JP2000330116A - Liquid crystal display device and its production - Google Patents

Liquid crystal display device and its production

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Publication number
JP2000330116A
JP2000330116A JP14170199A JP14170199A JP2000330116A JP 2000330116 A JP2000330116 A JP 2000330116A JP 14170199 A JP14170199 A JP 14170199A JP 14170199 A JP14170199 A JP 14170199A JP 2000330116 A JP2000330116 A JP 2000330116A
Authority
JP
Japan
Prior art keywords
liquid crystal
substrate
crystal display
substrates
display device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14170199A
Other languages
Japanese (ja)
Other versions
JP4354572B2 (en
JP2000330116A5 (en
Inventor
Tadahiro Kaneko
直裕 金子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP14170199A priority Critical patent/JP4354572B2/en
Publication of JP2000330116A publication Critical patent/JP2000330116A/en
Publication of JP2000330116A5 publication Critical patent/JP2000330116A5/ja
Application granted granted Critical
Publication of JP4354572B2 publication Critical patent/JP4354572B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

PROBLEM TO BE SOLVED: To prevent irregularity in display contrast and an image sticking caused with time in a liquid crystal display device having an insulating film on one substrate, by disposing alignment films having different holding rates. SOLUTION: In the liquid crystal display having a pair of substrates 11A, 11B having transparent electrodes 12, a liquid crystal sealed between the substrates, and an insulating film 13 formed on one substrate 11B to prevent short circuits between the upper and lower substrates, alignment films 14 having mutually different holding rates are arranged. After polyimide alignment films are formed on both of the substrates 11A, 11B, the substrate 11A is calcined at 280 deg.C, while the substrate 11B is baked at 200 deg.C. When the alignment films 14 are baked under the aforementioned production conditions, the substrate 11A has a higher holding rate by >=5% than the substrate 11B. Or, in the process of forming polyimide alignment films on both of the substrates 11A, 11B, an alignment film having 95% holding rate is applied on the substrate 11A, while an alignment film having 70% holding rate is applied on the substrate 11B, and then both are baked. By this method, the substrate 11A has a higher holding rate than the substrate 11B.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液晶表示素子及び
その製造方法に関するものである。
The present invention relates to a liquid crystal display device and a method for manufacturing the same.

【0002】[0002]

【従来の技術】図4は、一般的に現在使用されている液
晶表示素子の一例を示す。上下2枚で一対をなす基板1
A及び1Bの表面に対向する形でそれぞれの面に透明電
極膜2A及び2Bがパターン形成されてる。透明電極上
には製造時に発生したゴミ等の影響で短絡するのを防止
する絶縁膜3Aと3Bが形成されている。この様に形成
された両基板の上に配向膜4Aと4Bを塗布しラビング
処理を行い配向を行う。
2. Description of the Related Art FIG. 4 shows an example of a liquid crystal display device generally used at present. A pair of upper and lower substrates 1
Transparent electrode films 2A and 2B are pattern-formed on the respective surfaces so as to face the surfaces of A and 1B. Insulating films 3A and 3B are formed on the transparent electrode to prevent a short circuit due to dust or the like generated during manufacturing. The alignment films 4A and 4B are applied on both substrates thus formed, and rubbing is performed to perform alignment.

【0003】さらに枠状のシール5A及び5Bを片側基
板上に形成した後、両基板1A、1Bを一定の間隔をも
った形で接合し、その隙間に液晶6を封入することで液
晶表示素子が得られる。その過程において通常絶縁膜3
A、3Bは、透明電極基板の両面に配置する方が等価回
路的に対称な構造となるため短絡状態を防止するには理
想的である。
Further, after forming frame-shaped seals 5A and 5B on one side substrate, the two substrates 1A and 1B are joined at a predetermined interval, and a liquid crystal 6 is sealed in the gap to thereby provide a liquid crystal display element. Is obtained. In the process, usually the insulating film 3
A and 3B are ideal for preventing a short circuit state because they are more symmetrically equivalent in terms of equivalent circuit when disposed on both surfaces of the transparent electrode substrate.

【0004】しかし、片面側のみに絶縁膜層を配置した
場合でも短絡を抑えることは可能であり、製造上の工数
から考えるとコスト的にも有利となる。図5は、片面側
のみの絶縁層を設けた液晶パネルを示す。基板1B上に
透明電極膜2Bと、絶縁膜3Bと配向膜4Bがあり、対
向する基板1A上に透明電極2Aがあり、基板1Aと1
B間にシール5Aと5Bにより間隔を設け、液晶6を注
入したものである。従って製造の工数から考えると片側
基板のみに絶縁膜を塗布する製造方法も利用されてい
る。
[0004] However, even when the insulating film layer is arranged only on one side, it is possible to suppress the short circuit, and it is advantageous in terms of cost from the viewpoint of the number of manufacturing steps. FIG. 5 shows a liquid crystal panel provided with an insulating layer only on one side. A transparent electrode film 2B, an insulating film 3B and an alignment film 4B are provided on a substrate 1B, and a transparent electrode 2A is provided on an opposing substrate 1A.
A liquid crystal 6 is injected between B by providing an interval between the seals 5A and 5B. Therefore, from the viewpoint of the number of manufacturing steps, a manufacturing method in which an insulating film is applied only to one substrate is also used.

【0005】[0005]

【発明が解決しようとする課題】しかし、上述した様に
片側の絶縁膜を形成した場合、電気的に等価回路となら
ない事と、絶縁膜側の保持率が高くなってしまう。した
がって液晶素子にスタティック波形またはマルチプレッ
クス波形を印加しながら高温動作試験を実施した場合、
たとえば120h試験終了後に表示コントラストムラ等
が発生してしまう。
However, when the insulating film on one side is formed as described above, an electrically equivalent circuit is not obtained, and the holding ratio on the insulating film side is increased. Therefore, when performing a high-temperature operation test while applying a static waveform or a multiplex waveform to the liquid crystal element,
For example, display contrast unevenness or the like occurs after the end of the 120 h test.

【0006】この表示コントラストムラは、液晶表示素
子に対して対称な電界が印加されて無い為に直流成分が
発生し、液晶材料中や配向膜に付着しているイオン成分
が片側基板、特に印加した場所に吸着し易いことが実験
的に明らかにされている。このイオン成分が配向膜上に
吸着した場合、配向膜上に電気2重層を形成し、イオン
が吸着した電気2重層部分とイオンの吸着ていない部分
で、液晶に印加される電圧が異なり表示コントラストム
ラとして観察される。よって従来技術では、高温信頼性
試験を行った場合に経時的表示コントラストムラが発生
していた。
In the display contrast unevenness, since a symmetric electric field is not applied to the liquid crystal display element, a DC component is generated, and an ionic component adhering to the liquid crystal material or the alignment film is applied to the one-side substrate, especially when the It has been clarified experimentally that it is easy to be adsorbed to a place where it has occurred. When this ion component is adsorbed on the alignment film, an electric double layer is formed on the alignment film, and the voltage applied to the liquid crystal differs between the electric double layer portion where the ions are adsorbed and the portion where the ions are not adsorbed. It is observed as unevenness. Therefore, in the related art, when the high-temperature reliability test was performed, the display contrast unevenness over time occurred.

【0007】[0007]

【課題を解決するための手段】本願発明は上記問題を解
決するためのものであり、上述したように透明電極を有
する一対の基板と、この一対の基板の間隔に液晶を封入
した液晶素子の上下基板の短絡を防ぐために少なくとも
片側基板に絶縁膜を設ける液晶素子において,配向膜の
保持率の違う配向膜を配置することを特徴とし、表示ム
ラの無い液晶表示素子を提供する。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems. As described above, a pair of substrates having transparent electrodes and a liquid crystal element in which liquid crystal is sealed between the pair of substrates are provided. Provided is a liquid crystal display element having no display unevenness, characterized in that, in a liquid crystal element in which an insulating film is provided on at least one substrate to prevent a short circuit between upper and lower substrates, alignment films having different holding ratios of the alignment film are arranged.

【0008】[0008]

【発明の実施の形態】本発明の液晶表示素子の製造方法
は、透明電極を有する一対の基板上に、製造時発生した
異物等の影響で短絡するのを防止する絶縁膜が形成され
ている液晶表示素子において保持率の違う配向膜を配置
することにより電圧印加して発生する印加ムラ等を回避
する液晶光学素子を提供する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS In a method for manufacturing a liquid crystal display device according to the present invention, an insulating film for preventing short circuit due to the influence of foreign matter or the like generated during manufacturing is formed on a pair of substrates having transparent electrodes. Provided is a liquid crystal optical element in which alignment films having different holding ratios are arranged in a liquid crystal display element to avoid application unevenness or the like generated by applying a voltage.

【0009】以下に、本発明の実施形態を示す。 (実施例1)液晶表示素子および製造方法について、図
1に基づいて実施例を説明する。上下2枚で一対のガラ
ス等を利用した基板11A及び11Bの表面に対向する
それぞれの面に、ITO(酸化インジウムや酸化スズ)
で形成された透明電極膜12が配置されている。透明電
極膜12上には、製造時に発生する異物等のゴミの影響
で起こる短絡防止のためのSiO2からなる絶縁膜13
が形成されている。この様に形成された両基板の上にポ
リイミドの配向膜14を塗布後、焼成しラビング処理法
で配向を行う。
An embodiment of the present invention will be described below. (Example 1) An example of a liquid crystal display element and a manufacturing method will be described with reference to FIG. ITO (indium oxide or tin oxide) is provided on each of the upper and lower substrates 11A and 11B, which use a pair of glass or the like, facing the surfaces of the substrates.
Is disposed. An insulating film 13 made of SiO2 is provided on the transparent electrode film 12 to prevent a short circuit caused by the influence of dust such as foreign matter generated during manufacturing.
Are formed. After a polyimide alignment film 14 is applied on both substrates formed in this way, it is baked and aligned by a rubbing method.

【0010】さらにスペーサを混ぜた熱硬化樹脂や紫外
線硬化樹脂にシール材15を、片側基板上に枠状形成し
た後、両基板を一定の間隔で接合し、その隙間に液晶1
6を封入することで液晶素子を得る。ここで対向する片
側に絶縁膜の形成を行わないガラス基板11Aと絶縁膜
の形成を行う基板11Bにおいて基板1A、基板11B
共にポリイミド配向膜形成後、基板11Aに280℃焼
成を行い、基板11Bには200℃焼成を行う。このよ
うな製造条件で配向膜を焼成を行った場合、11A基板
は11B基板より保持率が5%以上高く出来上がる。 (実施例2)液晶表示素子および製造方法について、図
1に基づいて実施例を説明する。上下2枚で一対のガラ
スを使用した基板11及び、11Bの表面に対向する対
向するそれぞれの面に、通常ITO(酸化インジウムや
酸化スズ)で形成された透明電極膜12が配置されて
る。透明電極膜12上には製造時に発生しする異物等の
ゴミの影響で起こる短絡防止のためのSiO2からなる
絶縁膜13が形成されている。
Further, after a sealing material 15 is formed on a thermosetting resin or an ultraviolet curable resin mixed with a spacer on a one-sided substrate, both substrates are joined at a predetermined interval, and a liquid crystal 1 is inserted into the gap.
A liquid crystal element is obtained by enclosing 6. Here, a substrate 1A and a substrate 11B are formed of a glass substrate 11A on which an insulating film is not formed on one side and a substrate 11B on which an insulating film is formed.
In both cases, after forming the polyimide alignment film, the substrate 11A is baked at 280 ° C., and the substrate 11B is baked at 200 ° C. When the alignment film is baked under such manufacturing conditions, the holding ratio of the 11A substrate is higher than that of the 11B substrate by 5% or more. Example 2 An example of a liquid crystal display device and a manufacturing method will be described with reference to FIG. A transparent electrode film 12 usually made of ITO (indium oxide or tin oxide) is disposed on each of the upper and lower substrates 11 using a pair of glass and the opposing surfaces opposing the surface of 11B. An insulating film 13 made of SiO 2 is formed on the transparent electrode film 12 to prevent a short circuit caused by dust or other foreign matter generated during manufacturing.

【0011】この様に形成された両基板の上にポリイミ
ドの配向膜14を塗布後、焼成しラビング処理法で配向
を行う。さらに枠状の熱硬化樹脂や紫外線硬化樹脂にス
ペーサ15を混ぜたシール材を片側基板上に形成した
後、両基板を一定の間隔をもった形で接合し、その隙間
に液晶を封入することで液晶素子を得る。ここで対向す
る片側に絶縁膜配置を行わないガラスの基板11Aと絶
縁膜の配置を行う基板11Bにおいて、基板11A、基
板11B共にポリイミド配向膜形成時に、基板11Aに
は保持率が高い95%の保持率を持つ配向膜を塗布し、
基板11Bには保持率が低い70%の保持率を持つ配向
膜を塗布して焼成を行う。この場合、基板11Aは基板
11Bより保持率が高く出来上がる。以上の製造方法に
より、印加時に発生する表示コントラストムラを回避さ
せることが出来た。 (比較例)次に、従来技術と本発明を行った時の表示ム
ラ及び焼き付きについての比較例を述べる。図2は、基
板11A及び基板11Bを同じ焼成温度で行った時、液
晶にスタティック波形21を印加した場合の透過率の変
化を電圧に変換した透過光強度値22である。
After a polyimide alignment film 14 is applied on both substrates thus formed, they are baked and aligned by a rubbing method. Furthermore, after forming a sealing material in which a spacer 15 is mixed with a frame-shaped thermosetting resin or an ultraviolet-curing resin on one side substrate, the two substrates are joined at a fixed interval, and a liquid crystal is sealed in the gap. To obtain a liquid crystal element. Here, in the glass substrate 11A on which the insulating film is not disposed on one side facing the other and the substrate 11B on which the insulating film is disposed, the substrate 11A and the substrate 11B both have a high holding ratio of 95% when the polyimide alignment film is formed. Apply an orientation film with a retention rate,
On the substrate 11B, an orientation film having a low retention of 70% is applied and baked. In this case, the holding ratio of the substrate 11A is higher than that of the substrate 11B. With the above-described manufacturing method, it was possible to avoid display contrast unevenness occurring at the time of application. (Comparative Example) Next, a comparative example of display unevenness and burn-in when the prior art and the present invention are performed will be described. FIG. 2 shows a transmitted light intensity value 22 obtained by converting a change in transmittance when a static waveform 21 is applied to the liquid crystal into a voltage when the substrate 11A and the substrate 11B are performed at the same firing temperature.

【0012】図2から解る通り、電位が対称なスタティ
ック波形をかけているにもかかわらず、プラス側とマイ
ナス側の透過光強度の振幅変化が一定にならない。これ
は、液晶分子に印加する電圧が対称にもかかわらず、片
側基板だけ保持率が異なっているため液晶材料に印加さ
れる波形が擬似的なDCバイアスがかかった場合と同じ
状態になっている。この様な液晶表示素子を60℃環境
で連続駆動した場合、液晶に含まれているイオンが片側
基板表面の配向膜に吸着し易くなり、信頼性が悪い液晶
表示素子となる。
As can be seen from FIG. 2, the amplitude change of the transmitted light intensity on the plus side and the minus side is not constant even though a static waveform having a symmetric potential is applied. This is because the waveform applied to the liquid crystal material is in the same state as when a pseudo DC bias is applied because the holding ratio is different only on one side of the substrate despite the symmetry of the voltage applied to the liquid crystal molecules. . When such a liquid crystal display element is continuously driven in a 60 ° C. environment, ions contained in the liquid crystal are easily adsorbed to the alignment film on the surface of the one-sided substrate, resulting in a liquid crystal display element having poor reliability.

【0013】そこで、本発明を行った液晶表示素子の波
形を図3に示す。図3は、液晶にスタティック波形31
を印加した場合の透過光強度32の変化を示している。
従来技術の液晶表示素子の電圧波形とくらべて、本発明
の液晶表示技術の波形は、振幅が対称の波形となってい
る。本発明の液晶表示素子を60℃環境に連続駆動して
試験した場合、従来技術の液晶表示素子と比べてコント
ラストムラ及び焼き付きを抑えることが可能になる。
FIG. 3 shows a waveform of the liquid crystal display device according to the present invention. FIG. 3 shows a static waveform 31 on the liquid crystal.
Shows the change in the transmitted light intensity 32 when.
Compared with the voltage waveform of the conventional liquid crystal display device, the waveform of the liquid crystal display technology of the present invention has a waveform whose amplitude is symmetric. When the liquid crystal display device of the present invention is continuously driven and tested in a 60 ° C. environment, contrast unevenness and image sticking can be suppressed as compared with the conventional liquid crystal display device.

【0014】[0014]

【発明の効果】以上のような構成により、本発明は片側
基板に絶縁膜を設けた液晶表示素子において、保持率が
異なる配向膜を配置することにより経時的に発生する表
示コントラストムラ及び焼き付きを抑えることが可能と
なる液晶表示素子を提供することが出来る。
According to the above-described structure, the present invention provides a liquid crystal display device having an insulating film provided on one side of a substrate. A liquid crystal display element that can be suppressed can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を示す液晶表示素子の断面図FIG. 1 is a sectional view of a liquid crystal display device showing an embodiment of the present invention.

【図2】従来技術の印加波形と透過光強度の関係FIG. 2 shows the relationship between the applied waveform and the transmitted light intensity according to the prior art.

【図3】本発明の印加波形と透過光強度の関係FIG. 3 shows a relationship between an applied waveform and transmitted light intensity according to the present invention.

【図4】従来技術の液晶表示素子の断面図FIG. 4 is a sectional view of a conventional liquid crystal display device.

【図5】従来技術の液晶表示素子の断面図FIG. 5 is a sectional view of a conventional liquid crystal display device.

【符号の説明】[Explanation of symbols]

11 基板 12 透明電極膜 13 絶縁膜 14 配向膜 15 シール 21 印加電圧 22、31 透過光強度 32 印加電圧波形 DESCRIPTION OF SYMBOLS 11 Substrate 12 Transparent electrode film 13 Insulating film 14 Alignment film 15 Seal 21 Applied voltage 22, 31 Transmitted light intensity 32 Applied voltage waveform

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 表面に電極と配向膜が形成された2枚の
基板の間に液晶が封入され、少なくとも一方基板上の電
極と配向膜間に絶縁膜層を有する液晶表示素子におい
て、 前記2枚の基板の前記配向膜の保持率が互いに異なるこ
とを特徴とする液晶表示素子。
1. A liquid crystal display device having a liquid crystal sealed between two substrates each having an electrode and an alignment film formed on a surface thereof, and having an insulating film layer between the electrode and the alignment film on at least one of the substrates. A liquid crystal display element, wherein the holding ratios of the alignment films of two substrates are different from each other.
【請求項2】 前記配向膜の保持率が5%以上異なる請
求項1記載液晶表示装置。
2. The liquid crystal display device according to claim 1, wherein the holding ratio of the alignment film differs by 5% or more.
【請求項3】 表面に電極が形成された2枚の基板の間
に液晶が封入され、少なくとも一方の電極層の上に形成
された絶縁膜層と配向膜を設けた液晶表示素子の製造方
法において、 一方の絶縁層上に形成する配向膜の焼成温度と、透明電
極上に形成する配向膜の焼成温度が異なることを特徴と
する液晶表示素子の製造方法。
3. A method of manufacturing a liquid crystal display element, in which a liquid crystal is sealed between two substrates having electrodes formed on the surface, and an insulating film layer and an alignment film formed on at least one electrode layer are provided. 3. The method for manufacturing a liquid crystal display device according to claim 1, wherein a firing temperature of an alignment film formed on one of the insulating layers is different from a firing temperature of an alignment film formed on the transparent electrode.
【請求項4】 前記絶縁層上に形成する前記配向膜の焼
成温度と、前記透明電極上に形成する前記配向膜の焼成
温度差を20℃以上にしたことを特徴とする液晶表示素
子の製造方法。
4. A manufacturing method of a liquid crystal display device, wherein a difference between a firing temperature of the alignment film formed on the insulating layer and a firing temperature of the alignment film formed on the transparent electrode is 20 ° C. or more. Method.
JP14170199A 1999-05-21 1999-05-21 Liquid crystal display device and method for manufacturing liquid crystal display element Expired - Lifetime JP4354572B2 (en)

Priority Applications (1)

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JP2000330116A true JP2000330116A (en) 2000-11-30
JP2000330116A5 JP2000330116A5 (en) 2006-07-06
JP4354572B2 JP4354572B2 (en) 2009-10-28

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011081427A (en) * 2000-05-12 2011-04-21 Samsung Electronics Co Ltd Liquid crystal display device and substrate used for the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011081427A (en) * 2000-05-12 2011-04-21 Samsung Electronics Co Ltd Liquid crystal display device and substrate used for the same

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