JP2000356823A - Photosensitive material pressing guide - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a rise prevention mechanism constituted so that a photosensitive material is prevented from rising when it is exposed by a line exposure mechanism and the interference thereof with an emulsion surface is reduced as much as possible. SOLUTION: This photosensitive material pressing guide 5 is constituted of a guide A and a guide B. Besides, two projected lines 51 and 52 are formed at the surface where the guide A is brought into contact with the photosensitive material and two projected lines 53 and 54 are formed at the surface where the guide B is brought into contact with the photosensitive material. Then, an inclined surface 55 is formed at the upstream side of the guide A and a recessed part 56 is formed between two projected lines 51 and 52. For the guide B as well. a recessed part 57 is also formed between two projected lines 53 and 54. Besides, a slit 58 is formed between two guides A and B.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a technique for preventing a photosensitive material from floating during exposure in an exposure apparatus having a line exposure mechanism.

[0002]

2. Description of the Related Art In a conventional analog type exposure apparatus, in order to prevent floating of a photosensitive material, exposure is performed while holding the photosensitive material in a stationary state by lifting the photosensitive material by a pressing mechanism such as a paper mask. Was configured as follows. However, with recent advances in digital photographic processing technology, a configuration has been developed in which line exposure is performed on a photosensitive material using a line exposure mechanism controlled by digital technology. In the case of a line exposure mechanism, it is naturally necessary to perform line exposure while relatively moving the photosensitive material and the exposure unit. Generally, a configuration is employed in which a two-dimensional image is exposed by performing line exposure while moving a photosensitive material. Since the PLZT exposure unit constituting the line exposure mechanism has a small depth of focus, if the photosensitive material floats without being held at a predetermined position, the quality of an image is degraded. Therefore, a holding mechanism is required to hold the photosensitive material at a predetermined position and prevent the photosensitive material from floating during exposure.

[0003]

However, unlike the conventional analog system, a pressing mechanism such as a paper mask cannot be employed because the photosensitive material is not stopped. If exposure is performed while the photosensitive material is forcibly pressed by a flat pressing mechanism, there is a problem that the emulsion surface is scratched, or a transfer resistance is generated, resulting in uneven transfer. Further, in an environment with high humidity, there is a problem that the pressing mechanism and the emulsion surface of the photosensitive material come into close contact with each other and cause paper jam. Further, there is a problem that as the contact area between the pressing mechanism and the photosensitive material increases, the risk of scratching increases.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a lifting-prevention mechanism that prevents lifting of a photosensitive material during exposure by a line exposure mechanism and minimizes interference of the photosensitive material with an emulsion surface. is there.

[0005]

According to the first aspect of the present invention, there is provided a photosensitive material pressing guide provided to prevent floating of a photosensitive material conveyed on an exposure plate provided in a line exposure mechanism. A photosensitive material press guide configured to guide the photosensitive material between the exposure plate and a slit that allows exposure light emitted from a line exposure mechanism to pass therethrough. On the surface where the guide is in contact with the photosensitive material, a ridge perpendicular to the conveying direction of the photosensitive material is formed.

According to a second aspect of the present invention, at least one ridge is formed on the upstream side and the downstream side of the slit. According to a third aspect of the present invention, an inclined surface for guiding the leading edge of the conveyed photosensitive material between the guide and the exposure plate is formed upstream of the guide.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, a photosensitive material pressing guide according to the present invention will be described in detail with reference to the drawings showing an embodiment thereof.

FIG. 1 is a block diagram of an exposure apparatus having a photosensitive material pressing guide according to the present invention. In FIG. 1, reference numeral 1 denotes an exposure device, and a plurality of driving rollers 21, 21,..., Which are rotationally driven via a driving motor, and elastically press against the conveying surface of the driving rollers to rotate. And a plurality of driven rollers 22, 22,... Made of an elastic body, and provided with a transport mechanism 2 configured to transport the photographic paper P of the photosensitive material.

In the middle of the transport mechanism 2, there are cut portions 4, 4 for cutting photographic paper selectively supplied from the two paper magazines 3, 3 to a predetermined length, and a cutting portion 4, 4 provided from any of the paper magazines. A transfer section 5 having a sorting function for transferring the cut and cut photographic paper to an exposure section described later; a line exposure section 6 having a PLZT head 61 for performing line exposure on the transported photographic paper; And a printing mechanism 7 for printing data such as frame numbers and exposure conditions on the back surface of the photographic paper after the line exposure. The exposed photographic paper discharged from the exposure device 1 is configured to be sequentially transported to a developing unit (not shown), developed, and discharged after drying.

The transfer section 5 includes a chuck 51 configured to hold the cut photographic paper P, transport it to the exposure section 6 and open it. The chuck 51 is reciprocally driven in the transfer section 5 and is also driven in the width direction of the transport path by a left and right driving mechanism (not shown) constituting a distribution mechanism.

FIG. 2 is an enlarged view of a main part of the line exposure section 6. As shown in FIG. In FIG. 2, reference numeral 61 denotes a PLZT exposure unit, and exposure light is radiated from a radiating section 62 at the tip thereof. 5
Reference numeral denotes a photosensitive material holding guide, which comprises an upstream guide A and a downstream guide B. These guides may be integral or separate. 50 is an exposure plate,
The photosensitive material P is disposed between the photosensitive material pressing guide 5 and the photosensitive material holding guide 5. Reference numeral 63 denotes a driving roller for conveying the photosensitive material P with high accuracy, and reference numeral 64 denotes a driven roller thereof.

FIG. 3 is a detailed side sectional view of the photosensitive material pressing guide 5. As shown in FIG. In FIG. 3, two projections 51 and 52 are formed on the surface where the guide A contacts the photosensitive material.
The surface where the guide B comes into contact with the photosensitive material has two ridges 53,
54 are formed. An inclined surface 55 is formed on the upstream side of the guide A so as to gradually open from the ridge 51 toward the upstream side. A recess 56 is formed between the two ridges 51 and 52, and the recess 56 and the ridge 52 are connected by a smooth slope. Also in the guide B, the two ridges 5
A concave portion 57 is formed between 3 and 54, and the concave portion 57 and the ridge 54 are connected by a smooth slope.
A slit 58 is provided between the two guides A and B as described above.
Are formed.

Since the photosensitive material pressing guide 5 is configured as described above, even if the leading edge of the transported photosensitive material P is slightly lifted and transported to the photosensitive material retaining guide 5, the inclined surface 55 is used. Exposure plate 50
Guided to the gap between. Further, since the photosensitive material P is held down by a small contact area by the ridges 52 and 53 formed before and after the slit 58 irradiated with the exposure light, the photosensitive material P is hardly damaged and does not float. Conveyed. Further, since the inclined surface is also formed in the guide B on the downstream side of the slit 58, the photosensitive material P passing through the slit 58 is surely guided to the gap between the photosensitive material P and the exposure plate 50. The corners of each ridge are all smoothly rounded.

The upstream side of the slit 58 is prevented from floating by two convex ridges 51 and 52 formed on the guide A, and the downstream side is two convex ridges 53 and 5 formed on the guide B.
Since the lifting is prevented by 4, even if the driven roller 64 comes into close contact with or separates from the driving roller 63, adverse effects on exposure are prevented. Also,
A recess 56 is formed between the two ridges 51 and 52 of the guide A, and a recess 57 is formed between the two ridges 53 and 54 of the guide B. The surface is prevented from sticking to the guide. In addition, since these two ridges can be arranged at a predetermined distance by the concave portion formed therebetween, even if the photosensitive material P is curled, even if the photosensitive material P is curled, P
Is stably held. In this manner, the lifting of the photosensitive material P is prevented by the four ridges.
Since the position of the photosensitive material P can be kept within a predetermined depth of focus, an image of excellent quality can be obtained.

If the gap between the photosensitive material pressing guide 5 and the exposure plate 50 is set to a gap obtained by adding a thickness of about 0.03 mm to the thickness of the photosensitive material P, it is possible to effectively prevent both lifting and scratching. be able to.

The cross-sectional shape of the light-sensitive material pressing guide is not limited to the illustrated shape, but may be any shape provided that the light-sensitive material is formed with a ridge in order to reduce the contact area with the emulsion surface of the photographic material. The number and shape are not limited.

[0017]

As described above, according to the photosensitive material pressing guide of the present invention, the ridge is formed so as to reduce the contact area with the emulsion surface of the photosensitive material. It does not damage the emulsion side of the material and prevents sticking to the emulsion side of the photosensitive material. Therefore, a high-quality image can be stably obtained. According to claim 2, since at least one ridge is formed on the upstream side and the downstream side of the slit,
Further, the lifting of the photosensitive material can be reliably prevented. According to the third aspect, since the inclined surface is formed on the upstream side of the guide, even if the leading edge of the conveyed photosensitive material is slightly raised, it is surely guided between the guide and the exposure plate. be able to.

[Brief description of the drawings]

FIG. 1 is a configuration diagram of an exposure apparatus having a configuration of a photosensitive material pressing guide according to an embodiment of the present invention.

FIG. 2 is a side view of a main part of the exposure apparatus.

FIG. 3 is a side sectional view of the photosensitive material pressing guide.

[Explanation of symbols]

 Reference Signs List A Upstream guide B Downstream guide P Photosensitive material 5 Photosensitive material pressing guide 50 Exposure plate 51 Convex ridge 51 Convex ridge 51 Convex ridge 51 Convex ridge 55 Inclined surface 56 Depression 57 Recess 58 Slit 6 Line exposure unit 61 PLZT exposure unit

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H012 AA11 2H106 AB45 AB97 BA11 2H108 AA00 3F101 FA01 FB17 FC05 FC07 FE01 FE22 LA01 LB08

Claims (3)

[Claims] 1. A photosensitive device arranged to prevent floating of a photosensitive material conveyed on an exposure plate provided in a line exposure mechanism and configured to guide the photosensitive material between the photosensitive plate and the exposure plate. A material holding guide, which has a slit formed therein for allowing exposure light emitted from the line exposure mechanism to pass therethrough, and has a surface perpendicular to the conveying direction of the photosensitive material on a surface where the guide contacts the photosensitive material. A photosensitive material pressing guide, wherein a ridge is formed. 2. The photosensitive material pressing guide according to claim 1, wherein at least one ridge is formed on the upstream side and the downstream side of the slit. 3. An inclined surface for guiding the leading edge of the conveyed photosensitive material between the guide and the exposure plate is formed upstream of the guide.
3. The photosensitive material pressing guide according to any one of 2.