JP2000346369A - High-frequency heating equipment - Google Patents

High-frequency heating equipment

Info

Publication number
JP2000346369A
JP2000346369A JP11155876A JP15587699A JP2000346369A JP 2000346369 A JP2000346369 A JP 2000346369A JP 11155876 A JP11155876 A JP 11155876A JP 15587699 A JP15587699 A JP 15587699A JP 2000346369 A JP2000346369 A JP 2000346369A
Authority
JP
Japan
Prior art keywords
electric field
heating chamber
heating
field distribution
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11155876A
Other languages
Japanese (ja)
Inventor
Yasushi Iwabuchi
康司 岩渕
Osamu Sakurai
修 桜井
Hideaki Hatano
秀明 波多野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Appliances Inc
Original Assignee
Hitachi Home Tech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Home Tech Ltd filed Critical Hitachi Home Tech Ltd
Priority to JP11155876A priority Critical patent/JP2000346369A/en
Publication of JP2000346369A publication Critical patent/JP2000346369A/en
Pending legal-status Critical Current

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  • Constitution Of High-Frequency Heating (AREA)
  • Electric Ovens (AREA)

Abstract

PROBLEM TO BE SOLVED: To easily improve heating efficiency, especially, for compact food. SOLUTION: The high-frequency heating equipment is provided with a magnetron 1 for generating high-frequency energy and a waveguide 3 for connecting the magnetron 1 with a heating room 2, an electric field distribution adjustment part 5 consisting of a column shape, conical trapezoid shape, long column shape, or long conical trapezoid shape with an elliptic horizontal section is provided near an upper-wall center part of the heating chamber, and a heating pattern is controlled for increasing an electric field strength at a center part for placing food in the heating chamber, thus easily improving, especially, the heating efficiency of compact food.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、食品等を高周波加
熱する際、特に小形食品に対する加熱効率の向上を容易
に行なうことができる高周波加熱装置の構成に関するも
のである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-frequency heating apparatus which can easily improve the heating efficiency of small-sized foods when heating foods or the like with high frequency.

【0002】[0002]

【従来の技術】従来の一般的な高周波加熱装置において
は、導波管内に突き出したマグネトロン出力アンテナと
導波管先端との間に高周波放射口を設け、その大きさや
個数等を変えてマイクロ波の放射パターンを調節してい
たが、放射パターンを大幅に調節することは困難であ
り、加熱効率の向上を図ることは容易ではなかった。
2. Description of the Related Art In a conventional general high-frequency heating device, a high-frequency radiation port is provided between a magnetron output antenna protruding into a waveguide and the tip of the waveguide. However, it was difficult to greatly adjust the radiation pattern, and it was not easy to improve the heating efficiency.

【0003】そこで、マイクロ波の放射パターンを制御
する手段として、例えば特公昭64−8916号公報、
特開平08−124670号公報などがあり、特公昭6
4−8916号公報は、高周波発振器(マグネトロン)
と加熱室とを連結する導波管内に突き出させた高周波発
振器の出力アンテナと導波管先端との間に2個のスロッ
トを設け、これらスロットおよびスロット間の仕切部の
合計寸法を使用波長(自由空間波長)の1/2〜5/4
に調整するというものである。また、特開平08−12
4670号公報は、導波管と加熱室の結合部(連結面)
に2個のスロットを設け、このスロットを両者共に導波
管先端から管内波長の1/4の位置を通り、かつ導波管
軸に対してほぼ平行になるように形成したものである。
これら2つの公報はいずれも、導波管内の基本伝送モー
ドTE10の電磁界パターンを考慮し、その磁界に直交
する表面電流が導波管と加熱室との結合部に流れ、この
電流を切るようにスロットを設け、効率よく加熱室内に
高周波を放射しようとするものである。
Therefore, as means for controlling the microwave radiation pattern, for example, Japanese Patent Publication No. Sho 64-8916,
JP-A-08-124670, etc.
No. 4-8916 discloses a high-frequency oscillator (magnetron)
Two slots are provided between the output antenna of the high-frequency oscillator protruding into the waveguide connecting the heating chamber and the heating chamber, and the tip of the waveguide, and the total size of these slots and the partition between the slots is determined by the wavelength used ( 1/2 to 5/4 of free space wavelength)
It is to adjust to. Also, Japanese Patent Application Laid-Open No. 08-12 / 08
No. 4670 discloses a joint (connection surface) between a waveguide and a heating chamber.
Are provided with two slots, both of which are formed so as to pass through the position of 1/4 of the guide wavelength from the tip of the waveguide and to be substantially parallel to the waveguide axis.
Both of these two publications take into account the electromagnetic field pattern of the basic transmission mode TE10 in the waveguide, so that a surface current orthogonal to the magnetic field flows through the joint between the waveguide and the heating chamber, and cuts off this current. Are provided with slots to efficiently radiate high frequencies into the heating chamber.

【0004】[0004]

【発明が解決しようとする課題】しかしながら上記従来
の改良例では、原理的にスロットは真っ直ぐでその長さ
を自由空間波長の約1/2より大きめで、特公昭64−
8916号公報のように2個のスロットは導波管軸に対
して水平で互いに管内波長の1/2の距離に設けるか、
あるいは特開平08−124670号公報のように導波
管軸に対してほぼ平行でかつ導波管側面に沿った位置に
互いに対向して設ける必要があるため、スロット配置上
の制約が多く、加熱室内の定在波分布を根本的に変えて
加熱効率を向上させるのは困難であるという問題点があ
った。
However, in the above-mentioned conventional improvement, the slot is in principle straight, and its length is larger than about 1/2 of the free space wavelength.
No. 8916, two slots are provided horizontally with respect to the waveguide axis and at a distance of 互 い に of the guide wavelength from each other.
Alternatively, as in Japanese Patent Application Laid-Open No. 08-124670, it is necessary to be provided so as to be substantially parallel to the waveguide axis and to face each other at a position along the side surface of the waveguide. There is a problem that it is difficult to fundamentally change the standing wave distribution in the room to improve the heating efficiency.

【0005】[0005]

【課題を解決するための手段】上記の問題点を解決する
ために、本発明は、高周波エネルギーを発生するマグネ
トロンと、被加熱物が収納される加熱室と、マグネトロ
ンを加熱室に連結する導波管と、加熱室の上壁中央部付
近に設けた円柱形状、円錐台形状、長円柱形状あるいは
水平断面が長円状の長円錐台形状から成る電界分布調節
部とで高周波加熱装置を構成した。
In order to solve the above-mentioned problems, the present invention provides a magnetron for generating high-frequency energy, a heating chamber for accommodating an object to be heated, and a guide for connecting the magnetron to the heating chamber. A high-frequency heating device is composed of a wave tube and an electric field distribution control unit that is provided near the center of the upper wall of the heating chamber, and has a columnar shape, a truncated cone shape, an elliptical column shape, or an elliptical truncated cone shape with a horizontal cross-section. did.

【0006】[0006]

【発明の実施の形態】本発明は上述の構成とすることに
より、加熱室の上壁中央部付近に円柱形状、円錐台形
状、長円柱形状あるいは水平断面が長円状の長円錐台形
状から成る電界分布調節部を設け、この電界分布調節部
によってマイクロ波の加熱パターンを調節し、加熱室内
の食品が載置される中央部における電界強度を強くする
ことにより、特に小形食品に対する加熱効率を極めて向
上させるものである。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention has the above-described structure, and is arranged so that a cylindrical shape, a truncated cone shape, an elongated cylinder shape, or a horizontal cross section is changed from an elongated circular truncated cone shape near the center of an upper wall of a heating chamber. The electric field distribution adjusting section is provided, and the electric field distribution adjusting section adjusts the microwave heating pattern to increase the electric field intensity at the central portion where the food in the heating chamber is placed. This is a significant improvement.

【0007】[0007]

【実施例】本発明の一実施例を図1〜16により説明す
る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to FIGS.

【0008】図1は、本発明の一実施例を示す高周波加
熱装置の要部断面図であり、1は高周波エネルギーを発
生するマグネトロンで、1aは導波管3内に同軸結合さ
れて突き出したマグネトロン出力アンテナであり、導波
管3を加熱室2に連結し、マグネトロン1の高周波エネ
ルギーを導波管3を介して加熱室2内に放射するように
なっている。4はオーブン料理やグリル料理をするため
のヒータである。5は加熱室2の上壁中央部付近から内
部に突き出すように設けた円柱形状から成る電界分布調
節部であり、6は被加熱物を回転自在に載置するための
ターンテーブルで、7はターンテーブル6を回転させる
駆動テーブルである。8は駆動テーブル7を回転させる
ための駆動軸であり、9はこの駆動軸8を駆動する駆動
モータで、10は加熱室2と導波管3との連結面におけ
る高周波放射口である。
FIG. 1 is a cross-sectional view of a main part of a high-frequency heating apparatus according to an embodiment of the present invention. Reference numeral 1 denotes a magnetron that generates high-frequency energy, and 1a is coaxially coupled into a waveguide 3 and protrudes. This is a magnetron output antenna. The waveguide 3 is connected to the heating chamber 2, and the high frequency energy of the magnetron 1 is radiated into the heating chamber 2 via the waveguide 3. Reference numeral 4 denotes a heater for cooking an oven or grill. Reference numeral 5 denotes a column-shaped electric field distribution adjusting unit provided so as to protrude from the vicinity of the central portion of the upper wall of the heating chamber 2, reference numeral 6 denotes a turntable for rotatably mounting an object to be heated, and reference numeral 7 denotes a turntable. This is a drive table for rotating the turntable 6. Reference numeral 8 denotes a drive shaft for rotating the drive table 7, reference numeral 9 denotes a drive motor for driving the drive shaft 8, and reference numeral 10 denotes a high-frequency radiation port on a connection surface between the heating chamber 2 and the waveguide 3.

【0009】図2は、図1の矢印YY’方向から見た加
熱室2の上部を示す図であり、電界分布調節部5はU字
状に成形されたヒータ4で囲まれている。電界分布調節
部5の円柱形状部の半径Rを調節し、ターンテーブル6
上の食品が載置される中央部の電界強度を大きくして加
熱効率を向上させる。ただし半径Rは、電界分布調節部
5がヒータ4に接触しないように端末間の距離Dより小
さく、かつヒータ4による加熱時に焼きムラが無いよう
に距離Dよりもある程度余裕を持って決める必要があ
る。
FIG. 2 is a view showing the upper part of the heating chamber 2 as viewed from the direction of the arrow YY ′ in FIG. 1, and the electric field distribution adjusting section 5 is surrounded by a U-shaped heater 4. The radius R of the cylindrical portion of the electric field distribution adjusting section 5 is adjusted, and the turntable 6 is adjusted.
The heating efficiency is improved by increasing the electric field strength at the center where the food is placed. However, the radius R needs to be smaller than the distance D between the terminals so that the electric field distribution adjusting unit 5 does not contact the heater 4, and to have a certain margin more than the distance D so that there is no unevenness in the heating by the heater 4. is there.

【0010】図3は、図1および図2において、それぞ
れの寸法をA=320、B=310、C=215、D=
120、H=20mmに設定した場合の図1における観
察面11(ZX面)内で食品を置く確率の高い中央部
(直径200mm)内の電界強度最大値の計算例を示し
たものであり、この電界強度は、マグネトロンの発振周
波数を2,460MHZとしてFDTD(有限差分時間
領域)法により計算したものである。ただし、電界強度
の相対的な傾向を調べる目的であるので細かい寸法関係
は省略する。ここで示すように、電界分布調節部5の直
径2×Rを増していくと、電界強度最大値が大きくなる
傾向があり、すなわち加熱効率を向上させることができ
る。
FIG. 3 is a diagram showing the dimensions of FIGS. 1 and 2 as A = 320, B = 310, C = 215, D =
120 shows an example of calculation of the maximum electric field intensity value in the central portion (200 mm in diameter) where the probability of placing food on the observation surface 11 (ZX surface) in FIG. 1 when H = 20 mm is set; The electric field strength is calculated by the FDTD (finite difference time domain) method with the magnetron oscillation frequency set to 2,460 MHZ. However, since the purpose is to examine the relative tendency of the electric field strength, detailed dimensional relationships are omitted. As shown here, as the diameter 2 × R of the electric field distribution adjusting section 5 increases, the maximum electric field strength tends to increase, that is, the heating efficiency can be improved.

【0011】図4は、図1に示す円柱形状から成る電界
分布調節部5を長円柱形状にした場合の一実施例を示す
図であり、図5はこの図4の矢印YY’方向から見た加
熱室2の上部を示す図である。
FIG. 4 is a view showing an embodiment in which the columnar electric field distribution adjusting section 5 shown in FIG. 1 is formed into a long columnar shape, and FIG. 5 is viewed from an arrow YY 'direction in FIG. FIG. 4 is a diagram showing an upper part of a heating chamber 2 which has been heated.

【0012】図6は、図4および図5において、電界分
布調節部5のR寸法を35mmに固定し、長円の直線部
長さWを変えた場合の上記図3と同じ位置での電界強度
最大値の変化を示した図であり、W=40mmの場合、
電界強度最大値が最も大きくなり、加熱効率を極めて向
上させることができることが分かる。
FIG. 6 shows the electric field intensity at the same position as in FIG. 3 when the R dimension of the electric field distribution adjusting section 5 is fixed to 35 mm and the length W of the straight portion of the ellipse is changed in FIGS. It is a figure showing a change of the maximum value, when W = 40 mm,
It can be seen that the maximum value of the electric field intensity is the largest, and the heating efficiency can be significantly improved.

【0013】図7および図8は、それぞれ高周波加熱装
置に電界分布調節部5がない場合(R=0mm)、およ
び、H=20、R=35、W=40mmに寸法設定した
長円柱形状から成る電界分布調節部5を設けた場合の観
察面11における電界分布を示すものである。ターンテ
ーブル6により同心円状分布を形成している中央部は、
食品を置く確率の高い直径200mmの領域であり、電
界分布調節部5を設けることによってこの領域内でも特
に中央部の電界強度が大きくなっている。したがって、
中央部に置いた食品が小形であるほど電界分布調節部5
による加熱効率が電界分布調節部5のない場合より相対
的に向上する。
FIGS. 7 and 8 show the case where the high-frequency heating device does not have the electric field distribution adjusting section 5 (R = 0 mm) and the shape of the long cylinder having dimensions H = 20, R = 35 and W = 40 mm, respectively. 3 shows an electric field distribution on the observation surface 11 when the electric field distribution adjusting unit 5 is provided. The central part forming a concentric distribution by the turntable 6 is:
This is a region having a diameter of 200 mm where the probability of placing food is high. By providing the electric field distribution adjusting unit 5, the electric field intensity particularly in the central part is also increased in this region. Therefore,
The smaller the food placed in the center is, the smaller the electric field distribution control unit 5
, The heating efficiency is relatively improved as compared with the case where the electric field distribution adjusting unit 5 is not provided.

【0014】図9は、水平断面が長円状の長円錐台形状
から成る電界分布調節部5を加熱室2内に突き出して設
けた場合の一実施例を示す図であり、図10はこの図9
の矢印YY’方向から見た加熱室2の上部を示す図で、
この実施例では、基本的に図4および図5で示した一実
施例の場合と同じ効果がある。また、ここでの構造を型
で製造する場合は加熱室2を構成する金属板の加工性を
考慮して適切なテーパ5’を設けるとよい。
FIG. 9 is a view showing an embodiment in which an electric field distribution adjusting section 5 having a horizontal section of an elliptical frustoconical shape is provided so as to protrude into the heating chamber 2, and FIG. FIG.
The figure which shows the upper part of the heating chamber 2 seen from the arrow YY 'direction of
This embodiment has basically the same effects as those of the embodiment shown in FIGS. When the structure here is manufactured by a mold, an appropriate taper 5 'may be provided in consideration of the workability of the metal plate constituting the heating chamber 2.

【0015】図11は、ヒ−タ4を矩形上に成形して加
熱室2内の上壁に設け、その矩形内において長円錐台形
状から成る電界分布調節部5を加熱室2内に突き出して
設けた場合の一実施例を示す図であり、図12はこの図
11の矢印YY’方向から見た加熱室2の上部を示す図
で、この実施例では、基本的に図9および図10で示し
た一実施例の場合と同じ効果が得られる。
FIG. 11 shows a heater 4 formed in a rectangular shape and provided on the upper wall of the heating chamber 2, and an electric field distribution adjusting section 5 having a shape of a long truncated cone protrudes into the heating chamber 2 within the rectangle. FIG. 12 is a view showing the upper part of the heating chamber 2 as viewed from the direction of the arrow YY ′ in FIG. 11, and FIG. 12 is a view basically showing FIGS. The same effect as in the embodiment shown in FIG. 10 can be obtained.

【0016】図13は、ヒータ4の各辺と平行でない直
線部を持った長円錐台形状から成る電界分布調節部5
を、加熱室2内に突き出して設けた場合の一実施例を示
す図であり、例えば、加熱効率および加熱ムラ低減等の
性能を共に向上させる場合に利用する。
FIG. 13 shows an electric field distribution adjusting unit 5 having a shape of a long truncated cone having a straight portion that is not parallel to each side of the heater 4.
FIG. 3 is a view showing an embodiment in which the projections are provided in the heating chamber 2 and are used, for example, when both the performances such as the heating efficiency and the heating unevenness are improved.

【0017】図14は、円錐台形状から成る電界分布調
節部5を加熱室2内に突き出して設けた場合の一実施例
を示す図であり、この実施例では、基本的に図1および
図2の円柱形状から成る場合と同様な効果がある。
FIG. 14 is a view showing an embodiment in which an electric field distribution adjusting section 5 having a truncated cone shape is provided so as to protrude into the heating chamber 2. In this embodiment, basically, FIGS. The same effect as in the case of the second cylindrical shape is obtained.

【0018】図15は、ヒ−タ4を加熱室2の外部に設
け、長円錐台形状から成る電界分布調節部5を加熱室2
の外側へ突き出して設けた場合の一実施例を示す図であ
り、図16は、この図15の矢印YY’方向から見た加
熱室2の上部を示す図で、この構成においても加熱室2
内の電界分布を調節でき、中央部の電界強度を大きくで
きることを確認している。なお、このようにヒータ4が
加熱室2外にある場合も、円柱形状、長円柱形状、円錐
台形状から成る電界分布調節部5を加熱室2の外側へ突
き出し、その寸法を調整することにより、加熱室の中央
部の電界強度を大きくできることは言うまでもない。
FIG. 15 shows that the heater 4 is provided outside the heating chamber 2 and the electric field distribution adjusting section 5 having a shape of a long truncated cone is provided in the heating chamber 2.
FIG. 16 is a diagram showing an embodiment in which the heating chamber 2 is provided so as to protrude outwardly from FIG. 16. FIG. 16 is a view showing the upper portion of the heating chamber 2 as viewed from the direction of arrow YY ′ in FIG.
It has been confirmed that the electric field distribution in the inside can be adjusted and the electric field intensity in the center can be increased. In addition, even when the heater 4 is outside the heating chamber 2 as described above, the electric field distribution adjusting section 5 having a cylindrical shape, an elongated cylindrical shape, and a truncated cone shape is protruded to the outside of the heating chamber 2 and the dimensions thereof are adjusted. Needless to say, the electric field strength at the center of the heating chamber can be increased.

【0019】また、図9および図10、図11および図
12、図13および図14、図15および図16で示し
た構造を型で製造する場合、加熱室2を構成する金属板
の加工性を考慮して適切なテーパ5’を設けるとよい。
When manufacturing the structure shown in FIGS. 9 and 10, 11 and 12, 13 and 14, 15 and 16 by using a mold, the workability of the metal plate constituting the heating chamber 2 is reduced. In consideration of the above, an appropriate taper 5 ′ may be provided.

【0020】[0020]

【発明の効果】以上説明したように、本発明によれは、
高周波エネルギーを発生するマグネトロンと、このマグ
ネトロンを加熱室に連結する導波管とを備え、加熱室の
上壁中央部付近に円柱形状、円錐台形状、長円柱形状あ
るいは水平断面が長円状の長円錐台形状から成る電界分
布調節部を設け、加熱パターンを制御して加熱室内の食
品を置く中央部の電界強度を強くすることにより、特に
小形食品の加熱効率の向上を容易に実現できる。さら
に、加熱室上壁を内部あるいは外部に向かって絞りを設
けて電界分布調節部を形成することにより、ヒータによ
る加熱室の熱変形を防止するといった機械的な効果を得
ることができる。
As described above, according to the present invention,
It has a magnetron that generates high-frequency energy and a waveguide that connects this magnetron to the heating chamber, and has a columnar shape, a truncated cone shape, an elliptical cylinder shape, or an oblong horizontal cross section near the center of the upper wall of the heating chamber. By providing an electric field distribution adjusting section having a long truncated cone shape and controlling the heating pattern to increase the electric field intensity at the central portion where the food in the heating chamber is placed, it is possible to easily improve the heating efficiency especially for small foods. Further, a mechanical effect such as preventing thermal deformation of the heating chamber by a heater can be obtained by forming an electric field distribution adjusting section by providing a throttle on the upper wall of the heating chamber toward the inside or outside.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の高周波加熱装置の一実施例を示す要部
断面図である。
FIG. 1 is a cross-sectional view illustrating a main part of an embodiment of a high-frequency heating device according to the present invention.

【図2】図1の矢印YY’方向から見た加熱室2の上部
を示す図である。
FIG. 2 is a diagram showing an upper part of a heating chamber 2 as viewed from a direction of an arrow YY ′ in FIG.

【図3】図1における観察面11(ZX面)内で食品を
置く確率の高い中央部(直径200mm)内の電界強度
最大値の計算例である。
FIG. 3 is a calculation example of a maximum electric field intensity value in a central portion (200 mm in diameter) where a food is likely to be placed on the observation surface 11 (ZX plane) in FIG. 1;

【図4】図1における電界分布調節部5を長円柱形状に
した場合の図である。
FIG. 4 is a diagram in the case where the electric field distribution adjusting unit 5 in FIG. 1 is formed in a long cylindrical shape.

【図5】図2における電界分布調節部5を長円柱形状に
した場合の図である。
FIG. 5 is a diagram when the electric field distribution adjusting unit 5 in FIG. 2 is formed in a long cylindrical shape.

【図6】図5において電界分布調節部5のR寸法を35
mmに固定して、長円の直線部長さWを変えた場合の上
記図3と同じ位置での電界強度最大値の変化を示す図で
ある。
FIG. 6 shows a case where the R dimension of the electric field distribution adjusting unit 5 in FIG.
FIG. 4 is a diagram illustrating a change in the maximum electric field intensity at the same position as in FIG. 3 when the length W of the straight portion of the ellipse is changed while the length is fixed to mm.

【図7】電界分布調節部5がない場合(R=0mm)か
ら成る観察面11における電界分布を示す。
FIG. 7 shows an electric field distribution on the observation surface 11 when there is no electric field distribution adjusting unit 5 (R = 0 mm).

【図8】電界分布調節部5を長円柱形状として寸法をそ
れぞれH=20、R=35、W=40mmとして長円柱
形状とした場合から成る観察面11における電界分布を
示す。
FIG. 8 shows an electric field distribution on the observation surface 11 in a case where the electric field distribution adjusting unit 5 is formed in a long cylindrical shape with dimensions H = 20, R = 35, and W = 40 mm, respectively.

【図9】図1における電界分布調節部5を水平断面が長
円状の長円錐台形状にした場合の図である。
FIG. 9 is a diagram when the electric field distribution adjusting unit 5 in FIG. 1 has a horizontal section in the shape of an elliptical truncated cone.

【図10】図2における電界分布調節部5を水平断面が
長円状の長円錐台形状にした場合の図である。
10 is a diagram when the electric field distribution adjusting unit 5 in FIG. 2 has a horizontal cross section in the shape of a long circular truncated cone.

【図11】図1におけるヒータ4を矩形状にし、その矩
形内において電界分布調節部5を加熱室2内に突き出し
た場合の図である。
11 is a view showing a case where a heater 4 in FIG. 1 is formed in a rectangular shape, and an electric field distribution adjusting section 5 projects into the heating chamber 2 within the rectangular shape.

【図12】図2におけるヒ−タ4を矩形状にし、その矩
形内において電界分布調節部5を加熱室2内に突き出し
た場合の図である。
FIG. 12 is a view showing a case where the heater 4 in FIG. 2 is formed in a rectangular shape, and the electric field distribution adjusting section 5 projects into the heating chamber 2 within the rectangular shape.

【図13】図2における電界分布調節部5をヒータ4の
各辺と平行でない直線部を持った長円錐台形状にした場
合の図である。
FIG. 13 is a diagram showing a case where the electric field distribution adjusting unit 5 in FIG. 2 is formed in a long truncated cone shape having a straight line portion that is not parallel to each side of the heater 4.

【図14】図2における電界分布調節部5を円錐台形状
にした場合の図である。
14 is a diagram when the electric field distribution adjusting unit 5 in FIG. 2 has a truncated cone shape.

【図15】図1におけるヒ−タ4を加熱室2の外部に設
け、電界分布調節部5を長円錐台形状にした場合の図で
ある。
FIG. 15 is a view showing a case where the heater 4 in FIG. 1 is provided outside the heating chamber 2 and the electric field distribution adjusting unit 5 is formed in a long truncated cone shape.

【図16】図2におけるヒ−タ4を加熱室2の外部に設
け、電界分布調節部5を長円錐台形状にした場合の図で
ある。
FIG. 16 is a view showing a case where the heater 4 in FIG. 2 is provided outside the heating chamber 2 and the electric field distribution adjusting section 5 is formed into a long truncated cone shape.

【符号の説明】[Explanation of symbols]

1 マグネトロン 1a マグネトロン出力アンテナ 2 加熱室 3 導波管 4 ヒータ 5 電界分布調節部 5’テ−パ− 6 タ−ンテ−ブル 7 駆動テ−ブル 8 駆動軸 9 駆動モ−タ 10 高周波放射口 DESCRIPTION OF SYMBOLS 1 Magnetron 1a Magnetron output antenna 2 Heating chamber 3 Waveguide 4 Heater 5 Electric field distribution adjusting part 5 'taper 6 Turntable 7 Drive table 8 Drive shaft 9 Drive motor 10 High frequency radiation port

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3K090 AA01 AA02 AB02 BA01 BB01 CA01 3L086 AA01 BB05 DA06  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 3K090 AA01 AA02 AB02 BA01 BB01 CA01 3L086 AA01 BB05 DA06

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 高周波エネルギーを発生するマグネトロ
ン(1)と、被加熱物が収納される加熱室(2)と、前
記マグネトロンを前記加熱室に連結する導波管(3)
と、前記加熱室の上壁中央部付近に設けられた円柱形
状、円錐台形状、長円柱形状あるいは水平断面が長円状
の長円錐台形状から成る電界分布調節部(5)とで構成
されたことを特徴とする高周波加熱装置。
1. A magnetron (1) for generating high-frequency energy, a heating chamber (2) in which an object to be heated is stored, and a waveguide (3) connecting the magnetron to the heating chamber.
And an electric field distribution adjusting section (5) provided near the center of the upper wall of the heating chamber and having a columnar shape, a truncated cone shape, an elliptical column shape, or a truncated conical shape having an elliptical horizontal cross section. A high-frequency heating device, characterized in that:
JP11155876A 1999-06-03 1999-06-03 High-frequency heating equipment Pending JP2000346369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11155876A JP2000346369A (en) 1999-06-03 1999-06-03 High-frequency heating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11155876A JP2000346369A (en) 1999-06-03 1999-06-03 High-frequency heating equipment

Publications (1)

Publication Number Publication Date
JP2000346369A true JP2000346369A (en) 2000-12-15

Family

ID=15615446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11155876A Pending JP2000346369A (en) 1999-06-03 1999-06-03 High-frequency heating equipment

Country Status (1)

Country Link
JP (1) JP2000346369A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100455894C (en) * 2004-08-06 2009-01-28 上海松下微波炉有限公司 Microwave oven

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100455894C (en) * 2004-08-06 2009-01-28 上海松下微波炉有限公司 Microwave oven

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