JP2001070895A - Device and method for scrub washing, and production of information recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a scrub washing device capable of shortening washing time and eliminating the need of a large-scale device for transporting a substrate for next washing treatment. SOLUTION: This scrub washing device has a scrub pad 10 provided with two planar ring shaped scrubbers 11 and 11' and wheels 12 and 12' for supporting the inner peripheral surface A of the scrubber and the opposite side surface B to the scrub surface and for rotating the scrubber round the center axis in the state putting scrub surfaces of the scrubbers 11 and 11' together and a guide member provided along the outer periphery of the scrub pad 10 so that the substrate may be transported in the rotating direction of the scrub pad 10, and the scrub washing of the substrate is executed by transporting the substrate put between scrubbers 11 and 11' by the rotation of the scrub pad 10 rotating the substrate by the frictional force generated by abutting on the guide member.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scrub cleaning method and a scrub cleaning method for scrubbing the main surface of a disk-shaped substrate such as a glass substrate for an information recording medium or a semiconductor wafer with a sponge or a brush. The present invention relates to an apparatus, a method for manufacturing an information recording medium, and the like.

[0002]

2. Description of the Related Art In a disk substrate cleaning apparatus described in Japanese Patent Application Laid-Open No. 9-206705, a plurality of cleaning stations are arranged side by side, and a disk substrate (a disk having a center hole) is cleaned by a transfer device (lifting hook). The disk substrate is sequentially moved to a station, and the disk substrate is scrubbed and cleaned by a cylindrical scrub roller.

[0003]

In the above-described disk substrate cleaning apparatus, when transferring the disk substrate to each of the cleaning stations, the disk substrate is transported while supporting the center hole of each substrate by a lifting hook (between the cleaning stations). Transport), it is necessary to separately provide a transfer device, and there is a problem that the device becomes large-scale. Also,
When the transfer is performed while the center hole is supported by the lifting hook, there is a problem that the center hole may be rubbed and dust may be generated. Further, since it takes time to transfer to each cleaning station, there is a problem that the cleaning processing time when performing a plurality of cleaning processes is long. In other words, when the transfer is performed while supporting the center holes of the substrates one by one by the lifting hooks, the substrate is stopped → the center holes are supported (chucking) →
Since a series of operations from transfer to release of support (chucking) takes time, the cleaning processing time becomes longer. In addition, if the transfer takes a long time, there is a problem that the substrate dries and it becomes difficult to remove dirt. In particular, in the case of a 1-inch substrate used for a storage device in a mobile phone, a digital camera, a car navigation system, and the like, the center hole is small. Therefore, it is accurate and costly to perform the transfer while supporting the center hole with a lifting hook. Very difficult.

[0004]

To achieve the above object, the present invention has the following constitution.

(Configuration 1) Two planar scrubbers,
Means for supporting the scrubbing surfaces of the two planar scrubbers in opposition, means for rotating the planar scrubber about a rotation axis perpendicular to the planar scrubber, and a substrate sandwiched between the two opposing scrubbers. A guide member provided to be conveyed in the direction of rotation of the scrubber, wherein the substrate sandwiched between the two opposing scrubbers is conveyed in the direction of rotation of the scrubber by rotation of the scrubber, and A scrub cleaning apparatus characterized in that scrub cleaning of a substrate is performed by being rotated by frictional force generated by contact with a member.

(Structure 2) In a state where the two plate-ring-shaped scrubbers and the scrub surfaces of the two plate-ring-shaped scrubbers are aligned, the inner peripheral surface of the plate-ring-shaped scrubber and the opposite side of the scrub surface And a wheel for supporting the surface and rotating the scrubber about the central axis of the plate-ring-shaped scrubber; andthe plate-ring so that the substrate is transported in the direction of rotation of the scrub pad. A guide member provided to face the wheel on the inner peripheral surface side of the scrubber, and a guide member provided along the outer periphery of the scrub pad, wherein the substrate sandwiched between the two opposing scrubbers is a plate. The rotation of the scrub pad is carried in the direction of rotation of the scrubber between the wheel on the inner peripheral surface side of the ring-shaped scrubber and the guide member, and is abutted against the guide member to start the rotation. A scrub cleaning apparatus, which performs scrub cleaning of a substrate by being rotated by generated frictional force.

(Structure 3) Means for moving the scrubber in a state where at least a part of the substrate is sandwiched between two opposing scrubbers, and for transporting the substrate in the moving direction of the scrubber, and provided along the transport direction of the substrate Having friction generating means for generating friction by contacting the substrate to be conveyed,
A substrate cleaning unit that performs scrub cleaning of the substrate while transporting the substrate by rotating the substrate by the transfer of the substrate and the frictional force generated when the substrate comes into contact with the friction generating unit, and the substrate cleaning unit transfers the substrate to the substrate cleaning unit. A scrub cleaning apparatus comprising: a substrate introduction unit for carrying in; and a substrate removal unit for carrying out a substrate from the substrate cleaning unit.

(Structure 4) A pair of scrubbers rotatably supported and rotated by rotation driving means, a substrate introduction part for introducing a substrate before cleaning into a gap between the pair of scrubbers, and a substrate transferred from the substrate introduction part. The substrate is cleaned by a cleaning liquid supplied from a cleaning liquid supply unit, a substrate cleaning unit that cleans the substrate, a substrate removal unit that removes the cleaned substrate transported from the substrate cleaning unit, and in cooperation with the scrubber,
A transfer guide unit for transferring the substrate from the substrate introduction unit to the substrate cleaning unit, the substrate cleaning unit to the substrate removal unit, wherein the substrate cleaning unit applies a force in a transfer direction applied to the substrate by the scrubber. A scrub cleaning device comprising a resistance applying means for applying a resisting force to the scrubber, and performing scrub cleaning by a difference in peripheral speed due to rotation between the substrate and the scrubber by the resistance applying means.

(Structure 5) The scrub cleaning apparatus according to Structure 3 or 4, wherein a sensor for confirming the presence or absence of a substrate is provided in at least one of the substrate cleaning section, the substrate introduction section, and the substrate removal section.

(Structure 6) The transfer of the substrate is temporarily stopped by contacting the substrate transferred in the rotation direction of the scrubber,
The scrub cleaning apparatus according to any one of Configurations 1 to 5, further comprising a stopping unit for forcibly performing scrub cleaning of the substrate.

(Structure 7) The scrub cleaning apparatus according to Structure 6, wherein a sensor for confirming the presence or absence of the substrate is provided at a position where the transfer of the substrate is temporarily stopped.

(Structure 8) A plurality of cleaning stations having the structure described in any one of Structures 1 to 7, wherein the substrate cleaned in each cleaning station is transferred to the next cleaning station in the plurality of cleaning stations. A scrub cleaning device, comprising:

(Structure 9) The scrub cleaning apparatus according to Structure 8, wherein the transfer mechanism comprises a guide member connecting scrubbers of the plurality of cleaning stations.

(Structure 10) The transfer mechanism comprises a guide member for connecting the scrubbers of the plurality of washing stations, and a scrub roller for transporting the substrate while holding the substrate from both sides along the guide member. The scrub cleaning device according to configuration 8,

(Structure 11) The structure according to any one of structures 1 to 10, further comprising a scrubber and a cleaning liquid supply means for supplying a cleaning liquid to at least one of the substrates sandwiched between the two scrubbers. Scrub cleaning equipment.

(Structure 12) The structure according to any one of Structures 1 to 11, characterized in that the vertically arranged substrate is sandwiched between two scrubbers vertically arranged from both sides thereof. Scrub cleaning equipment.

(Structure 13) The scrub cleaning apparatus according to any one of structures 1 to 12, wherein the substrate is an information recording medium substrate.

(Structure 14) The scrubber is rotated in a state where the substrate is sandwiched between two opposing planar scrubbers, and the substrate is transported in the rotation direction of the scrubber.
A scrub cleaning method comprising: rotating a scrubber to generate a peripheral speed difference between the substrate and the scrubber due to rotation, thereby performing scrub cleaning of the substrate.

(Structure 15) The scrub cleaning method according to Structure 14, wherein the substrate conveyed by the scrubber is stopped at a predetermined position and scrub cleaning of the substrate is performed.

(Structure 16) A substrate cleaning section for performing scrub cleaning of the substrate, a substrate introduction section for introducing a substrate into the substrate cleaning section, and a substrate removal section for removing a substrate from the substrate cleaning section, The scrub cleaning method according to configuration 14 or 15, wherein the substrate is transported in order from the substrate introduction unit to the substrate cleaning unit, and from the substrate cleaning unit to the substrate removal unit.

(Structure 17) At least a sensor for confirming the presence or absence of a substrate is provided in the substrate cleaning section. When a plurality of substrates are scrub-cleaned, the sensor confirms that there is no substrate in the substrate cleaning section. 17. The scrub cleaning method according to Configuration 16, wherein the substrate is introduced into the substrate cleaning section from a time.

(Structure 18) In the method for manufacturing an information recording medium, wherein at least a recording layer is formed on the information recording medium substrate after scrubbing the substrate for the information recording medium, Structures 14 to 1
7. A method for manufacturing an information recording medium, comprising performing the scrub cleaning method according to any one of 7.

[0023]

According to the scrub cleaning method and apparatus of the present invention, the scrubber for scrub cleaning has a function of transferring a substrate to each cleaning point, and the transfer and transfer of the substrate are smooth, and the transfer to the next cleaning station is performed. Since the cleaning time is short, the cleaning processing time is reduced. Also,
Since the disk substrate can be transported without supporting the center hole, there is no danger that the center hole will be rubbed and dust will be generated, and thermal asperity due to dust generated from the center hole will be prevented. (For example, a magnetic disk) can be manufactured.

In the present invention, the substrate sandwiched between the two scrubbers is transported in the rotational direction by the rotation of the scrubber, and the friction between the substrate and the scrubber is generated by the frictional force generated when the substrate comes into contact with the guide member. A peripheral speed difference occurs between
Scrub cleaning is performed by rubbing the substrate and the scrubber. In order to generate a frictional force between the substrate and the guide member, that is, to generate a peripheral speed difference between the substrate and the scrubber, the substrate is transported in contact with the substrate transported in the rotation direction of the scrubber. Stopping means (stopping means) for temporarily stopping (for example, a rotatable free roller)
Or by adjusting the amount of substrate sandwiched by the scrubber (substrate clamping pressure).
In the latter case, since the substrate rotates during the transfer, the transfer of the substrate and the scrub cleaning are performed simultaneously.

According to the present invention, there is no need to provide a cleaning point or a large-scale device for transporting or transferring the substrate to the next cleaning station while supporting each substrate one by one. Can be made compact and small. In particular, the board placed vertically
A smaller space can be realized by using a vertical type device sandwiched between two scrubbers that are vertically installed from both sides. ADVANTAGE OF THE INVENTION According to this invention, there is no danger that a center hole will be rubbed and a board | substrate dries during a washing | cleaning process, and it will not become difficult to remove dirt. In the present invention, by providing the scrubber and the cleaning liquid supply means for supplying the cleaning liquid to at least one of the substrates sandwiched between the two scrubbers, and desirably both of them, the substrate does not dry during the cleaning and the transport. It is preferred. It is further desirable to provide a cleaning liquid (including water) supply means also in the transfer mechanism between the cleaning stations. In the present invention, it is preferable to provide a stopping means for forcibly performing scrub cleaning of the substrate, since the cleanliness of the substrate is improved. INDUSTRIAL APPLICABILITY The scrub cleaning method and apparatus of the present invention are useful especially in the case of performing a plurality of cleaning processes, because the cleaning process time is short and a large-scale transfer device does not need to be provided even when performing a plurality of cleaning processes. It is. The substrate to be cleaned according to the present invention is particularly suitable for cleaning a disk-shaped substrate such as a substrate for an information recording medium, particularly a substrate such as a 1-inch substrate, which is difficult to transfer or clean due to a small substrate size.

[0026]

(Embodiment 1) First, a scrub cleaning apparatus according to an embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view schematically showing a scrub cleaning apparatus according to one embodiment of the present invention, FIG. 2 is a front view of the scrub pad excluding a scrub pad on the near side, and FIG. 3 is a cross-sectional view of the scrub pad. 4 is a partial cross-sectional view showing a state of a substrate sandwiched between two scrubbers, FIG. 5 is a cross-sectional view for explaining the operation of a guide member in a transfer mechanism, and FIG. 6 is a front view showing another mode of an unloading mechanism. FIG.

The scrub cleaning apparatus shown in FIG. 1 includes a first cleaning station 100 for performing scrub cleaning with a weak alkaline cleaning liquid (the cleaning liquid may be other than the alkaline cleaning liquid).
Second cleaning station 3 for scrub cleaning with pure water
00 (other than pure water), and a transfer mechanism 200 for transferring the substrate cleaned in the first cleaning station to the second cleaning station. Note that three or more washing stations can be provided according to the required number of washing processes.

The first and second cleaning stations mainly include a scrub pad 10 for performing scrub cleaning of the substrate 1.
A guide member 20 for transporting the substrate 1 without dropping to the cleaning point, a stopper mechanism 30 for temporarily stopping the substrate 1 at the cleaning point, and a cleaning liquid supply mechanism 40 for supplying the cleaning liquid to the scrub pad 10 and the substrate 1 Consists of The scrub cleaning apparatus includes a loading mechanism for taking out a substrate from a cassette 61 containing a plurality of substrates and sending the substrate to a first cleaning station, and an unloading mechanism for storing a cleaned substrate in an empty cassette 63. ing.

In the present invention, as shown in FIGS. 2 to 4, the scrub pad 10 has a function of sandwiching at least a part of the substrate 1 from both sides of the substrate 1 and transporting the substrate 1 in the rotation direction of the scrub pad 10. And a function of performing scrub cleaning of the substrate 1. The scrub pad 10 is connected to a rotation mechanism (not shown) whose rotation speed is adjustable (1 to 500 rpm), and has two plate-ring-shaped sponges (scrubbers) 11 and 1 so that both surfaces of the substrate 1 can be scrubbed.
1 ′. The material of the sponge is polyvinyl alcohol (PVA). Two PVA sponges 11, 1
1 'is a wheel 12,
12 'supports the sponge on the inner peripheral surface A and the surface B opposite the scrub surface. Wheel 12, 1
2 ′ is configured to be rotatable around the central axis of the plate ring-shaped sponges 11, 11 ′. The width W of the ring of the plate ring-shaped sponge is about the radius of the substrate 1. As shown in FIG. 3, the two sponges 11 and 11 ′ are provided with an opening / closing mechanism (not shown) so that the sponges 11 and 11 ′ can be opened and closed in the thickness direction H of the substrate 1.
And the wheel 12 'and the sponge 11'. Note that the scrubber is not limited to a sponge, and may be a brush on which bristles are planted. Further, the holding pressure of the substrate 1 between the two sponges 11, 11 'can be adjusted. For example, FIG.
As shown in FIG. 5, a wheel 12 composed of a support 12a supporting the sponge 11 and a shaft 12b, a wheel 12 'composed of a support 12'a supporting the sponge 11' and a shaft 12'b, and a wheel 12 ' And a roller 13 arranged rotatably around the axis 12'b, and a gap 14 is provided between the support portions 12a and 12'a. By adjusting the interval, the holding pressure of the substrate 1 can be adjusted.

The guide member 20 is provided on the outer peripheral portion of the scrub pad 10, and the distance S between the inner diameter of the scrubber (outer diameter of the wheel) and the guide member is substantially the same as the diameter of the disc-shaped substrate 1. It is arranged. The distance S can have an adjustable structure. Guide member 20
Is made of a material softer than the substrate material so that the side surface of the substrate is not damaged. When the substrate is glass, a material such as polyetheretherketone (PEEK) or Teflon (registered trademark) is preferable. The substrate 1 is conveyed while being sandwiched between two sponges 11 and 11 ′ as the scrub pad 10 rotates. During this transfer, the guide member 20 prevents the substrate 1 from falling off.

A cleaning point for scrub-cleaning the substrate can be provided at an arbitrary position on the path along which the substrate 1 is transported by the scrub pad 10 and the guide member 20. The transported substrate is temporarily stopped at a cleaning point by a stopper mechanism 30 (for example, a rotatable free roller 31) made of a Teflon material for temporarily stopping the transported substrate 1, and is forcibly stopped. Perform scrub cleaning. Specifically, as shown in FIGS. 1 and 2, the lower half of the substrate 1 is rotated in the same direction as the scrub pad 10, whereby the substrate 1 is
The free roller 31 is rotated in the same direction as the scrub pad 10. The stopper mechanism 30 has a mechanism (not shown) for retracting the free roller 31 to a position where it does not come into contact with the substrate 1 in order to transfer the substrate 1 to the next cleaning station after scrubbing the substrate. Note that stopper mechanisms can be provided at a plurality of locations in one washing station. Further, as the stopping means (stopping means), a rotating roller driven by a drive system or a non-rotating stopping means made of a soft material that does not damage the substrate may be used instead of the free roller.

The cleaning liquid supply mechanism 40 includes a supply path 41 for spraying the cleaning liquid near the substrate surface and a supply path 42 for supplying the cleaning liquid from the inside of the scrub pad (the side in contact with the substrate) to the outside. is there. In the latter case, as shown in FIGS. 2 and 3, the cleaning liquid is supplied from the side surface of the wheel, and the cleaning liquid is supplied to the inner peripheral surface of the scrubber 11 via a supply path 42 extending radially inside the wheel. In this case, the cleaning liquid can be supplied not from the side surface of the wheel 12 but from a supply path passing through the rotation axis of the wheel. As a cleaning liquid to be used specifically, for example, pure water is supplied to the supply path 42 to the scrub pad in both the first and second cleaning stations. Further, in the first cleaning station, in order to perform cleaning with a weak alkaline cleaning liquid, a supply path 41 for spraying the cleaning liquid near the substrate surface by a pump from a cleaning liquid storage tank containing the weak alkaline cleaning liquid is provided.
Supply a weak alkaline cleaning solution. In the second cleaning station, pure water is supplied to the supply path 41 to perform cleaning with pure water.

Measure 1 The transfer mechanism 200 for transferring the substrate cleaned in the cleaning station 100 to the second cleaning station 300 includes a guide member 51 and a scrub pad 10.
And a rotating roller 52 made of the same material (sponge) as the scrubber. The rotating roller 52 has a rotating shaft 53
Is rotated in the direction of the arrow. The guide member 51 is
As shown in FIG. 5 (a), the substrate 1 transported sandwiched between the two sponges 11, 11 ′ is moved outward by the guide member 51 as shown in FIG. 5 (b). The substrate 1 is spread out to release the state in which the substrate 1 is sandwiched. The material of the rotating roller is preferably a soft material that does not damage the substrate surface. In order to prevent the scrub pad of the rotating roller from drying, a supply mechanism 40 and a supply path 43 for supplying pure water may be provided.
Note that the substrate may be simply transferred by the guide member using the rotation of the substrate without providing the rotating roller 52.

The cleaning apparatus of the present invention has a load mechanism for taking out a substrate from the storage cassette 61 storing a plurality of substrates and sending the substrate to the first cleaning station 100. Here, the storage cassette 61 has, for example, each substrate arranged at a distance of 6 mm, and is capable of storing 25 substrates (the number of stored substrates and the separation distance between the substrates are appropriately changed depending on the substrate size and the like. it can). A bottom surface of the storage cassette 61 is provided with a hand member 62 for holding a substrate in the loading mechanism.
Has an opening that allows it to pass through. The storage cassette 61 in which the substrates are arranged is moved by the stroke for separating the substrates, and the two sponges 11, 1 of the first cleaning station are moved by the hand member 62 of the loading mechanism.
It is transmitted until 1 '. 64 is a stopper. The substrate after the cleaning processing is stored in the storage cassette 63 via the guide 65 by the unload mechanism. As shown in FIG. 6, the substrate can be stored in a mode in which the guide member is provided obliquely downward.

Next, a scrub cleaning method according to one embodiment of the present invention will be described. 25 glass substrates for magnetic recording media of 1 inch diameter (outer diameter 27.4 mm, inner diameter 7.0 mm) precision polished and chemically strengthened are set in a storage cassette. This storage cassette is placed at the load point (immersed in pure water) of the scrub cleaning apparatus of the present invention described above. The glass substrate 1 placed in the storage cassette 61 is sent out to the scrubber position of the first cleaning station 100 rotating at a rotation speed of 100 rpm by the hand member 62 of the loading structure. The glass substrate 1 is composed of two sponges 1
It moves to the cleaning point between the guide member 20 and the wheels 12, 12 'while being sandwiched between 1, 1'.

At the cleaning point, the transport of the glass substrate 1 is stopped for several seconds (about 1 to 6 seconds) by the stopper mechanism of the free roller 31, and the weak alkaline cleaning liquid is sprayed from the supply path 41 toward the main surface of the substrate. At the same time, while supplying pure water to the sponges 11 and 11 'from the supply path 42, the substrate 1 and the sponge rotate in opposite directions to perform scrub cleaning. The rotation speed of the substrate is 2-5r
Ps is preferable. After the scrub cleaning in the first cleaning station is completed, the stopper of the free roller 31 is opened, and the substrate 1 moves to the transfer mechanism 200 while rotating. In the transfer mechanism 200, as shown in FIG. 5B, the sponges 11, 11 'are pushed outward by the guide members 51 to open the state in which the substrate 1 is sandwiched, and the both sides of the substrate 1 are opened. Is transported to the second cleaning station by being sandwiched by the rotary port rollers 52 arranged at the second position. Pure water is supplied to the rotary port 52 from the supply path 43 to prevent the substrate from drying.

The substrate 1 arriving at the second cleaning station 300 moves to the cleaning point while rotating between the wheel 12 and the guide member 20, similarly to the first cleaning station 100, and moves from the supply path 41 to pure water. Scrub cleaning (about 1 to 6 seconds).

After the scrub cleaning at the cleaning point is completed, the stopper of the free roller 31 is opened, the substrate 1 moves while rotating, and the substrate is stored in the storage cassette 63 at the unload point (immersed in pure water). Is done.

The obtained substrate was free from dirt, uneven cleaning and damage, and had good cleanliness. The time required to clean 25 glass substrates was as short as 45 seconds (1.8 seconds / sheet).

According to the present invention, a sensor for detecting a substrate is provided in the apparatus, and the flow of the substrate can be controlled and managed. For example,
As shown in FIG. 8, sensors 71, 72, and 7 for detecting substrates at the storage cassette 61, the cleaning point 101 of the first cleaning station, the cleaning point 201 of the second cleaning station, and the storage cassette 63, respectively.
3, 74 are provided to control and manage the flow of the substrate. In FIG. 8, a sensor 71 is a sensor for confirming the presence or absence of the substrate 1 at the substrate sending position in the storage cassette 61.
The sensor 72 is a sensor for checking the presence or absence of the substrate 1 at the cleaning point 101 of the first cleaning station. The sensor 73 is a sensor for confirming the presence or absence of the substrate 1 at the cleaning point of the second cleaning station 201. The sensor 74 is a sensor for confirming the presence or absence of the substrate 1 at the substrate storage position in the storage cassette 63.
In the storage cassette 61, the sensor 71 confirms that the substrate 1 exists at the substrate delivery position, and further confirms that the substrate 1 does not exist at the cleaning point 101 of the first cleaning station. The sponge 11, 1 of the scrub pad 10 which is constantly rotating
1 '(not shown). Substrate 1 at substrate sending position
When the sensor 71 confirms that the cassette does not exist, the cassette is moved to the next substrate sending position. At the cleaning point 101 of the first cleaning station, the substrate 1 arrives at the position of the free roller 31 and the presence of the substrate 1 is detected by the sensor 7.
When confirmation is made in step 2, the timer is activated and cleaning is performed at the cleaning point 101 for a certain period of time. After confirming that the set time of the timer has elapsed (time-up), the substrate 1 is moved to the cleaning point 201 of the second cleaning station.
After the sensor 73 confirms that the substrate 1 does not exist, the free roller 31 is retracted and the substrate 1 flows. As soon as the substrate flows, the free roller 31 is lowered to the original position. At the cleaning point 201 of the second cleaning station, when the substrate 1 arrives at the position of the free roller 31 and the presence of the substrate 1 is confirmed by the sensor 73, a timer is activated and cleaning is performed at the cleaning point 201 for a certain time. After confirming that the set time of the timer has elapsed (time-up), and further confirming by the sensor 74 that the substrate 1 does not exist at the substrate storage position in the storage cassette 63, the free roller 31 is retracted and the substrate 1 flows. . As soon as the substrate flows, the free roller 31 is lowered to the original position. In the storage cassette 63, when the sensor 74 confirms that the substrate 1 exists at the substrate storage position, the cassette is moved to the next substrate storage position. As described above, after confirming that the substrate does not exist at the next process position, by flowing the substrate, the trouble due to the collision of the substrate can be prevented beforehand. In addition, it is confirmed by a sensor and a timer mechanism that the substrate has not arrived even after a series of treatment times required from the delivery of the substrate to the storage thereof, or that the predetermined operation time at each sensor position has been exceeded. It is preferable to adopt a system for notifying a trouble such as catching or falling off of the substrate with a buzzer or stopping the device by checking with a sensor and a timer mechanism. The position and the number of the sensors are not limited to the illustrated embodiment, but can be set as appropriate. The type of the sensor may be any as long as it can detect the substrate. For example, a sensor that detects the substrate by reflection of laser light can be used. It goes without saying that each operation can be performed only by time management without providing a sensor.

FIG. 9 shows a specific example of a flowchart showing the control of the flow of the substrate described above. In FIG. 9, when the start switch is turned on, first, as a check of the initial state, (1) whether the cassette 61 containing the substrate to be washed and the empty cassette 63 are correctly set at predetermined positions (see FIG. 9). (2) whether the scrub pad 10 (hereinafter referred to as wheel 1) of the first cleaning station and the scrub pad 10 (hereinafter referred to as wheel 2) of the second cleaning station are rotating (not shown), (3) Whether the sensor 71 has confirmed the presence of the substrate and the sensors 72, 73, 74 have confirmed the absence of the substrate,
(4) It is checked whether the free roller 31 (hereinafter, referred to as a stopper 1) of the first cleaning station and the free roller 31 (hereinafter, referred to as a stopper 2) of the second cleaning station are lowered, and even one of the conditions is not satisfied. In this case, the alarm buzzer is turned on and an alarm is issued. After checking the initial state, in the loading mechanism, the hand member raising switch is turned ON, and when the raising of the hand member is confirmed,
The hand member lowering switch is turned on. When the lowering of the hand member is confirmed and the presence of the substrate is confirmed by the sensor 72, the cassette 61 is fed by one pitch. After that, returning to the confirmation of the presence of the substrate by the sensor 71 and the confirmation of the absence of the substrate by the sensor 72, the same operation is repeated. In the first cleaning station, after confirming the initial state, the sensor 7
When the presence of the substrate is confirmed in step 2, the timer 1 is started and the cleaning liquid is discharged until the time is up. After confirming the absence of the substrate by the sensor 73 and confirming the lowering of the stopper 2, the raising switch of the stopper 1 is turned ON. When the presence of the substrate is confirmed by the sensor 73, the lowering switch of the stopper 1 is set to O
N. Thereafter, the process returns to the confirmation of the presence of the substrate by the sensor 72, and the same operation is repeated. In the second cleaning station, after confirming the initial state, if the presence of the substrate is confirmed by the sensor 73, the timer 2 is started, and pure water is rinsed until the time is up. After the absence of the substrate is confirmed by the sensor 74, the lift switch of the stopper 2 is turned ON. When the presence of the substrate is confirmed by the sensor 74, the down switch of the stopper 2 is turned on. After that, the sensor 7
Returning to the confirmation of the presence of the substrate by 3, repeat the same operation. In the unloading mechanism, after the initial state is confirmed, the rise of the stopper 2 is confirmed, and when the presence of the substrate is confirmed by the sensor 74, the cassette 63 is fed by one pitch. Thereafter, returning to the confirmation of the absence of the substrate by the sensor 74, the same operation is repeated. If each judgment result is "No", the alarm buzzer is turned on and an alarm is issued. FIG. 9 is an example of a flowchart, and can be changed as appropriate. For example, instead of the sensors 72 and 73, a sensor for confirming the presence of the substrate in each of the wheels 1 and 2 can be provided.
The timer 1 can be designed to start and the cleaning liquid can be discharged until the time is up. Similarly, when the stopper 1 is confirmed to have risen, the timer 2 can be started and the pure water can be discharged until the time is up. .

Example 2 After drying 25 glass substrates scrubbed in Example 1, a NiAl seed layer and a Cr layer were formed on the main surface of the glass substrate by sputtering.
A V underlayer, a CoPtCrB magnetic layer, and a carbon protective layer were formed, and a perfluoropolyether lubricating layer was formed by a dipping method to produce a magnetic disk. A glide height test and a recording / reproducing test using an MR (magnetoresistive) head were performed on the manufactured magnetic disk. As a result, a highly reliable magnetic disk was obtained without occurrence of hits or thermal asperity.

The present invention is not limited to the scope described in the above embodiment, but can be implemented with appropriate modifications.

For example, as shown in FIG. 10, a plurality of scrub pads 10 can be continuously combined via a guide member 51 to constitute a scrub cleaning apparatus.

In the above embodiment, a rotatable free roller is provided in order to forcibly carry out scrub cleaning of the substrate. However, the clamping pressure on the substrate by the scrub pad, the amount of pinching on the substrate, or the guide member By appropriately controlling or changing the material state of the surface in contact with the side surface of the substrate, a difference in peripheral speed between the substrate and the scrubber occurs during the transfer of the substrate by the scrub pad, and the free roller Scrub cleaning can be performed without providing. However, at each cleaning station, the substrate is rotated during the transfer by the scrub pad, and the transfer of the substrate and the scrub cleaning are performed at the same time.
A combination in which a rotatable free roller or the like is provided to forcibly perform scrub cleaning of the substrate is most preferable. In this case, the rotation speed of the scrubber is preferably about 60 rpm, and the rotation speed of the substrate is preferably about 3 to 4 rpm. It is also preferable that the substrate be rotated while the substrate is being conveyed, because the wet scrubber can prevent the substrate from drying.

In addition, the scrubbers on both sides of the substrate can be rotated at the same or different rotation speeds in the same or different rotation directions when transferring the substrate or performing scrub cleaning at the cleaning point.

The scrubber is not limited to a plate ring, but may be a disk, a plane, or a belt. Further, the present invention is not limited to a mode in which about half of the substrate is sandwiched between the scrubbers, and may be an embodiment in which the entire substrate, or more than half of the substrate, or less than half of the substrate is sandwiched between the scrubbers. It can also be a horizontal device.

For removing dirt attached to the scrubber,
A scraping mechanism and a scrubber self-cleaning mechanism can be provided in the middle of the scrubber path. The guide member 51 shown in FIGS. 1 and 5 has an action of scraping off dirt attached to the scrubbers of both the first and second cleaning stations, and maintenance for removing dirt attached to the scrubber is usually required. Absent.

The structure of the scrub pad is, for example, as shown in FIG.
As shown in (1), a structure in which two or more substrates 1 can be simultaneously processed by a plurality of sponges 11 can be used to greatly improve the processing capability. In this case, the number of simultaneous processing
Considering the automation of the steps before and after the cleaning step by the apparatus of the present invention, it is preferable that the number of cassettes to be stored is a number that can be divided by an integer (for example, 1 or 5 for a 25-sheet cassette). In FIG. 11, each sponge 11 located in the middle is supported by the support member 15, but the scrubbers 11 and 11 'as shown in FIGS.
Scrub pads having a structure supported by 2, 12 'may be arranged side by side. In these cases, the intermediate wheel can be common.

In FIGS. 1-3, 6, 10 and the like, as the mechanism for driving the free roller 31 and the like, for example, a rotary actuator is used, and as shown in FIG. it can. Figures 1-3, 6,
In 8, 10 and the like, as the structure of the guide member, for example, a cross-sectional structure like the guide member 20 shown in FIG. 7 can be adopted.

Examples of the substrate to be cleaned include a glass substrate for a magnetic disk, a glass substrate for an optical disk, a glass substrate for a magneto-optical disk, and a semiconductor silicon wafer.
Substrate materials include glass (including glass for chemical strengthening, crystallized glass, etc.), ceramic, glass ceramic,
Examples include silicon, carbon, and metal. The shape of the substrate is circular, disk-shaped (including cases with orientation flat)
And the like. The substrate size is not particularly limited,
In addition to 1 inch, the present invention can be applied to sizes such as 2.5 inches, 3.0 inches, and 3.5 inches (for magnetic disks).

The steps of cleaning include, for example, after grinding / polishing of the substrate, after chemical strengthening of the substrate, before film formation on the substrate,
Alternatively, cleaning performed after film formation or the like can be given. In these cases, it is preferable to perform a more complete cleaning by combining the scrub cleaning according to the present invention with a cleaning / drying step that does not involve ordinary scrub cleaning. As the cleaning liquid, pure water, alkaline cleaning liquid, acidic cleaning liquid,
Examples include neutral detergents and other commercially available detergents.

Examples of the material of the scrubber in the scrub pad 10, the rotating roller 52, and the like include sponge-like materials (eg, PVA) and materials known as scrubber materials such as nylon brushes and artificial leather. As a material of the rotating roller 31, an elastic material such as rubber can be used.

The transfer mechanism includes a rotating roller, a guide member and the like. As a transfer mechanism, for example, as shown in FIG. 12, a substrate receiving portion 81 having a swing mechanism is provided between the cleaning stations, and after receiving the substrate 1 from the first cleaning station 100 by the substrate receiving portion 81, The transfer can be performed by swinging the receiving portion 81 about the fulcrum 82, toward the second cleaning station 200 as shown by a dotted line, and pushing out the substrate 1 in the direction of the arrow by a pushing arm or the like. . Other transfer mechanisms include a mechanism for transferring a substrate in the same manner as described above by providing a substrate receiving portion at the tip of a lever (lever) that reciprocates angularly,
A transfer mechanism using a robot arm can also be adopted.

The form of the scrubber and the positional relationship of the guide members and the like are not limited to the embodiments described above. For example, means for moving the scrubber while sandwiching at least a part of the substrate between two opposing scrubbers, and transporting the substrate in the moving direction of the scrubber (for example, a belt-shaped scrubber stretched between belt wheels). And a friction generating means (for example, a guide member) provided along the transport direction of the substrate and in contact with the transported substrate to generate friction when the substrate is transported and the substrate contacts the friction generating means. The substrate is rotated by the generated frictional force, so that the substrate is cleaned by scrubbing the substrate while transporting the substrate; a substrate loading unit that loads the substrate into the substrate cleaning unit; And a substrate unloading section for unloading the substrate.

[0056]

According to the scrub cleaning method and apparatus of the present invention, a scrubber for scrub cleaning has a function of transferring a substrate to each cleaning point, and the transfer and transfer of the substrate are smooth. Since the transfer time to the cleaning station is also short, the processing time for cleaning is reduced. In addition, in the disk substrate, since the transfer can be performed without supporting the center hole, there is no possibility that the center hole is rubbed and dust is generated, and the generation of thermal asperity due to dust generated from the center hole can be prevented. A highly reliable information recording medium (for example, a magnetic disk) can be manufactured. In addition, since there is no need to provide a large-scale device for transporting or transferring each substrate to a cleaning point or the next cleaning station while supporting each substrate, the device can be simplified, and the device can be made compact and space can be reduced. it can.
Furthermore, there is no danger of dust being generated due to the rubbing of the central hole, and the substrate is not dried during the cleaning process, and dirt is not easily removed. INDUSTRIAL APPLICABILITY The scrub cleaning method and apparatus of the present invention are useful especially in the case of performing a plurality of cleaning processes, because the cleaning process time is short and a large-scale transfer device does not need to be provided even when performing a plurality of cleaning processes. It is. The substrate to be cleaned according to the present invention is particularly suitable for cleaning a disk-shaped substrate such as a substrate for an information recording medium, particularly a substrate such as a 1-inch substrate, which is difficult to transfer or clean due to a small substrate size.

[Brief description of the drawings]

FIG. 1 is a sectional view schematically showing a scrub cleaning apparatus according to one embodiment of the present invention.

FIG. 2 is a front view of a main part of the apparatus when a scrub pad on the near side is removed.

FIG. 3 is a sectional view of a scrub pad.

FIG. 4 is a partial cross-sectional view showing a state of a substrate sandwiched between two scrubbers.

FIG. 5 is a sectional view for explaining the operation of a guide member in the transfer mechanism.

FIG. 6 is a front view showing another mode of the unload mechanism.

FIG. 7 is a cross-sectional view showing one embodiment of a scrub pad capable of adjusting a holding pressure.

FIG. 8 is a front view of a main part for describing a method of controlling and managing the flow of the substrate by providing a sensor for detecting the substrate in the scrub cleaning apparatus.

FIG. 9 is a flowchart or a signal diagram illustrating an operation of providing a sensor to control and manage the flow of the substrate.

FIG. 10 is a sectional view schematically showing a scrub cleaning apparatus according to another embodiment of the present invention.

FIG. 11 is a cross-sectional view showing one embodiment of a scrub pad capable of simultaneously processing a plurality of substrates.

FIG. 12 is a front view of a main part showing another mode of the transfer mechanism.

[Explanation of symbols]

 Reference Signs List 1 substrate 10 scrub pad 11, 11 'sponge (scrubber) 12, 12' wheel 20 guide member 30 stopper mechanism 31 free roller 40 cleaning liquid supply mechanism 41 supply path 42 supply path 51 guide member 52 rotating roller 61 cassette 63 cassette 71, 72 , 73, 74 Sensor 100 First cleaning station 200 Transfer mechanism 300 Second cleaning station

Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme coat II (Reference) H01L 21/304 644 H01L 21/304 644G 648 648G

Claims (18)

[Claims] 1. means for supporting two planar scrubbers with scrubbing surfaces of the two planar scrubbers facing each other; means for rotating the planar scrubber about an axis of rotation perpendicular to the planar scrubber; A substrate provided between the two opposing scrubbers so as to be conveyed in the direction of rotation of the scrubber; and a substrate interposed between the two opposing scrubbers. A scrub cleaning apparatus wherein the substrate is scrubbed by being conveyed in a rotation direction of a scrubber by rotation and rotated by a frictional force generated by contacting the guide member. 2. An inner peripheral surface of a plate-ring-shaped scrubber and a surface opposite to the scrub surface in a state where the scrubbing surfaces of the two plate-ring-shaped scrubbers are matched with each other. And a wheel for rotating the scrubber around a central axis of the plate-ring-shaped scrubber, and a scrub pad, and the plate-ring-shaped scrubber so that the substrate is transported in the rotation direction of the scrub pad. A guide member provided opposite to the wheel on the inner peripheral surface side of the scrubber, and provided along the outer periphery of the scrub pad, wherein the substrate sandwiched between the two opposing scrubbers has a plate ring shape The scrubber is conveyed in the rotational direction of the scrubber by the rotation of the scrub pad between the wheel on the inner peripheral surface side of the scrubber and the guide member, and the friction generated by contact with the guide member. A scrub cleaning apparatus, which performs scrub cleaning of a substrate by being rotated by frictional force. 3. A scrubber is moved with at least a part of the substrate sandwiched between two opposing scrubbers,
It has means for transporting the substrate in the direction of movement of the scrubber, and friction generating means provided along the transport direction of the substrate and in contact with the substrate to be transported to generate friction. A substrate cleaning unit that performs scrub cleaning of the substrate while transporting the substrate by rotating the substrate by a frictional force generated in contact with the unit; a substrate introduction unit that carries the substrate into the substrate cleaning unit; A scrub cleaning apparatus, comprising: a substrate take-out unit that carries out a substrate from a substrate cleaning unit. 4. A pair of scrubbers rotatably supported and rotated by rotation driving means, a substrate introduction unit for introducing a substrate before cleaning into a gap between the pair of scrubbers, and a substrate conveyed from the substrate introduction unit. A substrate cleaning unit for cleaning with a cleaning liquid supplied from a cleaning liquid supply unit, a substrate removal unit for removing a cleaned substrate transported from the substrate cleaning unit, and a substrate introduction unit for cooperating with the scrubber. A substrate transport unit that transports the substrate from the substrate cleaning unit to the substrate take-out unit, wherein the substrate cleaning unit applies a force against a force in a transport direction applied to the substrate by the scrubber. It has a resistance applying means, and performs scrub cleaning by a difference in peripheral speed due to rotation between the substrate and the scrubber by the resistance applying means. To a scrubbing device. 5. The scrub cleaning apparatus according to claim 3, wherein at least one of the substrate cleaning section, the substrate introduction section, and the substrate take-out section is provided with a sensor for confirming the presence or absence of the substrate. 6. A stopping means for temporarily stopping the transfer of the substrate by contacting the substrate transferred in the rotation direction of the scrubber and forcibly performing scrub cleaning of the substrate. The scrub cleaning device according to any one of claims 1 to 5. 7. The scrub cleaning apparatus according to claim 6, wherein a sensor for confirming the presence or absence of the substrate is provided at a position where the transport of the substrate is temporarily stopped. 8. A plurality of cleaning stations having a configuration according to claim 1, wherein the substrate cleaned in each of the plurality of cleaning stations is transferred to a next cleaning station. A scrub cleaning device, comprising: a transfer mechanism. 9. The scrub cleaning apparatus according to claim 8, wherein said transfer mechanism comprises a guide member connecting scrubbers of said plurality of cleaning stations. 10. The transfer mechanism according to claim 1, wherein the transfer mechanism comprises a guide member for connecting the scrubbers of the plurality of cleaning stations, and a scrub roller for transporting the substrate while holding the substrate from both sides along the guide member. A scrub cleaning device according to claim 8. 11. A cleaning liquid supply means for supplying a cleaning liquid to at least one of a scrubber and a substrate sandwiched between two scrubbers, the cleaning liquid supplying means comprising: Scrub cleaning equipment. 12. The apparatus according to claim 1, wherein the apparatus is a vertical type apparatus in which a vertically placed substrate is sandwiched between two scrubbers placed vertically from both sides thereof. Scrub cleaning equipment. 13. The scrub cleaning apparatus according to claim 1, wherein the substrate is an information recording medium substrate. 14. A scrubber is rotated in a state where a substrate is sandwiched between two opposing planar scrubbers, and the substrate is transported in the direction of rotation of the scrubber. A scrub cleaning method for the substrate by generating a peripheral speed difference due to rotation in the step (c). 15. The scrub cleaning method according to claim 14, wherein the substrate conveyed by the scrubber is stopped at a predetermined position and scrub cleaning of the substrate is performed. 16. A substrate cleaning unit, comprising: a substrate cleaning unit that performs scrub cleaning of the substrate; a substrate introduction unit that introduces a substrate into the substrate cleaning unit; and a substrate removal unit that removes a substrate from the substrate cleaning unit. 16. The scrub cleaning method according to claim 14, wherein the substrate is transported in order from the substrate introduction section to the substrate cleaning section, and from the substrate cleaning section to the substrate removal section. 17. A sensor for confirming the presence or absence of a substrate is provided at least in a substrate cleaning unit. When scrub-cleaning a plurality of substrates, the sensor confirms that there is no substrate in the substrate cleaning unit. 17. The scrub cleaning method according to claim 16, wherein the substrate is introduced into the cleaning unit. 18. The method for manufacturing an information recording medium according to claim 14, wherein at least a recording layer is formed on the information recording medium substrate after scrubbing the information recording medium substrate. A method for manufacturing an information recording medium, comprising: