JP2001223557A - Method for forming electrode of crystal oscillator and crystal oscillator - Google Patents
Method for forming electrode of crystal oscillator and crystal oscillatorInfo
- Publication number
- JP2001223557A JP2001223557A JP2000038152A JP2000038152A JP2001223557A JP 2001223557 A JP2001223557 A JP 2001223557A JP 2000038152 A JP2000038152 A JP 2000038152A JP 2000038152 A JP2000038152 A JP 2000038152A JP 2001223557 A JP2001223557 A JP 2001223557A
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- JP
- Japan
- Prior art keywords
- crystal
- electrode
- axis direction
- negative side
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明はクリスタルインピー
ダンス（以下ＣＩとする）を小さくする電極形成方法及
び水晶振動子を産業上の技術分野とし、特に水晶片の引
出電極をＸ軸の−側に延出した水晶振動子の電極形成方
法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode forming method for reducing crystal impedance (hereinafter, referred to as CI) and a quartz resonator as an industrial technical field, and in particular, extends an extraction electrode of a quartz piece to the minus side of the X axis. The present invention relates to a method for forming an electrode of a crystal resonator.
【０００２】[0002]
【従来の技術】（発明の背景）水晶振動子は、共振特性
に優れることから、周波数及び時間の基準源として通信
機器を含む多くの電子機器に広く用いられている。近年
では、携帯型に代表されるように電子機器の小型化が進
行し、これに伴い水晶振動子もさらなる縮小化が求めら
れている。(Background of the Invention) Quartz resonators are widely used in many electronic devices including communication devices as frequency and time reference sources because of their excellent resonance characteristics. In recent years, downsizing of electronic devices as represented by portable devices has been progressing, and accordingly, further reduction in the size of crystal units has been required.
【０００３】（従来技術の一例）第８図及び第９図は一
従来例を説明する図で、第８図は切断方位を示す図、第
９図は水晶片の図である。水晶振動子はＡＴカットとし
た矩形状の水晶片１からなる。ＡＴカットは、結晶軸
（Ｘ、Ｙ、Ｚ）のＹ軸に直交した主面（Ｙ面）がＸ軸を
中心としてＺ軸からＹ軸方向に３５度１５分回転した角
度で切断される。回転した新たな軸はＹ’軸及びＺ’軸
と称される。水晶片１はＸ軸を長さ、Ｚ’軸を幅及び
Ｙ’軸を厚み方向とする。そして、両端部にベベル加工
を施し、全体的に稜線部を丸くするバレル研磨を行う。
その後、両主面に励振電極２（ａｂ）を形成し、一端部
両側に引出電極３（ａｂ）を延出してなる。引出電極３
（ａｂ）はそれぞれ反対面に折り返される。これらは、
マスクを設けてスパッタリングや蒸着によって、一体的
に形成される。(Example of Prior Art) FIGS. 8 and 9 are views for explaining a conventional example, FIG. 8 is a view showing a cutting direction, and FIG. 9 is a view of a crystal blank. The crystal oscillator is formed of a rectangular crystal piece 1 that is AT-cut. In the AT cut, a main surface (Y plane) orthogonal to the Y axis of the crystal axes (X, Y, Z) is cut at an angle rotated about 35 degrees and 15 minutes from the Z axis in the Y axis direction about the X axis. The rotated new axes are referred to as the Y 'axis and the Z' axis. The crystal blank 1 has a length on the X axis, a width on the Z ′ axis, and a thickness direction on the Y ′ axis. Then, both ends are subjected to bevel processing, and barrel polishing is performed to round the ridge line as a whole.
After that, the excitation electrodes 2 (ab) are formed on both main surfaces, and the extraction electrodes 3 (ab) extend on both sides of one end. Extraction electrode 3
(Ab) is folded back to the opposite side. They are,
A mask is provided and formed integrally by sputtering or vapor deposition.
【０００４】励振電極２（ａｂ）は縮小化に伴い、水晶
片１の他端部寄りに即ち励振電極２（ａｂ）の中心が水
晶片１の長さ（Ｘ軸）方向の中心から偏心して形成され
る。そして、引出電極３（ａｂ）の延出した水晶片１の
一端部両側を、例えば表面実装用の容器底面に導電性接
着剤によって固着し、電気的・機械的に保持する（未図
示）。これにより、励振電極２（ａｂ）の面積を確保し
て、導電性接着剤と励振電極２（ａｂ）との電気的短絡
を防止する。なお、励振電極２（ａｂ）は大きいほど、
振動特性を基本的に良好にする。As the size of the excitation electrode 2 (ab) is reduced, the center of the excitation electrode 2 (ab) is decentered from the center in the length (X-axis) direction of the crystal blank 1 near the other end of the crystal blank 1. It is formed. Then, both ends of the extended crystal blank 1 of the extraction electrode 3 (ab) are fixed to, for example, the bottom surface of a surface mounting container with a conductive adhesive, and are electrically and mechanically held (not shown). Thereby, the area of the excitation electrode 2 (ab) is secured, and an electrical short circuit between the conductive adhesive and the excitation electrode 2 (ab) is prevented. The larger the excitation electrode 2 (ab) is,
The vibration characteristics are basically improved.
【０００５】[0005]
【発明が解決しようとする課題】（従来技術の問題点及
びその究明）しかしながら、上記構成の水晶振動子で
は、水晶片１の外形寸法及びベベルの加工量によって、
温度変化に対してＣＩが変化する問題があった。具体的
には、水晶片１を保持した後の約半数がある温度点例え
ば常温２５℃をピーク値（約２４Ω）として、ＣＩが放
物線状となる（第１０図の曲線イ）。そして、残りの約
半数が温度に対してＣＩがほぼ平坦状で、前述のピーク
値よりも４Ω程度小さくなる（同図の曲線ロ）。[Problems to be Solved by the Related Art and Their Investigation] However, in the quartz resonator having the above-mentioned structure, the external dimensions of the crystal blank 1 and the amount of bevel processing are different.
There was a problem that CI changed with temperature change. Specifically, the CI becomes parabolic with a peak value (approximately 24Ω) at a certain temperature point, for example, normal temperature 25 ° C., after holding the crystal blank 1 (curve a in FIG. 10). Then, about the other half, the CI is almost flat with respect to the temperature, and is about 4 Ω smaller than the above-mentioned peak value (curve B in the figure).
【０００６】そこで、問題点を究明したところ、引出電
極３（ａｂ）の延出した一端部を＋側として保持した場
合には（第１１図）、温度に対するＣＩの変化をもたら
し、一端部を−側として保持した場合には（第１２
図）、ほぼ平坦状となることが判明した。図中の○は一
端部を保持する導電性接着剤である。なお、水晶ではＸ
軸のみ±の方向性を持ち、Ｙ軸及びＺ軸には方向性がな
い。また、ＣＩの変化は発振回路を構成した場合、発振
周波数の変化を引き起こす。Then, when the problem was investigated, when the extended one end of the extraction electrode 3 (ab) was held as the positive side (FIG. 11), the CI was changed with respect to the temperature, and the one end was changed. When held as the negative side (the twelfth
(Fig.), It was found to be almost flat. ○ in the figure is a conductive adhesive holding one end. Note that X
Only the axis has a directionality of ±, and the Y axis and the Z axis have no directionality. In addition, a change in CI causes a change in oscillation frequency when an oscillation circuit is configured.
【０００７】（発明の目的）本発明は、Ｘ軸方向の−側
を識別して−側での保持を確実にする電極形成方法及び
ＣＩを小さくした水晶振動子を提供することを目的とす
る。(Object of the Invention) An object of the present invention is to provide an electrode forming method for identifying the negative side in the X-axis direction and ensuring the holding on the negative side, and a crystal resonator with a reduced CI. .
【０００８】[0008]
【課題を解決するための手段】本発明は、水晶片１にお
けるＸ軸方向の−側を認識した後、水晶片１の両主面に
励振電極２（ａｂ）を形成するとともにＸ軸方向の−側
となる一端部両側に引出電極３（ａｂ）を延出したこと
を基本的な解決手段とする。According to the present invention, the excitation electrode 2 (ab) is formed on both main surfaces of the crystal blank 1 after recognizing the negative side of the crystal blank 1 in the X-axis direction. The basic solution is to extend the extraction electrode 3 (ab) to both sides of one end portion on the negative side.
【０００９】[0009]
【作用】本発明では、Ｘ軸の−側を認識した後、水晶片
１の引出電極３（ａｂ）をＸ軸の−側に延出するので、
引出電極３（ａｂ）をＸ軸の−側に確実に延出する。以
下、本発明の一実施例を説明する。In the present invention, since the extraction electrode 3 (ab) of the crystal blank 1 is extended to the negative side of the X axis after recognizing the negative side of the X axis,
The extraction electrode 3 (ab) is reliably extended to the negative side of the X axis. Hereinafter, an embodiment of the present invention will be described.
【００１０】[0010]
【第１実施例】第１図は本発明の第１実施例を説明する
水晶振動子の特に水晶片１の図である。なお、前従来例
図と同一部分には同番号を付与してその説明は簡略又は
省略する。水晶振動子は、前述のようにＡＴカットとし
て、ベベル加工を両端部に施したた矩形状の水晶片１か
らなる。そして、この実施例では、Ｘ線による角度計測
器で水晶片１の切断角度及びＸ軸方向の±側を測定後、
軸方向を揃えて、マスクとしてのメッキ枠４に水晶片１
を順次に収容列する。メッキ枠４は、励振電極２（ａ
ｂ）の中心をＸ軸の＋側に偏心させ、引出電極３（ａ
ｂ）をＸ軸の−側に延出する多数の空隙を有した蓋を上
下に有する（未図示）。次に、図示しない真空容器内に
メッキ枠４を収容して、蒸着やスパッタリングによっ
て、Ｘ軸方向の＋側に中心が偏心した励振電極２（ａ
ｂ）、及びＸ軸方向の−側に延出した引出電極３（ａ
ｂ）を水晶片１に形成する（前第９図参照）。そして、
引出電極３（ａｂ）の延出した水晶片１の一端部両側を
導電性接着剤によって容器底面に固着し、電気的・機械
的に接続して保持する。First Embodiment FIG. 1 is a view of a crystal unit, particularly a crystal blank 1, for explaining a first embodiment of the present invention. The same parts as those in the prior art are denoted by the same reference numerals, and description thereof will be simplified or omitted. As described above, the crystal unit is formed of a rectangular crystal piece 1 having an AT cut and beveled on both ends. Then, in this embodiment, after measuring the cutting angle of the crystal blank 1 and the ± side in the X-axis direction with an angle measuring device using X-rays,
Align the axial direction, and place the crystal piece 1 on the plating frame 4 as a mask.
Are sequentially accommodated. The plating frame 4 includes the excitation electrode 2 (a
The center of b) is eccentric to the + side of the X axis, and the extraction electrode 3 (a
b) has upper and lower lids having a number of voids extending to the negative side of the X axis (not shown). Next, the plating frame 4 is housed in a vacuum vessel (not shown), and the center of the excitation electrode 2 (a
b) and the extraction electrode 3 (a
b) is formed on the crystal blank 1 (see FIG. 9). And
Both ends of the one end portion of the extended crystal piece 1 of the extraction electrode 3 (ab) are fixed to the bottom of the container with a conductive adhesive, and electrically and mechanically connected and held.
【００１１】このようなものでは、水晶片１におけるＸ
軸方向の±側を予め認識して励振電極２（ａｂ）及び引
出電極３（ａｂ）を形成するので、Ｘ軸方向の−側の一
端部両側に引出電極３（ａｂ）を確実に延出できる。そ
して、Ｘ軸方向の−側に引出電極３（ａｂ）の延出した
水晶片１の一端部両側を確実に保持できる。したがっ
て、ＣＩを小さくした水晶振動子を得ることができる。In such a case, X in the crystal blank 1 is
Since the excitation electrode 2 (ab) and the extraction electrode 3 (ab) are formed by recognizing the ± side in the axial direction in advance, the extraction electrode 3 (ab) is reliably extended to both sides of one end on the negative side in the X-axis direction. it can. Then, both ends of the one end portion of the crystal blank 1 extending from the extraction electrode 3 (ab) to the minus side in the X-axis direction can be reliably held. Therefore, it is possible to obtain a crystal resonator having a reduced CI.
【００１２】[0012]
【第２実施例】第２図は本発明の第２実施例を説明す
る、一部を拡大した水晶片の側面図である。なお、前実
施例と同一部分の説明は省略又は簡略する。この実施例
では、テレビカメラによる水晶片１の側面の画像によっ
て、Ｘ軸方向の±側を認識する。すなわち、水晶片１は
電極形成前の例えば研磨後に、表面に生じた加工歪層を
除去するエッチング処理が行われる。この際、水晶片１
の側面にはエッチングによる凹凸が生じる。そして、凹
凸はＸ軸方向の±側間で方向性をもった模様となる。こ
の例ではエッチングによる多数の凸部の先端が尖った方
が−側となる。したがって、この模様の画像によってＸ
軸方向の±を認識できる。Second Embodiment FIG. 2 is a partially enlarged side view of a crystal blank for explaining a second embodiment of the present invention. The description of the same parts as those in the previous embodiment is omitted or simplified. In this embodiment, the ± side in the X-axis direction is recognized from the image of the side surface of the crystal blank 1 by the television camera. That is, the crystal blank 1 is subjected to an etching process for removing a work-strained layer formed on the surface, for example, after polishing before forming electrodes. At this time, the crystal piece 1
Have irregularities due to etching on the side surface of the substrate. Then, the unevenness has a pattern having directionality between ± sides in the X-axis direction. In this example, the tip of a large number of convex portions formed by etching is the minus side. Therefore, X by this pattern image
You can recognize ± in the axial direction.
【００１３】そして、前述したように、メッキ枠４に水
晶片１の軸方向を一致させて収容し、蒸着やスパッタリ
ングによって、励振電極２（ａｂ）の中心がＸ軸の＋側
に偏心し、引出電極３（ａｂ）がＸ軸の−側に延出した
水晶片１を得る。そして、引出電極３（ａｂ）の延出し
たＸ軸の−側の一端部両側を保持する。これにより、Ｃ
Ｉを小さくできる。Then, as described above, the crystal blank 1 is accommodated in the plating frame 4 with the axial directions thereof coincident with each other, and the center of the excitation electrode 2 (ab) is eccentric to the + side of the X axis by vapor deposition or sputtering. The crystal blank 1 in which the extraction electrode 3 (ab) extends to the minus side of the X axis is obtained. Then, both sides of one end portion on the negative side of the extended X-axis of the extraction electrode 3 (ab) are held. Thereby, C
I can be reduced.
【００１４】なお、この実施例では、水晶片１の側面の
模様を認識手段としたが、例えばエッチングの進行速度
差による水晶片１の両端の形状差を認識手段としてもよ
く、要はエッチングによって生ずる模様及び外形等に基
づく目印を認識手段とすればよい。In this embodiment, the pattern on the side surface of the crystal blank 1 is used as the recognition unit. However, for example, a difference in the shape of both ends of the crystal blank 1 due to the difference in etching speed may be used as the recognition unit. A mark based on the resulting pattern and outer shape may be used as the recognition means.
【００１５】また、認識手段はエッチングによって生ず
る模様及び外形等の目印によらず、認識するための切欠
部を設けたり、外形形状を変化させたりしてもよい。例
えば、切欠部５としては水晶片１の一端部の角部に設け
る（第３図）。また、両端部の辺の長さを若干異ならせ
て例えば台形状とする（第４図）。あるいは、Ｘ軸方向
の両側面を傾斜させる（第５図）。In addition, the recognition means may be provided with a notch for recognition or change the outer shape, irrespective of a mark such as a pattern and an outer shape generated by etching. For example, the notch 5 is provided at a corner of one end of the crystal blank 1 (FIG. 3). In addition, the lengths of the sides at both ends are made slightly different to form, for example, a trapezoidal shape (FIG. 4). Alternatively, both sides in the X-axis direction are inclined (FIG. 5).
【００１６】[0016]
【第３実施例】第６図は本発明の第３実施例を説明する
水晶ウェハの図である。前実施例と同一部分の説明は省
略又は簡略する。前第１及び第２実施例では両端部にベ
ベル加工を施した水晶片１の場合を説明したが、第３実
施例はベベル加工を要しない平板状とした場合の例で、
水晶片１に分割する前の水晶ウェハ６の時点で励振電極
２（ａｂ）及び引出電極３（ａｂ）を形成する。すなわ
ち、先ず、研磨された水晶ウェハ６を前述の角度計測器
によって測定する。そして、水晶ウェハ６の軸方向を一
致させて図示しないメッキ枠４に収納する。メッキ枠４
は、励振電極２（ａｂ）の中心をＸ軸の＋側に偏心さ
せ、引出電極３（ａｂ）をＸ軸の−側に延出する多数の
空隙を有する。Third Embodiment FIG. 6 is a view of a crystal wafer for explaining a third embodiment of the present invention. The description of the same parts as in the previous embodiment is omitted or simplified. Although the first and second embodiments have described the case of the crystal blank 1 having beveled ends, the third embodiment is an example of a flat plate that does not require beveling.
An excitation electrode 2 (ab) and an extraction electrode 3 (ab) are formed at the point of the quartz wafer 6 before being divided into the quartz pieces 1. That is, first, the polished quartz wafer 6 is measured by the angle measuring device described above. Then, the quartz wafer 6 is accommodated in the plating frame 4 (not shown) so that the axial directions thereof coincide with each other. Plating frame 4
Has a large number of voids that decenter the center of the excitation electrode 2 (ab) to the + side of the X axis and extend the extraction electrode 3 (ab) to the − side of the X axis.
【００１７】次に、前述したように、真空容器内で蒸着
やスパッタリングにより、励振電極２（ａｂ）及び引出
電極３（ａｂ）を形成する。なお、ここでの励振電極２
（ａｂ）及び引出電極３（ａｂ）は、Ｃｒ（クロム）等
とした下地電極のみでもよい。最後に、ワイヤソーやダ
イシングソーによって各水晶片１に分割する。これによ
り、励振電極２（ａｂ）の中心がＸ軸の＋側に偏心し、
引出電極３（ａｂ）がＸ軸の−側に延出した水晶片１を
得る。そして、引出電極３（ａｂ）の延出したＸ軸の−
側の一端部両側を保持する。Next, as described above, the excitation electrode 2 (ab) and the extraction electrode 3 (ab) are formed by vapor deposition or sputtering in a vacuum vessel. The excitation electrode 2 here
(Ab) and the extraction electrode 3 (ab) may be only a base electrode made of Cr (chromium) or the like. Lastly, the crystal piece 1 is divided by a wire saw or a dicing saw. As a result, the center of the excitation electrode 2 (ab) is eccentric to the + side of the X axis,
The crystal blank 1 in which the extraction electrode 3 (ab) extends to the minus side of the X axis is obtained. Then, the X-axis of the extension of the extraction electrode 3 (ab)
Hold both sides at one end.
【００１８】このような電極形成方法であれば、水晶ウ
ェハ６の段階で軸方向を一致させて励振電極２（ａｂ）
及び引出電極３（ａｂ）を形成する。したがって、第１
実施例のように水晶片１を個々に測定する必要がないの
で、生産性を高めることができる。そして、引出電極３
（ａｂ）の延出したＸ軸の−側の一端部両側を保持する
ので、ＣＩを小さくできる。According to such an electrode forming method, the excitation electrodes 2 (ab) are aligned in the axial direction at the stage of the quartz wafer 6.
And an extraction electrode 3 (ab). Therefore, the first
Since it is not necessary to measure the crystal blanks 1 individually as in the embodiment, the productivity can be increased. And the extraction electrode 3
Since both ends of the one end on the negative side of the extended X-axis of (ab) are held, CI can be reduced.
【００１９】[0019]
【他の事項】上記実施例では、水晶片１はＸ軸を長さ、
Ｚ’軸を幅方向としたが、Ｚ’軸を長さ、Ｘ軸を幅方向
としてもよい（第７図）。また、引出電極３（ａｂ）は
反対面に折り返したが、片面のみでもよい。また、第１
及び第２実施例では、ベベル加工を両端部に設けて説明
したが、平板状でも適用できることは勿論である。ま
た、励振電極２（ａｂ）は偏心させて形成したが、中心
にあったとしても適用できる。[Others] In the above embodiment, the crystal blank 1 has a length along the X axis,
Although the Z ′ axis is defined as the width direction, the Z ′ axis may be defined as the length and the X axis may be defined as the width direction (FIG. 7). Further, although the extraction electrode 3 (ab) is folded back on the opposite surface, it may be provided on only one surface. Also, the first
In the second embodiment, the bevel processing is provided at both ends, but the present invention can be applied to a flat plate. Further, although the excitation electrode 2 (ab) is formed eccentrically, it can be applied even if it is located at the center.
【００２０】[0020]
【発明の効果】本発明は、水晶片１におけるＸ軸方向の
−側を認識した後、水晶片の両主面に励振電極を形成す
るとともにＸ軸方向の−側となる一端部両側に引出電極
を延出したので、Ｘ軸方向の−側での保持を確実にする
電極形成方法及びＣＩを小さくした水晶振動子を提供で
きる。According to the present invention, after recognizing the negative side of the crystal blank 1 in the X-axis direction, excitation electrodes are formed on both main surfaces of the crystal blank 1 and drawn out to both sides of one end which is the negative side in the X-axis direction. Since the electrodes are extended, it is possible to provide an electrode forming method for ensuring the holding on the negative side in the X-axis direction and a crystal resonator having a reduced CI.
【図１】本発明の第１実施例を説明するメッキ枠に収容
した水晶片の図である。FIG. 1 is a view of a crystal piece housed in a plating frame for explaining a first embodiment of the present invention.
【図２】本発明の第２実施例を説明する水晶片の一部を
拡大した側面図である。FIG. 2 is an enlarged side view of a part of a crystal blank for explaining a second embodiment of the present invention.
【図３】本発明の第２実施例の他の例を説明する水晶片
の平面図である。FIG. 3 is a plan view of a crystal blank for explaining another example of the second embodiment of the present invention.
【図４】本発明の第２実施例の更に他の例を説明する水
晶片の平面図である。FIG. 4 is a plan view of a crystal blank for explaining still another example of the second embodiment of the present invention.
【図５】本発明の第２実施例の更に他の例を説明する水
晶片の側面図である。FIG. 5 is a side view of a crystal blank for explaining still another example of the second embodiment of the present invention.
【図６】本発明の第３実施例を説明する水晶ウェハの図
である。FIG. 6 is a view of a crystal wafer for explaining a third embodiment of the present invention.
【図７】本発明の他の実施例を説明する水晶片の図であ
る。FIG. 7 is a view of a crystal blank for explaining another embodiment of the present invention.
【図８】従来例を説明する水晶片の切断方位図である。FIG. 8 is a view showing a cutting direction of a crystal piece for explaining a conventional example.
【図９】従来例を説明する水晶片の図である。FIG. 9 is a view of a crystal piece for explaining a conventional example.
【図１０】従来例を説明する水晶振動子のＣＩ特性図で
ある。FIG. 10 is a diagram illustrating a CI characteristic of a crystal unit illustrating a conventional example.
【図１１】従来例を説明する水晶片の平面図である。FIG. 11 is a plan view of a crystal blank for explaining a conventional example.
【図１２】従来例を説明する水晶片の平面図である。FIG. 12 is a plan view of a crystal piece for explaining a conventional example.
１ 水晶片、２ 励振電極、３ 引出電極、４ メッキ
枠、５ 切欠部、６水晶ウェハ．1 crystal blank, 2 excitation electrode, 3 extraction electrode, 4 plating frame, 5 notch, 6 crystal wafer.
Claims (8)
形成するとともに、前記励振電極から前記水晶片におけ
るＸ軸方向の一端部両側に引出電極を延出してなる水晶
振動子の電極形成方法において、前記水晶片におけるＸ
軸方向の−側を認識した後、前記水晶片の両主面に励振
電極を形成するとともに、前記励振電極から前記水晶片
のＸ軸方向の−側となる一端部両側に引出電極を延出し
たことを特徴とする水晶振動子の電極形成方法。An exciter electrode is formed on both main surfaces of a rectangular crystal piece, and extraction electrodes are extended from the excitation electrode to both ends of the crystal piece at one end in the X-axis direction. In the electrode forming method, the X in the quartz piece is
After recognizing the negative side in the axial direction, excitation electrodes are formed on both main surfaces of the crystal blank, and extraction electrodes are extended from the excitation electrodes to both sides of one end of the crystal blank on the negative side in the X-axis direction. A method for forming an electrode of a quartz oscillator, characterized in that:
認識する手段は、前記水晶片の軸方向を計測器によって
測定する手段である水晶振動子の電極形成方法。2. The method according to claim 1, wherein the means for recognizing the negative side in the X-axis direction is a means for measuring the axial direction of the quartz piece by a measuring instrument.
認識する手段は、前記水晶片の目印を画像によって認識
する手段である水晶振動子の電極形成方法。3. The method according to claim 1, wherein the means for recognizing the negative side in the X-axis direction is means for recognizing a mark of the crystal blank by an image.
ッチングによって生じた側面の模様である水晶振動子の
電極形成方法。4. The method according to claim 3, wherein the mark of the crystal piece is a pattern of a side surface generated by etching.
記Ｘ軸方向の−側を認識するための切欠部及び外形形状
である水晶振動子の電極形成方法。5. The method according to claim 3, wherein the mark of the crystal blank has a cutout for recognizing a negative side in the X-axis direction and an outer shape.
成するとともに、前記励振電極から前記水晶ウェハにお
けるＸ軸方向の一端部両側に引出電極を延出した後、多
数の水晶片に分割してなる水晶振動子の電極形成方法に
おいて、前記水晶ウェハにおけるＸ軸方向の−側を認識
した後、前記水晶ウェハの両主面に多数の励振電極を形
成するとともに、前記励振電極から前記水晶片のＸ軸方
向の−側となる一端部両側に多数の引出電極を延出した
ことを特徴とする水晶振動子の電極形成方法。6. A large number of excitation electrodes are formed on both main surfaces of a crystal wafer, and extraction electrodes are extended from the excitation electrodes to both ends of one end of the crystal wafer in the X-axis direction. In the method for forming an electrode of a divided quartz resonator, after recognizing the negative side in the X-axis direction of the quartz wafer, a large number of excitation electrodes are formed on both main surfaces of the quartz wafer, and the excitation electrodes are A method for forming an electrode for a crystal resonator, comprising: extending a plurality of extraction electrodes on both sides of one end of a crystal piece on the negative side in the X-axis direction.
形成し、前記励振電極から前記水晶片におけるＸ軸の−
側となる一端部両側に引出電極を延出してなる水晶振動
子において、前記水晶片におけるＸ軸の−側を認識する
外形処理が前記水晶片に施されていることを特徴とする
水晶振動子。7. An excitation electrode is formed on both main surfaces of a rectangular crystal blank, and the excitation electrode is connected to the X-axis of the crystal blank from the excitation electrode.
In a crystal resonator having extraction electrodes extending on both sides of one end portion, an outer shape process for recognizing a negative side of the X axis in the crystal piece is performed on the crystal piece. .
なる前記水晶片におけるＸ軸方向の−側となる、前記引
出電極の延出した一端部両側を保持してなる水晶振動
子。8. An extending end of the extraction electrode, which is located on the negative side in the X-axis direction of the crystal piece according to claim 1, 2, 3, 4, 5, 6, or 7, is held. Crystal oscillator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000038152A JP2001223557A (en) | 2000-02-10 | 2000-02-10 | Method for forming electrode of crystal oscillator and crystal oscillator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000038152A JP2001223557A (en) | 2000-02-10 | 2000-02-10 | Method for forming electrode of crystal oscillator and crystal oscillator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001223557A true JP2001223557A (en) | 2001-08-17 |
Family
ID=18561933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000038152A Pending JP2001223557A (en) | 2000-02-10 | 2000-02-10 | Method for forming electrode of crystal oscillator and crystal oscillator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001223557A (en) |
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|---|---|---|---|---|
| JP2003017978A (en) * | 2001-06-29 | 2003-01-17 | Kinseki Ltd | Piezoelectric vibrator |
| JP2005094410A (en) * | 2003-09-18 | 2005-04-07 | Toyo Commun Equip Co Ltd | Structure of piezoelectric vibrator and manufacturing method thereof |
| JPWO2007017992A1 (en) * | 2005-08-10 | 2009-02-19 | 株式会社大真空 | Piezoelectric vibration device and manufacturing method thereof |
| JP2009130586A (en) * | 2007-11-22 | 2009-06-11 | Epson Toyocom Corp | Piezoelectric vibration chip, piezoelectric device, and method of manufacturing piezoelectric vibration chip |
| JP2013102487A (en) * | 2012-12-27 | 2013-05-23 | Seiko Epson Corp | Piezoelectric vibration piece, piezoelectric device and manufacturing method of piezoelectric vibration piece |
| JP2014027505A (en) * | 2012-07-27 | 2014-02-06 | Seiko Epson Corp | Vibration piece, vibration element, vibrator, electronic device, electronic apparatus, movable body and manufacturing method for vibration piece |
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| JP2014143587A (en) * | 2013-01-24 | 2014-08-07 | Daishinku Corp | Crystal oscillator and production method of the same |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003017978A (en) * | 2001-06-29 | 2003-01-17 | Kinseki Ltd | Piezoelectric vibrator |
| JP2005094410A (en) * | 2003-09-18 | 2005-04-07 | Toyo Commun Equip Co Ltd | Structure of piezoelectric vibrator and manufacturing method thereof |
| JP4506135B2 (en) * | 2003-09-18 | 2010-07-21 | エプソントヨコム株式会社 | Piezoelectric vibrator |
| JPWO2007017992A1 (en) * | 2005-08-10 | 2009-02-19 | 株式会社大真空 | Piezoelectric vibration device and manufacturing method thereof |
| US7902731B2 (en) | 2005-08-10 | 2011-03-08 | Daishinku Corporation | Piezoelectric resonator device and method for manufacturing the same |
| JP2009130586A (en) * | 2007-11-22 | 2009-06-11 | Epson Toyocom Corp | Piezoelectric vibration chip, piezoelectric device, and method of manufacturing piezoelectric vibration chip |
| JP2014027505A (en) * | 2012-07-27 | 2014-02-06 | Seiko Epson Corp | Vibration piece, vibration element, vibrator, electronic device, electronic apparatus, movable body and manufacturing method for vibration piece |
| JP2013102487A (en) * | 2012-12-27 | 2013-05-23 | Seiko Epson Corp | Piezoelectric vibration piece, piezoelectric device and manufacturing method of piezoelectric vibration piece |
| JP2014143587A (en) * | 2013-01-24 | 2014-08-07 | Daishinku Corp | Crystal oscillator and production method of the same |
| JP2014045519A (en) * | 2013-11-28 | 2014-03-13 | Seiko Epson Corp | Piezoelectric vibration piece, piezoelectric device, and manufacturing method of piezoelectric vibration piece |
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