JP2001081138A5 - - Google Patents

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Publication number
JP2001081138A5
JP2001081138A5 JP1999263943A JP26394399A JP2001081138A5 JP 2001081138 A5 JP2001081138 A5 JP 2001081138A5 JP 1999263943 A JP1999263943 A JP 1999263943A JP 26394399 A JP26394399 A JP 26394399A JP 2001081138 A5 JP2001081138 A5 JP 2001081138A5
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JP
Japan
Prior art keywords
acid
generates
energy ray
proliferating
action
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999263943A
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Japanese (ja)
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JP2001081138A (en
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Publication date
Application filed filed Critical
Priority to JP26394399A priority Critical patent/JP2001081138A/en
Priority claimed from JP26394399A external-priority patent/JP2001081138A/en
Publication of JP2001081138A publication Critical patent/JP2001081138A/en
Publication of JP2001081138A5 publication Critical patent/JP2001081138A5/ja
Pending legal-status Critical Current

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本発明の請求項４に記載の感活性エネルギー線樹脂組成物は、以上に述べた酸感受性樹脂と活性エネルギー線の作用によって強酸を発生する酸発生剤に、さらに酸の作用によって新たな酸を発生する酸増殖剤を添加してなるものである。酸増殖剤の添加によってさらに酸増殖反応が高まるので、感度が向上する。 The acid generator which generates a strong acid under the action of actinic energy ray resin composition is more than the mentioned acid sensitive resins and active energy ray according to claim 4 of the present invention, a new acid by further action of an acid And an acid-proliferating agent that generates The addition of the acid proliferating agent further enhances the acid proliferating reaction, thereby improving the sensitivity.

JP26394399A 1999-09-17 1999-09-17 Acid sensitive resin, resin composition for active energy ray comprising the acid sensitive resin and method for forming pattern using the same Pending JP2001081138A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26394399A JP2001081138A (en) 1999-09-17 1999-09-17 Acid sensitive resin, resin composition for active energy ray comprising the acid sensitive resin and method for forming pattern using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26394399A JP2001081138A (en) 1999-09-17 1999-09-17 Acid sensitive resin, resin composition for active energy ray comprising the acid sensitive resin and method for forming pattern using the same

Publications (2)

Publication Number Publication Date
JP2001081138A JP2001081138A (en) 2001-03-27
JP2001081138A5 true JP2001081138A5 (en) 2006-10-19

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ID=17396421

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26394399A Pending JP2001081138A (en) 1999-09-17 1999-09-17 Acid sensitive resin, resin composition for active energy ray comprising the acid sensitive resin and method for forming pattern using the same

Country Status (1)

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JP (1) JP2001081138A (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100811394B1 (en) * 2001-10-18 2008-03-07 주식회사 하이닉스반도체 Novel negative type photoresist polymer and photoresist composition containing the same
KR101308695B1 (en) * 2006-07-10 2013-09-13 주식회사 동진쎄미켐 Acid amplifier and photosensitive polymer including the same
KR20100071088A (en) * 2007-10-29 2010-06-28 제이에스알 가부시끼가이샤 Radiation sensitive resin composition and polymer
JP5675070B2 (en) * 2009-07-30 2015-02-25 富士フイルム株式会社 Actinic ray-sensitive or radiation-sensitive resin composition, and pattern formation method using the composition
JP5331624B2 (en) * 2009-09-04 2013-10-30 富士フイルム株式会社 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
JP5371805B2 (en) * 2010-01-25 2013-12-18 富士フイルム株式会社 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
US9223208B2 (en) 2011-12-29 2015-12-29 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
US9772558B2 (en) * 2013-09-24 2017-09-26 International Business Machines Corporation Sulfonic acid ester containing polymers for organic solvent based dual-tone photoresists
JP2016071243A (en) * 2014-09-30 2016-05-09 富士フイルム株式会社 Method for forming resin pattern, method for forming pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device

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