JP2000276217A - Simulator for substrate processing device and computer readable recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To simulate the moving condition of a substrate and the operating condition of a carrier robot without actually operating a substrate processing device for successively processing substrates to report the result to an operator and to guide optimum input regulation time as well. SOLUTION: The respective operation units of the substrate processing device are provided with respectively modeled objects (modules). The object is one module for guiding time required for the operation of one operation unit on the basis of various parameters. Each object is independent of the other object but the other object is activated by event driven. Thus, since respective objects can be processed parallel while mutually relating the processing, simulation is enabled in response to the real processing of the substrate processing device and the simulated result is made optimum while reducing errors as well.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a semiconductor wafer,
A simulation apparatus for a substrate processing apparatus that sequentially performs a predetermined process on a precision substrate (hereinafter, simply referred to as a “substrate”) such as a glass substrate for a liquid crystal display and a plasma display panel, and a computer readable recording the program thereof. Recording media.

[0002]

2. Description of the Related Art FIG. 1 is a schematic diagram showing an example of a substrate processing apparatus for sequentially processing substrates. As shown in FIG. 1, the substrate processing apparatus 100 includes four transfer robots RB1.
RB4, and various processing tanks (processing units) 102 to 110 between the loader 101 and the unloader 111.
It has. In each processing tank, the substrate is processed with a predetermined processing liquid such as a chemical solution or pure water. Note that the chuck washing tank 102 is a tank for washing the chuck section holding the substrate by the transfer robot RB1. The transfer robot RB1 transfers a substrate between the loader 101 and the washing tank 104. The transfer robot RB2 transfers the substrate between the washing tank 104 and the washing tank 108. Transfer robot RB
No. 3 carries between the washing tank 108 and the spin dryer 110. The transfer robot RB4 transfers the substrate on which the drying process has been completed by the spin dryer 110 to the unloader 111.

The chemical solution tank 103 is a tank for washing the substrate by immersing the substrate in a mixed solution of ammonia and hydrogen peroxide solution (SC-1 solution). The washing tank 104 is a tank for washing the substrate by alternately overflowing hot pure water and rapid draining. The chemical solution tank 105 is a tank for etching a substrate by immersing the substrate in hydrofluoric acid. The overrinsing tank 106 is a tank for immersing the substrate in a tank in which pure water overflows to remove hydrofluoric acid attached to the substrate. Chemical solution tank 107 contains a mixed solution (SC) of hydrochloric acid and hydrogen peroxide solution.
This is a tank in which the substrate is washed by immersing the substrate in the second liquid. The washing tank 108 is a tank similar to the washing tank 104,
This is a tank for removing the SC-2 solution from the substrate surface. The final rinsing tank 109 is a tank for rinsing the substrate by immersing the substrate in pure water. Further, the spin dryer 110 is a processing tank that rotates the substrate and shakes off the pure water attached to the substrate by centrifugal force to dry.

In such a substrate processing apparatus 100,
The substrate to be processed is loaded into the loader 1 by the transfer robot RB1.
The transfer robots RB1 to RB are sequentially paid out from 01.
4 are configured to operate in cooperation with each other to be sequentially conveyed from the chemical solution tank 103 in the X direction and to perform predetermined processing.

[0005] In each processing tank, a processing time such as an immersion time which is optimal for performing a predetermined processing on the substrate is set. Substrates transferred by the transfer robots RB1 to RB4 are performed for each lot in which a plurality of substrate groups are set as one transfer unit. In the processing of the substrate, the processing content may be different for each lot, and in such a case, the setting of the processing time in each processing tank may be different.

Accordingly, in the substrate processing apparatus 100, the timing of loading the substrate of the next lot from the loader 101 into the processing tank is such that the substrate of the subsequent lot does not catch up with the substrate of the previously loaded lot. There is a need.

For example, in the chemical solution tank 105, the immersion process for a certain lot of substrates is completed for a predetermined time, and the substrate of the lot is moved to the next overrinse tank 106. If a substrate of a lot earlier than the lot is being washed, the substrate of the lot cannot be moved to the over-rinse tank 106. In this case, the substrate of the lot is immersed in hydrofluoric acid for more than a predetermined immersion time, and is over-etched, so that a defective product is generated.

Therefore, when a lot is loaded from the loader 101, a predetermined time interval must be provided after the previous lot is loaded. This interval is referred to as the "regulation time". If the charging regulation time is longer than necessary, the operating rate of the substrate processing apparatus 100 will be reduced.

Conventionally, the charging regulation time is derived by the following two methods and set in the substrate processing apparatus 100.

The first method is a method of calculating the regulation time of the feeding by calculation. FIG. 14 is a diagram for explaining a method of calculating the first insertion regulation time. FIG.
Is in seconds. FIG. 14A shows a preceding lot. Substrates of the preceding lot are sequentially processed in the processing tanks 103 to 110. The processing time in each processing tank is as shown in FIG.

First, the time (arrival time) at which the substrate of the preceding lot arrives at all the processing tanks is calculated from the processing time of each processing tank shown in FIG. This arrival time is the sum of the processing times up to the processing tank before the processing tank. For example, the time required for the substrate of the preceding lot to arrive at the over-rinse tank 106 is equal to the time of the earlier processing tank 10.
The sum of the processing times (“30 seconds”, “10 seconds”, and “20 seconds”) required in 3, 104, and 105 is “60 seconds”.

In a given processing tank, the time when the processing tank can be used is the time obtained by adding the processing time in the processing tank to the arrival time of the substrate of the preceding lot.

However, the processing time does not include the time required for the transfer robots RB1 to RB4 to transfer the substrate. Therefore, conventionally, a fixed lag time is set for each processing tank, including the time required for chucking and washing the transfer robot by the transfer robot in addition to the transfer of the substrate. In the example of FIG. 14, the lag time is set as 20 seconds.
FIG. 14A shows the accumulated value of the lag time up to the processing tank.

Accordingly, in an arbitrary processing tank, the processing time of the substrate of the preceding lot is completed, and the usable time for processing the substrate of the next lot is determined by the processing time, the arrival time, and the lag in FIG. This is the time obtained by adding all the accumulated values of the time.

Next, FIG. 14B is a diagram showing processing of a lot (new lot) to be input next to the preceding lot of FIG. 14A. The substrates of the new lot are placed in the processing tank 103,
Processing is sequentially performed at 106 and 110, and is not performed in other processing tanks. The processing time in the processing tanks 103, 106, and 110 is as shown in FIG. 14B, but the processing time in the processing tank that is not used is “0”. And
As in the case of the preceding lot of FIG. 14A, the arrival time of each new lot in each processing tank is calculated as shown in FIG. 14B.

In general, if an arbitrary processing tank is provided with a time interval obtained by subtracting the arrival time of a new lot from the usable time when the processing of the preceding lot is completed and becomes usable, a new lot is input. The new lot does not catch up with the preceding lot in the processing tank. Therefore, if the arrival time of the new lot is subtracted from the usable time for all the processing tanks and the maximum value is set as the input regulation time, the new lot catches up with the preceding lot in all the processing tanks inside the substrate processing apparatus 100. Therefore, problems such as over-etching can be avoided, and the operating rate of the substrate processing apparatus 100 is the highest.

FIG. 14 (c) shows a value obtained by subtracting the arrival time of FIG. 14 (b) from the usable time of FIG. 14 (a). According to FIG. 14C, the maximum value is “330” of the spin dryer 110. Therefore, after the substrate of the preceding lot is paid out from the loader 101 and a new lot is paid out after a lapse of 330 seconds, the substrate processing apparatus 100 Lot catch-up is eliminated internally. Accordingly, in the case of the example of FIG. 14, the insertion regulation time is set to “330 seconds”.

In the first method, the timing of paying out the next lot in the loader 101 is controlled by automatically performing the above-described arithmetic processing.

Next, a second method is to use the substrate processing apparatus 100.
In this method, the movement of the substrate for each lot is manually created as a time chart while considering the processing time of each processing tank, the operation of the transfer robot, and the like. Then, based on the created time chart, it is possible to determine the entry control time of the new lot.

[0020]

In a recent substrate processing apparatus, a cover is provided on the chemical solution tanks 103, 105, and 107, the spin dryer 110, or between the loader 101 and the processing tank, or between any processing tanks. Is often provided with a shutter. In the case of such an apparatus, a time for opening and closing these covers and shutters is required when transporting the substrate.

However, in the first method, the lag time is set to a constant value in the processing tank that requires the operation of the cover and the shutter, as in the other processing tanks. It will be low. In addition, the lag time may include a margin. Therefore, there is a problem that the charging regulation time obtained by the first method is not an optimal interval.

Even when the time chart is created manually as in the second method, if the time chart is created while taking into account the operation of the cover and the shutter, the calculation becomes extremely complicated. Therefore, there is a problem that a great deal of labor and work time are required for the creation. Such work has to be performed every time a lot of various processing procedures are mixed and the processing procedure is changed, resulting in poor work efficiency.

Further, the apparatus configuration itself of the substrate processing apparatus 100 may be changed in accordance with a change in the processing procedure of the substrate. In such a case, in the first method, a program for performing an automatic calculation is used. However, there is a problem that it is necessary to newly create or make a significant correction, while the second method also needs to newly create a time chart with a great deal of labor and work time.

As described above, in order to eliminate over-processing such as over-etching of the substrate and to maximize the operation rate of the substrate processing apparatus 100, it is very difficult to guide an optimal charging regulation time. Importantly, if the operator (operator) can easily and easily know the movement state of the substrate for each lot and the operation of the transfer robots RB1 to RB4 before actually operating the substrate processing apparatus 100, it is important. Is more preferable.

However, conventionally, there is no device for notifying the operator of the movement status of the substrate for each lot and the operation of the transfer robots RB1 to RB4 and the like. In addition to the small intervals, the second method requires a great deal of labor.

The present invention has been made in view of the above problems, and simulates the movement state of a substrate and the operation state of a transfer robot without actually operating a substrate processing apparatus for sequentially processing substrates. It is another object of the present invention to provide a simulation apparatus for a substrate processing apparatus capable of notifying an operator of the result thereof and deriving an optimum charging regulation time, and a computer-readable recording medium recording a program thereof.

[0027]

In order to achieve the above object, the invention according to claim 1 is directed to an operation progress state when performing a series of substrate processing using a substrate processing apparatus having a plurality of operation units. A device for simulating: (a) a group of simulating means for simulating the operation progress status for each operation unit of the substrate processing apparatus; and (b) a result of simulating a series of substrate processing by the group of simulating means. Simulation result output means for generating a simulation result by activating the simulation means group in an event-driven manner.

According to a second aspect of the present invention, in the simulation apparatus of the first aspect, the simulation result output means includes:
(b-1) It is characterized by having a graphical display signal output means for simulating the progress of the substrate until a series of substrate processing is completed and outputting it as a signal capable of graphical display.

According to a third aspect of the present invention, in the simulating apparatus of the first or second aspect, the substrate processing apparatus includes a plurality of processing units as a plurality of operation units and a substrate sequentially provided to the plurality of processing units. And a transport mechanism for transporting the plurality of processing units, (a-1) a plurality of processing unit simulating means for simulating the processing progress in each of the plurality of processing units, (a-2) Transport mechanism simulating means for simulating the transport progress of the transport mechanism.

According to a fourth aspect of the present invention, there is provided the simulation apparatus according to any one of the first to third aspects, wherein (c)
Time interval setting means for registering a time interval for sequentially sending out a plurality of substrate groups to a series of substrate processing processes of the substrate processing apparatus for each substrate group, and (d) a plurality of sequentially sent out time intervals. Means for activating the simulating means group for the group of substrates in an event-driven manner; (e) determining means for determining the presence or absence of mutual interference of a plurality of substrate groups in the substrate processing apparatus; And a minimum value determining means for obtaining an optimum interval near the minimum value of the time interval within a range in which the plurality of substrate groups do not interfere with each other.

According to a fifth aspect of the present invention, in the simulation apparatus of the fourth aspect, the contents and order of a series of substrate processing can be set for each substrate group.

According to a sixth aspect of the present invention, in the simulation apparatus according to any one of the first to fourth aspects, the simulation apparatus is configured separately from the substrate processing apparatus.

According to a seventh aspect of the present invention, in the simulation apparatus according to any one of the first to fourth aspects, the simulation apparatus is incorporated in a substrate processing apparatus.

According to an eighth aspect of the present invention, a program for operating a computer as the simulation device according to any one of the first to sixth aspects is recorded on a computer-readable recording medium.

[0035]

DESCRIPTION OF THE PREFERRED EMBODIMENTS <1. Configuration of Substrate Processing Apparatus> FIG. 1 shows an example of a substrate processing apparatus according to an embodiment of the present invention. Therefore, the outline of the substrate processing apparatus 100 is the same as that already described.

The chemical baths 103, 105, and 107 are provided with an openable / closable cover (not shown) to prevent the atmosphere from leaking from the respective processing baths. An openable / closable cover (not shown) is attached to prevent the liquid from scattering due to centrifugal force.

The loader 101 and the chuck washing tank 10
A shutter (not shown) for blocking the cleaning liquid used in the chuck washing tank 102 from entering the loader 101 is provided between the shutter 2 and the cleaning water tank 2. And the washing tank 10
A shutter (not shown) is also provided between the tank 4 and the chemical tank 105 to prevent the processing liquids in both tanks from entering each other. Further, a shutter (not shown) is provided between the washing tank 108 and the final rinsing tank 109 in order to prevent the processing solutions in both tanks from entering each other.

Various elements and sensors are attached to each processing tank as needed. For example, the chemical solution tank 103
The ultrasonic transducer is disposed in the SC-1 liquid to promote the activation of the processing on the substrate by vibrating the SC-1 liquid. In addition, each chemical solution tank 103, 105, 1
07 is provided with a temperature control element and a temperature sensor, respectively, in order to adjust each chemical solution to a predetermined temperature.

With such a configuration, the substrates to be processed are transported by the transport robots RB1 to RB4 for each lot, and are sequentially processed in a predetermined processing tank. When the transfer robots RB1 to RB4 transfer the substrate, the above-described opening and closing operations of the cover and the shutter are performed as necessary. In addition, when the set temperature of the chemical solution is different for each lot, the temperature is adjusted for each lot by the temperature element or the temperature sensor, and when the processing solution in each processing tank reaches the end of its life, before the processing of the next lot is started. Replace the processing solution.

The operation of the substrate processing apparatus 100 is as follows.
It is controlled by a control mechanism. FIG. 2 shows a substrate processing apparatus 1
It is a control block diagram of 00. As shown in FIG. 2, the substrate processing apparatus 100 has three CPs, a master CPU 121, a robot control CPU 122, and a tank control CPU 123.
U is provided. The master CPU 121 is a CPU that controls the entire substrate processing apparatus 100, and the robot control CPU 122 is configured to control the transfer robots RB1 to RB.
4 is a CPU for controlling the operation of FIG. Furthermore, C for tank control
The PU 123 controls the operations such as opening and closing the valves of the processing tanks 102 to 110, and also performs the above-described chemical liquid tank 103,
Temperature control elements TC1 to TC3 for controlling opening and closing operations of covers C1 to C4 provided on 105 and 107 and spin dryer 110, controlling shutters SH1 to SH3 provided between predetermined processing tanks, and adjusting the temperature of the chemical solution. And temperature sensor TS
C to control the TS1 to TS3, the ultrasonic vibrator US, etc.
PU.

A CRT 131 and a keyboard 132 are connected to the master CPU 121.
While referring to the screen display of the RT 131, the keyboard 132
By operating, various parameters in substrate processing can be set and input. Also, the master CPU 1
The storage unit 133 is connected to the keyboard 21.
Various parameters input from the interface 32 and other parameters required when processing the substrate in the substrate processing apparatus 100 can be stored in the storage unit 133. These parameters include semi-fixed fixed data irrespective of the apparatus configuration (for example, the moving speed of each transfer robot in the X direction, the distance that the transfer robot moves in each processing tank or loader in the vertical direction, the cover and the shutter). Is the time required for opening and closing operations, etc.), and variable data that is frequently changed (for example,
Recipe data (for example, the size of each processing tank, the life of a chemical solution, the replenishment interval, etc.), and the processing content of the substrate for each lot.
Transfer order, processing time in each processing tank, temperature of chemical solution at the time of processing, etc.).

When processing the substrate,
The master CPU 121 stores the various parameters in the storage unit 1
33, and issues an instruction to the robot control CPU 122 and the tank control CPU 123 to perform an appropriate operation based on the recipe data set for each lot. The robot control CPU 122 includes the master CPU 12
1 and each of the transfer robots RB1 to RB4 is driven based on a command from the tank control CPU 123, while the tank control CPU 123 is also controlled by the processing tanks 102 to RB4 based on commands from the master CPU 121 and the robot control CPU 122.
The controller 110 is configured to operate and control the opening and closing operations of the covers C1 to C4 and the shutters SH1 to SH3 to adjust the temperature of the chemical solution.

<2. Simulating apparatus> Substrate processing apparatus 1 having a plurality of operation units such as a transfer robot, a processing tank, a shutter, a cover, and a temperature adjustment mechanism as described above.
A description will be given of a simulation apparatus of a substrate processing apparatus that simulates an operation progress state when a series of substrate processing is performed using 00.

In the apparatus for simulating a substrate processing apparatus according to this embodiment, the operation of each operation unit of the substrate processing apparatus 100 is virtually performed by processing in a computer without actually operating the substrate processing apparatus 100 having the above configuration. It reproduces and thereby simulates the operation progress status of the entire substrate processing apparatus 100, and as a result, outputs the throughput of the substrate processing apparatus 100 and the optimal charging regulation time for each lot.

FIG. 3 is a diagram showing an example of the configuration of a simulation device 200 according to this embodiment. As shown in FIG. 3, an input / output device 201, a CPU
202, a memory 203, a storage unit 204, and interfaces 205, 206, and 209 are mutually connected via a bus line 210. The input / output device 201 is a device that reads data from and writes data to a computer-readable portable recording medium 211 such as a flexible disk, a magneto-optical disk, and a CD-ROM. The CPU 202 is a processing unit that performs arithmetic processing. The memory 203 is a device for temporarily storing and holding data. The storage unit 204 is a computer-readable fixed recording medium such as a magnetic disk, and stores an operating system (OS) and a simulation device. A simulation program to be realized and the above-described fixed data, variable data, recipe data, and the like are stored. Further, a display device 207 such as a CRT or a liquid crystal display is connected to the interface 205, and a keyboard 208 is connected to the interface 206.
Is connected. Further, the interface 209
An interface for performing communication or the like with the external substrate processing apparatus 100, and can transmit data from the simulation apparatus 200 to the substrate processing apparatus 100 and receive data from the substrate processing apparatus 100. .

As described above, the simulation apparatus 200 of the substrate processing apparatus according to the present embodiment is a general computer in which a multitasking operating system (OS) is installed.
An apparatus 02 is realized by executing a predetermined simulation program.

The above simulation program is
The information may be read from the portable recording medium 211, or may be stored in the storage unit 204 in advance as described above.
That is, the simulation program is stored regardless of whether it is a portable recording medium or a fixed recording medium.

The simulation device 2 configured as described above
At 00, each operation unit of the substrate processing apparatus 100 described above is realized by a modeled object (module), and each object is executed by the CPU 202 of the simulation apparatus 200, thereby simulating means for each operation unit. Function as Here, an object is one module for deriving the time required for the operation of one operation unit based on the various parameters described above. Each object is independent of other objects, but the object itself is not a completed program, but becomes the simulation program in a state where all objects are connected.

Here, a model structure of each operation unit of the substrate processing apparatus 100 will be described. FIG. 4 shows a simulation apparatus 200 for a substrate processing apparatus according to this embodiment.
FIG. 2 is a conceptual diagram showing an example of a model structure of each operation unit of the substrate processing apparatus 100 executed by the apparatus. FIG.
The solid line connecting between the objects indicates a part of the relationship in which the object can transmit and receive a message to and from the other object connected by the solid line. Indicates that it is activated by the object.

The event object 231 includes a cover object 232 and a shutter
3, superclasses such as a chemical exchange object 234, a tank management object 235, a processing tank object 237, a master object 236, and a transfer robot object 238. This event object 232
Cover object 232, shutter object 233, chemical liquid exchange object 234, which is a subclass of
Tank management object 235, processing tank object 23
7, each of the master object 236, the transfer robot object 238, and the like activates another object connected to the individual object based on predetermined recipe data, and starts a simulation process.
The cover object 232 is an object that simulates the operation of a cover provided in a predetermined processing tank of the substrate processing apparatus 100. The cover object 232 is activated by a command from the processing tank object 235 and the like, and covers C1 to C illustrated in FIG.
3 is simulated. Shutter object 2
Reference numeral 33 denotes an object that simulates the operation of a shutter provided at a predetermined position of the substrate processing apparatus 100, is activated by a command from the processing tank object 235 or the like, and controls the operation of the shutters SH1 to SH3 shown in FIG. Simulate. The chemical exchange object 234 is an object for managing and controlling the life of each chemical in the chemical tanks 103, 105, and 107, the time required for controlling the temperature of the chemical, and the like, and is activated by a command from the processing tank object 235 or the like in the same manner as described above. The temperature sensors TS1 to TS shown in FIG.
The operation of S3 and the temperature control elements TC1 to TC3 are simulated. The tank management object 235 is an object for managing the preparation state of each processing tank. The master object 236 is the master CPU 1 of the substrate processing apparatus 100.
21 is an object that virtually realizes some functions during substrate processing.

The processing tank object 237 is an object for making a request for unloading a substrate from each processing tank, for making a request for loading a substrate into each processing tank, and for controlling each processing tank. Activated by the object,
A part of the function of the tank control CPU 123 shown in FIG. 2 is simulated. The transfer robot object 238 is shown in FIG.
Is an object that simulates the function of the robot control CPU 122, and functions as a transport mechanism simulating unit that simulates the actual progress status of substrate transport.

The spin dryer cover object 239 is a cover C provided on the spin dryer 110.
4 simulates the operation of FIG.

The tank manager 240 is an object for specifying a processing tank to which a substrate is transported for each lot and checking whether the processing tank can be prepared. The recipe manager 241 generates a different recipe for each lot,
This is an object that provides detailed data of a recipe for each lot to the master object and the processing tank object. The recipe manager 241 is effective for simulating the operation of the substrate processing apparatus 100 when changing the recipe for each lot. The tank manager 240 and the recipe manager 241 do not simulate a specific operation unit of the substrate processing apparatus 100.

The file object 242 is an object that stores the state of the transfer robot and each processing tank as a file in the storage unit 204 or the like so that the simulation result can be output later. The file object 242 is not an object that simulates the operation unit of the substrate processing apparatus 100, but is provided so that the simulation result of the simulation apparatus 200 can be used effectively.

Further, the loader object 243 is an object for simulating the loading operation of the loader 101 for each lot. An unloader object 244, a chemical tank object 245, a washing tank object 246, a spin dryer object 247,
The chuck washing tank object 248 is also an object that simulates the operation state of each processing tank. These objects simulate processing time and the like set for each processing tank based on recipe data set for each lot. Then, the object for each processing tank functions as a plurality of processing unit simulating means for simulating the processing progress in each of the plurality of processing tanks provided in the substrate processing apparatus 100.

In FIG. 4, communication between the operation units of the substrate processing apparatus is simulated by communication between objects.

Although the model configuration is as described above,
The model configuration shown in FIG. 4 is an example showing the model configuration of the substrate processing apparatus 100 shown in FIGS. 1 and 2, and is not limited to this, and another model configuration may be adopted.
However, when a transfer robot simulates a substrate processing apparatus in which a series of substrate processing is performed by sequentially transporting a substrate to be processed to a plurality of processing tanks (processing units), the progress state is most likely to be considered. Since it is necessary to grasp the progress of the processing and transfer of each substrate, which is an influencing factor, the object functioning as the processing unit simulating means and the object functioning as the transfer mechanism simulating means are different from each other. Required.

<3. Operation of Simulator> The operation of the simulator of the substrate processing apparatus configured as described above will be described. FIG. 5 is a flowchart showing a processing sequence of the simulation apparatus of the substrate processing apparatus according to this embodiment.

As shown in FIG. 5, in the simulation device 200, input data is set in step S1 before the actual simulation processing. The setting of the input data in step S1 is performed in order to set parameters necessary for performing the simulation processing, recipes for each lot, and the like.

CPU 202 of simulation device 200
Displays an input data editing screen G1 as shown in FIG. On the input data editing screen G1, a menu of data that can be input and edited is displayed as shown in FIG. Then, the operator operates the display device 20.
The data to be input and edited is specified from the keyboard 208 with reference to the input data editing screen G1 displayed on the screen 7. For example, when the operator selects the setting for the transfer robot, a transfer robot setting screen G2 as shown in FIG. Then, the operator refers to the transfer robot setting screen G2 and inputs necessary data (robot name, loader side defense range, unloader side defense range, origin position, cleaning position for performing chuck cleaning, etc.) on each of the transfer robots with reference to the keyboard 208. Is operated to input the setting. When there are a large number of transfer robots, the display is displayed so that setting and input can be performed for other transfer robots by operating “previous page” and “next page”.

When other input data (simulation condition setting, tank setting, recipe data) is selected on the input data editing screen G1, the respective setting screens are displayed as in the case of the transfer robot setting. The necessary data is set by the operator.

In the simulation condition setting, the number of processing tanks, the arrangement state thereof, a simulation period (for example, one day when simulating the throughput of the substrate processing apparatus 100 per day, etc.) are set, and the like. In, the size and the like of each tank are set, and in the setting of the recipe data, the setting of the recipe applied to each lot is performed. With these settings, the arrangement of the processing tanks, the number of transfer robots, and the movable range can be set, and the configuration of the substrate processing apparatus can be freely defined. In addition, the conditions for exchanging the chemical solution can be changed.

The input data set in step S1 is used as needed in the process of processing each object. Further, these input data may be input directly from the substrate processing apparatus 100 via the interface 209 by communication instead of being input from the keyboard 208.

When the input data setting in step S1 in FIG. 5 is completed, the process proceeds to step S2, where a simulation process for the actual operation of the substrate processing apparatus is started. In step S2, as shown in FIG. 4, each object modeling each operation unit of the substrate processing apparatus performs event-driven communication between mutually connected objects.

Here, the event driven will be briefly described. FIG. 8 is an explanatory diagram for explaining the concept of event driven. As shown in FIG. 8, object A is first executed, and the internal state of object A is state A
Upon transition from 1 to state A2, object A sends a message to object B and activates object B. Then, when the execution of the object B is started and the internal state of the object B transitions from the state B1 to the state B2, the object B transmits a message to the object C and activates the object C. Then, the execution of the object C is started, and the internal state of the object C changes from the state C1 to the state C2. The object A is configured to transmit a message to the object B when the internal state of the object A changes, that is, when an event occurs in the object A. The same applies to the other objects B and C. Communication generated by the occurrence of such an event is referred to as event-driven communication. In this way, by activating other objects by event-driven processing, it becomes possible to perform the processing of each object in parallel while associating the processing with each other, so that the processing can be performed in accordance with the processing of the actual substrate processing apparatus. The simulation can be performed, and the simulation result is also optimal with few errors.

For example, in the model configuration shown in FIG.
The operation of the simulation device when the transfer robot transfers a certain lot of substrates will be described. FIG. 9 is a diagram illustrating an example of each object executed by the CPU 202 in this case. In FIG. 9, the process proceeds in the t direction.

The transfer robot object 238 receives an instruction (message) from the master object 236 or another object to transfer a certain lot of substrates to a predetermined processing tank. Then, the CPU 202 starts executing the transfer robot object 238. And
When it is necessary to confirm whether or not the processing tank of the transfer destination is in a prepared state, a message is transmitted to the processing tank object 237 by event driven.

The transmission and reception of messages between such objects is performed via a memory 203 and the like provided in the simulation device 200. The object of the communication destination is specified by designating the storage position of the object of the communication destination as a pointer.

By transmitting such an event-driven message, the processing tank object 237 is activated next in FIG. At this time, if the transfer robot object 238 can simulate another operation without waiting for a message from the processing tank object 237, the execution of the transfer robot object 238 is not interrupted. Therefore, in such a case, the transfer robot object 238 and the processing tank object 237 are processed in parallel as shown in FIG. Actual substrate processing apparatus 100
In each case, the operation units independently operate as in the relationship between the transfer robot and the processing tank. Therefore, also in the simulation apparatus 200, a simulation closer to the actual operation of the substrate processing apparatus 100 can be performed by processing the objects in parallel.

If a cover is provided in the processing tank to which the substrate is to be transferred, it is necessary to open the cover in order to carry the substrate into the processing tank. The processing tank object 237 transmits a message to the cover object 232 to open the cover of the processing tank when the cover needs to be opened for transporting the substrate. Thereby, the cover object 232 is executed to simulate the operation of opening the cover. At this time, the transfer robot object 238,
The processing tank object 237 continues to be executed in parallel. Then, when the cover opening operation by the cover object 232 is completed, a message indicating that the cover opening operation has been completed is transmitted to the processing tank object 237 which is the object that instructed the opening operation. Then, the execution of the cover object 232 ends.

Then, in response to the event that the cover opening operation has been completed, the operation of the processing tank object 237 after the cover is opened can be executed, and the corresponding processing is activated. And
When the processing tank object 237 continues to be executed and the preparation of the processing tank to which the substrate is to be transferred is completed, a message is transmitted to the transfer robot object 238. Thereby, the operation after the preparation of the processing tank to which the substrate is to be transferred in the transfer robot object 238 can be performed, the corresponding processing is activated, and the actual transfer operation of the substrate is simulated. I do. Then, when the simulation of the transfer operation of the transfer robot is completed, a transfer completion message is transmitted to the master object 236 that has transmitted the substrate transfer command message.

Here, the contents of the message transmitted / received between the objects may be an operation command or a completion notification, but the time when the operation command was issued or the time when the operation was completed may be notified. good. This is because time information is important in order to simulate the progress of the processing in the substrate processing apparatus 100 and to know the throughput and the charging regulation time. Also, the object that sent the operation command has
There is always a completion notification about the operation.

In FIG. 9, the case where the transport robot transports a substrate of a certain lot has been described as an example.
Similarly, the object that simulates each of the operation units described above is activated by event driven by another object. Here, the event-driven communication conditions differ depending on the recipe applied to each lot, and thus the event-driven form for all objects cannot be described in a unified manner. Therefore, the description of the processing mode based on the event driven among the other objects shown in FIG. 4 will be omitted.

As described above, the plurality of operation units of the substrate processing apparatus 100 are each realized as an object.
Each object is configured to independently simulate the operation of each operation unit. Each object is configured to be activated by the occurrence of an event in another object.

Therefore, when a new processing tank or other operation unit is added to the actual substrate processing apparatus 100, only the object to be added needs to be newly created. When the processing tank and other operation units are changed, it is only necessary to change the object corresponding to the changed operation unit. That is, in the simulation apparatus 200 of this embodiment, even if the apparatus configuration itself of the substrate processing apparatus 100 is changed, it is not necessary to improve the entire simulation program as in the related art, so that the substrate processing is efficiently performed. It is possible to cope with addition / change of the device configuration of the device 100.

In this embodiment, each operation unit is realized by a modeled object, and each object is connected to form a simulation apparatus of the substrate processing apparatus 100 as a whole. The difference between this object and a so-called subroutine will be described.

When each operation unit is realized by a so-called subroutine, when the processing is shifted to the subroutine, basically, only the processing of the subroutine is executed. However, as described above, in the actual substrate processing apparatus 100, each operation unit operates independently. Therefore, when each operation unit is realized by a subroutine, it is difficult to realize a simulation device that matches the operation of the actual substrate processing apparatus 100.

On the other hand, when each operation unit is realized by an object, as shown in FIG. 9, a plurality of operation units can be operated in parallel, which is closer to actual substrate processing. A simulation can be performed.

As described above, step S shown in FIG.
2 is performed. Eventually, if the simulation processing corresponding to the simulation period ends, step S2 ends.

Then, a simulation result output in step S3 is performed. The simulation result is stored in the storage unit 204 by the file object 242. Accordingly, the CPU 202 functions as a simulation result output unit, reads a file from the storage unit 204, and displays the simulation result on the display device 207.

By the way, as the processing of the substrate progresses, the substrate for each lot is sequentially transported through a predetermined processing tank. When transferring the substrate, be sure to use the transfer robot RB.
1 to RB4. When displaying an object that moves over time as described above, it is preferable to graphically display a trajectory over time. Therefore, the CPU 202 functions as a graphical display signal output unit that outputs as a signal that can be graphically displayed so that the moving state of the substrate and the operating state of the transfer robot for each lot can be graphically displayed.

The screens displayed on the display device 207 by the CPU 202 are shown in FIGS. A screen G3 shown in FIG. 10 shows a process in which the substrates for each lot L1, L2, L3 are transported to each processing tank. In addition, since the substrate of the lot L2 has a different recipe from the substrates of the other lots L1 and L3, the processing performed on the substrate is different. Further, a screen G4 shown in FIG. 11 shows the respective operations of the transfer robots RB1, RB2, RB3, RB4 shown in FIG. These screens G3 and G in FIGS.
No. 4 graphically displays the movement status of the substrate or the operation status of the transfer robot for each lot as a trace, so that it is possible to easily confirm the progress status in the process of processing the substrate. Further, a screen G5 shown in FIG. 12 shows the throughput of the substrate processing apparatus 100 obtained by the simulation processing (Step S2). From these screens, the operator can easily know the movement state of the substrate and the operation state of the transfer robot without actually operating the substrate processing apparatus 100, and also know the throughput of the substrate processing apparatus 100. Can be.

Next, the automatic derivation of the optimal charging regulation time will be described. FIG. 13 is a flowchart in which a process for automatically guiding the insertion regulation time is added to the flowchart of FIG. First, step S1 is the same as step S1 in the flowchart of FIG. Then, in step S11, the CPU 202 sets a time interval when the lottery is sequentially input from the loader 101 to a series of substrate processing processes of the substrate processing apparatus 100 for each lot. Here, the initial value of the set time interval is a sufficiently large value so that the subsequent lot cannot catch up with the preceding lot. CP
U202 functions as a time interval setting unit when performing step S11.

Then, the simulation processing of step S2 is performed. This step S2 corresponds to step S2 in FIG.
In the same manner as described above, each object is activated by the event driven, and the operation of the substrate processing apparatus 100 is simulated. When the simulation process in step S2 ends, the process proceeds to step S12.

In step S12, it is determined whether or not the lot has interfered. That is, if the lot sent out later from the loader 101 has caught up with the lot sent out earlier, “YES” is determined, and if not, “NO” is determined. At this time, the CPU 202 functions as a determination unit. Since the initial value of the time interval is a sufficiently large value so as not to cause lot interference, it is usually “NO” when step S12 is performed for the first time.
Is determined. Note that if “YES” is determined in step S12, the process proceeds to step S3, and if “NO” is determined, the process proceeds to step S13. In addition, a check of “NO” if the instructions for transferring lots in a plurality of processing tanks to the same transfer robot do not overlap for more than the allowable time, and “YES” if there is, are also performed.

[0086] In step S13, the closing regulation time is set as the time interval set in step S11. Then, the process proceeds to step S14.

In step S14, the time interval set in step S11 is changed to a smaller value by a predetermined interval, and the process returns to step S11. In step S11,
The time interval changed to a small value in step S14 is set as a time interval for simulating.

The same processing is performed in step S12 at “Y
This is repeated until it is determined to be "ES". Step S12
If “YES” is determined in step S13, the time interval set immediately before that as the loading regulation time in step S13 is the optimal time interval near the minimum value of the time interval within a range that does not cause lot interference. Become. In other words, the process of step S13, which is repeatedly executed while “NO” is determined in step S12, functions as a minimum value determination unit that derives an optimal insertion regulation time.

Then, in the process of outputting the simulation result in step S 3, the optimum input restriction time is displayed on the display device 207. In addition, the movement state of the substrate and the operation state of the transfer robot for each lot at that time are shown in FIGS.
Are performed in the same manner as the respective screens shown in FIG.

As described above, in the simulation apparatus 200 of this embodiment, the processing shown in the flowchart of FIG. 13 is performed to automatically determine the optimal loading regulation time in accordance with the actual operation of the substrate processing apparatus. Can be detected.

<4. Modified Example> The above description has mainly been directed to the substrate processing apparatus 100 for processing the substrates by sequentially transporting the substrates for each lot as shown in FIG. 1 to a predetermined processing tank. The simulation apparatus 200 of the substrate processing apparatus of the embodiment is not limited to the substrate processing apparatus as shown in FIG. 1, but a single-wafer substrate processing apparatus in which a spin coating apparatus, a heat treatment apparatus, and the like are combined.
Furthermore, even in the case of a cluster type substrate processing apparatus, each operation unit is realized as an individual object as in the above, and each object can be activated by event driven. Can be built.

In the above description, the case where the simulation apparatus 200 is configured separately from the substrate processing apparatus 100 has been described. However, the present invention is not limited to this. That is, the simulation apparatus 200 can be incorporated in the main body of the substrate processing apparatus. When the simulation apparatus 200 is configured separately from the substrate processing apparatus, the simulation apparatus 200 is configured by a general computer (for example, a so-called personal computer) as described above, so that the simulation can be performed in a place where the substrate processing apparatus does not exist. can do. On the other hand, when the simulation apparatus 200 is configured in a state of being incorporated in the substrate processing apparatus, the simulation can be performed at the operation site of the substrate processing apparatus, and there is no need to set and input parameters unique to the apparatus. There is an effect that parameters held by the substrate processing apparatus itself can be used.

[0093]

As described above, according to the first aspect of the present invention, the simulating means for simulating the operation progress for each operation unit of the substrate processing apparatus is activated by an event-driven method. Since a series of simulation results of the substrate processing by the simulation means group are generated, it is possible to easily and efficiently cope with the addition or change of the operation unit of the substrate processing apparatus.

According to the second aspect of the present invention, the simulation result output means simulates the progress of the substrate until a series of substrate processing is completed and outputs the signal as a signal that can be displayed graphically. Since the display signal output means is provided, the simulation result can be graphically displayed, and the progress can be easily confirmed.

According to the third aspect of the present invention, the simulating means group includes a plurality of processing section simulating means for simulating a processing progress state in each of the plurality of processing sections, and a transfer progress state of the transfer mechanism. Therefore, the progress of individual substrate processing and transport, which is a factor that most affects the progress of processing in the substrate processing apparatus, is taken into account.

According to the fourth aspect of the present invention, a time interval setting means for registering a time interval when a plurality of substrate groups are sequentially sent out to a series of substrate processing processes of the substrate processing apparatus for each substrate group, Means for activating the simulation means group in a event-driven manner for a plurality of substrate groups sequentially sent out at a time interval, and determination means for determining the presence or absence of mutual interference of the plurality of substrate groups in the substrate processing apparatus, Since the apparatus includes the minimum value determining means for obtaining the optimum interval near the minimum value of the time interval within a range where the plurality of substrate groups do not mutually interfere in the substrate processing apparatus, the optimum interval can be automatically detected.

According to the fifth aspect of the present invention, since the contents and order of a series of substrate processing can be set for each substrate group, it is possible to simulate when a substrate group of a different recipe is input. Is possible.

According to the sixth aspect of the present invention, since the simulator is configured separately from the substrate processing apparatus, the simulation can be performed in a place where the substrate processing apparatus does not exist.

According to the seventh aspect of the present invention, since the simulation device is incorporated in the substrate processing apparatus, it can be simulated at the operation site of the substrate processing apparatus.

According to the eighth aspect of the present invention, a computer executes a program recorded on a computer-readable recording medium to operate as a simulation device, and the computer executes the operation unit of the substrate processing apparatus. Function as a simulation device that can easily and efficiently cope with the addition or change of.

[Brief description of the drawings]

FIG. 1 is a schematic configuration diagram illustrating an example of a substrate processing apparatus that sequentially processes substrates.

FIG. 2 is a control block diagram of the substrate processing apparatus of FIG.

FIG. 3 is a diagram showing an example of a configuration of a simulation device according to the embodiment of the present invention.

FIG. 4 is a conceptual diagram illustrating an example of a model structure of each operation unit of the substrate processing apparatus executed by the simulation apparatus according to the embodiment of the present invention.

FIG. 5 is a flowchart showing a processing sequence of the simulation device according to the embodiment of the present invention.

FIG. 6 is a diagram showing an input data editing screen displayed by the simulation device according to the embodiment of the present invention.

FIG. 7 is a diagram illustrating a transfer robot setting screen displayed by the simulation device according to the embodiment of the present invention.

FIG. 8 is an explanatory diagram for explaining the concept of event driven.

FIG. 9 is a diagram showing, with time, a part of the processing of the simulation apparatus when the transfer robot transfers a certain number of substrates.

FIG. 10 is a diagram showing a display screen for a simulation result.

FIG. 11 is a diagram showing a display screen for a simulation result.

FIG. 12 is a diagram showing a display screen for a simulation result.

FIG. 13 is a flowchart for automatically deriving an optimal charging regulation time in the simulation device according to the embodiment of the present invention.

FIG. 14 is a diagram for explaining a conventional method of calculating a regulated insertion time.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 100 Substrate processing apparatus 102-110 Processing tank 121 Master CPU 122 Robot control CPU 123 Tank control CPU 200 Simulator 202 CPU 207 Display 208 Keyboard

 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yasuhiro Tanaka 4-chome Tenjin Kitamachi 1-chome, Horikawa-dori Teranouchi, Kamigyo-ku, Kyoto F-term in the Dainippon Screen Mfg. Co., Ltd. 5H223 AA05 DD03 EE06 EE30 FF05 FF08

Claims (8)

[Claims] An apparatus for simulating a progress of an operation when a series of substrate processing is performed using a substrate processing apparatus having a plurality of operation units, comprising: (a) operating for each operation unit of the substrate processing apparatus; A simulating means group for simulating a progress state; and (b) a simulating result output means for outputting a simulated result of the series of substrate processing by the simulating means group. A simulation apparatus for a substrate processing apparatus, wherein the simulation result is generated by being activated in a driven manner. 2. The simulation apparatus according to claim 1, wherein said simulation result output means comprises: (b-1) graphically displaying a progress status of the substrate until the series of substrate processing is completed. A graphical display signal output means for outputting as a signal capable of performing a simulation. 3. The simulation apparatus according to claim 1, wherein the substrate processing apparatus includes a plurality of processing units as the plurality of operation units, and a transfer unit that sequentially transfers the substrate to the plurality of processing units. Mechanism and
And the simulating means group includes: (a-1) a plurality of processing section simulating means for simulating a processing progress state in each of the plurality of processing sections; and (a-2) the transfer mechanism. Transport mechanism simulating means for simulating the transport progress state,
Simulator for substrate processing equipment. 4. The simulating apparatus according to claim 1, wherein (c) a plurality of substrate groups are sequentially sent out to each of the substrate groups to a series of substrate processing processes of the substrate processing apparatus. Time interval setting means for registering a time interval; (d) means for activating the simulating means group in an event driven manner with respect to the plurality of substrate groups sequentially sent out by the time interval; (e) the Determining means for determining the presence or absence of mutual interference of the plurality of substrate groups in the substrate processing apparatus; (f) near the minimum value of the time interval within a range where the plurality of substrate groups do not mutually interfere in the substrate processing apparatus. And a minimum value determining means for determining an optimal interval of the substrate processing apparatus. 5. The simulation apparatus according to claim 4, wherein the content and the order of the series of substrate processing can be set for each of the substrate groups. 6. The simulation apparatus according to claim 1, wherein the simulation apparatus is configured separately from the substrate processing apparatus. 7. The simulation apparatus for a substrate processing apparatus according to claim 1, wherein the simulation apparatus is incorporated in the substrate processing apparatus. 8. A computer-readable recording medium on which a program for causing a computer to operate as the simulation device according to claim 1 is recorded.