JP2000336491A - Microetching agent for nickel - Google Patents

Microetching agent for nickel

Info

Publication number
JP2000336491A
JP2000336491A JP15016599A JP15016599A JP2000336491A JP 2000336491 A JP2000336491 A JP 2000336491A JP 15016599 A JP15016599 A JP 15016599A JP 15016599 A JP15016599 A JP 15016599A JP 2000336491 A JP2000336491 A JP 2000336491A
Authority
JP
Japan
Prior art keywords
nickel
etching
high polymer
cationic
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15016599A
Other languages
Japanese (ja)
Inventor
Daisaku Akiyama
大作 秋山
Tomoshi Saito
知志 斉藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MEC Co Ltd
Original Assignee
MEC Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MEC Co Ltd filed Critical MEC Co Ltd
Priority to JP15016599A priority Critical patent/JP2000336491A/en
Publication of JP2000336491A publication Critical patent/JP2000336491A/en
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an etching agent for roughening the surface of nickel into a deep rugged shape exhibiting anchor effect in the case of being adhered with a resin by forming it into an aq. soln. contg. ferric chloride, hydrochloric acid and a high polymer compd. having at least either polyamine chains or cationic groups in molecules respectively by the ratios in specified ranges. SOLUTION: The ratio of ferric chloride is 5 to 39 wt.%, that of hydrochloric acid is 0.01 to 2 wt.%, and that of a high polymer compd. is 0.000001 to 1 wt.%. The high polymer compd. is a cationic high polymer compd. showing cationic behavior in an aq. soln., in which molecular weight is desirably several thousands to several millions, and polyethylene imine, polyalkylene polyamine or the like is desirable because of the excellent solubility and low foamability thereof. For obtaining deep ruggedness, etching is executed to a depth of 0.5 to 4 μm from the surface of nickel. Ferrous ions produced by the reaction with nickel are returned by air oxidation and recover the etching performance thereof.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、ニッケル表面を深
い凹凸のある形状に粗化することのできるマイクロエッ
チング剤に関する。本発明のマイクロエッチング剤は、
例えばニッケル材表面に被膜を形成したり、他部材と接
着する場合の前処理など、ニッケル材の表面処理に広く
使用することができる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a microetching agent capable of roughening a nickel surface into a shape having deep irregularities. The micro-etching agent of the present invention,
For example, it can be widely used for a surface treatment of a nickel material such as a pretreatment for forming a coating on the surface of a nickel material or bonding it to another member.

【0002】[0002]

【従来の技術】ニッケルと樹脂との接着性を向上させる
ために、従来からスクラブ研磨やバフ研磨により、ニッ
ケル表面を粗化することが行われている。しかしなが
ら、このような物理的研磨法では、充分粗化されず、樹
脂との接着性に優れた深い凹凸を得ることは困難であ
る。また、塩化第二鉄と塩酸とからなる水溶液でニッケ
ル表面をマイクロエッチングして粗化することも検討さ
れているが、このようなマイクロエッチング剤でも浅く
滑らかな凹凸しか得られず、樹脂との接着性が不充分で
ある。
2. Description of the Related Art In order to improve the adhesion between nickel and a resin, the surface of nickel has been conventionally roughened by scrubbing or buffing. However, with such a physical polishing method, the surface is not sufficiently roughened, and it is difficult to obtain deep irregularities excellent in adhesion to a resin. Further, microetching and roughening the nickel surface with an aqueous solution comprising ferric chloride and hydrochloric acid have been studied, but even with such a microetching agent, only shallow and smooth irregularities can be obtained, and the resin and the resin are not easily etched. Insufficient adhesion.

【0003】一方、鉄系合金のエッチング剤として、特
開昭63−79983号公報には、第二鉄塩、ポリアミ
ン、有機硫黄化合物、有機キレート化合物および無機酸
(塩酸、硫酸または硝酸)を含有する水溶液が記載され
ている。しかしながら、この水溶液でニッケルをマイク
ロエッチングすると、前記公報にも記載されているよう
に、平滑で光沢のある表面になり、樹脂との接着性はか
えって低下してしまう。
On the other hand, as an etching agent for an iron-based alloy, JP-A-63-79983 contains a ferric salt, a polyamine, an organic sulfur compound, an organic chelate compound and an inorganic acid (hydrochloric acid, sulfuric acid or nitric acid). Aqueous solutions are described. However, when nickel is microetched with this aqueous solution, as described in the above-mentioned publication, a smooth and glossy surface is obtained, and the adhesiveness to the resin is rather reduced.

【0004】また、本出願人による特開平9−4116
2号公報には、銅の酸化剤、ポリアミン鎖および(また
は)カチオン性基を有する高分子化合物を含有する水溶
液が、銅表面を粗化し得ることが記載されている。しか
しながら、この水溶液がニッケル表面に対し、どのよう
に作用するか、全く不明であった。すなわち、銅は水素
よりも酸化還元電位の高い貴な金属であるのに対し、ニ
ッケルは水素よりも酸化還元電位の低い卑な金属であ
り、腐食溶液に対する反応性が全く異なるのである。
[0004] Japanese Patent Application Laid-Open No. 9-4116 by the present applicant.
No. 2 describes that an aqueous solution containing a copper oxidizing agent, a polymer compound having a polyamine chain and / or a cationic group can roughen the copper surface. However, it was completely unknown how this aqueous solution acts on the nickel surface. That is, copper is a noble metal having a higher oxidation-reduction potential than hydrogen, whereas nickel is a noble metal having a lower oxidation-reduction potential than hydrogen, and has completely different reactivity to a corrosion solution.

【0005】[0005]

【発明が解決しようとする課題】本発明は、ニッケル表
面を樹脂と接着した場合にアンカー効果が充分に発現さ
れるような深い凹凸のある形状に粗化することのできる
マイクロエッチング剤を得ることを目的とする。
SUMMARY OF THE INVENTION An object of the present invention is to provide a microetching agent capable of roughening into a shape having deep irregularities such that an anchor effect is sufficiently exhibited when a nickel surface is bonded to a resin. With the goal.

【0006】[0006]

【課題を解決するための手段】本発明は、塩化第二鉄5
〜39%(重量%、以下同様)、塩酸0.01〜2%、
ポリアミン鎖およびカチオン性基の少なくとも一方を分
子中に有する高分子化合物0.000001〜1%を含
有する水溶液からなるニッケル用マイクロエッチング剤
に関する。
SUMMARY OF THE INVENTION The present invention provides ferric chloride 5
~ 39% (wt%, the same applies hereinafter), hydrochloric acid 0.01 ~ 2%,
The present invention relates to a microetching agent for nickel comprising an aqueous solution containing 0.000001 to 1% of a polymer compound having at least one of a polyamine chain and a cationic group in a molecule.

【0007】[0007]

【発明の実施の形態】以下に本発明のニッケル用マイク
ロエッチング剤に関して詳細に説明する。本発明におけ
る塩化第二鉄は、ニッケルを酸化溶解する作用を有す
る。塩化第二鉄の濃度は5〜39%、好ましくは7〜1
5%である。前記濃度が5%未満ではエッチング速度が
遅くなりすぎて深い凹凸を得るための処理時間が長くな
り、またエッチング剤の許容ニッケル溶解量が少なくな
る。前記濃度が39%を超えるとエッチング速度が速く
なりすぎてエッチング量の制御が困難になり、深い凹凸
が得にくくなる。
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the microetching agent for nickel of the present invention will be described in detail. Ferric chloride in the present invention has an action of oxidizing and dissolving nickel. The concentration of ferric chloride is 5-39%, preferably 7-1.
5%. If the concentration is less than 5%, the etching rate becomes too slow, the processing time for obtaining deep unevenness becomes longer, and the permissible nickel dissolution amount of the etching agent decreases. If the concentration exceeds 39%, the etching rate becomes too high, so that it is difficult to control the etching amount, and it is difficult to obtain deep irregularities.

【0008】本発明における塩酸は、酸化されたニッケ
ルのエッチング剤中への溶解を促進する作用があり、か
つ許容ニッケル溶解量を増加させる作用がある。塩酸の
濃度は0.01〜2%、好ましくは0.03〜0.5%
である。前記濃度が0.01%未満では前記効果が不充
分であり、2%を超えるとエッチングムラが生じやすく
なり、一定の凹凸形状を得ることが困難になる。
The hydrochloric acid in the present invention has an effect of accelerating the dissolution of oxidized nickel in an etching agent and an effect of increasing an allowable nickel dissolution amount. The concentration of hydrochloric acid is 0.01 to 2%, preferably 0.03 to 0.5%
It is. If the concentration is less than 0.01%, the effect is insufficient, and if it exceeds 2%, etching unevenness is likely to occur, and it is difficult to obtain a constant uneven shape.

【0009】本発明における高分子化合物は、その分子
中に少なくともポリアミン鎖およびカチオン性基の一方
を有し、水溶液中でカチオン性の挙動を示す分子量が1
000以上、好ましくは数千から数百万の高分子化合物
(以下、カチオン高分子という)である。前記カチオン
高分子の作用の詳細は不明であるが、ニッケル表面に不
連続に吸着し、孔食状態をつくりだすものと推定され
る。前記カチオン高分子の具体例としては、例えばポリ
エチレンイミン、ポリアルキレンポリアミン、ポリアリ
ルアミン、第4級アンモニウム塩型スチレンの重合体、
第4級アンモニウム塩型アミノアルキル(メタ)アクリ
レートの重合体、第4級アンモニウム塩型ジアリルアミ
ンの重合体、第4級アンモニウム塩型ジアリルアミンと
アクリルアミドとの共重合体、アミノアルキルアクリル
アミドの塩の重合体、カチオン性セルロース誘導体等が
あげられる。前記塩としては、例えば塩酸塩があげられ
る。また、カチオン高分子として、樹脂や繊維の帯電防
止剤、廃水処理用の高分子凝集剤、毛髪用リンスのコン
ディショニング成分等として市販されているものを使用
してもよい。前記カチオン高分子のうちでは、ポリエチ
レンイミン、ポリアルキレンポリアミン等が溶解性に優
れ、また発泡性が低いという点から好ましい。これらカ
チオン高分子は、2種以上を併用してもよい。カチオン
高分子の濃度は、0.000001〜1%である。特に
好ましい濃度はカチオン高分子の種類により異なるが、
0.0001〜0.5%程度である。前記濃度が0.0
00001%未満ではその効果が不充分で深い凹凸を得
ることができなくなり、また1%をこえると逆に防錆作
用を示して平滑な形状にエッチングされるようになる。
The polymer compound of the present invention has at least one of a polyamine chain and a cationic group in the molecule, and has a molecular weight of 1 which exhibits cationic behavior in an aqueous solution.
000 or more, preferably thousands to millions of high molecular compounds (hereinafter referred to as cationic polymers). The details of the action of the cationic polymer are unknown, but it is presumed that the cationic polymer is discontinuously adsorbed on the nickel surface to create a pitting state. Specific examples of the cationic polymer include, for example, polyethyleneimine, polyalkylenepolyamine, polyallylamine, a quaternary ammonium salt type styrene polymer,
Polymer of quaternary ammonium salt type aminoalkyl (meth) acrylate, polymer of quaternary ammonium salt type diallylamine, copolymer of quaternary ammonium salt type diallylamine and acrylamide, polymer of salt of aminoalkylacrylamide And cationic cellulose derivatives. Examples of the salt include a hydrochloride. Further, as the cationic polymer, those commercially available as an antistatic agent for resin or fiber, a polymer flocculant for wastewater treatment, a conditioning component for hair rinse, and the like may be used. Among the cationic polymers, polyethyleneimine, polyalkylenepolyamine, and the like are preferable because of their excellent solubility and low foamability. Two or more of these cationic polymers may be used in combination. The concentration of the cationic polymer is 0.000001 to 1%. The particularly preferred concentration varies depending on the type of the cationic polymer,
It is about 0.0001 to 0.5%. The concentration is 0.0
If it is less than 00001%, the effect is insufficient and it is not possible to obtain deep irregularities, and if it exceeds 1%, on the contrary, it exhibits a rust-preventive action and is etched into a smooth shape.

【0010】本発明のマイクロエッチング剤には、さら
に界面活性剤、キレート剤等の種々の添加剤を、必要に
応じて添加しても良い。
Various additives such as a surfactant and a chelating agent may be further added to the microetching agent of the present invention as needed.

【0011】本発明のマイクロエッチング剤は、前記の
各成分を水に溶解させることにより容易に調整すること
ができる。前記水としては、イオン交換水が好ましい。
The microetching agent of the present invention can be easily adjusted by dissolving each of the above components in water. The water is preferably ion-exchanged water.

【0012】本発明のマイクロエッチング剤の使用方法
に特に限定はないが、例えばニッケルにマイクロエッチ
ング剤をスプレーする方法、マイクロエッチング剤中に
ニッケルを浸漬する方法などがあげられる。前記方法の
うちでは、ニッケルとの反応によって生じた第一鉄イオ
ンが空気酸化によって第二鉄イオンに戻され、エッチン
グ能力を回復させることができるためスプレー法が好ま
しい。したがって、浸漬法の場合は、空気を吹き込むた
めのバブリング等を行うことが好ましい。
The method of using the microetching agent of the present invention is not particularly limited, and examples thereof include a method of spraying a microetching agent on nickel and a method of immersing nickel in the microetching agent. Among the above methods, a spray method is preferable because ferrous ions generated by a reaction with nickel are returned to ferric ions by air oxidation and the etching ability can be recovered. Therefore, in the case of the immersion method, it is preferable to perform bubbling or the like for blowing air.

【0013】本発明のマイクロエッチング剤を使用する
場合、深い凹凸を得るためにはニッケルの表面から0.
5〜4μm、好ましくは2〜3μmの深さまでエッチン
グすることが好ましい。尚、このエッチング量は、エッ
チング前後でのニッケルの重量変化と、ニッケルの表面
積及び密度から算出した値である。また、エッチングに
際して、エッチング剤の温度は通常20〜40℃、エッ
チング時間は10秒〜2分が好ましく、エッチング速度
は通常0.5〜5μm/分である。
When the microetching agent of the present invention is used, in order to obtain deep irregularities, it is necessary to use a microetching agent from the nickel surface in order to obtain deep irregularities.
It is preferred to etch to a depth of 5-4 μm, preferably 2-3 μm. The amount of etching is a value calculated from a change in weight of nickel before and after etching and a surface area and density of nickel. Further, at the time of etching, the temperature of the etching agent is usually 20 to 40 ° C., the etching time is preferably 10 seconds to 2 minutes, and the etching rate is usually 0.5 to 5 μm / min.

【0014】処理されるニッケルの種類によっては、マ
イクロエッチングの前に予備的処理を行ってもよく、例
えば光沢電解ニッケルめっき膜の場合、凹凸をつくりや
すくするために、マイクロエッチングの前に150〜3
00℃で20〜60分間加熱するのが好ましい。
Depending on the type of nickel to be treated, a preliminary treatment may be performed before micro-etching. For example, in the case of a bright electrolytic nickel plating film, 150-150 3
It is preferred to heat at 00C for 20-60 minutes.

【0015】また、樹脂との接着性をさらに向上させる
ために、マイクロエッチングの後にシラン系やチタン系
のカップリング剤を塗布してもよく、防錆処理を行って
もよい。
In order to further improve the adhesiveness with the resin, a silane-based or titanium-based coupling agent may be applied after micro-etching, or a rust-proof treatment may be performed.

【0016】[0016]

【実施例】実施例1〜5および比較例1〜5 厚さ70μmの銅箔表面に、厚さ10μmの電解ニッケ
ルめっきを施した試験箔を作製した。次に表1に示す組
成のマイクロエッチング剤を調製し、これに前記試験箔
を25℃、60秒間の条件で浸漬し、ニッケル表面をエ
ッチングした。エッチング量を表1に示す。得られた表
面を3500倍の電子顕微鏡により観察したところ、実
施例1〜5で得られた表面は何れも深くて細かい凹凸が
形成されていたのに対し、比較例1〜5で得られた表面
は何れも実施例に比べて凹凸が大きく単位面積当りの数
も少なかった。次に、エッチングされた試験箔を、厚さ
0.15mmの多層配線板用プリプレグ(三菱瓦斯化学
(株)製のGEPL−170)と積層プレスした後、J
ISC 6481(1990)に準じて幅1cmの銅箔
を残して残りの銅箔を除去し、引き剥がし強さを測定し
た。その結果を表1に示す。
Examples 1 to 5 and Comparative Examples 1 to 5 Test foils were prepared by applying a 10 μm thick electrolytic nickel plating to a 70 μm thick copper foil surface. Next, a microetching agent having the composition shown in Table 1 was prepared, and the test foil was immersed in the microetching agent at 25 ° C. for 60 seconds to etch the nickel surface. Table 1 shows the etching amount. Observation of the obtained surface with a 3500-fold electron microscope revealed that the surfaces obtained in Examples 1 to 5 were all formed with deep and fine irregularities, whereas those obtained in Comparative Examples 1 to 5 were obtained. Each of the surfaces had large irregularities and a small number per unit area as compared with the examples. Next, the etched test foil was laminated and pressed with a prepreg for multilayer wiring board having a thickness of 0.15 mm (GEPL-170 manufactured by Mitsubishi Gas Chemical Co., Ltd.).
According to ISC 6481 (1990), the remaining copper foil was removed except for the copper foil having a width of 1 cm, and the peel strength was measured. Table 1 shows the results.

【0017】比較例6〜7 実施例1と同様に作製した試験箔を、バフ(♯240エ
メリーバフ)またはスクラブ(G20スチールグリッド
によるグリットグラスト)により研磨し、プリプレグと
の接着性を調べた。結果を表1に示す。
Comparative Examples 6 and 7 Test foils produced in the same manner as in Example 1 were polished with a buff (# 240 emery buff) or a scrub (grit grit with a G20 steel grid), and the adhesion to a prepreg was examined. Table 1 shows the results.

【0018】[0018]

【表1】 [Table 1]

【0019】注)サンフロック700 :三洋化成工業
(株)製のカチオン性高分子凝集剤 エポミンP-1000 :日本触媒(株)製の平均分子量1000
0 のポリエチレンイミン コンセンスCP-104:センカ(株)製の平均分子量200000
の第4級アンモニウム塩型のジアリルアミン重合体
Note) Sanfloc 700: a cationic polymer flocculant manufactured by Sanyo Chemical Industries, Ltd. Epomin P-1000: an average molecular weight of 1000 manufactured by Nippon Shokubai Co., Ltd.
Polyethyleneimine Consensic CP-104 having an average molecular weight of 200,000 manufactured by Senka Co., Ltd.
Quaternary ammonium salt type diallylamine polymer

【0020】表1に示す通り、実施例に示すマイクロエ
ッチング剤で処理することにより、プリプレグとニッケ
ルとを強固に接着することができる。
As shown in Table 1, the prepreg and nickel can be firmly bonded by treating with the micro-etching agent shown in the embodiment.

【0021】[0021]

【発明の効果】ニッケル表面を本発明のマイクロエッチ
ング剤で粗化することにより、例えばAS樹脂、ABS
樹脂、フッ素樹脂、ポリアミド,ポリエチレン、ポリエ
チレンテレフタレート、ポリ塩化ビニリデン、ポリ塩化
ビニル、ポリカーボネート、ポリスチレン、ポリサルホ
ン、ポリプロピレン、液晶ポリマー等の熱可塑性樹脂
や、エポキシ樹脂、フェノール樹脂、ポリイミド、ポリ
ウレタン、ビスマレイミド・トリアジン樹脂、変性ポリ
フェニレンエーテル等の熱硬化性樹脂等の種々の樹脂と
の接着性を向上させることができる。すなわち、例えば
接着剤、塗料、成形用樹脂やプリント配線板等の電子部
品用絶縁樹脂等との接着性を向上させることができる。
By roughening the nickel surface with the microetching agent of the present invention, for example, AS resin, ABS
Resin, fluororesin, polyamide, polyethylene, polyethylene terephthalate, polyvinylidene chloride, polyvinyl chloride, polycarbonate, polystyrene, polysulfone, polypropylene, thermoplastic resin such as liquid crystal polymer, epoxy resin, phenol resin, polyimide, polyurethane, bismaleimide Adhesion with various resins such as a thermosetting resin such as a triazine resin and a modified polyphenylene ether can be improved. That is, it is possible to improve the adhesiveness with, for example, an adhesive, a paint, a molding resin, or an insulating resin for electronic components such as a printed wiring board.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 塩化第二鉄5〜39重量%、塩酸0.0
1〜2重量%、ポリアミン鎖およびカチオン性基の少な
くとも一方を分子中に有する高分子化合物0.0000
01〜1重量%を含有する水溶液からなるニッケル用マ
イクロエッチング剤。
1. Ferric chloride 5 to 39% by weight, hydrochloric acid 0.0
0.000 to 1% by weight of a polymer compound having at least one of a polyamine chain and a cationic group in a molecule
A microetching agent for nickel comprising an aqueous solution containing from 01 to 1% by weight.
JP15016599A 1999-05-28 1999-05-28 Microetching agent for nickel Pending JP2000336491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15016599A JP2000336491A (en) 1999-05-28 1999-05-28 Microetching agent for nickel

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15016599A JP2000336491A (en) 1999-05-28 1999-05-28 Microetching agent for nickel

Publications (1)

Publication Number Publication Date
JP2000336491A true JP2000336491A (en) 2000-12-05

Family

ID=15490938

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15016599A Pending JP2000336491A (en) 1999-05-28 1999-05-28 Microetching agent for nickel

Country Status (1)

Country Link
JP (1) JP2000336491A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5219008B1 (en) * 2012-07-24 2013-06-26 メック株式会社 Copper microetching agent, replenisher thereof, and method for manufacturing wiring board
US9614214B2 (en) * 2004-12-16 2017-04-04 Lg Chem, Ltd. Method for improvement of performance of si thin film anode for lithium rechargeable battery
CN106702385A (en) * 2017-03-28 2017-05-24 江苏和达电子科技有限公司 Elective etching solution of nickel or nickel alloy, and preparation method and application thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9614214B2 (en) * 2004-12-16 2017-04-04 Lg Chem, Ltd. Method for improvement of performance of si thin film anode for lithium rechargeable battery
JP5219008B1 (en) * 2012-07-24 2013-06-26 メック株式会社 Copper microetching agent, replenisher thereof, and method for manufacturing wiring board
US9441303B2 (en) 2012-07-24 2016-09-13 Mec Company Ltd. Microetching solution for copper, replenishment solution therefor and method for production of wiring board
US9932678B2 (en) 2012-07-24 2018-04-03 Mec Company Ltd. Microetching solution for copper, replenishment solution therefor and method for production of wiring board
CN106702385A (en) * 2017-03-28 2017-05-24 江苏和达电子科技有限公司 Elective etching solution of nickel or nickel alloy, and preparation method and application thereof

Similar Documents

Publication Publication Date Title
US5965036A (en) Microetching composition for copper or copper alloy
US20050170077A1 (en) Adhesion method
WO2014017115A1 (en) Microetching agent for copper, replenishment solution thereof, and method for producing wiring board
TWI314845B (en) Conductive metal plated polyimide substrate and process for manufacturing the same
EP0103149B1 (en) Poly(arylene sulfide) printed circuit boards
CA2763981C (en) Anodically assisted chemical etching of conductive polymers and polymer composites
JPH0243370A (en) Improved method for pre-treating a polymer surface prior to its plating and an improved metal-plated plastic article formed by the method
JPH04211192A (en) Method of pretreating surface for plating polyimide surface
EP0182379A2 (en) Plating poly(arylene sulfide) surfaces
JP2014139347A (en) Method of treating surface of copper foil for printed circuit, copper foil produced by the same and plating apparatus for the same
JP3916203B2 (en) Surface roughening agent for aluminum or aluminum alloy and surface roughening method using the same
JP2000336491A (en) Microetching agent for nickel
WO2009141909A1 (en) Method for conditioning insulating resin and its use
JP4769209B2 (en) Insulating resin conditioning method and use thereof
JP2001040490A (en) Microetching agent for iron-nickel alloy and surface roughening method suing it
JPS63168077A (en) Manufacture of printed wiring board
JPS6190497A (en) Roughing of resin layer securely without corrosion and cracking
JP2006077289A (en) Pretreatment method for electroless plating, and pretreatment liquid used therefor
JP2007262481A (en) Surface metallizing method of polyimide resin material
US6063445A (en) Method of preparation of polymer substrates for metal plating
JP3885165B2 (en) Method for modifying polyethylene terephthalate molded body surface, modified surface of polyethylene terephthalate molded body and printed wiring board
JP2006253424A (en) Method of manufacturing printed wiring board
WO2008005094A2 (en) Process for increasing the adhesion of a metal surface to a polymer
JP2003183841A (en) Pretreatment process of electroless plating material
JPS63196091A (en) Manufacture of circuit board

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Effective date: 20060425

Free format text: JAPANESE INTERMEDIATE CODE: A7424