JP2001144390A - Solid circuit board and manufacturing method therefor - Google Patents

Solid circuit board and manufacturing method therefor

Info

Publication number
JP2001144390A
JP2001144390A JP32327199A JP32327199A JP2001144390A JP 2001144390 A JP2001144390 A JP 2001144390A JP 32327199 A JP32327199 A JP 32327199A JP 32327199 A JP32327199 A JP 32327199A JP 2001144390 A JP2001144390 A JP 2001144390A
Authority
JP
Japan
Prior art keywords
copper foil
circuit board
dimensional
manufacturing
resin substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP32327199A
Other languages
Japanese (ja)
Inventor
Yoshiyuki Ando
好幸 安藤
Hideyuki Sagawa
英之 佐川
Hideki Asano
秀樹 浅野
Naotake Ebinuma
尚武 海老沼
Shozo Nakamura
省三 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Hitachi Ltd
Original Assignee
Hitachi Cable Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd, Hitachi Ltd filed Critical Hitachi Cable Ltd
Priority to JP32327199A priority Critical patent/JP2001144390A/en
Publication of JP2001144390A publication Critical patent/JP2001144390A/en
Pending legal-status Critical Current

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  • Structure Of Printed Boards (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a solid circuit board which can be manufactured with high producibility and a manufacturing method for manufacturing it and provide a solid circuit board, where the problem of rupture of a wiring layer caused when a manufacturing method of high producibility is adopted is resolved, and a manufacturing method for manufacturing it. SOLUTION: In manufacturing a solid circuit board, where a resin substrate 1 having a solid surface 3 is formed on the surface by pressing a resin board 5 and a copper foil 6 with heating dies 7, 8, the copper foil 6 is stuck to the formed solid surface 3, and the copper foil 6 is processed to a wiring layer 4 of a specified pattern, a copper foil, whose flexibility and elongation property are improved by heat treatment is used as the copper foil 6.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、立体回路基板およ
びその製造方法に関し、特に、高い生産性のもとに製造
でき、配線層に破断の生じない立体回路基板とその製造
方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a three-dimensional circuit board and a method of manufacturing the same, and more particularly to a three-dimensional circuit board which can be manufactured with high productivity and has no break in a wiring layer, and a method of manufacturing the same.

【0002】[0002]

【従来の技術】従来の立体回路基板の製造方法として、
たとえば、立体形状を有する樹脂基板に銅箔を接着し、
接着した銅箔を回路パターンに応じてエッチングで除去
して立体回路基板を製造する方法や、立体形状を有する
樹脂基板に回路パターンをメッキによって形成して立体
回路基板とする製造方法がある。
2. Description of the Related Art As a conventional method of manufacturing a three-dimensional circuit board,
For example, gluing a copper foil to a resin substrate having a three-dimensional shape,
There are a method of manufacturing a three-dimensional circuit board by removing the adhered copper foil by etching according to a circuit pattern, and a method of manufacturing a three-dimensional circuit board by forming a circuit pattern on a resin substrate having a three-dimensional shape by plating.

【0003】[0003]

【発明が解決しようとする課題】しかし、従来の立体回
路基板の製造方法によると、銅箔を接着する場合、接着
剤の塗布と固化に長い時間を要するため、生産性が悪
く、また、回路パターンをメッキする場合、メッキ時間
が長くなるため、これも生産性が悪い。
However, according to the conventional method of manufacturing a three-dimensional circuit board, when a copper foil is bonded, it takes a long time to apply and solidify the adhesive, so that the productivity is poor, and the circuit is not good. In the case of plating a pattern, the plating time is long, which also results in poor productivity.

【0004】従って、本発明の目的は、高い生産性で製
造できる立体回路基板とこれを製造するための製造方法
を提供することにある。本発明の他の目的は、生産性の
高い製造方法を採用したときに生じる配線層の破断を解
決した立体回路基板とこれを製造するための製造方法を
提供することにある。
Accordingly, it is an object of the present invention to provide a three-dimensional circuit board that can be manufactured with high productivity and a manufacturing method for manufacturing the same. It is another object of the present invention to provide a three-dimensional circuit board in which breakage of a wiring layer caused when a manufacturing method with high productivity is adopted and a manufacturing method for manufacturing the same.

【0005】[0005]

【課題を解決するための手段】本発明は、上記の目的を
達成するため、表面に立体面を形成した樹脂基板と、前
記樹脂基板の前記立体面に一体に貼り付けられた金属箔
によって形成された所定のパターンの配線層より構成さ
れる立体回路基板において、前記配線層は、熱処理によ
って柔軟性と伸び特性を向上させた金属箔によって構成
されることを特徴とする立体回路基板を提供するもので
ある。
In order to achieve the above object, the present invention provides a resin substrate having a three-dimensional surface formed on a surface thereof and a metal foil integrally attached to the three-dimensional surface of the resin substrate. A three-dimensional circuit board comprising a wiring layer having a predetermined pattern, wherein the wiring layer is made of a metal foil having improved flexibility and elongation characteristics by heat treatment. Things.

【0006】また、本発明は、上記の目的を達成するた
め、樹脂基板の表面に形成した立体面に所定のパターン
の配線層を形成した立体回路基板の製造方法において、
樹脂材料を予備成形して樹脂基板を準備し、銅箔に所定
の熱処理条件の熱処理を施して熱処理された銅箔を準備
し、前記樹脂基板の上に前記熱処理された銅箔を配置し
て加熱金型でプレスすることにより前記樹脂基板に前記
立体面を形成するとともに前記立体面に前記熱処理され
た銅箔を貼り付け、前記樹脂基板の前記立体面に貼り付
けられた前記熱処理された銅箔に所定のパターンニング
加工を施して前記配線層を形成することを特徴とする立
体回路基板の製造方法を提供するものである。
In order to achieve the above object, the present invention provides a method of manufacturing a three-dimensional circuit board having a wiring pattern of a predetermined pattern formed on a three-dimensional surface formed on a surface of a resin substrate.
Preparing a resin material to prepare a resin substrate, preparing a heat-treated copper foil by subjecting the copper foil to heat treatment under predetermined heat treatment conditions, disposing the heat-treated copper foil on the resin substrate The three-dimensional surface is formed on the resin substrate by pressing with a heating mold, and the heat-treated copper foil adhered to the three-dimensional surface of the resin substrate is attached to the three-dimensional surface. An object of the present invention is to provide a method for manufacturing a three-dimensional circuit board, wherein a predetermined patterning process is performed on a foil to form the wiring layer.

【0007】上記の金属箔としては銅箔が好ましく、樹
脂基板の構成材としては、ガラス繊維等の充填剤を混入
したエポキシ樹脂などの熱硬化性樹脂の使用が好まし
い。樹脂と接触する側の金属箔の表面を粗化することに
よって、樹脂に対する接着力を高めることは好ましい実
施形態である。
A copper foil is preferable as the metal foil, and a thermosetting resin such as an epoxy resin mixed with a filler such as glass fiber is preferable as a constituent material of the resin substrate. It is a preferred embodiment to increase the adhesive strength to the resin by roughening the surface of the metal foil in contact with the resin.

【0008】本発明は、配線層を構成する銅箔を熱処理
により焼鈍することによって柔軟性と伸び特性を向上さ
せ、これによって樹脂基板を成形するときの銅箔の賦形
性を高めることに特徴を有するもので、この結果、銅箔
は、樹脂基板を成形するときの樹脂の流れに縦横に対応
できるようになり、樹脂基板に形成される立体面に対し
て無理なく貼り付けられることになる。
The present invention is characterized in that the copper foil constituting the wiring layer is annealed by heat treatment to improve the flexibility and elongation characteristics, thereby improving the shapeability of the copper foil when forming a resin substrate. As a result, the copper foil can respond to the flow of the resin when molding the resin substrate vertically and horizontally, and can be stuck to the three-dimensional surface formed on the resin substrate without difficulty. .

【0009】銅箔を使用するとき、以上の効果を得るた
めの熱処理温度としては、150〜600℃に設定する
ことが好ましい。150℃未満では、銅箔に対して充分
な伸び特性を与えることが難しく、逆に、600℃を超
えると、銅箔の結晶粒の粗大化による引張強さの低下、
伸び低下が生じ使用に供することが難しくなる。
When a copper foil is used, the heat treatment temperature for obtaining the above effects is preferably set to 150 to 600 ° C. If the temperature is lower than 150 ° C., it is difficult to give sufficient elongation properties to the copper foil. Conversely, if the temperature exceeds 600 ° C., the tensile strength decreases due to the coarsening of the crystal grains of the copper foil,
The elongation decreases and it becomes difficult to use for use.

【0010】150〜600℃の範囲で熱処理を施され
た銅箔には、熱処理をしない銅箔に比べて20〜40%
もの伸び特性の向上と銅箔表面のビッカーズ硬さ(柔軟
性を計る指標となる)が10〜30%低減される性能が
与えられることになり、従って、これにより賦形性が向
上した銅箔は、樹脂基板の立体面に柔軟かつ完全に密接
するようになる。
[0010] The copper foil which has been subjected to the heat treatment at a temperature in the range of 150 to 600 ° C has a content of 20 to 40% as compared with the copper foil which has not been subjected to the heat treatment.
Copper foil with improved elongation characteristics and reduced Vickers hardness (a measure of flexibility) of the copper foil surface by 10 to 30% is provided, and thus, the shapeability is improved by this. Is flexible and completely in close contact with the three-dimensional surface of the resin substrate.

【0011】熱処理は、たとえば、2〜5℃/分の昇温
速度で銅箔を所定の温度に上昇させた後、50〜100
分間その温度に保持し、2〜10℃/分の速度で冷却す
ることによって行われる。なお、この条件において、よ
り好ましい銅箔の熱処理温度は250〜500℃であ
り、さらに好ましくは300〜400℃である。
The heat treatment is performed, for example, after raising the copper foil to a predetermined temperature at a rate of 2 to 5 ° C./min,
This is done by holding at that temperature for a minute and cooling at a rate of 2-10 ° C / min. Under these conditions, the heat treatment temperature of the copper foil is more preferably from 250 to 500C, and still more preferably from 300 to 400C.

【0012】加熱金型によって樹脂基板の形状に成形さ
れる樹脂の形態としては、顆粒状あるいは粉状の樹脂を
そのまま使用してもよいが固形物の形に成形したものの
使用がより好ましい。後者の例としては、たとえば、顆
粒状ないしは粉状の未硬化の熱硬化性樹脂をペースト状
にし、これを板状に成形したものの使用が考えられ、こ
のようにするときには、樹脂板を使用するときに比べて
小さな加圧力での成形が可能となり、銅箔への負担を減
らす効果が得られるようになる。樹脂は、予め所定の形
状に予備成形されてから加熱金型のプレスに供される。
As the form of the resin molded into the shape of the resin substrate by the heating mold, a granular or powdery resin may be used as it is, but the use of a resin molded in a solid form is more preferred. As an example of the latter, for example, it is conceivable to use an uncured thermosetting resin in the form of granules or powder in the form of a paste, and then form this into a plate. In this case, a resin plate is used. Molding can be performed with a smaller pressing force than usual, and the effect of reducing the burden on the copper foil can be obtained. The resin is preliminarily formed into a predetermined shape and then supplied to a heating mold press.

【0013】銅箔を立体面に対応させた形状に予め成形
しておくことは可能である。この形態は、特に、立体面
における高低差が熱処理した銅箔の伸びと賦形性を超え
るほどに大きなときに有利となる。銅箔の予備成形が、
立体面成型時の銅箔への過剰な伸びの負荷を緩和する。
It is possible to pre-form the copper foil into a shape corresponding to a three-dimensional surface. This form is particularly advantageous when the height difference in the three-dimensional plane is so large that it exceeds the elongation and shapeability of the heat-treated copper foil. Preforming of copper foil,
Relieves the load of excessive elongation on copper foil during three-dimensional molding.

【0014】[0014]

【発明の実施の形態】次に、本発明による立体回路基板
およびその製造方法の実施の形態を説明する。図1は、
立体回路基板の構成を示したもので、1は樹脂基板、2
は樹脂基板1の表面に形成された凹部、3はこの凹部2
による立体面を示す。
Next, an embodiment of a three-dimensional circuit board and a method of manufacturing the same according to the present invention will be described. FIG.
This shows the configuration of a three-dimensional circuit board, where 1 is a resin board, 2
Is a concave portion formed on the surface of the resin substrate 1;
2 shows a three-dimensional plane.

【0015】4は立体面2に形成された配線層を示し、
この配線層4は、熱処理した銅箔より構成されており、
これにより以下の製造過程において破断することがな
く、かつ、内部に過剰な応力を潜在させない状態のもと
に形成されている。
Reference numeral 4 denotes a wiring layer formed on the three-dimensional surface 2,
This wiring layer 4 is made of heat-treated copper foil,
As a result, it is formed in a state where it is not broken in the following manufacturing process and does not allow excessive stress inside.

【0016】図2は、図1の立体回路基板の製造手順を
示す。(a)の5は充填剤を含む顆粒状の未硬化のエポ
キシ樹脂を予備成形した樹脂板であり、この樹脂板5
は、次の(b)の工程において、銅箔6とともに加熱金
型7、8によってプレスされ、硬化成形される。加熱金
型7、8による成形条件は、温度180℃、圧力7MP
aであり、一方、銅箔6としては、350℃で80分間
熱処理焼鈍した厚さ18μmの銅箔を使用した。
FIG. 2 shows a procedure for manufacturing the three-dimensional circuit board of FIG. Reference numeral 5 in (a) denotes a resin plate obtained by preforming a granular uncured epoxy resin containing a filler.
Is pressed together with the copper foil 6 by the heating dies 7 and 8 in the next step (b) to be cured and formed. The molding conditions of the heating molds 7 and 8 are as follows: temperature 180 ° C., pressure 7MP.
On the other hand, as the copper foil 6, a copper foil having a thickness of 18 μm which was heat-annealed at 350 ° C. for 80 minutes was used.

【0017】(c)は成形品の構成を示す。樹脂板5よ
り成形された樹脂基板1の表面には、凹部2をを含む立
体面3が形成されており、さらに、この立体面3の表面
には、銅箔6が一体に貼り付けられている。(d)は銅
箔6に対するフォトエッチング工程を示し、銅箔6の表
面にフォトレジスト9が塗布され、露光と現像とエッチ
ング等が行われ、これにより(e)に示されるような所
定のパターンの配線層4が形成される。
(C) shows the structure of the molded article. A three-dimensional surface 3 including a concave portion 2 is formed on the surface of the resin substrate 1 formed from the resin plate 5, and a copper foil 6 is integrally attached to the surface of the three-dimensional surface 3. I have. (D) shows a photo-etching process for the copper foil 6, in which a photoresist 9 is applied to the surface of the copper foil 6, exposure, development, etching and the like are performed, whereby a predetermined pattern as shown in (e) is obtained. Wiring layer 4 is formed.

【0018】図3(a)は、配線層4の上に無電解メッ
キによるNi(下)とAu(上)の積層メッキ膜10を
形成した完成構造を示す。メッキ膜10を形成する前に
配線層4を確認した結果、コーナ部をはじめとした配線
層4での破断の発生は一切なく、完成品においても問題
点はなかった。なお、この実施形態における凹部2の深
さd1 は1mmであり、凹部2の傾斜部2′の角度は4
5゜である。
FIG. 3A shows a completed structure in which a laminated plating film 10 of Ni (lower) and Au (upper) is formed on the wiring layer 4 by electroless plating. As a result of checking the wiring layer 4 before forming the plating film 10, no breakage occurred in the wiring layer 4 including the corner portion, and there was no problem in the finished product. The depth d 1 of the recess 2 in this embodiment is 1 mm, and the angle of the inclined portion 2 ′ of the recess 2 is 4 mm.
5 ゜.

【0019】図3(b)は、比較例を示したものであ
る。図2の製造手順において、銅箔6として熱処理をし
ない通常の電解銅箔を使用し、他を同一にして製造した
立体回路基板のメッキ前の状態を示したもので、d2
1mmの深さと金型7、8より加わる延伸力のために銅
箔6に破れが発生し、これを原因とした配線層4の破断
部11がコーナ部Cに散発していることが確認された。
図3(a)、(b)の対比により、銅箔6を熱処理する
本発明の効果は明白である。
FIG. 3B shows a comparative example. In the manufacturing procedure of FIG. 2, a state before plating of a three-dimensional circuit board manufactured by using a normal electrolytic copper foil which is not heat-treated as the copper foil 6 and making the other parts the same is shown, where d 2 =
It was confirmed that the copper foil 6 was torn due to the depth of 1 mm and the stretching force applied from the molds 7 and 8, and the broken portion 11 of the wiring layer 4 caused by this was spattered at the corner C. Was.
From the comparison between FIGS. 3A and 3B, the effect of the present invention of heat-treating the copper foil 6 is clear.

【0020】図4(a)は本発明の他の実施の形態を示
したもので、凹部2の深さd3 を2mmに設定し、凹部
2の傾斜部2′の角度を45゜に設定した例である。図
4(b)は、この立体回路基板の使用例を示したもので
ある。配線層4の表面に下地をNiとしたNiとAuの
積層メッキ膜10が形成され、この配線層4の中央部に
半導体チップ12が搭載される。半導体チップ12の電
極13と配線層4の所定の個所がボンディングワイヤ1
4によって接続され、全体が樹脂封止材15で覆われる
ことにより所定の半導体パッケージとされる。
FIG. 4A shows another embodiment of the present invention, in which the depth d 3 of the concave portion 2 is set to 2 mm, and the angle of the inclined portion 2 ′ of the concave portion 2 is set to 45 °. This is an example. FIG. 4B shows an example of use of the three-dimensional circuit board. On the surface of the wiring layer 4, a laminated plating film 10 of Ni and Au with Ni as a base is formed, and a semiconductor chip 12 is mounted on a central portion of the wiring layer 4. A predetermined portion between the electrode 13 of the semiconductor chip 12 and the wiring layer 4 is a bonding wire 1
4 and are entirely covered with a resin sealing material 15 to form a predetermined semiconductor package.

【0021】図5は、図4の立体回路基板の製造手順を
示す。樹脂基板1の成型形状が異なるだけで、手順は図
2と同じであるので説明は省略する。図2におけるのと
同じ銅箔6と樹脂板5を使用し、加熱金型7、8による
プレス条件を図2と同じに設定することにより立体回路
基板を製造した。
FIG. 5 shows a procedure for manufacturing the three-dimensional circuit board of FIG. The procedure is the same as that of FIG. 2 except that the molding shape of the resin substrate 1 is different, and the description is omitted. A three-dimensional circuit board was manufactured by using the same copper foil 6 and resin plate 5 as in FIG. 2 and setting the pressing conditions by the heating dies 7 and 8 to be the same as those in FIG.

【0022】凹部2のd3 を2mmと深く設定したにも
拘わらず、配線層4での破断の発生は全くなかったのに
比べ、同じ条件で熱処理なしの電解銅箔を使用して製造
した比較例は、コーナ部での破断が多発した。
Despite the fact that d 3 of the recess 2 was set as deep as 2 mm, no breakage occurred in the wiring layer 4. In the comparative example, breaks frequently occurred at the corners.

【0023】図6は、比較例における破断の発生状態を
示したもので、コーナ部Cに多数の破断部11の発生が
認められた。なお、熱処理なしの電解銅箔を使用した立
体回路基板の場合、凹部2の深さd3 が0.3mmで破
断が発生することが確認されており、2mmにおいても
破断の発生しない本発明の効果は顕著である。
FIG. 6 shows the state of occurrence of breakage in the comparative example. In the corner portion C, many breakage portions 11 were observed. In the case of a three-dimensional circuit board using an electrolytic copper foil without heat treatment, it has been confirmed that breakage occurs when the depth d 3 of the concave portion 2 is 0.3 mm, and the breakage does not occur even at 2 mm. The effect is significant.

【0024】図7は、多数の立体面を一度の成形によっ
て形成するとともに、これへの銅箔の貼り付けを一括し
て行う例を示したもので、予め、熱処理した銅箔6に対
して形成すべき立体面(図示せず)に対応した形状を与
えておく点に特徴を有する。
FIG. 7 shows an example in which a large number of three-dimensional surfaces are formed by a single molding, and the copper foil is adhered to the three-dimensional surface at a time. The feature is that a shape corresponding to a three-dimensional surface (not shown) to be formed is given.

【0025】立体面における高低差が大きな場合に好適
であり、銅箔6へ加わる成型時の延伸力が緩和され、熱
処理した銅箔6の伸びと賦形性の許容範囲内において立
体面への良好な貼り付けが可能となる。16は、打ち抜
き加工あるいはフォトエッチング等によって予め製品形
状に加工した孔加工部、17は完成品の裏面にグランド
層等を形成するために貼り付けられた銅箔を示し、通常
の電解銅箔より構成されている。
It is suitable when the height difference on the three-dimensional surface is large, the stretching force applied to the copper foil 6 at the time of molding is relaxed, and the elongation and the shaping of the heat-treated copper foil 6 can be applied to the three-dimensional surface within an allowable range. Good pasting becomes possible. Reference numeral 16 denotes a hole-formed portion previously formed into a product shape by punching or photoetching, and 17 denotes a copper foil adhered on the back surface of the finished product to form a ground layer or the like. It is configured.

【0026】図8は、本発明によって得られる立体回路
基板のさらに他の構成例を示す。図4において、加熱金
型7、8を複数化することによって樹脂基板1に複数の
立体面3を形成し、立体面3のそれぞれに形成された銅
箔6に所定のフォトエッチングを施して配線層とした
後、配線層4の所定の個所に貫通孔を形成し、この貫通
孔の内面に厚さ0.05μmの無電解メッキを施してス
ルーホール18を形成した構成を有するもので、点線1
9の部分から切断され、切断片が個々の立体回路基板と
して使用される。
FIG. 8 shows still another configuration example of the three-dimensional circuit board obtained by the present invention. In FIG. 4, a plurality of three-dimensional surfaces 3 are formed on the resin substrate 1 by forming a plurality of heating dies 7 and 8, and a predetermined photo-etching is performed on the copper foil 6 formed on each of the three-dimensional surfaces 3 to perform wiring. After forming a layer, a through hole is formed at a predetermined position of the wiring layer 4, and a through hole 18 is formed by applying an electroless plating having a thickness of 0.05 μm to the inner surface of the through hole. 1
9 and cut pieces are used as individual three-dimensional circuit boards.

【0027】[0027]

【発明の効果】以上説明したように、本発明による立体
回路基板およびその製造方法によれば、樹脂を加熱金型
によりプレスすると同時に、銅箔を成形された樹脂基板
の立体面に貼り付けるため、従来の立体形状の樹脂基板
に銅箔を接着したり、メッキの回路パターンを形成する
ものに比べると生産性に優れており、さらに、金属箔と
して、熱処理によって柔軟性と伸び特性を向上させ、賦
形性を向上させた銅箔を使用するため、樹脂基板を成形
するときに銅箔が破れることがない。従って、本発明に
よれば、生産性が高く、配線層に破断のない立体回路基
板を提供することができる。
As described above, according to the three-dimensional circuit board and the method of manufacturing the same according to the present invention, the resin is pressed by the heating die and the copper foil is attached to the three-dimensional surface of the molded resin substrate. It is superior in productivity to those that bond copper foil to a conventional three-dimensional resin substrate or form a circuit pattern of plating, and as a metal foil, improves flexibility and elongation characteristics by heat treatment. In addition, since the copper foil having improved shapeability is used, the copper foil is not broken when the resin substrate is formed. Therefore, according to the present invention, it is possible to provide a three-dimensional circuit board having high productivity and having no break in the wiring layer.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明による立体回路基板の実施の形態を示す
説明図であり、(a)は平面図、(b)は(a)のA−
A断面図を示す。
FIGS. 1A and 1B are explanatory views showing an embodiment of a three-dimensional circuit board according to the present invention, wherein FIG. 1A is a plan view and FIG.
FIG.

【図2】図1の立体回路基板を製造するための製造手順
を示す説明図。
FIG. 2 is an explanatory view showing a manufacturing procedure for manufacturing the three-dimensional circuit board of FIG. 1;

【図3】立体回路基板の断面図を示し、(a)は本発明
に基づく立体回路基板、(b)は比較例の立体回路基板
を示す。
3A and 3B are cross-sectional views of a three-dimensional circuit board, wherein FIG. 3A shows a three-dimensional circuit board based on the present invention, and FIG. 3B shows a three-dimensional circuit board of a comparative example.

【図4】本発明による立体回路基板の他の実施の形態を
示す説明図であり、(a)は斜視図、(b)その使用例
を示し、(a)のB−B断面から見た構成を示す。
FIGS. 4A and 4B are explanatory views showing another embodiment of the three-dimensional circuit board according to the present invention, wherein FIG. 4A is a perspective view, FIG. The configuration is shown.

【図5】図4の立体回路基板を製造するための製造手順
を示す説明図。
FIG. 5 is an explanatory view showing a manufacturing procedure for manufacturing the three-dimensional circuit board of FIG. 4;

【図6】比較例の立体回路基板における配線層の破断の
発生状態を示す説明図。
FIG. 6 is an explanatory view showing a state in which a wiring layer in a three-dimensional circuit board according to a comparative example is broken.

【図7】本発明による立体回路基板の製造方法の他の実
施の形態を示す説明図。
FIG. 7 is an explanatory view showing another embodiment of the method of manufacturing a three-dimensional circuit board according to the present invention.

【図8】本発明による立体回路基板の他の実施の形態を
示す説明図。
FIG. 8 is an explanatory view showing another embodiment of the three-dimensional circuit board according to the present invention.

【符号の説明】[Explanation of symbols]

1 樹脂基板 2 凹部 3 立体面 4 配線層 5 樹脂板 6 銅箔 7、8 加熱金型 9 フォトレジスト 10 メッキ膜 REFERENCE SIGNS LIST 1 resin substrate 2 recess 3 solid surface 4 wiring layer 5 resin plate 6 copper foil 7, 8 heating mold 9 photoresist 10 plating film

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐川 英之 茨城県日立市日高町5丁目1番1号 日立 電線株式会社パワーシステム研究所内 (72)発明者 浅野 秀樹 茨城県日立市日高町5丁目1番1号 日立 電線株式会社パワーシステム研究所内 (72)発明者 海老沼 尚武 神奈川県横浜市戸塚区吉田町292番地 株 式会社日立製作所生産技術研究所内 (72)発明者 中村 省三 神奈川県横浜市戸塚区吉田町292番地 株 式会社日立製作所生産技術研究所内 Fターム(参考) 4E351 AA01 BB01 BB30 BB33 BB38 BB50 CC22 CC31 DD04 DD06 DD19 EE10 GG20 5E338 AA05 AA16 BB63 BB75 CC01 CD05 EE27 EE31 5E339 AB02 AC07 BC02 BD06 BD11 BE11 CC01 CD01 CE16 CF16 CF17 DD02 EE05 FF02 FF03 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Hideyuki Sagawa 5-1-1 Hidakacho, Hitachi City, Ibaraki Prefecture Power Systems Research Laboratory, Hitachi Cable, Ltd. (72) Inventor Hideki Asano 5 Hidakacho, Hitachi City, Ibaraki Prefecture 1-1 1-1, Hitachi Cable, Ltd. Power Systems Research Laboratory (72) Inventor Naotake Ebinuma 292 Yoshida-cho, Totsuka-ku, Yokohama-shi, Kanagawa Pref. Hitachi Manufacturing Co., Ltd. (72) Inventor Shozo Nakamura Kanagawa 292 Yoshida-cho, Totsuka-ku, Yokohama-shi F-term in Hitachi, Ltd. Production Technology Laboratory (Reference) 4E351 AA01 BB01 BB30 BB33 BB38 BB50 CC22 CC31 DD04 DD06 DD19 EE10 GG20 5E338 AA05 AA16 BB63 BB75 CC01 CD05 EE27 EE31 5E339 AB02 AC02 BD11 BE11 CC01 CD01 CE16 CF16 CF17 DD02 EE05 FF02 FF03

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】表面に立体面を形成した樹脂基板と、前記
樹脂基板の前記立体面に一体に貼り付けられた金属箔に
よって形成された所定のパターンの配線層より構成され
る立体回路基板において、 前記配線層は、熱処理によって柔軟性と伸び特性を向上
させた金属箔によって構成されることを特徴とする立体
回路基板。
1. A three-dimensional circuit board comprising a resin substrate having a three-dimensional surface formed on a surface thereof, and a wiring pattern having a predetermined pattern formed by a metal foil integrally attached to the three-dimensional surface of the resin substrate. The three-dimensional circuit board, wherein the wiring layer is formed of a metal foil having improved flexibility and elongation characteristics by heat treatment.
【請求項2】前記金属箔は、銅箔より構成され、前記樹
脂基板は、充填剤を混合した熱硬化性樹脂より構成され
ることを特徴とする請求項1項記載の立体回路基板。
2. The three-dimensional circuit board according to claim 1, wherein the metal foil is made of a copper foil, and the resin substrate is made of a thermosetting resin mixed with a filler.
【請求項3】樹脂基板の表面に形成した立体面に所定の
パターンの配線層を形成した立体回路基板の製造方法に
おいて、 樹脂材料を予備成形して樹脂基板を準備し、 銅箔に所定の熱処理条件の熱処理を施して熱処理された
銅箔を準備し、 前記樹脂基板の上に前記熱処理された銅箔を配置して加
熱金型でプレスすることにより前記樹脂基板に前記立体
面を形成するとともに前記立体面に前記熱処理された銅
箔を貼り付け、 前記樹脂基板の前記立体面に貼り付けられた前記熱処理
された銅箔に所定のパターンニングを施して前記配線層
を形成することを特徴とする立体回路基板の製造方法。
3. A method of manufacturing a three-dimensional circuit board in which a wiring pattern having a predetermined pattern is formed on a three-dimensional surface formed on a surface of a resin substrate, wherein a resin material is preformed to prepare a resin substrate. Preparing a heat-treated copper foil by performing heat treatment under heat treatment conditions, forming the three-dimensional surface on the resin substrate by arranging the heat-treated copper foil on the resin substrate and pressing with a heating mold; Affixing the heat-treated copper foil to the three-dimensional surface, and applying a predetermined patterning to the heat-treated copper foil attached to the three-dimensional surface of the resin substrate to form the wiring layer. A method for manufacturing a three-dimensional circuit board.
【請求項4】前記熱処理された銅箔を準備するステップ
は、150〜600℃の温度で焼鈍されたものであっ
て、焼鈍後における結晶粒の大きさは5μm以上15μ
m以下の範囲にあって、かつ双晶組織であること、伸び
は20%以上を有し、銅箔の表面のビッカース硬さはH
v45以下であることを特徴とする請求項3項記載の立
体回路基板の製造方法。
4. The step of preparing the heat-treated copper foil is performed by annealing at a temperature of 150 to 600 ° C., and the size of crystal grains after annealing is 5 μm to 15 μm.
m and a twin structure, the elongation is 20% or more, and the Vickers hardness of the surface of the copper foil is H
4. The method for manufacturing a three-dimensional circuit board according to claim 3, wherein the value is v45 or less.
【請求項5】前記樹脂基板を準備するステップは、顆粒
状ないしは粉状の樹脂粉を圧縮成形することを特徴とす
る請求項3項記載の立体回路基板の製造方法。
5. The method for manufacturing a three-dimensional circuit board according to claim 3, wherein in the step of preparing the resin substrate, a granular or powdery resin powder is compression-molded.
【請求項6】前記熱処理された銅箔を貼り付けるステッ
プは、前記立体面を形成する前に前記立体面に対応した
立体形状を前記熱処理された銅箔に付与することを特徴
とする請求項3項記載の立体回路基板の製造方法。
6. The heat-treated copper foil according to claim 3, wherein the step of attaching the heat-treated copper foil gives a three-dimensional shape corresponding to the three-dimensional surface to the heat-treated copper foil before forming the three-dimensional surface. 4. The method for manufacturing a three-dimensional circuit board according to claim 3.
JP32327199A 1999-11-12 1999-11-12 Solid circuit board and manufacturing method therefor Pending JP2001144390A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP32327199A JP2001144390A (en) 1999-11-12 1999-11-12 Solid circuit board and manufacturing method therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP32327199A JP2001144390A (en) 1999-11-12 1999-11-12 Solid circuit board and manufacturing method therefor

Publications (1)

Publication Number Publication Date
JP2001144390A true JP2001144390A (en) 2001-05-25

Family

ID=18152937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP32327199A Pending JP2001144390A (en) 1999-11-12 1999-11-12 Solid circuit board and manufacturing method therefor

Country Status (1)

Country Link
JP (1) JP2001144390A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008044382A1 (en) * 2006-10-13 2008-04-17 Manac Inc. Circuit board and process for producing the same
JP2011096910A (en) * 2009-10-30 2011-05-12 Panasonic Electric Works Co Ltd Circuit board structure, circuit module using the same, and method of manufacturing the circuit module
JP2011199315A (en) * 2011-06-17 2011-10-06 Dowa Holdings Co Ltd Metal/ceramic bonding substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008044382A1 (en) * 2006-10-13 2008-04-17 Manac Inc. Circuit board and process for producing the same
JP2011096910A (en) * 2009-10-30 2011-05-12 Panasonic Electric Works Co Ltd Circuit board structure, circuit module using the same, and method of manufacturing the circuit module
JP2011199315A (en) * 2011-06-17 2011-10-06 Dowa Holdings Co Ltd Metal/ceramic bonding substrate

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