JP2001217384A - Laminated semiconductor device and method of manufacturing the same - Google Patents

Laminated semiconductor device and method of manufacturing the same

Info

Publication number
JP2001217384A
JP2001217384A JP2000023747A JP2000023747A JP2001217384A JP 2001217384 A JP2001217384 A JP 2001217384A JP 2000023747 A JP2000023747 A JP 2000023747A JP 2000023747 A JP2000023747 A JP 2000023747A JP 2001217384 A JP2001217384 A JP 2001217384A
Authority
JP
Japan
Prior art keywords
substrate
stacked
chip
semiconductor
chips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2000023747A
Other languages
Japanese (ja)
Inventor
Kikuo Komori
喜久雄 小森
Takeshi Takashima
毅 高島
Kingo Nagao
錦吾 長尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2000023747A priority Critical patent/JP2001217384A/en
Publication of JP2001217384A publication Critical patent/JP2001217384A/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1515Shape
    • H01L2924/15153Shape the die mounting substrate comprising a recess for hosting the device
    • H01L2924/15155Shape the die mounting substrate comprising a recess for hosting the device the shape of the recess being other than a cuboid
    • H01L2924/15156Side view

Landscapes

  • Wire Bonding (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method of manufacturing a laminated semiconductor device with less restriction of size of semiconductor chips to be laminated, and also to provide such a semiconductor device. SOLUTION: In the method of manufacturing a laminated semiconductor device by stacking semiconductor chips 31 to 34 in plural stages, the plurality of semiconductor chips are stacked within accommodation substrates (1) having an internal hollow (2), the hollow 2 has spaces 21 to 24 for disposition of the chips which are sequentially spread from its bottom surface side, and the substrates 1 are previously integrally formed. In the laminated semiconductor device having the chips 31 to 34 laminated, the chips are formed as stacked within the hollow 2 of the substrates 1, and the hollow 2 has the spaces 31 to 34 sequentially spread from its bottom surface side, and the substrates are integrally formed.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、積層型半導体装置
の製造方法、及び該製造方法により得ることができる積
層型半導体装置に関する。本発明は特に、半導体チップ
を複数段積み重ねてなる積層型半導体装置の製造方法、
及び該積層型半導体装置に関するものである。本発明
は、たとえば多数のICチップを積み重ねて組み立てて
得るICパッケージについて、利用することができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a stacked semiconductor device and a stacked semiconductor device obtainable by the manufacturing method. The present invention particularly relates to a method for manufacturing a stacked semiconductor device in which a plurality of semiconductor chips are stacked,
And the stacked semiconductor device. The present invention can be used, for example, for an IC package obtained by stacking and assembling a large number of IC chips.

【0002】[0002]

【従来の技術】従来より小型化・高密度化等の要求か
ら、半導体チップを複数段積み重ねて積層型半導体装置
とすることが行われている。たとえば複数のICチップ
を積み重ねて組み立てたICパッケージが知られてお
り、スタックドICパッケージなどと称されている。
2. Description of the Related Art Conventionally, due to demands for miniaturization and high density, a plurality of semiconductor chips are stacked to form a stacked semiconductor device. For example, an IC package in which a plurality of IC chips are stacked and assembled is known, and is called a stacked IC package or the like.

【0003】従来のこの種のICパッケージで、ワイヤ
ー接続を用いて得るものは、下段に位置するICチップ
の上に、その上段に位置すべき別のICチップをダイ・
アタッチ・ペーストを介して固定して行くものである。
この場合、下段に位置するICチップのパッドに接触し
ない領域内のICチップサイズでないと、上段に配置す
ることは困難であった。このため、積み重ねるICチッ
プサイズには制約があり、複数のICチップを積み重ね
ICパッケージに構成することは、非常に制約を受ける
という問題点がある。
In a conventional IC package of this type, which is obtained by wire connection, another IC chip to be positioned above the lower IC chip is mounted on the lower IC chip.
It is fixed through an attach paste.
In this case, it is difficult to arrange the IC chip in the upper stage unless the size of the IC chip is in an area that does not contact the pads of the IC chip located in the lower stage. For this reason, there is a restriction on the size of the IC chips to be stacked, and there is a problem that the formation of a plurality of IC chips in a stacked IC package is greatly restricted.

【0004】また従来の積層型半導体装置の製造工法に
おける多段積層化は、各段の層を独立して形成し、その
後はんだ接合等を用いて接合組み立てを行っている。す
なわち、その接合の工程は別工程で必要であるものであ
る。各段の層の接合は多くの工程を要するものであっ
た。
[0004] Further, in the conventional multi-stage lamination in the manufacturing method of a stacked semiconductor device, layers of each stage are formed independently, and thereafter, bonding and assembling are performed using solder bonding or the like. That is, the joining step is necessary in another step. The bonding of the layers in each step required many steps.

【0005】また従来の工法は、基板へのワイヤー接続
が、各ICとも同一面で行われているため、ワイヤーが
錯綜し、ワイヤー同士の接触の問題があった。すなわ
ち、ワイヤーがたとえば上下、左右に幾重にも配線され
る場合が多く、このためにワイヤー同士の接触が、製造
上の困難さを増していた。
[0005] In the conventional method, wires are connected to the substrate on the same surface of each IC, so that the wires are complicated and there is a problem of contact between the wires. That is, the wires are often arranged in multiple layers, for example, up and down, left and right, and the contact between the wires has increased the difficulty in manufacturing.

【0006】[0006]

【発明が解決しようとする課題】本発明は、前記したよ
うな問題点を解消し、積層型半導体装置について、積層
すべき半導体チップのサイズの制約が少なく、たとえば
複数の異なったサイズのチップを複数段積み重ねること
も、または同サイズのチップを複数段積み重ねることも
ことも可能とした積層型半導体装置の製造方法、及びそ
れによって得られる積層型半導体装置を提供することを
目的とする。
SUMMARY OF THE INVENTION The present invention solves the above-mentioned problems and reduces the size of semiconductor chips to be stacked in a stacked semiconductor device. For example, a plurality of chips of different sizes can be used. It is an object of the present invention to provide a method of manufacturing a stacked semiconductor device that can be stacked in a plurality of stages or a plurality of stacked chips of the same size, and a stacked semiconductor device obtained by the method.

【0007】[0007]

【課題を解決するための手段】本発明に係る積層型半導
体装置の製造方法は、半導体チップを複数段積み重ねて
積層型半導体装置を形成する積層型半導体装置の製造方
法であって、内部中空の収納基板中に複数の半導体チッ
プを積み重ねるとともに、前記基板の中空は、底面側か
ら順次、半導体チップ配設空間が広くなっており、かつ
該基板はあらかじめ一体的に形成されていることを特徴
とするものである。
A method of manufacturing a stacked semiconductor device according to the present invention is a method of manufacturing a stacked semiconductor device in which a plurality of semiconductor chips are stacked to form a stacked semiconductor device. A plurality of semiconductor chips are stacked in the storage substrate, and the hollow space of the substrate is such that the space for disposing the semiconductor chips is gradually increased from the bottom side, and the substrate is formed integrally in advance. Is what you do.

【0008】本発明に係る積層型半導体装置は、半導体
チップが複数段積み重ねられて形成された積層型半導体
装置であって、複数の半導体チップが内部中空の収納基
板中に積み重ねられて形成されており、前記基板の中空
は、底面側から順次、半導体チップ配設空間が広くなっ
ており、かつ該基板は一体的に形成されていることを特
徴とするものである。
[0008] A stacked semiconductor device according to the present invention is a stacked semiconductor device formed by stacking a plurality of semiconductor chips in a plurality of stages. The stacked semiconductor device is formed by stacking a plurality of semiconductor chips in a hollow storage substrate. The hollow space of the substrate is characterized in that the semiconductor chip mounting space is gradually increased from the bottom side, and the substrate is formed integrally.

【0009】本発明によれば、あらかじめ一体的に形成
されている基板を用いるので、積層する半導体チップを
搭載する各段の基板を、各段毎に配設取付けする必要は
無い。
According to the present invention, since the substrates which are formed integrally in advance are used, it is not necessary to arrange and mount the substrates of each stage on which the semiconductor chips to be stacked are mounted for each stage.

【0010】かつ該基板は、半導体チップを配設する収
納中空は、底面側から順次、半導体チップ配設空間が広
くなっており、すなわちたとえば段状をなすので、各段
毎にチップを搭載し、取り付け固定することができ、こ
れにより、下段に位置するチップの上面が、その上段に
位置するチップに対し、フリーな面を供給できることに
より、チップサイズの制約にほとんど制約されることが
ない。その他、パッドエリヤの制約や、ワイヤーの制約
も、ほとんど受けない。
In the substrate, the space in which the semiconductor chips are arranged is arranged such that the space in which the semiconductor chips are arranged is gradually widened from the bottom side, that is, for example, it is stepped. The upper surface of the lower chip can supply a free surface to the upper chip, so that there is almost no restriction on the chip size. In addition, there are almost no restrictions on pad areas and wires.

【0011】また基板の半導体チップを配設収納中空
が、底面側から順次、半導体チップ配設空間が広くなる
(たとえば段状をなす)ので、ワイヤーの錯綜を防止で
き、ワイヤー同士の接触の問題が容易に回避できる。
Further, since the semiconductor chip mounting space where the semiconductor chip of the substrate is housed is gradually increased from the bottom side (for example, a step-like shape), the wire can be prevented from being complicated, and the problem of contact between the wires can be prevented. Can be easily avoided.

【0012】なお、特開平6−037248号公報に
は、半導体チップを積み重ねてなる積み重ね半導体マル
チチップモジュールの記載があるが、これは熱伝導性フ
レキシブル基板を用いるもので、内部収納型の基板を用
いるものではなく、かつ、各半導体チップの配設面の大
きさは同じである。特開平7−161924号公報に
は、半導体チップを搭載したキャリアを積層してなる半
導体装置が記載されているが、これも同じ大きさのキャ
リアを積層して組み立てる構成である。特開平6−14
0738号公報には、半導体チップを凹状の搭載空間に
搭載したキャリアを複数段に積層した構成が記載されて
いるが、このキャリアは同じ型・大きさをなすものであ
って、リードレスチップキャリアとして用いるものであ
る。いずれも、あらかじめ一体的に形成されている基板
を用いるものではなく、また、基板の半導体チップ配設
空間が、底面側から順次、広くなっているものではな
い。
Japanese Unexamined Patent Publication (Kokai) No. 6-037248 discloses a stacked semiconductor multi-chip module in which semiconductor chips are stacked. This module uses a heat conductive flexible substrate, and an internally housed substrate is used. It is not used, and the size of the arrangement surface of each semiconductor chip is the same. Japanese Patent Application Laid-Open No. 7-161924 describes a semiconductor device in which carriers on which semiconductor chips are mounted are stacked, but this also has a configuration in which carriers of the same size are stacked and assembled. JP-A-6-14
Japanese Patent Application Publication No. 0738 discloses a configuration in which carriers having semiconductor chips mounted in a concave mounting space are stacked in a plurality of stages. However, the carriers have the same shape and size. Is used. In each case, a substrate that is formed integrally in advance is not used, and the space for disposing the semiconductor chip of the substrate is not gradually widened from the bottom side.

【0013】[0013]

【発明の実施の形態】以下、本発明の実施の形態につい
てさらに説明し、また、その好ましい具体例を図面を参
照して説明する。なお当然のことではあるが、本発明は
図示実施の形態例に限定されるものではない。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The embodiments of the present invention will be further described below, and preferred specific examples will be described with reference to the drawings. Needless to say, the present invention is not limited to the illustrated embodiment.

【0014】本発明においては、基板の収納用内部中空
に複数の半導体チップを配設するものである。このよう
な内部収納型の基板を、本明細書中、適宜インターポー
ザー基板と称することもある。本発明において、基板の
中空は、底面側から順次、半導体チップ配設空間が広く
なっているが、本発明の実施において、該半導体チップ
配設空間が、配設する半導体チップの数に応じた段状に
なっていることは、好ましい形態である。
In the present invention, a plurality of semiconductor chips are provided in the hollow space for accommodating the substrate. Such an internal storage type substrate may be appropriately referred to as an interposer substrate in this specification. In the present invention, the hollow space of the substrate is such that the semiconductor chip mounting space is gradually increased from the bottom side. In the practice of the present invention, the semiconductor chip mounting space depends on the number of semiconductor chips to be mounted. Stepping is a preferred form.

【0015】本発明において、基板はあらかじめ一体的
に形成されているが、これは半導体チップを搭載する時
点で一体的に組み立てられていればよく、一体成型で形
成するのでも、各段用の基板をあらかじめ接着固定等し
て、一体化したものであってもよい。
In the present invention, the substrate is integrally formed in advance, but it is sufficient that the substrate is integrally assembled at the time of mounting the semiconductor chip. The substrate may be bonded and fixed in advance and integrated.

【0016】本発明において、上記あらかじめ一体的に
形成されている基板の収納用内部中空中に半導体チップ
を積み重ねて積層型半導体装置とするが、この複数の半
導体チップの配設は、各段毎に半導体チップを搭載して
配設することを繰り返して、複数の半導体チップの積み
重ねを行うことで、達成することができる。
In the present invention, the semiconductor chips are stacked in the hollow space for accommodating the substrate which is integrally formed in advance to form a stacked semiconductor device. This can be achieved by repeatedly stacking a plurality of semiconductor chips by repeatedly mounting and arranging semiconductor chips on the semiconductor device.

【0017】本発明は上記のような構成であるので、本
発明の実施に当たっては、各段の層毎に、たとえばIC
チップのダイマウント、ワイヤー接続、樹脂封止、キュ
アーまで行うことにより、下段に位置するIC等のチッ
プの上面が、その上段に位置するチップに対し、フリー
な面を供給できる。これにより、IC等のチップのサイ
ズ、パッドエリヤ、ワイヤーの制約をほとんど受けるこ
となく、積層型半導体装置の形成が達成できる。たとえ
ばICチップのいわゆるスタック化等が実現できる。
Since the present invention has the above-mentioned configuration, in implementing the present invention, for example, an IC
By performing die mounting, wire connection, resin sealing, and curing of the chip, the upper surface of the chip such as an IC located at the lower stage can supply a free surface to the chip located at the upper stage. Thus, the formation of a stacked semiconductor device can be achieved with almost no restrictions on the size of a chip such as an IC, pad area, and wires. For example, stacking of IC chips can be realized.

【0018】積層に際し、あらかじめ一体的に形成され
ている基板を用いるので、積層する半導体チップを搭載
する各段の基板を、各段毎に配設取付けする必要は無
い。
In the lamination, since a substrate which is integrally formed in advance is used, it is not necessary to dispose and mount substrates of each stage on which semiconductor chips to be laminated are mounted for each stage.

【0019】かつ該基板として、半導体チップを配設収
納する中空が底面側から順次、半導体チップ配設空間が
広くなる(たとえば段状をなす)ものを用いるので、ワ
イヤーの錯綜を防止でき、ワイヤー同士の接触の問題が
容易に回避できる。
Further, as the substrate, the space in which the semiconductor chip is arranged and accommodated and the space in which the semiconductor chip is arranged is gradually widened (for example, in the form of a step) from the bottom side is used. The problem of contact between them can be easily avoided.

【0020】本発明で用いる基板について、図2及び図
3の例示を用いて説明すると、次のとおりである。図2
に示した内部収納型の基板(インターポーザー基板)
は、3段スタックド(3段のチップ積層)の場合を例と
するものである。
The substrate used in the present invention will be described with reference to FIGS. 2 and 3. FIG.
Internal storage type board (interposer board) shown in
Is an example of a case of three-stage stacking (three-stage chip stacking).

【0021】図2は、本発明で用いることができる基板
の一例の構成を斜視図で示すものである。この例示の基
板1は、内部が中空になった箱型をなしており、該内部
中空がチップを収納するチップ配設空間2となってい
る。この半導体チップ配設空間2は、底面側から順次、
配設空間が広くなった形態をなしている。この例示の具
体的な形態としては、図3にチップ及びワイヤーを配設
した状態を一部破断図で示すように、階段状になって、
各チップの配設空間をなしている。図3中、符号3aで
下段に配設する半導体チップ(たとえば下段ICチッ
プ)を示し、3bで中段に配設する半導体チップ(たと
えば中段ICチップ)を示し、3cで上段に配設する半
導体チップ(たとえば上段ICチップ)を示す。符号4
でワイヤーを示す。
FIG. 2 is a perspective view showing the structure of an example of a substrate which can be used in the present invention. The substrate 1 in this example has a box shape with a hollow inside, and the hollow inside is a chip disposition space 2 for storing chips. The semiconductor chip mounting space 2 is sequentially formed from the bottom side.
The arrangement space is wide. As a specific example of this example, as shown in a partially cutaway view in which a chip and a wire are arranged in FIG.
The space for each chip is provided. In FIG. 3, reference numeral 3a denotes a lower semiconductor chip (for example, lower IC chip), 3b denotes a middle semiconductor chip (for example, middle IC chip), and 3c denotes an upper semiconductor chip. (For example, an upper IC chip). Code 4
Indicates a wire.

【0022】図2中の符号5で、パッドを示す。特に、
セカンドパッドを示す。この基板1は、上記のような形
態で、かつ、あらかじめ一体的に形成されているもので
ある。かかる収納基板1中に複数の(例示では3つの)
半導体チップ3a,3b,3cを積み重ねて構成するの
であり、配設する半導体チップの数に応じた段状になっ
ている(例示では3段になっている)半導体チップ配設
空間2に、各段毎に半導体チップを搭載して配設するこ
とを繰り返して、複数の半導体チップの積み重ねを行っ
て、積層型半導体装置を得る。
A pad 5 is shown in FIG. In particular,
Shows a second pad. The substrate 1 is formed in the above-described manner and is integrally formed in advance. A plurality (three in the example) of such a storage substrate 1
Each of the semiconductor chips 3a, 3b, and 3c is formed by stacking the semiconductor chips 3a, 3b, and 3c. By repeatedly mounting and arranging semiconductor chips for each stage, a plurality of semiconductor chips are stacked to obtain a stacked semiconductor device.

【0023】積層組み立てにおいては、各段の層毎に、
たとえばICチップのダイマウント、ワイヤー接続、樹
脂封止、キュアーまで行うと、下段に位置するIC等の
チップの上面が、その上段に位置するチップに対し、フ
リーな面を供給でき、これにより、IC等のチップのサ
イズ、パッドエリヤ、ワイヤーの制約をほとんど受ける
ことなく、積層型半導体装置の形成が達成できる。この
ときあらかじめ一体的に形成されている基板を用いるの
で、積層する半導体チップを搭載する各段の基板を、各
段毎に配設取付けする必要は無い。基板1はたとえば段
状をなすので、半導体チップ3a,3b,3c及びワイ
ヤー4を図示のごとく整然と配設でき、ワイヤーの錯綜
を防止でき、ワイヤー同士の接触の問題は回避できる。
In the layered assembly, for each layer of each stage,
For example, when die mount, wire connection, resin sealing, and curing of an IC chip are performed, the upper surface of a chip such as an IC positioned at a lower level can supply a free surface to a chip positioned at an upper level. The formation of a stacked semiconductor device can be achieved with almost no restrictions on the size of chips such as ICs, pad areas, and wires. At this time, since a substrate that is integrally formed in advance is used, it is not necessary to arrange and mount the substrates of each stage on which the semiconductor chips to be stacked are mounted, for each stage. Since the substrate 1 is formed in a stepped shape, for example, the semiconductor chips 3a, 3b, 3c and the wires 4 can be arranged in an orderly manner as shown in the figure, so that complicated wires can be prevented, and the problem of contact between the wires can be avoided.

【0024】次に、図1を参照して、本発明の好ましい
具体的な実施の形態例について、説明する。
Next, preferred specific embodiments of the present invention will be described with reference to FIG.

【0025】実施の形態例1 図1を参照する。図1は、本実施の形態例の積層型半導
体装置の出来上がり状態のパッケージ構造を断面図で示
すものである。
Embodiment 1 Referring to FIG. FIG. 1 is a sectional view showing a completed package structure of a stacked semiconductor device according to the present embodiment.

【0026】本発明に係る積層型半導体装置は、収納基
板内に複数の半導体チップが積層されてなるものである
が、本例はICチップを複数積層して、1パッケージと
したものである。図1は特に、4個のICチップを用い
た積層型(スタックド)パッケージを示すものである。
The stacked semiconductor device according to the present invention is formed by stacking a plurality of semiconductor chips in a housing substrate. In this embodiment, a plurality of IC chips are stacked to form one package. FIG. 1 particularly shows a stacked package using four IC chips.

【0027】図1を参照する。本実施の形態例における
基板1は、基板101〜106を接合して、一体的に形
成されたものである。基板1の内部は、複数の半導体チ
ップ31〜34を配設できる収納空間となっており、よ
ってこの基板1は内部収納(インターポーザー)基板を
なしている。
Referring to FIG. The substrate 1 in the present embodiment is formed by joining the substrates 101 to 106 and integrally. The inside of the substrate 1 is a storage space in which a plurality of semiconductor chips 31 to 34 can be arranged, and thus the substrate 1 forms an internal storage (interposer) substrate.

【0028】この基板1は、底板をなす基板101上
に、最下段の半導体チップ31を配設する収納空間21
を中央に開口している下から2番目の基板102を積層
し、その上に、次の半導体チップ32を配設する収納空
間22を中央に開口している3番目の基板103を積層
し、さらにその上に、さらに次の半導体チップ33を配
設する収納空間23を中央に開口している4番目の基板
104を積層し、さらにその上にさらに次の(最上段
の)半導体チップ34を配設する収納空間24を中央に
開口している5番目の基板104を積層し、最表面に枠
をなす基板105を積層して、一体的に形成されてい
る。各基板101〜106は、半導体チップ31〜34
を配設する内部収納空間が階段状になる形態で形成さ
れ、各収納空間21〜24は、順次、底面側(図の下
側)から、広くなっている。本例において、各半導体チ
ップ31〜34は、ICチップである。
The substrate 1 has a storage space 21 on which a lowermost semiconductor chip 31 is disposed on a substrate 101 serving as a bottom plate.
Is laminated on the second substrate 102 from the bottom, which is opened at the center, and the third substrate 103, which is opened at the center on the storage space 22 for disposing the next semiconductor chip 32, is laminated thereon. On top of this, a fourth substrate 104 having a storage space 23 in which the next semiconductor chip 33 is disposed is opened at the center, and the next (topmost) semiconductor chip 34 is further placed thereon. A fifth substrate 104 having an opening at the center of the storage space 24 to be provided is laminated, and a substrate 105 forming a frame is laminated on the outermost surface to be integrally formed. Each of the substrates 101 to 106 includes a semiconductor chip 31 to 34
Is formed in a step-like form, and each of the storage spaces 21 to 24 is sequentially widened from the bottom side (the lower side in the figure). In this example, each of the semiconductor chips 31 to 34 is an IC chip.

【0029】本例においてこのように構成される基板1
の階段状の構造は、各段の位置が、搭載する半導体チッ
プの上面と、ほぼ同一面になるように構成されている。
すなわち、基板102の上面(基板102が構成する
段)は、半導体チップ31の上面とほぼ同一面上にあ
り、基板103の上面(基板103が構成する段)は、
半導体チップ32の上面とほぼ同一面上にあり、基板1
04の上面(基板104が構成する段)は、半導体チッ
プ33の上面とほぼ同一面上にあり、基板105の上面
(基板105が構成する段)は、半導体チップ34の上
面とほぼ同一面上にあるようにする。
In the present embodiment, the substrate 1 thus configured
Is configured such that the position of each step is substantially flush with the upper surface of the semiconductor chip to be mounted.
That is, the upper surface of the substrate 102 (the step formed by the substrate 102) is substantially flush with the upper surface of the semiconductor chip 31, and the upper surface of the substrate 103 (the step formed by the substrate 103)
Substantially on the same plane as the upper surface of the semiconductor chip 32,
The upper surface of the substrate 04 (the step formed by the substrate 104) is substantially flush with the upper surface of the semiconductor chip 33, and the upper surface of the substrate 105 (the step formed by the substrate 105) is substantially flush with the upper surface of the semiconductor chip 34. As in

【0030】基板1の材料は任意であり、たとえば、セ
ラミックでも、有機基板でもよく、特に材料を問わな
い。
The material of the substrate 1 is arbitrary, and may be, for example, a ceramic or an organic substrate.

【0031】上記構造のあらかじめ一体的に形成された
基板1を用いて、次のように半導体チップ31〜34を
搭載し、積層型半導体装置を形成する。
The semiconductor chips 31 to 34 are mounted on the substrate 1 having the above-mentioned structure, which is formed integrally in advance, to form a stacked semiconductor device as follows.

【0032】基板102の中央のチップ収納空間21の
底面(基板101の上面中央部に相当)に、接着用のダ
イペースト61を塗布する。ここに半導体チップ31
(第1のICチップ)をマウントする。マウント後に、
ダイペースト61をキュアして、半導体チップ31(第
1のICチップ)を仮固定する。
A die paste 61 for bonding is applied to the bottom surface of the chip storage space 21 at the center of the substrate 102 (corresponding to the center of the upper surface of the substrate 101). Here is the semiconductor chip 31
(First IC chip) is mounted. After mounting,
The die paste 61 is cured, and the semiconductor chip 31 (first IC chip) is temporarily fixed.

【0033】半導体チップ31(第1のICチップ)の
パッド71と、基板102のランド81を、ワイヤー4
1にて接続する。封止樹脂91を、該ワイヤー41(第
1のICチップのワイヤー)が覆われるまで注入する。
このとき、封止樹脂91は、その上の基板103の上面
には、全く載ることがないように留意する。
The pads 71 of the semiconductor chip 31 (first IC chip) and the lands 81 of the substrate 102 are
Connect with 1. The sealing resin 91 is injected until the wires 41 (the wires of the first IC chip) are covered.
At this time, care should be taken that the sealing resin 91 does not rest on the upper surface of the substrate 103 thereon.

【0034】樹脂注入後、真空脱泡を行い、封止樹脂9
1のエアーを除去する。その後キュアして、封止樹脂9
1を仮硬化させる。
After the resin is injected, vacuum defoaming is performed, and the sealing resin 9 is removed.
1. Remove the air. After curing, the sealing resin 9
1 is pre-cured.

【0035】この封止樹脂91の上面が、次の半導体チ
ップ32(第2のICチップ)の搭載面になる。基板1
が段状に形成されているので、次の半導体チップ32
(第2のICチップ)の搭載面は、上記半導体チップ3
1(第1のICチップ)の搭載面より広くなっている。
The upper surface of the sealing resin 91 becomes a mounting surface for the next semiconductor chip 32 (second IC chip). Substrate 1
Are formed in steps, so that the next semiconductor chip 32
The mounting surface of the (second IC chip) is the semiconductor chip 3
1 (first IC chip).

【0036】すなわち上記封止樹脂91の上面中央部
に、ダイペースト62を塗布する。ここに半導体チップ
32(第2のICチップ)をマウントする。マウント後
に、ダイペースト62をキュアして、半導体チップ32
(第2のICチップ)を仮固定する。
That is, the die paste 62 is applied to the center of the upper surface of the sealing resin 91. Here, the semiconductor chip 32 (second IC chip) is mounted. After the mounting, the die paste 62 is cured, and the semiconductor chip 32 is cured.
(Second IC chip) is temporarily fixed.

【0037】半導体チップ32(第2のICチップ)の
パッド72と、基板103のランド82を、ワイヤー4
2にて接続する。封止樹脂92を、該ワイヤー42(第
2のICチップのワイヤー)が覆われるまで注入する。
このとき、封止樹脂92は、その上の基板104の上面
には、全く載ることがないように留意する。
The pad 72 of the semiconductor chip 32 (second IC chip) and the land 82 of the substrate 103 are connected to the wire 4
Connect with 2. The sealing resin 92 is injected until the wires 42 (the wires of the second IC chip) are covered.
At this time, care should be taken that the sealing resin 92 does not rest on the upper surface of the substrate 104 thereon.

【0038】樹脂注入後、真空脱泡を行い、封止樹脂9
2のエアーを除去する。その後キュアして、封止樹脂9
2を仮硬化させる。
After injecting the resin, vacuum defoaming is performed, and the sealing resin 9 is removed.
2. Remove the air. After curing, the sealing resin 9
2 is temporarily cured.

【0039】上記半導体チップ32(第2のICチッ
プ)の搭載作業と同様にして、半導体チップ33,34
(第3のICチップ及び第4のICチップ)の搭載を行
う。すなわち、上記と同様の積み重ね動作を繰り返し
て、積み重ね半導体装置を形成する。符号63,64で
各半導体チップ33,34接合用のダイペーストを示
し、73,74で各半導体チップ33,34のパッド、
83,84で基板104,105のランド、43,44
でワイヤー、93,94で封止樹脂を示す。
In the same manner as the mounting operation of the semiconductor chip 32 (second IC chip), the semiconductor chips 33 and 34
(A third IC chip and a fourth IC chip) are mounted. That is, the same stacking operation as described above is repeated to form a stacked semiconductor device. Reference numerals 63 and 64 indicate die pastes for bonding the semiconductor chips 33 and 34, reference numerals 73 and 74 indicate pads of the semiconductor chips 33 and 34,
Lands of the substrates 104 and 105 at 83 and 84, 43 and 44
Indicates a wire, and 93 and 94 indicate a sealing resin.

【0040】最上段の半導体チップ34(第4のICチ
ップ)の封止樹脂94を注入後、表面をスキージングす
る。スキージング後、得られたパッケージ全体をキュア
して、積層型ICパッケージを得る。
After injecting the sealing resin 94 of the uppermost semiconductor chip 34 (fourth IC chip), the surface is squeezed. After the squeezing, the entire obtained package is cured to obtain a laminated IC package.

【0041】なお図1中、符号7はランド、8は補強ラ
ンド、9は加工のため必要に応じて形成するレジストで
ある。
In FIG. 1, reference numeral 7 denotes a land, 8 denotes a reinforcing land, and 9 denotes a resist formed as required for processing.

【0042】本例によれば、半導体チップ31〜34を
配設する収納中空21〜24は、底面側から順次広くな
って、先の半導体チップの搭載位置の上面が、その上段
に位置するチップに対するフリーな搭載面を供給するこ
とで、チップサイズの制約をほとんど免れることができ
る。よって半導体チップ(ICチップ)のサイズに影響
を受けることなく、複数の積層化が可能となる。パッド
エリヤの制約や、ワイヤーの制約も、ほとんど受けな
い。ワイヤーの錯綜の防止が容易で、ワイヤー同士の接
触の問題が回避できる。
According to the present embodiment, the storage cavities 21 to 24 in which the semiconductor chips 31 to 34 are disposed are sequentially widened from the bottom surface side, and the upper surface of the mounting position of the semiconductor chip is located at the upper position. By providing a free mounting surface for, the limitations on chip size can be almost eliminated. Therefore, a plurality of layers can be stacked without being affected by the size of the semiconductor chip (IC chip). Almost no restrictions on pad area or wire. It is easy to prevent the wires from being complicated, and the problem of contact between the wires can be avoided.

【0043】かつあらかじめ基板1は一体的に形成され
ており、半導体チップ31〜34搭載の際に基板の接合
を行うような煩雑な工程が不要である。ICチップ等半
導体チップの多段積層化が単一の一体化基板を用いて可
能であり、多段階層化の工程が簡素化できる。4段を超
える多段の階層化も容易に可能となる。
In addition, since the substrate 1 is formed integrally in advance, a complicated process for bonding the substrates when mounting the semiconductor chips 31 to 34 is not required. Multi-layer stacking of semiconductor chips such as IC chips is possible using a single integrated substrate, and the process of multi-layering can be simplified. Hierarchy of more than four levels can be easily achieved.

【0044】また、マザー基板への実装面積の大幅に削
減することが可能となる。複数の半導体チップ(ICチ
ップ等)の積層化により、ICパッケージ等の小型化を
図ることができ、モバイル機器等の小型化にも役立つ。
Further, it is possible to greatly reduce the mounting area on the mother board. By stacking a plurality of semiconductor chips (IC chips and the like), miniaturization of an IC package and the like can be achieved, which is useful for miniaturization of a mobile device and the like.

【0045】複数の半導体チップ(ICチップ等)の積
層化により、マザー実装加工費が削減できるという効果
もある。
By laminating a plurality of semiconductor chips (IC chips and the like), there is also an effect that mother mounting processing cost can be reduced.

【0046】[0046]

【発明の効果】上述したように、本発明の積層型半導体
装置の製造方法、及び積層型半導体装置によれば、積層
すべき半導体チップのサイズの制約が少なく、たとえば
複数の異なったサイズのチップを複数段積み重ねること
も、または同サイズのチップを複数段積み重ねることも
ことも可能で、多段積層が容易に実現できると言う効果
が発揮できる。
As described above, according to the method for manufacturing a stacked semiconductor device and the stacked semiconductor device of the present invention, the size of semiconductor chips to be stacked is less restricted, and for example, a plurality of chips of different sizes are stacked. Can be stacked in a plurality of stages, or chips of the same size can be stacked in a plurality of stages, and the effect that multi-stage stacking can be easily realized can be exhibited.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明の実施の形態例1に係る積層型半導体
装置の断面図である。
FIG. 1 is a cross-sectional view of a stacked semiconductor device according to a first embodiment of the present invention.

【図2】 本発明に係る積層型半導体装置に用いること
ができる基板の構成例を示す構成図である。
FIG. 2 is a configuration diagram illustrating a configuration example of a substrate that can be used in a stacked semiconductor device according to the present invention.

【図3】 本発明に係る積層型半導体装置の構成例を示
す一部断面図である。
FIG. 3 is a partial cross-sectional view illustrating a configuration example of a stacked semiconductor device according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・基板、2・・・基板の内部中空(チップ配設空
間)、21〜24・・・(半導体チップの各)配設空
間、31〜34・・・半導体チップ(ICチップ)、4
1〜44・・ワイヤー。
1 ... substrate, 2 ... hollow inside the substrate (chip arrangement space), 21 to 24 ... (each semiconductor chip) arrangement space, 31 to 34 ... semiconductor chip (IC chip), 4
1-44. Wire.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップを複数段積み重ねて積層型
半導体装置を形成する積層型半導体装置の製造方法であ
って、 内部中空の収納基板中に複数の半導体チップを積み重ね
るとともに、 前記基板の中空は、底面側から順次、半導体チップ配設
空間が広くなっており、 かつ該基板はあらかじめ一体的に形成されていることを
特徴とする積層型半導体装置の製造方法。
1. A method for manufacturing a stacked semiconductor device, comprising stacking a plurality of semiconductor chips to form a stacked semiconductor device, comprising: stacking a plurality of semiconductor chips in an internal hollow storage substrate; A semiconductor chip mounting space is gradually increased from the bottom side, and the substrate is formed integrally in advance.
【請求項2】 前記基板の半導体チップ配設空間は、配
設する半導体チップの数に応じた段状になっていること
を特徴とする請求項1に記載の積層型半導体装置の製造
方法。
2. The method according to claim 1, wherein the semiconductor chip mounting space of the substrate has a stepped shape corresponding to the number of semiconductor chips to be mounted.
【請求項3】 前記複数の半導体チップの配設は、各段
毎に半導体チップを搭載して配設することを繰り返し
て、複数の半導体チップの積み重ねを行うことを特徴と
する請求項1に記載の積層型半導体装置の製造方法。
3. The method according to claim 1, wherein the step of arranging the plurality of semiconductor chips includes stacking the plurality of semiconductor chips by repeating mounting and arranging the semiconductor chips in each stage. A manufacturing method of the stacked semiconductor device according to the above.
【請求項4】 半導体チップが複数段積み重ねられて形
成された積層型半導体装置であって、 複数の半導体チップが内部中空の収納基板中に積み重ね
られて形成されており、 前記基板の中空は、底面側から順次、半導体チップ配設
空間が広くなっており、 かつ該基板は一体的に形成されていることを特徴とする
積層型半導体装置。
4. A stacked semiconductor device formed by stacking a plurality of semiconductor chips in a plurality of stages, wherein a plurality of semiconductor chips are stacked in a storage substrate having a hollow inside, and the hollow of the substrate is: A stacked semiconductor device, wherein the space for disposing a semiconductor chip is gradually increased from the bottom side, and the substrate is formed integrally.
【請求項5】 前記基板の半導体チップ配設空間は、配
設する半導体チップの数に応じた段状になっていること
を特徴とする請求項4に記載の積層型半導体装置。
5. The stacked semiconductor device according to claim 4, wherein the semiconductor chip mounting space of the substrate has a stepped shape corresponding to the number of semiconductor chips to be mounted.
JP2000023747A 2000-02-01 2000-02-01 Laminated semiconductor device and method of manufacturing the same Abandoned JP2001217384A (en)

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US7615413B2 (en) 2005-03-28 2009-11-10 Kabushiki Kaisha Toshiba Method of manufacturing stack-type semiconductor device and method of manufacturing stack-type electronic component
US7629695B2 (en) 2004-05-20 2009-12-08 Kabushiki Kaisha Toshiba Stacked electronic component and manufacturing method thereof
JP2011176279A (en) * 2010-01-27 2011-09-08 Honeywell Internatl Inc Multilayer integrated circuit package
CN108417556A (en) * 2018-05-23 2018-08-17 奥肯思(北京)科技有限公司 Multichip stacking encapsulation structure

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US7629695B2 (en) 2004-05-20 2009-12-08 Kabushiki Kaisha Toshiba Stacked electronic component and manufacturing method thereof
US8008763B2 (en) 2004-05-20 2011-08-30 Kabushiki Kaisha Toshiba Stacked electronic component and manufacturing method thereof
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US9024424B2 (en) 2004-05-20 2015-05-05 Kabushiki Kaisha Toshiba Stacked electronic component and manufacturing method thereof
US7615413B2 (en) 2005-03-28 2009-11-10 Kabushiki Kaisha Toshiba Method of manufacturing stack-type semiconductor device and method of manufacturing stack-type electronic component
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