JP2001237240A5 - - Google Patents

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Publication number
JP2001237240A5
JP2001237240A5 JP2000052080A JP2000052080A JP2001237240A5 JP 2001237240 A5 JP2001237240 A5 JP 2001237240A5 JP 2000052080 A JP2000052080 A JP 2000052080A JP 2000052080 A JP2000052080 A JP 2000052080A JP 2001237240 A5 JP2001237240 A5 JP 2001237240A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000052080A
Other languages
Japanese (ja)
Other versions
JP2001237240A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000052080A priority Critical patent/JP2001237240A/ja
Priority claimed from JP2000052080A external-priority patent/JP2001237240A/ja
Publication of JP2001237240A publication Critical patent/JP2001237240A/ja
Publication of JP2001237240A5 publication Critical patent/JP2001237240A5/ja
Pending legal-status Critical Current

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JP2000052080A 2000-02-23 2000-02-23 低誘電率膜及びこの低誘電率膜を有する半導体素子 Pending JP2001237240A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000052080A JP2001237240A (ja) 2000-02-23 2000-02-23 低誘電率膜及びこの低誘電率膜を有する半導体素子

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000052080A JP2001237240A (ja) 2000-02-23 2000-02-23 低誘電率膜及びこの低誘電率膜を有する半導体素子

Publications (2)

Publication Number Publication Date
JP2001237240A JP2001237240A (ja) 2001-08-31
JP2001237240A5 true JP2001237240A5 (enExample) 2006-09-07

Family

ID=18573648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000052080A Pending JP2001237240A (ja) 2000-02-23 2000-02-23 低誘電率膜及びこの低誘電率膜を有する半導体素子

Country Status (1)

Country Link
JP (1) JP2001237240A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100508901B1 (ko) * 2002-04-18 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
KR100508900B1 (ko) * 2002-04-18 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
KR100508902B1 (ko) * 2002-05-06 2005-08-17 주식회사 엘지화학 유기실리케이트 중합체 및 이를 함유하는 절연막
JP4409515B2 (ja) 2003-04-09 2010-02-03 エルジー・ケム・リミテッド 絶縁膜形成用コーティング組成物、その組成物を使用した低誘電絶縁膜の製造方法、その組成物より製造される半導体素子用低誘電絶縁膜およびその絶縁膜からなる半導体素子

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