JP2001300453A5 - - Google Patents

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Publication number
JP2001300453A5
JP2001300453A5 JP2000120015A JP2000120015A JP2001300453A5 JP 2001300453 A5 JP2001300453 A5 JP 2001300453A5 JP 2000120015 A JP2000120015 A JP 2000120015A JP 2000120015 A JP2000120015 A JP 2000120015A JP 2001300453 A5 JP2001300453 A5 JP 2001300453A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000120015A
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Japanese (ja)
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JP2001300453A (ja
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Publication date
Application filed filed Critical
Priority to JP2000120015A priority Critical patent/JP2001300453A/ja
Priority claimed from JP2000120015A external-priority patent/JP2001300453A/ja
Publication of JP2001300453A publication Critical patent/JP2001300453A/ja
Publication of JP2001300453A5 publication Critical patent/JP2001300453A5/ja
Pending legal-status Critical Current

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JP2000120015A 2000-04-20 2000-04-20 物品表面の洗浄方法と洗浄装置、およびこれらによる光学素子の製造方法と装置、並びに光学系、露光方法、露光装置、デバイス製造方法 Pending JP2001300453A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000120015A JP2001300453A (ja) 2000-04-20 2000-04-20 物品表面の洗浄方法と洗浄装置、およびこれらによる光学素子の製造方法と装置、並びに光学系、露光方法、露光装置、デバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000120015A JP2001300453A (ja) 2000-04-20 2000-04-20 物品表面の洗浄方法と洗浄装置、およびこれらによる光学素子の製造方法と装置、並びに光学系、露光方法、露光装置、デバイス製造方法

Publications (2)

Publication Number Publication Date
JP2001300453A JP2001300453A (ja) 2001-10-30
JP2001300453A5 true JP2001300453A5 (enrdf_load_stackoverflow) 2007-06-14

Family

ID=18630905

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000120015A Pending JP2001300453A (ja) 2000-04-20 2000-04-20 物品表面の洗浄方法と洗浄装置、およびこれらによる光学素子の製造方法と装置、並びに光学系、露光方法、露光装置、デバイス製造方法

Country Status (1)

Country Link
JP (1) JP2001300453A (enrdf_load_stackoverflow)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI518742B (zh) * 2003-05-23 2016-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US8317929B2 (en) * 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
KR20090081029A (ko) * 2006-12-08 2009-07-27 캐논 가부시끼가이샤 노광장치
CN102804070B (zh) * 2009-06-23 2016-06-08 Asml荷兰有限公司 光刻设备和器件制造方法
JP5429866B2 (ja) * 2009-09-18 2014-02-26 ヒューグルエレクトロニクス株式会社 除塵システム
JP2012211951A (ja) * 2011-03-30 2012-11-01 Shin Etsu Chem Co Ltd フォトマスク関連基板の洗浄方法及び洗浄装置
JP6214441B2 (ja) * 2014-03-18 2017-10-18 株式会社ニューフレアテクノロジー 偏向器用クリーニング装置及び偏向器のクリーニング方法
JP7038004B2 (ja) * 2018-05-24 2022-03-17 本田技研工業株式会社 光学部品の洗浄方法及び洗浄装置
CN108816963B (zh) * 2018-08-01 2024-02-06 中山普宏光电科技有限公司 一种紫外光和紫外激光双光源清洗设备
CN116959958B (zh) * 2023-07-31 2024-10-01 苏州亚信华电子科技有限公司 一种半导体激光清洗机

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