JP2000273696A - Insulating substrate with anodic oxidation coating, and its manufacture - Google Patents

Insulating substrate with anodic oxidation coating, and its manufacture

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Publication number
JP2000273696A
JP2000273696A JP11074988A JP7498899A JP2000273696A JP 2000273696 A JP2000273696 A JP 2000273696A JP 11074988 A JP11074988 A JP 11074988A JP 7498899 A JP7498899 A JP 7498899A JP 2000273696 A JP2000273696 A JP 2000273696A
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JP
Japan
Prior art keywords
steel sheet
insulating substrate
plated steel
alloy
mass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP11074988A
Other languages
Japanese (ja)
Inventor
Shingo Yonezawa
信吾 米澤
Keiichi Watanabe
啓一 渡邉
Keiichi Sawatani
啓一 澤谷
Setsuko Koura
節子 小浦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
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Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Priority to JP11074988A priority Critical patent/JP2000273696A/en
Publication of JP2000273696A publication Critical patent/JP2000273696A/en
Withdrawn legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an insulating substrate in which a uniform anodic oxidation coating is formed at the surface of the plating layer of an Al-alloy-plated steel sheet, and to provide its manufacturing method. SOLUTION: In the insulating substrate, an Al-Zn alloy, having a composition consisting of, by mass, 40-60% Al, <=2% Si with inevitable impurities, and the balance Zn, is used as an Al alloy for the plated steel sheet. This insulating substrate can be manufactured by immersing the Al-Zn alloy plated steel sheet as above in an aqueous solution of pH 5.0-10.0 containing alkali salt of weak acid to undergo continuous anodic oxidation.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、Al系合金のめっき鋼
板のめっき層表層に陽極酸化皮膜を形成した絶縁基板に
おいて、陽極酸化皮膜が均一なものおよび緻密な皮膜形
成可能な絶縁基板の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an insulating substrate having an anodized film formed on the surface of a plating layer of an Al-based alloy-coated steel sheet and having a uniform anodized film and capable of forming a dense film. About the method.

【0002】[0002]

【従来技術】太陽電池の基板は、絶縁性を要するが、非
晶質または多結晶のSi層を堆積する際に受ける200
〜350℃程度の加熱にも耐える必要がある。このた
め、基板としてはガラス基板や金属基板が従来より使用
されている。しかし、ガラス基板は安価であるが、衝撃
に弱いので、可撓性を必要とする用途には金属基板が使
用されている。この金属基板の代表的なものとしては、
Al系合金のめっき鋼板のめっき層表層に陽極酸化皮膜
を形成した絶縁基板が知られている(特開昭54−11
6347号公報、同62−89369号公報)。
2. Description of the Related Art The substrate of a solar cell needs to have insulating properties.
It is necessary to withstand heating up to about 350 ° C. For this reason, a glass substrate or a metal substrate has been conventionally used as the substrate. However, although glass substrates are inexpensive, they are vulnerable to impact, so metal substrates are used for applications requiring flexibility. A typical example of this metal substrate is
An insulated substrate having an anodic oxide film formed on the surface of a plating layer of an Al-based alloy-coated steel sheet is known (JP-A-54-11).
6347, 62-89369).

【0003】この絶縁基板は、素材に溶融Alめっき鋼
板を用いて、それを硫酸、しゅう酸、クロム酸などの酸
溶液中に浸漬して、陽極電解することにより製造してい
たが、市販の溶融Alめっき鋼板のめっき層は溶融めっ
き時にSiを5〜11mass%添加して、加工性の劣
るFe−Al合金層の成長を抑制しているため、Siの
部位の導電性が他の部位より良好になり、電解時に電流
分布が不均一になる。このため、陽極酸化皮膜の厚みが
不均一になるという問題があった。
[0003] This insulating substrate is manufactured by using a hot-dip Al-plated steel sheet as a material, immersing it in an acid solution such as sulfuric acid, oxalic acid, or chromic acid, and performing anodic electrolysis. Since the plating layer of the hot-dip Al-plated steel sheet suppresses the growth of the Fe-Al alloy layer having poor workability by adding 5 to 11 mass% of Si during hot-dip plating, the conductivity of the Si portion is higher than that of other portions. And the current distribution becomes non-uniform during electrolysis. For this reason, there has been a problem that the thickness of the anodic oxide film becomes uneven.

【0004】[0004]

【発明が解決しようとする課題】本発明は、Al系合金
のめっき鋼板のめっき層表層に陽極酸化皮膜を形成した
絶縁基板において、陽極酸化皮膜が均一なものおよびそ
の製造方法を提供するものである。
SUMMARY OF THE INVENTION The present invention provides an insulated substrate having an anodized film formed on the surface of a plating layer of an Al-based alloy plated steel sheet, wherein the anodized film is uniform and a method for producing the same. is there.

【0005】[0005]

【課題を解決するための手段】本発明の絶縁基板は、め
っき鋼板のAl系合金をAl:40〜60mass%、
Siおよび不可避的不純物:2mass%以下、残部:
ZnからなるAl−Zn系合金にした。この絶縁基板の
製造は弱酸のアルカリ塩を含むpH5.0〜10.0の水
溶液中にAl:40〜60mass%、Siおよび不可
避的不純物:2mass%以下、残部:ZnからなるA
l−Zn系合金のめっき鋼板を浸漬して、連続的に陽極
酸化する方法で行う。
The insulating substrate according to the present invention is characterized in that an Al-based alloy of a plated steel sheet has an Al content of 40 to 60 mass%,
Si and inevitable impurities: 2 mass% or less, balance:
An Al-Zn-based alloy made of Zn was used. This insulating substrate is manufactured by preparing an aqueous solution containing an alkaline salt of a weak acid having a pH of 5.0 to 10.0 and containing Al: 40 to 60 mass%, Si and unavoidable impurities: 2 mass% or less, and the balance of Zn:
This is performed by a method of immersing a plated steel sheet of an l-Zn-based alloy and continuously performing anodization.

【0006】[0006]

【作用】Al系合金めっき層がAlを40〜60mas
s%、Siおよび不可避的不純物を2mass%以下、
残部がZnからなるAl−Zn系合金のめっき鋼板を用
いて、陽極酸化処理すると、Siが含有されていても、
Si含有量が少ないため、Siの部位に集中する傾向の
ある電流がZnの溶解により均一に分散するので、厚み
の均一な陽極酸化皮膜を形成できる。Alが40mas
s%未満で、Znが58mass%より多いと、Znの
溶解速度が酸化皮膜の生成速度より速いため、連続した
酸化皮膜が形成されず、Alが60mass%以上で、
Znが38mass%より少ないと、Znの溶解反応が
少なくなるため、酸化皮膜の生成効率が低下し、また、
鋼板に対する犠牲防食作用も小さくなる。
[Function] Al-based alloy plating layer converts Al to 40 to 60 mas
s%, 2 mass% or less of Si and unavoidable impurities,
When the anodizing treatment is performed using a plated steel sheet of an Al-Zn-based alloy consisting of Zn, even if Si is contained,
Since the Si content is small, the current that tends to concentrate on the Si site is uniformly dispersed by dissolution of Zn, so that an anodic oxide film having a uniform thickness can be formed. Al is 40mas
When the Zn content is less than s% and the Zn content is more than 58 mass%, the dissolution rate of Zn is higher than the generation rate of the oxide film, so that a continuous oxide film is not formed.
If Zn is less than 38 mass%, the dissolution reaction of Zn decreases, so that the efficiency of forming an oxide film decreases, and
The sacrificial anticorrosion action on the steel sheet is also reduced.

【0007】Al−Zn系合金めっき鋼板は、溶融めっ
き法、蒸着法、電気めっき法のいずれにより製造したも
のでもよいが、安価な溶融めっき法により製造したもの
が好ましい。この場合、Fe−Al合金層の成長抑制の
ために溶融めっき時に添加するSiは2mass%以下
であれば、陽極酸化皮膜は不均一にならない。このた
め、Siは1〜2mass%するのが好ましい。不可避
的不純物としてはAlやZnの精錬過程に由来するB
i、Sb、Sn、Feなどが含まれる。
The Al—Zn alloy-plated steel sheet may be manufactured by any of a hot-dip plating method, a vapor deposition method, and an electroplating method, but is preferably manufactured by an inexpensive hot-dip plating method. In this case, if the amount of Si added during hot-dip plating for suppressing the growth of the Fe-Al alloy layer is 2 mass% or less, the anodic oxide film does not become non-uniform. For this reason, Si is preferably set to 1 to 2 mass%. Inevitable impurities include B originating from the refining process of Al and Zn.
i, Sb, Sn, Fe and the like.

【0008】陽極酸化皮膜の厚みは、十分な絶縁性を確
保するため、0.1μm以上にするのが好ましい。陽極
酸化皮膜の絶縁性は1μm程度で一定になり、また、そ
れより厚くなると、生成しにくくなる。このため、経済
性を考慮した場合、最大1μm程度で十分であるが、必
要ならば、さらに厚くすることも可能である。
The thickness of the anodic oxide film is preferably at least 0.1 μm in order to ensure sufficient insulation. The insulating property of the anodic oxide film is constant at about 1 μm, and when it is thicker, it is difficult to form. For this reason, in consideration of economy, a maximum of about 1 μm is sufficient, but if necessary, it can be further thickened.

【0009】陽極酸化処理は、孔のない緻密な構造のバ
リヤ−層の皮膜が形成されるようにするため、電解浴は
生成皮膜を溶解しない水溶液、すなわち、電解質に弱酸
のアルカリ塩を用いた水溶液、好ましくは緩衝溶液を用
いる。ここで、弱酸とは電離定数Kの小さい(K<10
-3)多価の無機酸、有機酸を言い、例えば、ホウ酸、リ
ン酸、酒石酸などが挙げられる。pHは5.0〜10.0
にする。pHが5.0より低いと、めっき層全体の溶解
反応が優先し、10.0より高いと、電解浴中に水酸化
物が生成して、電解効率が低下し、ともに陽極酸化皮膜
が形成されにくくなる。電解は直流またはパルス電流あ
るいはそれらの組み合わせで電流密度1〜10mA/c
2の範囲で実施するのが適している。1mA/cm2
り低いと、陽極酸化皮膜があまり生成せず、10mA/
cm2より高くしても、陽極酸化皮膜の生成効率が向上
しない。浴温は20〜60℃の範囲が適している。20
℃より低いと、Znの溶解反応が起こりにくくなり、6
0℃より高くすると、陽極酸化皮膜の溶解が起こり、と
もに陽極酸化皮膜の生成効率が悪くなる。
In the anodic oxidation treatment, in order to form a barrier layer film having a dense structure without pores, the electrolytic bath uses an aqueous solution that does not dissolve the formed film, that is, an alkaline salt of a weak acid is used for the electrolyte. An aqueous solution, preferably a buffer solution, is used. Here, a weak acid means that the ionization constant K is small (K <10).
-3 ) Polyvalent inorganic acids and organic acids, for example, boric acid, phosphoric acid, tartaric acid and the like. pH is 5.0 to 10.0
To If the pH is lower than 5.0, the dissolution reaction of the entire plating layer takes precedence, and if the pH is higher than 10.0, hydroxide is generated in the electrolytic bath to lower the electrolytic efficiency, and both forms an anodic oxide film. It is hard to be done. The electrolysis is performed at a current density of 1 to 10 mA / c by direct current or pulse current or a combination thereof.
It is suitable to carry out in the range of m 2 . When it is lower than 1 mA / cm 2 , an anodic oxide film is not formed so much that 10 mA / cm 2
Even if it is higher than cm 2, the generation efficiency of the anodic oxide film does not improve. The bath temperature is suitably in the range of 20 to 60C. 20
When the temperature is lower than 0 ° C., the dissolution reaction of Zn becomes difficult to occur, and 6
If the temperature is higher than 0 ° C., the anodic oxide film will be dissolved, and the production efficiency of the anodic oxide film will decrease.

【0010】[0010]

【実施例】実施例1 ホウ酸濃度が0.5mol/L、四ホウ酸ナトリウム濃
度が0.05mol/L、pHが7.6である水溶液の電
解浴にめっき層組成が表1のような溶融Al−Zn系合
金めっき鋼板またはAl−Si系合金めっき鋼板(めっ
き付着量はいずれも20μm)を浸漬して、電流密度1
0mA/cm2、浴温25℃の条件で陽極酸化処理を施
した。なお、陽極酸化皮膜の厚さは通電時間を変えるこ
とにより調整した。そして、処理後陽極酸化皮膜の厚さ
と絶縁性とを調査し、絶縁性は絶縁抵抗値が106Ω以
上のものを記号○で、102Ω以上、106Ω未満のもの
を△で、102Ω未満のものを記号×で評価した。表2
にこの結果を示す。
EXAMPLE 1 The plating layer composition was as shown in Table 1 in an electrolytic bath of an aqueous solution having a boric acid concentration of 0.5 mol / L, a sodium tetraborate concentration of 0.05 mol / L and a pH of 7.6. A hot-dip Al-Zn alloy-plated steel sheet or an Al-Si-based alloy-plated steel sheet (each having a coating weight of 20 µm) was immersed in the steel sheet to obtain a current density of 1
Anodizing treatment was performed under the conditions of 0 mA / cm 2 and a bath temperature of 25 ° C. In addition, the thickness of the anodic oxide film was adjusted by changing the energizing time. After the treatment, the thickness of the anodic oxide film and the insulating property were investigated. The insulating property was indicated by a symbol ○ when the insulation resistance value was 10 6 Ω or more, and a Δ when the insulating resistance value was 10 2 Ω or more and less than 10 6 Ω. Those having a resistivity of less than 10 2 Ω were evaluated with the symbol x. Table 2
The results are shown in FIG.

【0011】[0011]

【表1】 [Table 1]

【0012】[0012]

【表2】 [Table 2]

【0013】表2の結果より、めっき鋼板Bについて、
通電時間を80秒以上とした実施例3〜7は皮膜厚が
0.1μm以上となり、良好な絶縁性を示した。めっき
鋼板Aについては、通電時間を600秒にしても、皮膜
厚が0.1μm以上にならなかった。めっき鋼板Cにつ
いては皮膜厚0.1μm以上のものも得られているが、
絶縁性は良好でない。これはめっき層中に9mass%のS
iを含むため、電解過程でSiを析出することになり、
この析出したSiが導電性を有するため、絶縁性の低下
を招いているためと考えられる。
[0013] From the results in Table 2, for the plated steel sheet B,
In Examples 3 to 7 in which the energization time was 80 seconds or more, the film thickness was 0.1 μm or more, and good insulation was exhibited. Regarding the plated steel sheet A, even when the energizing time was 600 seconds, the film thickness did not become 0.1 μm or more. As for the plated steel sheet C, a coating thickness of 0.1 μm or more is obtained,
The insulation is not good. This is because 9 mass% of S
In order to contain i, Si will be deposited in the electrolytic process,
This is considered to be because the precipitated Si has conductivity and causes a decrease in insulation.

【0014】実施例2 実施例1の表1に示した溶融Al−Zn系合金めっき鋼
板Bを浴組成、pHの異なる種々の電解浴に浸漬して、
各浴での電解条件を一定にした状態で陽極酸化処理し、
実施例1と同要領で絶縁性を評価するとともに、陽極酸
化皮膜の厚さを測定した。そして、陽極酸化皮膜の厚さ
が0.1μm以上であったものを記号○で、0.1μm未
満であったものを記号×で評価した。この結果を表3に
示す。なお、電解浴については酸のイオン濃度を0.5m
ol/L一定とし、pHはその酸の塩濃度を変化させる
か、硫酸または水酸化ナトリウムを用いて調整した。
Example 2 A hot-dip Al—Zn alloy-plated steel sheet B shown in Table 1 of Example 1 was immersed in various electrolytic baths having different bath compositions and pHs.
Anodizing treatment while keeping the electrolysis conditions in each bath constant,
The insulation properties were evaluated in the same manner as in Example 1, and the thickness of the anodic oxide film was measured. Those having a thickness of 0.1 μm or more were evaluated with a symbol ○, and those having a thickness of less than 0.1 μm were evaluated with a symbol x. Table 3 shows the results. For the electrolytic bath, the ion concentration of the acid was 0.5 m
ol / L was kept constant, and the pH was adjusted by changing the salt concentration of the acid or by using sulfuric acid or sodium hydroxide.

【0015】[0015]

【表3】 [Table 3]

【0016】表3の結果より電解浴にpH5.0〜10.
0の範囲のホウ酸とそのアルカリ塩の混合溶液を適用し
た場合に陽極酸化皮膜厚さ、絶縁性とも良好な陽極酸化
皮膜を形成できることがわかる。また同様にリン酸、酒
石酸についてもアルカリ塩との混合溶液にて所定範囲に
あるpHの溶液を適用することで絶縁性に優れる陽極酸
化皮膜を形成できることがわかる。
From the results shown in Table 3, the pH of the electrolytic bath was adjusted to 5.0 to 10.
It can be seen that when a mixed solution of boric acid and its alkali salt in the range of 0 is applied, an anodic oxide film having good thickness and good insulating properties can be formed. Similarly, for phosphoric acid and tartaric acid, an anodic oxide film excellent in insulation can be formed by applying a solution having a pH within a predetermined range with a mixed solution with an alkali salt.

【0017】[0017]

【発明の効果】以上のように、Al系合金のめっき鋼板
のめっき層表層に陽極酸化皮膜を形成した絶縁基板にお
いて、めっき鋼板のAl系合金をAl:40〜60ma
ss%、Siおよび不可避的不純物:2mass%以
下、残部:ZnからなるAl−Zn系合金にすると、陽
極酸化皮膜の厚みは均一になり、また、Al系合金を上
記のようにしためっき鋼板を弱酸のアルカリ塩を含むp
H5.0〜10.0の水溶液中に浸漬して、連続的に陽極
酸化すると、バリヤ−型の陽極酸化皮膜を形成できる。
As described above, in the insulating substrate having the anodic oxide film formed on the surface of the plating layer of the Al-based alloy plated steel sheet, the Al-based alloy of the plated steel sheet is changed to Al: 40 to 60 ma.
When an Al—Zn-based alloy composed of ss%, Si and inevitable impurities: 2 mass% or less, and the balance: Zn, the thickness of the anodic oxide film becomes uniform, and a plated steel sheet made of the Al-based alloy as described above is used. P containing an alkali salt of a weak acid
When immersed in an aqueous solution of H5.0 to 10.0 and continuously anodized, a barrier-type anodized film can be formed.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 澤谷 啓一 千葉県市川市高谷新町7番地の1 日新製 鋼株式会社技術研究所塗装・複合材料研究 部内 (72)発明者 小浦 節子 千葉県市川市高谷新町7番地の1 日新製 鋼株式会社技術研究所塗装・複合材料研究 部内 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Keiichi Sawatani 7-1, Takatani Shinmachi, Ichikawa-shi, Chiba Pref. 7 Nisshin Steel Co., Ltd., Ritsumeikan Co., Ltd.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 Al系合金のめっき鋼板のめっき層表
層に陽極酸化皮膜を形成した絶縁基板において、めっき
鋼板のAl系合金をAl:40〜60mass%、Si
および不可避的不純物:2mass%以下、残部:Zn
からなるAl−Zn系合金にしたことを特徴とする陽極
酸化皮膜を有する絶縁基板。
1. An insulated substrate having an anodized film formed on the surface of a plating layer of an Al-based alloy plated steel sheet, wherein the Al-based alloy of the plated steel sheet is Al: 40-60 mass%, Si
And inevitable impurities: 2 mass% or less, balance: Zn
An insulating substrate having an anodic oxide film, wherein the insulating substrate is made of an Al-Zn alloy.
【請求項2】 陽極酸化皮膜の厚さが0.1μm以上
であることを特徴とする請求項1または2に記載の陽極
酸化皮膜を有する絶縁基板。
2. An insulating substrate having an anodized film according to claim 1, wherein the thickness of the anodized film is 0.1 μm or more.
【請求項3】 弱酸のアルカリ塩を含むpH5.0〜
10.0の水溶液中にAl:40〜60mass%、S
iおよび不可避的不純物:2mass%以下、残部:Z
nからなるAl−Zn系合金のめっき鋼板を浸漬して、
連続的に陽極酸化することを特徴とする陽極酸化皮膜を
有する絶縁基板の製造方法。
3. A pH of 5.0 containing an alkali salt of a weak acid.
Al in a 10.0 aqueous solution: 40-60 mass%, S
i and inevitable impurities: 2 mass% or less, balance: Z
n-Al-Zn alloy plated steel sheet
A method for producing an insulating substrate having an anodized film, characterized by continuously performing anodization.
JP11074988A 1999-03-19 1999-03-19 Insulating substrate with anodic oxidation coating, and its manufacture Withdrawn JP2000273696A (en)

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Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2000273696A true JP2000273696A (en) 2000-10-03

Family

ID=13563181

Family Applications (1)

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Country Status (1)

Country Link
JP (1) JP2000273696A (en)

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