JP2000275422A - Substrate for liquid crystal display device, and liquid crystal display device using the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve availability of light and to provide a substrate for a liquid crystal display device with little variation of color tone due to an angle of a visual field, by forming selective reflection-film patterns with three colors R, G, and B on a transparent substrate, and forming selective absorption-film patterns with the same colors on these selected reflection-film patterns. SOLUTION: Patterns for selective reflection-films 7-9 with R, G, and B are formed on a transparent substrate 14, and selective absorption-films 15-17 with the same colors are formed on the selective reflection-film 7-9. A driving IC is coupled to a panel and a color filter substrate is placed on a light guide plate side of a backlight to manufacture this liquid crystal display device. Thus, luminance is about twice of that of a liquid crystal display device manufactured using a color filter where the selective absorption-film 15-17 are formed without forming the selective reflection-film 7-9 patterns, color difference is kept within 3 even when an angle of a visual field varies by 10 deg. from the front face, color tone varies little due to the angle of the visual field, and display quality is good.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate used for manufacturing a liquid crystal display device used as a display of a personal computer or the like, and more particularly to a substrate used for manufacturing a liquid crystal display device having a high luminance. .

[0002]

2. Description of the Related Art At present, generally used color liquid crystal display devices include a thin film transistor (TFT) substrate and a color filter substrate in which a nematic liquid crystal is inserted between two polarizing plates. Structured panels are used. A liquid crystal display device is manufactured by combining this panel with a driving LSI and a backlight.

[0003] Such a liquid crystal display device does not always have high utilization efficiency of light emitted from a backlight. This is because light is absorbed by a polarizing plate, a color filter, and the like.

[0004] In order to enhance the light use efficiency, for example, a method using a reflective polarizing plate described in Japanese Patent Application Laid-Open Nos. 4-268505 and 6-281814, and Japanese Patent Application Laid-Open No. 9-506837 has been proposed. . A polarizing plate used in a liquid crystal display device transmits one of two orthogonal linearly polarized light components (P-polarized light and S-polarized light) of natural light and absorbs the other component. Is 50% or less, but by inserting a reflective polarizing plate between the light guide plate and the polarizing plate of the backlight, the light use efficiency is reduced to 70 to 8%.
It can be increased to 0%. Natural light composed of P-polarized light and S-polarized light as shown in the left side of FIG. 1 is reflected by the reflective polarizer and reflected by the light guide plate as shown in the right side of FIG. Then, the light again enters the reflective polarizing plate. By repeating this, the amount of light that can be used (integrated light amount) can be greatly increased.

Similarly, instead of the conventionally used color filter composed of three selective absorption film patterns of red (R), green (G) and blue (B), for example, Japanese Patent Laid-Open No. No. 59957 and JP-A-63
No. 146,019, Japanese Patent Application Laid-Open Nos. 8-234196 and 10-26038.
It is considered that the use efficiency of light can be improved by using a color filter composed of a selective reflection film pattern composed of a cholesteric liquid crystal polymer film shown in No. 7. For example, as shown in FIG. 2, when backlight light (white light) is incident on the R pixel, the R light is transmitted, the G light and the B light are reflected, and the reflected light is reflected by the light guide plate to be adjacent to the G pixel. Light enters the pixel. In the G pixel, the G light is transmitted and the B light is reflected, and the B light is reflected by the light guide plate and the adjacent B light is reflected.
The light enters the pixel and passes through the pixel. As described above, light that has been absorbed by the pixels of each color is transmitted through the pixels by repeating reflection, thereby increasing the light use efficiency.

[0006]

The selective reflection film composed of the multilayer interference thin film and the cholesteric liquid crystal polymer film has a characteristic that the wavelength range of the reflected light changes depending on the angle of the incident light. Therefore, in a liquid crystal display device manufactured using a color filter formed of a selective reflection film, there is a problem that a color tone changes depending on an angle at which a screen is viewed.

SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a substrate for realizing a liquid crystal display device in which the use efficiency of light is increased and the color tone does not change much depending on the viewing angle. .

[0008]

To solve the above-mentioned problems, the present invention has the following arrangement.

A selective reflection film pattern of three colors of red (R), green (G), and blue (B) is formed on a transparent substrate, and a selective absorption film pattern of the same color is formed on these selective reflection film patterns. Liquid crystal display substrate.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In a liquid crystal display substrate according to the present invention, as shown in FIG. 3, R, G, and B selective reflection film patterns are formed on a transparent substrate, and the same color selection pattern is formed on the selective reflection film. An absorbing film is formed. In the present application, the R selective reflection film means a film that transmits R light and reflects G light and B light. Similarly, the G selective reflection film is a film that transmits G light and reflects R light and B light, and the B selective reflection film transmits B light and transmits R light and R light.
It is a film that reflects light and G light. The R selective absorption film means a film that transmits R light and absorbs G light and B light. Similarly, the G selective absorption film is a film that transmits G light and absorbs R light and B light, and the B selective reflection film transmits B light and transmits R light.
It is a film that absorbs light and G light.

The substrate of the present invention and, for example, a commonly used T
A liquid crystal is injected between the FT substrates to produce a panel, and the substrate of the present invention is arranged on the backlight side, whereby the liquid crystal display device of the present invention is produced.

In the present invention, patterns of R, G, and B selective reflection films and selective absorption films are formed on a transparent substrate, but the transparent substrate is not particularly limited. As a transparent substrate,
Films or sheets of inorganic glass such as quartz glass, borosilicate glass, alumina silicate glass, soda lime glass having a silica-coated surface, and organic plastics such as polycarbonate and polymethyl methacrylate are preferably used.

If there is a gap due to problems such as the precision of pattern formation and the precision of bonding to the counter substrate, the gap is filled with a black matrix film to prevent a decrease in contrast due to light leakage from the gap. Is desirable.

When a black matrix film is formed on a transparent substrate, a multilayer film of chromium or chromium / chromium oxide, an inorganic film such as titanium nitride, a cholesteric polymer liquid crystal film having a visible light region as a selective reflection wavelength region, A resin film in which a light-shielding agent is dispersed is used, but the present invention is not particularly limited thereto. When a resin film in which a light-shielding agent is dispersed is used as a black matrix film, the light-shielding agent may be red, blue, in addition to metal oxide powders such as carbon black, titanium oxide, and iron tetroxide, metal sulfide powders, and metal powders. And a mixture of green pigments. Examples of the resin used include photosensitive or non-photosensitive materials such as an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, and gelatin.

The light shielding property of the black matrix is represented by an OD value (common logarithm of the reciprocal of the transmittance). In order to improve the display quality of the liquid crystal display device, it is 2.5 or more, and more preferably 3. Desirably, it is 0 or more.

It is desirable that the interface of the black matrix film with the transparent substrate be a mirror surface in order to enhance the light use efficiency. The mirror surface in the present invention means an interface whose luminosity-corrected reflectance (Y value) in the visible light region of 400 to 700 nm is 20% or more. The reflectance is preferably 30% or more, more preferably 40% or more, and further preferably 50% or more.

Such a black matrix film can be formed by a metal film such as chromium. Further, it can also be formed by using a cholesteric polymer liquid crystal film having a visible light region in a wavelength region of selective reflection.

In order to prevent a decrease in contrast due to reflection of external light, it is preferable that an anti-reflection film is formed on the surface of the black matrix film opposite to the interface with the transparent substrate. Such a black matrix film can be formed by a laminated film of a metal film such as chromium and a metal oxide film such as chromium oxide.

The black matrix film usually has (20 to
An opening of (200) μm × (20 to 300) μm is provided. To form the opening, after forming a black matrix film on the entire surface of the substrate, use a photoresist to form a resist pattern and pattern it by etching,
The so-called photolithography method is generally used, but the present invention is not limited to this method, and the opening can be formed by various methods.

R, so as to cover the formed opening,
A plurality of selective reflection film patterns of three colors of G and B are arranged.
As the selective reflection film, a multilayer interference thin film, a cholesteric liquid crystal polymer film, or the like can be used, but is not particularly limited thereto.

The multilayer interference thin film has a low refractive index material film and a high refractive index
A film in which multiple layers of material films are alternately stacked.
It transmits light in the wavelength region and reflects other light. Low bending
As a typical film of the refractive index material film, SiO_Two, CaF_Two,
MgF_TwoSuch as inorganic films, high refractive index material films, etc.
TiO_Two, Ta_TwoO_Two, ZnO, ZnS, ZrO _Two
And the like, but not particularly limited thereto.
Various membranes can be used. Also, epoxy resin
Fat, acrylic resin, urethane resin, polyester
Resin, polyimide resin, polyolefin resin, Novo
Combination of organic film such as rack resin and gelatin
To form multilayer interference thin film with selective reflection function
can do.

In general, a vacuum deposition method is used to form a multilayer interference thin film of an inorganic film. For patterning, a so-called lift-off method in which a lift-off material is formed in a portion other than forming a multilayer interference thin film in advance, a multilayer interference film is deposited, and then the multilayer interference film on the lift-off material is peeled and patterned simultaneously with the lift-off material, After depositing a multilayer interference film on the entire surface of the substrate, a photolithography method is used in which a resist pattern is formed using photoresist and patterned by etching.
A mask vapor deposition method of forming a pattern by performing vapor deposition between a vapor deposition source and a substrate through a mask can be employed, but the present invention is not particularly limited thereto, and various methods can be employed.

For forming a multilayer interference film of an organic film, a wet coating method such as spin coating or die coating is generally used. The patterning can be performed by a lift-off method or a photolithography method using a photoresist,
It can also be carried out by a simple photolithographic method for imparting photosensitivity to the organic film.

The cholesteric liquid crystal polymer film reflects circularly polarized light in the same direction as the direction of the helix among the circularly polarized light in the wavelength region equal to the product of the pitch of the helix and the refractive index. For example, a cholesteric polymer film in which the direction of the helix is left (or right) and the product of the helix pitch and the refractive index is equal to the wavelength region of the G light, and the product of the helix pitch and the refractive index is the wavelength of the B light When a cholesteric polymer film equal to the area is laminated, the linearly polarized light transmitted through the polarizing plate is left (or right) by a quarter-wave plate.
When converted into circularly polarized light, the G left (or right) circularly polarized light and the B left (or right) circularly polarized light are reflected, and the R left (or right) circularly polarized light is transmitted. R left (or right) circularly polarized light can be converted back to linearly polarized light with a quarter wave plate.

For the formation of the cholesteric liquid crystal polymer film, polymerizable or crosslinkable cholesteric liquid crystal molecules are usually used. As such cholesteric liquid crystal molecules, siloxane molecules as described in JP-B-63-47759 and acrylic molecules as described in JP-A-7-258638 are known. In the present invention, various cholesteric liquid crystal molecules can be used without being particularly limited thereto.

The cholesteric liquid crystal polymer film pattern can be formed by a photolithography method utilizing a polymerization reaction or a crosslinking reaction of cholesteric liquid crystal molecules by ultraviolet rays. However, the ordinary photolithography method requires an etching step, but this step can be omitted if the thermochromic effect is used. The use of the thermochromic effect can reduce the number of steps of applying cholesteric liquid crystal molecules as compared with the photolithography method.

The thermochromic effect is a phenomenon in which the pitch of the spiral changes depending on the temperature, and the wavelength of reflected light changes. Utilizing this phenomenon, for example, after applying cholesteric liquid crystal molecules on a transparent substrate, the substrate temperature is set to a temperature at which the spiral pitch becomes a pitch for reflecting G light, and a photomask is applied to a pattern region for reflecting G light. The G light reflection pattern can be fixed by irradiating ultraviolet light. Next, the substrate temperature is set to a temperature at which the pitch of the spiral becomes a pitch at which the B light is reflected, and the B light reflecting pattern is fixed by irradiating ultraviolet rays through a photomask to a pattern area that reflects the B light. Can be. Similarly, the pattern region that reflects the R light can be fixed. The cholesteric liquid crystal molecules are applied again, and the B light reflection pattern is fixed on the G light reflection pattern, the R light reflection pattern is fixed on the B light reflection pattern, and the G light reflection pattern is fixed on the R light reflection pattern. , G and B are obtained. Further, as shown in the left, 49th line of page 7 to the left, 2nd line of page 8 of JP-A-10-260387, the R, G , B, the selective reflection film pattern is 1
It can also be obtained in a single application step.

The quarter-wave plate is usually formed of an organic resin film having a birefringence. The product of the magnitude of the anisotropy of the refractive index and the film thickness is obtained by setting the wavelength of the light to be approximately one quarter. For example, a film formed by photopolymerizing or photocrosslinking a stretched organic resin film such as polycarbonate or an alignment film subjected to a rubbing treatment of a molecule having a photoreactive functional group and a birefringent component is used. . Usually, a cholesteric liquid crystal polymer film pattern is formed on a quarter-wave plate. Then, a quarter-wave plate is formed thereon directly or via a selective absorption film or the like.

As the selective absorption film, a dye or pigment is used as a coloring agent, and a resin film dyed with the dye, a resin film in which the pigment is dispersed, or a vapor deposition film of the pigment is used.
From the viewpoint of heat resistance and light stability, it is preferable to use a pigment rather than a dye as a colorant. As the pigment, an organic pigment and an inorganic pigment can be used, but it is preferable to use an organic pigment in view of color vividness. As the organic pigment, phthalocyanine-based, aziraki-based, condensed azo-based, quinacridone-based, anthraquinone-based, perylene-based, and perinone-based pigments are preferably used.

When a resin film in which a pigment is dispersed is used as the selective absorption film, examples of the resin used include an epoxy resin, an acrylic resin, a urethane resin, a polyester resin, a polyimide resin, a polyolefin resin, Photosensitive or non-photosensitive materials such as gelatin are exemplified. Photosensitive resins include photodecomposable resins, photocrosslinkable resins, photopolymerizable resins, and the like.Especially, monomers, oligomers or polymers having an ethylenically unsaturated bond and an initiator that generates radicals by ultraviolet rays are used. A photosensitive acrylic composition, a photosensitive polyamic acid composition, and the like, which contain, are suitably used.

The selective absorption film pattern is formed on the same color selective reflection film pattern. When a pigment-dispersed resin film is used as the selective absorption film, a photolithography method is preferably used for forming a pattern, and when a pigment vapor-deposited film is used, a lift-off method and a mask vapor deposition method are suitably used. However, the present invention is not limited to these, and a pattern can be formed by various methods. In the case where the selective reflection film is a multilayer interference thin film formed by a mask deposition method, if the selective absorption film is a pigment deposition film, pattern formation can be performed collectively in vacuum by mask deposition.

An overcoat film made of a transparent resin film may be formed on the selective absorption film for planarization.
When the liquid crystal is operated in a twisted nematic (TN) mode, a super twisted nematic (STN), a vertical alignment (VA) mode, or the like, a selective absorption film or an overcoat film on the selective absorption film is usually used. A transparent conductive layer is formed thereon.
Examples of the formed transparent electrode layer include, but are not particularly limited to, a thin film layer of tin oxide, zinc oxide, indium tin oxide (ITO), or the like. When the counter substrate of the substrate of the present invention is a TFT substrate, the transparent electrode layer may be a solid film, but otherwise, for example, when a simple matrix drive such as STN mode is performed, the transparent electrode layer is patterned in a stripe shape. Need to be.

When the ITO film is not formed on the ITO film, an alignment film for aligning liquid crystal molecules is usually formed on the selective absorption film or the overcoat film. As the alignment film, a thin film of a polyimide resin is generally used.

The substrate of the present invention, on which the liquid crystal alignment film is formed, and the counter substrate are adhered to each other using a sealant. After the liquid crystal is injected from the injection port provided in the seal portion, the injection port is sealed. After bonding the polarizing plate to the outside of the substrate, a driving IC or the like is mounted. The liquid crystal display device of the present invention is manufactured by disposing the substrate of the present invention on the backlight side.

The substrate of the present invention and the liquid crystal display device using this substrate are suitably used for display screens of personal computers, word processors, engineering workstations, portable information terminals, navigation systems, liquid crystal televisions, videos, etc. And power consumption are reduced.

Hereinafter, the present invention will be described in more detail with reference to preferred embodiments, but the efficacy of the present invention is not limited by the embodiments used.

[0037]

EXAMPLES Example 1 (Formation of black matrix) chromium metal and sputtering target and using a mixed gas of Ar and O ₂ as an atmosphere gas, first gradually increases after the gas flow rate of O ₂ to zero Sputtering was carried out while forming a metal chromium / chromium oxide film on a non-alkali glass substrate. A positive photoresist film was formed on this film, and after the mask exposure, the photoresist film was etched with an organic alkali-based developer, and then the metal chromium / chromium oxide film was etched with an inorganic acid-based etchant. . Thereafter, the photoresist film was peeled off to obtain a black matrix film having a mirror surface at the glass interface where the opening was formed and a surface serving as an antireflection film. (Formation of selective reflection film pattern) A N-methyl-2-pyrrolidone (NMP) solution of polyimide is applied on a substrate on which a black matrix is formed, and heated and dried at 100 ° C. for 10 minutes and at 230 ° C. for 20 minutes to obtain a polyimide film. Was formed, and a rubbing treatment was performed. Photoreactive acrylic monomer having birefringent component 4,4'-bisacryloyloxy-1,1'-biphenylene (BAB) and photopolymerization initiator 2-methyl-1- [4
-(Methylthio) phenyl] -2-morpholino-1-propanone solution of methylcellosolve acetate on a rubbed polyimide film was applied at 80 ° C. for 10 minutes.
After heating and drying at 140 ° C. for 20 minutes, ultraviolet rays were irradiated to form a quarter-wave plate.

Methyl cellosolve acetate solution of photoreactive siloxane cholesteric liquid crystal monomer TC3951L (manufactured by Wacker Chemicals) and photopolymerization initiator 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-1-propanone Was applied on a quarter-wave plate, and dried by heating at 80 ° C. for 10 minutes and at 140 ° C. for 20 minutes to form a cholesteric liquid crystal molecular film. The substrate temperature was set to 30 ° C., and ultraviolet light was irradiated through a mask to fix the R light reflection pattern. Next, the substrate temperature was set to 70 ° C., and ultraviolet light was irradiated through a mask to fix the G light reflection pattern. Further, by setting the substrate temperature to 100 ° C. and irradiating ultraviolet rays, B
The light reflection pattern was fixed.

The solution of the photoreactive siloxane-based cholesteric liquid crystal monomer and the photopolymerization initiator was applied and dried again, the substrate temperature was set to 30 ° C., and the mask was exposed to light.
An R light reflection pattern was fixed on the fixed G light reflection pattern to form a selective reflection film pattern transmitting B light. Next, the substrate temperature was set to 70 ° C., the G light reflection pattern was fixed on the B light reflection pattern fixed by mask exposure, and a selective reflection film pattern transmitting R light was formed. Similarly, exposure was performed at a substrate temperature of 100 ° C. to form a selective reflection film pattern transmitting G light.

After a polyimide film was formed on the patterned cholesteric liquid crystal polymer film and subjected to a rubbing treatment, a quarter-wave plate was formed using a solution of BAB and a photopolymerization initiator. (Formation of Selective Absorbing Film Pattern) Dianthraquinone pigment represented by Color index No. 65300 Pigment Red 177 as each of R, G and B pigments, Color Index No. 74265 Pigme
A phthalocyanine green pigment represented by nt Green 36 and a phthalocyanine blue pigment represented by Color Index No. 74160 Pigment Blue 15-4 were prepared. The pigments were mixed and dispersed in an NMP solution of a polyimide precursor (polyamic acid) to obtain three kinds of colored pastes of R, G, and B.

First, an R paste is applied on the substrate on which the selective reflection film pattern is formed, and dried at 80 ° C. for 10 minutes.
Semi-cure at 20 ° C. for 20 minutes. Thereafter, a positive photoresist solution was applied by a spinner and dried at 80 ° C. for 20 minutes. Exposure was performed using a mask, and the substrate was dipped in an organic alkali developer. Simultaneously, while the substrate was rocked, development of the positive photoresist and etching of the polyimide precursor were performed simultaneously. Thereafter, the positive type photoresist was stripped off with methyl cellosolve acetate, and then further removed for 250 minutes.
By curing at 30 ° C. for 30 minutes, an R selective absorption film pattern was formed on the R selective reflection film pattern.

Similarly, a G selective absorption film pattern was formed on the G selective reflection film pattern using G paste, and a B selective absorption film pattern was formed on the B selective reflection film pattern using B paste. (Formation of Transparent Electrode Layer) On the substrate on which the selective absorption film was formed, an ITO film was formed by sputtering using ITO as a target. (Formation of Liquid Crystal Alignment Film) A polyimide solution was applied on the ITO film, heated and dried to form a polyimide film, and then subjected to a rubbing treatment to obtain a liquid crystal alignment film. (Preparation of Liquid Crystal Display) Chromium was deposited on a transparent alkali-free glass substrate by vacuum evaporation, and the gate electrode was patterned by a photoetching technique. next,
By plasma CVD, silicon nitride (SiN
The thin film of x) was formed and used as an insulating film. Subsequently, an amorphous silicon (a-Si) film and SiNx as an etching stopper film layer were continuously formed. Next, the S of the etching stopper layer is formed by a photo-etching technique.
iNx was patterned. Film formation and patterning of n ⁺ -type a-Si for obtaining ohmic contact, and further, film formation and patterning of a transparent electrode (ITO) serving as a display electrode. Further, aluminum as a wiring material was entirely deposited, and a drain electrode and a source electrode were formed by a photoetching technique. Using the drain electrode and the source electrode as masks, the n ⁺ -type a-Si in the channel portion was removed by etching to complete the TFT substrate. Then, a polyimide-based alignment film was provided on the substrate, and a rubbing treatment was performed.

After the color filter substrate on which the spherical spacers were scattered and the TFT substrate were bonded using a sealant, a nematic liquid crystal was injected from an injection port provided in the seal portion. The liquid crystal was injected by leaving the empty cell under reduced pressure, immersing the injection port in the liquid crystal tank, and returning the pressure to normal pressure. After injecting the liquid crystal, the injection port was sealed, and a polarizing plate was attached to the outside of the substrate to produce a liquid crystal panel.

A driving IC is connected to the panel and the backlight is connected.
The color filter substrate on the side of the light guide plate
Thus, a liquid crystal display device was manufactured. Selective reflective film pattern
Color fill with selective absorption film pattern formed without forming
And the brightness of a liquid crystal display device manufactured using
At this time, there was almost twice the luminance. Also, the viewing angle from the front
Changes within 10 degrees, the color difference falls within 3 and depends on the viewing angle.
There was almost no change in color tone, and the display quality was good. Example 2 (Shape of selective reflection film pattern and selective absorption film pattern)
Ii) The black matrix prepared in Example 1 was formed.
G light and G light were applied to a part of the opening on the substrate by mask evaporation.
And SiO2 whose optical thickness is set so as to reflect light and B light_Two
And TiO_TwoWas formed. Same ma
Using a mask, a diamond is placed on the obtained selective reflection film pattern of R.
An anthraquinone pigment was deposited. Next, R light and B light
SiO whose optical thickness is set to be reflected_TwoAnd TiO
_TwoAlternately laminated thin film patterns formed by mask evaporation
Thereafter, a phthalocyanine green pigment was deposited. Likewise
The optical thickness was set so that R light and G light were reflected
SiO _TwoAnd TiO_TwoAlternately laminated thin film pattern
After forming by phthalocyanine blue pigment
I wore it. After vapor deposition, apply acrylic resin solution and add
Thermal drying was performed to form an overcoat film. (Production of liquid crystal display) ITO film on overcoat film
After forming, a liquid crystal alignment film is formed and rubbed.
Was. A liquid crystal display device was manufactured in the same manner as in Example 1.
In addition, the brightness is controlled by the selective absorption film without forming the selective reflection film pattern.
Manufactured using a patterned color filter
It is almost twice that of a liquid crystal display device and has a viewing angle of 10 from the front.
Even if the degree changes, the color difference falls within 3 and the color tone according to the viewing angle
There was almost no change in the display quality.

[0045]

The substrate of the present invention comprises R, G,
A selective reflection film pattern of B and a selective absorption film pattern of the same color are formed on the pattern. By using this substrate on the backlight side, there is almost no change in color tone due to viewing angle, high brightness and low power consumption,
The liquid crystal display device of the present invention can be realized.

[Brief description of the drawings]

FIG. 1 is a schematic sectional view showing the function of a reflective polarizing plate.

FIG. 2 is a schematic cross-sectional view showing a function of a color filter composed of a selective reflection film.

FIG. 3 is a schematic sectional view of the substrate of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... P polarized light 2 ... S polarized light 3 ... Reflective polarizing plate 4 ... Light guide plate 5 ... Liquid crystal panel 6 ... Polarizing plate 7 ... R selective reflection film 8 ... G selective reflection film 9 ... B selective reflection film 10 ... White light 11 ... R light 12 G light 13 B light 14 Transparent substrate 15 R selective absorption film 16 G selective absorption film 17 B selective absorption film

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H048 BA45 BA52 BB02 BB10 BB14 BB44 2H091 FA08X FA08Z FA14Y FA23Z FA34Y FA35Y FA37X FA41Z FB02 FB06 FB12 FB13 FC01 FC02 FC22 FC23 FD04 FD06 GA01 GA03 GA06 LA19 GA13 LA03

Claims (9)

[Claims] 1. A selective reflection film pattern of three colors of red (R), green (G) and blue (B) is formed on a transparent substrate, and a selective absorption film pattern of the same color is formed on these selective reflection film patterns. A substrate for a liquid crystal display device on which is formed. 2. The substrate according to claim 1, wherein the selective absorption film is a resin film in which a pigment is dispersed. 3. The substrate according to claim 1, wherein the selective absorption film is a pigment deposition film. 4. The substrate according to claim 1, wherein the selective reflection film is a multilayer interference thin film. 5. The substrate according to claim 1, wherein the selective reflection film is a cholesteric liquid crystal polymer film. 6. A black matrix film is formed in a gap between R, G, and B selective reflection film patterns and / or a gap between selective absorption film patterns.
The substrate according to any one of the above. 7. The substrate according to claim 1, wherein an interface between the black matrix film and the transparent substrate is a mirror surface. 8. The substrate according to claim 1, wherein an antireflection film is formed on a surface of the black matrix film opposite to an interface with the transparent substrate. 9. A liquid crystal display device having a backlight with a liquid crystal layer sandwiched between two substrates, wherein the substrate according to claim 1 is disposed on the backlight side. A liquid crystal display device characterized by the above-mentioned.