JP2000349135A - Rotation suppressing structure of wafer - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide the rotation suppressing structure of a wafer, wherein notches can be made to position within a specified range and the notches in the wafer can be effectively prevented suppressively from being positionally deviated greatly. SOLUTION: This rotation suppressing structure is the rotation suppressing structure of a wafer, wherein a wafer press 8 and rotation suppressing stoppers 13, which suppress the rotation of a wafer W to the circumferential direction of the wafer W using notches N in the outer prepheral parts of the wafer W, are provided. The wafer press 8 is constituted of a frame-shaped mounting plate 9 mounted on the inner surface of the ceiling of a cover body of a wafer housing container, and a plurality of elastic control pieces 11 respectively molded protuberantly under the lower parts of both side parts of this plate 9 and pressingly made contact with the outer peripheral edge parts opposing to each other of the wafer W. Each rotation suppressing stopper 13 is integrally molded protuberantly to the point part of each piece 11 and is insertedly engaged with each notch N notched in the wafer W. The rotation of the wafer W is suppressed in spite of vibrations or the like during the transportation of the wafer W, a plurality of the notches N can be grouped within a specified narrow range SD and the facilitation and the like of the work of an alignment of the notches N with each other can be expected.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer container used for transporting between factories, transporting between processes, or storing while protecting semiconductor wafers from contamination and damage. More specifically, the present invention relates to an improvement in a wafer rotation suppressing structure provided in a wafer holder.

[0002]

2. Description of the Related Art A wafer storage container is used for transporting, transporting or storing semiconductor wafers (hereinafter abbreviated as "wafer"). This type of wafer storage container includes a container body and a plurality of wafers. It comprises a cassette for accommodating W, a gasket, a lid, and a wafer retainer 8.

As shown in FIG. 17, a wafer W is basically formed in a circular shape, and an orientation flat (hereinafter, abbreviated as an orientation flat) OF is cut out linearly flat on an outer peripheral portion thereof. This Ori-Fla OF
Acts to facilitate the determination of crystal orientation, conduction type, and alignment.

As shown in FIG. 19, the wafer retainer 8 has a mounting plate 9 mounted on the inner surface of the ceiling of the lid, and is formed by projecting side by side on both sides of the mounting plate 9. It is composed of a pair of elastic regulating piece groups 10 and the like that are in pressure contact with the upper edge. A pair of orientation flat stopper groups 17 are formed to project from the mounting plate 9 side by side in the front-rear direction, and the tip end of each orientation flat stopper 18 is locked to the orientation flat OF to prevent rotation of the wafer W. Each elastic restricting piece 11 is formed into a deformable substantially L-shape, and a plurality of fitting grooves 19 having a V-shaped cross section are formed at the tip, and each fitting groove 19 is pressed against the upper edge of the outer periphery of the wafer W. Fit.

In the above configuration, a plurality of wafers W are aligned and stored in a cassette, and the cassette is stored in a container body.
Thereafter, if a lid is placed over the upper opening of the container body via a gasket, a plurality of wafers W can be stored. At this time, since the elastic pressing pieces 11 are pressed against both sides of the outer peripheral upper edge of the plurality of aligned wafers W, the wafer holder 8 suppresses the breakage and rotation of the wafer W due to an impact during transportation. To prevent.

In recent years, in the case of 8-inch wafers W which have become the mainstream of semiconductor component manufacturing, there is a strong demand for improvement in the production amount of semiconductor chips per wafer W. Therefore, in view of this point, a wafer W with a substantially circular notch N, which can be expected to increase in area, is becoming the mainstream in place of the wafer W with the orientation flat OF having a large cutout portion. As shown in FIG. 18, this type of wafer W has a notch N formed in a V-shaped or U-shaped notch at a part of the outer peripheral edge. Such a notch N is SE
The dimensions are determined by the MI standard. For example, in the case of an 8-inch wafer W, the notch N is cut out in a V-shape having a width of about 3 mm and a depth of about 1 mm.

[0007]

The conventional structure for suppressing the rotation of a wafer is constructed as described above.
Even if the wafer holder 8 provided with the orientation flat stopper 18 is used for the wafer W with the notch N, the orientation flat stopper 18 interferes with the upper peripheral edge of the wafer W. The fitting groove 19 does not contact (see FIG. 20). Therefore, the conventional wafer holder 8 cannot accommodate the wafer W with the notch N. In addition, if the orientation flat stopper 18 is eliminated, the wafer W stored in the wafer storage container rotates greatly due to vibration and impact during transportation, and a very complicated operation of positioning the notch N when using the wafer W is indispensable. Become.

On the other hand, the plurality of wafers W are characterized in that the amount of rotation is different for each wafer alignment and storage groove formed in a cassette. Therefore, the notch N for each wafer W
It is necessary to detect and align the positions by using a detection alignment device. However, when the notch N rotates near 180 ° and exceeds the detection range of the detection and alignment device, the wafer W is shifted by 360 °.
The notch N has to be detected by rotating close.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and has a feature that a notch can be located within a specific range, and a large displacement of a notch of a wafer can be effectively suppressed and prevented. It is intended to provide a rotation suppressing structure.

[0010]

According to the first aspect of the present invention, in order to achieve the above object, a wafer holder and
It is characterized in that it comprises a rotation suppressing stopper that enters a notch formed in the outer peripheral portion of the wafer to suppress the rotation of the wafer in the circumferential direction within a specific range.

The wafer retainer includes a mounting plate and a plurality of elastic restricting pieces provided on both sides of the mounting plate so as to protrude and contact an outer peripheral portion of the wafer. It can be formed at the contact portion of each elastic regulating piece so as to fit into the notch of the wafer. Further, the wafer retainer includes a mounting plate, and a plurality of elastic restricting pieces that are provided so as to protrude on both side portions of the mounting plate and come into contact with the outer peripheral portion of the wafer, and the rotation suppressing stopper includes the mounting plate. From the plurality of elastic restricting pieces, and the tip of the rotation suppressing stopper may be fitted into the notch of the wafer.

Here, the wafer in the claims includes a single or plural Si wafers, GaP wafers and the like in which at least a V-shaped or U-shaped notch is formed. The mounting plate for the wafer holder may be formed integrally with the lid of the wafer storage container, or may be mounted separately. Examples of the shape of the mounting plate include a plate shape and a substantially frame shape. The plurality of elastic restriction pieces are provided side by side on the mounting plate according to the number of wafers. The elastic restricting pieces may be integrally formed on both sides of the mounting plate, or may be separately mounted on both sides of the mounting plate.

Further, the rotation suppressing stopper may be formed integrally with the mounting plate or the elastic regulating piece, or may be detachably mounted or fixed as a separate body. The rotation suppressing stopper can be appropriately formed in various bar shapes, semicircular shapes, semielliptical shapes, semi-oval shapes, and the like. The distance between the rotation suppressing stoppers located on both sides of the mounting plate is short from the viewpoint of suppressing the rotation of the wafer (for example, 10% to 80% of the diameter of the wafer, preferably 15% to 50%). %degree)
Although it is more preferable, the length can be appropriately lengthened or shortened.

According to the first or second aspect of the present invention, when the wafer rotates due to vibration or impact and the notch reaches the position of the rotation suppressing stopper, the rotation suppressing stopper enters at least a part of the notch. , Get stuck or get caught. Due to this contact action, rotation in the circumferential direction of the wafer is regulated, and the notch is located within a specific range. According to the third aspect of the present invention, since the rotation suppressing stopper is formed between the elastic restricting pieces on both sides of the mounting plate, a specific rotation suppressing stopper is formed on each of the elastic restricting pieces on both sides. The range can be smaller.

[0015]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Preferred embodiments of the present invention will be described below with reference to the drawings, but the present invention is not limited to the following embodiments. As shown in FIGS. 1 to 5, the wafer rotation suppressing structure according to the present embodiment includes a wafer holder 8 detachably mounted on a lid 6 of a wafer storage container, and a wafer holder 8 integrally formed with the wafer holder 8. Wafers (for example, 13 or 25 wafers)
And a pair of rotation suppressing stopper groups 12 that respectively mesh with notches N formed by cutting out the outer peripheral edge of the wafer W to restrict the rotation of the wafer W in the circumferential direction within a specific range SD.

The wafer storage container comprises a container body 1, a cassette 3 for aligning and storing a plurality of wafers W, a gasket 5 serving as a sealing member, a lid 6, and a wafer holder 8. As shown in FIG. 1, the container body 1 is made of, for example, PP, PE, PC, ABS, AS, PBT, PEE.
It is molded into a non-colored or colored square bottomed cylinder using various thermoplastic resins and thermoplastic elastomers such as K, PEI, acrylic resin, etc., and hook mechanisms 2 are integrally molded on the upper outer surfaces of the left and right side walls, respectively. Have been. In addition, cassette 3
Is formed into a transparent or colored rectangular tube using the same material as the container body 1 as shown in FIG.
It is removably stored inside. A plurality of alignment support grooves 4 are formed on the inner surfaces of the left and right side walls of the cassette 3 in parallel at a constant pitch in the front-rear direction, and the wafers W are aligned and stored in the plurality of alignment support grooves 4.

As shown in FIG. 1, the gasket 5 is formed into a deformable frame shape using various kinds of thermoplastic elastomers such as polyester, olefin, and styrene, or fluorine rubber. It is detachably fitted to the upper peripheral edge. Further, as shown in the figure, the lid 6 is formed in a transparent structure in which the contents can be confirmed by using the same material or the like of the container body 1, and is detachably fitted to the upper opening of the container body 1. Are combined. Hooks 7 that can be bent and opened are integrally formed on the left and right side walls of the lid 6, and each hook 7 is detachably engaged with the hook mechanism 2.

The wafer retainer 8 is formed using various thermoplastic elastomers such as polyester, olefin, and styrene, PP, and PE. As shown in FIG. 1, the wafer retainer 8 includes a substantially frame-shaped mounting plate 9 which is detachably mounted on the inner surface of the ceiling of the lid 6 via a locking portion. At the lower part, elastic regulating piece groups 10 arranged in the front-rear direction (the depth direction in FIG. 2 and the like) are integrally formed to protrude. As shown in FIGS. 1 and 2, each elastic restriction piece 11 is formed in a substantially L-shape that can be bent and deformed.

As shown in FIG. 2 and the like, the pair of rotation suppressing stoppers 12 are integrally formed at the distal ends of the pair of elastic restricting pieces 10 as free lower ends, and are directed downward. . A specific range SD is formed between the rotation suppressing stopper 13 of one elastic restricting piece group 10 and the rotation restricting stopper 13 of the other elastic restricting piece group 10, and this specific range S
D is provided with notches N of a plurality of wafers W. As shown in FIGS. 2 to 4, each rotation suppressing stopper 13 is integrally formed so as to protrude from the distal end portion of the elastic regulating piece 11, and has a size, length, width ( For example,
(Width of 40% to 95% of the width of the notch N). Then, while being formed into a substantially square rod shape on the front side, and sectioned into a V-shaped section, it is press-fitted on both sides of the outer peripheral upper edge portion of the wafer W, and is inserted and locked into the notch N when facing the notch N. .

Each of the rotation suppressing stopper groups 12 is displaced so that the wafer W does not enter between the rotation suppressing stoppers 13 and the wafer W is not displaced, inclined and pressed into the rotation suppressing stopper 13. (For this point, see, for example, Japanese Utility Model Application No. 63-24237).

In the above configuration, in order to store a plurality of wafers W, first, a plurality of wafers W
Are arranged and stored, the notches N of the plurality of wafers W are arranged upward, respectively, and the cassette 3 is stored in the container body 1. Then, the lid 6 is placed over the upper opening of the container body 1 via the gasket 5, and then the hooks 7 are respectively engaged with the pair of hook mechanisms 2, so that a plurality of wafers W can be stored in an airtight state. it can. At this time, since the elastic restraining pieces 11 are elastically pressed against both sides of the outer peripheral upper edge of the plurality of aligned wafers W and are bent upward, the wafer retainer 8 presses the wafer W and moves the wafer W up and down. Prevents rattling and breakage in the front-rear direction (see FIG. 4).

The wafer storage container storing a plurality of wafers W is provided for transportation and transport. The plurality of wafers W are gradually rotated in the circumferential direction due to the vibration and impact of the transport and transport. When each wafer W rotates and the notch N faces one rotation suppressing stopper 13, the rotation suppressing stopper 13 of the elastic regulating piece 11 having a repulsive force at the notch N is inserted and locked. The rotation of the wafer W is reliably prevented (see FIG. 5).

According to the above configuration, the rotation of the wafer W with the notch N can be extremely effectively suppressed with a very simple configuration irrespective of vibration, impact, and the like during transportation, and a narrow specific range S
Since a plurality of notches N can be combined in D, remarkable smoothness, simplification, and simplification of the alignment and alignment work of the notches N of the wafer W during use can be expected.
In addition, since it is possible to surely prevent the notch N from rotating at a rotation angle θ of 30 ° to 90 ° or more, there is no need to rotate the wafer W close to 360 ° to detect the notch N at all. . Through these, the productivity of the wafer W supplied to the processing step can be greatly improved.

Further, since the amount of movement of the wafer W can be greatly reduced, the friction between the wafer W and the cassette 3 can be greatly reduced, and as a result, contamination of the surface of the wafer W can be prevented. Furthermore, since the elastic regulating piece 11 and the rotation suppressing stopper 13 are not separately formed but are integrated, simplification of the configuration and simplification of the molding operation can be greatly expected.

Next, FIGS. 6 to 8 show a second embodiment of the present invention.
The angle θ ₁ formed between the rotation suppressing stopper 13 and the outer peripheral edge of the wafer W when
0 °, preferably 25 ° to 60 °. The other parts are the same as those in the above-described embodiment, and a description thereof will be omitted. In this embodiment, the same operation and effects as those of the above embodiment can be expected, and there is no need to project the rotation suppressing stopper 13 at the tip of each elastic regulating piece 11 at all. It is clear that the speeding up and facilitation of the process can be greatly expected.

Next, FIGS. 9 to 11 show a third embodiment of the present invention.
1 is basically formed into a substantially U-shaped cross section having a spring property, and a curved inclined surface 14 having a V-shaped cross section which is gradually inclined upward from the bottom surface to a part of the inner surface is formed. A rotation suppressing stopper 13 having a V-shaped cross section is integrally formed so as to protrude in the vicinity of the boundary with the rotation stopper 14. Each rotation suppressing stopper 13 is formed in a semicircular shape and has a height of 0.5 to 3
mm, preferably 1-2 mm. The other parts are the same as those in the above-described embodiment, and a description thereof will be omitted.

In this embodiment, the same operation and effect as those of the above embodiment can be expected, and furthermore, the pressing range of the elastic regulating pieces 11 which press against both sides of the outer peripheral upper edge of the wafer W can be increased. Obviously, it is possible to more reliably prevent and prevent rattling and breakage of the wafer W in the up-down and front-rear directions.

Next, FIGS. 12 to 14 show a fourth embodiment of the present invention.
In this case, in this case, a group of elastic restriction pieces 10 arranged in the front-rear direction below the left and right sides of the mounting plate 9 of the wafer retainer 8 are integrally formed so as to be integrally formed. A pair of rotation suppressing stopper groups 12 arranged in the front-rear direction from the vicinity of the central portion are integrally formed so as to project integrally.

Each elastic regulating piece 11 has a substantially L
It is formed in the shape of a letter, and the tip, which is the free lower end, is protruded and formed. Each of the rotation suppressing stoppers 13 is formed to extend in a tapered bar shape, and is located between the pair of elastic restriction pieces 11. The tip, which is the free lower end of each rotation suppressing stopper 13, is sectioned and formed into a V-shaped cross section, and this tip is pressed into engagement with the outer peripheral upper edge of the wafer W and fitted into the notch N when facing the notch N. Insert and lock. Note that the rotation suppressing stopper group 12 may be formed in a leaf spring shape having a plurality of bending points. The other parts are the same as those in the above-described embodiment, and a description thereof will be omitted.

In the present embodiment, the same operation and effect as those of the above embodiment can be expected. Further, since a pair of rotation suppressing stoppers 13 are formed between the elastic regulating pieces 11 on the left and right sides, a specific range SD And the notch N is 2
Rotation at a rotation angle θ of 5 ° or more can be reliably suppressed and prevented. Therefore, smoothness, simplification, and simplification of the alignment work of the notch N can be further improved.

FIG. 15 shows a fifth embodiment of the present invention. In this case, a front open box structure in which a container main body 1 of a wafer storage container is directly aligned and stored with a plurality of wafers W is provided. A wafer retainer 8 is removably mounted on the inner surface of a lid 6 fitted through a gasket 5 in front of the opening of the container main body 1 via a gasket 5. Stopper group 1
2 are integrally formed in a protruding manner. The other parts are the same as those in the above-described embodiment, and a description thereof will be omitted.

In the present embodiment, the same operation and effect as those of the above embodiment can be expected, and the wafer W is 300
Even with a large diameter of not less than mm, the wafer W with the notch N
Can be extremely effectively suppressed with a very simple configuration, and a plurality of notches N can be collected within a narrow specific range SD. Therefore, the alignment and alignment of the notch N of the wafer W can be significantly facilitated, simplified, and facilitated.

Next, FIG. 16 shows a sixth embodiment of the present invention. In this case, each of the rotation suppressing stoppers 13 is basically formed into a V-shaped section, and the V-shaped section is formed.
A small projection 15 is formed integrally with the bent bottom of the character, and this projection 15 is inserted and locked in the notch N when facing the notch N. The other parts are the same as those in the above-described embodiment, and a description thereof will be omitted. In this embodiment, it is apparent that the same operation and effect as those of the above embodiment can be expected, and that the insertion and locking of the notch N can be more reliably performed.

In the above embodiment, PP, PE, P
The container body 1 was molded using various thermoplastic resins and thermoplastic elastomers such as C, ABS, AS, PBT, PEEK, PEI, and acrylic resin, and carbon fiber and other conductive additives were added thereto. Is also good. Further, an antistatic function can be provided by alloying with a conductive resin or the like. Further, although the rotation suppressing stopper 13 is sectioned and formed in a V-shaped cross section, it may be sectioned and formed in a substantially U-shaped section. In addition, the width of the rotation suppression of the wafer W is 25 ° to 90 ° as the rotation angle θ.
It may be one that prevents suppression at a rotation angle θ of 00 °. Further, the first to sixth embodiments can be appropriately combined. For example, the first and sixth embodiments can be combined, or the third and sixth embodiments can be combined. Further, the first, fourth, and sixth embodiments can be combined.

[0035]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of a wafer container having a wafer rotation suppressing structure according to the present invention will be described. Example 1 An 8-inch size transport wafer storage container shown in FIG. 1 was prepared, 25 wafers W with notches N were aligned and stored in a cassette 3, the notch N was positioned right above, and the cassette 3 was set in the container body 1. After the storage, the gasket 5 was fitted around the upper edge of the opening of the container body 1. After fitting the gasket 5,
The wafer holder 8 shown in FIG. 2 is mounted on the inner surface of the ceiling of the lid 6, and the left and right rotation suppressing stoppers 12 of the wafer holder 8 are set.
The cover 6 is fitted over the container body 1 while confirming that the notches N of the plurality of wafers W are at the same distance from each other, and the rotation of the wafer holder 8 is suppressed on both sides of the outer peripheral upper edge of each wafer W. The stoppers 13 were elastically pressed against each other, and the wafer W with the notch N was sealed and stored in the wafer storage container.
The interval between the left and right rotation suppressing stopper groups 12 is 60 mm,
The height of the rotation suppressing stopper 13 is 1.2 mm. A vibration test was performed on such a wafer storage container under the following conditions.

First, a wafer storage container was fixed on a vibration slope of a vibration tester via a band made of canvas, and at a half amplitude of 0.5 mm, 30 Hz × 5 minutes + 50 Hz × 5 minutes + 70.
A vibration of Hz × 5 minutes was applied. After the end of the vibration, the lid 6 of the wafer storage container was slowly opened, and the amount of rotation of each wafer W was measured as the moving distance from the position where the notch N existed before the vibration, and the results are shown in Table 1.

Example 2 The wafer container and the wafer W were each set to 6 inches, the interval between the left and right rotation suppression stopper groups 12 was set to 50 mm, and the height of the rotation suppression stopper 13 was set to 1.2 mm. Other than the above, the rotation amount of the wafer W was measured in the same manner as in Example 1, and the results are shown in Table 1. Using the wafer presser 8 Example 3 6 was 60mm the distance between the right and left rotation suppressing stopper group 12, an angle theta ₁ which forms the outer circumferential edge portion of the rotation restriction stopper 13 and the wafer W and 30 °. Other than the above, the rotation amount of the wafer W was measured in the same manner as in Example 1, and the results are shown in Table 1. Example 4 The distance between the left and right rotation suppressing stopper groups 12 was set to 60 mm, and the distance between the pair of rotation suppressing stoppers 13 was set to 30 mm using the wafer holder 8 shown in FIG. Other than the above, the rotation amount of the wafer W was measured in the same manner as in the first embodiment.
It was shown to.

Conventional Example The rotation amount of the wafer W was measured in the same manner as in Example 1 except that the wafer holder 8 having no rotation suppressing stopper 13 at the tip of the elastic regulating piece 11 was used. Indicated.

[0039]

[Table 1]

As a result of the above test, the notch N of each wafer W
It was confirmed that the rotation of the wafer W in the circumferential direction was prevented from being suppressed by the insertion and locking of the rotation suppressing stopper 13 of the wafer holder 8.

[0041]

As described above, according to the first or second aspect of the present invention, the notch can be set within a specific range.
There is an effect that large displacement of the notch of the wafer can be effectively suppressed and prevented. Further, according to the third aspect of the present invention, the specific range can be reduced by reducing the rotation angle of the notch. Therefore, smoothness, simplification, simplification, and the like of the notch alignment work can be improved.

[Brief description of the drawings]

FIG. 1 is an exploded perspective view showing a wafer container in an embodiment of a wafer rotation suppressing structure according to the present invention.

FIG. 2 is an explanatory sectional view showing an embodiment of a wafer rotation suppressing structure according to the present invention.

FIG. 3 is an explanatory sectional view showing a rotation suppressing stopper of FIG. 2;

FIG. 4 is an explanatory sectional view showing a state in which a wafer holder is set in a wafer storage container in the embodiment of the wafer rotation suppressing structure according to the present invention.

FIG. 5 is an explanatory cross-sectional view showing a state in which a rotation suppression stopper is fitted and locked in a notch of the wafer in the embodiment of the wafer rotation suppression structure according to the present invention.

FIG. 6 is an explanatory sectional view showing a second embodiment of the wafer rotation suppressing structure according to the present invention.

FIG. 7 is an explanatory sectional view showing a state in which a wafer holder is set in a wafer container in a second embodiment of the wafer rotation suppressing structure according to the present invention.

FIG. 8 is a cross-sectional explanatory view showing a state in which a rotation suppression stopper is fitted and locked in a notch of a wafer in a second embodiment of the wafer rotation suppression structure according to the present invention.

FIG. 9 is an explanatory sectional view showing a third embodiment of the wafer rotation suppressing structure according to the present invention.

FIG. 10 shows a third example of the wafer rotation suppressing structure according to the present invention.
It is sectional explanatory drawing which shows the state which set the wafer press in the wafer storage container in embodiment.

FIG. 11 shows a third example of the wafer rotation suppressing structure according to the present invention.
FIG. 13 is an explanatory cross-sectional view showing a state in which the rotation suppressing stopper is fitted and locked in the notch of the wafer in the embodiment.

FIG. 12 is a fourth view of the wafer rotation suppressing structure according to the present invention;
It is sectional explanatory drawing which shows embodiment.

FIG. 13 is a fourth view of the wafer rotation suppressing structure according to the present invention;
It is sectional explanatory drawing which shows the state which set the wafer press in the wafer storage container in embodiment.

FIG. 14 is a fourth view of the wafer rotation suppressing structure according to the present invention;
FIG. 13 is an explanatory cross-sectional view showing a state in which the rotation suppressing stopper is fitted and locked in the notch of the wafer in the embodiment.

FIG. 15 is a fifth view of the wafer rotation suppressing structure according to the present invention;
It is a perspective explanatory view which shows embodiment.

FIG. 16 shows a sixth embodiment of the wafer rotation suppressing structure according to the present invention.
It is sectional explanatory drawing which shows embodiment.

FIG. 17 is an explanatory diagram showing an orientation flat of a wafer.

FIG. 18 is an explanatory view showing a notch of a wafer.

FIG. 19 is an explanatory sectional view showing a conventional wafer rotation suppressing structure.

FIG. 20 is an explanatory sectional view showing a problem of a conventional wafer rotation suppressing structure.

[Description of Signs] 1 Container main body 3 Cassette 5 Gasket 6 Lid 8 Wafer retainer 9 Mounting plate 10 Elastic regulating piece group 11 Elastic regulating piece 12 Rotation suppression stopper group 13 Rotation suppression stopper 14 Curved inclined surface 15 Projection N Notch SD Specific Range of W wafer

 ────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Tatsuaki Hirohata Odakura Osaikura, Nishigo-mura, Nishishirakawa-gun, Fukushima Prefecture 150 F-term (reference) 3E096 AA06 BA16 BB04 CA02 DA05 DA17 DA30 FA03 FA09 FA10 GA03 GA04 5F031 CA02 DA09 EA10 EA12 EA19 EA20 FA01 JA34 JA35 PA26

Claims (3)

[Claims] 1. A wafer holding device, comprising: a notch formed in an outer peripheral portion of a wafer; and a rotation suppressing stopper for suppressing rotation of the wafer in a circumferential direction to a specific range by entering a notch formed in an outer peripheral portion of the wafer. Wafer rotation control structure. 2. The wafer holding device comprises: a mounting plate; and a plurality of elastic restricting pieces provided on both sides of the mounting plate so as to protrude and contact an outer peripheral portion of the wafer. 2. The structure for suppressing rotation of a wafer according to claim 1, wherein the elastic member is formed at a contact portion of the elastic restricting piece and fitted into a notch of the wafer. 3. The wafer holder comprises: a mounting plate; and a plurality of elastic restricting pieces provided on both sides of the mounting plate so as to protrude and contact an outer peripheral portion of the wafer. 2. The wafer rotation suppressing structure according to claim 1, wherein the rotation suppressing stopper projects from the mounting plate and is located between the plurality of elastic restricting pieces, and a tip of the rotation suppressing stopper is fitted into a notch of the wafer.