JP2001174622A - Method of manufacturing color filter and its manufacturing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a means to prevent such a problem as mixing of colors due to invasion of R, G, B pastes into adjacent pixel parts via horizontal lattices of a black matrix from occurring when the black matrix substrate is coated with the pastes in stripes. SOLUTION: The method of manufacturing a color filter is characterized by forming the black matrix parts placed on the both sides of a color pixel part toward the stripe direction as the highest parts and subsequently by forming a color coated film in stripes in the manufacturing method for the color filter forming the color coated film in stripes on the color pixel part in the black matrix on the substrate and the manufacturing device for this purpose is provided.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for manufacturing a color filter used in a liquid crystal color display device or the like.

[0002]

2. Description of the Related Art Conventionally known methods for producing a color filter include a pigment dispersion method, a dyeing method, a printing method and an electrodeposition method. However, in any of the manufacturing methods, the manufacturing process is complicated and the number of processes is large. In order to reduce costs, a manufacturing method of a color filter in which the manufacturing process is shortened is desired.

[0003] In particular, in the mainstream pigment dispersion method,
The same washing machine, coating machine, drying machine, and exposure machine are used to repeat at least the steps of washing, coating, drying, exposing, developing, and curing for each color of R (red), G (green), and B (blue). ,
The developing device and the curing device require three sets of three colors of RGB, which are wasteful in terms of equipment and processing materials used, and are a major obstacle to cost reduction.

For this reason, three colors of RGB are applied at once,
A method has been proposed in which steps (equipment) other than coating are performed for one color. The point of this method is a technique of applying three colors of RGB collectively. As a specific means for realizing this, as shown in Japanese Patent Application Laid-Open No. 5-142407 and the like, a nozzle in which a plurality of ejection holes are arranged in a straight line at a color pixel arrangement pitch of one color is arranged in the coating direction. Means of arranging three nozzles, dedicating each nozzle for each color of RGB, discharging the paste of each color from each nozzle, and applying the three colors of RGB to the substrate on which the black matrix is formed in a stripe shape, and Japanese Patent Application Laid-Open No. Hei 7-230885. As disclosed in the official gazette and the like, there is a means for simultaneously applying three colors of RGB to a black matrix substrate in a stripe shape by using a nozzle capable of simultaneously discharging three colors of RGB.

[0005] In both of the above-mentioned known examples, RGB is used for the nozzle.
Although the principle of applying the three colors collectively in a stripe shape is shown, when the RGB paste is applied in a stripe shape, the paste penetrates into adjacent color pixel portions to cause a problem such as color mixing. On the other hand, there is no description that there is a problem as well as a countermeasure, and the fact is that it is not practically used.

That is, in the conventional method, (1) When the RGB paste is applied to the RGB color pixel portion in the black matrix in a stripe shape, the height of the vertical grid and the horizontal grid constituting the black matrix are the same, so that the vertical If the paste is applied to the RGB pixel portions in a direction parallel to the grid, the paste will straddle the horizontal grid, and the paste will propagate along the horizontal grid and invade the adjacent pixel portions, causing color mixing.

[0007] (2) The paste of each color of RGB is applied in a stripe shape aiming at the color pixel portion between the black matrices on the substrate. The height of the black matrix is 0.1 μm in the case of a black matrix made of chromium oxide, and at most 1 μm in the case of a black matrix made of resin, whereas the height of the RGB pixel film is 1 to 2 μm.
m and the height of the black matrix or higher. The coating thickness of the paste for each color of RGB can be obtained by dividing the height of the RGB pixel film by the density, but is usually 10 to 30 μm, which is much thicker than the black matrix. When the difference in height is large as described above, no matter how much the RGB paste is applied to only the pixel portions between the black matrices, the paste overflows the pixel portions due to the flow of the paste after the application, and the paste overlies the black matrix. In an extreme case, it invades adjacent different color pixel portions, and causes a problem such as color mixing. To solve this problem, the paste after application does not flow and does not spread on the black matrix even if the thickness of the application is much larger than the black matrix by increasing the viscosity of the RGB paste or imparting thixotropy. However, since the property that the paste is appropriately spread and leveled in the pixel portion is lost, a new problem that uniformity of the applied thickness cannot be obtained arises.

(3) While the black matrix is in the form of a lattice, the RGB paste is applied in the form of stripes. Therefore, even if the application direction and the vertical lattice of the black matrix are made parallel, the horizontal lattice of the black matrix is formed. Since it always crosses, the horizontal lattice portion is applied. The RGB paste applied on the horizontal lattice must be finally removed. However, as a means for removing the paste, use a mechanical means such as polishing, or apply a resist solution, and remove an excess portion by a photolithography method. To remove. In the removal by mechanical means, since the film thickness on the horizontal lattice is the same as that of the pixel portion, it takes a very long time to remove, and productivity is greatly impaired. In the photolithography method,
Since the steps of coating, drying, exposure and development are added, the intended purpose of cost reduction by shortening the steps is impaired.

[0009]

The first object of the present invention is to pay attention to the above-mentioned problems, and when applying an RGB paste in a stripe shape to a black matrix substrate, the paste is applied to the side of the black matrix. It is an object of the present invention to provide a means that does not cause a problem such as color mixing caused by invading an adjacent pixel portion through a lattice.

A second object of the present invention is to make it possible to easily remove an unnecessary RGB coating film on a black matrix even when the RGB paste is prevented from entering the adjacent pixel portion. is there.

[0011]

In order to solve the above-mentioned problems, a method of manufacturing a color filter according to the present invention forms a color coating film in a stripe pattern on a color pixel portion between black matrices on a substrate. A method for manufacturing a color filter, comprising forming a black matrix portion on both sides of a color pixel portion in a stripe direction at the highest position, and then forming a color coating film in a stripe shape.

The method of manufacturing a color filter according to the present invention is a method of manufacturing a color filter in which a color coating film is formed in a stripe pattern on a color pixel portion between black matrices on a substrate. Forming a strippable layer that can be removed by stripping or dissolving on the black matrix portions on both sides of the color pixel section, and then forming a color coating film in a stripe shape.

Further, a method of manufacturing a color filter according to the present invention is a method of manufacturing a color filter in which a color coating film is formed in a stripe shape on a color pixel portion between black matrices on a substrate, After forming a release layer that can be removed by release or dissolution on the top, and forming the highest height of the laminated part of the black matrix and release layer on both sides of the color pixel part in the stripe direction, The method is characterized in that it is formed in a stripe shape.

That is, in the method of manufacturing a color filter according to the present invention, the height of the black matrix (height of the vertical lattice) on both sides in the stripe coating direction is higher than that of the other black matrix (horizontal lattice). By forming the black matrix substrate, R
When the GB paste is applied in the form of stripes, problems such as color mixing due to the penetration of the paste along the horizontal lattice of the black matrix and intrusion into adjacent pixel portions are prevented.

In addition, a release layer is formed on the black matrix on both sides in the stripe coating direction, so that unnecessary portions of the RGB coating film can be easily removed from this portion. Further, the height of the vertical lattice portion of the black matrix forming the release layer is made higher than the height of the horizontal lattice portion to prevent problems such as color mixing and to make it possible to easily remove unnecessary RGB coating films. I do.

Further, the apparatus for manufacturing a color filter according to the present invention for carrying out such a method includes a color filter for forming a color coating film in a stripe shape on a color pixel portion between black matrices on a substrate. A manufacturing apparatus, comprising: a black matrix forming apparatus for forming a black matrix portion on both sides of a color pixel portion in a stripe direction at the highest level, and forming the color coating film in a stripe shape with the black matrix forming apparatus. It is characterized by being arranged before the device.

The apparatus for manufacturing a color filter according to the present invention is an apparatus for manufacturing a color filter for forming a color coating film in a stripe pattern on a color pixel portion between black matrices on a substrate. Has a release layer forming apparatus that forms a release layer that can be removed by peeling or dissolving on the top of the substrate, and forms the highest height of the stacked portion of the black matrix and the release layer on both sides of the color pixel portion in the stripe direction. Along with the release layer forming apparatus,
The apparatus is characterized in that it is arranged before an apparatus for forming a color coating film in a stripe shape.

[0018]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a method and an apparatus for manufacturing a color filter according to the present invention will be described with reference to the drawings. FIG. 1 shows a color filter manufacturing process 1 according to an embodiment of the present invention. FIG. 2 is a plan view of the black matrix substrate 200, and FIG. 3 is a front sectional view of FIG. In this embodiment, a black matrix substrate 200 having a black matrix 202 in which a vertical lattice 204 is higher than a horizontal lattice 206 as shown in FIGS. . Subsequently, RGB stripe coating step 1
0, in the direction parallel to the vertical lattice 204 of the black matrix 202, the RGB color pixel units 210R, 210G, 210
A paste of each color of RGB is applied to B in a stripe shape.
When the coating is performed in this direction, the horizontal grid 206 of the black matrix 202 is straddled. However, since the vertical grid 204 is higher than the horizontal grid 206,
Even if the coating is applied over 6, the paste does not overflow the vertical lattice 204 and enter the adjacent color pixel portion.

The RGB paste is applied to all the color pixel portions in the form of stripes and dried, and then, in an RGB pixel film forming step 20, on the black matrix other than the RGB color pixel portions (in this case, on the horizontal grid 206). Unnecessary RGB
The color coating is removed (unnecessary RGB color coating removing step 21).
In order to remove unnecessary RGB color coating films, a resist solution is applied to the entire surface of the substrate, and after drying, the RGB color pixel portions 210R and 210R.
Exposure is performed using a photomask that irradiates light only to 0G and 210B, and the resist film in that portion is cured. Next, development is performed, and unnecessary RGB color coatings other than the RGB pixel portions protected by the cured resist film and the uncured resist film are removed by a dedicated chemical solution. Finally, the cured resist film is peeled off with another special chemical solution,
The RGB color coating is left only on the pixel units 210R, 210G, 210B. After that, the substrate is heated, and after curing the RGB color pixel film, which is the RGB color coating film remaining in the RGB color pixel portion, in the curing step 22, the chromaticity adjustment and the film thickness of the RGB color pixel film are made uniform. To this end, the RGB color pixel film is polished (polishing step 23). This polishing step may be omitted in some cases. Thereafter, in the ITO film forming process 30
A color filter is formed by forming TO by sputtering.

In the above-described manufacturing method, in the RGB stripe coating step 10, the nozzle 300 shown in FIG. 4 is attached to the nozzle stripe coating apparatus 400 shown in FIG.
B. Apply one color at a time. Here, the nozzle 300
A pitch corresponding to one color pixel of the black matrix substrate 200 with the release layer (for example, the color pixel portion 210R of FIG. 4)
, The discharge holes 304 for discharging the paste 310, the manifold 306 for storing the paste 310, the supply port 302 for supplying the paste,
Further, a pressure port 308 for pressurizing the paste with air whose pressure has been adjusted is provided.

Further, the stripe coating apparatus 400 is configured by attaching the nozzle 300 to the bracket 408 of the XYZ stage 420. This causes the nozzle 300 to
The linear drive device (not shown) can freely move in the Z direction and the linear drive device 410 can freely move in the Y direction.
Further, the substrate A is sucked and sucked by the suction disk 404 which is freely movable in the X direction and is rotatable in the XY plane by the linear driving device 406. Further, the substrate A is controlled by the CCD camera 412 and an image processing device (not shown).
And the control device (not shown) can align the ejection hole of the nozzle 300 directly above the color pixel portion of the substrate. On the other hand, the position of the upper surface of the substrate A is detected by the height sensor 414, and the nozzle 300 during coating is detected by a control device (not shown).
Of the lower surface of the substrate A and the upper surface of the substrate A can be set.

A specific coating method using the nozzle 300 and the stripe coating apparatus 400 is performed as follows. First, a black matrix substrate 200 with a peeling layer (hereinafter abbreviated as substrate A) is placed on the suction disk 404 and fixed by suction, and then the suction disk 404 is moved to detect the height of the substrate A by the height sensor 414. And C
The CD camera 412 detects the alignment marks provided at two places on the substrate A, and is provided on a line of the stripes of the R color pixel portion 210R on the substrate A and on the lower surface of the nozzle 300 in a straight line. The suction plate 404 is rotated so that the rows of the ejection holes 304 are at right angles. Next, the ejection hole 304 closest to the origin O in the Y direction of the nozzle 300
To the R color pixel portion 2 which is closest to the origin O in the Y direction of the substrate A.
The nozzle 300 is moved in the Y direction so as to be above 10R. Next, the suction plate 404 is returned to the origin O in the X direction, and the nozzle 3 is adjusted so that the substrate A and the lower surface of the nozzle 300 have a predetermined clearance according to the measured height of the substrate A.
00 is lowered in the Z direction and stopped. Next, suction cup 4
04 is moved toward the nozzle 300 in the X direction, and when the end of the substrate A comes directly below the suction hole 304 of the nozzle 300, air is supplied from a not shown air pressurizing source to the nozzle 300 filled with the R paste. From the discharge hole 304 to R
The paste is discharged and applied in a stripe shape. When the application end point comes, the supply of air is stopped, and the nozzle 300 is raised in the Z direction to complete the application.

Next, the suction plate 404 is moved in the X direction toward the origin, and the discharge hole 304 of the nozzle 300 is
The substrate is moved in the Y direction so as to reach the R pixel portion 210R of the substrate A to be coated next. Subsequently, the coating is performed in the same manner. When the coating of the predetermined area is completed, the suction of the suction disk 404 is released, and the substrate A is transferred to the next step. Less than,
The same application is performed for the G and B color pixel units using the respective dedicated nozzle application devices to complete the RGB three-color stripe application on the substrate A.

In the above-described coating method, the application to the substrate A by the nozzle 300 is performed in only one direction. However, the application may be performed in both directions as the substrate A reciprocates. Applying in both directions improves work efficiency.

Further, by disposing devices having the functions shown in the respective steps of the above-described color filter manufacturing method,
This is a manufacturing apparatus for manufacturing a predetermined color filter.

The double-sided high black matrix substrate formed in the double-sided high black matrix substrate forming step 100 may be a double-sided high black matrix substrate 220 with a release layer shown in FIGS. Here, FIG. 6 shows a black matrix substrate 22 on both sides with a release layer.
0 is a plan view, and FIG. 7 is a front sectional view thereof. This substrate 2
Reference numeral 20 denotes a layer for forming release layers 234 and 236 which are dissolved by a solvent on the black matrix 222. The vertical lattice portions 224 of the black matrix 222 have a thickness of a layer in which the black matrix 222 and the release layer 234 are overlapped with each other. The height is set higher than the height of the lattice portion 226. The release layer 236 may or may not be provided on the horizontal grid 226. However, since the unnecessary RGB coating on the black matrix 222 is removed in a later step, the horizontal grid 2
It is more preferable that the release layer 236 is also provided on 26. The release layers 234 and 236 may be formed of any material, but a resist film or the like which can be easily removed later by dissolving with a specific solvent is preferable.

As described above, the release layers 234 and 236 are provided on the black matrix 222, and the black matrix substrate 220 having the both side walls with the release layer having the vertical lattice portions higher than the horizontal lattice portions of the black matrix 222 is provided. The color filter manufacturing process used is as follows.

First, the RGB stripe coating step 1 shown in FIG.
0, both sides high black matrix substrate 22 with delamination
When the RGB color paste is applied to the RGB color pixel portions in a stripe shape in a direction parallel to the vertical lattice 224 of the black matrix 222, the black matrix 222 straddles the horizontal lattice 226.
Is higher than the film portion in which the horizontal lattice 226 and the release layer 236 are overlapped, so that even if the film portion is applied across the horizontal lattice 226 portion,
The paste does not overflow the vertical lattice 224 and enter the adjacent color pixel portion.

After the RGB paste has been applied to all the color pixel portions in a stripe shape, drying is performed. Then, in an RGB pixel film forming step 20, an unnecessary RGB color coating film removing step 21 is performed.
The release layer is dissolved by the solvent, whereby the unnecessary RGB color coating applied to the upper side of the release layer 236 on the horizontal lattice 226 of the black matrix 222 is removed.
Remove all 6 Further, at this time, the peeling layer 234 on the vertical lattice 224 of the black matrix 222 is also removed at the same time.
Only the RGB color pixel film, which is the RGB color coating film of G and 230B, remains.

After the RGB color pixel film is formed only in the RGB color pixel portion, the film is heated to a predetermined temperature and cured.
Further, in order to adjust the chromaticity and make the film thickness uniform, the RGB color pixel film is polished (curing step 22, polishing step 23). This polishing may be omitted in some cases. Next, in a final ITO film forming step 30, ITO is formed by sputtering to form a color filter.

There is a release layer on the black matrix,
There are the following methods for making the height at which the black matrix and the release layer overlap each other so that the vertical lattice portion of the black matrix is higher than the horizontal lattice portion.

The first method is to prepare a black matrix substrate having a release layer on a grid-like black matrix, and then superpose the release layer only on the vertical lattice. Specifically, in a grid-like black matrix substrate forming step 250 with a release layer shown in FIG. 8, a black matrix material is applied to the entire surface of the glass substrate (black matrix material applying step 251), and after drying (drying step 252),
A resist solution is applied and dried (resist solution application step 25
3. Drying step 254), exposure and development are performed so that the RGB color pixel portion becomes a plain glass surface (exposure step 255, development step 256) to form a lattice-shaped black matrix. At this stage, a resist film serving as a release layer remains on the black matrix, and a black matrix substrate having a release layer on a grid-like black matrix is obtained.

Next, in a vertical lattice release layer adding step 260, a resist liquid is applied to the entire surface of the previously obtained black matrix substrate and dried (resist liquid applying step 261 and drying step 262), and exposure and development are performed. Then, a new resist film is left only in the vertical lattice portion of the black matrix (exposure step 263, development step 264). Since the resist film is added only to the vertical lattice portion, the vertical lattice portion of the black matrix becomes higher than the horizontal lattice portion as a result. In the above-described lattice-like black matrix substrate forming step 250 with a release layer, instead of applying a black matrix material to a glass substrate and drying, a black matrix substrate in which a black matrix is formed in a lattice in advance is applied, and a resist solution is applied. A grid-like black matrix substrate with a release layer having a resist film on the black matrix may be formed by drying, exposing, and developing.

In the second method, as shown in FIG. 9, a glass substrate is loaded, a black matrix material is applied to the entire surface, dried, and then a resist solution is applied and dried (the black matrix material entire application step). 271, drying step 272,
Resist liquid application step 273, drying step 274), RGB
Exposure is performed using a photomask that irradiates light to the lattice-shaped portions of the black matrix so that the color pixel portions have a plain glass surface (exposure step 275). Then, the resist liquid is applied again and dried (resist liquid applying step 27).
6. Drying step 277), exposure is performed using a photomask in which only the vertical lattice of the black matrix is irradiated with light (exposure step 278), and development is performed (development step 279). Since only the resist film irradiated with light at the time of exposure and cured and the portion thereunder remain, as a result, the top of the resist film on the vertical lattice of the black matrix is higher than the top of the resist film on the horizontal lattice. Thus, a lattice-shaped black matrix substrate with a release layer in which the RGB pixel portion is a plain glass surface is obtained. In the above steps,
Instead of a glass substrate, a black matrix substrate with a grid-like black matrix formed in advance,
In the same manner, the resist film is applied to the resist liquid application step 273, and after the same step, the resist film serving as the release layer is similarly provided in the grid-like black matrix, and the vertical grid portion is higher than the horizontal grid portion. The obtained lattice-like black matrix substrate with a release layer is obtained.

The size of the substrate to which the present invention can be applied is not particularly limited, but preferably the diagonal length is 100 m.
m to 2000 mm, more preferably 500 mm to 130
0 mm. The paste for the RGB color pixel film to be used is not particularly limited, but has a viscosity of 10 cps to 100,000 cps, more preferably 5,000 cps to 50,000 cps, in order to discharge uniformly from the nozzles.

The resin contained in the paste may be any resin, but acrylic, polyimide and ethylcellulose resins are particularly preferred.

Further, the application conditions of the RGB paste to be used are such that the gap between the nozzle and the substrate at the time of application is 40 to 5
00 μm, more preferably 80 to 300 μm, and the coating speed is 0.1 m / min to 10 m / min, more preferably 0.5 m / min.
/ Min to 6 m / min. Further, the lattice shape of the black matrix film of the substrate preferably has a horizontal pitch of 50-3.
00 μm, more preferably 100 to 200 μm, the vertical pitch is preferably 100 to 500 μm, more preferably 200 to 300 μm, and the line width of the black matrix film is preferably 5 to 100 μm, more preferably 10 to 5 μm.
0, and the thickness of the black matrix film is 0.05μ
m to 50 μm, more preferably 0.1 to 10 μm. If the thickness of the black matrix is smaller than the range of the presentation, the light-shielding effect is lost, and if it is too thick, a pattern of a predetermined shape cannot be formed accurately by the photolithography method. Further, the thickness of the resist serving as a release layer is preferably 0.1 μm to 30 μm, more preferably 0.5 μm to 5 μm.
It is. The release layer is not limited to the resist film, and any release layer that can be dissolved by a solvent can be used. The nozzle hole diameter of the nozzle is a color pixel width WR (shown in FIG. 4) surrounded by a black matrix film.
It is preferable that the width be smaller than that, and it is preferable that the width be 10 μm or more smaller than the color pixel width. Therefore, the hole diameter of the nozzle is 10 to 2
00 μm, more preferably 20 to 80 μm. Further, the application of the present invention is not limited to the lattice-shaped black matrix, and there is no problem even if it is a stripe-shaped one.

In this embodiment, means for applying a paste of each color in the form of a stripe using a nozzle is used to form a striped color pixel film on a black matrix substrate. However, the present invention is not limited to this. Instead, any means may be applied as long as the color pixels are formed in a stripe shape. For example, means for transferring a color film on a film in a stripe shape to a black matrix substrate may be used.

Further, in the above-described embodiment, the case of the three-color sequential application in which the one-color paste is applied and then the next-color paste is applied has been described. The present invention can be applied to a case where pastes of three colors are sequentially applied by movement.

As described above, the vertical lattice portion of the black matrix film and the vertical lattice portion of the black matrix obtained by superposing the black matrix film and the release layer are higher than the horizontal lattice portion, so that each of the RGB pastes is vertically applied to the RGB pixel portion. When the stripe is applied in the direction parallel to the grid, even if the paste straddles the horizontal grid, the flow of the paste is regulated by the vertical grid, so that it is possible to prevent intrusion into adjacent pixel parts and the resulting color mixing. Can be.

Further, by forming a peeling layer which can be removed by peeling or dissolving on the black matrix portion on both sides of the color pixel portion, or by forming a peeling layer on the black matrix, By setting the height of the stacked part of the black matrix and release layer on both sides to be the highest, it is possible to prevent unnecessary RGB coatings on the black matrix while preventing intrusion into adjacent pixel parts and accompanying color mixing. Can be removed.

[0042]

EXAMPLE A non-alkali glass substrate having a size of 360.times.465 mm and a thickness of 0.7 mm was charged, and a paste for black matrix was applied to the entire surface of the substrate by a die coater at 10 .mu.m. The black matrix paste used was a light shielding material of titanium oxynitride, a binder of polyamic acid, and γ-butyrolactone as a solvent, each having a solid content of 10% and a viscosity of 18%.
Those prepared at cps were used. After applying this paste, the paste was dried at a hot plate temperature of 130 ° C. for 20 minutes by a drying device using a hot plate to obtain a black matrix film having a thickness of 1 μm.

A resist solution (XP942, Shipley) prepared to have a solid concentration of 20% and a viscosity of 8 cps was further formed thereon.
51) was also applied to the entire surface of a 10 μm substrate by a die coater. Dry on a hot plate at 90 ° C for 10 minutes, 2μm
After obtaining a resist film, the substrate pitch in the width direction is 110 μm.
m, longitudinal pitch of the substrate 330 μm, line width 30 μm,
A black matrix having a lattice shape in which the number of RGB pixels is 1920 (board width direction) × 480 (board length direction) and the diagonal length is 10.4 inches (211 mm in board width direction × 159 mm in board length direction) Exposure processing was performed using a photomask formed so as to be arranged at two locations in the longitudinal direction of the substrate. Subsequently, the above-mentioned resist solution was again applied to the entire surface at 10 μm and dried to obtain a 2 μm resist film. Then, in each of two areas (screen section) having a diagonal of 10.4 inches, the substrate width direction was changed. 110μm pitch,
A portion having a length of 159 mm in the longitudinal direction of the substrate and a line width of 30 μm (a vertical lattice portion of a black matrix) is exposed using a photomask created so as to irradiate light,
Further development was performed. As a result of these processes,
A lattice pattern having a pitch of 110 μm in the substrate width direction, a pitch of 330 μm in the longitudinal direction of the substrate, and a line width of 30 μm is formed by laminating a black matrix film and a resist film on one diagonal.
Two sections were formed in a section of 0.4 inches (211 × 159). Further, the film thickness of the lattice-like portion is such that the portion (vertical lattice) drawn with a pitch of 110 μm in the substrate width direction and a line width of 30 μm in the substrate longitudinal direction is 5 μm in height, a pitch of 330 μm in the substrate longitudinal direction, and a line width of 30 μm. The portion drawn in the substrate width direction (the horizontal lattice, but excluding the portion intersecting with the vertical lattice) was 3 μm in height.

Next, the R paste was placed in two places on the substrate.
A hole diameter of 60 μm, a pitch of 300 μm, and a number of holes of 6 so that the R color pixel portion of the 0.4 inch screen portion can be applied with a thickness of 4 μm.
While discharging the R paste from the four nozzles, the paste was applied only to two screen portions. The same application was performed for the G and B pastes. However, in order to apply all the pixels in the 10.4 inch screen in a stripe shape with each color paste, it is necessary to reciprocate the nozzle for each color five times. Was needed.

Here, the R paste contains a polyamic acid as a binder, γ-butyrolactone, N-methyl-2-
A mixture of pyrrolidone and 3-methyl-3-methoxybutanol was used as a solvent (hereinafter referred to as solvent A), Pigment Red 1
77 was used as a pigment, and a solid content concentration of 50% and a viscosity adjusted to 51500 cps were used. Further, for the G paste, the pigment was changed to Pigment Green 36 in the composition of the R paste, and the solid content concentration was 50%. 55000c viscosity
In the composition of the R paste, the pigment prepared in Pigment Blue 15 was used as the B paste, the solid content concentration was adjusted to 50%, and the viscosity was adjusted to 60000 cps.

Then, after drying on a hot plate at 100 ° C. for 20 minutes, the dry resist film is dissolved in a solvent using propylene glycol monomethyl ether acetate in a peeling device, and the dry resist film on a 10.4-inch screen is formed. Unnecessary RGB color coating films existing on the upper surface were removed to obtain a black matrix film of 1 μm and a 2 μm-thick RGB color pixel film in a color pixel portion surrounded by a lattice-shaped black matrix. Subsequently, the substrate was cured by heating it on a hot plate at 260 ° C. for 30 minutes, and then a special urethane foam (manufactured by Rodel Nitta) having a diameter of 400 mm and a thickness of 1.3 mm was formed on the pad, and alumina 120 (particle diameter of 0) was formed on the pad. .2 μm)
The entire surface of the substrate was polished with a polishing machine by using, and the thickness of each RGB color pixel film was set to 1.8 ± 0.02 μm. Then ITO
Was attached by sputtering to form a color filter. The obtained color filter had no color mixture, had uniform chromaticity over the entire surface of the substrate, and was excellent in quality.

[0047]

As described above, according to the method and apparatus for manufacturing a color filter of the present invention, the vertical lattice portion of the black matrix film or the vertical lattice portion of the black matrix in which the black matrix film and the release layer are superposed. Is higher than the horizontal grid portion, so that when each of the RGB pastes is stripe-applied to the RGB pixel portion in a direction parallel to the vertical grid, even if the paste straddles the horizontal grid portion, the flow of the paste is regulated by the vertical grid portion. Therefore, it is possible to prevent intrusion into an adjacent pixel portion and color mixing that accompanies it.

Further, by forming a peeling layer which can be removed by peeling or dissolving on the black matrix portions on both sides of the color pixel portion, or by forming a peeling layer on the black matrix, By setting the height of the stacked portion of the black matrix and the release layer on both sides to be the highest, unnecessary RGB coatings on the black matrix can be extremely prevented while preventing intrusion into adjacent pixel portions and the resulting color mixing. Can be easily removed.

Since a color filter is manufactured by the above-described method and apparatus for manufacturing an excellent color filter, a high-quality color filter can be manufactured.
It is possible to obtain with high productivity.

[Brief description of the drawings]

FIG. 1 is a flowchart showing a process of manufacturing a color filter according to an embodiment of the present invention.

FIG. 2 is a plan view of a black matrix substrate.

FIG. 3 is a cross-sectional view of the black matrix substrate taken along line AA of FIG. 2;

FIG. 4 is a cross-sectional view showing a paste application state by a nozzle in an RGB stripe application step.

FIG. 5 is a perspective view of a stripe coating apparatus.

FIG. 6 is a plan view of a black matrix substrate according to another embodiment.

FIG. 7 is a cross-sectional view of the black matrix substrate taken along line BB of FIG.

FIG. 8 is a flowchart showing a process of manufacturing a color filter according to another embodiment of the present invention.

FIG. 9 is a flowchart showing a process of manufacturing a color filter according to still another embodiment of the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Color filter manufacturing process 10 RGB stripe coating process 20 RGB color pixel film forming process 21 Unnecessary RGB color coating film removing process 22 Cure process 23 Polishing process 30 ITO film forming process 100 Side wall high black matrix substrate forming process 200 Black matrix substrate 202 Black matrix 204 Vertical lattice 206 Horizontal lattice 210R, 210G, 210B RGB color pixel part 220 Black matrix substrate 222 Black matrix 224 Vertical lattice part 226 Horizontal lattice part 230R, 230G, 230B RGB color pixel part 234 Release layer 236 on vertical lattice Release layer on lattice 250 Step of forming grid-like black matrix substrate with release layer 251 Full application step of black matrix material 252 Drying step 253 Resist liquid application step 254 Drying Step 255 Exposure step 256 Development step 260 Vertical lattice release layer addition step 261 Resist liquid application step 262 Drying step 263 Exposure step 264 Development step 271 Black matrix material entire surface application step 272 Drying step 273 Resist liquid application step 274 Drying step 275 Exposure step ( (Lattice form) 276 Resist liquid application step 277 Drying step 278 Exposure step (only vertical lattice) 279 Development step 300 Nozzle 302 Paste supply port 304 Paste discharge port 306 Manifold 308 Pressurization port 310 Paste 400 Stripe coating apparatus 404 Suction board 406 Linear drive Device 408 Bracket 410 Linear drive 412 CCD camera 414 Height sensor 420 XYZ stage

 ────────────────────────────────────────────────── ─── Continuing from the front page (72) Nobuyuki Kuroki, Inventor 1-1-1, Sonoyama, Otsu-shi, Shiga F-term in the Toga Company's Shiga Plant (reference) 2H048 BA02 BA11 BA45 BA48 BA64 BA66 BB02 BB24 BB44 2H091 FA03Y FA35Y FB02 FB13 FC10 FC12 FC15 FC18 FD04 FD05 FD06 LA30 5C094 AA03 AA43 CA19 CA24 ED03 ED15 FA04 GB01 5G435 AA04 CC12 FF13 GG12 KK05

Claims (9)

[Claims] 1. A method of manufacturing a color filter, wherein a color coating film is formed in a stripe shape on a color pixel portion between black matrices on a substrate, the black matrix being on both sides of the color pixel portion in a stripe direction. A method for manufacturing a color filter, wherein a color coating film is formed in a stripe shape after forming a portion to be highest. 2. A method of manufacturing a color filter, wherein a color coating film is formed in a stripe shape on a color pixel portion between black matrices on a substrate, the black matrix being on both sides of the color pixel portion in a stripe direction. A method for producing a color filter, comprising: forming a release layer that can be removed by dissolution or dissolution on a portion; and then forming a color coating film in a stripe shape. 3. A method for producing a color filter, wherein a color coating film is formed in a stripe shape on a color pixel portion between black matrices on a substrate, wherein the peeling layer is removable or dissolvable on the black matrix. And forming a color coating film in the form of stripes after forming the highest height of the stacked portion of the black matrix and the release layer on both sides of the color pixel portion in the stripe direction, and then forming the color coating film in a stripe shape. Manufacturing method of filter. 4. The color filter according to claim 1, wherein the formation of the stripe of the color coating film on the color pixel portion is performed by applying a color paste in a stripe shape. Production method. 5. The method for producing a color filter according to claim 2, further comprising, after forming the color coating film in a stripe shape, removing the release layer by peeling or dissolving. 6. A color filter manufacturing apparatus for forming a color coating film in a stripe form on a color pixel portion between black matrices on a substrate, the black matrix being on both sides of the color pixel portion in a stripe direction. An apparatus for manufacturing a color filter, comprising: a black matrix forming device for forming a portion at the highest position; and wherein the black matrix forming device is disposed before a device for forming a color coating film in a stripe shape. 7. The black matrix forming device includes a device for applying and drying a black matrix paste on the entire surface, a device for applying and drying a resist solution, and an exposure and developing device for forming a predetermined black matrix pattern. The apparatus for producing a color filter according to claim 6, comprising: 8. A color filter manufacturing apparatus for forming a color coating film in a stripe shape on a color pixel portion between black matrices on a substrate, wherein the color filter is stripped or dissolved on the black matrix. A release layer forming apparatus for forming a layer and forming the highest part of the stacked portion of the black matrix and the release layer on both sides of the color pixel portion in the stripe direction, and applying the release layer forming apparatus to the color coating. An apparatus for manufacturing a color filter, wherein the apparatus is arranged before an apparatus for forming a film in a stripe shape. 9. The peeling layer forming apparatus according to claim 8, wherein the peeling layer forming apparatus includes a device for applying and drying a peeling paste on the entire surface and an exposure and developing device for curing the peeling layer in a predetermined pattern. Color filter manufacturing equipment.