JP2001036175A5 - - Google Patents
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- JP2001036175A5 JP2001036175A5 JP1999206573A JP20657399A JP2001036175A5 JP 2001036175 A5 JP2001036175 A5 JP 2001036175A5 JP 1999206573 A JP1999206573 A JP 1999206573A JP 20657399 A JP20657399 A JP 20657399A JP 2001036175 A5 JP2001036175 A5 JP 2001036175A5
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- Prior art keywords
- wavelength
- reflectance
- light
- less
- laser diode
- Prior art date
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- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000737 periodic Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- NRPFNQUDKRYCNX-UHFFFAOYSA-N 4-methoxyphenylacetic acid Chemical compound COC1=CC=C(CC(O)=O)C=C1 NRPFNQUDKRYCNX-UHFFFAOYSA-N 0.000 description 1
- 101700000875 MED12 Proteins 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000003287 optical Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Description
レーザーダイオード11としては、InGaN活性層を有し、波長 450nmで発振するブロードエリア型のものが用いられている。またPr:YLF結晶14の光入射面である後方端面14aには、波長 450nmの光は80%以上の透過率で良好に透過させる一方、Pr3+の1つの発振線である波長 720nmに対して高反射率(反射率99%以上さらに好ましくは99.9%以上)で、 720nm以外のPr3+の発振線 490〜650nmおよび800nm以上に対しては低反射率(反射率60%以下さらに好ましくは30%以下)のコーティングが施されている。またPr:YLF結晶14の前方端面14bには、波長 720nmに対して低反射率(反射率0.2%以下)で、その第2高調波波長 360nmに対しては高反射率(反射率95%以上)のコーティングが施されている。一方共振器ミラー15のミラー面15aには、波長 720nmの光に対して高反射率(99%以上さらに好ましくは99.9%以上)で、波長 360nmの光を95%以上透過させ、上記 490〜650nmおよび800nm以上の光に対しては低反射率(60%以下さらに好ましくは30%以下)のコーティングが施されている。
As the laser diode 11, a broad area type laser having an InGaN active layer and oscillating at a wavelength of 450 nm is used. In addition, light of wavelength 450 nm is favorably transmitted to the rear end face 14a which is a light incident surface of Pr: YLF crystal 14 with a transmittance of 80% or more, while wavelength 720 nm which is one oscillation line of Pr 3+ High reflectivity (reflectance 99% or more, more preferably 99.9% or more), and a low reflectivity (reflectance 60% or less, more preferably) for Pr 3+ oscillation lines other than 720 nm 490 to 650 nm and 800 nm or more 30% or less) is applied. Also, the front end face 14b of the Pr: YLF crystal 14 has a low reflectance (reflectance of 0.2% or less) for a wavelength of 720 nm, and a high reflectance (reflectance of 95% or more for a second harmonic wavelength of 360 nm). Coating is applied. The mirror surface 15a of the resonator mirror 15, with high reflectance for light of wavelength 720 nm (or more preferably 99.9% or more 99%), is transmitted through the wavelength 360nm light of 95% or more, the 490~ A low reflectance (60% or less, more preferably 30% or less) coating is applied to light of 650 nm and 800 nm or more.
一方光波長変換素子の周期ドメイン反転構造には、1次の周期に限らず、3次の周期を適用してもよい。720nm発振の時の3次周期は、 4.95μmとなる。また光波長変換素子としては、周期ドメイン反転構造を有するものに限らず、B−BaBO3 、LBO、CLBO、GdYCOB、YCOB等からなるものを用いることもできる。さらに励起用レーザーダイオードとしては、ブロードエリア型のものだけでなく、MOPA、α−DFB構造を有するもの等も同様に適用可能である。
On the other hand, the periodic domain inversion structure of the optical wavelength conversion element may be applied not only to the first-order cycle but also to the third- order cycle. The third order period at the time of 720 nm oscillation is 4.95 μm. The light wavelength conversion element is not limited to one having a periodic domain inversion structure, and may be one made of B-BaBO 3 , LBO, CLBO, GdYCOB, YCOB, or the like. Furthermore, as a laser diode for excitation, not only a broad area type laser diode, but also one having a MOPA, an α-DFB structure, and the like are applicable.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20657399A JP2001036175A (en) | 1999-07-21 | 1999-07-21 | Laser-diode pumped solid-state laser |
US09/621,241 US6490309B1 (en) | 1999-07-21 | 2000-07-21 | Laser-diode-pumped laser apparatus in which Pr3+-doped laser medium is pumped with GaN-based compound laser diode |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20657399A JP2001036175A (en) | 1999-07-21 | 1999-07-21 | Laser-diode pumped solid-state laser |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007140809A Division JP2007281499A (en) | 2007-05-28 | 2007-05-28 | Laser diode-pumped solid-state laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001036175A JP2001036175A (en) | 2001-02-09 |
JP2001036175A5 true JP2001036175A5 (en) | 2005-06-09 |
Family
ID=16525652
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20657399A Pending JP2001036175A (en) | 1999-07-21 | 1999-07-21 | Laser-diode pumped solid-state laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2001036175A (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6816532B2 (en) * | 2001-05-15 | 2004-11-09 | Fuji Photo Film Co., Ltd. | Laser-diode-excited laser apparatus, fiber laser apparatus, and fiber laser amplifier in which laser medium doped with one of ho3+, sm3+, eu3+, dy3+, er3+, and tb3+is excited with gan-based compound laser diode |
JP2006282447A (en) | 2005-03-31 | 2006-10-19 | Fuji Photo Film Co Ltd | Translucent material and method for manufacturing the same |
JP2007115877A (en) * | 2005-10-20 | 2007-05-10 | Fujifilm Corp | Solid laser device |
JP2010026027A (en) * | 2008-07-16 | 2010-02-04 | Central Glass Co Ltd | Ultraviolet laser device |
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1999
- 1999-07-21 JP JP20657399A patent/JP2001036175A/en active Pending
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