JP2001110798A5 - - Google Patents

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Publication number
JP2001110798A5
JP2001110798A5 JP1999283098A JP28309899A JP2001110798A5 JP 2001110798 A5 JP2001110798 A5 JP 2001110798A5 JP 1999283098 A JP1999283098 A JP 1999283098A JP 28309899 A JP28309899 A JP 28309899A JP 2001110798 A5 JP2001110798 A5 JP 2001110798A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999283098A
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Japanese (ja)
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JP2001110798A (ja
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Priority to JP28309899A priority Critical patent/JP2001110798A/ja
Priority claimed from JP28309899A external-priority patent/JP2001110798A/ja
Publication of JP2001110798A publication Critical patent/JP2001110798A/ja
Publication of JP2001110798A5 publication Critical patent/JP2001110798A5/ja
Pending legal-status Critical Current

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JP28309899A 1999-10-04 1999-10-04 プラズマｃｖｄ装置及び薄膜製造方法 Pending JP2001110798A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28309899A JP2001110798A (ja) 1999-10-04 1999-10-04 プラズマｃｖｄ装置及び薄膜製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28309899A JP2001110798A (ja) 1999-10-04 1999-10-04 プラズマｃｖｄ装置及び薄膜製造方法

Publications (2)

Publication Number Publication Date
JP2001110798A JP2001110798A (ja) 2001-04-20
JP2001110798A5 true JP2001110798A5 (enExample) 2005-11-04

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ID=17661200

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28309899A Pending JP2001110798A (ja) 1999-10-04 1999-10-04 プラズマｃｖｄ装置及び薄膜製造方法

Country Status (1)

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JP (1) JP2001110798A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7976673B2 (en) * 2003-05-06 2011-07-12 Lam Research Corporation RF pulsing of a narrow gap capacitively coupled reactor
JP2007287890A (ja) * 2006-04-14 2007-11-01 Kochi Univ Of Technology 絶縁膜の成膜方法、半導体装置の製法、プラズマｃｖｄ装置
WO2015175934A1 (en) * 2014-05-15 2015-11-19 Anthony John Mark Deposition and patterning using emitted electrons
CN114203527A (zh) * 2021-12-15 2022-03-18 浙江大学杭州国际科创中心 一种碳化硅晶片热氧化的方法及装置

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