JP2000277662A - Ceramic circuit board - Google Patents

Ceramic circuit board

Info

Publication number
JP2000277662A
JP2000277662A JP11082995A JP8299599A JP2000277662A JP 2000277662 A JP2000277662 A JP 2000277662A JP 11082995 A JP11082995 A JP 11082995A JP 8299599 A JP8299599 A JP 8299599A JP 2000277662 A JP2000277662 A JP 2000277662A
Authority
JP
Japan
Prior art keywords
circuit board
ceramic
substrate
alumina
board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11082995A
Other languages
Japanese (ja)
Other versions
JP3833410B2 (en
Inventor
Yutaka Komorida
裕 小森田
Norio Nakayama
憲隆 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP08299599A priority Critical patent/JP3833410B2/en
Publication of JP2000277662A publication Critical patent/JP2000277662A/en
Application granted granted Critical
Publication of JP3833410B2 publication Critical patent/JP3833410B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To enable a ceramic circuit board to be improved in the withstand voltage characteristic and protected against cracking which occurs when the board is mounted and put in operation, by a method wherein an alumina board whose alumina purity is above a specified value is used as a ceramic board, and voids of the alumina board are set smaller than a prescribed value. SOLUTION: A ceramic circuit board 1 is composed of a ceramic board 2 and a metal circuit board 3 of prescribed shape bonded to the board 2. An alumina board whose alumina purity is above 99.5% and void content is below 5 vol.% and which has few defects is used as the ceramic board 2. By this setup, the ceramic board 2 is enhanced enough in denseness even if a small amount of sintering auxiliary is used and becomes higher in thermal conductivity than a conventional alumina board. The alumina board itself is lessened in thickness so as to be reduced in heat resistance. A circuit board more excellent in heat dissipating properties can be formed by synergism of these effects.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はセラミックス回路基
板に係り、特に耐電圧特性を改善し、さらに取付時およ
び使用時における割れの発生を効果的に防止でき、信頼
性を向上させたセラミックス回路基板に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a ceramic circuit board, and more particularly, to a ceramic circuit board having improved withstand voltage characteristics, and capable of effectively preventing the occurrence of cracks during mounting and use and improving reliability. About.

【0002】[0002]

【従来の技術】近年、パワートランジスタモジュール用
基板やスイッチング電源モジュール用基板等の回路基板
として、セラミックス基板上に銅板、アルミニウム板、
各種クラッド板等の金属板を接合したセラミックス回路
基板が広く使用されている。また、上記セラミックス基
板としては、安価で汎用性が高いアルミナ(Al
)基板、または電気絶縁性を有すると共に熱伝導
性に優れた窒化アルミニウム(AlN)基板や窒化けい
素(Si)基板等が一般的に使用されている。
2. Description of the Related Art In recent years, as a circuit substrate such as a substrate for a power transistor module or a substrate for a switching power supply module, a copper plate, an aluminum plate,
Ceramic circuit boards in which metal plates such as various clad plates are joined are widely used. In addition, as the ceramic substrate, alumina (Al) which is inexpensive and has high versatility is used.
A 2 O 3 ) substrate, an aluminum nitride (AlN) substrate, a silicon nitride (Si 3 N 4 ) substrate, and the like, which have electrical insulating properties and excellent thermal conductivity, are generally used.

【0003】上述したような銅板等で回路を構成したセ
ラミックス回路基板1は、例えば図1〜図3に示すよう
に、セラミックス基板2の一方の表面に金属回路板3と
しての銅板を接合する一方、他方の表面に裏金属板4と
しての銅板を接合して形成される。
A ceramic circuit board 1 having a circuit formed of a copper plate or the like as described above, for example, as shown in FIGS. 1 to 3, has a copper plate as a metal circuit board 3 joined to one surface of a ceramic substrate 2. Is formed by bonding a copper plate as the back metal plate 4 to the other surface.

【0004】上記セラミックス基板2表面に各種金属板
または金属層を一体に形成する手法としては、下記のよ
うな直接接合法,高融点金属メタライズ法,活性金属法
などが使用されている。直接接合法は、例えばセラミッ
クス基板2上に、所定形状に打ち抜いた銅回路板等を接
触配置して加熱し、接合界面にCu−CuO,Cu−
O等の共晶液相を生成させて、この液相によりセラミッ
クス基板との濡れ性を高め、次いで、この液相を冷却固
化させることにより、セラミックス基板と銅回路板等と
を直接接合する、いわゆる銅直接接合法(DBC法:D
irect Bonding Copper法)であ
る。また、高融点金属メタライズ法は、MoやWなどの
高融点金属をセラミックス基板表面に焼き付けて金属回
路層を一体に形成する方法である。また、活性金属法
は、Ti,Zr,Hfなどの4A族元素のような活性を
有する金属を含むAg−Cuろう材層を介してセラミッ
クス基板2上に金属板を一体に接合する方法である。こ
の活性金属法によれば、ろう材層はCuおよびAg成分
により銅回路板との接合強度を高められる一方、Ti,
Zr,Hf成分によりろう材層はセラミックス基板との
接合強度が高められる。
As a method for integrally forming various metal plates or metal layers on the surface of the ceramic substrate 2, the following direct bonding method, refractory metal metallizing method, active metal method, and the like are used. In the direct bonding method, for example, a copper circuit board or the like punched into a predetermined shape is contacted and placed on the ceramic substrate 2 and heated, and Cu—Cu 2 O, Cu—
A eutectic liquid phase such as O is generated, the wettability with the ceramic substrate is increased by the liquid phase, and then the liquid phase is cooled and solidified to directly join the ceramic substrate and the copper circuit board, etc. The so-called copper direct bonding method (DBC method: D
direct bonding Copper method). The refractory metal metallization method is a method in which a refractory metal such as Mo or W is baked on the surface of a ceramic substrate to form a metal circuit layer integrally. The active metal method is a method of integrally joining a metal plate on the ceramic substrate 2 via an Ag-Cu brazing material layer containing an active metal such as a Group 4A element such as Ti, Zr, and Hf. . According to this active metal method, the brazing material layer can increase the bonding strength with the copper circuit board by the Cu and Ag components, while the Ti,
The bonding strength between the brazing material layer and the ceramic substrate is enhanced by the Zr and Hf components.

【0005】また、具体的な回路の形成方法としては、
予めプレス加工やエッチング加工によりパターニングし
た銅板を用いたり、接合後にエッチング等の手法により
パターニングする等の方法が知られている。これら直接
接合法や活性金属ろう付け法により得られるセラミック
ス回路基板は、いずれもセラミックス基板と金属回路板
との接合強度が高く、単純な構造を有するため、小型高
実装化が可能であり、また製造工程も短縮できる等の効
果が得られ、大電流型や高集積型の半導体チップに対応
できる等の利点を有している。
Further, as a specific method of forming a circuit,
There are known methods of using a copper plate that has been patterned by press working or etching in advance, and performing patterning by a technique such as etching after bonding. The ceramic circuit boards obtained by the direct bonding method or the active metal brazing method each have a high bonding strength between the ceramic substrate and the metal circuit board, and have a simple structure, so that they can be miniaturized and mounted. The advantages are that the manufacturing process can be shortened and the like, and it is possible to cope with a large current type or highly integrated semiconductor chip.

【0006】近年、セラミックス回路基板を使用した半
導体装置の高出力化,半導体素子の高集積化が急速に進
行し、セラミックス回路基板に繰り返して作用する熱応
力や熱負荷も増加する傾向にあり、セラミックス回路基
板に対しても上記熱応力や熱サイクルに対して十分な接
合強度と耐久性が要求されている。
In recent years, the output of a semiconductor device using a ceramic circuit board and the integration of a semiconductor element have been rapidly advanced, and the thermal stress and thermal load repeatedly acting on the ceramic circuit board have also tended to increase. Ceramic circuit boards are also required to have sufficient bonding strength and durability against the above thermal stress and thermal cycle.

【0007】上記熱負荷の増大に対処し、さらに回路基
板の耐久性を向上させるために、回路基板を構成するセ
ラミックス基板の厚さを0.25〜0.38mm程度に
薄肉化して熱抵抗を低減したり、たわみ性を改良して破
れの発生を防止する試みがなされている。一方、セラミ
ックス基板として純度が96%程度と比較的に高いアル
ミナ基板に、前記直接接合法または活性金属法により金
属回路板(回路層)を一体に接合してセラミックス回路
基板とする試みもなされている。
In order to cope with the increase in the heat load and to further improve the durability of the circuit board, the thickness of the ceramic substrate constituting the circuit board is reduced to about 0.25 to 0.38 mm to reduce the thermal resistance. Attempts have been made to reduce or improve the flexibility to prevent the occurrence of tears. On the other hand, attempts have been made to integrally bond a metal circuit board (circuit layer) to an alumina substrate having a relatively high purity of about 96% as a ceramic substrate by the direct bonding method or the active metal method to form a ceramic circuit substrate. I have.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、従来の
セラミックス回路基板においては、セラミックス基板の
種類や金属板の接合方法を改良することにより高い接合
強度は得られていたが、耐絶縁破壊特性,耐熱サイクル
性および曲げ強度が十分に得られず、耐圧リーク等が発
生し易くセラミックス回路基板を用いた半導体装置の信
頼性や製品歩留りが低くなるという問題点があった。
However, in the conventional ceramic circuit board, a high bonding strength has been obtained by improving the type of the ceramic substrate and the bonding method of the metal plate. There is a problem that the cycle performance and the bending strength are not sufficiently obtained, and a pressure leakage or the like is easily generated, and the reliability and the product yield of the semiconductor device using the ceramic circuit board are lowered.

【0009】すなわち、セラミックス回路基板に搭載す
る半導体素子の高集積化および高出力化に対応して熱サ
イクル負荷も大幅に上昇し、熱応力によって基板に割れ
が発生して回路基板の機能が喪失されてしまう問題点が
あった。また、セラミックス基板自体の曲げ強度が小さ
く、たわみ量も少ないため、組立時にセラミックス回路
基板を実装ボードにねじで締着固定しようとすると、ね
じの僅かな締着力によってセラミックス基板が破壊して
しまう場合があり、回路基板を使用した半導体装置の製
品歩留りが低下してしまう問題点もあった。また、セラ
ミックス基板の強度が小さく、また薄いために強度が不
足し、回路基板を組み込んだパワートランジスタモジュ
ールを放熱フィンに取り付ける際の締付け力によって割
れ易い難点があった。さらに、使用時に発生する熱応力
によって割れが発生する場合も多く半導体装置の信頼性
が低下する難点もあった。
That is, the thermal cycle load is greatly increased in accordance with the high integration and high output of the semiconductor elements mounted on the ceramic circuit board, and the board is cracked due to thermal stress and the function of the circuit board is lost. There was a problem that was done. In addition, since the ceramic substrate itself has low bending strength and a small amount of bending, if the ceramic circuit board is screwed and fixed to the mounting board at the time of assembly, the ceramic substrate may be broken by the slight tightening force of the screw. There is also a problem that the product yield of the semiconductor device using the circuit board is reduced. Further, the strength of the ceramic substrate is low and the strength is insufficient due to the thinness, and there is a problem that the power transistor module incorporating the circuit board is easily broken by a tightening force when the power transistor module is mounted on the radiation fin. In addition, cracks often occur due to thermal stress generated during use, and the reliability of the semiconductor device is disadvantageously reduced.

【0010】特に、セラミックス基板を前記のように
0.25〜0.38mmと薄肉化した場合には、セラミ
ックス基板の表面に形成された微小なピンホールやボイ
ド(気孔)によって回路基板全体の耐絶縁破壊特性が大
きく低下し、耐圧リーク等が発生し易くなる問題点もあ
った。
In particular, when the thickness of the ceramic substrate is reduced to 0.25 to 0.38 mm as described above, minute pinholes or voids (voids) formed on the surface of the ceramic substrate are used to withstand the entire circuit substrate. There is also a problem that the dielectric breakdown characteristics are greatly reduced, and a leak withstand voltage or the like is likely to occur.

【0011】本発明は上記問題点を解決するためになさ
れたものであり、高い耐電圧特性および優れた耐熱サイ
クル特性に加えて、高い曲げ強度(抗折強度)を有し、
大きな曲げ荷重が作用した場合においても割れや絶縁破
壊を招くことが少なく信頼性が高いセラミックス回路基
板を提供することを目的とする。
The present invention has been made to solve the above problems, and has high bending strength (flexural strength) in addition to high withstand voltage characteristics and excellent heat cycle characteristics.
It is an object of the present invention to provide a highly reliable ceramic circuit board which does not cause cracking or dielectric breakdown even when a large bending load is applied.

【0012】[0012]

【課題を解決するための手段】上記目的を達成するた
め、本願発明者らは、特にセラミックス回路基板の耐電
圧特性を改善し、取付時および使用時に発生する割れを
防止するための構造を種々検討した。その結果、特にセ
ラミックス基板として純度が99.5重量%以上の高純
度アルミナ基板を使用し、そのアルミナ基板内部に発生
するボイド(気孔)を所定値以下にしたときに、従来の
アルミナ基板と比較してビッカース硬度,熱伝導率,抗
折強度および靭性値が向上し、このアルミナ基板に銅
板,アルミニウム板,またはクラッド板などの回路板を
直接接合法または活性金属法によって一体に接合して回
路基板としたときに、セラミックス回路基板全体の耐絶
縁性,曲げ強度およびたわみ量を大きくすることがで
き、割れの発生が少ないセラミックス回路基板が得られ
るという知見を得た。
Means for Solving the Problems To achieve the above object, the present inventors have developed various structures for improving the withstand voltage characteristics of ceramic circuit boards in particular and for preventing cracks occurring during mounting and use. investigated. As a result, when a high-purity alumina substrate having a purity of 99.5% by weight or more is used as a ceramic substrate, and the voids (pores) generated inside the alumina substrate are reduced to a predetermined value or less, compared with the conventional alumina substrate. The Vickers hardness, thermal conductivity, flexural strength, and toughness are improved, and a circuit board such as a copper plate, aluminum plate, or clad plate is integrally joined to this alumina substrate by a direct joining method or an active metal method. It has been found that when used as a substrate, the insulation resistance, bending strength, and deflection of the entire ceramic circuit board can be increased, and a ceramic circuit board with less cracking can be obtained.

【0013】本発明は上記知見に基づいて完成されたも
のである。すなわち、本発明に係るセラミックス回路基
板は、セラミックス基板上に所定形状の金属回路板を接
合したセラミックス回路基板において、上記セラミック
ス基板はアルミナ(Al )純度が99.5%以上
であり、ボイド率が5体積%以下のアルミナ基板である
ことを特徴とする。
The present invention has been completed based on the above findings.
It is. That is, the ceramic circuit board according to the present invention
For the board, a metal circuit board of a predetermined shape is connected to a ceramic substrate.
In the combined ceramic circuit board,
Substrate is alumina (Al2O 3) Purity is 99.5% or more
And an alumina substrate having a void fraction of 5% by volume or less.
It is characterized by the following.

【0014】また、アルミナ基板のボイド率は3体積%
以下であることが、より好ましい。さらに、アルミナ基
板の絶縁耐圧は25KV/mm以上,靭性値は3.24
MPa・m1/2以上,熱伝導率は28W/m・K以
上,ビッカース硬度は1500以上,抗折強度は400
MPa以上であることが好ましい。
The void ratio of the alumina substrate is 3% by volume.
The following is more preferable. Further, the withstand voltage of the alumina substrate is 25 KV / mm or more, and the toughness value is 3.24.
MPa · m 1/2 or more, thermal conductivity 28 W / m · K or more, Vickers hardness 1500 or more, flexural strength 400
It is preferably at least MPa.

【0015】また、金属回路板が直接接合法によりセラ
ミックス基板に接合されていることを特徴とする。さら
に、金属回路板が銅回路板であり、この銅回路板がCu
−O共晶化合物によりセラミックス基板に接合されるよ
うに構成してもよい。また、金属回路板が、Ti,Z
r,Hfから選択される少なくとも1種を含有する活性
金属層を介してセラミックス基板と接合されるように構
成してもよい。
Further, the present invention is characterized in that the metal circuit board is joined to the ceramic substrate by a direct joining method. Further, the metal circuit board is a copper circuit board, and this copper circuit board is
You may comprise so that it may be joined to a ceramics substrate by a -O eutectic compound. Further, when the metal circuit board is made of Ti, Z
It may be configured to be bonded to a ceramic substrate via an active metal layer containing at least one selected from r and Hf.

【0016】本発明に係るセラミックス回路基板におい
て使用されるセラミックス基板としては、特にアルミナ
純度が99.5重量%以上であり、ボイド率(気孔率)
が5体積%以下の高純度で欠陥が少ないアルミナ(Al
)基板が使用される。上記アルミナ基板は、例え
ば以下のような製造方法によって調製される。すなわ
ち、α−アルミナ結晶から成り、粒径が1〜3μmと従
来より微細であり、純度が99.5〜99.99%であ
る高純度アルミナ粉末に焼結助剤としてのSiO ,M
gO,CaO等の金属酸化物を0.5重量%未満、好ま
しくは0.3重量%以下添加し、さらに必要に応じて有
機結合剤を添加した原料混合体をドクターブレード法等
により成形し、得られたシート状成形体を600℃前後
で完全に脱脂した後、温度1200〜1700℃で10
〜48時間と長時間焼結して製造される。例えば、この
とき適切な温度調整により脱脂と焼結とを同時に行う方
法を適用してもよい。
In the ceramic circuit board according to the present invention,
The ceramic substrate used for
Purity is 99.5% by weight or more, void ratio (porosity)
Is 5% by volume or less of high purity and few defects in alumina (Al
2O3) A substrate is used. The above alumina substrate, for example,
For example, it is prepared by the following production method. Sand
In other words, it is composed of α-alumina crystals and has a particle size
Finer than ever, with a purity of 99.5-99.99%
As a sintering aid for high-purity alumina powder 2, M
Less than 0.5% by weight of a metal oxide such as gO or CaO is preferable.
Or 0.3% by weight or less, and
The raw material mixture to which the binder is added
And the obtained sheet-like molded body is heated to about 600 ° C.
After completely degreased at a temperature of 1200 to 1700 ° C.
It is manufactured by sintering for as long as 48 hours. For example, this
When performing degreasing and sintering simultaneously by appropriate temperature adjustment
A law may be applied.

【0017】上記のように高純度のアルミナ原料粉末を
使用し、長時間焼結して得られた高純度アルミナ基板
は、焼結助剤量が少なくても緻密化が十分に進行し、ボ
イド率(気孔率)が5vol.%以下となり、また厚さ
が0.25〜0.38mm程度となるように薄肉化した
場合においても、絶縁耐圧が25KV/mm以上とな
り、優れた絶縁耐性を有する。さらに上記アルミナ基板
の靭性値は3.42MPa・m1/2以上となり、熱伝
導率は28W/m・K以上,その平均値が31W/m・
K以上、ビッカース硬度は1500以上,抗折強度は4
00MPa以上、その平均値が500MPa以上とな
り、熱伝導性(放熱性)および機械的強度も、従来の純
度96%級のアルミナ基板と比較して優れた特性を有す
る。特に、熱伝導率が従来のアルミナ基板と比較して高
くなる効果と、アルミナ基板自体の厚さを薄くして熱抵
抗を低減できる効果とが相乗して、より放熱性が優れた
回路基板を形成することができる。
As described above, the high-purity alumina substrate obtained by using the high-purity alumina raw material powder and sintering for a long period of time is sufficiently densified even if the amount of the sintering aid is small, and the void Rate (porosity) is 5 vol. % Or less, and even when the thickness is reduced to about 0.25 to 0.38 mm, the withstand voltage is 25 KV / mm or more, and excellent insulation resistance is obtained. Further, the alumina substrate has a toughness value of 3.42 MPa · m 1/2 or more, a thermal conductivity of 28 W / m · K or more, and an average value of 31 W / m · K.
K or more, Vickers hardness is 1500 or more, bending strength is 4
It is not less than 00 MPa, the average value is not less than 500 MPa, and it has excellent properties in terms of thermal conductivity (heat dissipation) and mechanical strength as compared with a conventional 96% purity alumina substrate. In particular, the effect of increasing the thermal conductivity compared to the conventional alumina substrate and the effect of reducing the thermal resistance by reducing the thickness of the alumina substrate itself are synergistic, resulting in a circuit board with better heat dissipation. Can be formed.

【0018】また上記金属回路板を構成する金属として
は、銅,アルミニウム,鉄,ニッケル,クロム,銀,モ
リブデン,コバルトの単体またはその合金またはそれら
のクラッド材など、基板成分との共晶化合物を生成し、
直接接合法や活性金属法を適用できる金属であれば特に
限定されないが、特に導電性および価格の観点から銅,
アルミニウムまたはその合金またはクラッド材が好まし
い。
The metal constituting the metal circuit board may be a eutectic compound with a substrate component, such as a simple substance of copper, aluminum, iron, nickel, chromium, silver, molybdenum, and cobalt, or an alloy thereof, or a clad material thereof. Generate
The metal is not particularly limited as long as it is a metal to which the direct bonding method or the active metal method can be applied.
Aluminum or its alloy or clad material is preferred.

【0019】金属回路板の厚さは、通電容量等を勘案し
て決定されるが、セラミックス基板としてのアルミナ基
板の厚さを0.25〜1.2mmの範囲とする一方、金
属回路板の厚さを0.1〜0.5mmの範囲に設定して
両者を組み合せると熱膨張差による変形などの影響を受
けにくくなる。特にアルミナ基板の厚さを0.25〜
0.38mm程度に薄くすることにより、熱抵抗が低減
され、回路基板の放熱性を相乗的に改善できる。
The thickness of the metal circuit board is determined in consideration of the current carrying capacity, etc., while the thickness of the alumina substrate as the ceramic substrate is in the range of 0.25 to 1.2 mm, while the thickness of the metal circuit board is If the thickness is set in the range of 0.1 to 0.5 mm and the two are combined, it is less susceptible to deformation or the like due to a difference in thermal expansion. In particular, the thickness of the alumina
By reducing the thickness to about 0.38 mm, the thermal resistance is reduced, and the heat dissipation of the circuit board can be synergistically improved.

【0020】金属回路板として銅回路板を使用し直接接
合法によって接合する場合には、酸素を100〜100
0ppm含有するタフピッチ電解銅から成る銅回路板を
使用し、さらに後述するように銅回路板表面に所定厚さ
の酸化銅層を予め形成することにより、直接接合時に、
発生するCu−O共晶の量を増加させ、基板と銅回路板
との接合強度を、より向上させることができるので好ま
しい。
When a copper circuit board is used as a metal circuit board and bonded by a direct bonding method, oxygen is added in an amount of 100 to 100.
By using a copper circuit board made of tough pitch electrolytic copper containing 0 ppm and further forming a copper oxide layer of a predetermined thickness on the copper circuit board surface in advance as described later,
It is preferable because the amount of generated Cu-O eutectic can be increased and the bonding strength between the substrate and the copper circuit board can be further improved.

【0021】上記酸化銅層などの酸化物層は、例えば金
属回路板を大気中において温度150〜360℃の範囲
にて20〜120秒間加熱する表面酸化処理を実施する
ことによって形成される。ここで、酸化銅層の厚さが1
μm未満の場合は、Cu−O共晶の発生量が少なくなる
ため、基板と銅回路板との未接合部分が多く、接合強度
を向上させる効果は少ない。一方、酸化銅層の厚さが1
0μmを超えるように過大にしても、接合強度の改善効
果が少なく、却って銅回路板の導電特性を阻害すること
になる。したがって、銅回路板表面に形成する酸化銅層
の厚さは1〜10μmの範囲が好ましい。そして同様の
理由により2〜5μmの範囲がより望ましい。
The oxide layer such as the copper oxide layer is formed by, for example, performing a surface oxidation treatment in which a metal circuit board is heated in the atmosphere at a temperature of 150 to 360 ° C. for 20 to 120 seconds. Here, the thickness of the copper oxide layer is 1
If it is less than μm, the amount of Cu—O eutectic generated is small, so that there are many unjoined portions between the substrate and the copper circuit board, and the effect of improving the joining strength is small. On the other hand, when the thickness of the copper oxide layer is 1
Even if the thickness is excessively larger than 0 μm, the effect of improving the bonding strength is small and the conductive properties of the copper circuit board are rather hindered. Therefore, the thickness of the copper oxide layer formed on the surface of the copper circuit board is preferably in the range of 1 to 10 μm. And for the same reason, the range of 2 to 5 μm is more desirable.

【0022】本発明に係るセラミックス回路基板におい
て、活性金属法によって金属回路板をアルミナ基板に接
合する際に形成される活性金属層は、Ti,Zr,Hf
から選択される少なくとも1種の活性金属を含有し適切
な組成比を有するAg−Cu系ろう材等で構成され、こ
のろう材組成物を有機溶媒中に分散して調製した接合用
組成物ペーストをセラミックス基板(アルミナ基板)表
面にスクリーン印刷する等の方法で形成される。
In the ceramic circuit board according to the present invention, the active metal layer formed when the metal circuit board is bonded to the alumina substrate by the active metal method includes Ti, Zr, and Hf.
A bonding composition paste comprising at least one active metal selected from the group consisting of an Ag-Cu-based brazing material having an appropriate composition ratio, and prepared by dispersing the brazing material composition in an organic solvent Is formed on the surface of a ceramic substrate (alumina substrate) by screen printing or the like.

【0023】上記接合用組成物ペーストの具体例として
は、下記のようなものがある。すなわち重量%でCuを
15〜35%、Ti、Zr、Hfから選択される少くと
も1種の活性金属を1〜10%、残部が実質的にAgか
ら成る組成物を有機溶媒中に分散して調製した接合用組
成物ペーストを使用するとよい。
Specific examples of the bonding composition paste include the following. That is, a composition consisting of 15 to 35% by weight of Cu, 1 to 10% of at least one active metal selected from Ti, Zr, and Hf and a balance substantially composed of Ag is dispersed in an organic solvent. It is good to use the bonding composition paste prepared in this way.

【0024】上記活性金属はセラミックス基板に対する
ろう材の濡れ性および反応性を改善するための成分であ
る。上記の活性金属の配合量は、接合用組成物全体に対
して1〜10重量%が適量である。
The active metal is a component for improving the wettability and reactivity of the brazing material with respect to the ceramic substrate. An appropriate amount of the active metal is 1 to 10% by weight based on the whole bonding composition.

【0025】上記構成に係るセラミックス回路基板によ
れば、アルミナ純度が99.5%以上であり、かつボイ
ド率が5体積%以下である高純度アルミナ基板を使用し
ており、従来の純度96%のアルミナ基板と比較して緻
密で強度が高いため、応力歪みに対して優れた耐性が得
られ、クラックの発生を効果的に抑止することが可能に
なる。
According to the ceramic circuit board having the above structure, a high-purity alumina substrate having an alumina purity of 99.5% or more and a void fraction of 5% by volume or less is used. Since it is dense and has high strength as compared with the alumina substrate, excellent resistance to stress distortion can be obtained, and the occurrence of cracks can be effectively suppressed.

【0026】また、アルミナ基板が緻密であり、ボイド
に由来する表面欠陥も少ないため、基板厚さを薄くした
場合においても、耐電圧特性の低下が少なく、絶縁破壊
(耐圧リーク)が発生することも少ない。
In addition, since the alumina substrate is dense and has few surface defects due to voids, even when the substrate thickness is reduced, a decrease in withstand voltage characteristics is small and dielectric breakdown (breakdown voltage leakage) occurs. Also less.

【0027】さらに、従来のアルミナ基板と比較して、
熱伝導率も高くなるため、回路基板で形成したモジュー
ルの過渡熱抵抗も小さくでき、優れた放熱性を発揮させ
ることができる。また、従来のアルミナ基板と比較して
強度が高くなり、より薄くして使用できる点と上記熱伝
導率が向上する点とが相乗して回路基板の放熱性をより
高めることが可能になる。
Further, as compared with the conventional alumina substrate,
Since the thermal conductivity also increases, the transient thermal resistance of the module formed of the circuit board can be reduced, and excellent heat dissipation can be exhibited. Further, the strength is higher than that of the conventional alumina substrate, and the point that the substrate can be used thinner and the point that the thermal conductivity is improved synergistically make it possible to further enhance the heat dissipation of the circuit board.

【0028】[0028]

【発明の実施の形態】次に本発明の実施形態について添
付図面を参照して以下の実施例に基づいて、より具体的
に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, embodiments of the present invention will be described more specifically with reference to the accompanying drawings based on the following examples.

【0029】実施例1〜2 平均粒径1.5μmのα−アルミナ結晶から成り、純度
が99.9%の高純度アルミナ粉末に対して焼結助剤と
してのSiOを0.2重量%(実施例1),0.5重
量%(実施例2)添加し、さらに有機結合剤を添加して
原料混合体をそれぞれ調製した。各原料混合体をドクタ
ーブレード法によりシート成形して板状の成形体を調製
し、この成形体を10−4Torrの真空中で800℃
で8時間加熱して完全に脱脂した。この脱脂体を温度1
600℃で20時間焼結することにより、図1〜3に示
すように縦29mm×横69mm×厚さ0.30mmの
実施例1〜2用のアルミナ基板2をそれぞれ調製した。
Examples 1 and 2 0.2% by weight of SiO 2 as a sintering aid was added to high-purity alumina powder having an average particle size of 1.5 μm and having a purity of 99.9%. Example 1 and 0.5% by weight (Example 2) were added, and an organic binder was further added to prepare raw material mixtures. Each raw material mixture is sheet-formed by a doctor blade method to prepare a plate-like molded body, and this molded body is 800 ° C. in a vacuum of 10 −4 Torr.
For 8 hours to completely degrease. This degreased body is heated at a temperature of 1
By sintering at 600 ° C. for 20 hours, alumina substrates 2 for Examples 1 to 2 each having a length of 29 mm × a width of 69 mm × a thickness of 0.30 mm were prepared as shown in FIGS.

【0030】比較例1〜3 一方、比較例1〜3用のアルミナ基板として表1に示す
純度(91〜96%)を有し、縦29mm×横63mm
×厚さ0.30mmのアルミナ基板2を用意した。
Comparative Examples 1 to 3 On the other hand, the alumina substrates for Comparative Examples 1 to 3 had the purity (91 to 96%) shown in Table 1 and were 29 mm long × 63 mm wide.
X An alumina substrate 2 having a thickness of 0.30 mm was prepared.

【0031】上記のように調製し、または用意した各ア
ルミナ基板のAl純度,ボイド率,絶縁耐圧,抗
折強度,靭性値,熱伝導率およびビッカース硬度をそれ
ぞれ測定して表1に示す結果を得た。
The Al 2 O 3 purity, void ratio, dielectric strength, bending strength, toughness, thermal conductivity, and Vickers hardness of each alumina substrate prepared or prepared as described above were measured and shown in Table 1. The results shown were obtained.

【0032】一方、図1〜3に示すように厚さ0.25
mmのタフピッチ電解銅から成る金属回路板3としての
銅回路板を各アルミナ基板2の表面側に接触配置する一
方、背面側に厚さ0.20mmのタフピッチ電解銅から
成る裏金属板4としての裏銅板を接触配置して積層体と
した。
On the other hand, as shown in FIGS.
A copper circuit board as a metal circuit board 3 made of tough pitch electrolytic copper having a thickness of 0.2 mm is disposed in contact with the front side of each alumina substrate 2, while a back metal plate 4 made of 0.20 mm thick tough pitch electrolytic copper is provided on the back side. The back copper plate was placed in contact to form a laminate.

【0033】次に、内部を窒素ガス雰囲気に調整し、温
度を1075℃に設定した加熱炉内に、上記各積層体を
挿入して1分間加熱することにより、各アルミナ基板2
の両面に金属回路板3または裏銅板4を直接接合法(D
BC法)によって接合した実施例1〜2および比較例1
〜3に係るセラミックス回路基板1をそれぞれ調製し
た。
Next, the interior of each laminate was inserted into a heating furnace whose temperature was set at 1075 ° C. and the laminate was heated for 1 minute.
Bonding the metal circuit board 3 or the back copper plate 4 directly to both sides of the
Examples 1 and 2 and Comparative Example 1 joined by the BC method)
Each of the ceramic circuit boards 1 according to Nos. 1 to 3 was prepared.

【0034】こうして調製した各セラミックス回路基板
1は、図1〜3に模式的に示すように、アルミナ基板2
の表面側に、所定の回路パターン形状をなす金属板路板
3が一体に接合される一方、背面側に一枚板状の裏銅板
4が一体に接合した構造を有する。
Each of the ceramic circuit boards 1 thus prepared is, as schematically shown in FIGS.
Has a structure in which a metal plate path plate 3 having a predetermined circuit pattern shape is integrally joined to the front surface side, and a single plate-shaped back copper plate 4 is integrally joined to the back surface side.

【0035】上記のように調製した実施例1〜2および
比較例1に係る各セラミックス回路基板1について、表
面側の回路パターン面の両端部を50mmの支持スパン
で支持する一方、背面側の裏銅板4の中央部の1点に荷
重を付加して3点曲げ強度を測定するとともに、アルミ
ナ基板2の両縁部を含む平面に対する最大たわみ量を測
定した。なお、各セラミックス回路基板1の抗折強度値
はアルミナ基板破断時の荷重値をアルミナ基板単体に対
する応力値として示している。また、最大たわみ量は、
アルミナ基板が破断した時点でのたわみ量として測定し
た。各測定結果を表2に示す。
With respect to each of the ceramic circuit boards 1 according to Examples 1 and 2 and Comparative Example 1 prepared as described above, both ends of the circuit pattern surface on the front side are supported with a support span of 50 mm, while the back side on the back side is supported. A load was applied to one point at the center of the copper plate 4 to measure the three-point bending strength, and the maximum deflection of the alumina substrate 2 with respect to a plane including both edges was measured. The flexural strength value of each ceramic circuit board 1 indicates a load value when the alumina substrate is broken as a stress value for the alumina substrate alone. Also, the maximum deflection is
It was measured as the amount of deflection at the time when the alumina substrate was broken. Table 2 shows the measurement results.

【0036】[0036]

【表1】 [Table 1]

【0037】[0037]

【表2】 [Table 2]

【0038】上記表1および表2に示す結果から明らか
なように、実施例1〜2に係るセラミックス回路基板1
によれば、アルミナ純度が99.5%以上であり、かつ
ボイド率が2体積%以下である高純度アルミナ基板2を
使用しており、比較例1で示す従来の純度96%のアル
ミナ基板と比較して緻密で抗折強度が高いため、応力歪
みに対して優れた耐性が得られ、クラックの発生を効果
的に抑止できることが判明した。特に、表2に示すよう
に実施例1〜2に係る回路基板によれば、DBC回路基
板で評価した場合においても、従来の比較例1の回路基
板と比較して、抗折強度と破壊に至るまでの最大たわみ
量とが共に大幅に増加するため、割れに対する優れた耐
性が発揮されることが判明した。
As is clear from the results shown in Tables 1 and 2, the ceramic circuit boards 1 according to Examples 1 and 2
According to the above, a high-purity alumina substrate 2 having an alumina purity of 99.5% or more and a void fraction of 2% by volume or less is used. It has been found that, as compared with the prior art, it is dense and has high bending strength, so that excellent resistance to stress strain can be obtained and generation of cracks can be effectively suppressed. In particular, as shown in Table 2, according to the circuit boards according to Examples 1 and 2, even when evaluated with the DBC circuit board, the bending strength and the breaking strength were lower than those of the conventional circuit board of Comparative Example 1. It has been found that both the maximum deflection and the maximum deflection are greatly increased, so that excellent resistance to cracking is exhibited.

【0039】また、各実施例用のアルミナ基板2が緻密
であり、ボイドに由来する表面欠陥も少ないため、基板
厚さを0.30mmと薄くした場合においても、絶縁耐
圧が25KV/mm以上と高く、絶縁破壊(耐圧リー
ク)が発生する危険性も大幅に減少することが確認でき
た。
Further, since the alumina substrate 2 for each embodiment is dense and has few surface defects due to voids, even when the substrate thickness is reduced to 0.30 mm, the withstand voltage is 25 KV / mm or more. It was confirmed that the risk of dielectric breakdown (breakdown voltage leakage) was significantly reduced.

【0040】さらに、各比較例で示す従来のアルミナ基
板(熱伝導率17〜24W/m・K)と比較して、各実
施例のアルミナ基板の熱伝導率も31W/m・Kと高く
なるため、回路基板で形成したモジュールの過渡熱抵抗
も小さくでき、優れた放熱性を発揮させることが可能と
なった。また、各比較例で示す従来のアルミナ基板と比
較して、各実施例では抗折強度が高くなり、より薄くし
て使用できる点と上記熱伝導率が向上する点とが相乗し
て回路基板の放熱性をより高めることが可能になること
が判明した。
Furthermore, the thermal conductivity of the alumina substrate of each embodiment is also as high as 31 W / m · K as compared with the conventional alumina substrate (thermal conductivity 17 to 24 W / m · K) shown in each comparative example. Therefore, the transient thermal resistance of the module formed by the circuit board can be reduced, and excellent heat dissipation can be exhibited. Further, as compared with the conventional alumina substrate shown in each comparative example, in each of the examples, the flexural strength is increased, the point that the thinner substrate can be used, and the point that the thermal conductivity is improved are synergistic. It has been found that it is possible to further enhance the heat dissipation of the slab.

【0041】なお、以上の実施例および比較例において
は、銅直接接合法(DBC法)を使用して銅回路板等を
アルミナ基板に一体に接合した回路基板を形成した例で
説明しているが、活性金属法を使用して、Ti,Zr,
Hf等の活性金属を含有するAg−Cuろう材層を介し
て銅回路板等をアルミナ基板に一体に接合した場合につ
いても、上記実施例1〜2とほぼ同様な効果が得られ
た。
In the above Examples and Comparative Examples, a circuit board in which a copper circuit board or the like is integrally bonded to an alumina substrate using a copper direct bonding method (DBC method) is described. Use the active metal method to obtain Ti, Zr,
In the case where a copper circuit board or the like is integrally joined to an alumina substrate via an Ag-Cu brazing material layer containing an active metal such as Hf, substantially the same effects as those in Examples 1 and 2 were obtained.

【0042】[0042]

【発明の効果】以上説明の通り、本発明に係るセラミッ
クス回路基板によれば、アルミナ純度が99.5%以上
であり、かつボイド率が5体積%以下である高純度アル
ミナ基板を使用しており、従来の純度96%のアルミナ
基板と比較して緻密で強度が高いため、応力歪みに対し
て優れた耐性が得られ、クラックの発生を効果的に抑止
することが可能になる。
As described above, according to the ceramic circuit board of the present invention, a high-purity alumina substrate having an alumina purity of 99.5% or more and a void fraction of 5% by volume or less is used. Since it is dense and has high strength as compared with a conventional 96% pure alumina substrate, excellent resistance to stress strain can be obtained and cracks can be effectively suppressed.

【0043】また、アルミナ基板が緻密であり、ボイド
に由来する表面欠陥も少ないため、基板厚さを薄くした
場合においても、耐電圧特性の低下が少なく、絶縁破壊
(耐圧リーク)が発生することも少ない。
In addition, since the alumina substrate is dense and has few surface defects due to voids, even when the substrate thickness is reduced, there is little decrease in withstand voltage characteristics and dielectric breakdown (breakdown voltage leakage) occurs. Also less.

【0044】さらに、従来のアルミナ基板と比較して、
熱伝導率も高くなるため、回路基板で形成したモジュー
ルの過渡熱抵抗も小さくでき、優れた放熱性を発揮させ
ることができる。また、従来のアルミナ基板と比較して
強度が高くなり、より薄くして使用できる点と上記熱伝
導率が向上する点とが相乗して回路基板の放熱性をより
高めることが可能になる。
Further, as compared with the conventional alumina substrate,
Since the thermal conductivity also increases, the transient thermal resistance of the module formed of the circuit board can be reduced, and excellent heat dissipation can be exhibited. Further, the strength is higher than that of the conventional alumina substrate, and the point that the substrate can be used thinner and the point that the thermal conductivity is improved synergistically make it possible to further enhance the heat dissipation of the circuit board.

【図面の簡単な説明】[Brief description of the drawings]

【図1】セラミックス回路基板のパターン面側の構成を
示す平面図。
FIG. 1 is a plan view showing a configuration on a pattern surface side of a ceramic circuit board.

【図2】図1に示すセラミックス回路基板の断面図。FIG. 2 is a cross-sectional view of the ceramic circuit board shown in FIG.

【図3】図1に示すセラミックス回路基板の裏面側の構
成を示す背面図。
FIG. 3 is a rear view showing the configuration on the back side of the ceramic circuit board shown in FIG. 1;

【符号の説明】[Explanation of symbols]

1 セラミックス回路基板(アルミナ回路基板) 2 セラミックス基板(Al基板) 3 金属回路板(銅回路板) 4 裏金属板(銅板)1 ceramic circuit board (alumina circuit board) 2 ceramic substrate (Al 2 O 3 substrate) 3 metal circuit plate (copper circuit board) 4 back metal plate (copper plate)

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 セラミックス基板上に所定形状の金属回
路板を接合したセラミックス回路基板において、上記セ
ラミックス基板はアルミナ(Al)純度が99.
5%以上であり、ボイド率が5体積%以下のアルミナ基
板であることを特徴とするセラミックス回路基板。
1. A ceramic circuit board in which a metal circuit board having a predetermined shape is joined to a ceramic substrate, wherein the ceramic substrate has an alumina (Al 2 O 3 ) purity of 99.
A ceramic circuit board, which is an alumina substrate having a void ratio of 5% or more and a void fraction of 5% by volume or less.
【請求項2】 アルミナ基板のボイド率が3体積%以下
であることを特徴とする請求項1記載のセラミックス回
路基板。
2. The ceramic circuit board according to claim 1, wherein the void ratio of the alumina substrate is 3% by volume or less.
【請求項3】 アルミナ基板の絶縁耐圧が25KV/m
m以上であることを特徴とする請求項1記載のセラミッ
クス回路基板。
3. The dielectric strength of an alumina substrate is 25 KV / m.
2. The ceramic circuit board according to claim 1, wherein the length is at least m.
【請求項4】 アルミナ基板の靭性値が3.2MPa・
1/2以上であることを特徴とする請求項1記載のセ
ラミックス回路基板。
4. An alumina substrate having a toughness of 3.2 MPa ·
2. The ceramic circuit board according to claim 1, wherein the value is m 1/2 or more.
【請求項5】 アルミナ基板の熱伝導率が28W/m・
K以上であることを特徴とする請求項1記載のセラミッ
クス回路基板。
5. The thermal conductivity of an alumina substrate is 28 W / m ·
2. The ceramic circuit board according to claim 1, wherein K is not less than K.
【請求項6】 アルミナ基板のビッカース硬度が150
0以上であることを特徴とする請求項1記載のセラミッ
クス回路基板。
6. The alumina substrate has a Vickers hardness of 150.
2. The ceramic circuit board according to claim 1, wherein the value is 0 or more.
【請求項7】 アルミナ基板の抗折強度が400MPa
以上であることを特徴とする請求項1記載のセラミック
ス回路基板。
7. The alumina substrate has a bending strength of 400 MPa.
2. The ceramic circuit board according to claim 1, wherein:
【請求項8】 金属回路板が直接接合法によりセラミッ
クス基板に接合されていることを特徴とする請求項1記
載のセラミックス回路基板。
8. The ceramic circuit board according to claim 1, wherein the metal circuit board is joined to the ceramic substrate by a direct joining method.
【請求項9】 金属回路板が銅回路板であり、この銅回
路板がCu−O共晶化合物によりセラミックス基板に接
合されていることを特徴とする請求項1記載のセラミッ
クス回路基板。
9. The ceramic circuit board according to claim 1, wherein the metal circuit board is a copper circuit board, and the copper circuit board is joined to the ceramic substrate by a Cu—O eutectic compound.
【請求項10】 金属回路板が、Ti,Zr,Hfから
選択される少なくとも1種を含有する活性金属層を介し
てセラミックス基板と接合されていることを特徴とする
請求項1記載のセラミックス回路基板。
10. The ceramic circuit according to claim 1, wherein the metal circuit board is joined to the ceramic substrate via an active metal layer containing at least one selected from Ti, Zr, and Hf. substrate.
JP08299599A 1999-03-26 1999-03-26 Ceramic circuit board Expired - Lifetime JP3833410B2 (en)

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Publication number Priority date Publication date Assignee Title
JP2002246714A (en) * 2001-02-21 2002-08-30 Kyocera Corp Ceramic circuit board
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JP2003174115A (en) * 2001-09-26 2003-06-20 Kyocera Corp Composite ceramic component and method of manufacturing the same
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JPWO2017047512A1 (en) * 2015-09-16 2017-09-14 Semitec株式会社 Resistors and temperature sensors
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