JP2001083500A - Production of chiral nematic liquid crystal filter - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for the production of a filter to easily produce a single-color or multicolor chiral nematic liquid crystal filter having uniform thickness, high accuracy and excellent transparency and color purity while reducing the loss of the material. SOLUTION: The production method of a chiral nematic liquid crystal filter includes a process of forming a photo-setting light-transmitting photosensitive composition layer on a light-transmitting substrate and of exposing the photosensitive composition layer according to an image, a process of adhering a chiral nematic liquid crystal layer as a transfer material to the exposed photosensitive composition layer under pressure, a process of heating the light-transmitting substrate and the transfer material in the adhered state and then of peeling the transfer material to form the chiral nematic liquid crystal only in the exposed region on the photosensitive composition layer, and a process of dissolving and removing the photosensitive composition layer in the unexposed region after peeling and further, of heating and fixing the liquid crystal layer. Two or more kinds of transfer materials having different hues may be used to form a liquid crystal layer of two or more colors by repeating the above processes twice or more.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter used in a liquid crystal display device and the like, and more particularly, to a chiral nematic liquid crystal filter capable of reducing a material loss and easily manufacturing a high quality color filter. And a method for producing the same.

[0002]

2. Description of the Related Art Color filters used in color liquid crystal displays and the like generally include red (R), green (G),
Each pixel of blue (B) and a black matrix for the purpose of improving display contrast are formed between the pixels. Conventionally, such color filters are mainly those in which pigments are dispersed in a resin or dyes are dyed, and even in a manufacturing method, these colored resin liquids are applied onto a glass substrate by spin coating or the like. A color resist layer is formed by coating, and patterning by photolithography is performed to form a color filter pixel, or a color filter is produced by directly printing a colored pixel on a substrate. However, for example, a method of manufacturing a color filter by a printing method has a disadvantage that resolution of pixels is low and it is difficult to cope with a high-resolution image pattern, and a manufacturing method by a spin coating method causes a large material loss and a large area. However, there is a drawback that the coating unevenness is large when coating on the substrate.

According to the production method by the electrodeposition method, a color filter having relatively high resolution and less unevenness of the colored layer can be obtained. However, there are disadvantages that the production process is complicated and liquid management is difficult. Was. As described above, as a process for manufacturing a color filter, there has been a demand for a manufacturing method capable of easily and easily manufacturing a high-quality color filter with little material loss.

[0004] In view of the above demands, Japanese Patent Publication No. 2794
Nos. 242 and 2873889 disclose a method of manufacturing a color filter by a film transfer method or an ink-jet method, and a method of manufacturing a color filter with less material loss and high efficiency is also proposed. However, in particular, in the ink jet method, after forming an ink receiving layer made of a water-soluble polymer, a desired pattern is subjected to a hydrophilicity / hydrophobicity treatment,
In order to obtain a color filter layer by spraying ink of each color of R, G, and B on the hydrophilized portion by an inkjet method,
The resulting color filters are inferior in resolution. Also,
The probability of occurrence of color mixing between adjacent filter layers is high, and the position accuracy is also poor.

On the other hand, high performance of color filters is required to have high transmittance and color purity. In recent years, in the method using dyes, pigments are used by optimizing the types of dyes and dyeing resins. In the method, transparency and color purity have been improved by using finely dispersed pigments. However, in recent years, liquid crystal displays (LC
D) The requirements for the transmittance and color purity of the color filters in the panel are very high. In particular, in the reflection type color filter for LCD, while it is difficult to achieve both white display and contrast of paper white, and color reproducibility, in the conventional manufacturing method, dye a dye in the resin, or
Since all color filters produced by dispersing pigments are light absorption type color filters, the improvement in color purity by further improving the transmittance has almost reached the limit.

[0006] A polarization type color filter comprising a chiral nematic liquid crystal as a main component, a polymerizable monomer, a polymerization initiator, and the like mixed with such a light absorption type color filter to form a fine pattern is formed. Are known. Since the polarized light utilizing color filter reflects and transmits a certain amount of light to display an image, the light utilization efficiency is high, and the transmittance and the color purity are more excellent than the light absorption type color filter. It has the performance which it did.

However, in the manufacturing method,
A method in which a film is formed by spin coating or the like on a substrate that has been subjected to an alignment treatment has been generally used from the viewpoint that it is preferable in that a film having a uniform thickness can be formed, but on the other hand, material loss is large. When an expensive liquid crystal material or the like is used, there is a problem that it is disadvantageous in terms of cost.

Further, in the spin coating method, it is difficult to control the film thickness in the film forming process. In particular, when a liquid crystal material is used, the performance such as reflectance is easily affected by the film thickness. It was a factor that would be higher.

Further, when a material having a liquid crystal-containing photosensitive composition layer is used, when patterning is performed by photolithography, components other than the liquid crystal component and the chiral compound, that is, the alignment movement of the liquid crystal can be suppressed. A large amount of a polymerizable monomer or a polymerization initiator could not be contained in the photosensitive composition layer, and it was difficult to achieve both color reproducibility, patterning, and curing reactivity.

[0010]

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned conventional problems and achieve the following objects. That is, the present invention reduces material loss,
An object of the present invention is to provide a method of manufacturing a monochromatic or multicolor chiral nematic liquid crystal filter having a uniform thickness, high accuracy, and excellent transmittance and color purity, which can be easily manufactured.

[0011]

Means for Solving the Problems The present inventors have found that the process is simple, the material loss is small, the thickness is uniform, and the transparency is high.
As a result of intensive studies on a method of manufacturing a color filter having excellent color purity, an adhesive photosensitive composition layer is formed on a substrate serving as a filter base, and a photocuring reaction of the photosensitive composition layer is utilized. By image-wise patterning and selectively forming a liquid crystal layer (colored layer) by adhesive peeling, it is possible to easily produce a filter with low material loss, uniform and high precision, and excellent in transparency and color purity. This led to the completion of the present invention. The means for solving the above problems are as follows. That is,

<1> a step of forming a light-transmissive photosensitive composition layer which is cured by light on a light-transmissive substrate, exposing the photosensitive composition layer through an image mask, A step of pressure-bonding the chiral nematic liquid crystal layer of the transfer material having the chiral nematic liquid crystal layer on the body and the photosensitive composition layer after exposure, and heating the light-transmitting substrate and the transfer material in the bonded state. Thereafter, peeling the transfer material from the photosensitive composition layer on the light-transmitting substrate, a step of forming a chiral nematic liquid crystal layer only in the exposed area on the photosensitive composition layer, after peeling, the non-exposed area Dissolving and removing the photosensitive composition layer, and further heating to fix the chiral nematic liquid crystal layer to the light transmissive substrate, thereby producing a chiral nematic liquid crystal filter.

<2> The step of exposing, the step of bonding under pressure, the step of forming a chiral nematic liquid crystal layer, and the step of fixing are sequentially repeated at least twice using two or more transfer materials having different hues. The method for producing a chiral nematic liquid crystal filter according to <1>, wherein a chiral nematic liquid crystal layer of two or more colors is formed on the light transmitting substrate.

<3> The method for producing a chiral nematic liquid crystal filter according to <1> or <2>, wherein the transfer material has a thermoplastic resin layer between the flexible support and the chiral nematic liquid crystal layer. is there.

<4> The production of the chiral nematic liquid crystal filter according to any one of <1> to <3>, wherein the transfer material further has an intermediate layer between the flexible support and the chiral nematic liquid crystal layer. Is the way.

[0016]

DETAILED DESCRIPTION OF THE INVENTION In the method for producing a chiral nematic liquid crystal filter according to the present invention, a photocurable photosensitive composition layer is formed on a light-transmitting substrate, and the photosensitive composition layer is exposed imagewise. And pressure bonding the surface of the chiral nematic liquid crystal layer of the transfer material and the surface of the photosensitive composition layer after the exposure, and heating the photosensitive composition layer and the chiral nematic liquid crystal layer in the bonded state. After peeling, a step of forming a chiral nematic liquid crystal layer only in the exposed area of the photosensitive composition layer, and after peeling, dissolving and removing the photosensitive composition layer in the non-exposed area, and further heating the chiral nematic liquid crystal layer And fixing the same. Further, the above-described steps are sequentially repeated twice or more, and a chiral nematic liquid crystal layer of two or more colors is formed imagewise on the light-transmitting substrate, thereby forming a color filter composed of the chiral nematic liquid crystal. Hereinafter, a method of manufacturing the chiral nematic liquid crystal filter of the present invention will be described, and the details of the chiral nematic liquid crystal filter obtained by the manufacturing method will be clarified through the description.

<Manufacturing Method of Chiral Nematic Liquid Crystal Filter> The manufacturing method of the chiral nematic liquid crystal filter of the present invention comprises forming at least a light-transmitting photosensitive composition layer which is cured by light on a light-transmitting substrate. Exposing the photosensitive composition layer through an image mask (hereinafter sometimes referred to as “exposure step”); and exposing the chiral nematic liquid crystal layer of a transfer material having a chiral nematic liquid crystal layer on a flexible support. Pressure-bonding the exposed photosensitive composition layer to the exposed photosensitive composition layer (hereinafter, may be referred to as a “bonding step”); heating the bonded light-transmitting substrate and the transfer material; A step of peeling the transfer material from the photosensitive composition layer on the substrate to form a chiral nematic liquid crystal layer only in an exposed area on the photosensitive composition layer (hereinafter, referred to as an “image forming step”) After the separation, a step of dissolving and removing the photosensitive composition layer in the non-exposed area and further heating to fix the chiral nematic liquid crystal layer to the light-transmitting substrate (hereinafter referred to as a “fixing step”) ), And may have other steps as necessary. For example, a liquid crystal filter may be manufactured by the manufacturing method shown in FIG. FIG. 2 is a schematic process diagram for explaining a manufacturing process of the chiral nematic liquid crystal filter of the present invention.

-Exposure Step- First, the exposure step will be described. In the exposure process, FIG.
As shown in (I) to (II) of FIG.
A light-transmitting photosensitive composition layer 2 is formed thereon, and the photosensitive composition layer 2 is imagewise exposed through an image mask 8 having a desired image shape. Here, the photosensitive composition layer 2 may be subjected to an orientation treatment, preferably a rubbing treatment, on the surface of the photosensitive composition layer 2 by a conventional method before the exposure. The rubbing angle and the like during the rubbing process are set in advance, but are not particularly limited. The photosensitive composition layer 2 is selectively exposed imagewise according to an image mask, and in the exposed region, a curing reaction is selectively caused to cure imagewise. Therefore, the photosensitive composition layer has a photosensitive composition which can be cured by irradiation with light (active light), and further has other components.

The photosensitive composition layer has a function of selectively forming an image-wise transfer of the liquid crystal layer in the exposed area by bonding and peeling off the layer to a chiral nematic liquid crystal layer described later in the bonding step described later. From the viewpoint of the characteristics, it is required that the film strength of the layer itself increases due to polymerization, aggregation, and the like upon exposure, but that the adhesiveness to the liquid crystal layer does not significantly change before and after exposure. However, after the heat treatment in the image forming step described later, it is sufficient that an adhesive force that does not cause peeling of the exposed area at the time of final peeling is obtained. There is no. That is, as the film strength and adhesive strength of the photosensitive composition layer in the exposed area, the adhesive strength between the chiral nematic liquid crystal layer and the flexible support at the time of peeling in the image forming step described below is stronger. There is no problem if you can get Further, from the viewpoint of use as a filter, the photosensitive composition layer is required to be light-transmitting, and from the viewpoint of increasing the color purity of the color filter, is preferably a transparent, colorless and transparent composition. .

The image mask is not particularly limited, and can be appropriately selected from known masks. Any one in which openings are arranged one-dimensionally or two-dimensionally is used. Can be.

The light source (actinic ray) to be exposed through the image mask is preferably an ultraviolet ray, and specific examples thereof include an ultra-high pressure mercury lamp, a high pressure mercury lamp, a carbon arc lamp, and a metal halide lamp. preferable. The irradiation amount of the actinic ray is 10 to 800 mj.
/ Cm ² , preferably 30 to 500 mj / cm ² . When the irradiation amount is less than 10 mj / cm ² , the curing reaction may not be sufficiently performed, and
If it exceeds j / cm ² , the working efficiency may decrease.

-Adhesion Step- In the adhesion step, a flexible support 4 as shown in FIG.
A transfer material 7 having at least a chiral nematic liquid crystal layer 5 and a cover film 6 is prepared, and after the cover film 6 is peeled off, as shown in (III) of FIG. Nematic liquid crystal layer 5
And the photosensitive composition layer 2 pattern-exposed in the exposure step
Are brought into contact with each other, pressed and adhered. here,
FIG. 1 shows a layer structure of a transfer material and a schematic manufacturing process thereof. When a full-color image is formed, a chiral nematic is prepared and oriented separately on three flexible supports so that the selective reflection wavelengths are red, green and blue belonging to the visible wavelength region. Three types of transfer materials having a liquid crystal layer are prepared, and in a series of manufacturing processes from an exposure process to a fixing process, in a bonding process of each color, the colors are sequentially bonded by pressure onto the same light transmitting substrate in order for each color.

The pressurizing means for pressurizing can be appropriately selected from known pressurizing methods. For example, the pressurizing means is such that the photosensitive image-receiving material 3 and the transfer material 7 'in a bonded state are sandwiched between pressure rollers. A method of transporting, a method of moving the pressure pad while pressing it, and a method of pressure bonding under reduced pressure are exemplified. Among them, it is preferable to use a pressure roller from the viewpoint of avoiding mixing of air or the like at the time of bonding and ensuring sufficient adhesiveness. The pressure at the time of pressurization is 0.1 to 100
preferably kg / m ^2, it is good Li preferred 1~20kg / m ^2.

The transport speed when using a pressure roller is preferably 1 to 50 m / min, and 0.5 to 5 m / min.
min is more preferred.

In addition, heating can be performed simultaneously with the pressure bonding as described above. By heating in this process, the transfer material 7 ′ can be softened, and the following properties can be ensured so that bubbles and the like do not mix with the irregularities on the photosensitive image receiving material 3. It is also possible to improve the adhesiveness of the transfer material. As a heating method in this case, for example, when the above-described pressure roller or pressure pad is used, a method of bonding these while directly heating them may be mentioned. The heating temperature in this case is preferably from 80 to 160 ° C, more preferably from 100 to 150 ° C.

-Image Forming Step- In the image forming step, as shown in (IV) to (VI) of FIG. 2, the photosensitive image receiving material 3 and the transfer material 7 'adhered in the adhering step are kept in an adhered state. After the heat treatment, the transfer material 7 ′ is peeled off from the photosensitive image receiving material 3, and a chiral nematic liquid crystal layer is formed in a desired image only on the exposed region on the light transmitting substrate 1. Here, the photosensitive image-receiving material 3 and the transfer material 7 'are in a state of being firmly bonded at the bonding interface, and the photosensitive composition layer 2 in the exposed region is itself more than the non-exposed portion. Also, when the transfer material is peeled from the photosensitive image receiving material, the photosensitive composition layer 2 in the non-exposed portion is broken and peeled together with the flexible support 4 when the transfer material is peeled from the photosensitive image receiving material. On the other hand, in the exposed area, the chiral nematic liquid crystal layer 5 of the transfer material 7 ′ is separated from the flexible support 4, and the photosensitive composition layer 2 is formed on the light transmitting substrate 1 of the photosensitive image receiving material 3. Is transcribed through

The heating temperature during the heat treatment is 10
0-150 degreeC is preferable and 100-130 degreeC is more preferable. The heating time can be appropriately selected depending on the temperature, and is particularly preferably 0.5 to 60 minutes, and preferably 3 to 30 minutes.
Minutes are more preferred. If the heating temperature is lower than 100 ° C., the alignment may not occur. If the heating temperature exceeds 150 ° C., a thermosetting reaction may occur, and the liquid crystal may be hardened before the alignment is sufficient. In addition, it may be difficult to peel off from the temporary support, or the photosensitive composition layer may be cured by heat and cannot be dissolved and removed in the fixing step.

By performing the heat treatment as described above, the liquid crystal molecules are oriented to have a predetermined orientation promoted by an orientation treatment such as a rubbing treatment previously performed on the surface of the flexible support 4, and A liquid crystal layer having a high color purity (hereinafter, referred to as a “liquid crystal filter layer”) can be formed by developing a color having a desired hue having an excellent purity and, further, by cooling and fixing. The liquid crystal filter layer is a colored layer having a desired hue, and functions as a colored filter film (color filter film) when used as a filter (color filter).

As described above, by employing the steps from the exposure step to the image forming step, patterning by photolithography is not required. Therefore, the chiral nematic liquid crystal layer 5 does not need to contain a large amount of a polymerizable monomer or a photopolymerization initiator that can sufficiently suppress the orientation of liquid crystal molecules, and the patterning function is different from that of the chiral nematic liquid crystal layer. It becomes possible to separate and give to the photosensitive composition layer which has sufficient curing reactivity.
Therefore, sufficient curing reactivity can be realized, and at the same time, both high-precision patterning and improvement in performance such as color reproducibility and color purity can be realized.

Further, by performing the heat treatment as described above, it is possible to contribute to securing a sufficient adhesive force that does not cause peeling in the exposed area at the time of peeling. That is, the adhesive strength between the chiral nematic liquid crystal layer and the photosensitive composition layer is larger than the adhesive strength between the chiral nematic liquid crystal layer 5 and the flexible support 4 in the exposed area at the time of peeling, and in the non-exposed area, It is necessary to be larger than the breaking strength of the photosensitive composition layer.

The peeling speed at the time of peeling varies depending on the material to be used, the processing conditions of each step, and the like.
m / min is preferable, and 1 to 10 m / min is more preferable.

-Fixing Step- In the fixing step, as shown in FIG. 2 (VII), after the exfoliation in the image forming step, the photosensitive composition layer remaining in the non-exposed area is dissolved and removed, washed with water and dried. After that, heating is further performed to fix the chiral nematic liquid crystal layer to the light transmitting substrate, and fix the liquid crystal filter layer. Examples of the dissolving solution used for the dissolving and removing include an aqueous solution of an alkaline surfactant. For example, a developing solution CD and CD-2000 manufactured by FUJIFILM Aurin Co., Ltd. are preferably exemplified.

As a means for fixing the chiral nematic liquid crystal layer 5 selectively formed in the exposed area to the light transmitting substrate 1 together with the photosensitive composition layer 2, a heat treatment is preferable. Examples of a heating device that can be used for the heat treatment include a convection oven, a hot plate, and a far-infrared irradiator. The heating temperature during the heat treatment is preferably from 150 to 260 ° C, and from 180 to 240 ° C.
Is more preferable, and 200 to 230C is most preferable. In addition, the heat treatment time by the temperature is preferably 5 to 90 minutes, more preferably 20 to 60 minutes when using a convection oven, and preferably 2 to 15 minutes when using a hot plate. , 2 to 5 minutes are more preferable. If the heating temperature is lower than 150 ° C., curing and fixation may be insufficient. If the heating temperature is higher than 260 ° C., the chiral nematic liquid crystal layer may be thermally decomposed.

In the method for producing a chiral nematic liquid crystal filter of the present invention, in order to produce a color filter for full-color display, blue (B) whose selective reflection wavelength belongs to the visible wavelength region is placed on three flexible supports. ), Green (G),
Three types of transfer materials for red, green, and blue, each having a chiral nematic liquid crystal layer separately prepared and oriented to be red (R), are required. in this case,
As described above, a series of manufacturing steps (exposure step to fixing step) in which a single color chiral nematic liquid crystal layer (liquid crystal filter layer) is formed on a light-transmitting substrate using one type (one color) of transfer material. The above three transfer materials (three colors) are sequentially applied to the same light-transmitting substrate, and the three primary colors (B, G, R) are used.
By forming a liquid crystal filter layer composed of a chiral nematic liquid crystal layer, a full-color color filter can be manufactured.

The details are as follows. That is, for example, after forming a photosensitive composition layer on a light-transmitting substrate, performing a surface treatment such as rubbing treatment on the photosensitive composition layer, and then exposing the photosensitive composition layer to the exposure step First, after performing image exposure through a desired image mask for a red image (exposure step), the surface of the chiral nematic liquid crystal layer and the photosensitive image after the exposure using a red transfer material from which the cover film has been removed. The material is adhered to the surface of the photosensitive composition layer while applying pressure (adhesion step). Subsequently, after being heated and oriented in the bonded state, when peeled off, the red chiral nematic liquid crystal layer in the unexposed portion is peeled off together with the flexible support while destroying the photosensitive composition layer, and the light transmission An image-like red chiral nematic liquid crystal layer is formed in an exposed area on the non-conductive substrate (image forming step). Thereafter, according to the fixing step, the photosensitive composition layer remaining in the non-exposed area is dissolved and removed, washed with water, dried, further heated, and cooled to form a red chiral nematic liquid crystal layer on the light transmitting substrate. When fixed (fixing step), a red liquid crystal filter layer is formed.

Next, a new photosensitive composition layer is formed on the entire surface of the light transmitting substrate on the side where the red liquid crystal filter layer is formed, and a desired image mask for a blue image and a transfer material for blue are formed. By repeating the above-mentioned steps (exposure step to fixing step) in the same manner as in the case of red, a blue liquid crystal filter layer is formed. In the fixing step, the photosensitive composition layer formed on the red liquid crystal filter layer is dissolved and removed. Furthermore, a new photosensitive composition layer is again formed on the entire surface of the light transmitting substrate on the side where the red and blue liquid crystal filter layers are formed, and a desired image mask for green image and a transfer material for green are formed. And each of the steps (exposure step to
By repeating the fixing step, a green liquid crystal filter layer is formed, and the three primary colors (B, B) are formed on the same light-transmitting substrate.
G, R) can be formed. As described above, the photosensitive composition layer formed on the red and blue liquid crystal filter layers is dissolved and removed in the final fixing step.

As described above, in the method for producing a chiral nematic liquid crystal filter of the present invention, a material containing a monochromatic or multicolor chiral nematic liquid crystal having a uniform thickness, excellent transparency and color purity while reducing material loss. The filter can be manufactured easily and with high precision.

In the production method of the present invention, a light-transmissive photosensitive composition layer which is cured by light is formed on a light-transmissive substrate, and the substrate on which the photosensitive composition layer is formed is transferred to the substrate. It functions as an image receiver for the chiral nematic liquid crystal layer of the material.

-Photosensitive composition layer- The photosensitive composition layer is a light-transmitting layer that is cured by exposure to actinic light and has a soft film property itself. For example, US Pat. 549,367, etc., and the like. Specifically, the photosensitive composition layer mainly contains a photosensitive composition containing at least the following components (a) to (c), and if necessary, contains other components. Is done. (A) at least one kind of a photopolymerizable unsaturated monomer having at least two terminal ethylene groups and having a boiling point of 100 ° C. or more under normal pressure; (b) photopolymerization initiation activated by irradiation with an active electromagnetic wave Agent, (c) an organic polymer compound having a water-soluble atomic group in a side chain or a part thereof (binder)

The above-mentioned (a) a photopolymerizable unsaturated monomer having at least two terminal ethylene groups and having a boiling point of 100 ° C. or more under normal pressure (hereinafter sometimes simply referred to as “photopolymerizable unsaturated monomer”) ) Includes, for example, polyethylene glycol di (meth) acrylate, trimethylolethane tri (meth) acrylate, neopentyl glycol (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipenta Erythritol hexa (meth) acrylate, hexanediol (meth) acrylate, trimethylolpropane tri (acryloyloxyprooil) ether, tri (acryloyloxyethyl) isocyanurate, polyfunctional such as glycerin and trimethylolethane Those obtained by adding ethylene oxide or propylene oxide to an alcohol and then (meth) acrylated, urethane acrylates described in JP-B-48-41708, JP-B-50-6034, and JP-A-51-37193. 48-64183
No., JP-B-49-43191, JP-B-52-3049
Polyfunctional acrylates such as polyester acrylates described in No. 0, epoxy acrylates which are reaction products of epoxy resin and (meth) acrylic acid, and methacrylates.

Further, the Journal of the Adhesion Society of Japan (Vol. 20, N
o. Compounds introduced as photocurable monomers and oligomers on pages 300 to 308) can also be used.
Monomers or oligomers may be used alone or in combination of two or more.

The amount of the photopolymerizable unsaturated monomer or oligomer to be used is preferably 5 to 60% by weight, more preferably 10 to 50% by weight, based on the weight of the solid content of the photosensitive composition. If the amount is less than 5% by weight, a clear difference may not be obtained in the adhesive strength between the exposed part and the unexposed part to the chiral nematic liquid crystal layer. In some cases, the adhesive composition is too soft, and the work of bonding to the chiral nematic liquid crystal layer becomes difficult.

As the photopolymerization initiator (b) activated by irradiation with an active electromagnetic wave, US Pat. No. 2,367,
660, US Pat. Nos. 2,367,661 and 2,36.
7,670, the α-carbonyl compound described in U.S. Pat. No. 2,448,828, the acyloin ether described in U.S. Pat. No. 2,722,512, the α-carbonized compound described in U.S. Pat. No. 2,722,512. Aromatic acyloin compounds substituted with hydrogen, U.S. Pat. Nos. 3,046,127 and 2,95
No. 1,758, a polynuclear quinone compound, a combination of triallylimidazole dimer / p-aminophenyl ketone described in U.S. Pat. No. 3,549,367, and a benzoate described in JP-B-51-48516. Thiazole-based compounds / trihalomethyl-s-triazine-based compounds, photosensitive-s- described in Japanese Patent Application No. 61-186238.
Triazine compounds, trihalomethyl-s-triazine compounds described in U.S. Pat. No. 4,239,850, and oxadiazole compounds described in U.S. Pat. No. 4,212,976 can be exemplified. . However,
The present invention is not limited to these.

The amounts of the various photopolymerization initiators used are as follows.
0.2 to 3 based on the weight of the photopolymerizable unsaturated monomer
0% by weight is preferable, and 0.5 to 20% by weight is more preferable. If the amount is less than 0.2% by weight, the photocuring reaction may not be sufficiently performed. If the amount exceeds 30% by weight, poor alignment of liquid crystal molecules and coloring due to the initiator may be caused. There is.

The (c) organic polymer compound (binder) having a water-soluble atomic group in a side chain or a part thereof includes:
Examples of the (a) linear organic high molecular polymer compatible with the photopolymerizable unsaturated monomer include, among others, those soluble in an organic solvent. Examples of the linear organic polymer include, for example, JP-A-59-44615 and JP-B-54.
-34327, JP-B-58-12577, JP-B-5
Methacrylic acid copolymers described in JP-A-4-25957, JP-A-59-53836 and JP-A-59-71048;
Polymers having a carboxyl group in the side chain, such as acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer; Acidic cellulose derivatives.

In addition, those obtained by adding an acid anhydride to a polymer having a hydroxyl group are also useful. Among them, benzyl (meth) acrylate / (meth) acrylic acid copolymer and benzyl (meth) acrylate / (meth) acrylic acid / multi-component copolymer with other monomers can be particularly preferably mentioned.

The organic polymer compound can be used as a binder in any combination of various amounts of various polymers. The amount used is preferably 90% by weight or less, more preferably 30 to 85% by weight, based on the total solid weight of the photopolymerizable composition, from the viewpoint of ensuring sufficient strength of the formed image. .

In the photosensitive composition layer, other components include
For the purpose of improving storage stability, a thermal polymerization inhibitor may be added. Examples of the thermal polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-
p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-
6-t-butylphenol), 2,2'-methylene (4
-Methyl-6-t-butylphenol), 2-mercaptobenzimidazole and the like. Usually, the amount of the thermal polymerization inhibitor used is preferably 500 to 2000 ppm based on the photopolymerizable unsaturated monomer. Incidentally, an appropriate amount of a thermal polymerization inhibitor is usually added to commercially available photopolymerizable unsaturated monomers.

The photosensitive composition layer constituted as described above is formed by applying it to the substrate surface by preparing a coating liquid using a solvent having low toxicity and excellent coating properties, if necessary. Can be. Examples of the solvent include 3-
Methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester, 3-methoxypropionic acid propyl ester, 3-ethoxypropionic acid methyl ester, 3-ethoxypropionic acid ethyl ester, 3
-Alkoxypropionates such as ethoxypropionate propyl ester, 2-methoxypropyl acetate, 2-ethoxypropyl acetate, esters of alkoxy alcohols such as 3-methoxybutyl acetate, methyl lactate, lactates such as ethyl lactate, Ketones such as methyl ethyl ketone, cyclohexanone, methyl cyclohexanone, and other γ-butyrolactone, N
-Methylpyrrolidone, dimethylsulfoxide and the like are useful.

On the other hand, since most of the photopolymerizable unsaturated monomers or oligomers contained in the photopolymerizable composition are liquid at room temperature, an appropriate mixing ratio with the organic polymer compound used as a binder is selected. Thus, even after the solvent is evaporated by drying, the photosensitive composition layer exhibits a soft film property and has adhesiveness. By irradiating the photosensitive composition layer with an actinic ray, a polymerization curing reaction is caused to cause the monomer or oligomer in the layer to disappear, and the photosensitive composition layer is changed to a hard film having higher strength.

Light-Transmissive Substrate The light-transmissive substrate can be appropriately selected from any known substrates, for example, a glass substrate; polycarbonate, vinyl chloride, polyethylene terephthalate (P
ET), triacetate cellulose (TAC), synthetic resin substrates such as polyethylene naphthalate (PEN) and the like. Among them, a glass substrate is preferable because of its excellent surface smoothness.

The method for coating the photosensitive composition layer on the light transmitting substrate can be appropriately selected from known coating methods, and examples thereof include a spinner, a roll coater, a bar coater, and a curtain coater. The layer thickness of the photosensitive composition layer is preferably from 0.2 to 2 μm, more preferably from 0.5 to 2 μm.
1 μm is more preferred. If the layer thickness is less than 0.2 μm, it may be difficult to control adhesion and peeling,
If it exceeds μm, the transparency of the photosensitive composition layer may decrease.

<Transfer Material> The transfer material has a chiral nematic liquid crystal layer on a flexible support, and a cover film on the chiral nematic liquid crystal layer.
It has another layer as needed. The transfer material is, for example, as shown in FIG. 1, a flexible support 4 that has been subjected to an orientation treatment such as a rubbing treatment, or when another layer is provided on the flexible support 4, A chiral nematic liquid crystal layer 5 is provided on another layer subjected to an alignment treatment such as a rubbing treatment,
A cover film 6 is formed on the chiral nematic liquid crystal layer.
May be provided. FIG. 1 is a diagram showing an example of a layer structure of a transfer material and a schematic manufacturing process thereof.

-Chiral nematic liquid crystal layer-The chiral nematic liquid crystal layer contains a chiral nematic liquid crystal material, a chiral compound, and a thermosetting agent.
Further, if necessary, a binder resin, a surfactant, a thermal polymerization inhibitor, a thickener, a dye, a pigment, an ultraviolet absorber, a gelling agent, a solvent and the like can be contained.

The chiral nematic liquid crystal material is characterized in that the liquid crystal phase is fixed below the liquid crystal transition temperature, and has a refractive index anisotropy Δn of 0.10.
It can be appropriately selected from liquid crystal materials, polymer liquid crystal materials, and polymerizable liquid crystal materials of .about.0.40. While in the liquid crystal state at the time of melting, it can be used as a solid phase by, for example, aligning by using an alignment substrate that has been subjected to an alignment treatment such as rubbing treatment, and then fixing it by cooling or the like. Specific examples of the chiral nematic liquid crystal material include the following compounds. However, the present invention is not limited to these.

[0056]

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[0057]

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[0058]

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In the above formula, n represents an integer of 3 or more. In each of the above exemplified compounds, those in which the intermediate linking group is changed to the following structure can also be mentioned as suitable.

[0060]

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The content of the chiral nematic liquid crystal material is preferably from 0.5 to 50% by weight, more preferably from 2 to 15% by weight, based on the total weight of the chiral nematic liquid crystal layer. If the content is less than 0.5% by weight, the orientation of the liquid crystal molecules becomes insufficient, and a desired hue may not be obtained. If the content exceeds 50% by weight, the orientation of the liquid crystal molecules is inhibited, In some cases, a sufficient color density cannot be obtained.

Examples of the chiral compound include the following compounds in addition to isomanide, catechin, isosorbide, fencon and carvone from the viewpoint of improving the hue and color purity of the liquid crystal compound.

[0063]

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[0064]

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The content of the chiral compound is preferably from 0 to 30% by weight, more preferably from 0 to 20% by weight, based on the total weight of the cholesteric liquid crystal layer. If the content exceeds 30% by weight, the orientation of the cholesteric liquid crystal compound may be insufficient.

Examples of the thermosetting agent include an epoxy resin, a compound having a methylol group, and a monomer having an ethylenically unsaturated bond. As the epoxy resin, a glycidyl ether type synthesized from bisphenol A and epichlorohydrin is the most common, but instead of bisphenol A, bisphenol F, tetrabromobisphenol A, tetraphenylolethane, phenol novolak, o Resins synthesized using cresol novolak, polypropylene glycol, hydrogenated bisphenol A and the like are also useful. Also, glycidyl ester type epoxy resins include hexahydrophthalic anhydride and dimer acid, and glycidylamine type epoxy resins include diaminodiphenylmethane, isocyanuric acid and hydantoin. Furthermore, p-
Mixtures such as aminophenol and p-oxybenzoic acid, or alicyclic ones are also useful.

If the amount of the epoxy resin is too small, a sufficient effect cannot be obtained. In particular, 0.5 to 100% by weight based on the total weight of the binder resin described later used in the chiral nematic liquid crystal layer. Is preferred, and 1 to 100
% Is more preferred. If the amount is less than 0.5% by weight, sufficient curability may not be obtained, and
If it exceeds 00% by weight, the alignment of the liquid crystal molecules is hindered, and a sufficient coloring density may not be obtained.

The compound having a methylol group is, for example, a compound having a methylol group as a formaldehyde precursor or a compound having a substituted methylol group, and includes a compound represented by the following structural formula (1). _{^{(R 1 O-CH 2)}} n -A- (CH 2 -OR 2) m Formula (1)

In the above formula, A represents a group represented by B or BYB, and B represents a substituted or unsubstituted mononuclear or condensed polynuclear aromatic hydrocarbon or oxygen, sulfur, nitrogen Represents a heterocyclic compound. Y is a single bond or carbon number 1-4
Alkylene group, substituted alkylene group, arylene group, substituted arylene group, arylene alkylene group, -O-, -S
_{-, - SO 2 -, -} CO -, - COO -, - OCOO
-, -CONH-, and a substituted or unsubstituted alkylene group having a part of these bonds. Y is
A polymer such as a phenol resin may be used.

In the structural formula (1), R ¹ and R ² may be the same or different and each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group, a substituted or unsubstituted group. Represents an aryl group, an alkanol group, an arylalkyl group, or an acyl group. Further, n represents an integer of 1 to 3, and m represents an integer of 0 to 3.

Examples of the compound represented by the structural formula (1) include various aminoblasts or phenoblasts, that is, urea-formaldehyde, melamine-formaldehyde, benzoguanamine-formaldehyde,
Glycol lauryl-formaldehyde resins and their monomers or oligomers are exemplified. Many of these are commercially available for applications such as vehicles for paints, for example, Cymel (registered trademark) 300, 301,
303, 350, 370, 380, 1116, 113
0, 1123, 1125, 1170, etc. (manufactured by American Cyanamid Co., Ltd.)
w30, Mw30M, Mw30HM, Mx45, Bx4
000, N4206 and the like (manufactured by Sanwa Chemical Co., Ltd.) can be mentioned as typical examples. These compounds may be used alone or in combination of two or more.

Another specific example is a methylolated or alkoxymethylated phenol derivative which can be a formaldehyde precursor.
These may be used as a monomer or may be used as a resin such as a resole resin or a benzyl ether resin. Further, as another system of the acid-curable compound, a compound having a silanol group, for example, JP-A-2-15426
No. 6, No. 2-173647 and the like.

The amount of the compound having a methylol group is preferably 0.1 to 1 with respect to the total weight of the binder resin described later used in the chiral nematic liquid crystal layer.
0% by weight is preferable, and 0.5 to 5% by weight is more preferable. If the amount is less than 0.1% by weight, sufficient curability may not be obtained. If the amount exceeds 10% by weight, the orientation of liquid crystal molecules is inhibited, and a sufficient color density cannot be obtained. Sometimes.

Examples of the monomer having an ethylenically unsaturated bond include the following compounds. However, the present invention is not limited to these.

[0075]

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Among the various thermosetting agents, polyfunctional monomers such as pentaerythritol tetraacrylate and dipentaerythritol hexaacrylate are preferred. The addition amount of the thermosetting agent is preferably 0.5 to 50% by weight based on the total solid weight of the chiral nematic liquid crystal layer. If the amount is less than 0.5% by weight, sufficient curability may not be obtained. If the amount is more than 50% by weight, the alignment of liquid crystal molecules is inhibited, and sufficient color formation cannot be obtained. Sometimes.

Examples of the binder resin include polystyrene compounds such as polystyrene and poly-α-methylstyrene, cellulose resins such as methylcellulose, ethylcellulose and acetylcellulose; acidic cellulose derivatives having a carboxyl group in the side chain; polyvinylformal; Acetal resins such as polyvinyl butyral, JP-A-59-44615, JP-B-54-34327,
JP-B-58-12577, JP-B-54-25957
JP-A-59-53836, JP-A-59-7104
No. 8, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer and the like.

Homopolymers of alkyl acrylates and homopolymers of alkyl methacrylates are also mentioned. In these, alkyl groups are methyl, ethyl, n-propyl, n-butyl, iso-
-Butyl group, n-hexyl group, cyclohexyl group, 2-
Examples thereof include an ethylhexyl group. In addition, a polymer having a hydroxyl group to which an acid anhydride is added, a benzyl (meth) acrylate / (homopolymer of methacrylic acid) acrylic acid copolymer or benzyl (meth) acrylate / (meth) acrylic acid / other monomer And the like.

The content of the binder with respect to the total solid content in the chiral nematic liquid crystal layer is preferably from 10 to 90% by weight, more preferably from 20 to 70% by weight. If the content is less than 10% by weight, the transparency may be reduced. If the content is more than 90% by weight, the orientation of the liquid crystal molecules may be inhibited, and a sufficient color density may not be obtained.

Each of the above components is dissolved in an appropriate solvent to prepare a coating liquid solution, and the coating liquid is applied on a flexible support described later by a desired coating method to obtain a chiral nematic liquid crystal layer. Can be formed. Examples of the solvent include 3-methoxypropionic acid methyl ester, 3-methoxypropionic acid ethyl ester,
Alkoxypropionic esters such as -methoxypropionic acid propyl ester, 3-ethoxypropionic acid methyl ester, 3-ethoxypropionic acid ethyl ester, and 3-ethoxypropionic acid propyl ester;
Esters of alkoxy alcohols such as -methoxypropyl acetate, 2-ethoxypropyl acetate, and 3-methoxybutyl acetate; lactates such as methyl lactate and ethyl lactate; ketones such as methyl ethyl ketone, cyclohexanone and methylcyclohexanone; and other γ-butyrolactone , N-methylpyrrolidone, dimethylsulfoxide and the like.

When a coating liquid prepared using the solvent is applied to form a chiral nematic liquid crystal layer, the thickness of the layer is required to have an accuracy of ± 5%, preferably ± 2%, of a desired thickness. You. From the viewpoint of ensuring the accuracy, a spin coater is mainly used as a coating machine. The layer thickness of the transfer material after coating and drying of the chiral nematic liquid crystal layer is preferably 0.5 to 2.5 μm, and 0.8 to 2.
0 μm is more preferred. When the layer thickness is less than 0.5 μm, a sufficient color density may not be obtained,
If it exceeds μm, the accuracy of forming a liquid crystal filter layer formed imagewise may be reduced.

—Cover Film— A cover film is preferably provided on the photosensitive composition layer from the viewpoint of protecting the photosensitive composition layer during storage. Examples of the material used for the cover film include polypropylene, polyethylene, PET, PEN, and TAC. As the thickness of the cover film, 1 to
100 μm is preferable, and 4 to 40 μm is more preferable.

-Flexible support-As the flexible support, a resin film having a uniform thickness is preferable. For example, polyethylene terephthalate, polycarbonate, 6-nylon, 6,6-nylon, polystyrene, polypropylene, Polyether sulfone,
Cellulose acetate and the like can be mentioned. Further, at the time of peeling in the image forming step, it is preferable to form an antistatic layer on the surface of the support on which the chiral nematic liquid crystal layer is not provided for the purpose of preventing adhesion of dust due to peeling charging. In the case where a chiral nematic liquid crystal layer is provided directly on the flexible support, rubbing is performed on the surface of the flexible support on the side on which the liquid crystal layer is to be formed for the purpose of aligning the liquid crystal layer in a desired shape in an image forming step. Preferably, an orientation treatment such as a treatment is performed.

The thickness of the flexible support is selected from the viewpoints of ensuring heat conduction at the time of pressure bonding in the bonding step and followability in the case where there is unevenness on the light transmitting substrate of the photosensitive image receiving material. , 150 μm or less. On the other hand, the thickness is preferably 20 μm or more from the viewpoint of handleability at the time of pressure bonding to a photosensitive image receiving material and formation of a chiral nematic liquid crystal layer.

The transfer material is preferably provided with a thermoplastic resin layer, an intermediate layer and the like as other layers. By providing the thermoplastic resin layer between the flexible support of the transfer material and the chiral nematic liquid crystal layer, the thermoplastic resin layer has a function as a cushion material, and the transfer material is pressure-bonded to a substrate having an uneven surface. In the case of transferring, the following property of the chiral nematic liquid crystal layer to be transferred can be improved. That is, for example, when a single-color liquid crystal filter layer is already formed on a substrate, pressure bonding is performed using a transfer material having a different hue, and transfer is performed. And can be adhered uniformly. It is particularly useful when the bonding step is repeated a plurality of times as in the production method of the present invention.

-Thermoplastic resin layer-The thermoplastic resin layer has at least a glass transition point (T
g) is a thermoplastic polymer or polymer compound having a temperature of 80 ° C. or less and a plasticizer or the like mixed therein. However,
When the chiral nematic liquid crystal layer is directly provided on the thermoplastic resin layer, the thermoplastic resin layer may use a polymer compound or the like that is not dissolved by a solvent or the like used when forming the chiral nematic liquid crystal layer. is necessary.

Examples of the thermoplastic polymer include polyethylenes, polypropylenes, acrylic resins, methacrylic resins, polyesters, polyamides, polyurethanes, polycarbonates, polystyrenes, ethylene-vinyl acetate copolymer resins, and ethylene-acrylate copolymer resins. , Vinyl chloride resin, vinylidene chloride resin, chlorinated polyethylene, chlorinated polypropylene, chlorinated rubbers, polyvinyl butyral, polyvinyl acetal, polyvinyl pyrrolidone, polyethylene noside, phenolic resin,
Cellulose derivatives, polyvinyl alcohol derivatives, latexes and mixtures thereof are preferred.

When the chiral nematic liquid crystal layer is provided directly on the thermoplastic resin layer, a material which is not dissolved by a solvent or the like used when forming the chiral nematic liquid crystal layer is preferable. Therefore, in this case, the thermoplastic polymer is preferably a mixture of polyvinyl alcohol and polyethylene glycol, a water-soluble polymer material such as a methyl vinyl ether maleic anhydride copolymer, and polyvinyl butyral.

The method for forming the thermoplastic resin layer is as follows.
Although not particularly limited, for example, after dissolving the polymer compound or the like in a solvent or the like to form a coating liquid, spin coating, curtain coating, bar coating, or a method of extruding from a slit and applying. Can be applied. The solvent used in this case can be appropriately selected in consideration of the solubility of the polymer used, and examples thereof include ketones such as methyl ethyl ketone and acetone; alcohols such as methanol and ethanol; ethylene glycol and ethylene glycol mono. Preferable examples include ethyl ether, propylene glycol, propylene glycol monomethyl ether, and acetates thereof.
The thickness of the thermoplastic resin layer is usually preferably from 6 μm to 100 from the viewpoint of effectively exhibiting cushioning properties, and more preferably from 6 to 50 μm from the viewpoint of handling properties and the like.

-Intermediate Layer- The transfer material may be provided with an intermediate layer. The intermediate layer is provided for the purpose of preventing the solvent and the like of the chiral nematic liquid crystal layer and the plasticizer and the solvent of the thermoplastic resin layer from adversely affecting each other between the two layers. Preferably, the material is dispersed or dissolved in an aqueous alkaline solution and selected from materials having low oxygen permeability. The intermediate layer can be configured to have a water-soluble polymer such as polyvinyl alcohol, polyvinyl pyrrolidone, water-soluble polyvinyl butyral, and water-soluble nylon (removable by washing with water).

A surfactant can be appropriately added to the intermediate layer as needed. As the surfactant, in consideration of solubility and applicability, cationic, anionic, amphoteric, nonionic, etc., any of them can be used. A nonionic surfactant is preferred in that it does not inhibit the nonionic surfactant. Specific examples of the nonionic surfactant include polyoxyethylene type, acetylene glycol type such as Surfynol (manufactured by Nissin Chemical Co., Ltd.), and fluorine such as Megafac F142D (manufactured by Dainippon Ink Co., Ltd.). Oligomers and the like. Further, the intermediate layer, if necessary, a dye,
Pigments, ultraviolet absorbers, defoamers, matting agents, solvents and the like can also be added.

The thickness of the intermediate layer is 0.1 to 5 μm.
m is preferred. Further, as the intermediate layer, JP-A-5-17
No. 3320 (paragraph number [0011]) can be suitably used. Further, in the case where an intermediate layer is provided and a chiral nematic liquid crystal layer is formed on the intermediate layer, it is preferable that after the intermediate layer is formed, its surface is subjected to an alignment treatment by a rubbing treatment or the like.

[0093]

EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to these examples. still,
“Parts” and “%” in the examples all represent “parts by weight” and “% by weight”.

Example 1 <Preparation of Coating Solution for Photosensitive Composition Layer> First, a compound having the following composition was mixed to prepare a coating solution for a photosensitive composition layer. [Composition of coating solution for photosensitive composition layer] ・ Benzyl methacrylate / methacrylic acid copolymer: 5 parts (molar ratio: 70/30, weight average molecular weight: 20,000) ・ Dipentaerythritol hexaacrylate: 8 Part4,4'-methoxynaphthalene-2,6-di (trichloromethyl) -s-triazine 1 part Hydroquinone monomethyl ether 0.001 part 3-methoxybutyl acetate 100 parts

A glass substrate having a thickness of 1.1 mm is prepared, and the obtained coating solution for a photosensitive composition layer is coated on the substrate using a spin coater so that the layer thickness after drying is 0.8 μm. After drying in an oven at 100 ° C for 2 minutes,
A photosensitive composition layer was formed. Thereafter, a rubbing treatment was performed on the photosensitive composition layer to obtain a substrate having the photosensitive composition layer.

<Preparation of Transfer Material> Next, compounds having the following compositions were mixed to form chiral nematic liquid crystals (Ch-L) for red (R), green (G) and blue (B) pixels.
C) Layer coating solutions (1) to (3) were prepared. In addition, the content of each composition was made into the following weight ratio with respect to the total weight of each coating liquid for Ch-LC layers. -Composition of coating liquid (1) for Ch-LC layer for red pixel--The following compound (a) ... 87%-The following compound (b) ... 5%-Dipentaerythritol hexaacrylate ... 3%・ Epoxy resin (DER # 337, manufactured by Dow Chemical Company) 5%

-Composition of coating solution (2) for Ch-LC layer for green pixel--The following compound (a) ... 86%-The following compound (b) ... 6%-Dipentaerythritol hexaacrylate-・ 3% ・ Epoxy resin (DER # 337, manufactured by Dow Chemical Company) ・ ・ ・ 5%

-Composition of coating solution (3) for Ch-LC layer for blue pixel-Compound (a) ... 85% below Compound (b) ... 7% Dipentaerythritol hexaacrylate-・ 3% ・ Epoxy resin (DER # 337, manufactured by Dow Chemical Company) ・ ・ ・ 5%

[0099]

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Three rubbed polyethylene terephthalate (PET) base films having a thickness of 75 μm were prepared, and the Ch-LC layer coating solution (1) obtained above was prepared.
After coating (3) on a different PET base film using a spin coater so that the dry coating amount is 2 μm, the coating is dried in an oven at 100 ° C. for 2 minutes,
A single color (R,
G, B) Ch-LC layers were formed. Thereafter, a polypropylene film having a thickness of 12 μm is pressed and laminated on each of the formed Ch-LC layers, and a transfer material for a red pixel (1), a transfer material for a green pixel (2), and a transfer material for a blue pixel. (3) was obtained.

(Exposure Step) Using the aligner MAP-1200L (manufactured by Dainippon Screen Co., Ltd.), the photosensitive composition layer of the substrate obtained above was applied to an ultrahigh-pressure mercury lamp (500 W / cm), 100mJ
/ Cm ² irradiation energy of 60 cm above the photosensitive composition layer
Exposure was performed from a distance of 25 seconds.

(Adhesion Step) Subsequently, the cover film was removed from the transfer material (1) for red pixels, and the Ch-LC layer of the transfer material (1) and the surface of the photosensitive composition layer after the exposure were exposed. And a laminator (Fast Laminator 8B-550-80, manufactured by Taisei Laminator Co., Ltd.) under the conditions of a pressure of 2 kg / m ² , a roller temperature of 130 ° C., and a conveying speed of 0.2 m / min. Pressure bonding was performed.

(Image Forming Step) In a state where the glass substrate is adhered as described above, the glass substrate is placed on a hot plate so as to be in contact with the glass plate, and is kept at a temperature of 120 ° C. for 5 minutes.
-After coloring the LC layer, it was cooled to room temperature, and the transfer material (1) was peeled off from the photosensitive composition layer on the glass substrate. In the exposed area of the photosensitive composition layer on the glass substrate, the Ch-LC layer for red pixels is selectively transferred, and in the non-exposed area, the photosensitive composition layer is destroyed. Ch-LC layer is PET of transfer material (1)
It remained on the base film and was peeled off with the film.

(Fixing Step) After forming a red pixel pattern on the glass substrate as described above, polyoxyethylene octyl phenyl ether (trade name: Nonion H)
(S-210, manufactured by NOF CORPORATION) 2% aqueous solution was sprayed on the glass substrate to dissolve and remove the photosensitive composition layer remaining in the non-exposed area, and further washed with water and dried. Then 2
It was heated and baked in a 00 ° C. oven for 30 minutes and cooled to room temperature to form a red liquid crystal filter layer.

Next, a new photosensitive composition layer is formed on the surface of the glass substrate on the side where the red liquid crystal filter layer is formed by the same method as described above to cover the entire substrate surface. Processing was performed. The substrate is imagewise exposed using a green pixel image mask instead of the red pixel image mask in the same manner as in the exposure step, and further replaced with the red pixel transfer material (1). Using the transfer material (2) for a green pixel, the same steps as the bonding step to the fixing step were repeated to form a green liquid crystal filter layer on a glass substrate.

Further, on the surface of the glass substrate on which the red and green liquid crystal filter layers are formed, a new photosensitive composition layer is formed again in the same manner as described above to cover the entire surface of the substrate. A rubbing treatment was performed in the same manner as described above. The substrate is imagewise exposed using a blue pixel image mask instead of the red pixel image mask in the same manner as in the exposure step, and further replaced with the red pixel transfer material (1). Using the transfer material (3) for blue pixels, the same steps from the bonding step to the fixing step were repeated to form a blue liquid crystal filter layer on a glass substrate. As described above, red (R), green (G), and blue (B) are formed on the surface of the glass substrate obtained by repeating the exposure process to the fixing process three times for each color.
Thus, a full-color color filter having a uniform thickness, excellent transmittance and color purity, and pixel formation with high precision was formed.

In the color filter produced by the method for producing a chiral nematic liquid crystal filter of the present invention, the liquid crystal filter layers (R), (G), and (B) are all formed in the same size. There was no particular need to change the process conditions. Furthermore, material loss in each process is small,
The wet processing step is only for dissolving and removing the photosensitive composition layer remaining on the glass substrate after each of the transfer materials (1) to (3) is peeled off, and the operation in the entire process was easy. .

(Example 2) <Preparation of substrate> In the same manner as in Example 1, a photosensitive composition layer was formed on a glass substrate, and the surface of the photosensitive composition layer was subjected to a rubbing treatment.

<Preparation of Transfer Material> First, a compound having the following composition was mixed to prepare a coating solution for a thermoplastic resin layer. -Composition of coating solution for thermoplastic resin layer-Vinyl chloride / vinyl acetate copolymer ... 290.0 g (copolymerization ratio (weight ratio): 75/25, degree of polymerization: about 400; Trade name: MPR- (TSL, manufactured by Nissin Chemical Co., Ltd.)-Vinyl chloride / vinyl acetate / maleic acid copolymer: 76.0 g (copolymerization ratio (weight ratio): 86/13/1, degree of polymerization: about 400; product) Name: MPR-TM, manufactured by Nissin Chemical Co., Ltd.)-Dibutyl phthalate ... 88.5 g-Fluorine surfactant ... 5.4 g (Product name: F-177P, Dainippon Ink Co., Ltd.)・ MEK ・ ・ ・ 975.0g

Next, a compound having the following composition was mixed to prepare a coating solution for an intermediate layer. -Composition of coating solution for intermediate layer--Polyvinyl alcohol (PVA205, manufactured by Kuraray Co., Ltd.) ... 13 parts-Polyvinylpyrrolidone (PVP-K30, manufactured by Gokyo Sangyo Co., Ltd.) ... 6 parts-Methanol-・ 173 parts ・ Ion exchange water ・ ・ 211 parts

On a 75 μm-thick polyethylene terephthalate base film similar to that used in Example 1, the obtained coating liquid for a thermoplastic resin layer was applied to a thickness of 20 μm after application and drying using a spin coater. After being applied as described above, it was dried in an oven at 100 ° C. for 2 minutes to form a thermoplastic resin layer. Further, the coating liquid for the intermediate layer was applied on the thermoplastic resin layer using a spin coater so that the layer thickness after coating and drying was 1.6 μm.
It was dried in an oven at 00 ° C. for 2 minutes to form an intermediate layer.
Thereafter, the surface of the intermediate layer was subjected to a rubbing treatment using a nylon cloth.

Three PET base films each having a rubbed intermediate layer and a thermoplastic resin layer were prepared,
Ch-LC layer coating solution (1) to 1 prepared in Example 1
(3) Using a spin coater, the dry coating amount is 2
μm and then dried on a 100 ° C. oven for 2 minutes.
Each single color (R, G,
The Ch-LC layer of B) was formed. Then, each formed C
On the h-LC layer, a polypropylene film having a thickness of 12 μm was pressed and laminated to obtain transfer materials (4) to (6) for red, green and blue pixels.

The transfer materials (4) to (6) obtained above
And the same steps as in Example 1 (exposure step to fixing step)
Is repeated three times for each of the transfer materials (4) to (6) in order to form a liquid crystal filter layer of three colors of red (R), green (G), and blue (B) on the surface of the glass substrate. It was possible to manufacture a full-color color filter having a uniform thickness, excellent transparency and color purity, and pixel formation with high precision. In particular, by providing a thermoplastic resin layer on the transfer material, the transfer material for green pixels (5)
When the red and green liquid crystal filter layers are already formed, the transfer material (6) for blue pixels is added to the glass substrate on which the red and green liquid crystal filter layers are already formed. At the time of pressure bonding, despite the presence of unevenness due to the existing liquid crystal filter layer, entrapment of air bubbles during bonding was minimized, and bonding could be performed more uniformly.

As described above, in the color filter produced by the method for producing a chiral nematic liquid crystal filter of the present invention, the liquid crystal filter layers (R), (G), and (B) are all formed in the same size. There was no particular need to change the process conditions for each hue. Further, the material loss is small, and the wet processing step is performed by using the transfer material (4) to
It was only when dissolving and removing the photosensitive composition layer remaining on the glass substrate after each peeling of (6), and the operation in the whole process was easy.

[0115]

According to the present invention, it is possible to easily produce and provide a monochromatic or polychromatic chiral nematic liquid crystal filter having a uniform thickness, high precision, and excellent transmittance and color purity while reducing material loss. Can be.

[Brief description of the drawings]

FIG. 1 is a diagram illustrating an example of a layer configuration of a transfer material.

FIG. 2 is a schematic process diagram for explaining a manufacturing process of the chiral nematic liquid crystal filter of the present invention.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 flexible support 2 photosensitive composition layer 4 light-transmitting substrate 5 chiral nematic liquid crystal layer 6 cover film 7 ′ transfer material (after removing cover film) 8 image mask

Claims (4)

[Claims] 1. curing on a light transmitting substrate by light;
Forming a light-transmissive photosensitive composition layer, exposing the photosensitive composition layer through an image mask; and the chiral nematic liquid crystal layer of a transfer material having a chiral nematic liquid crystal layer on a flexible support. Pressure-bonding the exposed photosensitive composition layer to the exposed photosensitive composition layer, and heating the bonded light-transmitting substrate and the transfer material, and then peeling the transfer material from the photosensitive composition layer on the light-transmitting substrate Forming a chiral nematic liquid crystal layer only in the exposed area on the photosensitive composition layer, and dissolving and removing the photosensitive composition layer in the non-exposed area after peeling, and further heating the light transmitting substrate. Fixing a chiral nematic liquid crystal layer to the liquid crystal layer, and a method for producing a chiral nematic liquid crystal filter. 2. A step of exposing, using a pressure-sensitive adhesive, a step of forming a chiral nematic liquid crystal layer, and a step of fixing the chiral nematic liquid crystal layer in order using two or more transfer materials having different hues. 2. The method for producing a chiral nematic liquid crystal filter according to claim 1, wherein the chiral nematic liquid crystal layer of two or more colors is formed on the light transmitting substrate by repeating at least twice. 3. The method for producing a chiral nematic liquid crystal filter according to claim 1, wherein the transfer material has a thermoplastic resin layer between the flexible support and the chiral nematic liquid crystal layer. 4. The method for producing a chiral nematic liquid crystal filter according to claim 1, wherein the transfer material further has an intermediate layer between the flexible support and the chiral nematic liquid crystal layer.