JP2001270995A - Heat resistant film - Google Patents

Heat resistant film

Info

Publication number
JP2001270995A
JP2001270995A JP2000085353A JP2000085353A JP2001270995A JP 2001270995 A JP2001270995 A JP 2001270995A JP 2000085353 A JP2000085353 A JP 2000085353A JP 2000085353 A JP2000085353 A JP 2000085353A JP 2001270995 A JP2001270995 A JP 2001270995A
Authority
JP
Japan
Prior art keywords
film
layered compound
glass transition
resistant film
thermoplastic resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000085353A
Other languages
Japanese (ja)
Inventor
Yasuo Shimobe
安雄 下邊
Sadafumi Furukawa
禎史 古川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP2000085353A priority Critical patent/JP2001270995A/en
Publication of JP2001270995A publication Critical patent/JP2001270995A/en
Pending legal-status Critical Current

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  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a film which shows an excellent surface smoothness and transparency as well as heat resistance such as a shape retention at an elevated temperature, a low heat distortion, etc. SOLUTION: A resin composition composed of a thermoplastic resin having a glass transition temperature of >=100 deg.C and a specified layered-compound, is formed into a film.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は光学的に透明でかつ
耐熱性に優れたフィルムに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optically transparent film having excellent heat resistance.

【0002】[0002]

【従来の技術】エレクトロニクス技術の急速な進歩に伴
い、液晶表示分野は拡大している。この分野において一
般的には素子を透明導電層を有するガラス基板上に形成
する事により各種用途に供されている。しかし、ガラス
基板は機械的強度、特に脆性に課題があり素子の耐久性
を低下させるため、強化ガラス等の特殊な処理をした基
板の利用が行われている。しかし、耐衝撃性という面で
は十分なものが得られていないのが現状である。また、
ガラス基板は比重が大きく、可搬型機器に組み込んだ場
合、機器の重量が大きくなる。この様なガラスの問題点
を改良した、透明で耐熱性に優れたガラス代替プラスチ
ックフィルムが望まれている。
2. Description of the Related Art With the rapid progress of electronics technology, the field of liquid crystal display is expanding. In this field, devices are generally provided for various uses by forming them on a glass substrate having a transparent conductive layer. However, glass substrates have problems in mechanical strength, particularly brittleness, and reduce the durability of devices. Therefore, substrates treated with special treatment such as tempered glass have been used. However, at present, sufficient impact resistance has not been obtained. Also,
The glass substrate has a large specific gravity, and when incorporated into a portable device, the weight of the device increases. A glass substitute plastic film which is transparent and has excellent heat resistance, which solves such problems of glass, is desired.

【0003】[0003]

【発明が解決しようとする課題】本発明は、表面平滑
性、透明性に優れるとともに、高温時の保形性及び熱時
の低寸法変化などの耐熱性に優れたフィルムを提供する
ものである。
SUMMARY OF THE INVENTION The present invention provides a film having excellent surface smoothness and transparency, as well as excellent heat resistance such as shape retention at high temperatures and low dimensional changes upon heating. .

【0004】[0004]

【課題を解決するための手段】即ち本発明の第1の発明
は、ガラス転移点が100℃以上である熱可塑性樹脂及
び層状化合物より構成される樹脂組成物からなる耐熱性
フィルムであり、第2の発明は、ポリエーテルサルホン
から成るフィルムの少なくとも片面に、ガラス転移点が
100℃以上である熱可塑性樹脂及び層状化合物より構
成される樹脂組成物を積層した耐熱性フィルムである。
That is, a first invention of the present invention is a heat-resistant film comprising a resin composition comprising a thermoplastic resin having a glass transition point of 100 ° C. or higher and a layered compound, The invention of No. 2 is a heat-resistant film in which a resin composition composed of a thermoplastic resin having a glass transition point of 100 ° C. or more and a layered compound is laminated on at least one surface of a film made of polyether sulfone.

【0005】[0005]

【発明の実施の形態】本発明に使用するガラス転移点が
100℃以上である熱可塑性樹脂とは、示差走査熱量測
定(熱流束型DSCでの測定、JIS K 7121)
によるガラス転移点(中間点ガラス転移点)が100℃
以上のものであり、例えばポリエチレンナフタレート、
ポリサルホン、ポリエーテルサルホン、ポリエーテルエ
ーテルケトン、シクロオレフィンコポリマー(非晶性ポ
リオレフィン)等が挙げられる。耐熱性の面からガラス
転移点は高いものが好ましく、より好ましくは180℃
以上であり、更に好ましくは200℃以上のものであ
り、ポリエーテルサルホンが最も好ましい。ガラス転移
点が100℃より低いと、高温時の保形性及び熱時の低
寸法変化などの耐熱性が不十分である。
BEST MODE FOR CARRYING OUT THE INVENTION The thermoplastic resin having a glass transition point of 100 ° C. or higher used in the present invention refers to a differential scanning calorimeter (measurement with a heat flux type DSC, JIS K 7121).
Glass transition point (intermediate point glass transition point) is 100 ° C
Above, for example, polyethylene naphthalate,
Examples include polysulfone, polyethersulfone, polyetheretherketone, and cycloolefin copolymer (amorphous polyolefin). A glass transition point is preferably high from the viewpoint of heat resistance, and more preferably 180 ° C.
Or more, more preferably at least 200 ° C., and most preferably polyethersulfone. When the glass transition point is lower than 100 ° C., heat resistance such as shape retention at a high temperature and low dimensional change upon heating is insufficient.

【0006】また、本発明に使用する層状化合物とは、
層状結晶構造を持つ無機物質のことであり、この様なも
のとしては、例えばモンモリロナイト、サポナイト、バ
イデライト、ノントロナイト、ヘクトライトなどのスメ
クタイト系粘土鉱物、バーミキュライト、ハロサイト、
その他天然又は人工の粘土鉱物、雲母、ハイドロタルサ
イト、グラファイトなどが挙げられる。これらの層状化
合物は1種用いても良いし、2種以上組み合わせて用い
ても良い。これらの中で、粘土鉱物が好適である。
[0006] The layered compound used in the present invention is:
It is an inorganic substance having a layered crystal structure, such as, for example, montmorillonite, saponite, beidellite, nontronite, smectite-based clay minerals such as hectorite, vermiculite, halosite,
Other examples include natural or artificial clay minerals, mica, hydrotalcite, graphite, and the like. These layered compounds may be used alone or in combination of two or more. Of these, clay minerals are preferred.

【0007】中でも、有機オニウムイオンによって有機
化された層状粘土鉱物が、樹脂に対する膨潤性の面で好
ましい。ここで言う、有機オニウムイオンの例として
は、ヘキシルアンモニウムイオン、オクチルアンモニウ
ムイオン、2−エチルヘキシルアンモニウムイオン、ド
デシルアンモニウムイオン、オクタデシルアンモニウム
イオン、ジオクチルジメチルアンモニウムイオン、トリ
オクチルアンモニウムイオン、ジステアリルアンモニウ
ムイオン等を挙げることができる。
[0007] Above all, a layered clay mineral which has been organized by an organic onium ion is preferable in terms of swelling with respect to a resin. Here, examples of the organic onium ion include hexyl ammonium ion, octyl ammonium ion, 2-ethylhexyl ammonium ion, dodecyl ammonium ion, octadecyl ammonium ion, dioctyl dimethyl ammonium ion, trioctyl ammonium ion, distearyl ammonium ion, and the like. Can be mentioned.

【0008】本発明において、ガラス転移点が100℃
以上である熱可塑性樹脂及び層状化合物からなる組成物
中の層状化合物含有量は、表面平滑性、透明性、高温時
の保形性及び熱時の低寸法変化などの観点から、0.1
〜10重量%であり、より好ましくは0.3〜8重量
%、最も好ましくは0.5〜5重量%である。
In the present invention, the glass transition point is 100 ° C.
The content of the layered compound in the composition comprising the thermoplastic resin and the layered compound is 0.1 from the viewpoints of surface smoothness, transparency, shape retention at high temperature, and low dimensional change during heating.
-10% by weight, more preferably 0.3-8% by weight, most preferably 0.5-5% by weight.

【0009】更に、本発明のフィルムを構成する組成物
には、本発明の効果を損なわない範囲で、酸化防止剤、
紫外線吸収剤、光安定剤、滑剤、アンチブロッキング
剤、帯電防止剤、界面活性剤、染料、顔料、難然剤、可
塑剤等を含有することができる。本発明のフィルム厚み
については、通常0.1〜0.6mmの範囲であり、好ま
しくは0.15〜0.5mmである。
Further, the composition constituting the film of the present invention contains an antioxidant, as long as the effects of the present invention are not impaired.
It may contain an ultraviolet absorber, a light stabilizer, a lubricant, an anti-blocking agent, an antistatic agent, a surfactant, a dye, a pigment, a flame retardant, a plasticizer, and the like. The thickness of the film of the present invention is usually in the range of 0.1 to 0.6 mm, preferably 0.15 to 0.5 mm.

【0010】本発明の耐熱性フィルムを得る好適な方法
としては、1)熱可塑性樹脂を構成するモノマーを含有す
る溶液中に層状化合物を分散させた後、重合を行う方
法、2)熱可塑性樹脂を良溶媒中で層状化合物と分散、混
合した後、溶媒を除去する方法、3)層状化合物を熱可塑
性樹脂と溶融混練する方法などを挙げることができる。
これらの方法により、本発明のフィルムに好適な組成物
を調製することができる。
The preferred method for obtaining the heat-resistant film of the present invention includes: 1) a method of dispersing a layered compound in a solution containing a monomer constituting a thermoplastic resin, followed by polymerization, and 2) a method of producing a thermoplastic resin. Can be dispersed and mixed with a layered compound in a good solvent, and then the solvent can be removed, and 3) a method in which the layered compound is melt-kneaded with a thermoplastic resin.
By these methods, a composition suitable for the film of the present invention can be prepared.

【0011】得られた組成物は、T−ダイ法、カレンダ
ー法、溶剤キャスティング法等公知の成形方法によりフ
ィルム状に製膜、或いは積層される。溶剤キャスティン
グ法によって製造される際の溶剤としては、熱可塑性樹
脂及び層状化合物を溶解し、キャスティング可能なもの
であれば特に限定はされないが、たとえばN−1メチル
2−ピロリドン、N、N-ジメチルホルムアミド等が好適
に使用される。
The obtained composition is formed into a film or laminated by a known molding method such as a T-die method, a calender method, and a solvent casting method. The solvent used in the production by the solvent casting method is not particularly limited as long as it can dissolve a thermoplastic resin and a layered compound and can be cast. For example, N-1 methyl 2-pyrrolidone, N, N-dimethyl Formamide and the like are preferably used.

【0012】[0012]

【実施例】次に本発明を実施例で、更に具体的に説明す
る。実施例及び比較例において用いた各成分を以下に示
す。なお、ガラス転移点についてはDSC220C[セ
イコー電子工業(株)製]により、昇温速度10℃/minで
測定を行った。
Next, the present invention will be described more specifically with reference to examples. The components used in the examples and comparative examples are shown below. The glass transition point was measured with a DSC 220C (manufactured by Seiko Denshi Kogyo KK) at a heating rate of 10 ° C./min.

【0013】(熱可塑性樹脂) ・PES(ポリエーテルサルホン) 4100G[ガラス転移点:225℃、住友化学工業
(株)製] (層状化合物) ・SPN(有機化ヘクトライト) ルーセンタイトSPN[コープケミカル(株)製]
(Thermoplastic resin) PES (polyether sulfone) 4100G [Glass transition point: 225 ° C., Sumitomo Chemical Co., Ltd.]
(Layered compound) ・ SPN (organized hectorite) Lucentite SPN [Corp Chemical Co., Ltd.]

【0014】(実施例1)ポリエーテルサルホン及び層
状化合物を十分混合し、2軸混練機を用いて樹脂温度3
30℃にて溶融混練し、ダイから溶融押出を行い、0.
2mm厚みのフィルムを作製し、使用した。
Example 1 Polyether sulfone and a layered compound were sufficiently mixed, and a resin temperature of 3 was obtained using a twin-screw kneader.
The mixture was melt-kneaded at 30 ° C. and melt-extruded from a die.
A film having a thickness of 2 mm was prepared and used.

【0015】(実施例2)ポリエーテルサルホン及び層
状化合物を十分混合し、2軸混練機を用いて樹脂温度3
30℃にて溶融混練し、ポリエーテルサルホンと2層共
押出ダイから溶融押出を行い、トータル厚み0.2mm
の2層フィルム(ポリエーテルサルホン+層状化合物/
ポリエーテルサルホン=0.1/0.1mm)を作製
し、使用した。
Example 2 Polyether sulfone and a layered compound were sufficiently mixed, and a resin temperature of 3 was obtained using a twin-screw kneader.
Melt-kneaded at 30 ° C, melt-extruded from polyethersulfone and two-layer coextrusion die, total thickness 0.2mm
2 layer film (polyether sulfone + layered compound /
(Polyethersulfone = 0.1 / 0.1 mm) was prepared and used.

【0016】(実施例3)ポリエーテルサルホン95重
量%及び層状化合物5重量%をN−1メチル2−ピロリ
ドン中で溶解・分散させ、混合溶液を得た。この混合溶
液を厚み0.2mmのポリエーテルサンホンフィルム上
にコートし、乾燥により0.205mm厚みのフィルム
を作製し、使用した。
Example 3 95% by weight of polyether sulfone and 5% by weight of a layered compound were dissolved and dispersed in N-1 methyl 2-pyrrolidone to obtain a mixed solution. This mixed solution was coated on a polyether sunphone film having a thickness of 0.2 mm, and a film having a thickness of 0.205 mm was prepared by drying and used.

【0017】(比較例1)ポリエーテルサルホンを2軸
混練機を用いて樹脂温度330℃にて溶融混練し、ダイ
から溶融押出を行い、0.2mm厚みのフィルムを作製
し、使用した。
Comparative Example 1 Polyethersulfone was melt-kneaded using a twin-screw kneader at a resin temperature of 330 ° C., melt-extruded from a die, and a 0.2 mm thick film was prepared and used.

【0018】また、各特性については、以下の様にして
測定した。 フィルム外観:上記フィルムの外観を目視で判断した。
平滑性の良いものを○、悪いものを×とした。 透明性:ASTM−D1003に従いHAZEを測定し
た。 熱時の寸法安定性:TMA/SS120C[セイコー電
子工業(株)製]により、20℃から200℃まで昇温
速度5℃/min、荷重5gで測定を行った。その間の試料
(長さ10mm)における寸法変化を測定した。 配合組成及び各測定値の結果を表1に示す。
Each characteristic was measured as follows. Film appearance: The film appearance was visually judged.
A sample with good smoothness was marked with "O", and a sample with poor smoothness was marked with "x". Transparency: HAZE was measured according to ASTM-D1003. Dimensional stability during heating: Measurement was performed at a temperature rising rate of 5 ° C./min from 20 ° C. to 200 ° C. under a load of 5 g using TMA / SS120C (manufactured by Seiko Instruments Inc.). The dimensional change in the sample (length 10 mm) during that time was measured. Table 1 shows the composition and the results of each measurement.

【0019】[0019]

【表1】 [Table 1]

【0020】[0020]

【発明の効果】本発明により、表面平滑性、透明性に優
れるとともに、高温時の保形性及び熱時の低寸法変化な
どの耐熱性に優れたプラスチックフィルムが提供され
る。本耐熱性フィルムは、光エレクトロニクス分野での
光学基板等として有用である。
According to the present invention, a plastic film having excellent surface smoothness and transparency, as well as excellent heat resistance such as shape retention at high temperatures and low dimensional change during heating is provided. The heat-resistant film is useful as an optical substrate or the like in the field of optoelectronics.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08J 5/18 CEZ C08J 5/18 CEZ C08K 7/00 C08K 7/00 // C08K 9/04 C08K 9/04 C08L 81:06 C08L 81:06 101:00 101:00 Fターム(参考) 4F071 AA45 AA51 AA64 AA86 AB30 AD05 AE17 AH19 BA01 BB02 BB04 BB06 BC01 4F100 AC00A AC03 AC03H AC10 AC10H AK01A AK54B AK54J AK55B AK55J AL01B AL05A BA02 GB41 JA05A JB16A JJ03 JK15 JL04 JM10A JN01 YY00A 4J002 AA011 BB161 CF081 CH091 CN031 DA026 DE286 DJ006 DJ056 FA016 FB086 FD016──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C08J 5/18 CEZ C08J 5/18 CEZ C08K 7/00 C08K 7/00 // C08K 9/04 C08K 9 / 04 C08L 81:06 C08L 81:06 101: 00 101: 00 F term (reference) 4F071 AA45 AA51 AA64 AA86 AB30 AD05 AE17 AH19 BA01 BB02 BB04 BB06 BC01 4F100 AC00A AC03 AC03H AC10 AC10H AK01A AK54BAK41 AL05 GB05 AK54J05B05 JB16A JJ03 JK15 JL04 JM10A JN01 YY00A 4J002 AA011 BB161 CF081 CH091 CN031 DA026 DE286 DJ006 DJ056 FA016 FB086 FD016

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 ガラス転移点が100℃以上である熱可
塑性樹脂及び層状化合物より構成される樹脂組成物から
なる耐熱性フィルム。
1. A heat-resistant film comprising a resin composition comprising a thermoplastic resin having a glass transition point of 100 ° C. or higher and a layered compound.
【請求項2】 ポリエーテルサルホンから成るフィルム
の少なくとも片面に、請求項1記載の樹脂組成物を積層
することを特徴とする耐熱性フィルム。
2. A heat-resistant film obtained by laminating the resin composition according to claim 1 on at least one surface of a film made of polyethersulfone.
JP2000085353A 2000-03-24 2000-03-24 Heat resistant film Pending JP2001270995A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000085353A JP2001270995A (en) 2000-03-24 2000-03-24 Heat resistant film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000085353A JP2001270995A (en) 2000-03-24 2000-03-24 Heat resistant film

Publications (1)

Publication Number Publication Date
JP2001270995A true JP2001270995A (en) 2001-10-02

Family

ID=18601707

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000085353A Pending JP2001270995A (en) 2000-03-24 2000-03-24 Heat resistant film

Country Status (1)

Country Link
JP (1) JP2001270995A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006077193A (en) * 2004-09-13 2006-03-23 Sumitomo Chemical Co Ltd Polyether sulfone resin composition and its film
JP2012036399A (en) * 2004-10-04 2012-02-23 Solvay Advanced Polymers Llc High performance shaped article, method of making the same, and use of the same
CN104910624A (en) * 2015-06-16 2015-09-16 苏州云舒新材料科技有限公司 Polysulfone composite and preparation process thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006077193A (en) * 2004-09-13 2006-03-23 Sumitomo Chemical Co Ltd Polyether sulfone resin composition and its film
JP2012036399A (en) * 2004-10-04 2012-02-23 Solvay Advanced Polymers Llc High performance shaped article, method of making the same, and use of the same
CN104910624A (en) * 2015-06-16 2015-09-16 苏州云舒新材料科技有限公司 Polysulfone composite and preparation process thereof

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