JP2000356812A - Exposure head cleaning device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a uniform cleaning effect and to reduce working burden imposed on an operator by providing a moving mechanism moving a cleaning mechanism for cleaning an exposure surface along the exposure surface. SOLUTION: This device is equipped with a cleaning unit C for cleaning the Selfoc(R) lens array(exposure surface) of an exposure head 8. The unit C is equipped with a base member 50 connected to a moving unit 24, a brush supporting base 51 pivotally supported to rotate around a rotary shaft 51a in the member 50, a brush 53 attached to the down-side of the base 51, a switching member 52 fixed on the side of the base 51, a tension spring 54 for energizing the brush 53 to either a cleaning action position or a retreat position, and 1st and 2nd stoppers 55 and 56 attached to the member 50. Then, the head 8 is cleaned whenever the calibration work of the head 8 is performed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exposure head cleaning device for cleaning an exposure head.

[0002]

2. Description of the Related Art In such an exposure head, a large number of elements are arranged in rows as an exposure surface, and the amount of light output from each element is changed in accordance with image data to form an image on a photosensitive material. Can be formed by exposure.
As a typical example of such an exposure head, there is a type using a PLZT shutter array. Irradiation light from a light source is divided by an optical fiber in accordance with the number of pixels, and a PLZT shutter array is provided at an output end of the optical fiber. An imaging Selfoc lens array (this corresponds to the above-described element) is provided.

[0003] Then, while the exposure head is used for a long time, dust and dirt adhere to the surface of the element array (the light output surface of the SELFOC lens array, which corresponds to the exposure surface). If such dust or dirt is present, a desired image is not formed on the photosensitive material by light exposure, which causes deterioration in print quality. Therefore, it is necessary to periodically clean the surface of the element row of the exposure head.

[0004] This cleaning operation is performed by a serviceman or an operator. The cleaning operation is performed manually using a cleaning member such as cleaning paper, or by using a cleaner or the like.
After all, a serviceman or an operator directly cleans the surface of the element row of the exposure head.

[0005]

However, in a manual operation by a service person or an operator, the cleaning effect is affected by the politeness at the time of cleaning, and a uniform cleaning effect may not be obtained. In addition, the timing for performing the cleaning is not uniform due to the quality control level of the operator, and the quality of the photographic processing equipment may not be stable. Further, the manual cleaning work was very troublesome. The present invention has been made in view of the above circumstances, and its purpose is to:
An object of the present invention is to provide an exposure head cleaning device that can expect a uniform cleaning effect and can reduce the work load on an operator or the like.

[0006]

According to the present invention, there is provided an exposure head cleaning apparatus according to the present invention, wherein an exposure surface for exposing an image on a photosensitive material has a line shape along the width direction of the photosensitive material. An exposure head formed, a cleaning mechanism for moving along the exposure surface to clean the exposure surface, and a moving mechanism for moving the cleaning mechanism along the exposure surface are provided. Things.

According to this configuration, the cleaning mechanism can be moved along the exposure surface by the moving mechanism.
Then, while the cleaning mechanism is moving, the exposure surface can be cleaned. That is, there is no need for a serviceman or operator to perform manual cleaning using a cleaning member. As a result, a uniform cleaning effect can be expected, and the work load on the operator and the like can be reduced.

In a preferred embodiment of the present invention, the cleaning mechanism is configured to be capable of reciprocating along the exposure surface, setting a cleaning member at a cleaning operation position on an outward path of the reciprocating movement, There is one provided with a switching mechanism for setting the cleaning member to the cleaning non-operation position on the return path.

According to this structure, the cleaning mechanism can be reciprocated along the exposure surface, and at the same time, the cleaning of the element array is performed on the forward path of the reciprocating movement, and the cleaning is not performed on the return path. If the cleaning member is set at the cleaning action position even on the return path, dust removed by the cleaning member during the cleaning operation on the outward path may adhere to the exposure head again. By employing the above configuration, dust and the like on the exposure head can be reliably removed.

In another preferred embodiment of the present invention, the cleaning device further includes a cleaning member support on which the cleaning member is mounted and supported, wherein the switching mechanism includes a switching unit integrally formed on the cleaning member support. ,
And a cam portion acting on the switching portion provided at both ends of the reciprocating movement.

According to this configuration, the cleaning member (such as a brush) is mounted on and supported by the cleaning member support, and a switching portion is integrally formed on the cleaning member support. By switching the position of the switching unit by the cam units provided at both ends of the reciprocating movement, the cleaning member can be switched between the cleaning operation position and the cleaning non-operation position. That is, since a dedicated actuator for switching is not required, the switching mechanism can be configured with a simple configuration.

In still another preferred embodiment of the present invention,
The exposure surface has a number of elements arranged in a row, a sensor for detecting the amount of light emitted from the exposure surface, a sensor support on which the sensor is mounted, and a sensor support. A sensor guide mechanism for guiding the exposure head along the element row, wherein the cleaning mechanism is attached to the sensor support.

When an image is to be formed by light output from an exposure surface composed of a large number of element rows, when the same data (for example, data for driving a PLZT shutter array) is given to each element , The amount of light emitted from each element must be the same. But,
In the above example, even if the same image data is given due to the individual variation of the PLZT shutter array, etc.
(The light output end of the SELFOC lens) does not always have the same light emission amount. This variation in light emission appears as a variation in color development of the photosensitive material, and causes deterioration in print quality. Therefore, the exposure head is calibrated to eliminate such light emission variations.

[0014] Therefore, while moving a sensor support base on which a sensor for detecting the light emission amount of light output from a large number of elements is mounted along a large number of element rows, individual light emission output from each element is performed. The amount is detected and adjusted so that the variation in the amount of light emission is eliminated.

That is, by attaching the cleaning mechanism to the sensor support for performing the calibration, a dedicated moving mechanism for moving the cleaning mechanism becomes unnecessary. Since it can also be used as a moving mechanism for moving the sensor, there is a cost advantage. Further, since the calibration work of the exposure head is usually performed regularly, the cleaning can also be performed periodically. Further, by performing cleaning when performing the calibration work, the quality of the calibration work itself can be improved.

[0016]

Preferred embodiments of the present invention will be described with reference to the drawings. FIG. 1 schematically shows a digital exposure apparatus 4 in which an exposure head cleaning apparatus according to the present invention is used and a mechanism related thereto.

The digital exposure apparatus 4 includes a light source 10 such as a halogen lamp for exposure, a color filter 3, an optical fiber 9, and an exposure head 8. Exposure head 8
In the figure, a large number of PLZT shutter arrays are arranged in one row along the width direction of the photographic paper S (corresponding to a photosensitive material), and the optical fibers 9 have the same number of fibers (number of pixels) as the number of PLZT shutter arrays. Light source 10
Is emitted from each of the fiber bundles to the PLZT shutter array. The PLZT shutter array controls each shutter release time based on the image data, thereby exposing and forming an image on the printing paper S. The image formed by the exposure head 8 corresponds to one row. Actually, a two-dimensional image is formed by sequentially exposing one row at a time while transporting the printing paper S. A color filter 3 is provided to form a color image. The color image can be exposed on the photographic paper S by sequentially switching to each of the R, G, and B filters. Although not shown in FIG. 1, the PLZT shutter array is located at a position facing the emulsion surface of the photographic paper S, and a SELFOC lens array is further provided on the front surface of the PLZT shutter array. A sharp image is formed on the emulsion surface.

In FIG. 1, photographic paper S is transported in the direction of arrow A by transport roller mechanisms 1 and 2. Exposure head 8
Is completed, a predetermined processing is performed in a developing processing unit and a drying processing unit (not shown), the paper is cut into a predetermined size by a cutter, and then discharged outside the apparatus.

The controller 12 controls each section of the apparatus. The controller 12 controls the color filter control section 13, the drive power supply section 14, the image data output control section 15, and the photographic paper transport control section 16. I have. Color filter control unit 13
Controls the drive of the filter drive motor 6. The drive power supply unit 14 supplies power to the exposure head 8. The image data output control section 15 outputs image data to be exposed on the photographic paper S to the exposure head 8, and mainly controls the driving of the PLZT shutter array. The photographic paper transport control unit 16 controls the drive of the roller drive motor 5 and transports the photographic paper 3.

<Details of Digital Exposure Apparatus> Next, details of a mechanism and the like relating to an exposure head calibration apparatus of the digital exposure apparatus 4 will be described. 2 is a plan view of the exposure head 8 of the digital exposure apparatus 4 as viewed from the front, FIG. 3 is a view P (side view part 1) of FIG. 2, and FIG. 4 is a view of FIG. Q (side view part 2).

In FIG. 2, a head main body 20 on which the exposure head 8 is mounted and supported, a guide mounting base 21 located on a side surface of the head main body 20, and a head mounted and fixed to the guide mounting base 21 are fixed. Moving rail 22 and ball screw 2
2, a moving unit 24 (corresponding to a sensor support) driven in the direction of arrow B in FIG. 2 by the ball screw 23, a first side plate 25 provided to sandwich both sides of the head body 20, and a first side plate 25. And two side plates 26. Although not shown in FIGS. 2, 3, and 4, the light source 10, the color filter 3, the filter driving motor 6, and the optical fiber 9 are provided inside the head main body 20.

As described above, the exposure head 8 includes a selfoc lens array 8 that can approach the printing paper S.
a is provided. This Selfoc lens array 8
A PLZT shutter array is provided on the back side of a.
A heat insulating member 47 made of, for example, aluminum foil is attached to the outer peripheral surface of the exposure head 8. As will be described later, the linear motion rail 22 forms a linear motion system (corresponding to a sensor guide mechanism) with the moving block 44 and the ball 45 (see FIG. 7 and the like). That is, the moving unit 24 is reciprocated in the direction of arrow B by the ball screw 23, and at this time, the moving unit 24 is smoothly guided by the linear motion system. In addition, the sensor guide mechanism by the linear motion system
It has enough strength.

The moving unit 24 includes an optical sensor 48
(See FIG. 3), and detects the amount of light emitted from each SELFOC lens array 8a of the exposure head 8 when the moving unit 24 moves along the linear motion rail 22. The moving unit 24 includes the exposure head 8
The slit 30 is formed at a position facing the lens 30, and the light sensor 48 detects light passing through the slit 30.
The optical sensor 48 is connected to the moving unit 24 by an appropriate method.
Mounted against. As shown in FIG. 3, the light received by the optical sensor 48 is detected as a light emission amount by a light emission amount detection unit 61, and the controller 12 determines the light emission amount of each Selfoc lens array (each pixel portion) and the light emission balance of each color. The light emission correction amount data is transmitted to the image data output control unit 15 in order to adjust the shutter release time or the like so as to be appropriate. That is, the mobile unit 24
, Slit 30, optical sensor 48, light emission amount detection unit 61, controller 12, and image data output control unit 1.
5 functions as an exposure head calibrating device.

A first mounting reference block 27 and a second mounting reference block 28 are provided at both left and right ends of the head main body 20.
It is fixed to the head body 20 by screws.
The guide mounting base 21 is integrally formed with a first mounting reference surface 21a and a second mounting reference surface 21b, which are close to the first mounting reference block 27 and the second mounting reference block 28, respectively. It is formed so that it may be located at a different position. As will be described later, the first mounting reference block 27 and the first mounting surface of the guide mounting base 21 are mounted on a mounting reference surface 25a (see FIG. 3 and the like) formed integrally with the first side plate 25. The reference surface 21a is applied and positioned. The same applies to the second side plate 26.
As described above, after the application is performed, the first side plate 25
The head body 20 and the guide mount 21 are fixed to the second side plate 26 by screws (not shown).

As understood from the side view of FIG. 3, the linear motion rail 22 has a shape extending in the longitudinal direction between the first side plate 25 and the second side plate 26, and guides a plurality of places by screws 43. The fixed mounting is performed on the mounting base 21. Both ends of the ball screw 23 are formed by bearing members (not shown).
It is supported by the first side plate 25 and the second side plate 26. The ball screw 23 is connected to a moving unit 24 via a moving body 29 integrally provided with a ball nut (not shown). A sprocket 3 is provided at one end of the ball screw 23.
The ball screw 23 can be rotated by connecting the sprocket 32 to a sprocket 33 connected to the motor shaft of the moving unit drive motor 31 by a belt mechanism 34. Of course, the rotation drive mechanism of the ball screw 23 is not limited to this, and a drive mechanism using a gear train may be employed.

FIG. 4 is a view taken in the direction of arrow Q in FIG. 2, and corresponds to a side view opposite to FIG. A temperature control mechanism of the exposure head 8 is mainly incorporated in the side surface portion. This temperature control mechanism is performed so that the color development state on the photographic paper S becomes appropriate, and performs temperature control with an accuracy of ± 1 ° C. As described in FIG. 2, the heat insulating member 47 is provided so as to cover the outer peripheral surface of the head main body 20. Also, a temperature sensor 35 for measuring the temperature of the exposure head 8
A surface heater 36 for heating the entire exposure head 8 to a predetermined temperature; a cooling water storage portion 37 for cooling the entire exposure head 8 to a predetermined temperature; A pipe 38 connected to one end in the direction, a heat exchange chamber 39 provided at the end of the pipe 38 opposite to the side connected to the cooling water storage portion 37, and a heat exchange chamber 39 disposed adjacent to the heat exchange chamber 39. The Peltier device 40, a heat sink 41 disposed adjacent to the Peltier device 40, and a pair of cooling fans 42 disposed above and below the heat sink 41.

As the temperature sensor 35, for example, a thermistor, which is a semiconductor element, is preferably selected. The temperature control mechanism will be briefly described below. Temperature sensor 3
The temperature data (analog signal) detected by 5 is converted into digital data by the A / D converter in the temperature detector 59 and sent to the comparison / determination unit 60. Comparison judgment section 6
In the case of 0, the controller compares the preset temperature data to be controlled with the sent temperature data, and transmits the result to the controller 12.

If the detected temperature is lower than the set temperature as a result of the determination, the heater driving unit 17
The exposure head 8 is heated by driving the exposure head 8. If the detected temperature is too high than the set temperature, the Peltier device driving unit 1
8 drives the Peltier element 40. When the temperature is high, the water in the cooling water storage 37 evaporates and travels through the pipe 38 into the heat exchange chamber 39.
In this state, by driving the Peltier element 40,
The heat is removed from the water vapor in the heat exchange chamber 39, and the water vapor becomes water droplets and is returned to the cooling water storage section 37, thereby cooling the exposure head 8.

The heat removed by the Peltier device 40 is released to the outside of the device via the heat sink 41. A cooling fan 42 is provided above and below the heat sink 41, respectively.
Is provided to make it easy for heat to escape to the outside of the device. When the controller 12 controls the driving of the Peltier element 40, the fan 42 is simultaneously driven by the fan driving unit 19. That is, the Peltier element 40 and the fan 42 are driven in conjunction with each other.
When it is determined from the determination result that the temperature is within the range of the detected temperature, neither the surface heater 36 nor the Peltier element 40 is driven. By providing the temperature control mechanism as described above, an appropriate color development state of the photographic paper S can be obtained.

<Linear Motion System> Next, the linear motion system will be described with reference to FIGS. As described above, this linear motion system includes the linear motion rail 22, the moving block 44, and the ball 45 (corresponding to a rolling element).
The moving block 44 is fixed to the moving unit 24 by screws (not shown). The moving block 44 has a substantially C-shaped cross section, and a number of balls 45 roll along a rolling locus inside the moving block 44.

The rolling locus of the ball 45 is provided at a total of four places, and the rolling grooves 22 forming a part of the rolling locus are provided.
a, 22 b are formed on the linear motion rail 22. Rolling grooves 22a are provided one by one on the upper and lower side surfaces of the linear motion rail 22a.
Two rolling grooves 22b are formed in the plane portion. When this linear motion system is used, the moving unit 24 can move along the linear motion rail 22 very smoothly, and there is an advantage that rattling does not occur. In the flat portion of the linear motion rail 22, a plurality of screw mounting holes 22 are provided.
c is formed. A commercially available linear motion system can be used.
The LM Guide, a trade name of K Company, can be used.

<Positioning and Mounting Mechanism of Mobile Unit> Next, the positioning and mounting mechanism of the mobile unit 24 will be described with reference to FIGS. First, the necessity of this mechanism will be described. As described above, the moving unit 24 moves along the linear motion rail 22 to move along the exposure head 8 and detects the amount of light emitted from each SELFOC lens array 8 a by the optical sensor 48. By doing so, the exposure head 8 is calibrated. In order for this calibration to be performed accurately, the slit 30 provided in the moving unit 24 must move accurately on the virtual focal plane. This virtual focal plane is a plane through which the photographic paper S passes, and is located at a predetermined distance (about 7 mm) from the SELFOC lens array 8a, and the slit 30 must move to this position. In addition. The optical sensor 48 is disposed immediately near the slit 30.

Therefore, in order to secure such a positional relationship with high accuracy, the assembly is performed by the following assembling procedure. First, the mounting is performed with the mounting reference surface of the first mounting reference block 27 fixed to the head main body 20 to which the exposure head 8 is mounted abutting on the mounting reference surface 25 a of the first side plate 25. The head body 20 is attached to the first side plate 25 with screws (not shown). Next, the first mounting reference surface 21 a of the guide mounting base 21 is
Is mounted in a state where it is applied to the mounting reference surface 25a. The mounting of the guide mount 21 to the first side plate 25 is performed by screws (not shown).

Although not shown in FIG. 6, the head body 20 and the guide mount 21 are similarly mounted on the mounting reference surface 26a (see FIG. 4) of the second side plate 26 on the opposite side.
Next, the moving block 44 and the linear motion rail 22 are attached to the moving unit 24. In addition, moving block 4
Since the unit 4 and the linear rail 22 are in a unit state from the beginning, the moving block 44 and the moving unit 24 may be connected by screws. Then, the moving unit 24 is set in a state of being brought to one end of the linear rail 22 (the state shown in FIG. 3), and the mounting reference surface 24a (see FIG. 7) formed on the moving unit 24 is fixed to the guide mounting base. 21st first
It is applied to the mounting reference surface 21a. In this state, the linear motion rail 22 is screwed to the guide mounting base 21 with screws 43, but not all screws 43 are fixed.
Only the screws 43 closest to the mounting reference surface 21a (the leftmost part in FIG. 3) are temporarily fixed.

Next, the moving unit 24 is connected to the linear motion rail 22.
To the other end (the side closer to the second side plate 26), and the mounting reference surface 24a is similarly moved to the guide mounting base 2.
It is applied to the first second mounting reference surface 21b. In this state, the portion closest to the second mounting reference surface 21b of the linear motion rail 22
Only the screw 43 (rightmost in FIG. 3) is stopped. Next, the screw 43 on the leftmost side in FIG. Then, all the remaining screws 43 are tightened, and the mounting of the moving unit 24 and the linear motion system is completed.

As can be seen from the above, the moving unit 24 and the exposure head 8 are provided with the mounting reference surfaces 25a, 25b formed on the first side plate 25 and the second side plate 26, respectively.
Assembled based on Mobile unit 24
Is actually the first and second mounting reference surfaces 2 of the guide mounting base 21.
1a, 21b, these first,
The second mounting reference surfaces 21a, 21b are attached to the mounting reference surfaces 25a,
Since the moving unit 24 is assembled so as to be at the same height as the moving unit 25b, it can be said that the moving unit 24 can be assembled substantially based on the mounting reference surfaces 25a and 25b. Although the exposure head 8 is not directly applied to the mounting reference surfaces 25a and 25b, the head main body 20 supporting the exposure head 8 is assembled based on the mounting reference surfaces 25a and 25b. The exposure head 8 has a mounting reference surface 25.
a, 25b.

Therefore, the slit 30 of the moving unit 24
The error factors that affect the distance relationship between the exposure head 8 and the SELFOC lens array 8a include the height between the SELFOC lens array 8a and the mounting reference surfaces of the first mounting reference block 27 and the second mounting reference block 28. The distance in the direction, and the dimension from the mounting reference surface 24a of the moving unit 24 to the mounting portion of the slit 30. Since the error factor can be reduced, it is not necessary to provide a special adjustment mechanism. In the above configuration, the linear motion rail 22 is also attached to the mounting reference surface 25.
The moving unit 24 can move a predetermined position (virtual focus position) on the exposure head 8 with high accuracy. At both ends of the linear motion rail 22 (both ends of the range in which the moving unit 24 moves), the mounting reference surfaces 24a of the moving unit 24 are respectively attached to the mounting reference surfaces 21a, 21 of the guide mounting base 21.
b, the mobile unit 24
Sufficient accuracy can be ensured within the range in which.

In the above configuration, the first mounting reference block 27 and the second mounting reference block 28 are formed as separate members. However, the present invention is not limited to this. You may.

<Floating Mechanism> Next, the floating mechanism will be described with reference to FIGS. The moving unit 24 is screwed and moved by the ball screw 23. As can be understood from FIG. 2 and the like, since the length of the ball screw 23 is considerably long, there is a possibility that the central portion may be deformed by its own weight. . On the other hand, the mobile unit 24
Is moved by the linear motion rail 22 without play, the movement of the moving unit 24 may not be smooth due to the bending deformation of the ball screw 23 or the like. In order to cope with such a problem, a floating mechanism is employed in a connection portion between the ball screw 23 (ball screw mechanism) and the moving unit 24.

As shown in FIG. 7, there is provided a moving body 29 to which a ball nut (not shown) is integrally attached, and this moving body 29 is attached to the moving unit 24 by a stepped screw 46. The moving body 29 and the ball screw 23 are connected in a unit state from the beginning.

FIG. 8 shows a dimensional relationship when the moving body 29 is fixed to the moving unit 24 by the stepped screw 46. As can be seen from FIG. 8, the height h2 of the step portion 46a of the stepped screw 46 is set to be higher than the thickness h1 of the mounting portion of the moving body 29. The dimension (diameter) a1 of the mounting hole of the moving body 29 is larger
The size is set to be a little larger than the outer diameter a2 of 6a with a margin. In other words, in installation
The ball screw 23 and the moving unit 24 are attached so as to have a slight play. This will be referred to as a floating mechanism for convenience. The amount of rattling in the floating mechanism can be set in consideration of the amount of bending deformation of the ball screw 23 and the like. In this way, even if the ball screw 23 is bent or deformed, it can be absorbed by the looseness set in the floating mechanism, so that the moving unit 24 can be moved smoothly along the linear rail 22. Can be.

<Configuration of Cleaning Unit> Next, a cleaning unit C (corresponding to a cleaning mechanism) for cleaning the SELFOC lens array 8a (hereinafter, sometimes referred to as an exposure surface) of the exposure head 8 will be described. I do. Long-time digital exposure equipment 4
With the use of, dust adheres to the exposed surface. It is very troublesome for the operator to manually perform the dust removal work. Therefore, a mechanism for automatically cleaning the exposure surface is provided.

FIG. 7 shows the mechanism of the cleaning unit C mounted on the upper part of the moving unit 24. 2 and 3 show only a schematic location where the cleaning unit C is provided for convenience of illustration.
The detailed configuration is not shown. As shown in FIG. 7, the cleaning unit C includes a base member 50 coupled to the moving unit 24, and a brush support table 51 rotatably supported on the base member 50 so as to be rotatable around a rotation axis 51a. (Corresponding to a cleaning member support) 51 and a brush 53 attached below the brush support 51.
(Corresponding to a cleaning member) and the brush support 5
1. A switching member 52 fixed to the side of the unit 1 by a screw (not shown), and a tension spring for urging the brush 53 to one of a cleaning operation position and a retracted position (corresponding to a cleaning non-operation position). 54 (snap action spring), and a first stopper 55 and a second stopper 56 attached to the base member 50.

A support pin 50a for hooking hooks at both ends of the tension spring 54 is attached to the base member 50.
Similarly, support pins 51b are provided on the brush support base 51, respectively. In FIG. 7, the brush support 51 is urged clockwise about the rotating shaft 51 a by the tension spring 54, and the side surface of the brush support 51 opposite to the side on which the switching member 52 is attached is the fourth side. It is in contact with one stopper 55. In this state, the brush 53 is set at the cleaning position, and is set at a position where the exposure surface of the exposure head 8 can be cleaned.

FIG. 10 shows an operation mechanism of the cleaning unit C. The first switching cam member 57 and the second switching cam member 5 on which the tip 52a of the switching member 52 operates.
8 are provided. These switching cam members 5
A first cam portion 57a and a second cam portion 58a are formed on the first and second cam portions 58, respectively. On the left side of FIG. 10, the brush 53 is set at the cleaning position.

When the moving unit 24 moves from the left side of FIG. 10 to the right side (outbound path), the leading end 52a of the switching member 52 is moved to the first switching cam member 57 at the end side of the outward path.
Abuts on the first cam portion 57a. Thus, the switching member 52 and the brush support 51 are rotated counterclockwise around the rotation axis 51a. And the tension spring 5
At the point in time when the brush 4 moves over the rotation shaft 51a, the urging force in the counterclockwise direction by the tension spring 54
1 and the switching member 52 is moved to the second position as shown in FIG.
It is stabilized in a state where it comes into contact with the stopper 56. This state is a retracted position where the brush 53 does not perform cleaning.

As can be understood from the positional relationship between the cleaning unit C and the slit 30 in FIG. 3, the cleaning of the exposed surface is performed by the brush 53 before the detection by the optical sensor 48 is performed. Therefore, since the dust and dirt on the exposed surface have been removed in advance, the detection of the light emission amount by the optical sensor 48 becomes accurate. If the brush 53 slides on the exposed surface when the mobile unit 24 returns to the initial position again after the detection of the light emission amount, dust removed on the outward path may adhere to the exposed surface again. In the return step, the brush 53 is kept at the retracted position.

When the moving unit 24 returns (FIG. 10
Move from right to left of. ), The brush 53 moves in a retracted state, and the distal end portion 52a of the switching member 52 contacts the second cam portion 58a of the second switching cam member 58 at the end side of the return path. Thus, the switching member 52 and the brush support 51 are rotated clockwise around the rotation shaft 51a. Thus, the brush 53 returns from the retracted position in FIG. 9 to the cleaning operation position (initial position) in FIG.

According to the above configuration, the cleaning of the exposure head 8 is always performed when the exposure head 8 is calibrated, so that the digital exposure apparatus 4 can be made extremely convenient.

<Another Embodiment> In this embodiment, the PLZT shutter system is taken as an example of the exposure head 8, but
However, the present invention is not limited to this.
T printers and the like are also included.

[Brief description of the drawings]

FIG. 1 is a diagram schematically illustrating a digital exposure apparatus using an exposure head calibration apparatus according to the present invention and a mechanism related thereto.

FIG. 2 is a plan view of the exposure head of the digital exposure apparatus as viewed from the front.

FIG. 3 is a view P of FIG. 2 (side view 1);

FIG. 4 is a view Q in FIG. 2 (side view 2);

FIG. 5 shows a linear motion system.

FIG. 6 is a diagram showing a positioning and mounting mechanism of the moving unit.

FIG. 7 is a side view of the cleaning unit and the moving unit.

FIG. 8 shows a floating mechanism.

FIG. 9 is an operation diagram of a cleaning unit.

FIG. 10 is a view showing an operation mechanism of the cleaning unit.

[Explanation of symbols]

 Reference Signs List 8 Exposure head 8a Selfoc lens array (exposure surface) 22 Linear rail 24 Moving unit (sensor support) 48 Optical sensor 51 Brush support 52 Switching member 53 Brush (cleaning member) 57 First switching cam member 58 Second switching Cam member C Cleaning unit (cleaning mechanism) S Photographic paper

 ────────────────────────────────────────────────── ─── Continuing on the front page (72) Inventor Hiroshi Miyawaki 579 Umehara, Wakayama City, Wakayama Prefecture F-term in Noritsu Koki Co., Ltd. 2C061 AQ06 AS11 BB08 BB10 CM05 CM14 2C162 AE09 AE23 AE28 AE47 AE52 AE93 FA05 FA10 FA45 2H076 AB51 AB82 2H106 AA76 AB04 BH00

Claims (4)

[Claims] An exposure head for exposing an image on the photosensitive material, the exposure head being formed in a line along the width direction of the photosensitive material, and moving along the exposure surface to clean the exposure surface. An exposure head cleaning device, comprising: a cleaning mechanism for moving the cleaning mechanism along the exposure surface. 2. The cleaning mechanism is configured to be capable of reciprocatingly moving along the exposure surface, setting a cleaning member at a cleaning action position on a forward path of the reciprocating movement, and cleaning the cleaning member on a returning path of the reciprocating movement. 2. The exposure head cleaning device according to claim 1, further comprising a switching mechanism for setting a non-operating position. 3. A cleaning member supporting base on which the cleaning member is mounted and supported, wherein the switching mechanism is provided at both ends of the reciprocating movement with a switching part formed integrally with the cleaning member supporting base. 3. The exposure head cleaning apparatus according to claim 2, further comprising a cam section acting on the switching section. 4. An exposure surface, on which a number of elements are arranged in a row, a sensor for detecting an amount of light emitted from the exposure surface, a sensor support on which the sensor is mounted, 4. A sensor guide mechanism for guiding the sensor support along the element row of the exposure head, wherein the cleaning mechanism is attached to the sensor support. Exposure head cleaning device according to item 1.