JP2000288108A - Antibacterial metal spattering mask - Google Patents

Antibacterial metal spattering mask

Info

Publication number
JP2000288108A
JP2000288108A JP11127493A JP12749399A JP2000288108A JP 2000288108 A JP2000288108 A JP 2000288108A JP 11127493 A JP11127493 A JP 11127493A JP 12749399 A JP12749399 A JP 12749399A JP 2000288108 A JP2000288108 A JP 2000288108A
Authority
JP
Japan
Prior art keywords
mask
antibacterial
spattering
metal
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11127493A
Other languages
Japanese (ja)
Inventor
Tatsuo Miyauchi
達雄 宮内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SUPATTA KK
Original Assignee
SUPATTA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SUPATTA KK filed Critical SUPATTA KK
Priority to JP11127493A priority Critical patent/JP2000288108A/en
Publication of JP2000288108A publication Critical patent/JP2000288108A/en
Pending legal-status Critical Current

Links

Classifications

    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A41D13/1192Protective face masks, e.g. for surgical use, or for use in foul atmospheres with antimicrobial agent
    • AHUMAN NECESSITIES
    • A41WEARING APPAREL
    • A41DOUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D31/00Materials specially adapted for outerwear
    • A41D31/04Materials specially adapted for outerwear characterised by special function or use
    • A41D31/30Antimicrobial, e.g. antibacterial
    • A41D31/305Antimicrobial, e.g. antibacterial using layered materials

Abstract

PROBLEM TO BE SOLVED: To provide an antibacterial metal spattering mask suppressing the multiplication of miscellaneous viruses in a mask, preventing all ill effect to the skin and capable of being used safely by closely sticking antibacterial metals to the base material of the mask by spattering. SOLUTION: Antibacterial metals 2 such as silver, zinc, copper, titanium oxide and zinc oxide are closely stuck to the base material 1 of a mask by spattering to form the mask having a metal layer on the surface and a woven fabric layer or a nonwoven fabric layer on the back face. When the mask is used, it is worn to cover the nose and mouth like a normal mask. This sterilization processing method may be adapted to a replacing gauze. During the use of the mask, the exhaled breath is left in the mask, and the moisture in the next inhaled breath is sterilized by antibacterial sliver ions emitted from the antibacterial metals 2. When titanium oxide is closely stuck by spattering, a further antibacterial effect can be expected by a photocatalyst function.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】マスクの基材に、抗菌性の金
属をスパッタリング法で密着させ、雑菌の増殖を押さ
え、皮膚への影響も少なく、安全性の高いマスクであっ
て、基材には織物や不織布層が形成されたことを特徴と
するマスクに関するものである。
BACKGROUND OF THE INVENTION An antibacterial metal is adhered to a mask substrate by a sputtering method to suppress the growth of germs, to have little effect on the skin, and to provide a highly safe mask. The present invention relates to a mask having a woven or nonwoven fabric layer formed thereon.

【0002】[0002]

【従来の技術】従来、織物や不織布に金属をスパッタリ
ングして、抗菌性を付与したマスクはなかった。
2. Description of the Related Art Heretofore, there has been no mask provided with antibacterial properties by sputtering metal onto a woven or nonwoven fabric.

【0003】[0003]

【発明が解決しようとする課題】(イ) 従来のマスク
の基材の抗菌処理で、特に有機系のものは、皮膚障害な
どの事例が跡を絶たない。 (ロ) 糸自体に無機系金属を練りこんだものは、表面
に金属が出にくく,効果が弱かった 本発明は、これらの欠点を除くためになされたものであ
る。
(A) Conventional antibacterial treatment of a base material of a mask, especially an organic one, has no trace of cases such as skin disorders. (B) In the case where the yarn itself is kneaded with an inorganic metal, the metal hardly appears on the surface and the effect is weak. The present invention has been made to eliminate these disadvantages.

【0004】[0004]

【課題を解決するための手段】いま,その構成を説明す
ると、 (イ)マスクの基材(1)に、抗菌性の金属(2)をス
パッタリング法で密着させる。 (ロ)マスクの基材(1)には、織物や不織布層を形成
する以上のような構成によるマスクである。
Means for Solving the Problems Now, the structure will be described. (A) An antibacterial metal (2) is brought into close contact with a base material (1) of a mask by a sputtering method. (B) A mask having the above-described configuration in which a woven or nonwoven fabric layer is formed on the base material (1) of the mask.

【0005】[0005]

【発明の実施の形態】以下,本発明の実施の形態につい
て説明する。マスクの基材に抗菌性の金属をスパッタリ
ング法で密着させ、表面(3)には金属層、裏面(4)
には織物層や不織布層を形成する。本発明はこのような
構造で、これを使用するときは、普通のマスクと同じよ
うに鼻と口を覆うように装着すれば良い。、また、表裏
どちらの面を使用しても良く、又替えガーゼとして使用
しても良い。
Embodiments of the present invention will be described below. An antibacterial metal is adhered to the base material of the mask by sputtering, and a metal layer is formed on the front surface (3) and a back surface (4).
A woven layer and a non-woven layer are formed on the substrate. The present invention has such a structure, and when it is used, it may be worn so as to cover the nose and mouth like a normal mask. Further, either of the front and back surfaces may be used, or it may be used as a replacement gauze.

【0006】[0006]

【発明の効果】自分の吐く息がマスクに残り,次に息を
吸う時にその水分が、銀イオンをを少しずつ放出して、
抗菌効果を発揮します。その他の効果として (イ)呼吸抵抗が少ない。 (ロ)雑菌の増殖を押さえ、皮膚への影響が少なく、安
全性が高い。 (ハ)生地の肌触りが変わらない (ニ)酸化チタンなどをスパッタリング法で密着させる
と、光触媒機能があり更なる抗菌効果が有ります。 (ホ)銀等の無機系抗菌剤は、毒性が低く、耐性菌を作
らない。
The breath exhaled on the mask remains on the mask, and when inhaling the next breath, the water releases silver ions little by little,
Exhibits antibacterial effect. Other effects (a) Respiratory resistance is low. (B) It suppresses the growth of various germs, has little effect on the skin, and is highly safe. (C) The texture of the fabric does not change. (D) If titanium oxide or the like is adhered by sputtering, it has a photocatalytic function and further antibacterial effect. (E) Inorganic antibacterial agents such as silver have low toxicity and do not produce resistant bacteria.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の断面図である。FIG. 1 is a sectional view of the present invention.

【図2】本発明の斜視図である。FIG. 2 is a perspective view of the present invention.

【符号の説明】[Explanation of symbols]

(1)基材 (2)金属 (3)表面 (4)裏面 (1) Base material (2) Metal (3) Front surface (4) Back surface

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】マスクの基材(1)に、抗菌性の金属
(2)をスパッタリング法で密着させた金属層と基材層
からなるマスク。
1. A mask comprising a metal layer and a substrate layer in which an antibacterial metal (2) is adhered to a substrate (1) of the mask by a sputtering method.
【請求項2】マスクの基材(1)は織物,不織布などで
構成される請求項1の抗菌性金属スパッタリングマス
ク。
2. The antimicrobial metal sputtering mask according to claim 1, wherein the base material of the mask is made of a woven or non-woven fabric.
【請求項3】スパッタリングのターゲットとなる金属
(2)は、銀、亜鉛、銅、又は酸化チタン,酸化亜鉛な
どの酸化物などである、請求項1の抗菌性金属スパッタ
リングマスク。
3. The antimicrobial metal sputtering mask according to claim 1, wherein the metal (2) serving as a sputtering target is silver, zinc, copper, or an oxide such as titanium oxide or zinc oxide.
JP11127493A 1999-03-31 1999-03-31 Antibacterial metal spattering mask Pending JP2000288108A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11127493A JP2000288108A (en) 1999-03-31 1999-03-31 Antibacterial metal spattering mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11127493A JP2000288108A (en) 1999-03-31 1999-03-31 Antibacterial metal spattering mask

Publications (1)

Publication Number Publication Date
JP2000288108A true JP2000288108A (en) 2000-10-17

Family

ID=14961336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11127493A Pending JP2000288108A (en) 1999-03-31 1999-03-31 Antibacterial metal spattering mask

Country Status (1)

Country Link
JP (1) JP2000288108A (en)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016318A1 (en) * 2002-08-19 2004-02-26 Il Sik Kim Mask based on the use of silver
WO2007027413A1 (en) * 2005-08-31 2007-03-08 Kimberly-Clark Worldwide, Inc. Germicidal face mask
KR100708763B1 (en) * 2005-08-02 2007-04-18 (주) 월드비젼 Method for manufacturing of mask pack coated with silver and mask pack manufactured method thereof
WO2007049848A1 (en) * 2005-10-25 2007-05-03 Young Chul Choi A mask in which a sterilizing pad inserted detachably and the manufacturing method thereof
WO2007078412A1 (en) * 2005-12-21 2007-07-12 Kimberly-Clark Worldwide, Inc. Germicidal surface-covering assembly
WO2007093808A2 (en) * 2006-02-16 2007-08-23 Queen Mary & Westfield College Virucidal materials
US7661430B2 (en) 2006-05-19 2010-02-16 Richard Mason Antimicrobial dental appliances including mouthguards and mouthpieces
JP2010178765A (en) * 2009-01-06 2010-08-19 Kiyoshi Kato Mask
WO2010139086A1 (en) * 2009-06-01 2010-12-09 Gutierrez Riquelme Jose Luis Disinfecting device for surgical or protective masks
EP2134447A4 (en) * 2007-03-22 2011-07-06 Mvp Textiles & Apparel Inc Antimicrobial filtration article
CN102691039A (en) * 2011-03-25 2012-09-26 鸿富锦精密工业(深圳)有限公司 Antibacterial film-coated member and preparation method thereof
CN102771916A (en) * 2012-08-09 2012-11-14 上海成增科技发展有限公司 Initiatively protective type antibacterial mouth mask
WO2015103949A1 (en) * 2014-01-09 2015-07-16 郑建国 Alloy disinfection wire and face mask thereof for removing pm2.5
CN105595469A (en) * 2016-01-18 2016-05-25 广西大学 Sterilization and filtration composition for anti-fog-and-haze mouth mask
CN111466408A (en) * 2020-04-14 2020-07-31 安徽万兴实业有限公司 Preparation method of antibacterial material, manufacturing method of antibacterial nanofiber cloth and application
WO2022007624A1 (en) * 2020-07-10 2022-01-13 深圳市君能高芯科技有限公司 Antibacterial anti-virus washable multifunctional face mask and preparation method therefor

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004016318A1 (en) * 2002-08-19 2004-02-26 Il Sik Kim Mask based on the use of silver
KR100708763B1 (en) * 2005-08-02 2007-04-18 (주) 월드비젼 Method for manufacturing of mask pack coated with silver and mask pack manufactured method thereof
WO2007027413A1 (en) * 2005-08-31 2007-03-08 Kimberly-Clark Worldwide, Inc. Germicidal face mask
JP4823314B2 (en) * 2005-08-31 2011-11-24 キンバリー クラーク ワールドワイド インコーポレイテッド Bactericidal face mask
JP2009505788A (en) * 2005-08-31 2009-02-12 キンバリー クラーク ワールドワイド インコーポレイテッド Bactericidal face mask
WO2007049848A1 (en) * 2005-10-25 2007-05-03 Young Chul Choi A mask in which a sterilizing pad inserted detachably and the manufacturing method thereof
JP2009521611A (en) * 2005-12-21 2009-06-04 キンバリー クラーク ワールドワイド インコーポレイテッド Assembly covered with a sterilizing surface
WO2007078412A1 (en) * 2005-12-21 2007-07-12 Kimberly-Clark Worldwide, Inc. Germicidal surface-covering assembly
WO2007093808A3 (en) * 2006-02-16 2007-10-25 Queen Mary & Westfield College Virucidal materials
CN102805081A (en) * 2006-02-16 2012-12-05 玛丽皇后和威斯特-弗尔德学院 Use and method of nanoparticles in reducing and/or preventing virus transmission, articles of protective clothing, and filters
JP2013067618A (en) * 2006-02-16 2013-04-18 Queen Mary & Westfield College Virucidal material
WO2007093808A2 (en) * 2006-02-16 2007-08-23 Queen Mary & Westfield College Virucidal materials
US7661430B2 (en) 2006-05-19 2010-02-16 Richard Mason Antimicrobial dental appliances including mouthguards and mouthpieces
EP2134447A4 (en) * 2007-03-22 2011-07-06 Mvp Textiles & Apparel Inc Antimicrobial filtration article
JP2010178765A (en) * 2009-01-06 2010-08-19 Kiyoshi Kato Mask
WO2010139086A1 (en) * 2009-06-01 2010-12-09 Gutierrez Riquelme Jose Luis Disinfecting device for surgical or protective masks
CN102691039A (en) * 2011-03-25 2012-09-26 鸿富锦精密工业(深圳)有限公司 Antibacterial film-coated member and preparation method thereof
CN102771916A (en) * 2012-08-09 2012-11-14 上海成增科技发展有限公司 Initiatively protective type antibacterial mouth mask
WO2015103949A1 (en) * 2014-01-09 2015-07-16 郑建国 Alloy disinfection wire and face mask thereof for removing pm2.5
CN105595469A (en) * 2016-01-18 2016-05-25 广西大学 Sterilization and filtration composition for anti-fog-and-haze mouth mask
CN111466408A (en) * 2020-04-14 2020-07-31 安徽万兴实业有限公司 Preparation method of antibacterial material, manufacturing method of antibacterial nanofiber cloth and application
WO2022007624A1 (en) * 2020-07-10 2022-01-13 深圳市君能高芯科技有限公司 Antibacterial anti-virus washable multifunctional face mask and preparation method therefor

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