JP2001100019A - Color filter substrate, electrooptical device using color filter substrate, its manufacturing method and electronic instrument - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a color filter substrate, which prevents light scattering due to generation of protrusions on a chromium layer in the case a light shielding layer provided for the color filter substrate comprises a multilayer structure using a chromium oxide layer and/or a chromium nitride layer and the chromium layer. SOLUTION: The color filter substrate is provided with a color filter 220 arranged on a substrate 200. The color filter 220 comprises plural coloring material layers 202, etc., arranged on the substrate and light shielding layers 201 arranged between the mutually neighboring coloring material layers 202, etc. The light-shielding layer 201 comprises the multilayer structure composed of the chromium layer 201a and the chromium oxide layer and/or the chromium nitride layer 201b provided at least on a substrate 200-side surface of the chromium layer 201a. An inner peripheral wall of the chromium layer 201a is characterized by being more recessed inwardly than inner peripheral walls of the chromium oxide layer and/or the chromium nitride layer 201b.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a color filter substrate having a color filter comprising a plurality of color material layers provided on a substrate and a light-shielding layer provided between adjacent color material layers. The present invention relates to an electro-optical device using the color filter substrate, a method of manufacturing the same, and an electronic apparatus.

[0002]

2. Description of the Related Art A color liquid crystal display device generally realizes color display by forming a color filter having a fine color material layer inside a panel. The color filter is obtained by applying an organic film containing a dye or a pigment on a substrate and finely processing the same by photolithography. When performing multi-color display, it is common to form red, green, and blue color material layers for each dot. Here, the area of the color material layer of each color corresponds to 1
It is formed to be larger than the area of the pixel electrode for displaying the dot. In general, a light-shielding film is provided between pixel electrodes adjacent to each other or between color material layers for the purpose of improving display contrast and the like.

A liquid crystal display device having such a structure is used as a display device of a portable electronic device which is rapidly spreading in recent years. Liquid crystal display devices are lightweight for portable devices.
This is because it has thinness, low power consumption, and high display quality. In many cases, a black-and-white or monochromatic reflective liquid crystal display device is used for applications requiring lower power consumption, and a transmissive color liquid crystal display device with a backlight is used for applications requiring higher display quality. .

[0004] In recent years, attention has been paid to research on a reflection type color liquid crystal display device which aims at high display quality such as being bright even in a dark environment and having good panel visibility in view of low power consumption.

FIG. 17 is a plan view showing the structure of a conventional reflective color liquid crystal display device, and FIG. 18 is a sectional view taken along the line aa 'of FIG.

A conventional reflection type color liquid crystal display device includes a transparent substrate having a color filter 900b, a so-called color filter substrate 900, and a transparent substrate having a TFD (metal / oxide film / metal) element 913 formed thereon, a so-called active element substrate 910. The color filter substrate 900 and the active element substrate 910 are arranged to face each other, and a liquid crystal layer 930 is sandwiched between the two substrates with a specific gap.

On the color filter substrate 900 (lower side in the drawing), R (red), G (green), and B (blue) color material layers 9 are provided.
02, 903, and 904 and a light-shielding film (black matrix) 901 provided between these color material layers.
00b on the transparent electrode 906 via a protective film 905
And an alignment film 907 is formed thereon. The light-shielding film 901 has a three-layer structure in which chromium oxide films 901b and 901b of a low-reflection material are provided on both surfaces of a chromium film 901a.

On the other hand, on the active element substrate 910,
There is a transparent pixel electrode 912 connected to the signal line 911 by the TFD element 913, and an alignment film 917 is further formed.

A polarizing plate 908 is provided on the outer surface (upper side in the drawing) of the color filter substrate 900, and a polarizing plate 918 is provided on the outer surface (lower side in the drawing) of the active element substrate 910.
And a reflection plate 919 are attached so as to match the designated transmission and absorption axes, respectively, and display is performed by controlling the amount of reflected incident light of the surrounding environment by an electric field between electrodes applied to the liquid crystal.

As a conventional method for forming a light-shielding film having a multilayer structure as described above, a chromium oxide film is formed on a transparent substrate by reactive sputtering, and then a chromium film is formed on the chromium oxide film by sputtering. Next, a chromium oxide film is formed on the chromium film in the same manner as described above to form a laminated film, and then a photosensitive resist is applied, exposed, and developed on the laminated film to form a resist pattern. When the laminated film is etched using an etching solution containing ceric ammonium nitrate as a main component and the resist pattern as a mask, a light-shielding film 901 as shown in FIG. 18 is obtained.

When the color liquid crystal display device provided with the color filter substrate 900 is of a transmission type, the light-shielding film has a two-layer structure in which a chromium oxide film is provided on the transparent substrate side of a chromium film. Is also good.

[0012]

By the way, in the reflection type color liquid crystal display device, in order to improve the visibility of the panel, it is required to further reduce the light reflection on the surface of the light shielding film which is one of the components. Can be

However, in the conventional reflection type color liquid crystal display device as shown in FIGS. 17 and 18, since the peripheral wall of the chromium layer 901a protrudes outward from the chromium oxide film 901b, the outside of the color filter substrate 900 is formed. When the light incident on the light-shielding film 901 hits the protruding portion of the chrome film 901a, the light is scattered there and the display surface is glazed, and the panel visibility is reduced. Further, the color filter substrate 900 and the liquid crystal layer 9 are disposed from outside the liquid crystal display device.
30, the light incident through the active element substrate 910 is
Although the light is reflected by the reflection plate 919, if the inner peripheral wall of the chromium film 901a surrounding the color material layer protrudes outward from the inner peripheral wall of the chromium oxide film 901b surrounding the color material layer, the reflected light is reflected on the protrusion. When it scatters, multiple reflections occur,
Display unevenness and color unevenness occur.

The chromium film 90 as described above is
The protrusion 1a is generated when the chromium oxide film and the laminated film including the chromium film and the chromium oxide film are etched by using the etching solution containing ceric ammonium nitrate as a main component. It is considered that the etching rate of the chromium oxide film is higher than that of the chromium film, so that the chromium oxide film is rapidly etched. A method for resolving sticking, display unevenness and color unevenness has not yet been established.

The present invention has been made in view of the above circumstances, and when a light-shielding layer provided on a color filter substrate has a multilayer structure using a chromium oxide layer and / or a chromium nitride layer and a chromium layer, the chromium layer An object of the present invention is to provide a color filter substrate that can prevent light scattering caused by the formation of a protrusion.

Also, a method of manufacturing the color filter substrate, an electro-optical device using the color filter substrate, and
It is an object to provide an electronic apparatus including the electro-optical device.

[0017]

A color filter substrate according to the present invention is a color filter substrate having a color filter provided on a substrate, wherein the color filter comprises a plurality of color material layers provided on the substrate. And a light-shielding layer provided between adjacent color material layers, wherein the light-shielding layer is a multilayer comprising a chromium layer and a chromium oxide layer and / or a chromium nitride layer provided on at least a surface of the chromium layer on the substrate side. The chromium layer has a structure in which an inner peripheral wall of a portion surrounding the color material layer is recessed inward from an inner peripheral wall of a portion of the chromium oxide layer and / or the chromium nitride layer surrounding the color material layer. Features.

According to the above configuration, a reflection type liquid crystal device of a simple matrix type, a reflection type liquid crystal device of an active matrix type using a two-terminal switching element such as TFD (metal / oxide film / metal), a TFT ( An inner peripheral wall of a portion surrounding the color material layer of the chromium layer provided in the multilayer light-shielding layer is used for the active matrix type reflection type liquid crystal device using switching means such as a thin film transistor). And / or the chrome nitride layer is recessed inward from the inner peripheral wall of the portion surrounding the color material layer, so that light incident from the outside of the reflective liquid crystal device may scatter light on the chrome layer of the light shielding layer. In addition, it is possible to prevent glare on the display surface and improve visibility.

When the color filter substrate is used in the above-mentioned reflection type liquid crystal device, light incident from the outside of the liquid crystal device is reflected by a reflection means such as a reflection layer provided in the reflection type device. However, the inner peripheral wall of the chrome layer of the light-shielding layer having the multilayer structure surrounding the coloring material layer is recessed inward from the inner peripheral wall of the chrome oxide layer and / or the chromium nitride layer surrounding the coloring material layer. Since the reflected light does not scatter on the chrome layer of the light shielding layer,
Multiple reflection can be prevented, and thus display unevenness and color unevenness caused by multiple reflection can be prevented, and display performance can be improved.

When the color filter substrate is used in a transmissive liquid crystal device or a transflective liquid crystal device, light emitted from the inside of the liquid crystal device such as a backlight scatters on the chrome layer of the light shielding layer. Without multiple reflection, multiple reflection can be prevented, and therefore display unevenness and color unevenness due to multiple reflection can be prevented, and display performance can be improved.

In the above-mentioned color filter substrate, it is preferable that the light-shielding layer is formed of a three-layer structure in which a chromium oxide layer and / or a chromium nitride layer are provided on both surfaces of a chromium layer.

According to the above configuration, when used in a reflection type liquid crystal device, light incident from the outside does not scatter on the chromium layer of the light shielding layer, so that glare on the display surface can be prevented and visual recognition can be prevented. Property, and the incident light is
The light is reflected by a reflection means such as a reflection layer provided in the reflection type liquid crystal device, but the reflected light does not scatter on the chrome layer of the light shielding layer, so that multiple reflections can be prevented, and thus display unevenness caused by multiple reflections can be prevented. Color unevenness can be prevented, and display performance can be improved.

In the above-mentioned color filter substrate, the light-shielding layer is formed of a laminate comprising a chromium layer and two or more chromium oxide layers and / or chromium nitride layers provided on the substrate side of the chromium layer. In this case, it is preferable that the refractive index of the laminate increases in order from the chromium oxide layer and / or the chromium nitride layer on the substrate side to the chromium layer. According to the above configuration, the reflectance of the light shielding layer can be made smaller,
In addition to improving the visibility, the light emitted from the inside of the transmissive liquid crystal device or the transflective liquid crystal device such as a backlight does not scatter on the chrome layer of the light shielding layer, thereby preventing multiple reflections. Display unevenness and color unevenness due to reflection can be prevented, and display performance can be improved.

An electro-optical device according to the present invention is an electro-optical device having an electro-optical material between two substrates facing each other, wherein one of the two substrates has one of the above structures. It is characterized by using the color filter substrate of the present invention.

With such an electro-optical device, the inner peripheral wall of the chrome layer of the light-shielding layer having a multi-layer structure provided on the color filter substrate and surrounding the color material layer is oxidized in the upper and / or lower layers. Since the chrome layer and / or the chromium nitride layer is recessed from the inner peripheral wall of the portion surrounding the coloring material layer, the light-shielding layer has no chrome layer protrusion, and therefore the chrome layer has a protrusion in the light-shield layer. Since the occurrence of light scattering can be improved, visibility can be improved and display performance can be improved. An electronic apparatus according to another aspect of the invention includes the electro-optical device according to the aspect of the invention.

With such an electronic device, the visibility can be improved and the image quality can be improved.

According to a method of manufacturing an electro-optical device of the present invention, a color comprising a plurality of color material layers provided on a substrate and a light shielding layer provided between adjacent color material layers is provided. A method for manufacturing a color filter substrate provided with a filter, comprising: a laminated film in which a chromium oxide layer and / or a chromium nitride layer and a chromium layer are sequentially formed on a substrate; or a chromium oxide layer and / or a chromium nitride layer and a chromium layer Forming a resist pattern on the surface of a laminated film in which a layer and a chromium oxide layer and / or a chromium nitride layer are sequentially formed, etching the laminated film using the resist pattern as a mask, having the predetermined pattern, and A light-shielding layer in which the inner peripheral wall of the chrome layer surrounding the color material layer is recessed inward from the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer surrounding the color material layer. It characterized by having a step of forming.

According to such a method of manufacturing the electro-optical device, the inner peripheral wall of the chromium layer surrounding the color material layer is a portion of the chromium oxide layer and / or the chromium nitride layer surrounding the color material layer. An electro-optical device having a light-shielding layer depressed inward from the inner peripheral wall can be provided.

In the method of manufacturing an electro-optical device according to the present invention, when the laminated film is etched using the resist pattern as a mask, an etching solution containing ceric ammonium nitrate as a main component is used, and an etching temperature of 2 nm is used.
It is desirable that the temperature be 5 ° C or less.

According to such a method of manufacturing an electro-optical device, the etching temperature of the laminated film with the etching solution is set to 25 ° C. or less, whereby the etching of the chromium layer constituting the laminated film is performed. Since the rate is higher than the etching rate of the chromium oxide layer and / or the chromium nitride layer, the chromium layer is etched quickly, and the inner peripheral wall of the chromium layer surrounding the color material layer has a chromium oxide layer and / or a nitrided layer. It is possible to form a light-shielding layer that is recessed inward from an inner peripheral wall of the chrome layer that surrounds the color material layer.

In the above-described method of manufacturing an electro-optical device, the etching temperature is preferably set to 10 ° C. to 25 ° C., more preferably, 18 ° C. to 23 ° C.
゜ C or less.

If the etching temperature for etching the laminated film with the etching solution exceeds 25 ° C., the etching rate of the chromium oxide layer and / or the chromium nitride layer becomes larger than the etching rate of the chromium layer, and The inner peripheral wall surrounding the color material layer protrudes outward from the inner peripheral wall surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer. On the other hand, if the etching temperature is lower than 10 ° C., the etching rate of the laminated film is too low, and the production efficiency is deteriorated.

[0033]

Embodiments of the present invention will be described below with reference to the drawings.

(First Embodiment of Electro-Optical Device) A liquid crystal panel of a first embodiment of an electro-optical device using a color filter substrate according to the present invention will be described below with reference to FIGS. FIG. 1 is a plan view showing a first embodiment in which the present invention is applied to a TFD (metal / oxide film / metal) active matrix reflective liquid crystal panel.
Is a cross-sectional view of the reflective liquid crystal panel shown in FIG. 1 along the line II-II, and FIG. 3 is a perspective view showing a main part of the reflective liquid crystal panel shown in FIG. Note that these drawings are for explaining the configuration of the liquid crystal panel, and the size, thickness, dimensions, and the like of each part shown in the drawings are different from the actual dimensional relationship of the liquid crystal panel. The liquid crystal panel 1 of this embodiment includes a liquid crystal driving I
A liquid crystal display device or a liquid crystal device (electro-optical device) is configured by mounting ancillary elements such as C and a support.

The liquid crystal panel 1 of this embodiment uses a TFD element (Thin Film Diode) and has a transparent substrate 210 on which a TFD element is formed, that is, a so-called active element substrate. A counter substrate 200 on which a color filter 220 is formed, that is, a so-called color filter substrate is disposed. In FIG. 1, reference numeral 12 denotes an annular sealing material. The sealing material 12 is interposed between the transparent substrate 210 and the counter substrate 200.

As shown in FIG. 2, the color filter substrate 2
A color filter 220 is provided on the top of the color filter 200 (under the color filter substrate 200 in FIG. 2). The color filter 220 includes a plurality of color material layers 202 formed on the substrate 200 and adjacent color material layers 202, 202.
Light shielding layer (black matrix) 20 provided between
1 is provided.

Each color material layer 202 includes red (R), green (G),
It is colored in any one of blue (B), and is arranged in a mosaic shape in FIG. 3, but may be arranged in a stripe shape or a triangle shape.

The light-shielding layer 201 is formed in a matrix so as to surround the color material layers 202..., And has a function of improving contrast, preventing mixing of color materials, etc., that is, a function as a so-called black matrix. Things.

As shown in FIG. 2, the light-shielding layer 201 is formed by stacking a chromium oxide layer and / or a chromium nitride layer 201b, a chromium layer 201a, a chromium oxide layer and / or a chromium nitride layer 201b in this order from the substrate 200 side. It has a three-layer structure. Also, the chrome layer 201a of the light shielding layer 201
Of the chrome oxide layer and / or the chromium nitride layer 201b is inwardly recessed from the inner peripheral wall of the portion surrounding the color material layer 202. In the following embodiments, the inner peripheral wall of the chrome layer surrounding the color material layer is abbreviated as the inner peripheral wall of the chrome layer. Further, the inner peripheral wall of the portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer is abbreviated as the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer.

The specific dimensions of the light shielding layer 201 are as follows: the thickness of the chromium layer 201a is about 1500 angstroms, and the thickness of the chromium oxide layer and / or the chromium nitride layers 201b and 201b above and below the chromium layer 201a is respectively It is about 300 to 400 angstroms. The width of the chromium layer 201a between the adjacent color material layers 202 is about 10 to 50 μm, and the inner peripheral wall of the chromium layer 201a is 0 to 200 μm thicker than the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer 201b. Preferably, it is located on the inner side of about Å.

The chrome layer 2 forming the light shielding layer 201
01a or each chromium oxide layer and / or chromium nitride layer 201
The thickness of b and the width of the chromium layer 201a and the chromium oxide layer and / or the chromium nitride layer 201b between the adjacent color material layers 202, 202 are not limited to the ranges described above, and may be arbitrarily changed. It is possible.

Further, the color filter substrate 200 has the structure shown in FIG.
3 to 3, a protective film 205 covering the color filter 220 is provided.

On the protective film 205 (under the protective film 205 in FIG. 2), a transparent electrode (scanning electrode) 206 made of an ITO (Indium Tin Oxide) film or the like is formed in a stripe shape in the horizontal direction of the paper. . Further, the transparent electrode 20
6 (under the transparent electrode 206 in FIG. 2).
Are formed.

As shown in FIG. 3, the active element substrate 210 has TFD elements 214 arranged in a matrix.
And a plurality of signal lines 211 are formed, and each signal line 211 is connected in series with a plurality of TFD elements 214. Also, each TFD element 214.
12 are connected. An alignment film 217 is formed on the signal lines 211, the TFD elements 214, and the pixel electrodes 212, as shown in FIG.

Then, between the two substrates, the alignment films 207, 21
A liquid crystal layer 230, a spacer (not shown), and the like are arranged in a liquid crystal enclosing region surrounded by the annular seal member 7 and the annular seal member 12.
The liquid crystal forming the liquid crystal layer 230 is a kind of electro-optical material.

As shown in FIGS. 2 and 3, a polarizing plate 208 is provided on the color filter substrate 200, and a polarizing plate 218 is provided on the active element substrate 210 (under the substrate 210 in FIGS. 2 and 3). And a reflection plate 219 are adhered in accordance with the designated transmission / absorption axes.

Under this configuration, a scanning signal and a data signal are applied to the signal line 211 to which the transparent electrode 206 and the TFD element 214 are connected by a driving circuit (not shown). Thus, the TFD element 214 is driven, and the display is performed by controlling the alignment state of the liquid crystal.

The transparent electrode 206 may be used as a data line to which a data signal is applied, and the signal line 211 to which the TFD element 214 is connected may be used as a scanning line to which a scanning signal is applied.

The color filter 220 provided on the color filter substrate 200 of the liquid crystal panel 1 of the first embodiment can be manufactured as described below.

First, an example of a method of forming a light shielding layer provided in the color filter 220 will be described with reference to FIG.
In manufacturing the light-shielding layer 201, a sputtering apparatus including a film formation chamber capable of being evacuated and a target made of chromium metal disposed in the film formation chamber is used, and the atmosphere gas in the film formation chamber is changed. The light shielding layer 20 having a multilayer structure
1 can be formed. The chrome layer 201 of the light shielding layer 201
When the chromium oxide layers 201b are formed as the upper and lower surfaces of the layer a, the target may be made of chromium oxide instead of chromium metal.

After disposing the opposing substrate 200 made of a transparent substrate in the film forming chamber, a mixed gas atmosphere of an oxygen gas or a nitrogen gas and an inert gas is formed. To deposit the constituent particles of the target on the surface of the counter substrate 200,
As shown in FIG. 4A, a thickness of 300
A chromium oxide layer of about ~ 400 Å and / or
Alternatively, the chromium nitride layer 201b is formed by reactive sputtering. Next, the atmosphere gas in the film formation chamber is changed to an inert gas atmosphere, and the target is sputtered to form constituent particles of the target with the chromium oxide layer and / or
Alternatively, it is deposited on the surface of the chromium nitride layer 201b, and FIG.
As shown in FIG. 7, a chromium layer 201a having a thickness of about 1500 angstroms is formed by sputtering. Next, the atmosphere gas in the film formation chamber was changed to a mixed gas atmosphere of an oxygen gas or a nitrogen gas and an inert gas, and the target was sputtered to deposit constituent particles of the target on the surface of the chromium layer 201a. As shown in FIG. 4A, a chromium oxide layer and / or a chromium nitride layer 201b having a thickness of about 300 to 400 angstroms is formed by reactive sputtering to obtain a laminated film 203 having a three-layer structure.

Thereafter, as shown in FIG.
A positive photosensitive resist 204 is applied on the substrate 03. Next, as shown in FIG. 4C, after a photomask 231 having a predetermined pattern is arranged on the photosensitive resist 204, exposure is performed. Then, as shown in FIG. 4D, the exposed photosensitive resist 204 is developed to form a resist pattern 204a, and is baked if necessary. Here, an alkaline aqueous solution is used as the developer.

Next, the laminated film 203 is formed with a resist pattern 204 at an etching temperature of 25 ° C. or less using an etching solution containing ceric ammonium nitrate as a main component.
Etching is performed using a as a mask.

Thereafter, when the resist pattern 204a is stripped using a stripping solution, a light-shielding layer 201 having a three-layer structure as shown in FIGS. 2 to 3 and FIG. 4E is obtained. Here, an alkaline aqueous solution having an alkali concentration higher than that of the developer is used as the stripping solution.

The light-shielding layer 201 thus obtained is
An inner peripheral wall having a predetermined pattern and surrounding the color material layer 202 of the chromium layer 201a has upper and lower chromium oxide layers and / or chromium nitride layers 201b and 201b.
Is inwardly recessed from an inner peripheral wall which is a portion surrounding the color material layer 202.

The inner peripheral wall of the chromium layer 201a surrounding the color material layer 202 has upper and lower chromium oxide layers and / or
Alternatively, the light-shielding layer 20 depressed inward from the inner peripheral wall which is a portion surrounding the color material layer 202 of the chromium nitride layers 201b and 201b
1 can be obtained when the laminated film 203 is etched using the above-mentioned etching solution at an etching temperature of 25 ° C.
This is because the following makes the etching rate of the chromium layer 201a constituting the stacked film 203 higher than the etching rate of the chromium oxide layer and / or the chromium nitride layer 201b, and the chromium layer 201a is etched quickly.

The etching temperature for etching the laminated film 203 is 10 ° C. because the etching rate of the chromium layer can be made higher than the etching rate of the chromium oxide layer and / or the chromium nitride layer and the production efficiency is good. It is desirable that the temperature be not less than C and not more than 25 ° C, more desirably not less than 18 ° C and not more than 23 ° C.

After the light-shielding layer 201 is formed on the opposing substrate 200 as described above, a photosensitive resist containing a red coloring material is applied thereon, and then exposed and developed to perform R
A (red) color material layer 202 is formed. Next, when the G (green) color material layer 202 and the B (blue) color material layer 202 are formed in the same manner, a color filter 220 is obtained. The coloring material layers 202 can be formed by various methods such as various printing methods, electrodeposition methods, transfer methods, and dyeing methods, in addition to the above-described pigment dispersion method.

According to the liquid crystal panel 1 of the first embodiment, the inner peripheral wall of the chromium layer 201a of the light-shielding layer 201 provided on the color filter substrate 200 has chromium oxide layers and / or chromium nitride layers provided above and below it. 201b, the light incident from the outside of the reflection type liquid crystal panel 1 is reflected by the chrome layer 2 of the light shielding layer 201.
Light is not scattered in 01a, so that glare on the display surface can be prevented and visibility can be improved. Light incident from the outside of the liquid crystal panel 1 is reflected by a reflection plate 219 provided in the liquid crystal panel 1, but the inner peripheral wall of the chrome layer 201a of the light shielding layer 201 having a three-layer structure has a chromium oxide layer and / or Since the chromium nitride layer 201b is recessed inward from the inner peripheral wall, the reflected light is
The light is not scattered, and multiple reflection can be prevented. Therefore, display unevenness and color unevenness caused by multiple reflection can be prevented, and display performance can be improved.

(Second Embodiment of Electro-Optical Device) FIG. 5 is a partial sectional view of a second embodiment in which the present invention is applied to a simple matrix type reflection type liquid crystal panel using a color filter substrate, and FIG. It is a perspective view which shows the principal part of the reflection type liquid crystal panel of No. 5.

The reflection type liquid crystal panel shown in FIGS.
It has a substrate 310 on which a plurality of strip-shaped data electrodes or scanning electrodes 312 are formed.
Filter substrate 300 including a cross electrode or data electrode 306 and a color filter 320
Is arranged.

The color filter 3 is provided on the color filter substrate 300 (the lower side of the color filter substrate 300 in FIG. 5).
20 are provided. This color filter 320
A plurality of color material layers 302 formed on the substrate 300;
And a light shielding layer (black matrix) 301 provided between the adjacent color material layers 302, 302. Each color material layer 302 is similar to that of the first embodiment,
It is colored in any of red (R), green (G) and blue (B). As shown in FIG. 5, the light-shielding layer 301 has a three-layer structure in which a chromium oxide layer and / or a chromium nitride layer 301b, a chromium layer 301a, a chromium oxide layer and / or a chromium nitride layer 301b are sequentially stacked from the substrate 300 side. belongs to. Further, the chrome layer 30 of the light shielding layer 301
1a is a chromium oxide layer and / or a chromium nitride layer 3
01b is recessed inward from the inner peripheral wall. The color filter 320 used in the second embodiment can be manufactured in the same manner as the color filter 220 used in the first embodiment.

Further, the color filter substrate 300 has the structure shown in FIG.
6, a protective film 305 covering the color filter 320 is provided, and a transparent electrode 306 serving as a scanning electrode or a data electrode is formed on the protective film 305 (under the protective film 305 in FIG. 5). The alignment film 3 is further formed on the transparent electrode 306 (under the transparent electrode 306 in FIG. 5).
07 is formed.

On the other hand, on the substrate 310, the data electrodes or the scanning electrodes 312 are arranged in a strip shape, and the alignment film 317 is formed.

Then, a liquid crystal is sealed between the two substrates with a specific gap therebetween to form a liquid crystal layer 330.

The color filter substrate 300 has a polarizing plate 308, and the substrate 310 has a polarizing plate 318 and a reflecting plate 319.
Are affixed to the designated transmission and absorption axes, respectively, and are displayed by controlling the amount of reflected incident light in the surrounding environment by the electric field between the electrodes applied to the liquid crystal.

Since the reflection type liquid crystal panel of the second embodiment is provided with the color filter substrate 300 having the light shielding layer 301 having the above configuration, the same operation and effect as those of the reflection type liquid crystal panel of the first embodiment are provided. There is.

(Third Embodiment of Electro-Optical Device) FIG. 7 is a partial sectional view showing a third embodiment in which the present invention is applied to a TFT (thin film transistor) active matrix type reflection type liquid crystal panel using a color filter substrate. FIG. 8 is a perspective view showing a main part of the reflective liquid crystal panel of FIG.

The reflection type liquid crystal panel shown in FIGS.
An active element substrate 410 having a transparent pixel electrode 412 connected to the TFT 413 is formed, and a common substrate (color filter substrate) 400 is arranged at a position facing the active element substrate 410.

The color filter 4 is provided on the color filter substrate 400 (under the color filter substrate 400 in FIG. 7).
20 are provided. This color filter 420
A plurality of color material layers 402 formed on the substrate 400
And a light shielding layer (black matrix) 401 provided between the adjacent color material layers 402 and 402. Each color material layer 402 is similar to that of the first embodiment,
It is colored in any of red (R), green (G) and blue (B). As shown in FIG. 7, the light-shielding layer 401 has a three-layer structure in which a chromium oxide layer and / or a chromium nitride layer 401b, a chromium layer 401a, a chromium oxide layer and / or a chromium nitride layer 401b are sequentially stacked from the substrate 700 side. belongs to. Also, the chrome layer 40 of the light shielding layer 401
1a is a chromium oxide layer and / or a chromium nitride layer 4
01b is recessed inward from the inner peripheral wall. The color filter 420 used in the third embodiment can be manufactured in the same manner as the color filter 420 used in the first embodiment.

Further, the color filter substrate 400
8, a protective film 405 is provided to cover the color filter 420, and a common electrode 406 is formed on the protective film 405 (under the protective film 405 in FIG. 7). An alignment film 407 is formed above (below the common electrode 406 in FIG. 7).

On the other hand, on the active element substrate 410,
TFT 413 controlled by a signal line 411 and a scanning line 415
There is a transparent pixel electrode 412 connected by
Are formed.

Then, a liquid crystal is injected between the two substrates with a specific gap therebetween to form a liquid crystal layer 430.

A polarizing plate 408 is provided on the color filter substrate 400, and a polarizing plate 418 is provided on the active element substrate 410.
And a reflection plate 419 are adhered to the designated transmission and absorption axes, respectively, and display is performed by controlling the amount of reflected incident light of the surrounding environment by the electric field between the electrodes applied to the liquid crystal.

Since the reflection type liquid crystal panel of the third embodiment is provided with the color filter substrate 400 having the light shielding layer 401 having the above-described configuration, the same operation and effect as those of the reflection type liquid crystal panel of the first embodiment are provided. There is.

(Fourth Embodiment of Electro-Optical Device) FIG. 9 is a partial sectional view of a fourth embodiment in which the present invention is applied to a simple matrix type reflection type liquid crystal panel using a color filter substrate.

The reflection type liquid crystal panel 500 of the fourth embodiment
Is a pair of transparent substrates 513 and 514 adhered to each other via a substantially rectangular and annular sealing material (not shown) in plan view, and sandwiched therebetween by being surrounded by the sealing material. Liquid crystal layer 515 and one transparent substrate 51
3 mainly includes a polarizing plate 16 attached to the upper surface side.

Of the transparent substrates 513 and 514, the transparent substrate 513 is a front transparent substrate provided facing the observer side, and the transparent substrate (color filter substrate) 514 is provided on the opposite side, in other words, the transparent substrate provided on the back side. It is a substrate. In this embodiment, only one polarizing plate 516 is provided. However, it is needless to say that a required number of polarizing plates may be provided.

A driving electrode layer 523 is provided on the back side of the transparent substrate 513 (in other words, on the liquid crystal layer 515 side). The driving electrode layer 523 is made of ITO (Indi
It is formed of a transparent conductive material such as um Tin Oxide (indium tin oxide) in a stripe shape in plan view.

On the transparent substrate 514 (in other words, the liquid crystal layer 15
Side), a reflective layer 531 in order from the transparent substrate 514 side,
A color filter 520, a protective layer 533 for flattening and protecting the color filter 520, and an electrode layer 535 are formed. The structure of the color filter 520 includes a plurality of color material layers 502 formed on a substrate 514 with a reflective layer 531 interposed therebetween.
, And a light-shielding layer 501 provided between adjacent color material layers 502, 502. This light shielding layer 501
Has a three-layer structure in which a chromium oxide layer and / or a chromium nitride layer 501b, a chromium layer 501a, a chromium oxide layer and / or a chromium nitride layer 501b are sequentially stacked from the substrate 514 side. Further, the chrome layer 5 of the light shielding layer 501
The inner peripheral wall 01a is recessed inward from the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer 501b.

The reflection layer 531 has a configuration in which a reflection film such as an Al vapor-deposited film is coated on the surface of a reflection substrate having an uneven portion on the surface. The reflection layer 531 has a thickness of, for example, 5 mm.
A resin film such as polycarbonate having a thickness of 0 to 200 μm,
Alternatively, a metal film is used as a base, and a reflective film made of Ag or Al is formed on the base to a thickness of 1000 Å or more by vapor deposition or sputtering.

In an actual liquid crystal panel, an alignment film is formed on the liquid crystal layer 515 side of the electrode layer 523 and the liquid crystal layer 515 side of the electrode layer 535. However, the alignment film is omitted in FIG. In addition, the description of the alignment film will be omitted in other embodiments which will be sequentially described below.

The reflection type liquid crystal panel 500 of the fourth embodiment
Since the color filter substrate 514 having the light-shielding layer 501 having the above-described configuration is provided, the same operation and effect as those of the reflective liquid crystal panel of the first embodiment can be obtained. Further, in the reflection type liquid crystal panel 500, since the color filter 520 is formed immediately above the reflection layer 531, light incident on the liquid crystal panel 500 reaches the reflection layer 531 via the liquid crystal layer 515 and is reflected. Color filter 5 immediately
Since the light passes through 50, the problem of color misregistration hardly occurs.

(Fifth Embodiment of Electro-Optical Device) FIG. 10 is a partial sectional view of a fifth embodiment in which the present invention is applied to a reflection type liquid crystal panel of a simple matrix system using a color filter substrate. is there.

The reflection type liquid crystal panel 55 of the fifth embodiment
Since the basic structure of 0 is the same as that of the fourth embodiment, the same components are denoted by the same reference numerals, and the description of those components will be omitted. The following mainly describes different components.

The structure of the reflective liquid crystal panel 550 of the fifth embodiment is different from that of the fourth embodiment in that a polarizing plate 516 is used.
A scattering film 551 is built in a portion between the transparent substrate 513 and the color filter 520 provided on the lower transparent substrate 514 side and a plurality of color material layers 5 provided thereon.
Are provided on the transparent substrate 513 on the upper side (observer side) to flatten and protect 02..., And have a flat reflecting surface instead of the reflecting layer 531 having the uneven surface of the fourth embodiment. The point is that a layer 552 and a protective layer 553 for protecting the layer 552 are built in.

Since the color filter 520 of the fifth embodiment is formed on the lower surface of the substrate 513, the structure of the color filter 520 shown in FIG. 9 is upside down. The color filter 52
Since 0 is provided on the transparent substrate 513 side, the transparent substrate 513 is a color filter substrate.

The scattering film 551 is, for example, a substrate film made of triallyl cyanate in which metal oxide particles are dispersed as a filler, and scatters light passing through the film.

The reflection type liquid crystal panel 550 of the fifth embodiment
Since the color filter substrate 513 having the light shielding layer 501 having the above-described configuration is provided, the same operation and effect as those of the reflective liquid crystal panel of the first embodiment can be obtained. Further, in the liquid crystal panel 550, the light reflected by the reflective layer 552 having a flat reflective surface is scattered by the scattering film 551, so that a display state of uniform brightness without interference fringes or display unevenness is generated. Can be obtained.

In each of the above embodiments, a so-called reflective liquid crystal panel has been described as an example, but the present invention can be applied to a transmissive liquid crystal panel. As the transmissive liquid crystal panel configuration,
For example, the lower side of the transparent substrate 210 in the first embodiment of FIGS. 1 to 3, the segment substrate 310 in the second embodiment of FIGS. 5 and 6, and the lower side of the active element substrate 410 in the third embodiment of FIGS. What is necessary is just not to provide the reflector of this. Alternatively, the reflective layer 531 above the transparent substrate 514 in the fourth embodiment of FIG. 9 is not provided, or the reflective layer 552 above the transparent substrate 514 in the fifth embodiment of FIG. 10 is not provided. do it. The light-shielding layer provided on the color fill substrate of the transmission type liquid crystal panel as described above has a three-layer structure like the light-shielding layer described in each of the above embodiments, and has a chromium oxide layer and / or a chromium nitride layer. The inner peripheral wall of the sandwiched chromium layer may be recessed inward from the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer, but may be a light shielding layer 601 as shown in FIG. The light shielding layer 701 may be used.

The light shielding layer 601 shown in FIG. 11 includes a chromium layer 601a provided on the color filter substrate 600, and a chromium oxide layer and / or a chromium nitride layer 601b provided on the chromium layer 601a on the color filter substrate 600 side. The chromium layer 601a is formed of a laminate, and the inner peripheral wall of the chromium layer 601a is recessed inward from the inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer 601b. In FIG. 11, reference numeral 620 denotes a color filter, and 602 denotes a color material layer.

The method of forming the light-shielding layer 601 is such that, in the step shown in FIG. 4A, the chromium oxide layer and / or
Alternatively, except that the chromium nitride layer is not provided, it can be formed in the same manner as the method of forming the light-shielding layer provided in the liquid crystal panel of the first embodiment described above.

According to the color filter substrate 600 provided with the color filter 620 having the light-shielding layer 601 having the above configuration, when the color filter substrate 600 is provided in a transmissive liquid crystal panel or a transflective liquid crystal panel, the transmissive liquid crystal panel or the transflective liquid crystal panel Light such as a backlight emitted from the inside of the transmissive liquid crystal panel is not scattered on the chrome layer 601a of the light shielding layer 601 and multiple reflection can be prevented. Therefore, display unevenness and color unevenness caused by multiple reflection can be prevented. And display performance can be improved.

The light shielding layer 701 in FIG.
a and the color filter substrate 700 of the chrome layer 701a
And a chromium oxide layer and / or a chromium nitride layer 701b, 701c provided on the substrate 700 side. / Or chromium nitride layer 7
01c and the chromium layer 701a have larger refractive indexes in this order.

The method for forming the light-shielding layer 701 is such that, in the step shown in FIG. 4A, the chromium oxide layer and / or
Alternatively, a chromium nitride layer is not provided, two chromium oxide layers and / or chromium nitride layers are provided on the color filter substrate side of the chromium layer, and after providing these two chromium oxide layers and / or chromium nitride layers, the chromium layer is formed. When providing the light-shielding layer provided in the liquid crystal panel of the first embodiment described above, except that an active gas such as nitrogen or carbon dioxide gas is also supplied into the film forming chamber and the concentration of the active gas is changed. Can be formed in the same manner as in the method of forming. By changing the concentration of the active gas supplied into the deposition chamber, a film having a different refractive index and a different absorbance (the real part and the imaginary part of the complex light refractive index) can be obtained.

According to the light-shielding layer 701 having the above structure, the reflectance can be further reduced. Therefore, the color filter substrate 7 provided with the color filter 720 having the light-shielding layer 701 is provided.
According to 00, visibility can be improved when provided in a transmissive liquid crystal panel or a transflective liquid crystal panel, and light from a backlight or the like emitted from the inside of the transmissive liquid crystal device or the transflective liquid crystal device can be reduced. In addition, the chrome layer 701a of the light shielding layer 701 is not scattered, and multiple reflection can be prevented. Therefore, display unevenness and color unevenness caused by multiple reflection can be prevented, and display performance can be improved.

(Example of Electronic Apparatus) A liquid crystal display device or a liquid crystal device (electro-optical device) provided with the liquid crystal panel of any of the above embodiments can be applied as a display panel of various electronic devices. An electronic device configured using the liquid crystal panel of any of the above embodiments generally has the configuration shown in FIG.
3, a display information output source 1003 and a display information processing circuit 1
002, a display drive circuit 1004, a display panel 1006 including the above-described liquid crystal panel, a clock generation circuit 1008, and a power supply circuit 1010. The display information output source 1003 includes a memory such as a ROM and a RAM, and a tuning circuit that tunes and outputs a television signal. The display information output source 1003 outputs display information such as a video signal based on a clock from a clock generation circuit 1008. I do. The display information processing circuit 1002 processes and outputs display information based on the clock from the clock generation circuit 1008. The display information processing circuit 1002 can include, for example, an amplification and polarity inversion circuit, a serial-parallel conversion circuit, a rotation circuit, a gamma correction circuit, a clamp circuit, and the like.

The display driving circuit 1004 includes a scanning side driving circuit and a data side driving circuit.
006 is driven for display. The power supply circuit 1010 supplies power to each of the above circuits.

Examples of the electronic apparatus having such a configuration include a liquid crystal projector, a multimedia-compatible personal computer (PC) and an engineering workstation (EWS), a pager, a mobile phone,
Examples include a word processor, a television, a viewfinder type or a monitor direct-view type video tape recorder, an electronic organizer, an electronic desk calculator, a car navigation device, a POS terminal, and a device having a touch panel.

FIG. 15 is a schematic configuration diagram of a main part of a reflection type liquid crystal projector using the reflection type liquid crystal panel of any of the first to fifth embodiments as a light valve.

The projector of this example has a light source section 810 and an integrator lens 8 arranged along the system optical axis L.
20, a polarization illuminating device 800 which is roughly composed of a polarization conversion element 830, and S emitted from the polarization illuminating device 800.
The polarizing beam splitter 850 that reflects the polarized light beam by the S-polarized light beam reflecting surface 851, and among the light beams reflected from the S-polarized light reflecting surface 851 of the polarizing beam splitter 850.
Dichroic mirror for separating blue light (B) component 8
62, a reflective liquid crystal light valve 870B that modulates the separated blue light (B), a dichroic mirror 863 that reflects and separates the red light (R) component of the light beam after the blue light is separated, A reflective liquid crystal light valve 870R for modulating the separated red light (R), a reflective liquid crystal light valve 870G for modulating the remaining green light (G) transmitted through the dichroic mirror 863, and the three reflective liquid crystal light valves. 870R, 870G, 870B
The light modulated by the dichroic mirrors 862 and 86
3. The projection optical system 880 is composed of a projection lens that combines the light with the polarization beam splitter 850 and projects the combined light on the screen 890.

The above three reflective liquid crystal light valves 870
For R, 870G, and 870B, the above-described reflective liquid crystal panels according to any one of the first to fifth embodiments of the present invention are used. The plurality of color material layers of the color filter of the reflective liquid crystal panel of the present embodiment used for the reflective liquid crystal light valve 870R are colored R (red), and the present embodiment used for the reflective liquid crystal light valve 870G. The plurality of color material layers of the color filter of the reflective liquid crystal panel of the embodiment are colored G (green), and the plurality of colors of the color filter of the reflective liquid crystal panel of the present embodiment used for the reflective liquid crystal light valve 870B. The material layer is colored B (blue).

The randomly polarized light beam emitted from the light source unit 810 is split into a plurality of intermediate light beams by the integrator lens 220, and the polarization direction is changed by the polarization conversion element 830 having the second integrator lens on the light incident side. The light beam is converted into a substantially uniform type of polarized light beam (S-polarized light beam) before reaching the polarizing beam splitter 850. The S-polarized light beam emitted from the polarization conversion element 830 is reflected by the S-polarized light beam reflection surface 851 of the polarizing beam splitter 850, and of the reflected light beams, the light beam of blue light (B) is reflected by the dichroic mirror 862 as blue light reflection. Reflective liquid crystal light valve 870B
Modulated and reflected. Further, among the light beams transmitted through the blue light reflecting layer of the dichroic mirror 862, the light beam of the red light (R) is reflected by the red light reflecting layer of the dichroic mirror 863, and the reflection type liquid crystal light valve 870R
Modulated and reflected. Further, the light flux of the green light (G) transmitted through the red light reflecting layer of the dichroic mirror 1863 is modulated and reflected by the reflective liquid crystal light valve 870G.

As described above, among the color lights modulated and reflected by the respective reflective liquid crystal light valves 870R, 870G, and 870B, the S-polarized light component does not pass through the polarizing beam splitter 850 that reflects the S-polarized light. ,
The P polarization component is transmitted. This polarization beam splitter 85
In this configuration, an image is formed by combining lights transmitted through 0, and the image is formed on a screen 890 via a projection optical system 880.

When the liquid crystal panel according to any one of the first to fifth embodiments is used for a light valve of a liquid crystal projector as shown in FIG. 14, a liquid crystal projector with improved visibility and image quality can be obtained.

FIGS. 15A to 15C are external views showing another specific example of an electronic device using the liquid crystal panel of any one of the above-described embodiments of the present invention. Note that these electronic devices are used not as a light valve as described above but as a direct-view type liquid crystal display device (liquid crystal panel), so that any of a transmission type and a reflection type liquid crystal device can be applied.

FIG. 15A is a perspective view showing a mobile phone. 1000 denotes a mobile phone body, of which 100
Reference numeral 1 denotes a liquid crystal display unit using the liquid crystal panel according to the embodiment of the present invention.

FIG. 15B is a diagram showing a wristwatch-type electronic device. 1100 is a perspective view showing the watch main body. 1
Reference numeral 101 denotes a liquid crystal display unit using the liquid crystal panel according to the embodiment of the present invention. Since this liquid crystal panel has higher definition pixels than a conventional clock display unit, it can also display television images, and can realize a wristwatch type television.

FIG. 15C shows a portable information processing apparatus such as a word processor or a personal computer. 1200 denotes an information processing device, 1202 denotes an input unit such as a keyboard,
06 is a display unit using the liquid crystal panel of the embodiment of the present invention;
Reference numeral 1204 denotes an information processing apparatus main body. Each electronic device uses the transmissive liquid crystal panel according to the above-described embodiment of the present invention, and a bright display can be obtained by arranging a so-called backlight on the back side of the transmissive liquid crystal panel. If used, a backlight is not required and power consumption can be reduced.

Note that the present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the present invention. For example, the present invention is not limited to being applied to the driving of the above-described various liquid crystal panels, but is also applicable to electroluminescence and plasma display devices.

[0111]

EXAMPLE (Experimental example) When forming a light-shielding layer having a multilayer structure by the method described below, the etching temperature was set to 20 ° C to 4 ° C.
The dependence of the etching rate of each layer on the etching temperature when changed within the range of 0 ° C. was examined. Figure 1 shows the results.
6 is shown.

After the glass substrate was placed in the film forming chamber of the sputtering apparatus, the gas was evacuated to 1.0 × 10 ⁻⁴ Pa,
A mixed gas of oxygen gas and argon gas (inert gas) was introduced up to 0.4 Pa.

Then, the sputtering power was set to 2.2 W / cm
^{In step 2} , a Cr target placed in the film forming chamber was sputtered to deposit constituent particles of the target on the surface of the glass substrate, thereby forming a chromium oxide layer having a thickness of 300 Å. Then, the inside of the film formation chamber is again set to 1.
After exhausting to 0 × 10 ⁻⁴ Pa, the Ar gas was
Introduced. Then, the sputtering power is set to 5 W / cm ²
The target was sputtered, and the constituent particles of the target were deposited on the surface of the chromium oxide layer to form a chromium layer having a thickness of 1500 angstroms. Next, after the inside of the film formation chamber was evacuated again to 1.0 × 10 ⁻⁴ Pa, the above mixed gas was introduced to 0.4 Pa. Then, the sputtering power was adjusted to 2.2 W / cm ² , the target particles were sputtered to deposit the constituent particles of the target on the surface of the chromium layer, and a chromium oxide layer having a thickness of 300 Å was formed. A laminated film having a structure was obtained.

Thereafter, a positive photosensitive resist was applied on the obtained laminated film, and a photomask having a predetermined pattern was arranged thereon, followed by exposure. Subsequently, the exposed photosensitive resist was developed using an alkaline aqueous solution to form a resist pattern and then baked. When the laminated film is etched with a ceric ammonium nitrate solution using the resist pattern as a mask, the etching temperature is changed, and thereafter, the resist pattern is peeled off using an alkaline aqueous solution to form a three-layer light-shielded structure. Layer obtained.

From the results shown in FIG. 16, when the etching temperature of the laminated film having the chromium oxide layer formed on both sides of the chromium layer with the ceric ammonium nitrate solution exceeds about 26.degree. It can be seen that the etching rate of the chromium layer is higher than the etching rate of the chromium oxide layer. On the other hand, when the etching temperature is lower than 26 ° C., it can be seen that the etching rate of the chromium layer constituting the laminated film is higher than the etching rate of the chromium oxide layer. From the above results, the inner peripheral wall of the chromium layer should be set to an etching temperature of 25 ° C. or less when etching the laminated film of the chromium oxide layer and the chromium layer using the ceric ammonium nitrate solution. It can be seen that this is effective in obtaining a light-shielding layer that is recessed inside the inner peripheral wall of the color material layer of the chromium oxide layer.

[0116]

As described above, in the color filter substrate of the present invention, the inner peripheral wall of the chrome layer provided in the multilayer light-shielding layer surrounding the color material layer is formed of the chromium oxide layer. And / or the chromium nitride layer is recessed inward from the inner peripheral wall of the portion surrounding the color material layer, so that when provided in a reflective liquid crystal device, light incident from the outside of the reflective liquid crystal device will be a light shielding layer. Light does not scatter on the chrome layer of the
Visibility can be improved. When the color filter substrate of the present invention is used in a reflection type liquid crystal device, light incident from the outside of the liquid crystal device is reflected by a reflection means such as a reflection layer provided in the reflection type device. Since the inner peripheral wall of the portion surrounding the color material layer of the chrome layer of the light shielding layer of the structure is recessed inward from the inner peripheral wall of the portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer, Light does not scatter on the chrome layer of the light-shielding layer, and multiple reflection can be prevented. Therefore, display unevenness and color unevenness due to multiple reflection can be prevented, and display performance can be improved.

When the color filter substrate of the present invention is used in a transmissive liquid crystal device or a transflective liquid crystal device, light emitted from the inside of the liquid crystal device, such as a backlight, emits light from a chrome layer as a light shielding layer. Therefore, multiple reflection can be prevented without scattering, so that display unevenness and color unevenness caused by multiple reflection can be prevented, and display performance can be improved.

An electro-optical device according to the present invention is an electro-optical device having an electro-optical material between two opposing substrates, wherein one of the two substrates has one of the above structures. Since the color filter substrate of the present invention is used, the inner peripheral wall of the portion surrounding the color material layer of the chrome layer of the light-shielding layer having a multilayer structure provided on the color filter substrate of the present invention has an upper layer and / or Since the lower chromium oxide layer and / or the chromium nitride layer is recessed from the inner peripheral wall of the portion surrounding the color material layer, the light-shielding layer has no protrusion of the chromium layer, and thus the light-shielding layer has a protrusion of the chrome layer. As a result, it is possible to improve the occurrence of light scattering, thereby improving the visibility and the display performance.

Since the electronic apparatus of the present invention includes the electro-optical device of the present invention having the above-described configuration as a display section, the visibility and the image quality can be improved.

According to the method of manufacturing an electro-optical device of the present invention, a chromium oxide layer and / or a chromium nitride layer and a chromium layer are sequentially formed on a substrate, or a chromium oxide layer and / or a chromium nitride layer. Chrome layer and chromium oxide layer and / or
Alternatively, a resist pattern is formed on the surface of a laminated film in which a chromium nitride layer and a chromium nitride layer are sequentially formed. An inner peripheral wall serving as a portion surrounding the layer includes a step of forming a light-shielding layer recessed inward from the inner peripheral wall serving as a portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer, Provided is an electro-optical device having a light-shielding layer in which an inner peripheral wall serving as a portion surrounding the color material layer of the chromium layer is recessed inward from an inner peripheral wall serving as a portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer. it can.

In the method of manufacturing an electro-optical device according to the present invention, the etching temperature when the laminated film is etched with an etching solution containing ceric ammonium nitrate as a main component is set to 25 ° C. or less, Since the etching rate of the chromium layer constituting the laminated film is higher than the etching rate of the chromium oxide layer and / or the chromium nitride layer, the chromium layer is rapidly etched, and the chromium layer becomes a portion surrounding the coloring material layer. It is possible to form a light-shielding layer in which the peripheral wall is recessed inward from the inner peripheral wall which is a portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer.

[Brief description of the drawings]

FIG. 1 is a plan view showing a first embodiment in which the present invention is applied to a TFD active matrix type reflective liquid crystal panel.

FIG. 2 is a sectional view of the reflective liquid crystal panel shown in FIG.
It is sectional drawing which follows a line.

FIG. 3 is a perspective view showing a main part of the reflective liquid crystal panel shown in FIG.

FIG. 4 is a diagram illustrating a method of manufacturing a light-shielding layer provided on a color filter substrate of the reflective liquid crystal panel of FIG.

FIG. 5 is a partial sectional view of a second embodiment in which the present invention is applied to a reflection type liquid crystal panel of a simple matrix system using a color filter substrate.

6 is a perspective view showing a main part of the reflective liquid crystal panel shown in FIG.

FIG. 7 shows a TFT using a color filter substrate according to the present invention.
FIG. 10 is a partial cross-sectional view of a third embodiment applied to a reflective liquid crystal panel of an active matrix system.

8 is a perspective view showing a main part of the reflective liquid crystal panel shown in FIG.

FIG. 9 is a partial sectional view of a fourth embodiment in which the present invention is applied to a reflection type liquid crystal panel of a simple matrix system using a color filter substrate.

FIG. 10 is a partial sectional view of a fifth embodiment in which the present invention is applied to a reflection type liquid crystal panel of a simple matrix system using a color filter substrate.

FIG. 11 is a partial sectional view of an embodiment in which the color filter substrate of the present invention is applied to a color filter substrate provided in a transmissive liquid crystal panel or a transflective liquid crystal panel.

FIG. 12 is a partial cross-sectional view of another embodiment in which the color filter substrate of the present invention is applied to a color filter substrate provided in a transmissive liquid crystal panel or a transflective liquid crystal panel.

FIG. 13 is an explanatory diagram showing a basic configuration of an electronic device using the liquid crystal panel according to the present invention.

FIG. 14 shows an application example of the electronic apparatus of the present invention.
FIG. 1 is a schematic configuration diagram of a main part of a reflection type liquid crystal projector.

15A and 15B show another example of an application example of the electronic apparatus of the present invention. FIG. 15A is a perspective view showing a mobile phone, and FIG. 15B is an example of a mobile information processing apparatus. Perspective view,
FIG. 15C is a perspective view illustrating an example of a wristwatch-type electronic device.

FIG. 16 is a diagram showing the etching temperature dependence of the etching rate of each layer when etching a laminated film having a chromium oxide layer formed on both surfaces of a chromium layer.

FIG. 17 is a plan view showing the structure of a conventional reflective color liquid crystal display device.

18 is a sectional view taken along line a-a 'of FIG.

[Explanation of symbols]

1, 500, 550: liquid crystal panel 200: counter substrate (color filter substrate) 201, 301, 401, 501, 601, 701,.
Light shielding layer (black matrix) 201a, 301a, 401a, 501a, 601a,
701a: chrome layers 201b, 301b, 401b, 501b, 601b, 7
01b, 701c... Chromium oxide layer and / or chromium nitride layer 202, 302, 402, 502, 602, 702.
Color material layer 203 Laminated film 204a Resist pattern 206 Transparent substrate (scanning electrode) 210 Transparent substrate (active element substrate) 220, 320, 420, 520, 620, 720 ...
Color filters 230, 330, 430, 515,..., Liquid crystal layers 300, 400, color filter substrate 310, segment substrate 410, active element substrate 513, 514, transparent substrate 600, 700,. · Color filter substrate, 870R, 870G, 870B · · · reflective liquid crystal light valve 1000 · · · mobile phone body 1001 and 1101 · · · liquid crystal display unit 1006 · · · display panel 1100 · · · watch body 1200 · · · Information processing device 1206 Display unit

Continued on the front page F-term (Reference) 2H048 BA45 BB02 BB14 BB37 BB44 2H091 FA02Y FA34Y FB06 FB08 FC26 FD06 LA16 5G435 AA00 AA02 AA04 BB12 BB16 BB17 CC09 CC12 DD02 DD05 EE33 FF03 FF05 FF13 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01 GG01

Claims (7)

[Claims] 1. A color filter substrate having a color filter provided on a substrate, wherein the color filter is provided between a plurality of color material layers provided on the substrate and adjacent color material layers. The light-shielding layer has a multilayer structure including a chromium layer and a chromium oxide layer and / or a chromium nitride layer provided on at least a surface of the chromium layer on the substrate side. A color filter substrate, wherein an inner peripheral wall of a portion surrounding the material layer is recessed inward from an inner peripheral wall of the chromium oxide layer and / or the chromium nitride layer surrounding the color material layer. 2. The color filter substrate according to claim 1, wherein the light-shielding layer is formed of a three-layer structure in which a chromium oxide layer and / or a chromium nitride layer are provided on both surfaces of a chromium layer. 3. An electro-optical device having an electro-optical material between two substrates facing each other, wherein the color filter substrate according to claim 1 or 2 is used as one of the two substrates. An electro-optical device, comprising: 4. An electronic apparatus comprising the electro-optical device according to claim 3. 5. A method for manufacturing an electro-optical device having a color filter comprising a plurality of color material layers provided on a substrate and a light-shielding layer provided between adjacent color material layers. A laminated film or a chromium oxide layer and / or a chromium oxide layer and / or a chromium nitride layer and a chromium layer sequentially formed on a substrate.
Alternatively, a resist pattern is formed on the surface of a laminated film in which a chromium nitride layer, a chromium layer, a chromium oxide layer, and / or a chromium nitride layer are sequentially formed, and the laminated film is etched using the resist pattern as a mask, A light-shielding portion having a pattern, wherein an inner peripheral wall serving as a portion surrounding the color material layer of the chromium layer is recessed inward from an inner peripheral wall serving as a portion surrounding the color material layer of the chromium oxide layer and / or the chromium nitride layer. A method for manufacturing an electro-optical device, comprising a step of forming a layer. 6. The method according to claim 1, wherein the etching of the laminated film using the resist pattern as a mask is performed using an etching solution containing ceric ammonium nitrate as a main component and at an etching temperature of 25 ° C. or lower. 5
The manufacturing method of the electro-optical device according to the above. 7. An etching temperature of 10 ° C. or higher and 25 or higher.
7. The method of manufacturing an electro-optical device according to claim 5, wherein the temperature is not more than ゜ C.