JP2001003167A - Method for measuring resistance value of metallic vapor deposition film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method for measuring each of resistance value of the surface and back face in a both side vapor deposition film without forming non-vapor deposited parts in an online system with the improved precision at the time of measuring the resistance value of the film. SOLUTION: This is a method for measuring the resistance value of a metallic vapor deposition film in which the film resistance value R of a metallic vapor deposition film is measured, where the film is obtd. by laminating a conductor metallic layer 7 on a belt like film 4 to be vapor-deposited by vapor- depositing a conductor metal on one side of the film 4 to be vapor-deposited running so as to be supplied from a raw sheet film roll 1 toward a take-up roll 9 in the process of its running, in which, by eddy current type coil sensors 5 and 8, the eddy current generated on the conductor metallic layer 7 is measured and is transformed into voltage V, and by the voltage V, the resistance value R of the metallic vapor deposition film is measured by the following approximate expression: R=a/V2+b/V+c [where (a), (b) and (c) are constants].

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of measuring the resistance of a metal-deposited film, and more particularly, to the method of measuring the resistance of a running metal-deposited film by using an eddy current coil sensor and an approximate expression. It relates to a method for measuring R.

[0002]

2. Description of the Related Art As a method of laminating a metal or a metal oxide on a deposition substrate such as a plastic film or a glass sheet, a vacuum deposition method of depositing a metal or the like under a vacuum on a deposition substrate is widely used. I have. Various vapor deposition products for decoration, electric use, etc. are manufactured by this vacuum vapor deposition method.

A typical example of a vapor-deposited product is a metal vapor-deposited film for a capacitor (hereinafter, simply referred to as "metal-deposited film"). After preparing a metal deposited film using a vacuum deposition method, it may be necessary to measure the resistance value of the metal deposited film, but offline, that is,
Various methods have already been established for measuring the resistance value of the metal-evaporated film after the film has been stationary while the film is stationary.

Usually, such a film is unwound from a raw film roll, metal is vapor-deposited on the way, and is produced while being wound up by a take-up roll. As a method of measuring the resistance value of the film during production (that is, during running), a method such as a light transmission method (including a laser transmission method) and an eddy current method have been devised and put into practical use, and a general capacitor is used. Is widely used in metal vapor deposition film manufacturing equipment.

Here, an eddy current coil sensor used in the eddy current method will be briefly described. As shown in FIG. 5, when an alternating current is supplied i ₁ to the coil, it is an alternating magnetic field. When there is a metal thin film at the end of the coil through which the current i ₁ flows, the eddy current i ₂
Occurs. The generated current is inversely proportional to the resistance value R according to Ohm's law. Further, the by eddy current i ₂ magnetic field is generated in a direction to prevent the original magnetic field, the current i ₁ of the coil changes. The eddy current coil sensor converts a change in the current of the coil into a voltage V and outputs the voltage.

[0006]

However, when measuring the resistance value of a metal-deposited film using the eddy current method, conventionally, in the conversion from the voltage of the eddy current method to the resistance value, the following is theoretically required. The relationship of (Equation 1) holds, but does not hold for a metal-deposited film in which a metal or the like is deposited on a plastic film by a vacuum deposition method. That is, when the following (Equation 1) is directly applied to a metal deposition film, there is a problem that an error is large; (Equation 1) R = a / V (where R is a resistance value, and V is an eddy current coil sensor. Output voltage from a is a constant)

[0007] In the case of a single-sided vapor deposition film in which metal or the like is vapor-deposited only on one side of the metal vapor deposition film, the resistance value of the metal vapor deposition film can be measured easily and inexpensively by the light transmission method or the eddy current method. it can. However, in the case of a double-sided vapor-deposited film in which a metal or the like is vapor-deposited on both sides of a metal-deposited film, it is impossible to simultaneously measure the resistance value of each of the front surface and the rear surface during running.

Therefore, when measuring the resistance value of the front or back surface of the double-sided vapor-deposited film, a non-vapor-deposited portion where metal or the like is not vapor-deposited on a part of one side of the double-sided vapor-deposited film is set.
A light transmission method or an eddy current measurement method is applied to the non-evaporated portion. However, in this case, since it is necessary to set a non-evaporated portion, a loss portion occurs in the film, and productivity is deteriorated due to a decrease in product yield.

[0009] Furthermore, recently, since a method of using a vapor deposition film without a non-vapor deposition portion on both sides instead of an aluminum foil is expanding, vapor deposition films having no vapor deposition portion during vapor deposition are increasing. When measuring the resistance value of a vapor-deposited film having no such non-vapor-deposited portion using the eddy current method, it is necessary to set the non-vapor-deposited portion separately, so that the loss amount becomes large.

A method of directly measuring the resistance value of a double-sided deposited film by a light transmission method without forming a non-deposited portion is also conceivable. However, even a single-sided deposited film has a light transmittance of about 0.1.
Since it is only 3%, the light transmittance of the double-sided evaporated film is about 0.0003%, which is not practical.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to improve the accuracy in measuring the resistance value of a film and to form an on-line method without forming a non-deposited portion. It is an object of the present invention to provide a method for measuring the respective resistance values of the front and back surfaces of a double-sided evaporated film.

[0012]

According to the present invention, there is provided a method for measuring a resistance value of a metal-deposited film according to the present invention, which comprises a belt-like film which is fed from a raw film roll 1 toward a take-up roll 9 and travels. Measurement of the resistance R of the metal-deposited film in which the conductive metal is deposited on one surface of the film-deposited film 4 to measure the film resistance R of the metal-deposited film obtained by laminating the conductive metal layer 7 on the film-deposited film 4 during running. A eddy current generated in the conductive metal layer 7 by the eddy current type coil sensors 5 and 8 and converted into a voltage V,
The resistance value R of the metallized film is approximated by the voltage
= A / V ² + b / V + c (where a, b and c are constants). ).

Another gold according to the present invention that solves the above-mentioned problems.
The method for measuring the resistance of metallized films is
Roll 1 to take-up roll 9
Conductive metal is deposited on both sides of the strip-shaped film 4 to be deposited.
Thus, the conductor metal layers 7 are formed on both surfaces of the film 4 to be deposited.
Resistance R on the back surface of a metallized film on which_TwoTraveling
This is a method for measuring the resistance value of a metallized film measured during
After depositing a conductive metal on the surface of the film 4
In addition, the eddy current type coil sensor 5 causes the conductor on the surface side
The eddy current generated in the metal layer 7 is measured and the voltage V₁Conversion to
And the voltage V₁The resistance R of the surface of the metallized film₁
To the approximate expression (R₁= A / V₁ ^Two+ B / V₁+ C, where a,
b and c are constants)
After depositing a conductive metal on the back surface of the film 4,
With the coil sensor 8, the conductor metal layers 7 on both sides are emitted.
Measure the generated eddy current and measure the voltage V_{1 + 2}To the voltage V_{1 + 2}
The composite resistance value R on both sides of the metallized film_{1 + 2}Approximate
The formula (R_{1+ Two}= A / (V_{1 + 2})^Two+ B / V_{1 + 2}+ C, where
a, b and c are constants)
And surface resistance R₁And double-sided combined resistance value R_{1 + 2}From the back
Surface resistance R_TwoBy the formula (R_Two= (R_{1 + 2}-R₁) / (R_{1 + 2}・
R₁)).

[0014]

DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to embodiments and drawings. Using a semi-continuous vacuum evaporation apparatus as shown in FIG. 1, a polyethylene terephthalate film 4 (thickness 4 μm, width 500 mm, length 3000)
0 m, hereinafter simply referred to as “film”). First, aluminum is vapor-deposited on the surface of the film 4 fed from the film roll 1 from the vapor deposition source 3a along the outer periphery of the cooling roller can 2, and thus the conductive metal layer is formed on the surface of the film 4. 7a are stacked. The thickness of the conductive metal layer 7a is about 30
nm, the temperature during deposition is about 1000 ° C., and the pressure is about 1
It is about × 10 ⁻⁴ Pa.

The resistance value R _{1 of the} surface of the film 4 on which aluminum is vapor-deposited and on which the conductor metal layer 7a is laminated is measured by an eddy current coil sensor 5 disposed behind the vapor deposition source 3a. As described in paragraph number 0005, since the previous eddy current coil sensor 5 an alternating current i ₁ flows have conductive metal layer 7, the conductive metal layer 7
eddy current i ₂ which is inversely proportional to the resistance R ₁ in a occurs. Therefore eddy current i ₂ is for generating a magnetic field in a direction that prevents the original magnetic field, change the alternating current flowing in the eddy current coil sensor 5 and converts the amount of change the current into a voltage V _1.

In the present invention, when determining the resistance value R ₁ from the voltage V _1, using the following formulas; (number _{2) R 1 = a / V} 1 2 + b / V 1 + c ( where, a , B and c
Is a constant). According to this formula, the resistance value R ₁ can be made closer to the resistance value precisely obtained by off-line or the like as compared with the resistance value obtained by (Equation 1), and the measurement accuracy of the resistance value R ₁ can be improved. it can. In the present invention, the resistance value R _{1 is} determined using the eddy current coil sensor 5 as described above.
And the resistance value of the film 4 on which the conductive metal layer 7 is formed can be measured during running without forming a non-evaporated portion.

The constants a, b and c in the equation (2) vary depending on the material, density and the like of the film.
02 or more and 0 or less, b is about 0 or more and 1.0 or less, and c is about -0.1 or more and 0 or less.

The eddy current coil sensor 5 is composed of three coil sensors as shown in FIG. In the measurement of the actual resistance value, (there are variations) widthwise to the resistance value is different from the film for, and the voltages V ₁ and the average value of the obtained voltage from each of the three coils sensor.
Of course, by accurately stabilizing the film gap distance from the sensor over the entire width in the width direction, it is possible to measure the width distribution measurement by the width scanning method of one sensor.

The film 4 whose surface resistance R ₁ has been measured in this manner is then vapor-deposited with aluminum on the rear surface thereof along the outer periphery of the cooling roller can 6 by the vapor deposition source 3b in the same manner as the front surface. Conductive metal layer 7b is formed on the back surface of the substrate. The combined resistance R _{1 + 2} on both surfaces of the film 4 on which the conductor metal layer 7b is laminated by depositing aluminum on the back surface is measured by the eddy current coil sensor 8 disposed behind the deposition source 3b. . When measuring the combined resistance R _{1 + 2} of both sides, the paragraph number 0
The equation (Equation 2) described in 016 is used. The combined resistance R _{1 + 2 on} both sides of the eddy current coil sensor 8
Is measured, the film 4 is taken up by a take-up roll 9.

Further, the combined resistance value R _{1 + 2} of the resistance value R ₁ and both sides of the surface obtained as described above, the back surface of the resistance value R ₂ is calculated by the following formulas; (Equation 3) ( R ₂ = (R _{1 + 2} −R ₁ ) / (R _{1 + 2} · R ₁ )).

FIG. 3 shows the correlation between the resistance values R ₁ and R _{1 + 2} obtained from Expression ₂ , the resistance values obtained from Expression 1, and the resistance values actually obtained by the contact equation. Show. As can be understood from FIG. 3, the resistance value actually obtained by the contact method (in FIG. 3, white circles and “raw data”) and Equation 2
Was at most 0.25 Ω / cm ² . The variation in the resistance value actually obtained by the contact method was ± 0.25Ω / cm ² . On the other hand, the resistance value actually obtained by the contact method and
Was as large as 0.75 Ω / cm ² at a large value.

When the resistance value is measured using an eddy current coil sensor as in the present invention, if the base film is sufficiently thin, the measured value of the total vapor deposition thickness on the front and back surfaces is obtained. It was found that there was no significant difference between the measured value and the measured value of single-sided deposition having a thickness corresponding thereto. Further, it was found that sufficient accuracy could be obtained if the film thickness was within 50 μm.

Needless to say, the numerical values such as the thickness and width of the film 4 are merely examples. Further, in the above description, vapor deposition was performed on the front surface and then on the rear surface.
The term "backside" is intended to facilitate explanation,
The back surface may be deposited first, and then the front surface may be deposited later.

[0024]

As described above, according to the present invention, there is provided a method for producing a metal-deposited film by laminating a conductive metal layer 7 on both sides of a film 4 which is fed from a raw film roll 1 and travels by a vacuum deposition method. In addition, it is possible to easily measure the resistance value of the front and back surfaces of the running metal-deposited film 4 and the combined resistance value of the front surface and the back surface without forming a non-deposited portion, so that the deposited film thickness resistance can be measured. . As a result, the management of the resistance value, the control level can be improved, and the non-evaporated portion is not discarded.
The loss can be reduced, and the productivity of the metal-deposited film can be significantly improved. The present invention has a remarkable effect on the measurement of the resistance value of a film for a capacitor, but is also suitable for measuring the resistance value of a product requiring a vapor deposition film such as a decorative material, a packaging material, and a filter.

[Brief description of the drawings]

FIG. 1 is an internal front view of an apparatus for manufacturing a capacitor film by vacuum evaporation.

FIG. 2 is a sectional view of a metal-deposited film.

FIG. 3 is a correlation diagram between a resistance value R and a voltage V;

FIG. 4 is a layout diagram of the eddy current coil sensor 5.

FIG. 5 is an explanatory diagram showing a concept of measurement by an eddy current coil sensor.

[Explanation of symbols]

REFERENCE SIGNS LIST 1 raw film roll 2 cooling roller can (surface evaporation) 3 evaporation source (surface evaporation) 4 film to be evaporated (polyethylene terephthalate film) 5 eddy current coil sensor (surface resistance measurement) 6 cooling roller can (back surface evaporation) 7 Deposited metal layer 8 Eddy current coil sensor (both sides combined resistance measurement) 9 Take-up roll

Continuing on the front page (72) Inventor Michiyasu Moriwaki 1006 Kazuma Kadoma, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (72) Inventor Shinichi Kato 1006 Okadoma Kadoma Kadoma City, Osaka Matsushita Electric Industrial Co. ) Inventor Mikio Ishida 1006 Kazuma Kadoma, Kadoma City, Osaka Prefecture F-term in Matsushita Electric Industrial Co., Ltd. (reference) AA11 AA25 BA03 BB04 BD00 EA00

Claims (2)

[Claims] The present invention is characterized in that a conductive metal is vapor-deposited on one surface of a strip-shaped deposition film (4) which is fed from a raw film roll (1) toward a take-up roll (9) and runs, thereby forming the deposition film. (4) A method for measuring the resistance value of a metal-deposited film, wherein the film resistance value R of the metal-deposited film having a conductive metal layer (7) laminated thereon is measured during the traveling, wherein the eddy-current coil sensor (5; 8), the eddy current generated in the conductive metal layer (7) is measured and converted into a voltage V, and the resistance value R of the metal-deposited film is calculated by the voltage V.
Is measured according to the following approximate formula: R = a / V ² + b / V + c (where a, b and c are constants). 2. A film to be deposited by depositing a conductive metal on both sides of a strip-shaped film to be deposited (4) which is fed from a raw film roll (1) toward a take-up roll (9) and runs. The resistance value R ₂ of the back surface of the metal deposition film in which the conductor metal layer (7) is laminated on both surfaces of (4).
Is a method of measuring the resistance value of a metal-deposited film during the traveling, wherein a conductive metal is deposited on the surface of the film-to-be-deposited (4), and then the eddy-current coil sensor (5) is used to measure the resistance of the surface. the conductive metal layer eddy current generated in the (7) was converted to voltages V ₁ and measuring, approximating the resistance value R ₁ of the surface of the metallized film by the voltages V ₁ formula (R ₁ = a / V ₁ ² + b / V
₁ + c, where a, b, and c are constants). A conductive metal is also deposited on the back surface of the film to be deposited (4), and then both sides are detected by an eddy current coil sensor (8). The eddy current generated in the conductive metal layer (7) is measured and the voltage V
_{1 + 2} , and the combined resistance value R _{1 + 2} of both sides of the metal-deposited film is approximated by the voltage V _{1 + 2} (R _{1 + 2} = a / (V
_{1 + 2} ) ² + b / V _{1 + 2} + c, where a, b and c are constants), and from the surface resistance R ₁ and the double-sided combined resistance R _{1 + 2.} , Back surface resistance R ₂
From the formula (R ₂ = (R _{1 + 2} −R ₁ ) / (R _{1 + 2} · R ₁ )).