JP2001297628A - Electrically conductive paste and ceramic electronic component - Google Patents

Electrically conductive paste and ceramic electronic component

Info

Publication number
JP2001297628A
JP2001297628A JP2001018636A JP2001018636A JP2001297628A JP 2001297628 A JP2001297628 A JP 2001297628A JP 2001018636 A JP2001018636 A JP 2001018636A JP 2001018636 A JP2001018636 A JP 2001018636A JP 2001297628 A JP2001297628 A JP 2001297628A
Authority
JP
Japan
Prior art keywords
glass
external electrode
conductive paste
ceramic
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001018636A
Other languages
Japanese (ja)
Inventor
Toshiki Nagamoto
才規 永元
Kunihiko Hamada
邦彦 浜田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to JP2001018636A priority Critical patent/JP2001297628A/en
Publication of JP2001297628A publication Critical patent/JP2001297628A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide an electrically conductive paste and ceramic electronic component, in which the strength of connection between an external electrode and a ceramic element assembly and an adhesion of metal plating are secured, and an adhesion among electronic components can be prevented. SOLUTION: In an electrically conductive paste and ceramic electronic component an electrically conductive powder including Ag, glass powder, and an organic vehicle are included, and substantially, the alkaline earth metals and lead are not contained. In the glass powder, alkaline metal oxide, boron oxide, silicon dioxide, zinc oxide, and aluminum oxide are included and when each of them are expressed as M2O (M is at least one of the kinds selected from among Li, Na, K, Rb, Cs, and Fr), B2O3, SiO2, ZnO, and Al2O3, the range with respect to a glass composition of 100 weight % are in the range 5<=M2O<=12, 35<=B2O3<=45, 10<=SiO2<=20, 35<=ZnO<=45, and 1<=Al2O3<=5 (in weight %).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、導電性ペーストお
よびセラミック電子部品に関し、特に、積層セラミック
コンデンサの外部電極を形成するために用いられる導電
性ペースト、およびこれを用いて外部電極を形成した積
層セラミックコンデンサに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive paste and a ceramic electronic component, and more particularly, to a conductive paste used for forming external electrodes of a multilayer ceramic capacitor, and a laminate using the same to form external electrodes. It relates to a ceramic capacitor.

【0002】[0002]

【従来の技術】従来のセラミック電子部品、例えば積層
型のセラミック電子部品は、セラミック素体と、セラミ
ック素体の両端面に形成された外部電極とからなる。セ
ラミック素体は、複数のセラミック層が積層されてな
り、内部電極を備えるセラミック電子部品にあっては、
それぞれの端縁がセラミック層の何れかの端面に露出す
るようにセラミック層間に形成された複数の内部電極を
備え、外部電極は内部電極の露出した端縁を介して内部
電極と電気的に接続されている。
2. Description of the Related Art A conventional ceramic electronic component, for example, a laminated ceramic electronic component, comprises a ceramic body and external electrodes formed on both end surfaces of the ceramic body. The ceramic body is formed by laminating a plurality of ceramic layers, and in a ceramic electronic component having internal electrodes,
A plurality of internal electrodes are formed between the ceramic layers such that each edge is exposed at any one end surface of the ceramic layer, and the external electrodes are electrically connected to the internal electrodes via the exposed edges of the internal electrodes. Have been.

【0003】厚膜からなる外部電極の場合、導電性ペー
ストが用いられる。この導電性ペーストは、例えばA
g,Ag/Pd等からなる導電性粉末とガラスフリット
が、有機バインダーと有機溶剤とからなる有機ビヒクル
中に分散されてなり、セラミック素体の端面に浸漬塗布
して乾燥させ焼成することにより外部電極が形成され
る。
In the case of a thick film external electrode, a conductive paste is used. This conductive paste is, for example, A
g, Ag / Pd, etc., and a glass frit are dispersed in an organic vehicle comprising an organic binder and an organic solvent, and are applied to the end surface of the ceramic body by dip coating, drying and firing to obtain an external component. An electrode is formed.

【0004】さらに、外部電極の半田濡れ性や半田耐熱
性を向上させる目的で、導電性ペーストからなる外部電
極上にNiめっきを、さらにその上にSnめっきあるい
はNiめっき等の各種電解めっきを施す場合がある。こ
のめっき処理が長時間に及ぶと、めっき液が外部電極の
内部に存在するポアを伝い、外部電極とセラミック素体
との界面に移動し、外部電極の接合強度(引張り強度)
が低下する場合がある。この問題を防止する目的で、従
来から導電性ペーストに用いられるガラスフリットとし
ては、耐めっき溶解性に優れるSiO2を多く含有する
硼珪酸亜鉛系ガラスフリットが挙げられる。しかしなが
ら、これらのガラスフリットを使用すると接合強度の劣
化防止の効果はあるが、焼成後の外部電極の表面にガラ
スが偏析し、後のめっき処理においてめっきが均一に形
成できないという問題が生じる。
Further, in order to improve the solder wettability and solder heat resistance of the external electrode, Ni plating is applied to the external electrode made of a conductive paste, and various electrolytic plating such as Sn plating or Ni plating is applied thereon. There are cases. If this plating process takes a long time, the plating solution travels through the pores inside the external electrode and moves to the interface between the external electrode and the ceramic body, and the bonding strength (tensile strength) of the external electrode
May decrease. As a glass frit conventionally used for a conductive paste for the purpose of preventing this problem, a zinc borosilicate-based glass frit containing a large amount of SiO 2 having excellent plating dissolution resistance can be cited. However, although the use of these glass frits has the effect of preventing the joint strength from deteriorating, the glass segregates on the surface of the fired external electrode, and a problem arises in that plating cannot be formed uniformly in a subsequent plating process.

【0005】この問題については、特公平8−1713
6号公報によれば、硼珪酸亜鉛バリウム系ガラスを用い
ることで、めっき処理による外部電極とセラミック素体
間の接合強度劣化を防ぎ、かつめっき付着性を確保でき
ると記載がある。また、特公平8−34168号公報に
よれば、アルカリ/アルカリ土類金属酸化物と酸化鉛を
含む硼珪酸亜鉛系ガラスを用いることで、上記2つの効
果に加えて、外部電極とセラミック素体の界面に結晶相
を形成して熱衝撃等によるセラミック素体のクラック発
生を抑制できると記載がある。つまり、外部電極の接合
強度を確保するためには、セラミック素体に対して濡れ
性に優れる、すなわちセラミック素体に対する接触角が
小さいガラスを用いることで、外部電極とセラミック素
体の界面にガラスを集中させ、かつ焼成後の外部電極の
表面のガラス量を減らすことでめっき付着性を確保す
る。
[0005] Regarding this problem, Japanese Patent Publication No. 8-1713
According to Japanese Patent Publication No. 6 (1999), it is described that by using a zinc borosilicate glass based glass, it is possible to prevent the bonding strength between the external electrode and the ceramic body from deteriorating due to the plating treatment and to secure the plating adhesion. According to Japanese Patent Publication No. 8-34168, the use of a zinc borosilicate-based glass containing an alkali / alkaline earth metal oxide and lead oxide provides an external electrode and a ceramic body in addition to the above two effects. It is described that a crystal phase is formed at the interface of the ceramic body to suppress the occurrence of cracks in the ceramic body due to thermal shock or the like. In other words, in order to secure the bonding strength of the external electrode, by using glass having excellent wettability with respect to the ceramic body, that is, using a glass having a small contact angle with the ceramic body, the glass at the interface between the external electrode and the ceramic body is Is concentrated and the amount of glass on the surface of the external electrode after firing is reduced to ensure the plating adhesion.

【0006】[0006]

【発明が解決しようとする課題】しかしながら従来技術
によれば、焼成後の外部電極の表面付近のガラス量が少
ないことから、外部電極の表面付近の焼結が悪く電極膜
がポーラス状態になり、さらにポアにはガラスがほとん
ど存在しない。このため、電解めっきにより形成するN
iめっきやSnめっきが外部電極の内部にまで浸入析出
し、めっき皮膜を形成する問題が生じる場合がある。こ
のめっき皮膜による残留応力は非常に大きく、例えばセ
ラミック電子部品の実装時に生じる様々な衝撃、特には
機械的応力に加えて、セラミック素体へのクラック発生
を助長するという悪影響を及ぼす。
However, according to the prior art, since the amount of glass near the surface of the external electrode after firing is small, the sintering near the surface of the external electrode is poor and the electrode film becomes porous. Furthermore, there is little glass in the pores. Therefore, N formed by electrolytic plating
There is a case where i-plating or Sn-plating penetrates and deposits inside the external electrode to form a plating film. The residual stress due to the plating film is very large, and has, for example, various impacts generated during the mounting of the ceramic electronic component, particularly a mechanical stress, and also has an adverse effect of promoting the generation of cracks in the ceramic body.

【0007】また、従来技術によれば、外部電極の焼成
時に外部電極を介して複数のセラミック電子部品同士が
互いに貼り付き合う、いわゆる「くっつき不良」が生じ
る場合がある。これは、外部電極の表面に存在するガラ
スの量は少ないにもかかわらず、ガラスのセラミック素
体への濡れ性が良いことから、外部電極の表面が他のセ
ラミック電子部品のセラミック素体に接した際に、複数
のセラミック電子部品同士が外部電極の表面のガラスを
介して接合するために生じる。
Further, according to the prior art, when firing the external electrodes, a plurality of ceramic electronic components may adhere to each other via the external electrodes, that is, a so-called "sticking defect" may occur. This is because although the amount of glass present on the surface of the external electrode is small, the glass has good wettability to the ceramic body, so that the surface of the external electrode is in contact with the ceramic body of another ceramic electronic component. This occurs because a plurality of ceramic electronic components are joined together via the glass on the surface of the external electrode.

【0008】また、従来より低軟化点ガラスフリットと
して硼珪酸鉛系ガラスが用いられているが、鉛は環境負
荷物質であり、世界規模で規制対象となっている。
[0008] Lead borosilicate glass has conventionally been used as a low softening point glass frit, but lead is an environmentally hazardous substance and is regulated on a global scale.

【0009】本発明の目的は、上述の問題点を解消すべ
くなされたもので、外部電極とセラミック素体との接合
強度およびめっき付着性を確保し、かつ外部からの機械
的応力に対して電子部品としての電気的特性の劣化を防
止し、かつ外部電極の焼成時に発生するセラミック電子
部品間の貼り付きを防止することができる導電性ペース
トおよびこれを用いて外部電極を形成したセラミック電
子部品を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems, to ensure the bonding strength and plating adhesion between an external electrode and a ceramic body, and to prevent external mechanical stress. Conductive paste capable of preventing deterioration of electrical characteristics as an electronic component and preventing sticking between ceramic electronic components generated during firing of an external electrode, and a ceramic electronic component using the same to form an external electrode Is to provide.

【0010】[0010]

【課題を解決するための手段】上記目的を達成するため
に、本発明の導電性ペーストは、セラミック電子部品の
厚膜電極形成に供される導電性ペーストであって、Ag
を含有する導電性粉末と、ガラス粉末と、ビヒクルとを
含有し、実質的にアルカリ土類金属ならびに鉛を含有せ
ず、ガラス粉末は、アルカリ金属酸化物と、酸化硼素
と、酸化珪素と、酸化亜鉛と、酸化アルミニウムとを含
有し、それぞれをM2O(MはLi,Na,K,Rb,
Cs,Frから選ばれる少なくとも1種),B23,S
iO2,ZnO,Al23と表したとき、ガラス組成1
00重量%に対して、5≦M2O≦12重量%、35≦
23≦45重量%、10≦SiO2≦20重量%、3
5≦ZnO≦45重量%、1≦Al23≦5重量%の範
囲にあることを特徴とする。
In order to achieve the above object, the conductive paste of the present invention is a conductive paste used for forming a thick-film electrode of a ceramic electronic component, and the conductive paste is made of Ag.
Containing a conductive powder, a glass powder, and a vehicle, containing substantially no alkaline earth metal and lead, the glass powder contains an alkali metal oxide, boron oxide, and silicon oxide, It contains zinc oxide and aluminum oxide, each of which is M 2 O (M is Li, Na, K, Rb,
Cs, Fr), B 2 O 3 , S
When expressed as iO 2 , ZnO, Al 2 O 3 , the glass composition 1
5 ≦ M 2 O ≦ 12% by weight, 35 ≦
B 2 O 3 ≦ 45% by weight, 10 ≦ SiO 2 ≦ 20% by weight, 3
It is characterized in that 5 ≦ ZnO ≦ 45% by weight and 1 ≦ Al 2 O 3 ≦ 5% by weight.

【0011】また、本発明の導電性ペーストにおけるガ
ラス粉末の含有量は、導電性粉末100重量部に対して
2〜15重量部であることが好ましい。
The content of the glass powder in the conductive paste of the present invention is preferably 2 to 15 parts by weight based on 100 parts by weight of the conductive powder.

【0012】また、本発明のセラミック電子部品は、複
数のセラミック層が積層されてなる積層体と、積層体の
端面に形成された一対の外部電極とを備えるセラミック
電子部品であって、外部電極は本発明の導電性ペースト
を用いて形成されていることを特徴とする。
Further, the ceramic electronic component of the present invention is a ceramic electronic component comprising: a laminated body in which a plurality of ceramic layers are laminated; and a pair of external electrodes formed on an end face of the laminated body. Is characterized by being formed using the conductive paste of the present invention.

【0013】[0013]

【発明の実施の形態】本発明の導電性ペーストに用いら
れるガラスフリットは、セラミック素体に対して濡れ難
いため、つまりセラミック素体に対する接触角が大きい
ため、外部電極の焼成中に、外部電極からセラミック素
体との界面へガラスが移動することが抑制され、外部電
極内に残留するガラス量が多くなる。このため、高温に
おいても外部電極中にガラスが液相の状態で存在し、液
相状態のガラスが外部電極の液相焼結を促進させ、外部
電極が緻密化する。さらに、焼成後の外部電極に存在す
るポアの多くはガラスにより覆われる。
BEST MODE FOR CARRYING OUT THE INVENTION The glass frit used for the conductive paste of the present invention is hard to wet the ceramic body, that is, has a large contact angle with the ceramic body. Movement of glass from the glass to the interface with the ceramic body is suppressed, and the amount of glass remaining in the external electrode increases. Therefore, the glass exists in the liquid phase in the external electrode even at a high temperature, and the glass in the liquid phase promotes the liquid phase sintering of the external electrode, and the external electrode is densified. Further, most of the pores existing in the fired external electrode are covered with glass.

【0014】本発明の導電性ペーストに用いられるガラ
スフリット中に含有するアルカリ金属酸化物としては、
酸化リチウム、酸化ナトリウム、酸化カリウム、酸化ル
ビジウム、酸化セシウム、酸化フランシウムが挙げら
れ、ガラスフリット100重量%のうち、Li2O,N
2O,K2O,Rb2O,Cs2O,Fr2O換算の合計
の含有量が5〜12重量%であることを要する。すなわ
ち、含有量が上述の範囲内であれば、ガラスの作業温
度、ガラスの流動性、セラミック素体の破壊限界値が何
れも適正値となり、いわゆる「くっつき不良」も生じな
い。他方、含有量が5重量%未満であると、ガラスの作
業温度が上昇し、焼成温度域においてガラスの流動性が
低下する。また、含有量が12重量%を越えると、セラ
ミック素体に対する接触角が小さくなり、すなわちセラ
ミック素体に対する濡れ性が良くなるため、外部電極の
焼成時にセラミック電子部品同士が互いに貼り付く、い
わゆる「くっつき不良」が生じる。さらにガラスとセラ
ミック素体とが反応して、セラミック素体の破壊限界値
が低下する。
The alkali metal oxide contained in the glass frit used in the conductive paste of the present invention includes:
Examples include lithium oxide, sodium oxide, potassium oxide, rubidium oxide, cesium oxide, and francium oxide. Of the glass frit 100% by weight, Li 2 O, N
requires that a 2 O, K 2 O, Rb 2 O, Cs 2 O, the total content of Fr 2 O in terms of 5 to 12 wt%. That is, if the content is within the above range, the working temperature of the glass, the fluidity of the glass, and the breaking limit value of the ceramic body all become appropriate values, and so-called "sticking failure" does not occur. On the other hand, if the content is less than 5% by weight, the working temperature of the glass increases, and the fluidity of the glass decreases in the firing temperature range. On the other hand, if the content exceeds 12% by weight, the contact angle with respect to the ceramic body is reduced, that is, the wettability with respect to the ceramic body is improved. Therefore, when the external electrodes are fired, the ceramic electronic components adhere to each other. "Stick failure" occurs. Further, the glass and the ceramic body react with each other, and the breaking limit value of the ceramic body decreases.

【0015】また、本発明の導電性ペーストに用いられ
るガラスフリット中に含有する酸化硼素は、ガラスフリ
ット100重量%のうちB23換算の含有量が35〜4
5重量%であることを要する。すなわち、含有量が上述
の範囲内であれば、ガラス化が容易であり、ガラスの流
動性、外部電極のめっき液に対する溶解性、外部電極の
接合強度が何れも適正値となる。他方、含有量が35重
量%未満であると、ガラス化が困難となり、また流動性
が抑制され外部電極の焼結が妨げられる。また、含有量
が45重量%を越えると、めっき液に対する溶解性が過
剰となり、めっき後の外部電極の接合強度が劣化する。
The boron oxide contained in the glass frit used in the conductive paste of the present invention has a B 2 O 3 -equivalent content of 35 to 4% in 100% by weight of the glass frit.
It must be 5% by weight. That is, when the content is within the above range, vitrification is easy, and the fluidity of the glass, the solubility of the external electrode in the plating solution, and the bonding strength of the external electrode are all appropriate values. On the other hand, if the content is less than 35% by weight, vitrification becomes difficult, the fluidity is suppressed, and the sintering of the external electrode is hindered. On the other hand, when the content exceeds 45% by weight, the solubility in the plating solution becomes excessive, and the bonding strength of the external electrode after plating deteriorates.

【0016】また、本発明の導電性ペーストに用いられ
るガラスフリット中に含有する酸化珪素は、ガラスフリ
ット100重量%のうちSiO2換算の含有量が10〜
20重量%であることを要する。すなわち、含有量が上
述の範囲内であれば、外部電極のめっき液に対する溶解
性、ガラスの軟化温度、外部電極の接合強度が何れも適
正値となる。他方、含有量が10重量%未満であると、
めっき液に対する溶解性が過剰となり、めっき後の外部
電極の接合強度が劣化する。また、含有量が20重量%
を越えると、ガラスの軟化温度が上昇して外部電極の焼
結が抑制されるため、緻密な外部電極が得られず、外部
電極とセラミック素体間の接合強度が低下する。
Further, silicon oxide contained in the glass frit used in the conductive paste of the present invention, 10 to the content of SiO 2 in terms of the glass frit 100 wt%
It needs to be 20% by weight. That is, when the content is within the above range, the solubility of the external electrode in the plating solution, the softening temperature of the glass, and the bonding strength of the external electrode are all appropriate values. On the other hand, if the content is less than 10% by weight,
The solubility in the plating solution becomes excessive, and the bonding strength of the external electrode after plating deteriorates. In addition, the content is 20% by weight.
If the temperature exceeds the above range, the softening temperature of the glass rises and sintering of the external electrode is suppressed, so that a dense external electrode cannot be obtained, and the bonding strength between the external electrode and the ceramic body decreases.

【0017】また、本発明の導電性ペーストに用いられ
るガラスフリット中に含有する酸化亜鉛は、ガラスフリ
ット100重量%のうちZnO換算の含有量が35〜4
5重量%であることを要する。すなわち、含有量が上述
の範囲内であれば、ガラスの軟化温度、ガラスの流動
性、外部電極の接合強度が何れも適正値となり、いわゆ
る「くっつき不良」も生じない。他方、含有量が35重
量%未満であると、ガラスの軟化温度が上昇し外部電極
の焼結が抑制されるため、緻密な外部電極が得られず、
また、外部電極とセラミック素子間の接合強度が低下す
る。また、含有量が45重量%を越えると、ガラス化が
困難になるとともに、セラミック素体に対する接触角が
小さくなり、すなわちセラミック素体に対する濡れ性が
良くなるため、外部電極の焼成時にセラミック電子部品
同士が互いに貼り付く、いわゆる「くっつき不良」が生
じる。
The zinc oxide contained in the glass frit used in the conductive paste of the present invention has a ZnO equivalent content of 35 to 4% in 100% by weight of the glass frit.
It must be 5% by weight. That is, when the content is within the above range, the softening temperature of the glass, the fluidity of the glass, and the bonding strength of the external electrode are all appropriate values, and so-called "sticking failure" does not occur. On the other hand, if the content is less than 35% by weight, the softening temperature of the glass increases and sintering of the external electrode is suppressed, so that a dense external electrode cannot be obtained,
Also, the bonding strength between the external electrode and the ceramic element decreases. On the other hand, if the content exceeds 45% by weight, vitrification becomes difficult, and the contact angle with the ceramic body is reduced, that is, the wettability with the ceramic body is improved. A so-called "sticking defect" occurs in which the pieces adhere to each other.

【0018】また、本発明の導電性ペーストに用いられ
るガラスフリット中に含有する酸化アルミニウムは、ガ
ラスフリット100重量%のうちAl23換算の含有量
が1〜5重量%であることを要する。すなわち、含有量
が上述の範囲内であれば、ガラスの軟化温度、外部電極
の接合強度が何れも適正値となる。他方、含有量が1重
量%未満であると、ガラスが溶融せずに未溶融物が生
じ、均質なガラスフリットが得られない。また、含有量
が5重量%を越えると、ガラスの軟化温度が上昇して外
部電極の焼結が抑制されるため、緻密な外部電極が得ら
れず、外部電極とセラミック素体間の接合強度が低下す
る。
The aluminum oxide contained in the glass frit used in the conductive paste of the present invention must have an Al 2 O 3 content of 1 to 5% by weight based on 100% by weight of the glass frit. . That is, if the content is within the above range, the softening temperature of the glass and the bonding strength of the external electrode are both appropriate values. On the other hand, if the content is less than 1% by weight, the glass does not melt and an unmelted substance is generated, and a homogeneous glass frit cannot be obtained. On the other hand, if the content exceeds 5% by weight, the softening temperature of the glass rises and sintering of the external electrode is suppressed, so that a dense external electrode cannot be obtained, and the bonding strength between the external electrode and the ceramic element body Decrease.

【0019】また、本発明の導電性ペーストは、実質的
にガラスフリット中にアルカリ土類金属酸化物を含有し
ないことを要する。実質的にアルカリ土類金属を含有す
るガラスフリットを用いた導電性ペーストからなる外部
電極を焼成すると、昇温時にガラスが結晶化して著しく
ガラスの流動性が阻害される。このため、外部電極の表
面にガラス成分が過剰に残りやすく、めっき付着性が極
端に低下する。
Further, the conductive paste of the present invention needs to contain substantially no alkaline earth metal oxide in the glass frit. When an external electrode made of a conductive paste using a glass frit substantially containing an alkaline earth metal is fired, the glass is crystallized when the temperature is raised, and the fluidity of the glass is significantly impaired. For this reason, the glass component tends to remain excessively on the surface of the external electrode, and the plating adhesion is extremely reduced.

【0020】また、本発明の導電性ペーストは、実質的
にガラスフリット中に環境負荷物質である鉛成分を含有
しないことを要する。
Further, the conductive paste of the present invention needs to contain substantially no lead component which is an environmentally harmful substance in the glass frit.

【0021】また、本発明の導電性ペーストにおけるガ
ラスフリットの含有量は、導電性粉末100重量部に対
して2〜15重量部の範囲であることが好ましい。含有
量が2重量部以上であれば、外部電極とセラミック素体
間の接合強度がより向上する。他方、含有量が15重量
部以下であれば、外部電極の焼成時にセラミック電子部
品同士が互いに貼り付く、いわゆる「くっつき不良」が
ほとんど発生しない。
The content of glass frit in the conductive paste of the present invention is preferably in the range of 2 to 15 parts by weight based on 100 parts by weight of the conductive powder. When the content is 2 parts by weight or more, the bonding strength between the external electrode and the ceramic body is further improved. On the other hand, when the content is 15 parts by weight or less, so-called "sticking failure" hardly occurs when the ceramic electronic components adhere to each other when the external electrode is fired.

【0022】また、ガラスフリットは上述した本発明の
組成範囲内であれば、単独あるいは2種類以上の混合状
態で使用しても構わない。
The glass frit may be used alone or in a mixture of two or more kinds as long as it is within the above-mentioned composition range of the present invention.

【0023】次に、本発明の一つの実施形態のセラミッ
ク電子部品として積層セラミックコンデンサを挙げ、こ
れについて図1を参照して詳細に説明する。積層セラミ
ックコンデンサ1は、複数の内部電極3を備えるセラミ
ック素体2と、外部電極4,4と、Niめっき膜5,5
と、Snめっき膜6,6とからなる。セラミック素体2
は、BaTiO3を主成分とする複数のセラミック層2
aが積層され焼成されてなる。内部電極3は、所定枚数
のセラミック層2a上に形成された電極膜がセラミック
層2aとともに同じ焼成されてなり、それぞれの端縁が
セラミック層2aの何れかの端面に露出するように形成
されている。外部電極4,4は、セラミック素体2の端
面に本発明の導電性ペーストが塗布され乾燥されて焼成
されてなる一対の厚膜電極であり、セラミック素体2の
端面に露出した内部電極3,3に電気的かつ機械的に接
続されるように形成されてなる。
Next, a multilayer ceramic capacitor will be described as a ceramic electronic component according to one embodiment of the present invention, which will be described in detail with reference to FIG. The multilayer ceramic capacitor 1 includes a ceramic body 2 having a plurality of internal electrodes 3, external electrodes 4 and 4, and Ni plating films 5 and 5.
And Sn plating films 6 and 6. Ceramic body 2
Are a plurality of ceramic layers 2 mainly composed of BaTiO 3.
a is laminated and fired. The internal electrodes 3 are formed by firing the same electrode films formed on a predetermined number of ceramic layers 2a together with the ceramic layers 2a so that the respective edges are exposed on any of the end faces of the ceramic layers 2a. I have. The external electrodes 4 and 4 are a pair of thick-film electrodes formed by applying the conductive paste of the present invention to the end faces of the ceramic body 2, drying and firing, and the internal electrodes 3 exposed on the end faces of the ceramic body 2. , 3 so as to be electrically and mechanically connected to each other.

【0024】なお、本発明のセラミック電子部品におけ
るセラミック素体2の形状、材質、内部電極3の形成位
置、枚数、外部電極4,4との接続の有無、内部電極3
自体の有無、めっき膜5,5,6,6の材質、層数等
は、上述した一つの実施形態である積層セラミックコン
デンサに特に限定されない。
The shape and material of the ceramic body 2 in the ceramic electronic component of the present invention, the formation position and the number of the internal electrodes 3, the presence or absence of connection with the external electrodes 4 and 4, the internal electrodes 3
The presence or absence of itself, the material of the plating films 5, 5, 6, 6 and the number of layers are not particularly limited to the multilayer ceramic capacitor according to the above-described embodiment.

【0025】[0025]

【実施例】まず、表1に示した組成比率となるように各
酸化物等の出発原料を調合し、これを1000〜120
0℃で溶融させた後、急冷してガラス化させ、これを疎
粉砕した後に微粉砕して、平均粒径が5μmである試料
1〜11のガラスフリットを得た。
EXAMPLES First, starting materials such as oxides were prepared so as to have the composition ratios shown in Table 1, and the starting materials were mixed at 1000 to 120.
After melting at 0 ° C., the glass was rapidly cooled to vitrify, coarsely pulverized and then finely pulverized to obtain glass frit of Samples 1 to 11 having an average particle diameter of 5 μm.

【0026】次に、エチルセルロースとアルキド樹脂か
らなる有機バインダー25重量%と、エチルカルビトー
ル、1−オクタノール、ケロシン系溶剤とからなる有機
溶剤75重量%とを混合した有機ビヒクルを得た。
Next, an organic vehicle was prepared by mixing 25% by weight of an organic binder composed of ethyl cellulose and an alkyd resin and 75% by weight of an organic solvent composed of ethyl carbitol, 1-octanol and a kerosene-based solvent.

【0027】次に、導電性粉末としてAg粉末を71重
量%と、試料1〜11のガラスフリットを5重量%を、
有機ビヒクル24重量%に混合させて、三本ロールで混
練・分散して、試料1〜11の導電性ペーストを得た。
Next, 71% by weight of Ag powder as conductive powder and 5% by weight of glass frit of Samples 1 to 11 were
The mixture was mixed with 24% by weight of an organic vehicle, and kneaded and dispersed with three rolls to obtain conductive pastes of Samples 1 to 11.

【0028】次に、BaTiO3を主成分とするセラミ
ック層を準備し、所定枚数のセラミック層の表面上に一
方の端縁がセラミック層の何れかの端面側に露出するよ
うに、内部電極となるべき電極膜を印刷し、これら複数
のセラミック層を所定枚数積層し圧着して、複数の生の
セラミック素体を準備した。
Next, a ceramic layer containing BaTiO 3 as a main component is prepared, and an internal electrode and an internal electrode are formed on the surface of a predetermined number of ceramic layers such that one edge is exposed to one of the end faces of the ceramic layer. An electrode film to be formed was printed, and a predetermined number of these ceramic layers were laminated and pressed to prepare a plurality of raw ceramic bodies.

【0029】次に、生のセラミック素体の両端面に試料
1〜11の導電性ペーストを浸漬塗布し、150℃で1
0分間乾燥させた後、大気中で750℃10分ピークの
条件で焼成して、内部電極に電気的かつ機械的に接合さ
れた一対の外部電極を形成し、この一対の外部電極上に
Niめっき膜を電解めっき処理により形成し、さらにN
iめっき膜上にSnめっき膜を電解めっき処理により形
成して、試料1〜11の積層セラミックコンデンサを得
た。
Next, the conductive pastes of samples 1 to 11 were dip-coated on both end surfaces of the raw ceramic body,
After drying for 0 minutes, the mixture is baked at 750 ° C. for 10 minutes in the air to form a pair of external electrodes electrically and mechanically joined to the internal electrodes. A plating film is formed by electrolytic plating,
An Sn plating film was formed on the i plating film by electrolytic plating to obtain multilayer ceramic capacitors of Samples 1 to 11.

【0030】そこで、試料1〜11の積層セラミックコ
ンデンサについて、Niめっき膜、外部電極の接合強
度、たわみ強度、いわゆる「くっつき不良」における部
品間固着力を測定し、これらを表1にまとめた。なお、
本発明の範囲内の試料について評価を○とし、本発明の
範囲外の試料については評価を×で表した。
Then, for the multilayer ceramic capacitors of Samples 1 to 11, the bonding strength between the Ni plating film and the external electrode and the bending strength, that is, the so-called “sticking failure”, the adhesion force between the components was measured, and these are summarized in Table 1. In addition,
For samples within the scope of the present invention, the evaluation was rated as ○, and for samples outside the scope of the present invention, the evaluation was represented as x.

【0031】なお、めっき膜厚は、蛍光X線膜厚計によ
り測定を行なったn=5の平均値を求め、厚いものほど
めっき付着性が優れることを示すが、Ni膜厚について
は厚くなりすぎるとたわみ強度が劣化する原因となる。
The plating film thickness was determined by an average value of n = 5 measured by a fluorescent X-ray film thickness meter. The larger the film thickness, the better the plating adhesion, but the larger the Ni film thickness. If it is too large, the bending strength may be deteriorated.

【0032】また、接合強度ならびにたわみ強度はn=
10の平均値であり、値が大きいものほど優れることを
示す。たわみ強度は、ガラスエポキシ基板中央の実装ラ
ンドに試料1〜11の積層セラミックコンデンサを半田
付けして、基板中心点に加圧棒で力を加えて基板をたわ
ませて、AE(アコースティックエミッション)センサ
ーによりクラック発生音を検知した時の基板のたわみ量
を測定して評価した。
The bonding strength and the bending strength are n =
An average value of 10 indicates that the larger the value, the better. The flexural strength is determined by soldering the multilayer ceramic capacitors of Samples 1 to 11 to the mounting land at the center of the glass epoxy board, and applying force to the center point of the board with a pressure rod to bend the board, and AE (Acoustic Emission) The amount of deflection of the substrate when crack generation sound was detected by the sensor was measured and evaluated.

【0033】また、「くっつき不良」における部品間固
着力の測定は、一方のセラミック電子部品の外部電極と
なるべき電極膜と他方のセラミック電子部品のセラミッ
ク素体を接触させた状態で焼成を行ない、これらの部品
間固着力の測定を行なったn=10の平均値であり、そ
の値が大きいものほど「くっつき不良」を引き起こし易
いことを示す。
Further, the measurement of the adhesion force between components in the case of "sticking failure" is performed by baking in a state where an electrode film to be an external electrode of one ceramic electronic component and a ceramic body of the other ceramic electronic component are in contact with each other. This is the average value of n = 10 obtained by measuring the adhesion force between these components, and indicates that the larger the value, the more easily the "sticking failure" is caused.

【0034】[0034]

【表1】 [Table 1]

【0035】表1から明らかであるように、試料1〜5
のガラスフリットを用いた積層セラミックコンデンサ
は、Niめっき膜厚が1.21〜1.33μmで適正で
あることから、たわみ強度も5.51〜6.09mmと
高く優れ、外部電極の接合強度も34.7〜41.3N
と高く優れた。また、部品間固着力も7.0〜8.5N
と低く優れ、本発明の範囲内となった。
As is clear from Table 1, samples 1 to 5
The multilayer ceramic capacitor using the glass frit of (1) has an excellent Ni-plated film thickness of 1.21 to 1.33 μm, and therefore has a high flexural strength of 5.51 to 6.09 mm and excellent external electrode bonding strength. 34.7-41.3N
And high and excellent. Also, the fixing force between parts is 7.0 to 8.5N.
And low, which was within the scope of the present invention.

【0036】これに対して、ガラスフリット中のB23
の含有量がガラスフリット100重量%に対して46重
量%である試料6の積層セラミックコンデンサは、Ni
めっき膜厚が1.49μmと過剰に厚いことから、たわ
み強度が1.86mmと極端に低く、外部電極の接合強
度も8.8Nと低く劣った。また、部品間固着力も1
5.8Nであり、外部電極の接合強度を超えて高く劣っ
たため、本発明の範囲外となった。
In contrast, B 2 O 3 in the glass frit
Of the sample 6 in which the content of Ni was 46% by weight with respect to 100% by weight of the glass frit,
Since the plating film thickness was excessively large at 1.49 μm, the flexural strength was extremely low at 1.86 mm, and the bonding strength of the external electrode was low at 8.8 N, which was inferior. In addition, the adhesion between parts is 1
Since it was 5.8 N, which was higher and inferior than the bonding strength of the external electrode, it was out of the range of the present invention.

【0037】また、ガラスフリット中のSiO2の含有
量がガラスフリット100重量%に対して24重量%で
ある試料7の積層セラミックコンデンサは、たわみ強度
が高く優れ、部品間固着力も低く優れたが、外部電極の
接合強度が20.9Nで低く劣ったため、本発明の範囲
外となった。
The multilayer ceramic capacitor of Sample 7, in which the content of SiO 2 in the glass frit was 24% by weight with respect to 100% by weight of the glass frit, was excellent in high flexural strength and low in fixing strength between parts. However, the bonding strength of the external electrode was 20.9 N, which was low and inferior, and thus was outside the scope of the present invention.

【0038】また、ガラスフリット中のZnOの含有量
がガラスフリット100重量%に対して46重量%であ
る試料8の積層セラミックコンデンサは、外部電極の接
合強度とたわみ強度が高く優れたが、Niめっき膜厚が
1.05μmで薄く、「くっつき不良」を示す部品間固
着力は13.2Nであり、外部電極の接合強度を超えて
高く劣ったため、本発明の範囲外となった。
The multilayer ceramic capacitor of Sample 8, in which the content of ZnO in the glass frit was 46% by weight with respect to 100% by weight of the glass frit, was excellent in the bonding strength and the bending strength of the external electrode, and was excellent. The plating film thickness was as thin as 1.05 μm, and the inter-part adhesion force showing “sticking failure” was 13.2 N, which was higher and inferior than the bonding strength of the external electrode, and thus was out of the scope of the present invention.

【0039】また、ガラスフリット中のAl23の含有
量がガラスフリット100重量%に対して6重量%であ
る試料9の積層セラミックコンデンサは、Niめっき膜
厚が1.33μmで適正であり、部品間固着力も低く優
れたが、外部電極の接合強度が16.7Nで低く劣り、
たわみ強度も2.51mmで低く劣ったため、本発明の
範囲外となった。
The multilayer ceramic capacitor of Sample 9 in which the content of Al 2 O 3 in the glass frit is 6% by weight with respect to 100% by weight of the glass frit is appropriate when the Ni plating film thickness is 1.33 μm. The bonding strength of the external electrodes was 16.7 N, which was low and inferior.
The flexural strength was 2.51 mm, which was low and inferior, and was out of the range of the present invention.

【0040】また、ガラスフリット中のNa2OとLi2
OとK2Oの合計含有量、すなわちアルカリ金属酸化物
の合計含有量がガラスフリット100重量%に対して6
重量%である試料10の積層セラミックコンデンサは、
Niめっき膜厚が1.20μmで適正であり、外部電極
の接合強度もたわみ強度も高く優れたが、部品間固着力
が17.3Nで高く劣ったため、本発明の範囲外となっ
た。
Further, Na 2 O and Li 2 in the glass frit
The total content of O and K 2 O, that is, the total content of alkali metal oxides is 6% with respect to 100% by weight of the glass frit.
The multilayer ceramic capacitor of Sample 10 which is weight% is
The Ni plating film thickness was 1.20 μm, which was appropriate, and the bonding strength and flexural strength of the external electrode were high and excellent. However, the bonding strength between components was 17.3 N, which was inferior and was out of the range of the present invention.

【0041】また、ガラスフリット中にアルカリ土類金
属であるCaOを含有する試料11の積層セラミックコ
ンデンサは、Niめっき膜厚が0.51μmで極端に薄
く、外部電極の接合強度が16.1Nで低く劣り、たわ
み強度も2.13mmと低く劣った。また、部品間固着
力も16.6Nであり、外部電極の接合強度を超えて高
く劣ったため、本発明の範囲外となった。
The multilayer ceramic capacitor of Sample 11 containing CaO, which is an alkaline earth metal in the glass frit, has an extremely thin Ni plating film thickness of 0.51 μm and a bonding strength of the external electrode of 16.1 N. The flexural strength was as low as 2.13 mm. In addition, the fixing force between components was 16.6 N, which was higher and inferior than the bonding strength of the external electrode, and thus was out of the range of the present invention.

【0042】[0042]

【発明の効果】以上のように本発明の導電性ペーストを
用いて形成された外部電極は、めっき液に対するシール
ド性に優れ、電解めっき後のセラミック素体との接合強
度劣化を防ぎ、十分な接合強度を得ることが可能であ
る。
As described above, the external electrode formed by using the conductive paste of the present invention has excellent shielding properties against the plating solution, prevents the joint strength with the ceramic body after electrolytic plating from deteriorating, and provides a sufficient effect. It is possible to obtain joint strength.

【0043】また、ガラス成分は焼成後の外部電極の表
面にも存在するが、弱酸性であるNiめっき液に対し若
干溶解性を示すため、めっき処理時に外部電極の表面に
存在するガラス成分は溶解し、外部電極中に含まれる導
電性粉末が表面に露出するため、めっき付着性は良好で
ある。
Although the glass component is present on the surface of the external electrode after firing, the glass component present on the surface of the external electrode during plating is slightly soluble in a weakly acidic Ni plating solution. It dissolves and the conductive powder contained in the external electrode is exposed on the surface, so that the plating adhesion is good.

【0044】また、焼成後の外部電極は緻密であり、外
部電極の表面付近のポアもガラスにより充填されている
ため、外部電極の内部におけるNiめっきの皮膜化すな
わち析出が少なく、その結果、機械的な外部応力に対す
るセラミック素体のクラック発生限界、すなわちたわみ
強度が向上する。
Further, since the fired external electrode is dense and the pores near the surface of the external electrode are filled with glass, the formation of Ni plating film, that is, the precipitation inside the external electrode is small. The crack generation limit of the ceramic body with respect to a specific external stress, that is, the bending strength is improved.

【0045】さらに、外部電極の表面にもガラスは存在
するが、セラミック素体への接触角が大きいため、外部
電極焼成時に他のチップと重なり合っても、セラミック
電子部品同士がガラスを介して互いに貼り付き合う、い
わゆる「くっつき不良」が少なく、また貼り付いたとし
ても固着力は従来に比して低い。
Further, although glass exists on the surface of the external electrode, since the contact angle with the ceramic body is large, even when the external electrode overlaps with another chip at the time of firing the external electrode, the ceramic electronic components can be connected to each other via the glass. There is little so-called "sticking failure" that sticks together, and even if sticking, the sticking force is lower than before.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る一つの実施の形態のセラミック電
子部品の断面図である。
FIG. 1 is a cross-sectional view of a ceramic electronic component according to one embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 セラミック電子部品 2 セラミック素体 3 内部電極 4 外部電極 DESCRIPTION OF SYMBOLS 1 Ceramic electronic component 2 Ceramic body 3 Internal electrode 4 External electrode

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E001 AB03 AC04 AC09 AF00 AF06 AH01 AH07 AJ03 5E082 AA01 AB03 BC40 FG26 GG10 GG26 GG28 JJ03 JJ12 JJ13 JJ23 PP03 5G301 DA03 DA34 DA36 DA38 DA39 DA40 DA42 DA53 DD01  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E001 AB03 AC04 AC09 AF00 AF06 AH01 AH07 AJ03 5E082 AA01 AB03 BC40 FG26 GG10 GG26 GG28 JJ03 JJ12 JJ13 JJ23 PP03 5G301 DA03 DA34 DA36 DA38 DA39 DA40 DA42 DA53 DD01

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 セラミック電子部品の厚膜電極形成に供
される導電性ペーストであって、 Agを含有する導電性粉末と、ガラス粉末と、有機ビヒ
クルとを含有し、実質的にアルカリ土類金属ならびに鉛
を含有せず、 前記ガラス粉末は、アルカリ金属酸化物と、酸化硼素
と、酸化珪素と、酸化亜鉛と、酸化アルミニウムとを含
有し、それぞれをM2O(MはLi,Na,K,Rb,
Cs,Frから選ばれる少なくとも1種),B23,S
iO2,ZnO,Al23と表したとき、ガラス組成1
00重量%に対して、 5≦M2O≦12重量% 35≦B23≦45重量% 10≦SiO2≦20重量% 35≦ZnO≦45重量% 1≦Al23≦5重量% の範囲にあることを特徴とする導電性ペースト。
1. A conductive paste for forming a thick-film electrode of a ceramic electronic component, comprising a conductive powder containing Ag, a glass powder, and an organic vehicle, and being substantially alkaline earth earth. Free of metal and lead, the glass powder contains an alkali metal oxide, boron oxide, silicon oxide, zinc oxide, and aluminum oxide, each of which is M 2 O (M is Li, Na, K, Rb,
Cs, Fr), B 2 O 3 , S
When expressed as iO 2 , ZnO, Al 2 O 3 , the glass composition 1
5 ≦ M 2 O ≦ 12 wt% 35 ≦ B 2 O 3 ≦ 45 wt% 10 ≦ SiO 2 ≦ 20 wt% 35 ≦ ZnO ≦ 45 wt% 1 ≦ Al 2 O 3 ≦ 5 wt% with respect to 00 wt% % Of the conductive paste.
【請求項2】 前記ガラス粉末の含有量は、前記導電性
粉末100重量部に対して2〜15重量部であることを
特徴とする請求項1に記載の導電性ペースト。
2. The conductive paste according to claim 1, wherein the content of the glass powder is 2 to 15 parts by weight based on 100 parts by weight of the conductive powder.
【請求項3】 複数のセラミック層が積層されてなる積
層体と、前記積層体の端面に形成された一対の外部電極
とを備えるセラミック電子部品であって、 前記外部電極は、請求項1または2に記載の導電性ペー
ストを用いて形成されていることを特徴とするセラミッ
ク電子部品。
3. A ceramic electronic component comprising: a laminated body formed by laminating a plurality of ceramic layers; and a pair of external electrodes formed on an end surface of the laminated body, wherein the external electrode is formed of a ceramic material. 3. A ceramic electronic component formed by using the conductive paste according to 2.
JP2001018636A 2000-02-09 2001-01-26 Electrically conductive paste and ceramic electronic component Pending JP2001297628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001018636A JP2001297628A (en) 2000-02-09 2001-01-26 Electrically conductive paste and ceramic electronic component

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-31738 2000-02-09
JP2000031738 2000-02-09
JP2001018636A JP2001297628A (en) 2000-02-09 2001-01-26 Electrically conductive paste and ceramic electronic component

Publications (1)

Publication Number Publication Date
JP2001297628A true JP2001297628A (en) 2001-10-26

Family

ID=26585099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001018636A Pending JP2001297628A (en) 2000-02-09 2001-01-26 Electrically conductive paste and ceramic electronic component

Country Status (1)

Country Link
JP (1) JP2001297628A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006073023A1 (en) * 2005-01-07 2006-07-13 Murata Manufacturing Co., Ltd. Conductive paste and piezoelectric electronic part utilizing the same
JP2014046228A (en) * 2012-08-29 2014-03-17 Ngk Spark Plug Co Ltd Method for manufacturing hydrogen separator
KR20150053979A (en) * 2012-10-09 2015-05-19 가부시키가이샤 무라타 세이사쿠쇼 Laminated ceramic electronic component and method for manufacturing same
WO2018025627A1 (en) * 2016-08-03 2018-02-08 昭栄化学工業株式会社 Conductive paste
KR20200009020A (en) 2017-05-26 2020-01-29 스미토모 긴조쿠 고잔 가부시키가이샤 A composition for forming a conductor, a manufacturing method thereof, a conductor, a manufacturing method thereof, and a chip resistor
KR20200016847A (en) 2017-05-26 2020-02-17 스미토모 긴조쿠 고잔 가부시키가이샤 Composition for conductor formation, conductor and manufacturing method thereof, and chip resistor
JP7379899B2 (en) 2019-07-22 2023-11-15 Tdk株式会社 ceramic electronic components

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006073023A1 (en) * 2005-01-07 2006-07-13 Murata Manufacturing Co., Ltd. Conductive paste and piezoelectric electronic part utilizing the same
JPWO2006073023A1 (en) * 2005-01-07 2008-06-12 株式会社村田製作所 Conductive paste and piezoelectric electronic component using the same
JP4552937B2 (en) * 2005-01-07 2010-09-29 株式会社村田製作所 Conductive paste and piezoelectric electronic component using the same
JP2014046228A (en) * 2012-08-29 2014-03-17 Ngk Spark Plug Co Ltd Method for manufacturing hydrogen separator
US9831037B2 (en) 2012-10-09 2017-11-28 Murata Manufaturing Co., Ltd. Monolithic ceramic electronic component and method for manufacturing the same
KR101688200B1 (en) * 2012-10-09 2016-12-20 가부시키가이샤 무라타 세이사쿠쇼 Laminated ceramic electronic component and method for manufacturing same
KR20150053979A (en) * 2012-10-09 2015-05-19 가부시키가이샤 무라타 세이사쿠쇼 Laminated ceramic electronic component and method for manufacturing same
WO2018025627A1 (en) * 2016-08-03 2018-02-08 昭栄化学工業株式会社 Conductive paste
JPWO2018025627A1 (en) * 2016-08-03 2019-07-11 昭栄化学工業株式会社 Conductive paste
US11183315B2 (en) 2016-08-03 2021-11-23 Shoei Chemical Inc. Conductive paste
KR20200009020A (en) 2017-05-26 2020-01-29 스미토모 긴조쿠 고잔 가부시키가이샤 A composition for forming a conductor, a manufacturing method thereof, a conductor, a manufacturing method thereof, and a chip resistor
KR20200016847A (en) 2017-05-26 2020-02-17 스미토모 긴조쿠 고잔 가부시키가이샤 Composition for conductor formation, conductor and manufacturing method thereof, and chip resistor
JP7379899B2 (en) 2019-07-22 2023-11-15 Tdk株式会社 ceramic electronic components

Similar Documents

Publication Publication Date Title
KR100366930B1 (en) Conductive Paste and Ceramic Electronic Device Using the Same
JP5609875B2 (en) Sealing glass for semiconductor device, sealing material, sealing material paste, semiconductor device and manufacturing method thereof
JP4645594B2 (en) Conductive paste and ceramic electronic component using the same
WO2012117978A1 (en) Airtight member and method for producing same
JPH08180731A (en) Electroconductive thick film compound, thick film electrode, ceramic electronic component, and layered ceramic capacitor
KR100400155B1 (en) Laminated ceramic electronic device
JPWO2015093098A1 (en) Multilayer ceramic electronic components
JP3799933B2 (en) Conductive paste and ceramic electronic components
JP2001345231A (en) Conductive paste and ceramic electronic part
JP2001297628A (en) Electrically conductive paste and ceramic electronic component
JPH01252548A (en) Glass ceramic composition
JP2001284160A (en) Conductive paste and laminated ceramic electronic component using the same
JPH08315634A (en) Conductive paste and ceramic electronic component using it
JPH087645A (en) Conductive paste and multilayer ceramic capacitor
JPH0896623A (en) Conductive paste
JPH02109314A (en) Electroconductive compound for terminal electrode of ceramic capacitor
JP2001118427A (en) Thick film electrode paste
JP4576660B2 (en) Conductive paste for multilayer ceramic capacitor and multilayer ceramic capacitor using the same
JP2968316B2 (en) Multilayer ceramic capacitors
JP2000036220A (en) Conductive paste and ceramic electronic part using same
JPH07211133A (en) Conductive paste for forming terminal electrode of electronic part
JP3293440B2 (en) Multilayer ceramic electronic component and method of manufacturing the same
JP2009043516A (en) Conductive paste, and piezoelectric component
JP4254136B2 (en) Conductive paste and ceramic electronic components
JPH06103810A (en) Conductive paste

Legal Events

Date Code Title Description
A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20040220

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20040420

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20050329