ltd | Method and structure for joining aluminum base material |
CN107442922A (en) * | 2017-09-18 | 2017-12-08 | 上海航天精密机械研究所 | A kind of method that connecting dissimilar material is spread using amorphous intermediate layer |
CN107442922B (en) * | 2017-09-18 | 2020-10-09 | 上海航天精密机械研究所 | Method for diffusion bonding of dissimilar materials by using amorphous interlayer |
Also Published As
Publication number | Publication date |
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JP4414556B2 (en) | 2010-02-10 |
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