JP2001210872A - Semiconductor light emitting device and manufacturing method thereof - Google Patents

Semiconductor light emitting device and manufacturing method thereof

Info

Publication number
JP2001210872A
JP2001210872A JP2000017475A JP2000017475A JP2001210872A JP 2001210872 A JP2001210872 A JP 2001210872A JP 2000017475 A JP2000017475 A JP 2000017475A JP 2000017475 A JP2000017475 A JP 2000017475A JP 2001210872 A JP2001210872 A JP 2001210872A
Authority
JP
Japan
Prior art keywords
led chip
phosphor
housing
emitting device
light emitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000017475A
Other languages
Japanese (ja)
Inventor
Yasuhiko Matsushita
保彦 松下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Original Assignee
Tokyo Sanyo Electric Co Ltd
Tottori Sanyo Electric Co Ltd
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Sanyo Electric Co Ltd, Tottori Sanyo Electric Co Ltd, Sanyo Electric Co Ltd filed Critical Tokyo Sanyo Electric Co Ltd
Priority to JP2000017475A priority Critical patent/JP2001210872A/en
Publication of JP2001210872A publication Critical patent/JP2001210872A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/49Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
    • H01L2224/491Disposition
    • H01L2224/49105Connecting at different heights
    • H01L2224/49107Connecting at different heights on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

Abstract

PROBLEM TO BE SOLVED: To prevent a semiconductor light emitting device in which light emission characteristics of a phosphor is identical in any area of the phosphor. SOLUTION: This semiconductor light emitting device consists of a cabinet 200 of which the section is of an almost recessed shape and is provided with a hole part 220 in a recessed part 210, an LED chip 230 fit in the hole part 220, and a phosphor 260 formed on the top of the LED chip 230 and at the bottom of the recessed part 210. In the semiconductor light emitting device, the top of the LED chip 230 and the bottom of the recessed part 210 are located on almost the same plane.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は半導体発光装置及びその
製造方法に関する。
The present invention relates to a semiconductor light emitting device and a method for manufacturing the same.

【0002】[0002]

【従来の技術】半導体発光装置の一つにLED(Lig
ht Emitting Diode)発光装置があ
る。
2. Description of the Related Art One of semiconductor light emitting devices is an LED (Lig).
HT Emitting Diode) light emitting devices.

【0003】前記LED発光装置は、小型で効率良く光
を発光する為パーソナルコンピュータ等の電子機器から
電光掲示板や信号器などの光源として幅広い分野で使用
されている。
[0003] The LED light emitting devices are used in a wide range of fields as electronic devices such as personal computers and light sources such as electric bulletin boards and traffic lights in order to emit light efficiently with small size.

【0004】又、最近では赤色や青色だけでなく白色の
光を発光するLEDに関する様々な技術が提案されてい
る。
[0004] Recently, various technologies relating to LEDs that emit white light as well as red and blue light have been proposed.

【0005】例えば、特開平11−40858号公報で
は、断面が略凹型の筐体凹部中央に青色発光のLEDチ
ップを接着し、前記LEDチップ上面と該LEDチップ
を除く凹部底面に蛍光物質を付着させることにより、前
記LEDチップから発光された青色光を前記蛍光物質で
波長変換させ、白色光を発光させる技術が開示されてい
る。
For example, in Japanese Patent Application Laid-Open No. 11-40858, a blue-emitting LED chip is adhered to the center of a housing recess having a substantially concave cross section, and a fluorescent substance is attached to the top surface of the LED chip and the bottom surface of the recess excluding the LED chip. A technique is disclosed in which the wavelength of blue light emitted from the LED chip is converted by the fluorescent substance to emit white light.

【0006】前記従来の発光装置について具体的に以下
に説明する。
The above-mentioned conventional light emitting device will be specifically described below.

【0007】図2は、前記従来のLED発光装置の断面
図である。
FIG. 2 is a sectional view of the conventional LED light emitting device.

【0008】図2において、断面が略凹型の筐体100
凹部110中央には、LEDチップ120が接着剤で接
着されており、前記LEDチップ120は、絶縁基板上
に例えばGaNからなるN型導電性を有するコンタクト
層と、ノンドープ型InGANからなる活性層と、Ga
NからなるP型導電性を有するクラッド層と、GaNか
らなるP型導電性を有するコンタクト層とを順に積層さ
せた構造である。
In FIG. 2, a housing 100 having a substantially concave cross section is shown.
At the center of the recess 110, an LED chip 120 is adhered with an adhesive. The LED chip 120 has an N-type conductive contact layer made of, for example, GaN, and an active layer made of non-doped InGAN on an insulating substrate. , Ga
This is a structure in which a cladding layer made of N and having P-type conductivity and a contact layer made of GaN and having P-type conductivity are sequentially laminated.

【0009】又、前記LEDチップ120の上面と前記
LEDチップ120を除く前記筐体凹部110底面には
蛍光体130が付着されており、さらに、凹部110に
は樹脂が充満されている。
A phosphor 130 is attached to the upper surface of the LED chip 120 and the bottom surface of the housing recess 110 except for the LED chip 120, and the recess 110 is filled with resin.

【0010】前記発光装置を形成する際には、先ず、接
着剤により筐体凹部110中央にLEDチップ120を
接着すると共に、前記筐体凹部110を除く筐体100
上面上にレジストマスクを形成する。このようにして形
成した複数の筐体100を容器内に入れ、蛍光体と例え
ばSiO2からなるゾルを混ぜ合わせたものを前記容器
へと注入する。
When forming the light emitting device, first, the LED chip 120 is bonded to the center of the housing recess 110 with an adhesive, and the housing 100 excluding the housing recess 110 is attached.
A resist mask is formed on the upper surface. The plurality of housings 100 thus formed are put in a container, and a mixture of a phosphor and a sol made of, for example, SiO 2 is injected into the container.

【0011】その後、放置しておくと前記ゾル内の蛍光
体130が、凹部110底面を除く筐体100上面に沈
降する。
Thereafter, when the phosphor is left as it is, the phosphor 130 in the sol sinks on the upper surface of the housing 100 except for the bottom surface of the recess 110.

【0012】続いて容器内の廃液を除去しLEDチップ
120上に粒子状蛍光体が堆積した筐体100を120
度に加熱した空気で乾燥させLEDチップ120上面と
筐体凹部110底面以外に付着した蛍光体130をレジ
ストマスクごと除去することによってLEDチップ12
0上面と該LEDチップ120を除く筐体凹部110底
面に蛍光体130を形成する。
Next, the waste liquid in the container is removed, and the casing 100 in which the particulate phosphor has been deposited on the LED chip 120 is moved to 120.
The phosphor 130 attached to the LED chip 120 and the bottom of the housing recess 110 together with the resist mask are removed by drying with heated air, and the LED chip 12 is removed.
The phosphor 130 is formed on the upper surface and the bottom surface of the housing recess 110 excluding the LED chip 120.

【0013】最後にLEDチップ120や蛍光体130
を埃等から保護する為に筐体の凹部110に透光性のエ
ポキシ樹脂を流し込み硬化させることにより、蛍光体を
用いたLED発光装置が完成する。
Finally, the LED chip 120 and the phosphor 130
An LED light-emitting device using a phosphor is completed by pouring a transparent epoxy resin into the concave portion 110 of the housing and hardening the same to protect the device from dust and the like.

【0014】尚、前記筐体100下方には、外部から前
記LEDチップ120のp型層又はn型層へと電流を流
す為の外部電極150が形成されている。
An external electrode 150 for passing a current from the outside to the p-type layer or the n-type layer of the LED chip 120 is formed below the housing 100.

【0015】[0015]

【発明が解決しようとする課題】前記従来の半導体発光
装置では、上記筐体凹部110底面中央からLEDチッ
プ120が突出するように形成されている。又、上記筐
体凹部110底面に蛍光体130を形成する際には、前
記筐体100が複数個配置された容器中に、蛍光体13
0と例えばSiO2からなるゾルを混ぜ合わせたものを
注入している。
In the conventional semiconductor light emitting device, the LED chip 120 is formed so as to protrude from the center of the bottom surface of the housing recess 110. When the phosphor 130 is formed on the bottom surface of the housing recess 110, the phosphor 13 is placed in a container in which a plurality of the housings 100 are arranged.
A mixture of 0 and a sol made of, for example, SiO 2 is injected.

【0016】この為、前記LEDチップ120上面と該
LEDチップ120を除く筐体凹部110底面に蛍光体
130が沈着するまでにゾルの僅かな対流により、筐体
凹部110から突出したLEDチップ120上面の蛍光
体の厚さが場所により不均一となり易い。
Therefore, the sol is slightly convected before the phosphor 130 is deposited on the upper surface of the LED chip 120 and the bottom surface of the housing recess 110 excluding the LED chip 120, and the upper surface of the LED chip 120 protruding from the housing recess 110. The thickness of the phosphor tends to be uneven depending on the location.

【0017】その為、LEDチップ120上面内で蛍光
体の配された場所により、発光色が異なるという問題が
発生する。
Therefore, there arises a problem that the luminescent color differs depending on the location of the phosphor on the upper surface of the LED chip 120.

【0018】その結果、前記半導体発光装置から放射さ
れる光の波長が同一の半導体装置内でも位置により異な
り、所望の発光色を得ることが困難である。
As a result, the wavelength of the light emitted from the semiconductor light emitting device differs depending on the position even within the same semiconductor device, and it is difficult to obtain a desired emission color.

【0019】又、前記筐体凹部110から前記LEDチ
ップ120が突出している為に、前記筐体凹部110底
面の位置によって前記LEDチップ120の活性層から
前記筐体凹部110底面までの距離(光路長)に差が生
じ、前記筐体凹部110底面に形成された蛍光体130
から発光される光の色相にばらつきが生じる。
Also, since the LED chip 120 protrudes from the housing recess 110, the distance from the active layer of the LED chip 120 to the bottom of the housing recess 110 (optical path) depends on the position of the bottom of the housing recess 110. The phosphor 130 formed on the bottom surface of the housing recess 110.
The hue of the light emitted from the light source varies.

【0020】[0020]

【課題を解決するための手段】請求項1記載の半導体発
光装置は、LEDチップと、上面に略凹状の凹部を有す
る筐体と、前記凹部に配され前記LEDチップからの光
を吸収し波長変換して発光する蛍光体とを有し、前記凹
部底面には穴部が形成されており、前記LEDチップ上
面と前記筐体凹部底面は略同一平面上となるように、前
記穴部に前記LEDチップを配置したことを特徴とす
る。
According to a first aspect of the present invention, there is provided a semiconductor light emitting device, comprising: an LED chip; a housing having a substantially concave concave portion on an upper surface; A phosphor that converts and emits light, wherein a hole is formed in the bottom of the recess, and the LED chip upper surface and the housing recess bottom are substantially coplanar with each other in the hole. It is characterized in that an LED chip is arranged.

【0021】請求項2記載の半導体発光装置の製造方法
は、LEDチップと、上面に前記LEDチップを配置す
る為の穴部が形成された略凹状の凹部を有した筐体と、
前記LEDチップから送出された光を吸収し波長変換す
る蛍光体と、を有する半導体発光装置の形成方法であっ
て、前記筐体の穴部に前記LEDチップを嵌め込む第1
の工程と、蛍光体を含有した粘性の低い樹脂モールドを
前記筐体の凹部に流し込む第2の工程と、前記樹脂モー
ルド中に含まれた蛍光体を前記LEDチップ上面と前記
筐体凹部底面に沈降させる第3の工程と、を有すること
を特徴とする。
According to a second aspect of the present invention, there is provided a method for manufacturing a semiconductor light emitting device, comprising: a housing having an LED chip; and a substantially concave recess having a hole for disposing the LED chip on an upper surface;
A phosphor that absorbs light sent from the LED chip and converts the wavelength of the light emitted from the LED chip, wherein the first LED chip is fitted into a hole of the housing.
And a second step of pouring a low-viscosity resin mold containing a phosphor into the recess of the housing, and placing the phosphor contained in the resin mold on the LED chip upper surface and the housing recess bottom surface. And a third step of sedimentation.

【0022】[0022]

【発明の実施の形態】図1は、本発明を適用してなる実
施例である半導体発光装置の断面図である。
FIG. 1 is a sectional view of a semiconductor light emitting device according to an embodiment to which the present invention is applied.

【0023】図1において、断面が略凹状の例えばポリ
カーボネート樹脂からなる筐体200の凹部210中央
には穴部220が形成されており、前記穴部220には
例えば青色発光のLEDチップ230が、該LEDチッ
プ230の上面と凹部210底面が同じ平面上となるよ
うに穴部220に嵌め込まれている。
In FIG. 1, a hole 220 is formed in the center of a concave portion 210 of a casing 200 made of, for example, a polycarbonate resin having a substantially concave cross section. The hole 220 is provided with, for example, an LED chip 230 for emitting blue light. The LED chip 230 is fitted into the hole 220 such that the upper surface of the LED chip 230 and the bottom surface of the concave portion 210 are on the same plane.

【0024】又、前記凹部210下方には、前記LED
チップ230に形成されたp型電極とn型電極に夫々電
気的に接続可能な第1の電極240と第2の電極250
が配置されている。
The LED is provided below the recess 210.
A first electrode 240 and a second electrode 250 electrically connectable to a p-type electrode and an n-type electrode formed on the chip 230, respectively;
Is arranged.

【0025】前記LEDチップ230上面と前記凹部2
10底面には例えばイットリウム・アルミニウム・ガー
ネット(YAG)系蛍光体からなる蛍光体260が形成
されており、前記凹部210には例えば透光性エポキシ
樹脂からなる樹脂270が充填されている。
The upper surface of the LED chip 230 and the recess 2
A phosphor 260 made of, for example, an yttrium-aluminum-garnet (YAG) -based phosphor is formed on the bottom surface 10, and the recess 210 is filled with a resin 270 made of, for example, a translucent epoxy resin.

【0026】次に、図1に示すLEDチップ230につ
いて具体的に以下に説明する。
Next, the LED chip 230 shown in FIG. 1 will be specifically described below.

【0027】前記LEDチップ230は、サファイア基
板上に例えばGaNからなるバッファ層を、該バッファ
層上にn型GaNクラッド層を、該n型GaNクラッド
層上にInGaN/GaNの周期的なヘテロ構造により
構成された多重量子井戸(MQW)構造のInGaN/G
aN活性層を、該InGaN/GaN活性層上にp型A
lGaNクラッド層を、該p型AlGaNクラッド層上
にp型GaNコンタクト層を設けた構造である。又、前
記p型GaNコンタクト層上には透明電極を介したp型
電極280が、前記n型GaN層の一部表面にはn型電
極290が形成されている。
The LED chip 230 has a buffer layer made of, for example, GaN on a sapphire substrate, an n-type GaN cladding layer on the buffer layer, and a periodic heterostructure of InGaN / GaN on the n-type GaN cladding layer. InGaN / G with multiple quantum well (MQW) structure composed of
An aN active layer is formed on the InGaN / GaN active layer by p-type A
This is a structure in which an lGaN cladding layer is provided on the p-type AlGaN cladding layer with a p-type GaN contact layer. A p-type electrode 280 is formed on the p-type GaN contact layer via a transparent electrode, and an n-type electrode 290 is formed on a partial surface of the n-type GaN layer.

【0028】次に、本実施例のLEDチップ230の製
造方法について以下に述べる。
Next, a method of manufacturing the LED chip 230 of this embodiment will be described below.

【0029】先ず、有機洗浄及び熱処理により洗浄した
サファイヤ基板上に、約600度の高温中でトリメチル
ガリウム(Ga(CH33)ガス、アンモニアガスを流
し、MOCVD法でGaNからなる薄膜のバッファ層を
形成する。
First, a trimethylgallium (Ga (CH 3 ) 3 ) gas and an ammonia gas are flowed at a high temperature of about 600 ° C. on a sapphire substrate cleaned by organic cleaning and heat treatment, and a GaN thin film buffer is formed by MOCVD. Form a layer.

【0030】続いて、基板温度を約1100度に保ち、
前記バッファ層上にトリメチルガリウム(Ga(C
33)ガス、アンモニアガス、ドーパントガスとして
SiH4を流すことにより、n型GaNクラッド層を形
成する。
Subsequently, the substrate temperature is maintained at about 1100 degrees,
Trimethylgallium (Ga (C
H 3) 3) gas, ammonia gas, by flowing SiH 4 as dopant gas, thereby forming an n-type GaN clad layer.

【0031】その後、アンモニア(NH3)と、トリメ
チルガリウム(Ga(CH33)ガスを流し込むことに
より、GaNからなる薄膜バリア層を形成し、続いて、
トリメチルガリウム(Ga(CH33)ガス、トリメチ
ルインジウム(In(CH33)ガス、アンモニアを流
し込むことによりIn0.35Ga0.65Nからなる量子井戸
層を形成する。
Thereafter, a thin film barrier layer made of GaN is formed by flowing ammonia (NH 3 ) and trimethylgallium (Ga (CH 3 ) 3 ) gas.
Trimethyl gallium (Ga (CH 3) 3) gas, trimethyl indium (In (CH 3) 3) to form a quantum well layer made of In 0.35 Ga 0.65 N by pouring gas, ammonia.

【0032】この時、前記GaNバリア層及び前記In
0.35Ga0.65N量子井戸層を同じ条件下で5層形成する
ことにより、In0.35Ga0.65NとGaNの周期的なヘ
テロ構造により構成された多重量子井戸(MQW)構造
のInGaN/GaN活性層が形成される。
At this time, the GaN barrier layer and the In
By forming five 0.35 Ga 0.65 N quantum well layers under the same conditions, an InGaN / GaN active layer having a multiple quantum well (MQW) structure composed of a periodic heterostructure of In 0.35 Ga 0.65 N and GaN is obtained. It is formed.

【0033】次に、前記InGaN/GaN活性層上で
トリメチルガリウム(Ga(CH33)ガス、トリメチ
ルアルミニウム(Al(CH33)ガス、アンモニア、
ドーパントガスとしてCP2Mgを流し込み、p型のA
lGaNクラッド層を形成する。
Next, a trimethyl gallium (Ga (CH 3 ) 3 ) gas, a trimethyl aluminum (Al (CH 3 ) 3 ) gas, ammonia,
CP 2 Mg is poured as a dopant gas, and p-type A
An lGaN cladding layer is formed.

【0034】その後、前記p型AlGaNクラッド層上
で、アンモニア(NH3)と、トリメチルガリウム(G
a(CH33)ガスと、ドーパントガスとしてCp2
gを流し込み、p型のGaNコンタクト層を形成する。
Thereafter, on the p-type AlGaN cladding layer, ammonia (NH 3 ) and trimethylgallium (G
a (CH 3 ) 3 ) gas and Cp 2 M as a dopant gas
g is poured to form a p-type GaN contact layer.

【0035】続いて、LEDチップ230に電極を形成
させるために、前記p型GaNコンタクト層上にエッチ
ングマスクを形成し、前記エッチングマスクが覆われて
いないn型GaNコンタクト層とInGaN/GaN活
性層とp型AlGaNクラッド層とp型GaNコンタク
ト層の一部を反応性イオンエッチングにより除去する。
Subsequently, in order to form electrodes on the LED chip 230, an etching mask is formed on the p-type GaN contact layer, and the n-type GaN contact layer and the InGaN / GaN active layer which are not covered with the etching mask are formed. And part of the p-type AlGaN cladding layer and the p-type GaN contact layer are removed by reactive ion etching.

【0036】その後、前記p型GaNコンタクト層上部
と前記エッチング処理により表面が露出したn型GaN
コンタクト層上部に夫々真空蒸着法などを用いてp型電
極280とn型電極290を形成する。
Then, the upper portion of the p-type GaN contact layer and the n-type GaN whose surface is exposed by the etching process.
A p-type electrode 280 and an n-type electrode 290 are formed on the contact layer by using a vacuum deposition method or the like.

【0037】尚、前記p型GaNコンタクト層上部のp
型電極280は例えばニッケルと金の合金からなり、前
記n型GaNコンタクト層上部のn型電極290はアル
ミニウム、シリコン、ニッケル、金等の合金で形成され
る。
It should be noted that the p-type GaN contact layer
The mold electrode 280 is made of, for example, an alloy of nickel and gold, and the n-type electrode 290 on the n-type GaN contact layer is made of an alloy of aluminum, silicon, nickel, gold, or the like.

【0038】このようにして発光ピーク波長460nm
の青色発光LEDチップ230が形成された。
Thus, the emission peak wavelength is 460 nm.
Blue light emitting LED chip 230 was formed.

【0039】次に、前記LEDチップ230を嵌め込ん
だ白色LED発光装置の製造方法について以下に説明す
る。
Next, a method of manufacturing a white LED light emitting device in which the LED chip 230 is fitted will be described below.

【0040】先ず、インサート成形により成形可能であ
り、断面が略凹形状である例えばポリカーボネート樹脂
からなる筐体200を形成し、前記筐体凹部210底面
に前記p型電極280と接続させる為の第1電極240
と、前記n型電極290と接続させる為の第2電極25
0を形成する。
First, a case 200 made of, for example, a polycarbonate resin, which can be formed by insert molding and has a substantially concave cross section, is formed, and a second portion for connecting the p-type electrode 280 to the bottom surface of the case concave portion 210 is formed. One electrode 240
And a second electrode 25 for connecting to the n-type electrode 290.
0 is formed.

【0041】次に、例えば絶縁性接着材を用いて前記筐
体200の穴部220にLEDチップ230を接着す
る。その後、チップ230のp型GaNコンタクト層に
形成されたp型電極280と第1電極240の間に例え
ば直径約20μmの導電性ワイヤを取り付け、チップの
n型GaNコンタクト層に形成されたn型電極290と
筐体の第2電極250の間に例えば直径約20μmの導
電性ワイヤを取り付ける。
Next, the LED chip 230 is bonded to the hole 220 of the housing 200 using, for example, an insulating adhesive. Thereafter, a conductive wire having a diameter of, for example, about 20 μm is attached between the p-type electrode 280 formed on the p-type GaN contact layer of the chip 230 and the first electrode 240, and the n-type formed on the n-type GaN contact layer of the chip is formed. For example, a conductive wire having a diameter of about 20 μm is attached between the electrode 290 and the second electrode 250 of the housing.

【0042】尚、前記ワイヤの材料としては、Au、A
l、Cuなどの金属又は合金を使用している。
The material of the wire is Au, A
Metals or alloys such as l and Cu are used.

【0043】続いて、例えば透光性エポキシ樹脂などか
らなる粘性の低い樹脂モールドにイットリウム・アルミ
ニウム・ガーネット(YAG)系蛍光体を混入したもの
を、前記筐体200の凹部210に注ぐ。続いて室温を
維持しながら放置し、前記蛍光体260を完全に前記筐
体200凹部210底面に沈降させる。
Subsequently, a mixture of a low-viscosity resin mold made of, for example, a translucent epoxy resin and a yttrium-aluminum-garnet (YAG) -based phosphor is poured into the recess 210 of the housing 200. Subsequently, the phosphor 260 is allowed to settle completely on the bottom surface of the concave portion 210 of the housing 200 while being left at room temperature.

【0044】最後に、前記透光性エポキシ樹脂を乾燥す
ることにより固める。
Finally, the translucent epoxy resin is hardened by drying.

【0045】このようにして製造したLED発光装置の
LEDチップ230を発光させると、前記LEDチップ
230からの光が前記凹部210底面に形成された蛍光
体260により黄色光に波長変換され、蛍光体260を
透過した青色光と混色して白色発光を得ることができ
た。
When the LED chip 230 of the LED light emitting device manufactured as described above emits light, the light from the LED chip 230 is wavelength-converted to yellow light by the phosphor 260 formed on the bottom surface of the concave portion 210, and the phosphor is converted to yellow light. White light was able to be obtained by mixing with the blue light transmitted through 260.

【0046】以上説明したように、本実施例のLED発
光装置は、筐体凹部210底面とLEDチップ230上
面が同一平面上となるように、LEDチップを筐体20
0に設けられた穴部220に埋め込んでいる。この為、
前記筐体凹部210底面と前記LEDチップ230上面
に同一厚さの蛍光体260を形成することができる。
As described above, in the LED light emitting device of this embodiment, the LED chip is mounted on the housing 20 such that the bottom surface of the housing recess 210 and the upper surface of the LED chip 230 are flush with each other.
It is embedded in a hole 220 provided in the “0”. Because of this,
A phosphor 260 having the same thickness may be formed on the bottom surface of the housing recess 210 and the top surface of the LED chip 230.

【0047】又、前記LEDチップ230上面の蛍光体
260はチップ上面内においても厚さを均一にすること
ができる。
Further, the phosphor 260 on the upper surface of the LED chip 230 can have a uniform thickness even in the upper surface of the chip.

【0048】その結果、従来技術の問題点である、チッ
プ上面内で蛍光体の配された場所により発光色が異なる
という問題を回避できる。
As a result, it is possible to avoid the problem of the prior art, that is, the problem that the emission color differs depending on the location of the phosphor on the upper surface of the chip.

【0049】又、前記LEDチップ230の活性層から
発光された光は前記LEDチップ230上面周辺にのみ
に照射される為、前記LEDチップ230の活性層から
前記蛍光体260への光路長は光束の全てにおいてほと
んど同一である。
Since the light emitted from the active layer of the LED chip 230 irradiates only the periphery of the upper surface of the LED chip 230, the optical path length from the active layer of the LED chip 230 to the phosphor 260 is luminous flux. Are almost identical in all of

【0050】その結果、従来技術の問題点である、チッ
プの側面方向において蛍光体の配された場所により発光
色相が異なるという問題も回避できる。
As a result, it is possible to avoid the problem of the prior art, that is, the problem that the emission hue differs depending on the location of the phosphor in the lateral direction of the chip.

【0051】更に、本実施例の半導体発光装置の形成方
法を用いることにより、簡単に筐体凹部210底面と前
記LEDチップ230上面に同一厚さの蛍光体260を
形成することができる。
Further, by using the method of forming a semiconductor light emitting device of this embodiment, the phosphor 260 having the same thickness can be easily formed on the bottom surface of the housing recess 210 and the upper surface of the LED chip 230.

【0052】尚、本実施例では、活性層が量子井戸構造
の青色発光LEDチップを用いたが、LEDチップの構
造はこの限りではない。
In this embodiment, a blue light emitting LED chip having a quantum well structure as an active layer is used, but the structure of the LED chip is not limited to this.

【0053】又、本実施例では、LEDチップ230の
基板として絶縁性を有するサファイア基板を用いたが、
前記基板に導電性の基板を用いることにより、前記LE
Dチップ230のp型電極280と前記導電性基板を、
夫々筐体200に取り付けられた第1電極240と第2
電極250に電気的に接続する構造にしても良い。
In this embodiment, a sapphire substrate having an insulating property is used as the substrate of the LED chip 230.
By using a conductive substrate for the substrate, the LE
The p-type electrode 280 of the D chip 230 and the conductive substrate
The first electrode 240 and the second electrode 240 attached to the housing 200, respectively.
A structure for electrically connecting to the electrode 250 may be employed.

【0054】[0054]

【発明の効果】本発明の半導体発光装置は、蛍光体を介
して発光された光の発光特性を発光に寄与する蛍光体の
全ての領域で同一とすることが可能である。
According to the semiconductor light emitting device of the present invention, it is possible to make the light emission characteristics of the light emitted through the phosphor the same in all the regions of the phosphor that contribute to the light emission.

【0055】又、本発明の半導体発光装置の製造方法
は、簡単な方法で、蛍光体を介して発光された光の発光
特性を発光に寄与する蛍光体の全ての領域で同一とする
半導体発光装置を製造することが可能である。
Further, the method for manufacturing a semiconductor light emitting device of the present invention is a simple method for making the light emission characteristics of light emitted via a phosphor the same in all regions of the phosphor contributing to light emission. It is possible to manufacture the device.

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明を適用してなる実施例装置の断面図で
ある。
FIG. 1 is a sectional view of an apparatus according to an embodiment to which the present invention is applied.

【図2】 従来の半導体発光装置の断面図である。FIG. 2 is a sectional view of a conventional semiconductor light emitting device.

【符号の説明】[Explanation of symbols]

100 筐体 110 凹部 120 LEDチップ 130 蛍光体 140 樹脂 150 外部電極 200 筐体 210 凹部 220 穴部 230 LEDチップ 240 第1電極 250 第2電極 260 蛍光体 270 樹脂 280 p型電極 290 n型電極 REFERENCE SIGNS LIST 100 housing 110 recess 120 LED chip 130 phosphor 140 resin 150 external electrode 200 housing 210 recess 220 hole 230 LED chip 240 first electrode 250 second electrode 260 phosphor 270 resin 280 p-type electrode 290 n-type electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 LEDチップと、上面に略凹状の凹部を
有する筐体と、前記凹部に配され前記LEDチップから
の光を吸収し波長変換して発光する蛍光体とを有し、 前記凹部底面には穴部が形成されており、前記LEDチ
ップ上面と前記筐体凹部底面は略同一平面上となるよう
に、前記穴部に前記LEDチップを配置したことを特徴
とする半導体発光装置。
1. An LED chip, a housing having a substantially concave concave portion on an upper surface, and a phosphor disposed in the concave portion for absorbing light from the LED chip and converting the wavelength to emit light, the concave portion comprising: A semiconductor light-emitting device, wherein a hole is formed in a bottom surface, and the LED chip is disposed in the hole such that an upper surface of the LED chip and a bottom surface of the housing recess are substantially coplanar.
【請求項2】 LEDチップと、上面に前記LEDチッ
プを配置する為の穴部が形成された略凹状の凹部を有し
た筐体と、前記LEDチップから送出された光を吸収し
波長変換する蛍光体と、を有する半導体発光装置の形成
方法であって、 前記筐体の穴部に前記LEDチップを嵌め込む第1の工
程と、蛍光体を含有した粘性の低い樹脂モールドを前記
筐体の凹部に流し込む第2の工程と、前記樹脂モールド
中に含まれた蛍光体を前記LEDチップ上面と前記筐体
凹部底面に沈降させる第3の工程と、を有することを特
徴とする半導体発光装置の製造方法。
2. A housing having an LED chip, a substantially concave recess formed with a hole for disposing the LED chip on an upper surface, and absorbing light transmitted from the LED chip to perform wavelength conversion. A method of forming a semiconductor light emitting device, comprising: a first step of fitting the LED chip into a hole of the housing; and forming a low-viscosity resin mold containing the phosphor on the housing. A semiconductor light emitting device comprising: a second step of pouring into a concave portion; and a third step of causing a phosphor contained in the resin mold to settle on the upper surface of the LED chip and the lower surface of the concave portion of the housing. Production method.
JP2000017475A 2000-01-26 2000-01-26 Semiconductor light emitting device and manufacturing method thereof Pending JP2001210872A (en)

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