JP2001188266A - Method for manufacturing cell for electrochromic mirror and electrochromic mirror - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a cell for an electrochromic mirror eliminating a sealing defect of a seal and suppressing the reduction of performance in the cell and to provide the electrochromic mirror using the cell. SOLUTION: The method for manufacturing the cell for the electrochromic mirror comprises a stage for applying an epoxy sealing agent on a prescribed position of a peripheral part on the surface of at least one conductive substrate of two sheets of conductive substrates, a stage for pre-curing the applied sealing agent before the two sheets of substrates are laminated and a stage for sticking the two sheets of substrates to each other by curing the sealing agent while the two sheets of substrates are laminated.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a cell used for manufacturing an electrochromic mirror capable of reversibly changing the reflectance with respect to electromagnetic waves such as light.
And an electrochromic mirror.

[0002]

2. Description of the Related Art Electrochromic anti-glare mirrors have been used to prevent the glare of headlights of rear vehicles by reversibly changing the reflectivity of electromagnetic waves. Demand is growing significantly. Electrochromic anti-glare mirrors generally include an electrolyte and, if necessary, an electrochromic compound in a cell with a structure in which the edges of two conductive substrates, a transparent conductive substrate and a reflective conductive substrate, are bonded together with a sealant. Manufactured by injection.

[0003] The performance required of the electrochromic anti-glare mirror is, of course, to be able to sufficiently prevent glare caused by the reflected light of the headlights of the rear vehicle. Sex demands are coming out. High durability, which is one of the above requirements, depends on the performance of the peripheral seal of the cell, which protects the electrochromic part (the part containing the electrochromic compound) inside the mirror by shielding it from the external environment. Very large. A curable resin such as an epoxy resin is usually used as a sealant. However, according to the study of the present inventors, in the conventional electrochromic anti-glare mirror, the seal failure due to blistering or cracking of the seal portion (sealing failure) was observed. Failure), the internal electrochromic portion was damaged, and the performance was found to be easily degraded.

Accordingly, an object of the present invention is to provide a method for manufacturing a cell for an electrochromic mirror which eliminates poor sealing of the seal and suppresses a decrease in performance inside the cell, and an electrochromic mirror using the cell. It is in.

[0005]

Means for Solving the Problems In the study of the present inventors,
It is considered that blisters and cracks in the seal portion that cause poor sealing are caused by degassing of the solvent and low molecular weight components contained in the sealant after the sealant has been cured. Particularly, in the electrochromic anti-glare mirror, since the width of the seal is relatively large and the distance between the two substrates is relatively large, the application amount of the sealant is large, and therefore, the degassing after the seal is very large. Become. The present inventors have found that by precuring the sealant such that degassing is sufficiently performed before the sealant is cured, the above-described sealing problems can be prevented, and have completed the present invention.

According to the present invention, there is provided a step of applying an epoxy-based sealant to a predetermined position on a peripheral edge of a surface of at least one of two conductive substrates, before the two conductive substrates are overlapped. A step of pre-curing the applied sealant,
Next, there is provided a method for manufacturing a cell for an electrochromic mirror, comprising a step of curing the two substrates in a state of being overlapped with each other and bonding the substrates together.

The present invention also provides an electrochromic mirror characterized in that an electrolyte is injected into the electrochromic mirror cell manufactured by the above method.

[0008]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A method for manufacturing an electrochromic mirror cell according to the present invention will be described below in the order of steps. First, an epoxy-based sealant is applied to a predetermined position on the peripheral edge on the surface of at least one of the two conductive substrates.

The conductive substrate will be described. The conductive substrate means a substrate that functions as an electrode. Therefore, the conductive substrate of the present invention includes a substrate in which the substrate itself is made of a conductive material and a laminated plate in which an electrode layer is laminated on one or both sides of a substrate having no conductivity to impart conductivity. You. Regardless of whether or not it has conductivity, it is necessary that the substrate itself has a smooth surface at room temperature, but the surface may be flat or curved. May be deformed. The two conductive substrates usually have the same shape, but may be different from each other. The thickness of the substrates is not particularly limited, but is usually 0.2 to 2.5 mm. One of the two conductive substrates used in the present invention is a transparent conductive substrate, and the other is a reflective conductive substrate capable of reflecting electromagnetic waves, typically light.

The transparent conductive substrate is usually manufactured by laminating a transparent electrode layer on a transparent substrate. Here, "transparent" means having a light transmittance of 10 to 100% in a visible light region. The material of the transparent substrate is not particularly limited, and may be, for example, colorless or colored glass or tempered glass, and may be colorless or colored transparent resin.
As the substrate material, specifically, polyethylene terephthalate, polyethylene naphthalate, other polyamides, polysulfone, polyethersulfone, polyetheretherketone, polyphenylenesulfide,
Polycarbonate, polyimide, polymethyl methacrylate and polystyrene can be used.

As the transparent electrode layer, for example, a metal thin film of gold, silver, chromium, copper and tungsten, or a conductive film made of a metal oxide can be used. Examples of the metal oxide include ITO (In ₂ O ₃ —SnO ₂ ), tin oxide, silver oxide, zinc oxide, and vanadium oxide. The thickness of the electrode layer is usually 10 to 500 nm, preferably 50 to 3 nm.
The surface resistance (R _sq : resistance per unit area) is usually in the range of 0.5 to 500 Ω / sq, preferably 1 to 50 Ω / sq. Known means can be arbitrarily adopted for the formation of the transparent electrode layer.

As the reflective conductive substrate usable in the present invention, for example, the following laminated body or plate-like body can be mentioned. (1) a laminate in which a reflective electrode layer is laminated on a transparent or opaque substrate having no conductivity; (2) a transparent electrode layer on one surface of a transparent substrate having no conductivity, and a laminate on the other surface. A laminate in which a reflective layer is laminated; (3) a laminate in which a reflective layer is laminated on a transparent substrate having no conductivity; and a transparent electrode layer on the reflective layer; And (5) a plate-like body in which the substrate itself has both functions of a light reflection layer and an electrode layer.

The above-mentioned reflective electrode layer means a thin film having a mirror surface and exhibiting an electrochemically stable function as an electrode. Examples of such a thin film include gold, platinum, tungsten, tantalum, rhenium, osmium,
Metal film of iridium, silver, nickel or palladium,
An alloy film of platinum-palladium, platinum-rhodium or stainless steel may be used. An arbitrary method, for example, a vacuum deposition method, an ion plating method, or a sputtering method can be appropriately employed for forming such a thin film having a mirror surface. The substrate on which the reflective electrode layer is provided may be transparent or opaque. Therefore, as the substrate on which the reflective electrode layer is provided, various non-transparent plastics, glass, wood, and stone materials can be used in addition to the transparent substrate exemplified above. If the reflective electrode layer itself has rigidity, the use of the substrate can be omitted. The reflection plate or the reflection layer means a substrate or a thin film having a mirror surface, for example, silver, chromium, aluminum,
Includes stainless or nickel-chromium plates and thin films thereof. Note that an electrochromic layer (an electrochromic compound layer or a layer containing the compound) may be formed over the conductive substrate.

The sealant used in the present invention is an epoxy-based sealant, and a sealant generally used for manufacturing a liquid crystal display or the like can be widely used.
The sealant may be either a thermosetting type or a photocuring type using ultraviolet light or visible light.

Examples of the epoxy sealant include bisphenol A type epoxy resin, bisphenol F type epoxy resin, biphenyl type epoxy resin, bisphenol S type epoxy resin, diphenyl ether type epoxy resin, dicyclopentadiene type epoxy resin, and bromine-containing bisphenol. F type epoxy resin, fluorine-containing bisphenol A type epoxy resin, orthocresol novolak type epoxy resin, DPP novolak type epoxy resin, trishydroxyphenylmethane type epoxy resin, tetraphenylolethane type epoxy resin, dicyclopentadiene phenol type epoxy resin, Glycidylamine type epoxy resin, glycidyl ester type epoxy resin, alicyclic type epoxy resin, urethane modified epoxy resin and silicon containing epoxy resin It is below.

Specific examples of the thermosetting type include a type which is cured only with an epoxy resin and a type which is cured by mixing with a curing agent. Catalyst curing agents are mixed in the type that cures only with an epoxy resin, and the types include, for example, benzylsulfonium salts, benzylammonium salts, pyridinium salts, benzylphosphonium salts, hydrazinium salts, carboxylic acid esters, and sulfones. Acid esters and amine imides. In addition, as a type of curing agent of a type that is cured by mixing with a curing agent,
For example, amine-based curing agents of diethylenetriamine, triethylenetetramine, mensendiamine, isophoronediamine, metaxylenediamine, diaminodiphenylmethane, metaphenylenediamine, diaminodiphenylsulfone, and polyamidoamine; methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride And acid anhydride-based curing agents of methylnadic anhydride; phenol-based curing agents of naphtholized phenolic resins, dicyclopentadienated phenolic resins, and styrenated phenolic resins. Further, as the heat latent curing agent, for example,
Dicyandiamide, adipic dihydrazide, imidazole compounds and epoxy-amine adducts.

Specific examples of the photocurable type include the epoxy resin described above, and an epoxy-modified acrylic resin obtained by reacting the epoxy resin with acrylic acid, methacrylic acid, crotonic acid, hexylacrylic acid, or cinnamic acid. Can be As a photo-curing catalyst for epoxy resin, for example,
Aryldiazonium salts, diaryliodonium salts,
Triarylsulfonium salts, β-ketosulfones, iminosulfonates and benzoinsulfonates. As a photo-curing catalyst for epoxy-modified acrylic resin,
For example, benzyl dimethyl ketal, α-hydroxy ketone and α-amino ketone can be mentioned.

The sealing agent may contain beads. The beads mainly serve to keep the distance between the substrates (cell gap) constant when two conductive substrates are bonded to each other. The particle size (average particle size) of the beads used is usually 20
0 to 20 μm, preferably 150 to 30 μm, more preferably 100 to 40 μm, particularly preferably 80 to 50 μm.
μm. The material of the beads is not particularly limited as long as it has an insulating property.For example, a glass material such as quartz or a blue plate, an acrylic or poly (propylene carbonate) -based or vinylbenzene-based resin material is used. be able to. The beads may be colorless or colored, and may be transparent or opaque.

When the beads are contained, the content of the beads in the sealant is preferably 0.01 to 1 in the sealant.
0 mass%, more preferably 0.05 to 5 mass%, particularly preferably 0.1 to 3 mass%. The sealant may contain a filler component such as alumina or silica. The viscosity of the epoxy sealant when including beads is
0.5 to 500 Pa. s is preferable,
More preferably 2 to 300 Pa. s, particularly preferably from 5 to 150 Pa.s. s.

The sealant is usually applied to a predetermined position on the peripheral edge on the surface of one conductive substrate. Of course, the sealant may be applied to the peripheral edges on both surfaces of the two conductive substrates.
In the case where a substrate provided with a conductive layer or the like is used as the conductive substrate, a sealant is applied to the peripheral edge on the surface on the conductive layer side. The conductive substrate may be provided with at least one opening in a sealed portion of the substrate for injecting an electrolyte or the like.

Although the two conductive substrates usually have the same shape as described above, in such a case, the two substrates are overlapped so that the upper and lower substrates are located at exactly the same position as each other. In the case of bonding, 0.2 to 10 from the edge of the substrate along the shape of the substrate at the peripheral edge on the surface of the conductive substrate.
The sealant may be applied to the position of mm. Alternatively, in a case where two conductive substrates are overlapped and bonded in a state where the upper and lower substrates are slightly displaced in a direction parallel to each other, the application position of the sealant may be adjusted according to the displaced direction and position.

The application of the sealant is performed by a known method, for example,
It can be performed by using a disk pen method or a screen method. It is preferable that both the dispensing method and the screen printing method are automatic coating methods. In the dispense method, it is preferable that the movement of the discharge port is controlled by a XY two-axis or XYZ three-axis control robot so that the liquid can be applied to a predetermined position on the peripheral portion of the substrate. Those that can be controlled are preferred.

The application of the sealant is preferably practically narrow in the seal width after the two conductive substrates are bonded together. The seal width after lamination is usually 2 mm or less, preferably 1.9 mm or less, more preferably 1.8 mm or less, and the lower limit is not particularly limited, but is usually 0.5 mm or more, preferably 0.8 mm or more. It is desirable to apply a sealant to the surface. By reducing the seal width, the size of the mirror case can be reduced, which is effective in reducing the weight of the mirror.

Next, the sealant applied before the two conductive substrates are overlapped is precured. Precuring in the present invention means that the sealant is in the process of curing, is crushed when the other substrate is bonded, and fits into the substrate,
That is, a state in which a sufficient adhesive force is developed by subsequent curing. Here, the term “sufficient adhesive strength” means that the adhesive strength between glass and glass is 1 MPa or more, preferably 5 MPa or more, and more preferably 10 MPa or more. Pre-curing removes the solvent and low molecular weight components, which are degassed components from the sealant, and reduces the occurrence of blisters and cracks in the seal due to degassing when curing after bonding two substrates. Can be prevented. Note that the adhesive strength referred to here is JIS K
It is a value measured according to 6850.

As a method of pre-curing the sealant,
A heating method is preferable, and specifically, the following method can be adopted as a preferable method. (1) The substrate on which the sealant has been applied is placed in an oven. (2) The substrate coated with the sealant is placed on a hot plate. (3) The substrate coated with the sealant is irradiated with a halogen lamp or an infrared or far-infrared lamp.

(1) Heating by Oven When an oven is used, a method in which a substrate is placed in an oven maintained at a certain temperature and a method in which the substrate is placed in an oven and then heated to a certain temperature are performed. Although there is a method of performing, any method may be used. Suitable temperature of the oven is usually 40-160 ° C, preferably 50-130 ° C,
More preferably, it is 60 to 100 ° C. When placed in an oven maintained at a constant temperature, the time of heating in the oven is appropriately selected depending on the type of sealing agent and the heating temperature, but is usually 1 minute to 180 minutes, preferably 5 minutes to 12 minutes.
0 minutes, more preferably 10 minutes to 100 minutes. In addition, when the temperature is raised to a certain temperature after being put in the oven, the heating rate is usually 0.5 to 10 ° C./min, preferably 1 to 7 ° C./min, more preferably 1 to 5 ° C./min. Yes,
After reaching a certain temperature, it may be kept at that temperature,
Usually, it may be held continuously for 180 minutes or less, preferably 120 minutes or less, more preferably 100 minutes or less, and 1 minute or more. In any case, after the heating is completed, it may be taken out of the oven immediately and cooled, or may be gradually cooled in the oven. The cooling rate for slow cooling is usually 0.5
-100 ° C / min, preferably 1-70 ° C / min, more preferably 1-50 ° C / min. Ovens that can be used include general drying ovens and ovens of the type that circulate hot air. Further, the inside of the oven can be set to an inert atmosphere such as nitrogen or argon in addition to an air atmosphere.

(2) Heating on a hot plate When using a hot plate, a method of placing a substrate on a hot plate maintained at a certain temperature and a method of placing a substrate on a hot plate are used. There is a method in which the temperature is raised to the temperature, and either method may be used. A suitable temperature of the hot plate is usually 40 to 200 ° C, preferably 50 to 150 ° C, more preferably 60 to 12 ° C.
0 ° C. When placed on a hot plate maintained at a constant temperature, the time for heating on the hot plate is usually 0.5 to 100 minutes, preferably 1 to 60 minutes, more preferably 2 to 30 minutes. Also, if the temperature rises to a certain temperature after being placed on a hot plate,
The heating rate is usually 0.5 to 100 ° C./min, preferably 1 to 100 ° C./min.
６０60 ° C./min, more preferably 1-30 ° C./min. After reaching a certain temperature, the temperature may be further maintained at that temperature. The time is usually 100 minutes or less, preferably 60 minutes.
It may be held continuously for not more than one minute, more preferably not more than 30 minutes, and not less than one minute. In any case, after heating is completed, it may be removed directly from the hot plate,
You may cool slowly on a hot plate. The cooling rate in the case of slow cooling is usually 0.5 to 120 ° C./min, preferably 1 to 7 ° C.
0 ° C./min, more preferably 1 to 50 ° C./min. The hot plate can be put in a bag of an inert atmosphere such as nitrogen or argon in addition to the air atmosphere.

(3) Heating by a halogen lamp or an infrared or far-infrared lamp In the case of irradiation with these lights, a method of irradiating a substrate with a lamp that is lit in a steady state and a method of illuminating the lamp on the substrate Is adjusted and the temperature is raised to a certain temperature, but any method may be used. When irradiating with a lamp that is lit in a steady state, the appropriate temperature of the substrate surface is usually 40 to 160 ° C, preferably 50 to 130 ° C,
More preferably, it is 60 to 100 ° C. The lamp irradiation time is usually 1 minute to 180 minutes, preferably 5 minutes to 12 minutes.
0 minutes, more preferably 10 minutes to 100 minutes. When raising the temperature to a certain temperature by adjusting the lamp illuminance, the heating rate is usually 0.5 to 10 ° C / minute, preferably 1 to 7 ° C.
/ Min, more preferably 1 to 5 ° C./min. After reaching a certain temperature, the temperature may be further maintained at that temperature.
Irradiation may be continued for 0 minute or less, preferably 120 minutes or less, more preferably 100 minutes or less, and 1 minute or more. In any case, the lamp irradiation may be stopped immediately after the heating is completed, or the lamp illuminance may be adjusted to gradually cool the lamp. The cooling rate in the case of slow cooling is usually 0.5 to 100 ° C.
/ Min, preferably 1 to 70 ° C / min, more preferably 1 to 70 ° C / min.
５０50 ° C./min. The atmosphere for irradiating the lamp can be an air atmosphere or an inert atmosphere such as nitrogen or argon.

One conductive substrate pre-cured with the sealant and the other conductive substrate are superposed on each other (on the conductive surface side in the case of a substrate provided with a conductive layer) to form two sheets of the conductive substrate. Attach the substrates. The superposition of two conductive substrates may be performed by placing the other (upper) substrate on the one (lower) substrate at the same position and superposing the two conductive substrates at a predetermined interval, or There is a case where the other (upper) substrate is shifted on the (lower) substrate and two conductive substrates are overlapped at a predetermined interval, but this is adjusted according to a target mirror.

The bonding is performed by curing the sealant. The curing conditions of the sealing agent are as follows:
It is appropriately selected depending on the type of the substrate and the like. For example, when a thermosetting sealant is used, the heating temperature is usually 80 to 20.
The temperature is 0 ° C., preferably 100 to 180 ° C., and the curing time is usually about 1 minute to 3 hours, preferably about 10 minutes to 2 hours. When a light-curable sealant is used, the light source may be a high-pressure mercury lamp, a fluorescent lamp, a xenon lamp, or the like. The amount of light irradiation is not particularly limited, but is usually 1
00 to 50000 mJ / cm ² , preferably 1000 to
It is about 20,000 mJ / cm ² .

The substrate arrangement when bonding the substrates is as follows:
The gap between the substrates, that is, the cell gap is not particularly limited, but is usually 20 to 200 μm.
m, preferably 30 to 150 μm, more preferably 4
0 to 100 μm. The cell gap is, for example,
It can be easily adjusted by adding beads to the sealing agent and selecting the particle size of the beads. In addition, a spacer having an arbitrary shape may be provided on the peripheral portion for adjusting the cell gap.

Through the above steps, a cell for an electrochromic mirror can be manufactured. By using the cell for an electrochromic mirror obtained by the present invention, it is possible to manufacture a high-performance electrochromic mirror.

Next, a method for manufacturing an electrochromic mirror using the electrochromic mirror cell of the present invention will be described. Known methods can be widely applied to the method for manufacturing the electrochromic mirror, and are not particularly limited.
For example, a liquid electrolyte or a liquid electrolyte composition further containing an electrochromic compound, if necessary, is injected into the cell for the electrochromic mirror through the opening, the opening is sealed, and the power supply is further turned off. The mirror can be easily manufactured by connecting the system and mounting the mirror case.

Further, a solid electrolyte precursor comprising a liquid electrolyte and a polymerizable monomer, or a solid electrolyte composition precursor further comprising an optional electrochromic compound in an electrochromic mirror cell, or After injecting the solid polymer electrolyte precursor, or a solid polymer electrolyte composition precursor further containing an optional component of an electrochromic compound, into the cell through the opening, the opening is sealed before or An all-solid-state mirror can be easily manufactured by forming an electrolyte by curing the precursor later, connecting a power supply system, and attaching a mirror case.

[0035]

According to the method for manufacturing a cell for an electrochromic mirror of the present invention, it is possible to prevent the occurrence of bubble swelling and cracking in the seal portion, and thus to eliminate poor sealing of the seal and to improve the performance inside the cell. Can be suppressed. As a result, a long-life electrochromic mirror with improved performance can be manufactured.

[0036]

EXAMPLES The present invention will be described in more detail with reference to the following examples, which should not be construed as limiting the invention thereto.

Example 1 To 20 g of a commercially available thermosetting epoxy adhesive (Structobond XN-21-S) was added 0.4 g of blue plate glass beads (particle size: 53 to 63 μm), kneaded well and sealed. (Viscosity of sealant: 40)
Pa · s). This was transferred to a 30 ml barrel for a dispenser and defoamed by a usual method. A discharge needle having a length of 13 mm and a diameter of 19 G (0.70 mm) was attached to the end of the barrel, and set in an XYZ three-axis control auto dispenser. A substrate (a glass transparent conductive substrate with an ITO layer) was fixed to a work base of an auto dispenser, and a sealing agent was applied at a nozzle sweep speed of 50 mm / sec, a discharge pressure of 0.2 MPa, and a distance of 0.5 mm between the discharge port and the substrate. It was applied along the shape of the substrate at the periphery. The substrate on which the sealant was applied was placed in a hot-air circulating type oven maintained at 80 ° C. and heated for 45 minutes. Then, it was directly taken out of the refrigerator and allowed to cool. The sealant was still in the process of curing, and was easily deformed when a local pressure was applied.

A separately prepared reflective conductive substrate was set on the substrate precured with the sealant while applying a slight pressure. At this time, the sealant was crushed and deformed. Thereafter, the set cell (sealant) was cured at 160 ° C. for 2 hours. After curing, it was not deformed even when a local pressure was applied, and the substrates were strongly adhered to each other and sealed. In the seal portion of the cell for an electrochromic anti-glare mirror manufactured in this manner, no blisters or cracks were generated.

Example 2 A sealant was applied to a substrate in the same manner as in Example 1, and the substrate coated with the sealant was placed on a hot plate maintained at 75 ° C. After 10 minutes, the substrate was directly removed from the plate and allowed to cool. The sealant was still in the process of curing, and was easily deformed when a local pressure was applied.

A separately prepared reflective conductive substrate was set on the substrate precured with the sealant while applying a slight pressure. At this time, the sealant was crushed and deformed. After that, the set cell (sealant)
The coating was cured by treating at 80 ° C. for 1 hour. After curing, it was not deformed even when a local pressure was applied, and the substrates were strongly adhered to each other and sealed. No bubbles and cracks were generated in the sealing portion of the electrochromic anti-glare mirror cell fabricated using the substrate precured with the sealing agent in this manner.

Example 3 2.0 g of acrylic resin beads (particle size: 63 to 75 μm) was added to 100 g of a commercially available thermosetting epoxy adhesive (Structbond XN-21-S), and the mixture was kneaded well and sealed. Was prepared (viscosity of sealant:
40 Pa · s). This sealant is placed on a screen printing plate of mesh (180), and the distance between the printing plate and the conductive substrate (material: blue plate, thickness: 1.1 mm, shape: round rectangle) is 1.3 mm, squeegee Screen printing was performed at a pressure of 0.2 MPa, a squeegee angle of 85 °, and a squeegee sweep speed of 10 mm / sec along the substrate shape at the periphery of the conductive substrate. The substrate coated with the sealant was placed under a halogen lamp, and the lamp was turned on. Five minutes later, the temperature of the substrate surface reached 95 ° C. Then, after the lamp irradiation was continued at 95 ° C. for 20 minutes, the lamp was turned off and the substrate was allowed to cool. The sealant was still in the process of curing, and was easily deformed when pressure was applied locally.

A separately prepared reflective conductive substrate was set on the substrate precured with the sealant while applying a slight pressure. At this time, the sealant was crushed and deformed. After that, the set cell (sealant)
The composition was cured by treating at 60 ° C. for 1.5 hours. After curing, it was not deformed even when a local pressure was applied, and the substrates were strongly adhered to each other and sealed. In this way, no blistering or cracking occurred in the sealing portion of the electrochromic anti-glare mirror produced using the substrate precured with the sealing agent.

Example 4 In the same manner as in Example 1, a sealing agent was applied to the periphery of the conductive substrate except for the opening for injecting the electrolyte precursor, to produce a cell for an electrochromic mirror. On the other hand, methoxypolyethylene glycol monomethacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd., M40G
N) 1.0 g, polyethylene glycol dimethacrylate (9G, manufactured by Shin-Nakamura Chemical Co., Ltd.) 0.02 g, γ
4.0 g of butyrolactone, 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane-1-
0.02 g, and 3- (5-methyl-2H-benzotriazol-2-yl) -5- (1-methylethyl)
In a mixed solution of 0.15 g of -4-hydroxybenzenepropanoic acid, lithium perchlorate was 0.8 M, diheptylviologen perchlorate was 30 mM, and ferrocene was 30 mM.
To obtain a homogeneous solution of a precursor of a solid polymer electrolyte composition containing an electrochromic compound. After this was injected through the opening of the cell, the opening was sealed, and the precursor of the solid polymer electrolyte composition was light-cured. Thereafter, electrodes and leads were attached, connected to a control circuit, and housed in a mirror case to produce an electrochromic anti-glare mirror. This mirror is 8
After leaving for 1000 hours in an atmosphere of 0 ° C., or for 70 hours in an atmosphere of −30 ° C. However, in any case, no change was observed in the sealed portion after standing, and the performance of the mirror was not changed at all from the initial stage.

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Go Tsuyoshi Asano 8 Chidori-cho, Naka-ku, Yokohama-shi, Kanagawa Pref. Nishiishi Mitsui Co., Ltd. (72) Inventor Yoshinori Nishitani Chidori, Naka-ku, Kanagawa No. 8 in the town Nishiishi Mitsui Co., Ltd. Central Research Laboratory F-term (reference) 2K001 AA10 CA02 CA04 CA08 CA09 CA42 CA45 DA19 DA21

Claims (2)

[Claims] 1. A step of applying an epoxy-based sealant to a predetermined position on an upper peripheral portion of at least one conductive substrate of two conductive substrates, wherein the epoxy-based sealant is applied before overlapping the two conductive substrates. A method for producing a cell for an electrochromic mirror, comprising: a step of pre-curing a sealant; and then a step of curing the two substrates in a state of being overlapped and bonding the substrates together. 2. An electrochromic mirror obtained by injecting an electrolyte into a cell manufactured by the method according to claim 1.