JP2000356852A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2000356852A5 JP2000356852A5 JP2000019857A JP2000019857A JP2000356852A5 JP 2000356852 A5 JP2000356852 A5 JP 2000356852A5 JP 2000019857 A JP2000019857 A JP 2000019857A JP 2000019857 A JP2000019857 A JP 2000019857A JP 2000356852 A5 JP2000356852 A5 JP 2000356852A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000019857A JP4108243B2 (en) | 1999-04-14 | 2000-01-28 | Photosensitive resin laminate |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10720099 | 1999-04-14 | ||
| JP11-107200 | 1999-04-14 | ||
| JP2000019857A JP4108243B2 (en) | 1999-04-14 | 2000-01-28 | Photosensitive resin laminate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000356852A JP2000356852A (en) | 2000-12-26 |
| JP2000356852A5 true JP2000356852A5 (en) | 2007-02-08 |
| JP4108243B2 JP4108243B2 (en) | 2008-06-25 |
Family
ID=26447250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000019857A Expired - Lifetime JP4108243B2 (en) | 1999-04-14 | 2000-01-28 | Photosensitive resin laminate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4108243B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003057821A (en) * | 2001-08-13 | 2003-02-28 | Showa Highpolymer Co Ltd | Photosensitive resin and photosensitive resin composition |
| CN1273867C (en) * | 2001-11-12 | 2006-09-06 | 旭化成电子材料元件株式会社 | Photosensitive resin composition and applications thereof |
| KR100521999B1 (en) * | 2002-09-03 | 2005-10-18 | 주식회사 코오롱 | Photopolymerizable Resin Composition For Sandblast Resist |
| JP2005031639A (en) * | 2003-06-16 | 2005-02-03 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element using the same, method for fabricating resist pattern, method for manufacturing printed wiring board, printed wiring board and electronic component using the same |
| JP4632117B2 (en) * | 2004-07-27 | 2011-02-16 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive element using the same, resist pattern manufacturing method, and printed wiring board manufacturing method |
| US20240111211A1 (en) | 2019-10-16 | 2024-04-04 | Showa Denko Materials Co., Ltd. | Photosensitive resin film, resist pattern forming method, and wiring pattern forming method |
| WO2022201432A1 (en) | 2021-03-25 | 2022-09-29 | 昭和電工マテリアルズ株式会社 | Photosensitive resin film, resist pattern forming method, and method for forming wiring pattern |
-
2000
- 2000-01-28 JP JP2000019857A patent/JP4108243B2/en not_active Expired - Lifetime