JP2001127305A5 - - Google Patents

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Publication number
JP2001127305A5
JP2001127305A5 JP2000246511A JP2000246511A JP2001127305A5 JP 2001127305 A5 JP2001127305 A5 JP 2001127305A5 JP 2000246511 A JP2000246511 A JP 2000246511A JP 2000246511 A JP2000246511 A JP 2000246511A JP 2001127305 A5 JP2001127305 A5 JP 2001127305A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000246511A
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Japanese (ja)
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JP4637333B2 (ja
JP2001127305A (ja
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Priority to JP2000246511A priority Critical patent/JP4637333B2/ja
Priority claimed from JP2000246511A external-priority patent/JP4637333B2/ja
Publication of JP2001127305A publication Critical patent/JP2001127305A/ja
Publication of JP2001127305A5 publication Critical patent/JP2001127305A5/ja
Application granted granted Critical
Publication of JP4637333B2 publication Critical patent/JP4637333B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000246511A 1999-08-18 2000-08-15 半導体装置の作製方法 Expired - Fee Related JP4637333B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000246511A JP4637333B2 (ja) 1999-08-18 2000-08-15 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-231281 1999-08-18
JP23128199 1999-08-18
JP2000246511A JP4637333B2 (ja) 1999-08-18 2000-08-15 半導体装置の作製方法

Publications (3)

Publication Number Publication Date
JP2001127305A JP2001127305A (ja) 2001-05-11
JP2001127305A5 true JP2001127305A5 (cg-RX-API-DMAC7.html) 2007-10-25
JP4637333B2 JP4637333B2 (ja) 2011-02-23

Family

ID=26529786

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000246511A Expired - Fee Related JP4637333B2 (ja) 1999-08-18 2000-08-15 半導体装置の作製方法

Country Status (1)

Country Link
JP (1) JP4637333B2 (cg-RX-API-DMAC7.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4683761B2 (ja) * 2000-05-12 2011-05-18 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4282985B2 (ja) 2002-12-27 2009-06-24 株式会社半導体エネルギー研究所 表示装置の作製方法
JP5307992B2 (ja) * 2007-07-27 2013-10-02 株式会社半導体エネルギー研究所 表示装置の生産方法
TW201234419A (en) * 2011-01-13 2012-08-16 Shibaura Inst Technology METHOD FOR FORMING POLYCRYSTALLINE THIN FILM OF Si AND/OR Ge ON SUBSTRATE

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0350720A (ja) * 1989-07-18 1991-03-05 Seiko Epson Corp 多結晶シリコン再結晶化法
JP3355137B2 (ja) * 1993-02-10 2002-12-09 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2531383B2 (ja) * 1994-07-11 1996-09-04 ソニー株式会社 薄膜トランジスタの製法

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