JP2000310588A - Method for observing and recording/reproducing surface - Google Patents

Abstract

PROBLEM TO BE SOLVED: To eliminate an effect of adhering substances and correctly observe a medium surface by applying a force to between a probe tip and a surface for cleaning thereby removing deposit of the probe tip, and observing an interaction acting between the probe and medium. SOLUTION: A probe consisting of a probe 101 and a supporting elastic body scans a medium and detects an interaction between the probe 101 and the medium. In other words, a relative position of the medium and a tip of the probe 101 is controlled to move in a horizontal and a vertical directions of the medium. A position of the tip of the probe 101 is moved to a position where to detect and the medium is scanned. The interaction is directly observed and detected from a current flowing between the probe 101 and medium, or the like. In this case, the probe 101 is brought into contact with a surface 103 for cleaning and pressed in an arrow direction, so that the deposit 102 of the probe 101 is moved to the surface 103 for cleaning and removed. A pressing force is applied by moving a root of the elastic body in a direction for the probe 101 to press the surface 103 for cleaning. An effect of the deposit 102 is eliminated and a correct observation image can be obtained.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scanning microscope and a method for applying the scanning microscope to scan a probe to observe the surface of a medium or reproduce recorded information on a nanometer scale. It is an object of the present invention to realize a surface observation / recording / reproducing method capable of more accurately observing the surface of a medium or reproducing information recorded on the medium by removing the adhered substances.

[0002]

2. Description of the Related Art In recent years, a scanning tunneling microscope (hereinafter, referred to as STM) capable of observing the surface of a substance with an atomic order resolution [G. Binnig et al. , Physic
al Review Letters, Vol. 49, p. 57 (1982)], and real-space observation at the atomic and molecular levels has become possible. The scanning tunneling microscope scans while controlling the distance between the probe electrode and the sample so as to keep the tunnel current constant, and from the control signal at that time, the information of the electron cloud on the sample surface and the shape of the sample in sub-nanometer order. Can be observed. An atomic force microscope (AFM) has been developed as a means for observing the surface of a substance at a high resolution. STM or AF
For example, a scanning probe microscope (SP) is generally used to perform two-dimensional scanning of the sample surface using a probe and observe physical information on the sample surface from the interaction between the probe and the sample surface.
M), which has attracted attention as a high-resolution (atomic or nanometer scale) surface observation means.
In particular, the AFM has an advantage that the surface shape can be observed even when the observation medium is insulative. There is also a means of applying AFM and using a probe supported by an elastic body to detect an interaction acting between the probe and the observation medium as a force.
A scanning magnetic force microscope and the like are mentioned as examples. Also, if the principle of SPM is applied, it is possible to reproduce information written on an atomic level and on a nanometer scale.
Such reproduction is described in, for example, JP-A-63-1615.
No. 53 discloses this.

[0003] Among the methods of observing and reproducing information at the atomic level and the nanometer scale using the SPM or SPM technology, there are various methods in which a probe is supported on an elastic body by applying AFM. There are advantages. For example, when the medium is scanned while the tip of the probe is in contact, the medium surface shape information can be obtained by a method similar to the conventional AFM operation, and from this information, other physical information can be obtained at a necessary place. Also, a tapping AFM that scans the medium surface while hitting the probe even if the medium is not always in contact, or a non-contact AFM in which the probe does not contact the medium.
It is possible to obtain the surface shape of the sample by a technique referred to as: In addition, even if the normal AFM operation is not performed, if the scanning is performed by bringing the probe tip into contact with the medium and using the restoring force of the elastic body to press the probe tip against the medium, no special control is performed. This also has the advantage that the tip of the probe is located on the medium surface. This makes it possible to reproduce information without strictly controlling the position in the direction perpendicular to the medium.

[0004]

However, by applying the technique of AFM in this way, the probe is brought into contact with the medium,
Alternatively, when the medium is brought close to the medium, impurities and the like on the medium may adhere to the probe. At this time, the interaction that occurs between the probe and the medium differs from the case where there is no attached matter, and correct information cannot be obtained. That is, a correct image cannot be obtained when observing the surface, and correct information cannot be reproduced when reproducing information.

Therefore, the present invention solves the above-mentioned problems, eliminates the influence of the attached matter at the tip of the probe, and more accurately observes the surface of the medium or reproduces information recorded on the medium. It is an object of the present invention to provide a recording / reproducing method.

[0006]

In order to achieve the above object, the present invention is characterized in that a surface observation / recording / reproducing method is configured as follows. That is, the surface observation / recording / reproducing method of the present invention scans a medium formed by a probe composed of a probe and an elastic body supporting the probe, and observes the surface of the medium or information recorded on the medium. Controlling the relative position of the probe and the medium, and scanning the probe with the medium, and operating the probe between the probe and the medium. Observing the action, and bringing the tip of the probe into contact with a cleaning surface for removing a substance attached to the tip of the probe, and applying a force between the probe tip and the cleaning surface. And removing at least one of the deposits on the tip of the probe by applying the voltage.
Further, the surface observation / recording / reproducing method according to the present invention is characterized in that the method includes a step of reading and reproducing information recorded in advance on the recording medium based on the observed interaction. Further, in the surface observation / recording / reproducing method of the present invention, in the step of removing the deposits on the tip of the probe, the step of moving the tip of the probe and the surface for cleaning in a direction parallel to the surface for cleaning is simultaneously performed. It is characterized by performing. Further, in the surface observation / recording / reproducing method of the present invention, in the step of removing the adhering matter at the tip of the probe, the magnitude of the force applied between the tip of the probe and the cleaning surface may be different from each other. In the step of observing the action, when observing the interaction with the probe in contact with the medium, the probe
It is characterized by being greater than the force acting between the media. Further, the surface observation / recording / reproducing method of the present invention is characterized in that the cleaning surface is a dedicated cleaning area for removing the attached matter at the tip of the probe.
Further, in the surface observation / recording / reproducing method of the present invention, the dedicated cleaning area has a convex portion that comes into contact with the tip of the probe, and applies a force to the tip of the probe by contact with the convex portion. It is characterized in that the deposits on the tip of the probe are removed. Further, the surface observation / recording / reproducing method of the present invention is characterized in that the dedicated cleaning area is formed of a material having a lower hardness than the material of the tip of the probe. Further, in the surface observation / recording / reproducing method of the present invention, the force applied between the probe tip and the cleaning surface is an electrostatic force acting between the cleaning surface and the probe. And Further, the surface observation / recording / reproducing method of the present invention is characterized in that at least two or more probes are provided.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention attains the above-described object of the present invention by the above-described configuration. In the above-described configuration of the present invention, the interaction with a medium is observed by a probe. In the case of observation with a probe microscope, it is an observation medium, and in the case of a reproduction method using a probe, it is an information recording medium. In the present invention, the probe is supported by an elastic body. The elastic body is generally a leaf spring called a cantilever used in the AFM. In this specification, a probe and an elastic body are collectively called a probe. The probe detects the interaction with the medium. The interaction is caused by an electromagnetic field including a force, an electric field, a magnetic field, light, and the like. Also, a current flowing between the probe and the medium is included. In detecting the interaction, a force generated by the interaction may be detected, or the interaction may be directly observed. An example of the former is a magnetic force microscope that uses a magnetic material as a probe and detects a magnetic field generated by a medium as a magnetic force. The latter includes a current flowing between the probe and the medium. The step of controlling the positions of the medium and the probe moves the relative position of the medium and the tip of the probe in a direction horizontal to the medium (hereinafter referred to as the XY direction) and a direction perpendicular to the medium (hereinafter referred to as the Z direction). . With this operation, the position of the tip of the probe is moved to the position where the interaction is to be detected. If the interaction between the probe and the medium is detected and two-dimensional mapping is performed, it functions as a microscope, and if the recording bit or the like recorded as a state change on the medium is detected, a reproducing operation can be performed. The cleaning surface may be anything that can directly apply a force by contacting the probe. The cleaning surface may be the medium itself to be observed, may be prepared separately from the medium, or may be provided in an apparatus having a probe to be observed. In the present invention, the attached matter attached to the probe is removed in a state where the probe is in contact with the cleaning surface. This deposit should not be present, but has been accidentally deposited from the surface of the medium or from the atmosphere around the probe, which causes the probe to detect the correct interaction with the medium. You will not be able to do it.

FIG. 1 is a view for explaining the step of removing the deposit. An attachment 102 is attached to the probe 101. The probe 101 is brought into contact with the cleaning surface 103 and the probe is pressed in the direction shown in the figure. This force is generally applied by pressing the root of the elastic body supporting the probe in a direction in which the probe presses the cleaning surface (FIG. 2). In FIG. 2, the probe 101 is supported by the cantilever 201,
Reference numeral 2 denotes a mounting portion of the cantilever 201. By moving the cantilever 201 mounting portion in the direction of the arrow shown in the figure, the cantilever 201 bends and the probe 10
A force as shown in FIG. 1 can be applied to one tip.
The force acting between the tip of the probe and the cleaning surface is not limited to the example shown in FIG. 2 and may be any force that acts in a contact state. The removal of the deposit refers to the removal of the deposit from between the tip of the probe and the medium. After the removal, the deposit may be transferred to the cleaning surface (FIG. 3). It may move from the tip of the probe to the side wall of the probe (FIG. 4). By this series of operations, the interaction with the medium can be detected with less influence of the attached matter, and a correct observation image can be obtained.

[0009] In addition, it is possible to realize an information reproducing method of reading information from a medium on which information is recorded by reading information recorded on the medium in advance based on the observed interaction and reproducing the information. It becomes possible. In this case, the medium is generally called a recording medium, and information is recorded on the recording medium based on information to be recorded in advance. Therefore, in the present invention, by performing this step based on the observed surface information, the recorded information from the recording medium is reproduced. According to the present invention, the interaction with the medium can be detected by reducing the influence of the attached matter, and the recorded information can be reproduced more correctly.

In the step of applying a force between the tip of the probe and the surface for cleaning, the step of moving the tip of the probe and the surface for cleaning in a direction parallel to the surface for cleaning is performed simultaneously. Thereby, the deposit can be more effectively removed. This means that deposits can be more effectively removed by displacing the probe in parallel (in the X and Y directions) to the cleaning surface so as to drag the probe while applying force.

In the case where the interaction between the probe and the medium is observed when the interaction between the medium and the medium is observed using the probe, the observation between the tip and the cleaning surface may be performed. In the step of applying a force therebetween, the magnitude of the applied force is made larger than the force acting between the probe tip and the medium in the step of observing the interaction, so that the adhered substance can be more reliably attached. Can be removed. The case shown here is a case where the probe detects an interaction in a state in which the probe is in contact with the medium. At this time, a force is often applied between the probe and the medium. For example, when detecting a current flowing between the probe and the medium, a voltage is applied between the probe and the medium, and an electrostatic force is generated between the two. Further, in the AFM, the probe is observed in a state where an atomic force acts between the probe and the medium, and the force is still working. In these cases, a certain amount of extraneous matter can be removed by the force applied between the probe and the medium during these observations.However, in order to remove extraneous matter that is not removed, the interaction must be detected. It can be removed by applying a force greater than the force applied between the probe and the medium while it is present.

Further, by providing a dedicated cleaning area for removing the attached matter at the tip of the probe, and removing the attached matter at the tip of the probe in the area, the influence of the removed attached matter is reduced. be able to. This is because if the removed deposits remain on the medium as shown in FIG. 3, when the place is observed again, the influence of the removed deposits may occur, or the place may be searched again. When the needle passes, it may move to the probe again. By providing a dedicated area (cleaning area) for removing the attached matter at the tip of the probe and removing the attached matter at the tip of the probe, the influence of the removed matter can be avoided. The cleaning-dedicated area may be provided on the medium, or a cleaning area separately provided may be prepared.
Further, it may be installed in a device having a probe.

[0013] As a specific means for generating a force between the probe and the cleaning surface to remove deposits on the tip of the probe, a convex portion is provided in the cleaning area, and the probe is attached to the convex portion. There is a method in which a force is applied to the tip of the probe by bringing the probe into contact. This is a method shown in FIG. 5, and in FIG. 5, reference numeral 501 denotes a convex portion. FIG. 5 shows the positions of the probe 101 and the cantilever 201. When the tip of the probe comes to the projection 501, the cantilever 201
The tip of the probe 101 automatically comes into contact with the convex portion 501 without adjusting the position of the mounting portion 202, and a force is applied. FIG.
In FIG. 7, the dotted line shows a state when the attached matter is not removed.

Further, as a specific means for generating a force between the probe and the cleaning surface to remove the deposits on the tip of the probe, an electrostatic force acting between the cleaning surface and the probe is used. be able to. This is to apply a voltage between the probe and the cleaning surface or between the elastic body and the cleaning surface to generate an electrostatic force to generate a force between the probe tip and the cleaning surface. Can be. This force is not limited to the outermost surface of the cleaning surface, but may be an electrostatic force acting between the lower portion and the probe when an insulating film is present on the surface.

The method of providing the convex portion and the method of using the electrostatic force can apply a force only to a desired tip of the probe when removing the attached matter at the tip of the probe supported by a plurality of elastic members. This has the advantage that the required force need not be applied to other probes. FIG. 6 shows a method of applying a force by applying a probe tip supported by a plurality of elastic bodies to a convex portion. 6 in the figure
01 to 604 are probes, and each probe is supported by an elastic cantilever 605 to 608. 6
Reference numeral 09 denotes a projection provided in the cleaning-dedicated area 610. The figure shows a state in which the attached matter at the tip of the probe 602 supported by the cantilever 606 is removed from the group of cantilevers and probes. The size of the protrusion 609 in the X and Y directions is about the distance between two adjacent probes, only one probe 602 contacts the protrusion 609, and a force is applied to the tip of the probe. In addition, it is also possible to bring all the probes into contact with each other, bring the probe 602 into contact with the convex portion, and flex the cantilever 606 only greatly to apply a greater force to the tip of the probe 602 than to the other tips. . In this manner, a force for removing adhering matter can be applied only to a specific one of the probes supported by the plurality of cantilevers.

In the method using an electrostatic force, if an electrostatic force is generated by applying a voltage between a specific probe or a cantilever and a cleaning surface, it is possible to remove an adhering substance only at the specific probe tip. And unnecessary force is not applied to the other tips. Further, by making the hardness of the dedicated cleaning area lower than that of the material of the tip of the probe, it is possible to suppress a phenomenon that the probe is chipped and deteriorated when removing an accessory.

[0017]

Embodiments of the present invention will be described below. Embodiment 1 Embodiment 1 according to the present invention will be described. FIG. 7 is a diagram for explaining an AFM device used in performing the surface observation method of the present embodiment. AF used in this embodiment
The M device is composed of an observation sample 701, a probe 702, a cantilever 703, a laser 704, a two-part sensor 705, a deflection detector 706, a Z-direction position control circuit 707, a medium stage 708, a medium stage drive mechanism 709, an XY-direction position control circuit 710, a microcomputer 711, and a display 712. Have been. Observation sample 701 used in this example
Is a silicon substrate, but the storage place before observation according to the present example was not a particularly clean atmosphere. The probe 702 has a square cone shape silicon nitride, and the cantilever 703 for supporting the same is also made of silicon nitride.
2 and cantilever 703 are the same as those used in normal AFM. Observation sample 70 of cantilever 703
The surface opposite to 1 is coated with Au to increase the light reflectance. The spring constant of the cantilever used in this embodiment is 0.5.
It was 05 N / m. The laser 704 used was a semiconductor laser having a wavelength of 670 nm. 2-split sensor 705
Is to determine the position of the irradiated laser by incorporating two photodiodes. The deflection amount detection device 706 is 2
Based on the signal from the split sensor 705, the cantilever 70
3 is detected. Laser 7 for position detection in Z direction
04 irradiates the side of the cantilever 703 opposite to the sample, and the laser beam is introduced into the two-divided sensor 705. The two-division sensor 705 detects the optical path of the laser light from the difference in the intensity of the light incident on the two diodes.
03 of the two-divided sensor 70
5 is used to detect the amount of deflection of the cantilever 7.
03 is detected. This method is generally called an optical lever method. Z direction position control circuit 70
Reference numeral 7 denotes a medium stage driving mechanism 7 based on a control signal from the microcomputer 711 and a signal from the deflection amount detection device 706.
09 in the illustrated Z direction is controlled. Media stage 70
Reference numeral 8 denotes a member for holding and fixing the observation medium 701, which is moved by the medium stage driving mechanism 709 in the XYZ directions in the figure. In this embodiment, a stepping motor is used for the coarse movement mechanism of the drive mechanism, and a piezo element is used for the fine movement mechanism. The XY direction position control circuit 710 is configured to control the medium stage driving mechanism 709 based on a signal from the microcomputer 711.
Control the position of the direction. The microcomputer 711 controls the overall operation of the AFM of this embodiment. The display 712 processes the obtained signal and displays an image.

The operation of this embodiment is as follows. First, the micro computer 711 sends a control signal to the XY direction position control circuit 710 to move the probe 702 in the XY direction to a position where observation is desired. Next, the microcomputer 711 instructs the Z-direction position control circuit 707 to bring the probe 702 into contact with the observation sample 701. Next, the microcomputer 711 instructs the Z-direction position control circuit 707 to apply feedback in the Z-direction so that the signal from the deflection amount detection device 706 becomes constant. In this state, the microcomputer 711 operates the XY-direction position control circuit 71.
When the command is set to 0, the probe 702 scans the surface of the observation sample 701. That is, a state in which the amount of deflection of the cantilever 703 becomes constant, that is, the tip of the probe 702 and the observation sample 7
The probe 702 scans the surface of the observation sample 701 in a state where the force applied during the period 01 is constant. At this time, the microcomputer controls the position in the XY direction and the position control circuit 707 in the Z direction.
The shape information on the surface of the sample can be obtained by the control signal from the controller, and this is displayed on the display 712. These series of operations are similar to those of the conventional AFM. In the present embodiment, the amount of deflection is set to be about 0.2 μm, and since the spring constant is 0.05 n / m, a force of about 1 × 10 ⁻⁸ N is applied during observation. .

In this embodiment, 1 μm × 1 μm
The observation was repeated 10 times in the same procedure at different locations. Thereafter, the attached matter on the tip of the probe was removed by the following procedure. First, the probe 702 is moved to a place where the observation is not affected in a state where the probe 702 is separated from the surface of the observation sample 701 by a command from the microcomputer 711. Next, the microcomputer 711 instructs the Z-direction position control circuit 707 to bring the probe 702 into contact with the surface of the observation sample 701, and adjust the Z-direction position so that the deflection amount becomes 2 μm. In this state, about 1 × 1
A force of 0 ^-7 N will be applied. After this operation, the probe 7
02 is separated from the surface of the observation sample 701. This operation removes dirt from the tip of the probe, and removes deposits on the tip of the probe when the next AFM observation is performed, so that an accurate image can be obtained. In some cases, the above operation alone did not remove the attached matter. In this case, the tip of the probe 702 was brought into contact with the surface of the observation sample 701, a force was applied, and then the attached matter was removed by scanning in the XY directions. We were able to.

Second Embodiment Next, a second embodiment according to the present invention will be described. This embodiment uses the information reproducing apparatus shown in FIG. The reproducing apparatus shown in FIG. 8 is configured based on the AFM shown in FIG. 7 used in the first embodiment. 8 includes a recording medium 801, a probe 802, and a cantilever 803 in place of the observation sample 701, the probe 702, and the cantilever 703 shown in FIG. 7, and further includes a power supply 804 and a current detection mechanism 805. . Recording medium 801 used in this embodiment
Is as shown in FIG.
A polyimide LB film 903 having a thickness of about 3 nm is formed on a gold (111) crystal 902 epitaxially grown in FIG. Further, the probe 802 and the cantilever 803
Are both made of silicon nitride and used in AFM. In this embodiment, the probe 802 and the cantilever 80 are used.
3 is the probe 702 and the cantilever 70 used in the first embodiment.
3, the surface of the recording medium 801 of the probe 802 and the cantilever 803 is provided with tungsten by sputtering to have conductivity. This tungsten is also attached to the tip of the probe 802. A bias voltage can be applied between the tungsten thin film and the gold crystal by the power supply 804. The current detection mechanism 805 detects a current flowing between the tip of the probe 802 and the recording medium 801 by applying the bias voltage, and sends the detected current value to the microcomputer 711.

Although the polyimide LB film 903 is insulative and has high resistance, there is a recording bit 904 in which the conductivity is increased in the form of a spot having a diameter of 10 nm. The recording bit is previously formed on the recording medium 801 at a location corresponding to the information “1” based on the information to be written. In this embodiment, the probe 802 scans by contacting the surface of the polyimide LB film 903, but when the tip of the probe 802 is on the recording bit 904 or not, the resistance between the probe 802 and the gold crystal 902 is low. different. This difference in resistance value is detected as a difference in flowing current, and a recording bit is detected. The microcomputer 711 reproduces information based on the detected recording bit. In this embodiment, if there is an attached matter at the tip of the probe, the resistance value between the tip of the probe 802 and the gold crystal 902 increases as compared with the case where there is no attached matter, and there is a possibility that a true signal cannot be read. .

The reproduction of information in this embodiment is performed as follows. First, the microcomputer 711 is XY
A control signal is sent to the direction / position control circuit 710, and the probe 802 is
Is moved to the position where reproduction of the recorded information is desired. Next, the microcomputer 711 instructs the Z-direction position control circuit 707 to move the probe 802 to the recording medium 80.
Touch 1 Next, the microcomputer 711 sets Z
The direction position control circuit 707 is instructed, and the deflection amount detection device 7
Feedback in the Z direction is applied so that the signal from the reference number 06 becomes constant. In this state, the microcomputer 711 instructs the XY direction position control circuit 710 to cause the probe 802 to scan the surface of the observation sample 701. That is, the probe 802 scans over the surface of the recording medium 701 in a state where the force acting between the tip of the probe 802 and the observation sample 701 becomes constant. At this time, the microcomputer 711 can obtain the shape information of the sample surface based on the position in the XY direction and the control signal from the position control circuit 707 in the Z direction. In the present embodiment, the amount of deflection is set to be about 0.2 μm and the spring constant is 0.05 N / m.
^-8 N of force will be applied. In this state, the power supply 804
To apply a voltage between the tip of the probe 802 and the gold crystal 902. In this embodiment, a voltage of 2 V was applied. The current detection mechanism 805 measures the current flowing at this time and sends it to the microcomputer 711. Microcomputer 71
Based on this current value, 1 determines whether or not there is a bit, and reproduces information.

In this embodiment, 1 μm × 1 μm
Play the information in the area of, then change the location and follow the same procedure
Reproduction was repeated several times. Then, follow the procedure below to
Deposits attached to the tip were removed. First microcontroller
The probe 802 is moved to the recording medium 80 by a command from the computer 711.
No recording bit is formed at a distance from one surface
Move to location. Next, the microcomputer 711
The probe 802 and the recording medium are commanded to the direction position control circuit 707.
Bring the surface of the body 801 into contact so that the amount of deflection is 2 μm
Adjust the position in the Z direction. In this state, the tip of the probe 802
About 1 × 10 ^-7N forces will be applied. This behavior
After that, the probe 802 is separated from the surface of the recording medium 801. this
The operation removes dirt from the tip of the probe and then reproduces information.
Is performed, the deposits on the tip of the probe are removed and the recording bit
Can be accurately captured. Also, it ’s just the above behavior
In some cases, deposits were not removed by
In this case, the tip of the probe 802 is brought into contact with the surface of the recording medium 801 to apply a force.
And then scanning in the X and Y directions to
Could be removed. In this embodiment, the recording medium
The unevenness of the surface of the probe 801 is 1 nm or less.
After the leading edge and the recording medium 801 are in contact, the amount of deflection is constant
XY direction position control without Z-direction position control
Scanning between the tip of the probe 802 and the recording medium 801
There is no problem because no large force is applied. Moreover
In that case, since the position control in the Z direction is not required, the control is small.
It is possible to operate at a very high speed.

[Embodiment 3] FIG. 10 shows the structure of an embodiment 3 according to the present invention. The cleaning substrate 801 which is a dedicated area for removing the probe adhering matter in the AFM apparatus of FIG. 7 is shown. Is provided. Cleaning substrate 10
Numeral 01 denotes a copper substrate, which is used to remove deposits at the tip of the probe 701. In this embodiment, the observation of the surface of the observation medium 701 is performed in the same manner as in the first embodiment. When removing the attached matter at the tip of the probe, it is performed not on the surface of the observation sample 701 but on the surface of the cleaning substrate 1001. The operation of removing the attached matter at the tip of the probe is the same as that of the first embodiment except that the operation is performed on the surface of the cleaning substrate 1001. In the present embodiment, since the removed deposits do not remain on the observation medium, the removed deposits adhere to the probe again, or the removed deposits remain in the observation area and affect the observation image. Never give. Further, in this embodiment, the probe 702 is made of silicon nitride, and the cleaning substrate 1001 is made of copper, so that the probe has a higher hardness, and has an effect that the probe 702 is not chipped and deformed by cleaning. .

[Embodiment 4] Next, Embodiment 4 of the present invention.
Will be described. This embodiment uses the AFM device shown in FIG. The AFM device in FIG. 11 is a so-called non-contact mode AFM. A vibration device 1101 is added as compared with the AFM device shown in FIG. Exciter 11
Numeral 01 vibrates the root of the cantilever 703 in the Z direction in the figure using a piezo element. The vibration device 1101 is controlled by the microcomputer 711. Further, the deflection amount detection device 706 can measure the amplitude intensity when the signal from the two-divided sensor 705 is an alternating current. That is, when the cantilever 703 is vibrating, the vibration intensity can be measured.

In this embodiment, the XY direction is adjusted and the tip of the probe 702 is moved to the position where the observation is desired, as in the first embodiment. Next, the microcomputer 711 instructs the vibration device 1101 to vibrate the cantilever 703. In this embodiment, the amplitude is about 2 at the tip of the probe 702.
nm. In this state, the macro computer 711 commands the Z-direction position control circuit 707 to move the tip of the probe 702 closer. The vibration intensity of the cantilever 706 changes according to the distance between the tip of the probe 702 and the observation medium 701. The microcomputer 711 includes the tip of the probe 702 and the observation sample 7.
01 is defined as the vibration intensity of the cantilever 703, and the Z-direction position control circuit 70 is controlled so that this value becomes constant.
The scanning is performed in the X and Y directions while keeping the distance between the tip of the probe 702 and the observation sample 701 constant by applying feedback by 7. Thereafter, as in the first embodiment, the shape of the surface of the observation sample 701 can be obtained from these control signals. That is, in the present embodiment, observation is performed in a state where the probe 702 and the observation sample 701 do not come into contact with each other. However, if there is a lump of dust or the like on the surface of the sample, feedback rarely follows the dust, and the dust sometimes comes into contact with the dust and adheres to the tip of the probe 702. This deposit affects the image to be observed. In this embodiment, after a change in the image occurs, the attached matter at the tip of the probe 702 is removed in the following procedure. First, the vibration device 1
The excitation by 101 is stopped. Next, the probe 702 is brought into contact with the surface of the observation sample 701, and a force is applied so that the tip 702 of the probe presses the surface of the observation sample 701. In this embodiment, the magnitude of the force was 1 × 10 ⁻⁷ N. Further, in this embodiment, while the tip of the probe 702 is in contact with the surface of the observation sample 701, the cantilever 703 may be vibrated by the vibrating device 1101, and the tip of the probe 702 may be vibrated to remove the adhered substance. Further, by scanning in the XY directions while the probe 702 and the surface of the observation sample 701 are in contact with each other, it is possible to more effectively remove the attached matter. With this operation, the attached matter at the tip of the probe 702 is removed, and a correct observation image can be obtained.

Fifth Embodiment FIG. 12 shows the configuration of a fifth embodiment using an AFM device. The AFM shown in FIG. 12 is composed of a plurality of cantilevers using a piezoresistive element and an AFM using a probe.
FM. The AFM used in the present embodiment is the same as the AFM used in the first embodiment except for the probe 702 and the cantilever 703.
Is provided with a probe group 1201 instead of the laser 704, and a Z displacement detector 1202 is provided instead of the laser 704 two-piece sensor 705 and the deflection amount detector 706. Further, a probe cleaning mechanism 1203 is provided. The probe group 1201 is composed of a plurality of probes 1300 as shown in FIG.
Reference numeral 0 denotes a probe 1301 and a cantilever 1302. Each probe is arranged at intervals of 200 μm. The cantilever 1102 is made of silicon and has an ion-implanted layer into which As is ion-implanted. This ion implantation layer is a piezoresistive layer, and its resistance changes when the cantilever is bent. This piezoresistive layer is electrically connected to the Z displacement detecting device 1202,
02 detects bending of the cantilever by monitoring the resistance value of the piezoresistive layer. This bending indicates the position of the tip of the probe in the Z direction. The probe 1301 is made of silicon. In the present embodiment, there are a plurality of the probes 1300, and the AFM observation can be performed at the same number of places as the number of the probes, so that the AFM observation can be performed at higher speed and in a wider range. The spring constant of one cantilever is 0.1N /
m. The probe cleaning mechanism 1203 is made of silicon, and is provided with a projection having a size of about 50 μm × 50 μm in the XY directions and a size in the Z direction, that is, a height of 1 μm, on a flat silicon substrate. This cleaning mechanism 1
The entire surface of 203 is coated with a platinum thin film.

In the AFM observation in this embodiment, the probe group 120 is first controlled by a command from the microcomputer 711.
1 is moved to a position in the XY direction in which observation is desired. Next, the probe group 1201 is brought close to the observation sample 701, and the probes of all the probe groups 1201 are brought into contact with the observation sample 701. In this state, the observation medium stage 708 is scanned in the illustrated XY directions. The probe at the tip of the probe group 1201 moves so as to trace the surface of the observation sample 701, and
The cantilever of each probe is turned in accordance with the surface irregularities, and the Z displacement detecting device 1002 detects the position of the tip of the probe in the Z direction. The microcomputer 711 can obtain the shape of the surface of the observation sample from the position of the tip of each probe in the Z direction and the position in the XY direction.

A method for removing the deposits on the tip of the probe in the present AFM apparatus will be described with reference to FIG. FIG. 14 shows a state in which the attached matter at the tip of one of the probes in the probe group 1300 is removed. In FIG. 14, the above-mentioned convex portion of the probe cleaning mechanism is indicated by 1401, and portions other than the convex portion are indicated by 1402. Further, the probe and its probe for removing the attached matter at the tip are
And 1404, the other probe and its probe
Shown at 405 and 1406. The tip of the probe 1404 is aligned with the position of the protrusion 1401 of the cleaning mechanism 1203, and the probe group 1300 is moved to the probe cleaning mechanism 1203.
Approach. By this approaching operation, the tip of the probe 1404 comes into contact with the projection 1401. In this state, the probe 1406 does not contact the cleaning mechanism 1203 with another probe. At this time, a force is applied only to the tip of the probe 1404, and the attached matter is removed. Further, the entire probe group 1300 is moved in the XY direction in FIG. 12 so that the entire probe group 1300 is brought into contact with a place other than the convex portion 1401, that is, in contact with the illustrated portion 1402, and then only the probe 1404 passes through the convex portion 1401. Alternatively, a method may be used in which a force is applied only to the probe 1404 to remove extraneous matter.

[Embodiment 6] FIG. 15 shows a configuration of an embodiment 6 using an AFM. The AFM used in this embodiment is the same as the AFM shown in FIG. 12, but differs in the following points. A probe group 1501 is used instead of the probe group 1201. FIG. 16 shows a probe group 1501. The probe group 1501 includes a plurality of probes 1600, and the probe 1600 includes the probe 1601 and the cantilever 1.
602. An electrode 1603 is provided on the cantilever 1602. Other structures of the probe group 1501 are the same as the probe group 1201 shown in the fifth embodiment.

Reference numeral 1502 denotes a cleaning mechanism, in which a silicon substrate is coated with a platinum thin film. Here, the tip of the probe 1601 is brought into contact with the tip to apply a force, thereby removing the attached matter at the tip of the probe 1601. A voltage can be applied between the electrode 1603 and the cleaning mechanism 1502 by a power source (not shown). This voltage can be applied to each electrode. In the present embodiment, the surface of the observation sample 701 is observed by a procedure similar to the method described in the fifth embodiment. A method for removing deposits on the tip of the probe in the present AFM apparatus will be described. First, the probe group 1501 is brought into contact with the cleaning mechanism 1502. Next, a voltage is applied between the electrode 1603 on the cantilever holding the probe for removing the attached matter at the tip and the cleaning mechanism 1502. By this voltage application, a force is applied between the probe from which the deposit is to be removed and the Si substrate 901, and the deposit is removed.

Embodiment 7 Next, Embodiment 7 of the present invention will be described. In this embodiment, FIG. 1 using an apparatus similar to FIG.
The information is reproduced using the information reproducing device of No. 7. The apparatus used in this embodiment includes a probe group 1701 instead of the probe group 1201 and a recording medium 801 instead of the observation medium 701 as compared with the AFM shown in FIG. In addition, a current detection mechanism 1702 and a power supply 1703 are newly provided. Further, a Z displacement detection device 1202 is not provided. The probe group 1701 has the same shape as the probe group shown in FIG. 13, except that the cantilever portion is made of silicon nitride and the probe is made of tungsten. The tungsten portion of this probe is electrically connected to the current detection mechanism 1702 via aluminum wiring provided on the cantilever portion. The recording medium 801 is similar to the recording medium used in the second embodiment. The gold crystal portion of the recording medium 801 is electrically connected to a power supply 1703. Power supply 1
A voltage 703 is applied between the probe and the recording medium 801, and a current detection mechanism 1702 detects a current flowing between the probe and the recording medium for each probe at this time, and sends the value to the microcomputer 711.

The reproduction of information in this embodiment is performed as follows.

First, the microcomputer 711 operates as XY
A control signal is sent to the direction position control circuit 710 to move the position of the probe group 1702 in the X and Y directions to the position where the recorded information is to be reproduced. Next, the microcomputer 711 instructs the Z-direction position control circuit 707 to send the probe group 170
2 is brought into contact with the recording medium 801. In the contact detection in this embodiment, a voltage is applied between the probe and the recording medium 801 by the power supply 1703 in advance. Recording medium 801
When the probe and the probe group 1701 come into contact with each other, a small amount of current flows, so that the contact can be detected. Next, the microcomputer 711 instructs the XY direction position control circuit 710 to cause the probe 802 to scan the surface of the observation sample 701. In this state, a voltage is applied between the power supply 1703 and the gold crystal 902. In this embodiment, a voltage of 2 V was applied. The current detection mechanism 1702 measures the current flowing at this time and sends it to the microcomputer 711. The microcomputer 711 determines whether or not there is a bit based on the current value, and reproduces information. The reproducing apparatus used in the present embodiment includes the probe cleaning mechanism 1203 used in the fifth embodiment. Also in the present embodiment, it is possible to remove the attached matter at the tip of a specific one of the probes in the probe group 1702 by the same method as that described in the fifth embodiment. By removing the deposits, information can be reproduced more accurately.

[0035]

Embodiment 8 Next, Embodiment 8 of the present invention will be described. In this embodiment, an information reproducing apparatus similar to the information reproducing apparatus used in the seventh embodiment is used. However, the information reproducing apparatus used in this embodiment has the electrodes shown in FIG. 16 on each cantilever of the probe group 1701. This electrode is insulated from the aluminum wiring from the probe. Example 6 is replaced with the probe cleaning mechanism 1203.
Is provided with the cleaning mechanism 1502 indicated by. A voltage can be applied between the cleaning mechanism 1502 and the probe by a power source for each probe as in the sixth embodiment. Also in this embodiment, the recorded information recorded on the recording medium 801 can be reproduced by the same procedure as in the seventh embodiment. Further, it is possible to remove deposits on the tip of the probe by a method similar to the method shown in the sixth embodiment.

[0036]

As described above, according to the present invention, by removing the deposits on the tip of the probe, the correct interaction between the tip and the observation medium or the recording medium can be obtained. It is possible to detect the effect, more accurate surface observation, or more accurate reproduction of recorded information,
It can be carried out.

[Brief description of the drawings]

BRIEF DESCRIPTION OF DRAWINGS FIG. 1 is a diagram illustrating removal of a deposit.

FIG. 2 is a view for explaining removal of deposits at the tip of a probe supported by an elastic body.

FIG. 3 is a view showing an example after removal of an attached matter at the tip of a probe.

FIG. 4 is a view showing an example after removal of an attached matter at a probe tip.

FIG. 5 is a diagram showing a configuration for removing an attached matter at the tip of a probe using a convex portion.

FIG. 6 is a diagram showing a configuration for removing deposits on the tip of a probe supported by a plurality of elastic bodies.

FIG. 7 is a diagram illustrating a configuration of an AFM device used in the first embodiment.

FIG. 8 is a diagram showing a configuration of an information reproducing apparatus used in a second embodiment.

FIG. 9 illustrates a configuration of a recording medium.

FIG. 10 is a diagram illustrating a configuration of an AFM device used in a third embodiment.

FIG. 11 is a diagram showing a configuration of an AFM device used in a fourth embodiment.

FIG. 12 is a diagram showing a configuration of an AFM device used in a fifth embodiment.

FIG. 13 is a diagram showing a configuration of a probe group.

FIG. 14 is a diagram illustrating a configuration for removing an attached matter at the tip of a probe according to a fifth embodiment.

FIG. 15 is a diagram illustrating a configuration of an AFM device used in a sixth embodiment.

FIG. 16 is a diagram showing a configuration of a probe group.

FIG. 17 is a diagram showing a configuration of an information reproducing apparatus used in a seventh embodiment.

[Explanation of symbols]

101: Probe 102: Attachment 103: Cleaning Surface 201: Cantilever 501: Convex 601 to 604: Probe 605 to 608: Cantilever 609: Convex 610: Area for Cleaning Only 701: Observation Sample 702: Probe 703 : Cantilever 704: laser 705: two-division sensor 706: deflection amount detection device 707: Z direction position control circuit 708: medium stage 709: medium stage drive mechanism 710: XY direction position control circuit 711: microcomputer 712: display 801: recording Medium 802: Probe 803: Cantilever 804: Power supply 805: Current detection mechanism 901: Silicon substrate 902: Gold (111) crystal 903: Polyimide LB film 904: Recording bit 1001: Probe cleaning mechanism 1002: Z displacement detection Apparatus 1101: Exciter 1201: Probe group 1202: Z displacement detector 1203: Probe cleaning mechanism 1300: Probe 1301: Probe 1302: Cantilever 1401: Convex part 1402: Place other than convex part 1403, 1404: Attachment of tip Probes and their probes 1405, 1406: Other probes and their probes 1501: Probe group 1502: Cleaning mechanism 1600: Probe 1601: Probe 1602: Cantilever 1603: Electrode 1701: Probe group 1702: Current detection Mechanism 1703: Power supply

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2F063 AA43 CA31 CA32 DA01 DA02 DB05 DD02 DD06 EA16 EA20 EB01 EB05 EB15 EB23 EB27 JA04 2F069 AA60 DD08 DD13 DD30 GG01 GG04 GG06 GG07 GG58 GG62 GG65 GG65 HH05 MM03 RR07

Claims (9)

[Claims] 1. A probe comprising a probe and an elastic body supporting the probe scans a medium to observe the surface of the medium or to reproduce information recorded on the medium.
A recording / reproducing method, comprising: controlling a relative position between the probe and a medium; scanning the probe with the medium, and observing an interaction between the probe and the medium. Contacting the tip of the probe with a cleaning surface for removing an adhering substance attached to the tip of the probe, and applying a force between the tip and the cleaning surface to apply the force to the probe. A method for observing / recording / reproducing a surface, comprising: at least a step of removing extraneous matter at a tip. 2. The surface observation / recording / reproducing method according to claim 1, further comprising the step of reading and reproducing information preliminarily recorded on the recording medium based on the observed interaction. 3. The step of removing adhering matter at the tip of the probe, wherein the tip of the probe and the cleaning surface are
3. The step of moving in a direction parallel to the cleaning surface is performed simultaneously.
Surface observation / recording / reproducing method described in 1. 4. The method according to claim 1, wherein the magnitude of a force applied between the tip of the probe and the surface for cleaning is determined by the step of observing the interaction. The surface according to any one of claims 1 to 3, wherein a force acting between the probe and the medium is larger when observing the interaction in a state where the probe and the medium are in contact with each other. Observation, recording and reproduction method. 5. The surface observation and cleaning method according to claim 1, wherein the cleaning surface is a dedicated cleaning area for removing the deposit on the tip of the probe. Recording and playback method. 6. The dedicated cleaning area has a convex portion that comes into contact with the tip of the probe, and a force is applied to the tip of the probe by contact with the convex portion to remove the deposit on the tip of the probe. The surface observation / recording / reproducing method according to claim 5, wherein 7. The surface observation / recording according to claim 5, wherein the dedicated cleaning area is formed of a material having a lower hardness than a material of the tip of the probe. Playback method. 8. A method according to claim 1, wherein the force applied between said probe tip and said cleaning surface is an electrostatic force acting between said cleaning surface and said probe. The surface observation / recording / reproducing method according to any one of the preceding claims. 9. The method according to claim 1, wherein at least two or more probes are provided.
Surface observation / recording / reproducing method described in the section.