JP2001059198A - Zn-Co PLATED METALLIC SHEET EXCELLENT IN CORROSION RESISTANCE AND ITS PRODUCTION - Google Patents

Zn-Co PLATED METALLIC SHEET EXCELLENT IN CORROSION RESISTANCE AND ITS PRODUCTION

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Publication number
JP2001059198A
JP2001059198A JP23520699A JP23520699A JP2001059198A JP 2001059198 A JP2001059198 A JP 2001059198A JP 23520699 A JP23520699 A JP 23520699A JP 23520699 A JP23520699 A JP 23520699A JP 2001059198 A JP2001059198 A JP 2001059198A
Authority
JP
Japan
Prior art keywords
plating
plating layer
corrosion resistance
plated
amorphous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP23520699A
Other languages
Japanese (ja)
Inventor
Kuniyasu Araga
邦康 荒賀
Hiroo Shigeru
博雄 茂
Masatoshi Iwai
正敏 岩井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP23520699A priority Critical patent/JP2001059198A/en
Publication of JP2001059198A publication Critical patent/JP2001059198A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To produce a Zn-Co electroplated metallic sheet excellent in corrosion resistance even with small plating coating weight and moreover excellent also as to forming workability and productivity. SOLUTION: In this Zn-Co plated metallic sheet in which a plating layer essentially consisting of a Zn-Co alloy is formed, the Zn-Co plating layer is made amorphous. Moreover, it can be said that it is amorphous in the case the X-ray diffraction pattern of the plating layer measured by using Cu-Kα rays does not substantially include the peaks caused by a η phase of Zn, and peaks substantially resulted from substrate metal excepting the fact that the peaks of >=1 deg. half-value width are shown in the vicinity of 2 θ: 41 to 45 deg..

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、建材,家庭電器製
品,自動車等の広範な分野において使用される耐食性に
優れた薄目付けの電気Zn−Coめっき金属板およびそ
の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-plated electric Zn-Co plated metal sheet having excellent corrosion resistance and used in a wide range of fields such as building materials, household appliances, automobiles, and the like, and a method for producing the same.

【0002】なお、本発明においてめっき対象となる金
属基材には、FeやFe基合金の他、CuやAl等の非
鉄金属やそれらの合金が含まれ、その形状については平
板材や波板材等の板材をはじめとして管材や棒材,線材
等の如何を問わないが、以下では代表的な金属基材であ
る鋼板を取り上げて本発明を説明する。
The metal substrate to be plated in the present invention includes non-ferrous metals such as Cu and Al and alloys thereof in addition to Fe and Fe-based alloys. The present invention will be described with reference to a steel plate, which is a typical metal base material, regardless of a plate material such as a pipe material, a pipe material, a bar material, and a wire material.

【0003】[0003]

【従来の技術】建材,家庭電器製品および自動車等の広
範な分野において、鋼板等を防食する手段としてZnめ
っきが従来より汎用されている。Znめっき鋼板のめっ
き法には、溶融めっき法,電気めっき法,蒸着めっき法
等があり、腐食環境が厳しく且つ長期の耐食性が要求さ
れる建材や自動車用途には、厚めっきが容易な溶融めっ
きが行われている。また、腐食環境はマイルドである
が、美麗な表面外観が要求される家電やOA機器等への
用途には薄目付でめっき外観が美麗な電気めっきが主と
して用いられている。
2. Description of the Related Art In a wide range of fields such as building materials, household appliances and automobiles, Zn plating has been widely used as a means for preventing corrosion of steel plates and the like. There are hot-dip galvanizing method, electroplating method, and vapor-deposition plating method as the plating method for Zn-plated steel sheet. For building materials and automobiles that require severe corrosion environment and long-term corrosion resistance, hot-dip plating that is easy to thick plating Has been done. Further, although the corrosive environment is mild, electroplating with a thin and beautiful plating appearance is mainly used for home appliances and OA equipment requiring a beautiful surface appearance.

【0004】近年、鋼板等の耐食性向上に対する要求は
更に高まる傾向にあり、いずれのめっき方法においても
めっき付着量を増加させることで耐食性を向上させるこ
とはできるが、めっき付着量の増加は加工性や溶接性の
劣化を招いてしまう。そこでZnと異種金属の合金めっ
き等の方法が数多く提案されており、中でも薄目付が容
易な電気めっき法では、Zn−Ni,Zn−Fe,Zn
−Co等の各種合金めっきが採用されている。特に、Z
n−Co系合金めっきは高耐食性が期待でき、より高い
耐食性を得る技術として例えば特開昭60−21109
6号公報には複層めっき鋼板が提案されている。これ
は、第1層としてCoを6〜30重量%、第2層として
Coを0.1〜6重量%含有するZn−Co合金めっき
層を形成するものである。しかしながら、上記複層めっ
き鋼板でも耐食性についてはまだ改善の余地が残されて
おり、必要な場合にはめっき付着量を多くしなければな
らず、このため経済性に欠けるうえ、めっき皮膜の加工
性や溶接性の改善にも限界があった。
[0004] In recent years, the demand for improved corrosion resistance of steel sheets and the like has tended to further increase. In any of the plating methods, the corrosion resistance can be improved by increasing the amount of plating, but the increase in the amount of plating is due to the workability. And deterioration of weldability. Therefore, many methods such as alloy plating of Zn and a dissimilar metal have been proposed. Among them, in the electroplating method in which thinning is easy, Zn—Ni, Zn—Fe, Zn
Various types of alloy plating such as -Co are employed. In particular, Z
The n-Co alloy plating can be expected to have high corrosion resistance, and as a technique for obtaining higher corrosion resistance, for example, JP-A-60-21109
No. 6 proposes a multi-layer plated steel sheet. This is to form a Zn—Co alloy plating layer containing 6 to 30% by weight of Co as the first layer and 0.1 to 6% by weight of Co as the second layer. However, there is still room for improvement in the corrosion resistance of the above-mentioned multi-layer plated steel sheet, and if necessary, the amount of coating must be increased, which is not economical and the workability of the plating film is low. And the improvement of weldability was also limited.

【0005】[0005]

【発明が解決しようとする課題】本発明は上記のような
事情に着目してなされたものであり、少ないめっき付着
量で耐食性に優れ且つ成形加工性および生産性について
も優れた電気Zn−Coめっき金属板及びその製造方法
を提供しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned circumstances, and is an electric Zn--Co alloy which is excellent in corrosion resistance with a small amount of plating adhesion and excellent in moldability and productivity. An object of the present invention is to provide a plated metal plate and a method of manufacturing the same.

【0006】[0006]

【課題を解決するための手段】上記の目的を達成するこ
とのできた本発明の耐食性に優れたZn−Coめっき金
属板とは、Zn−Co合金を主体とするめっき層が形成
されたZn−Coめっき金属板であって、Zn−Coめ
っき層がアモルファスであることを要旨とするものであ
る。具体的には、Cu−Kα線を用いて測定しためっき
層のX線回折パターンが、実質的にZnのη相に起因す
るピークを含まないと共に、2θ:41〜45°近傍に
半値幅が1°以上のピークが見られる他は実質的に基板
金属に由来するピークが認められる場合にアモルファス
であるということができる。
The Zn-Co-plated metal sheet excellent in corrosion resistance according to the present invention, which can achieve the above object, is a Zn-Co plated metal plate having a plating layer mainly composed of a Zn-Co alloy. A Co-plated metal plate, wherein the Zn-Co plated layer is amorphous. Specifically, the X-ray diffraction pattern of the plating layer measured using Cu-Kα radiation does not substantially include a peak due to the η phase of Zn, and has a half-value width in the vicinity of 2θ: 41 to 45 °. Amorphous can be said to be amorphous when a peak substantially derived from the substrate metal is observed except that a peak of 1 ° or more is observed.

【0007】尚、Zn−Coめっき層中のCo含有量は
1〜35重量%であることが望ましく、ZnおよびCo
の金属塩を含有する酸性めっき液を用い、300〜20
00A/dm2の電流密度で電気めっきを行うことによ
り、めっき層がアモルファスである電気Zn−Coめっ
き金属板を製造することができる。
The Co content in the Zn—Co plating layer is desirably 1 to 35% by weight.
Using an acidic plating solution containing a metal salt of
By performing electroplating at a current density of 00 A / dm 2 , an electroplated Zn—Co plated metal plate having an amorphous plating layer can be manufactured.

【0008】[0008]

【発明の実施の形態】本発明者等は、純Znめっき層よ
り優れた耐食性を有するZn−Coめっき層の耐食性を
更に向上させる技術の開発を目的として鋭意研究を重ね
た。その結果、Zn−Coめっき層をアモルファスめっ
き層とすることにより、従来のZn−Coめっき層に比
べて飛躍的に優れた耐食性を示すことを突き止め、本発
明に想到した。
BEST MODE FOR CARRYING OUT THE INVENTION The present inventors have conducted intensive studies for the purpose of developing a technique for further improving the corrosion resistance of a Zn—Co plating layer having better corrosion resistance than a pure Zn plating layer. As a result, they found out that the Zn—Co plating layer was made to be an amorphous plating layer, thereby exhibiting significantly superior corrosion resistance as compared with the conventional Zn—Co plating layer, and reached the present invention.

【0009】なお、本発明で言う耐食性とは、めっきま
ま(無塗装)での耐赤錆性や耐穴あき腐食性を意味する
ものであり、また塗装した後にあっては塗膜に疵がつい
た部分や塗装鋼板の端面における耐食性や耐塗膜膨れ性
を意味するものである。
The term "corrosion resistance" as used in the present invention means red rust resistance or pitting corrosion resistance as-plated (no coating), and after coating, the coating film has no scratches. It means the corrosion resistance and the swelling resistance of the coating film on the bent portion and the end face of the coated steel sheet.

【0010】またアモルファスとは、構成する各原子が
結晶構造を持たずランダムな位置関係にある状態を言
う。例えば常法によりZnとCoの合金めっきを作製す
ると、Co含有率に従ってZn相,ZnとCoの金
属間化合物相( 例えばCoZn 13,Co5Zn21),
Co相の各相が、複数認められる。結晶構造を有する純
金属や合金または金属間化合物等のめっき層をX線回折
法により測定すると、図1の純Znめっきや図2の結晶
構造を有するZn−Co合金めっきの様に、結晶の各面
間隔に対応した鋭い回折線(ピーク)が観測されるが、
アモルファスめっき層の場合には、図3に示した本発明
に係るZn−Coめっきの測定結果の様に、鋭い回折線
は認められずブロードな回折パターンとなる。
[0010] Also, amorphous is that each of the constituent atoms is
State that has no crystal structure and is in a random positional relationship
U. For example, an alloy plating of Zn and Co is produced by an ordinary method.
Then, according to the Co content, the Zn phase, the gold of Zn and Co
Intergeneric compound phase (for example, CoZn 13, CoFiveZntwenty one),
Multiple Co phases are observed. Pure with crystal structure
X-ray diffraction of metal, alloy or intermetallic compound plating layer
The pure Zn plating of FIG. 1 and the crystal of FIG.
Each surface of the crystal, like Zn-Co alloy plating with a structure
A sharp diffraction line (peak) corresponding to the interval is observed,
In the case of an amorphous plating layer, the present invention shown in FIG.
Sharp diffraction line like the measurement result of Zn-Co plating
Is not recognized and a broad diffraction pattern is obtained.

【0011】Zn−Coめっき層が、結晶質を有するZ
n−Coめっき層(以下、アモルファスめっき層に対し
て結晶質めっき層ということがある)に比べて非常に優
れた耐食性を有する理由は、現時点では必ずしも全てが
解明された訳ではないが以下の様に考えられる。Zn−
Co結晶質めっき層の場合、めっき層中に通常、前記
〜の複数の“相”を有しており、これらの相ごとに腐
食電位が異なっている。従って、めっき層中でミクロな
腐食電池が形成され、腐食電位の低い相の溶解が促進さ
れ、結果としてめっき層全体の耐食性を下げている。こ
れに対してアモルファスめっき層の場合には、各原子が
ランダムに配置しているため、めっき層中に結晶構造に
起因する“相”が存在せず均一なめっき層となってい
る。即ち、めっき層の腐食電位が均一であるため、腐食
電池が形成されず優れた耐食性を示す。また、結晶質に
は必ず存在する結晶粒界は、腐食の起点と考えられてい
るが、アモルファスめっき層にはこの結晶粒界が存在し
ないため、この点でも非常に有利であることが推察でき
る。
The Zn—Co plating layer has a crystalline Z
The reason for having extremely excellent corrosion resistance compared to an n-Co plating layer (hereinafter sometimes referred to as a crystalline plating layer with respect to an amorphous plating layer) is not completely understood at this time, but the following is described. It is thought like. Zn-
In the case of a Co crystalline plating layer, the plating layer usually has a plurality of “phases” described above, and the corrosion potential differs for each of these phases. Therefore, a micro corrosion cell is formed in the plating layer, and the dissolution of a phase having a low corrosion potential is promoted, and as a result, the corrosion resistance of the entire plating layer is lowered. On the other hand, in the case of the amorphous plating layer, since each atom is randomly arranged, there is no "phase" due to the crystal structure in the plating layer, and the plating layer is uniform. That is, since the corrosion potential of the plating layer is uniform, a corrosion battery is not formed and excellent corrosion resistance is exhibited. Also, crystal grain boundaries that are always present in the crystalline material are considered to be the starting points of corrosion, but since this crystal grain boundary does not exist in the amorphous plating layer, it can be inferred that this point is also very advantageous. .

【0012】本発明のZn−Coめっき層は、X線回折
法を用いて測定した回折パターンがブロードでなければ
ならない。具体的には、線源としてCuKα線を用いた
X線回折の場合、実質的にZnのη相の回折パターンを
示すことなく、2θ:41〜45°近傍に半値幅が1°
以上のピークが見られる他は実質的に基板金属に由来す
るピークが認められるものであることが必要である。
尚、CoZn13,Co5Zn21,CoZnの各金属間化
合物が生成した場合には、2θ:41〜45°付近に鋭
い回折パターンが認められる。また、2θ:41〜45
°近傍において、半値幅で1°未満の鋭いピークを1つ
だけ持つ場合であっても、前記金属間化合物のいずれか
が生成しており、もはやアモルファスめっきとは言え
ず、優れた耐食性は期待できない。
The Zn-Co plating layer of the present invention must have a broad diffraction pattern measured by using the X-ray diffraction method. Specifically, in the case of X-ray diffraction using CuKα radiation as a radiation source, the half-value width is 1 ° in the vicinity of 2θ: 41 to 45 ° without substantially showing the diffraction pattern of the η phase of Zn.
In addition to the above peaks, it is necessary that a peak substantially derived from the substrate metal is recognized.
When the intermetallic compounds of CoZn 13 , Co 5 Zn 21 , and CoZn are formed, a sharp diffraction pattern is observed at around 2θ: 41 to 45 °. Also, 2θ: 41 to 45
In the vicinity of °, even if it has only one sharp peak with a half-value width of less than 1 °, one of the intermetallic compounds has been generated, and it can no longer be said to be amorphous plating, and excellent corrosion resistance is expected. Can not.

【0013】X線回折に関しては公知の方法を用いれば
良く、線源としてもCuKα線の他、CoKα線等を使
用してもよい。尚、CuKα線以外の線源を用いた場合
には、本発明でいうピーク回折角度(2θ)は、その線
源の波長に合わせて変化する。また線源の強度について
は、例えば管球方式の場合、一般的に使用される電圧4
0kV,電流20mA程度を採用すればよい。測定角度
の範囲は、2θで30〜80°(CuKα線を用いた場
合)程度測定することが望ましい。
A known method may be used for X-ray diffraction, and a CoKα ray or the like may be used as a radiation source in addition to CuKα rays. When a radiation source other than CuKα radiation is used, the peak diffraction angle (2θ) in the present invention changes according to the wavelength of the radiation source. Regarding the intensity of the radiation source, for example, in the case of a tube system, a generally used voltage 4
A current of about 0 kV and a current of about 20 mA may be employed. It is desirable that the range of the measurement angle is about 30 to 80 ° (when using CuKα radiation) in 2θ.

【0014】本発明のZn−Coめっき層の成分組成で
あるが、Co量が少なすぎると、Coの添加効果が実質
的に発揮されず、しかもアモルファスめっき層を得るこ
とできない。従って、耐食性においてZn−Co結晶質
めっき層と格別の差異が認められなくなるので、1%以
上含有させることが望ましく、2%以上であればより望
ましい。一方、Co量が多すぎると、めっき層自身の腐
食電位が貴になり、基材として鋼板等のFe系素材やA
l系素材を用いた場合にZn系めっきに特有の犠牲防食
作用が無くなり、或いはかえって基材の腐食を促進して
しまう。更には成形加工性が劣化すると同時に高価なC
oを多量に含有させることは経済的にも好ましくない。
従って、35%以下が好ましく、30%以下であればよ
り好ましい。なお、Coの含有量が増加すると成形加工
性が低下する理由は、Coの増加に伴いめっき層の硬度
が増加し、成形加工時にクラックが生じ、めっき層が剥
離しやすくなるからであると考えられる。
The composition of the Zn—Co plating layer of the present invention is too small. If the amount of Co is too small, the effect of adding Co is not substantially exhibited, and an amorphous plating layer cannot be obtained. Therefore, no particular difference in the corrosion resistance from the Zn—Co crystalline plating layer is observed, so that it is desirable to contain 1% or more, more preferably 2% or more. On the other hand, if the amount of Co is too large, the corrosion potential of the plating layer itself becomes noble, and as a substrate, an Fe-based material such as a steel sheet or A
When an l-based material is used, the sacrificial anticorrosion effect peculiar to Zn-based plating is lost, or rather, the corrosion of the base material is promoted. Furthermore, the cost of C
Inclusion of a large amount of o is economically undesirable.
Therefore, it is preferably at most 35%, more preferably at most 30%. It is considered that the reason that the formability decreases when the content of Co increases is that the hardness of the plating layer increases with the increase of Co, cracks occur during the forming process, and the plating layer is easily peeled. Can be

【0015】本発明においてZn−Coめっきの付着量
は特に制限されるものではないが、めっき付着量が2g
/m2に満たない場合には、めっきままの状態における
耐食性が不十分である。逆に付着量が多過ぎると、成形
加工性やスポット溶接性に問題が生じる他、経済性にも
劣る。従って、2〜60g/m2の範囲から選定するこ
とが望ましく、より好ましくは5〜40g/m2であ
る。また、めっきは基材である金属板の必要な面に施せ
ばよく、片面だけに施しても良いし両面に施しても良
い。
In the present invention, the amount of Zn—Co plating is not particularly limited, but the amount of plating is 2 g.
/ M 2 , the corrosion resistance in the as-plated state is insufficient. Conversely, if the amount of adhesion is too large, problems arise in the formability and spot weldability, and the economic efficiency is poor. Therefore, it is desirable to select from the range of 2 to 60 g / m 2 , and more preferably 5 to 40 g / m 2 . The plating may be applied to the required surface of the metal plate as the base material, and may be applied to only one surface or both surfaces.

【0016】本発明に係るめっき金属板では、仕上げ塗
装を施さずにめっきのままで使用することも可能である
が、必要により耐食性,耐疵付き性,耐指紋性,加工性
等の特性の一層の向上を目的として、各種化成処理(ク
ロメート皮膜処理やりん酸塩皮膜処理,クリアー皮膜処
理等)や塗装を施してもよい。化成処理の中でも代表的
なクロメート皮膜処理としては、反応型クロメート皮膜
処理,塗布型クロメート処理,電解クロメート処理等が
あり、耐食性,耐疵付き性,耐黒変性等の特性を向上す
る上では、シリカ等の各種酸化物や有機シラン化合物、
更にはりん酸,硝酸,フッ化物,珪素フッ化物等の各種
反応促進剤をCr化合物が主成分である処理液に含有せ
しめたクロメート処理を行うことが推奨される。
In the plated metal sheet according to the present invention, it is possible to use the plated metal sheet as it is without applying a finish coating. However, if necessary, characteristics such as corrosion resistance, scratch resistance, fingerprint resistance and workability are required. For the purpose of further improvement, various chemical conversion treatments (chromate film treatment, phosphate film treatment, clear film treatment, etc.) and painting may be applied. Among the chemical conversion treatments, typical chromate film treatments include reaction-type chromate film treatment, coating-type chromate treatment, and electrolytic chromate treatment. In order to improve characteristics such as corrosion resistance, scratch resistance, and blackening resistance, Various oxides such as silica and organic silane compounds,
Further, it is recommended to perform a chromate treatment in which various reaction accelerators such as phosphoric acid, nitric acid, fluoride, silicon fluoride and the like are contained in a treatment solution containing a Cr compound as a main component.

【0017】上記化成処理のクリアー皮膜処理において
は、クリアー皮膜が有機系樹脂を主体とする場合には、
エポキシ系樹脂,ポリエステル系樹脂,ポリウレタン系
樹脂,エチレン性不飽和カルボン酸を重合成分として含
むエチレン共重合体樹脂,ポリビニル系樹脂,ポリアミ
ド系樹脂,フッ素系樹脂等の有機樹脂成分を主体とする
ものを処理液としたものが例示でき、耐食性,潤滑性,
耐疵付き性,加工性,溶接性,電着塗装性,塗膜密着性
等の品質を向上させるため、必要によりシリカ等の各種
酸化物粒子や各種りん酸塩等の無機顔料、ワックス粒
子,有機シラン化合物,ナフテン酸塩等を含有せしめた
処理液を塗布してもよい。また、上記クリアー皮膜が無
機物を主体とするものとしては、ケイ酸ソーダ,ケイ酸
カリウム,ケイ酸リチウム等のケイ酸塩を主体とする処
理液を塗布するものが例示でき、造膜性,耐食性,潤滑
性,耐疵付き性,加工性,溶接性,電着塗装性,塗膜密
着性等の品質向上を目的として、コロイダルシリカ等の
各種酸化物粒子や各種りん酸等の無機顔料、ワックス粒
子,有機シラン化合物を処理液に含有させてもよい。
In the clear film treatment of the chemical conversion treatment, when the clear film is mainly composed of an organic resin,
Mainly composed of organic resin components such as epoxy resin, polyester resin, polyurethane resin, ethylene copolymer resin containing ethylenically unsaturated carboxylic acid as a polymerization component, polyvinyl resin, polyamide resin, and fluorine resin. Is used as a treatment liquid. Corrosion resistance, lubricity,
In order to improve the quality of scratch resistance, workability, weldability, electrodeposition coating properties, coating film adhesion, etc., various kinds of oxide particles such as silica, inorganic pigments such as various phosphates, wax particles, A treatment liquid containing an organic silane compound, a naphthenate or the like may be applied. Examples of the clear film mainly composed of an inorganic substance include those in which a treatment liquid mainly composed of a silicate such as sodium silicate, potassium silicate, lithium silicate, etc. is applied. Inorganic pigments such as colloidal silica, various kinds of phosphoric acid, etc., and wax for the purpose of improving the quality of lubrication, scratch resistance, workability, weldability, electrodeposition coating properties, coating film adhesion, etc. Particles and an organic silane compound may be contained in the treatment liquid.

【0018】これらの化成処理皮膜は単独で施してもよ
く、種々組み合わせて施してもよい。上記化成処理皮膜
の好ましい付着量は、耐食性向上効果等を有効に発揮さ
せると共に経済性を考慮すれば5〜300mg/m2
範囲から選択すればよく、また無機質もしくは有機質皮
膜の好ましい付着量は、同様の理由から膜厚で0.05
〜20μmとすればよい。
These chemical conversion coatings may be applied alone or in various combinations. The preferred coating amount of the chemical conversion coating film may be selected from the range of 5 to 300 mg / m 2 in consideration of economical efficiency while effectively exhibiting the effect of improving corrosion resistance and the like, and the preferable coating amount of the inorganic or organic film is , For the same reason, 0.05
The thickness may be up to 20 μm.

【0019】次に本発明に係るZn−Coめっき金属板
の製造方法について詳述する。本発明の製造方法は、Z
nとCoの金属塩を含有する酸性めっき液を用い、電流
密度300A/dm2以上という従来の電気めっき法と
比べて非常に高い電流密度で電気めっきを行う必要があ
る。高い電流密度でめっきを行うことによりアモルファ
スめっきが得られる理由に関しては、以下の様な理由に
よるものと考えられる。すなわち、基材表面で還元され
た金属原子は、通常、マイグレーションという基材表面
における金属原子の移動過程を経て、めっき原子層のキ
ンク或いはステップに取り込まれ結晶として成長してい
く。このマイグレーション過程は、比較的遅い素過程で
あり、電流密度を大きくし金属原子の還元量(すなわち
析出量)を多くすると、マイグレーションによる結晶化
が間に合わなくなり、析出した金属原子は結晶格子を組
むことなくめっき層を形成するようになるものと推定さ
れる。
Next, a method for manufacturing a Zn—Co plated metal sheet according to the present invention will be described in detail. The production method of the present invention
It is necessary to use an acidic plating solution containing a metal salt of n and Co, and perform electroplating at a current density of 300 A / dm 2 or more, which is much higher than the conventional electroplating method. The reason why amorphous plating can be obtained by performing plating at a high current density is considered to be as follows. That is, the metal atoms reduced on the surface of the base material are usually taken in the kinks or steps of the plating atomic layer through a migration process of the metal atoms on the surface of the base material called migration, and grow as crystals. This migration process is a relatively slow elementary process. If the current density is increased and the amount of reduction (that is, the amount of precipitation) of metal atoms is increased, crystallization due to migration cannot be completed in time, and the deposited metal atoms form a crystal lattice. It is presumed that a plating layer is to be formed without forming a plating layer.

【0020】上述の通り、アモルファスめっき層を得る
ためには300A/dm2以上の電流密度が必要であ
り、500A/dm2以上とすることが好ましい。一
方、2000A/dm2を超えると、基材表面への金属
イオンの供給が間に合わなくなり、めっき外観が黒っぽ
く変色するめっきヤケ現象が生じ、商品価値が著しく損
なわれるため、2000A/dm2以下とすることが必
要であり、1800A/dm2であればより好ましい。
As described above, in order to obtain an amorphous plating layer, a current density of 300 A / dm 2 or more is necessary, and preferably 500 A / dm 2 or more. On the other hand, when it exceeds 2000A / dm 2, the supply of metal ions to the substrate surface no longer keep up, the plating burnt phenomenon coating appearance may change color blackish occur, because the commercial value is seriously impaired, and 2000A / dm 2 or less And 1800 A / dm 2 is more preferable.

【0021】まためっき液については、酸性浴(例えば
硫酸塩浴、塩化物浴)が使用可能である。ZnおよびC
oについては、硫酸塩,塩化物,酢酸塩,炭酸塩等の金
属イオンとして、所望のめっき皮膜組成となる量をめっ
き液に加えれば良い。例えば、めっき液中のZnイオン
量は10〜110g/Lで、Coイオン量は5〜110
g/L程度でアモルファスめっきを得ることができた。
また、めっき液のpHについては、電流効率およびめっ
きヤケ現象との関係からpH0.1〜2.0の範囲とす
ることが好ましい。なおめっき液には、導電性を高めて
電力消費量を低減させるため、Na2SO4,(NH4)2
4,KCL, NaCl等の導電性補助剤を添加しても
よい。
As the plating solution, an acidic bath (eg, a sulfate bath or a chloride bath) can be used. Zn and C
As for o, an amount of a metal salt such as a sulfate, a chloride, an acetate, a carbonate, or the like, which gives a desired plating film composition, may be added to the plating solution. For example, the amount of Zn ions in the plating solution is 10 to 110 g / L, and the amount of Co ions is 5 to 110 g / L.
At about g / L, amorphous plating could be obtained.
The pH of the plating solution is preferably in the range of 0.1 to 2.0 in view of the relationship between the current efficiency and the plating burn phenomenon. The plating solution contains Na 2 SO 4 , (NH 4 ) 2 S in order to increase conductivity and reduce power consumption.
A conductive auxiliary such as O 4 , KCL, and NaCl may be added.

【0022】その他のめっき条件であるめっき液温度や
相対流速については、めっきヤケ等の不良が出ない範囲
で設定すればよく、前者については30〜70℃、後者
については0.3〜5m/sについて本発明の効果が確
認された。なお、相対流速とは液の流れ方向とめっき原
板である鋼板の通板方向を考慮した液流速と通板速度の
差である。
The other plating conditions such as the plating solution temperature and the relative flow rate may be set within a range that does not cause defects such as plating burns, and the former is 30 to 70 ° C., and the latter is 0.3 to 5 m / m. The effect of the present invention was confirmed for s. Note that the relative flow velocity is a difference between the liquid flow velocity and the passing speed in consideration of the flow direction of the liquid and the passing direction of the steel plate as the plating original plate.

【0023】まためっき方法についても特に規定される
ものでは無く、常法に従ってめっき母材に脱脂や酸洗等
の前処理を施した後、縦型あるいは横型のめっきセルで
電気めっきすればよい。電気めっきの方法としても、公
知の直流(定電流)めっき法やパルスめっき法が採用で
きる。
The plating method is not particularly limited, and the plating base material may be subjected to a pretreatment such as degreasing or pickling according to a conventional method, and then subjected to electroplating in a vertical or horizontal plating cell. As the electroplating method, a known direct current (constant current) plating method or pulse plating method can be adopted.

【0024】尚、Zn−Coアモルファスめっきについ
ては、1−エチル−3−メチルイミダゾリウムクロリド
(EMIC)を電解液に用いた溶融塩電析法が知られている
[表面技術協会 第95回講演大会要旨集(p.29)]。しか
しながら、Zn−Coアモルファスめっきと耐食性との
関係については何の知見も開示されていない。しかも上
記溶融塩電析法によると40〜70%の多量のCoを含
有させないとアモルファスめっき層を得ることができな
いが、このように多量のCoを含有させると、前述した
ように優れた耐食性を得ることができない。
Incidentally, regarding Zn-Co amorphous plating, 1-ethyl-3-methylimidazolium chloride is used.
A molten salt electrodeposition method using (EMIC) as an electrolyte is known [Summary of the 95th Annual Meeting of the Surface Technology Association of Japan (p.29)]. However, no knowledge is disclosed about the relationship between Zn—Co amorphous plating and corrosion resistance. Moreover, according to the molten salt electrodeposition method, an amorphous plating layer cannot be obtained unless a large amount of 40 to 70% of Co is contained. However, when such a large amount of Co is contained, excellent corrosion resistance is obtained as described above. I can't get it.

【0025】本発明の表面処理板に用いる基材は、自動
車,家電製品,建材等の材料として用いられる各種の冷
間圧延鋼板が主に用いられる。しかしながら、用途に応
じて熱間圧延鋼板や、アルミニウム合金板,銅板等,鋼
板以外の金属板や管材,棒材,線材を選択することも可
能である。
As the base material used for the surface-treated sheet of the present invention, various cold-rolled steel sheets used as materials for automobiles, home appliances, building materials and the like are mainly used. However, it is also possible to select a metal plate other than a steel plate such as a hot-rolled steel plate, an aluminum alloy plate, a copper plate, and the like, a tube material, a bar material, and a wire material according to the application.

【0026】以下、実施例を挙げて本発明の構成および
作用効果を具体的に説明するが、これらは本発明を何等
制限するものではなく、本発明の趣旨を逸脱しない範囲
において適宜変更実施することは、全て本発明の技術的
範疇に含まれる。
Hereinafter, the structure, operation, and effects of the present invention will be described in detail with reference to examples. However, these do not limit the present invention in any way, and may be appropriately changed and implemented without departing from the spirit of the present invention. This is all included in the technical category of the present invention.

【0027】[0027]

【実施例】常法で作製したAlキルド冷延鋼板をめっき
母材として用いた。これを脱脂・酸洗後、硫酸塩浴を用
いて下記の条件で電気めっきを施した。
EXAMPLE An Al-killed cold-rolled steel sheet produced by a conventional method was used as a plating base material. This was degreased and pickled, and then electroplated using a sulfate bath under the following conditions.

【0028】 <電気めっき条件> ・めっき液組成: ZnSO4・7H2O 50〜400g/L CoSO4・7H2O 50〜400g/L Na2SO4 20〜100g/L H2SO4 10〜70g/L ・電流密度 : 100〜2500A/dm2 ・めっき浴温度: 60±5℃ ・めっき液流速: 0.5〜5m/sec ・電極(陽極): IrOx電極 ・めっき付着量: 20g/m2 得られためっき鋼板について、無塗装(めっきまま)の
耐食性をJIS Z2371塩水噴霧試験により評価し
た。塩水噴霧試験960時間(40日)経過後の赤錆発
生面積率を下記基準で判定した。また、成形加工性の判
定としてめっき面を外側にして180°密着曲げを実施
し、曲げ部にニチバンセロハンテープを付着させ引き剥
がし、テープに付着しためっき剥離片を目視観察し下記
基準にてめっき密着性を判定した。得られた結果を表1
にまとめて示す。
[0028] <Electroplating Conditions> plating solution composition: ZnSO 4 · 7H 2 O 50~400g / L CoSO 4 · 7H 2 O 50~400g / L Na 2 SO 4 20~100g / L H 2 SO 4 10~ 70 g / L ・ Current density: 100-2500 A / dm 2・ Plating bath temperature: 60 ± 5 ° C. ・ Plating solution flow rate: 0.5-5 m / sec ・ Electrode (anode): IrO x electrode ・ Plating weight: 20 g / for m 2 obtained plated steel sheet, the corrosion resistance of unpainted (as plating) was evaluated by JIS Z2371 salt spray test. The red rust generation area rate after 960 hours (40 days) of the salt spray test was determined according to the following criteria. In addition, as a determination of the formability, a 180 ° close contact bending was performed with the plating surface outside, and a Nichiban cellophane tape was attached to the bent portion and peeled off. The plating strips adhered to the tape were visually observed and plated according to the following criteria. The adhesion was determined. Table 1 shows the obtained results.
Are shown together.

【0029】<耐食性> ◎ : 0% ○ : 10%未満 △ : 10以上50%未満 × : 50%以上 <めっき密着性(成形加工性)> ○ : 剥離なし または 実用上問題ないレベル × : 剥離大<Corrosion resistance>: 0%: Less than 10% △: 10 or more and less than 50% ×: 50% or more Big

【0030】[0030]

【表1】 [Table 1]

【0031】表1から明らかなように、めっき層構造が
アモルファスである本発明例No.1〜23の場合、い
ずれも非常に優れた耐食性とめっき密着性を兼備してい
る。これに対して、めっき層にZnのη相を含有した
り、2θ:41〜45°付近のピークの半値幅が1°未
満である比較例No.24〜29の場合、明らかに耐食
性が劣っており、また一部供試材(比較例No.26,
27)については、めっき密着性についても劣っている
ことがわかる。
As is clear from Table 1, Example No. 1 of the present invention in which the plating layer structure was amorphous. In the cases of Nos. 1 to 23, all have both excellent corrosion resistance and plating adhesion. On the other hand, in the case of Comparative Example No. 1 in which the η phase of Zn is contained in the plating layer, and the half width of the peak near 2θ: 41 to 45 ° is less than 1 °. In the case of Nos. 24 to 29, the corrosion resistance was clearly inferior, and some test materials (Comparative Example Nos.
As for 27), it can be seen that the plating adhesion is also inferior.

【0032】[0032]

【発明の効果】本発明は以上の様に構成されているの
で、耐食性に優れ、且つ成形加工性および生産性につい
ても優れたZn−Coめっき金属板およびその製造方法
の提供が可能となった。特に本発明のアモルファスめっ
き金属板は、従来の表面処理金属材にない薄目付け高耐
食性を有しており、更に工業的規模の連続操業性にも優
れ、且つ安価に製造可能である。
As described above, the present invention is constructed as described above, so that it is possible to provide a Zn-Co plated metal sheet which is excellent in corrosion resistance, and is excellent in molding workability and productivity, and a method for producing the same. . In particular, the amorphous-plated metal sheet of the present invention has thinning and high corrosion resistance not found in conventional surface-treated metal materials, is excellent in continuous operability on an industrial scale, and can be manufactured at low cost.

【図面の簡単な説明】[Brief description of the drawings]

【図1】純Znめっき層のX線回折パターンを示す一例
である。
FIG. 1 is an example showing an X-ray diffraction pattern of a pure Zn plating layer.

【図2】結晶構造を有するZn−Co合金めっき層のX
線回折パターンを示す一例である。
FIG. 2 shows a X of a Zn—Co alloy plating layer having a crystal structure.
It is an example which shows a line diffraction pattern.

【図3】本発明のZn−Coめっき層のX線回折パター
ンを示す一例である。
FIG. 3 is an example showing an X-ray diffraction pattern of a Zn—Co plating layer of the present invention.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 岩井 正敏 兵庫県加古川市金沢町1番地 株式会社神 戸製鋼所加古川製鉄所内 Fターム(参考) 4K023 AB29 BA06 BA08 BA21 BA29 DA02 DA06 DA07  ──────────────────────────────────────────────────続 き Continuing from the front page (72) Inventor Masatoshi Iwai 1 Kanazawacho, Kakogawa-shi, Hyogo Prefecture Kobe Steel Works Kakogawa Works F-term (reference) 4K023 AB29 BA06 BA08 BA21 BA29 DA02 DA06 DA07

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 Zn−Co合金を主体とするめっき層が
形成されたZn−Coめっき金属板であって、Zn−C
oめっき層がアモルファスであることを特徴とする耐食
性に優れたZn−Coめっき金属板。
1. A Zn—Co plated metal plate on which a plated layer mainly composed of a Zn—Co alloy is formed.
A Zn-Co plated metal plate having excellent corrosion resistance, characterized in that the o-plated layer is amorphous.
【請求項2】 Cu−Kα線を用いて測定しためっき層
のX線回折パターンが、実質的にZnのη相に起因する
ピークを含まないと共に、2θ:41〜45°近傍に半
値幅が1°以上のピークが見られる他は実質的に基板金
属に由来するピークが認められる請求項1に記載のZn
−Coめっき金属板。
2. The X-ray diffraction pattern of the plating layer measured using Cu-Kα radiation does not substantially include a peak attributed to the η phase of Zn and has a half-value width near 2θ: 41 to 45 °. 2. The Zn according to claim 1, wherein a peak substantially derived from the substrate metal is observed except for a peak of 1 ° or more.
-Co-plated metal plate.
【請求項3】 前記Zn−Coめっき層中のCo含有量
が1〜35重量%である請求項1または2に記載のZn
−Coめっき金属板。
3. The Zn according to claim 1, wherein the Co content in the Zn—Co plating layer is 1 to 35% by weight.
-Co-plated metal plate.
【請求項4】 ZnおよびCoの金属塩を含有する酸性
めっき液を用い、300〜2000A/dm2の電流密
度で電気めっきを行うことを特徴とする電気Zn−Co
めっき金属板の製造方法。
4. An electric Zn—Co electrode, wherein an electroplating is performed at a current density of 300 to 2000 A / dm 2 using an acidic plating solution containing a metal salt of Zn and Co.
Manufacturing method of plated metal sheet.
JP23520699A 1999-08-23 1999-08-23 Zn-Co PLATED METALLIC SHEET EXCELLENT IN CORROSION RESISTANCE AND ITS PRODUCTION Withdrawn JP2001059198A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23520699A JP2001059198A (en) 1999-08-23 1999-08-23 Zn-Co PLATED METALLIC SHEET EXCELLENT IN CORROSION RESISTANCE AND ITS PRODUCTION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23520699A JP2001059198A (en) 1999-08-23 1999-08-23 Zn-Co PLATED METALLIC SHEET EXCELLENT IN CORROSION RESISTANCE AND ITS PRODUCTION

Publications (1)

Publication Number Publication Date
JP2001059198A true JP2001059198A (en) 2001-03-06

Family

ID=16982662

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2001059198A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015106643A (en) * 2013-11-29 2015-06-08 日立金属株式会社 Printed wiring board and method of manufacturing the same
US9564255B2 (en) 2013-01-30 2017-02-07 Hitachi Metals, Ltd. High-speed transmission cable conductor, and producing method thereof, and high-speed transmission cable
US9884467B2 (en) 2012-06-01 2018-02-06 Hitachi Cable, Ltd. Copper-based material and method for producing the same
US10006138B2 (en) 2013-11-29 2018-06-26 Hitachi Metals, Ltd. Copper foil and method of manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9884467B2 (en) 2012-06-01 2018-02-06 Hitachi Cable, Ltd. Copper-based material and method for producing the same
US9564255B2 (en) 2013-01-30 2017-02-07 Hitachi Metals, Ltd. High-speed transmission cable conductor, and producing method thereof, and high-speed transmission cable
JP2015106643A (en) * 2013-11-29 2015-06-08 日立金属株式会社 Printed wiring board and method of manufacturing the same
US9769933B2 (en) 2013-11-29 2017-09-19 Hitachi Metals, Ltd. Printed circuit board and method of manufacturing the same
US10006138B2 (en) 2013-11-29 2018-06-26 Hitachi Metals, Ltd. Copper foil and method of manufacturing the same

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