JP2000266921A - Color filter, manufacture of color filter and liquid crystal display device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a manufacturing method of a color filter by using a back exposure having a flattening layer for filling up irregularities between pixels without executing precise positioning, and a liquid crystal display device. SOLUTION: Concerning this manufacturing method of a color filter and this liquid crystal display device, in the manufacturing method of a color filter for forming a transparent flattening layer for filling up recess parts between pixels by forming a three or morecolored pixel part by an electrochemical method on a substrate having a transparent conductive thin film where pattern forming is executed, and thereafter by coating a photo-curing transparent photosensitive resin on the whole surface and drying it, and by exposing (back exposing) from a non-coated surface without the aid of a photomask, and by developing and curing it, the development process is executed by a development condition stronger than a development condition of the photosensitive resin in the normal case of exposing from the coated face through a photomask.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a color filter used for a color liquid crystal display, a method for manufacturing the color filter, and a liquid crystal display. Particularly, the present invention relates to a method for manufacturing a color filter suitable for a plastic film substrate having excellent portability.

[0002]

2. Description of the Related Art Liquid crystal display devices have been used in various fields, and are increasingly being used as CRTs as information display devices. In particular, devices that require portability are small,
Because of its light weight and low power consumption, it is used in many devices. In addition, color technology has advanced, and various methods for producing color filters for liquid crystals, such as a dyeing method, a pigment dispersion method, an electrodeposition method, a printing method, and a micellar electrolytic method, have been proposed. is there. Among these, in the dyeing method, the pigment dispersion method, the printing method, and the like, red (R), green (G), blue (B), a light-shielding layer provided to prevent light leakage and enhance contrast, and between pixels. In the formation of the flattening layer used to fill the irregularities, it is necessary to accurately position each position with respect to another pattern. In addition, it is necessary to align the color filter pattern with the electrode for driving the liquid crystal.

In this respect, in an electrochemical method such as an electrodeposition method or a micelle electrolytic method, a photolithography method is used to pattern a transparent electrode, but such precise alignment is not required. Further, the micelle electrolysis method can form a conductive color filter layer, and can use the color filter layer as a liquid crystal drive electrode without laminating a liquid crystal drive electrode again on the color filter layer. To this end, micellar electrolysis has established a basic technology (J. Am. Chem. Soc. 1991, 11).
3,450-456, Patent Publication 1812057, 20
27520, JP-A-2-146001, JP-A-2-14997, and JP-A-2-267268), various studies have been made toward practical use.
In particular, since precise alignment is not required, the present invention is highly adaptable to a plastic film substrate in addition to a normal glass substrate.

Recently, a liquid crystal display device using a plastic film has been used for portable equipment such as a mobile phone and an electronic organizer. The plastic film has a thickness of about 0.1 to 0.3 mm and is light in weight, so that it is most suitable for portable equipment. In addition, reflective color liquid crystal displays have been actively developed for the purpose of improving portability and reducing power consumption. In the case of a reflective color liquid crystal display, it is necessary to efficiently return the light incident on the panel to the observer. It has been proposed to flatten unevenness with a transparent flattening layer. In this case, the transparent flattening layer can be manufactured by a normal photolithography method using a photomask in the same manner as the light shielding layer. Also in this case, the number of photolithography steps increases, which may cause a decrease in yield. Therefore, a self-aligned backside exposure method using the color filter itself as a photomask (JP-A-1-13530, JP-A-1-29330)
No. 6) has been proposed, but in practice, the color filter of the reflection type color liquid crystal display is extremely thin because it emphasizes brightness, and cannot sufficiently fulfill the role of a photomask. At present, unevenness between pixels cannot be completely flattened.

[0005]

SUMMARY OF THE INVENTION An object of the present invention is to provide a method of manufacturing a color filter having a flattening layer for filling irregularities between pixels without performing precise alignment.

[0006]

Means for Solving the Problems After forming pixel portions of at least three colors by an electrochemical method on a substrate having a patterned transparent conductive thin film, a photocurable transparent photosensitive resin is applied to the entire surface and dried. In a method of manufacturing a color filter in which a transparent flattening layer is formed by exposing from a non-coated surface without using a photomask (backside exposure), and developing and curing to form a transparent flattening layer that fills a concave portion between pixels, By performing the reaction under the conditions, it was found that the thickness contrast of the photocurable transparent photosensitive resin layer could be obtained even when a thin-film color filter was used, and the photocurable transparent photosensitive resin layer could be flattened, thereby achieving the present invention.

[0007] The present invention uses a condition that is stronger than the developing condition of the photosensitive resin when exposing from the coated surface through a normal photomask, that is, using a high-concentration developer and / or a long developing time. By doing so, it is possible to form a transparent flattening layer that fills the concave portions between the pixels.

[0008] However, if the developing conditions are too strong, the thickness of the film is greatly reduced, and the photosensitive resin in the concave portion to be filled is also removed, so that the flattening cannot be performed. For this reason, the developer concentration is 2 to 30 when using a normal photomask.
The development time is preferably about 1 to 20 times that of a case using an ordinary photomask, although it depends on the concentration of the developing solution. In particular, the present invention is directed to visible light (400 to 800 n
In the case of a thin film color filter having an average transmittance of 60% or more in m), when the color filter is conductive,
When an ultraviolet absorber is contained in the color filter layer,
Alternatively, when a layer containing an ultraviolet absorber is provided above or below a color filter layer, it is effective when the substrate having a transparent conductive thin film is a plastic film substrate.

The electrochemical method for forming the three primary color dye films constituting the color filter of the present invention includes, but is not limited to, the electrodeposition method and the micellar electrolytic method generally used as described above. Not something. The electrodeposition method is a method in which an electrodeposition polymer and a pigment are dispersed and electrodeposition coating is performed on an electrode patterned on a substrate.The micellar electrolysis method is a method in which a pigment is dispersed using a surfactant having a redox ability. This is a method of dispersing and forming a dye layer on an electrode patterned on a substrate. However, in the micelle electrolysis method, conductive particles can be contained in the color filter together with the dye, and a conductive color filter can be produced, which is more preferable.

The micelle electrolysis method, which is preferable as the method for producing a color filter of the present invention, will be described in more detail.
Examples of dyes having three primary color spectral characteristics include organic pigments such as perylene pigments, lake pigments, azo pigments, quinacridone pigments, anthraquinone pigments, metal-substituted phthalocyanine pigments, halogen-substituted phthalocyanine pigments, titanium oxide, iron oxide, and the like. Examples thereof include inorganic pigments such as cobalt violet and cobalt blue, which are used alone or in combination. Further, yellow pigments such as isoindolinone pigments and disazo pigments for adjusting chromaticity, and purple pigments such as dioxane pigments are used as necessary. The particle size of these pigments is preferably 10 μm or less, particularly preferably 1 μm or less. In order to impart conductivity to the prepared dye layer, in addition to these dyes,
If necessary, transparent conductive particles such as ITO may be added.

A ferrocene derivative surfactant used for converting these hydrophobic substances into micelles has both a ferrocene site necessary for an electrolytic reaction and a nonionic, cationic or anionic surfactant site. 1963-2432
No. 98, JP-A-1-226894, JP-A-1
No. 45370, JP-A-2-88887, JP-A-2-96585, and JP-A-2-250892, but are not particularly limited.
As the aqueous medium of the micelle electrolyte, water, alcohol, acetone and the like may be mixed and used as necessary. In addition, a supporting electrolyte is added to the micelle electrolyte as needed in order to adjust the electric conductivity of the aqueous medium. As the supporting electrolyte, generally used ones such as sulfates, halides, acetates, and water-soluble oxides of alkali metals and alkaline earth metals are used.

In order to prepare a micelle electrolyte using the above-mentioned materials, a dye, a ferrocene derivative surfactant, and if necessary, conductive particles, a supporting electrolyte and the like are added to the aqueous medium, and a homogenizer, a ternary electrolyte, and the like are added. It is uniformly dispersed or solubilized by a dispersing method such as a roll mill, a sand mill, a pearl mill, and a stirrer. Here, the concentration of the ferrocene derivative surfactant is 0.1 mmol / l to 1.0 mol / l.
Is preferable, and the dye concentration is preferably 1 to 500 g / l.
To prepare a dye thin film using the micellar electrolysis method adjusted in this way, the conductive substrate is immersed in an electrolytic solution and energized.The electrolysis conditions at this time include the use of a ferrocene derivative surfactant. The reaction is performed at a voltage higher than the oxidation-reduction potential and lower than the hydrogen generation potential. Specifically, 0.1 to 1.5
V, the current density is preferably 1 mA / cm ² or less, and the electrolysis is performed by a constant potential, constant current, or other electrolytic method. When electrolysis is performed under such conditions, a desired dye thin film is formed according to the principle of the micelle electrolysis method.

After the formation of the thin film, if necessary, washing and drying may be performed to provide a protective layer. The protective layer is required to improve the mechanical strength of the dye layer without affecting the driving of the liquid crystal, and to be effective as a blocking layer between the dye layer and the liquid crystal layer. A transparent, light-curable resist cured product such as a resin, an ester, a polyimide, a cyclized rubber, a siloxane, or an epoxy resin, a cured transparent thermosetting resin, or the like is used. However, the unevenness between pixels is not flattened by the protective layer alone, and eventually the flattening layer of the present invention is required. Therefore, it is more preferable that the flattening layer also has the function of the protective layer.

The conductive substrate must be a metal or a conductor that is nobler than the oxidation-reduction potential of the ferrocene derivative surfactant, and may be gold, platinum, silver, glassy carbon, a conductive metal oxide, or an organic metal. Although a polymer conductor and the like are mentioned, for use in a liquid crystal cell, a form in which a transparent conductive metal oxide layer such as ITO is formed on glass or a film is preferable, and in the present invention, precise alignment is performed. Since it is not necessary, IT
The formation of the O thin film is particularly effective. Plastic film substrates are required to have durability against high-temperature atmospheres in the process of forming a transparent conductive film and in the process of manufacturing devices.Polyethylene terephthalate, polyethylene naphthalate, polycarbonate, polyether sulfone, and polyimide have both heat resistance and optical flatness. , Polyarylate and the like are used.

FIG. 3 shows a process for producing a transparent flattening layer by back exposure on the color filter produced as described above.
It is explained according to 1. The photocurable transparent photosensitive resin that constitutes the transparent flattening layer not only has excellent patterning characteristics, but also improves the mechanical strength of the dye layer without affecting the driving of the liquid crystal, and a blocking layer between the dye layer and the liquid crystal layer. effect is obtained as is preferably one excellent in transparency and solvent resistance, and further, when the color filter layer is conductive 10 ⁰ Omega
cm, preferably at least 10 ¹³ Ωcm. Examples of these are acrylic, ester, urethane, polyimide, cyclized rubber, siloxane,
Epoxy resin, polyvinyl alcohol resin or the like is used alone or in combination. In addition, a reaction initiator for controlling the photocuring reaction, a photosensitizer, a reactive diluent, and the like can be appropriately added to these.

The above-mentioned photo-curable transparent photosensitive resin is prepared by dissolving a monomer component for forming the resin in a suitable organic solvent such as hydrocarbon, ketone, or ether or an aqueous solvent, and spin-coating or roll-coating. Method, dip coating method,
It was manufactured by coating the entire surface of the substrate by a printing method or the like and performing pre-baking [FIG. 1 (a)]. Prebaking is usually performed at 70 to 120 ° C for 2 to 1 depending on the type of resin used.
It takes about 5 minutes. The substrate coated with the entire surface of the photo-curable transparent photosensitive resin is exposed from the back (FIG. 1B). The wavelength range of the light used at the time of exposure may be various ranges, but an ultraviolet range is preferable, and as a light source, an ultra-high pressure mercury lamp,
A metal halide lamp, an excimer lamp, or the like is used. The amount of exposure depends on the type of the photosensitive resin used, but is usually about 50 to 1000 mJ / cm ² . Then, in the most important development step of the present invention, here, the uncured portion of the photosensitive resin mainly on the dye layer in the pixel portion is removed [FIG. 1 (c)].

The developer used in this case includes inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate and sodium silicate, ethylamine, n
Primary amines such as -propylamine, secondary amines such as diethylamine and di-n-propylamine, tertiary amines such as triethylamine and methyldiethylamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide and the like But quaternary ammonium salts, alcoholamines such as diethylethanolamine and triethanolamine, and the like, but are not limited thereto. Furthermore, a water-soluble organic solvent such as methanol and ethanol, a surfactant and the like can be appropriately added to these.

The development conditions using these developing solutions vary depending on the photosensitive resin used, even when the photosensitive resin is exposed from the surface coated with the photosensitive resin through an ordinary photomask. In the case of a reflection type color liquid crystal display, when back exposure is performed using a thin color filter having a low ultraviolet blocking ability, it is difficult to flatten the dye layer under normal developing conditions. By limiting the conditions to a stronger range, flattening between the dye layers was made possible. That is, the concentration of the developing solution is preferably about 2 to 30 times that in the case where a normal photomask is used, and the developing time depends on the concentration of the developing solution.
About twice is preferable. After the development, the substrate is washed with water, an organic solvent, or the like, and subjected to host baking if necessary. Host baking conditions vary depending on the photosensitive resin used, but are usually 100 to 25.
This is performed at 0 ° C. for about 30 to 120 minutes. Through the above steps, a transparent flattening layer is completed.

In the present invention, in order to improve the ability of the thin film color filter to block ultraviolet light, an ultraviolet absorber is contained in the dye layer, or a layer containing the ultraviolet absorber is provided above or below the dye layer. You can also. In this case, the method for incorporating the ultraviolet absorber is not limited, but from the gist of the present invention, the same electrochemical method as that for forming the color layer of the color filter is preferable. Examples of the ultraviolet absorber used include transparent ceramic fine particles such as zinc oxide, titanium oxide, tin oxide, and cerium oxide, and organic ultraviolet absorbers such as a benzotriazole compound, a hydroxybenzophenone compound, and a salicylate compound. .

[0020]

EXAMPLE 1 A transparent conductive film on a glass substrate was formed with a pitch of 110 μm and a width of 90 μm.
960 μm stripes were processed by the usual photolithography method. Next, a micelle electrolyte was prepared as follows. That is, in the case of red, 5 g of perylene red, IT
5 g of O powder, 1.5 g of FPEG (manufactured by Dojindo Chemical Co., Ltd.) as a ferrocene derivative, and 10.4 g of LiBr as a supporting salt were added to 1000 ml of water, ultrasonically dispersed, and then centrifuged (200
0 rpm, 10 minutes), when green, 5 g of phthalocyanine green, 5 g of ITO powder, 1.5 g of FPEG,
After adding 10.4 g of LiBr to 1000 ml of water and ultrasonic dispersion, the mixture was centrifuged (2000 rpm, 10 minutes). In the case of blue, phthalocyanine blue 4 g, ITO
6 g of powder, 2.0 g of FPEG and 10.4 g of LiBr were added to 1000 ml of water, ultrasonically dispersed, and then centrifuged (200
0 rpm, 10 minutes). After the glass substrate was immersed in the red electrolyte solution thus prepared, 0.5 V (vsAg / A) was applied to every third transparent electrode.
gCl) for 4 minutes, and a red conductive color filter layer (visible light 400-8) on the selected electrode.
00 nm average transmittance: 65%, film thickness: 5500 °). Subsequently, the substrate was washed with pure water and dried at 120 ° C. Similarly, a green electrolyte for 3 minutes (average visible light transmittance: 66%, film thickness: 4800 °), a blue electrolyte for 2 minutes (average visible light transmittance: 60%, film thickness: 4900 °),
Electrolysis was performed to form red, green, and blue conductive color filter layers.

On the entire surface of the substrate on which the color filter is provided, a photo-curable transparent photosensitive resin (Tokyo Ohka Kogyo OMR-
83) by about 7200 ° by spin coating, and 90 ° C.
Was prebaked in an oven for 5 minutes. The entire surface of the substrate was exposed (300 mJ / cm ² ) with an ultra-high pressure mercury lamp from the back side without the color filter layer, and developed with a 2.0% aqueous sodium hydrogen carbonate solution at 25 ° C. for 60 seconds,
A flattening layer was formed by performing host baking at 0 ° C. for 1 hour. When the unevenness between the respective dye layers of the color filter thus manufactured was measured by a surface step meter (manufactured by DEKTAK), almost no step was found within the range of the measurement error.

Example 2 The color filter layer prepared in Example 1 contained an ultraviolet absorber as follows. That is, 5.0 g of 2-hydroxymethoxybenzophenone as an ultraviolet absorber, 0.5 g of FPEG, and 10.4 g of LiBr were added to 1000 ml of water, ultrasonically dispersed, and then stirred for 1 day.
The insoluble components were removed by centrifugation (2000 rpm, 1 hour) to prepare a micelle electrolyte, and the color filter layer prepared above was immersed in the solution to obtain 0.5 V (vsA
g / AgCl) for 3 minutes, washed with pure water and dried to hold the ultraviolet absorber in the color filter. A light-curing transparent photosensitive resin (Fuji Film Olin CT) is applied to the entire surface of the substrate on which the ultraviolet absorbent-containing color filter thus formed is formed at 7000 ° C. by a spin coating method, and prebaked in an oven at 120 ° C. for 3 minutes. Was done. The entire surface of this substrate was exposed with an ultra-high pressure mercury lamp from the back side without a color filter layer (50 mJ / cm
² ) Then, development processing is performed with a 1.5% aqueous solution of tetramethylammonium hydroxide at 25 ° C. for 30 seconds,
A flattening layer was formed by performing host baking for one hour. When the unevenness between the respective dye layers of the color filter thus manufactured was measured by DEKTAK, almost no step was found within the range of the measurement error.

Example 3 A 0.2-μm thick chromium metal film was formed on a transparent conductive film of a transparent conductive film FST-5340 (manufactured by Sumitomo Bakelite Co., Ltd.) by a vacuum evaporation method. Subsequently, 960 stripe-shaped resist patterns having a pitch of 110 μm and a width of 90 μm were formed by a normal photolithography method, and chromium and a transparent conductive film were processed by wet etching with the resist patterns. After the photoresist was stripped, an RGB conductive color filter was formed on the transparent electrode using the same RGB micelle electrolyte as in Example 1 under the following electrolysis conditions. That is, each of the electrolytes was 0.5 V (vsAg).
/ AgCl) with R for 3.5 minutes, G for 3 minutes, and B for 1.
A constant potential electrolysis was performed for 5 minutes, and R (visible light average transmittance: 70%, film thickness: 5200 °), G (visible light average transmittance: 68%, film thickness: 4600 °), and B (visible light average, respectively) A conductive color filter layer having a transmittance of 64% and a thickness of 4700 °) was formed.

A light-curing transparent photosensitive resin (Nippon Kayaku CL-1) is applied to the entire surface of the substrate on which the color filter is provided by about 6,000Å by spin coating, and prebaked in an oven at 80 ° C. for 5 minutes. Was. The whole surface of this substrate was exposed with an ultra-high pressure mercury lamp from the back side without the color filter layer (2
(100 mJ / cm ² ), developed with a 1.5% aqueous solution of potassium hydroxide at 25 ° C. for 90 seconds, and baked at 180 ° C. for 2 hours to form a flattened layer. The unevenness between the dye layers of the color filter thus manufactured is
When measured by EKTAK, almost no step was found within the range of the measurement error.

Example 4 Under the same conditions as in Example 3, an RGB color filter layer was formed on a transparent conductive film substrate on which a transparent conductive layer was patterned. A light-curing transparent photosensitive resin (JNPC-48)
L: manufactured by JSR) was applied by a spin coating method at about 6000Å, and prebaked in an oven at 90 ° C for 5 minutes. The entire surface of the substrate was exposed (350 mJ / cm ² ) with an ultra-high pressure mercury lamp from the back side without a color filter layer, developed with a 2.5% tetramethylammonium aqueous solution at 25 ° C. for 30 seconds, and heated at 180 ° C. for 1 hour. Baking was performed to form a flattening layer. When the unevenness between the respective dye layers of the color filter thus manufactured was measured by DEKTAK, almost no step was found within the range of the measurement error.

Example 5 An ultraviolet absorbing layer was formed on a transparent conductive film substrate on which a transparent conductive layer was patterned in the same manner as in Example 3 under the following conditions. 10 g of zinc oxide powder, 2.5 g of FPEG (manufactured by Dojindo Chemical) as a ferrocene derivative, LiB as a supporting salt
After adding 10.4 g of r to 1000 ml of water and ultrasonic dispersion,
The micellar electrolyte was adjusted by centrifugation (2000 rpm, 10 minutes), and a constant potential electrolysis of 0.5 V (vsAg / AgCl) was performed for 2 minutes to form an ultraviolet absorbing layer on the transparent conductive electrode. On this, an RGB color filter layer was formed under the same conditions as in Example 3. However, the average visible light transmittance and the thickness of the film including the ultraviolet absorbing layer were 60.2% for R.
8400Å, G 58.5% 7200Å, B 5
4.4% was 7300 °.

A light-curing transparent photosensitive resin (JSR JNPC-4) is formed on the entire surface of the substrate on which the color filter is provided.
3ML) by spin coating to about 10,000
Prebaking was performed in an oven at 0 ° C. for 5 minutes. The entire surface of the substrate was exposed (350 mJ / cm ² ) with an ultra-high pressure mercury lamp from the back side without a color filter layer, developed with a 2.5% tetramethylammonium aqueous solution at 25 ° C. for 30 seconds, and heated at 180 ° C. for 1 hour. Baking was performed to form a flattening layer. When the unevenness between the respective dye layers of the color filter thus manufactured was measured by DEKTAK, almost no step was found within the range of the measurement error.

Example 6 Using the conductive color filter prepared in Example 4, 1
An STN liquid crystal panel driven by a / 240 duty was manufactured and the driving voltage was evaluated. As a result, there was no change in the driving voltage as compared with the case without the color filter.

Comparative Example 1 The procedure of Example 1 was repeated, except that a 0.2% aqueous solution of sodium hydrogen carbonate was used as a developing solution in the developing step of forming the flattening layer.
As a result of measurement with TAK, R was about 4700 ° and G was about 3
Steps (dye layer and concave portions) of 500 ° and B were about 3600 ° were observed.

Comparative Example 2 The procedure of Example 2 was repeated, except that a 0.2% aqueous solution of tetramethylammonium hydroxide was used as a developing solution in the developing step of forming the flattening layer. As a result of measurement with DEKTAK, R was about 3
Steps of 600 °, G of about 2800 ° and B of about 3000 ° (dye layer and concave portion) were observed.

Comparative Example 3 The procedure of Example 3 was repeated, except that a 1.0% aqueous solution of potassium hydroxide was used as a developing solution in the developing step of preparing the flattening layer.
As a result of measurement by TAK, R was about 4200Å and G was about 3
Steps (dye layer and concave portions) of 500 ° and B were about 3600 ° were observed.

Comparative Example 4 The procedure of Example 4 was repeated, except that a 0.14% aqueous solution of tetramethylammonium was used as a developing solution in the developing step of forming the flattening layer. As a result of measurement, R was about 3800 °,
G (about 3000 °) and B (about 3200 °) steps (dye layer and concave portions) were observed.

Comparative Example 5 The same procedure as in Example 5 was carried out except that a 0.14% aqueous solution of tetramethylammonium was used as a developing solution in the developing step for preparing the flattening layer. As a result, R was about 6400 °,
G (about 3000 °) and B (about 3300 °) steps (dye layer and concave portions) were observed.

Comparative Example 6 A drive voltage was evaluated in the same manner as in Example 6 except that the conductive color filter prepared in Comparative Example 5 was used. As a result, an insulating film was formed on the conductive color filter used as the drive electrode. The drive voltage was considered to be increased due to a large amount of the remaining photosensitive resin layer remaining.

[0035]

According to the present invention, it is possible to provide a method of manufacturing a color filter having a flattened layer in which unevenness between color filters is filled by back exposure that does not require precise alignment, even in a thin film color filter. Claims 3 and 4 Provided are color filters having a flattening layer that fills in irregularities between the color filters by the backside exposure method. Claims 5 to 6 In the case of a thin film color filter having a low ultraviolet blocking ability, a color filter which is easy to produce a flattening layer by back exposure due to the absorption effect of an ultraviolet absorber has been provided. Claim 7 A color filter has been provided which has the most advantageous effect that it can be easily manufactured when a plastic film substrate is used because precise positioning is not required. Claim 8 A liquid crystal display device has been provided in which the color filter of the present invention does not affect the driving of the liquid crystal, such as a decrease in driving voltage, and does not affect the display quality even in the STN mode due to its flatness.

[Brief description of the drawings]

FIG. 1 is a view for explaining a step of forming a transparent flattening layer on a color filter by a back exposure method. FIG. 3A is a diagram illustrating a stage in which a transparent photosensitive resin is applied to the entire surface of a substrate and prebaking is performed. FIG. 3B is a diagram illustrating a stage of exposing from the back surface of the substrate. FIG. 4C is a diagram illustrating a step of removing an uncured portion on the dye layer of the pixel portion.

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Claims (8)

[Claims] 1. After forming pixel portions of at least three colors by an electrochemical method on a substrate having a patterned transparent conductive thin film, a photo-curable transparent photosensitive resin is applied to the entire surface and dried to form a photo mask. In a method of manufacturing a color filter in which a transparent flattening layer is formed by exposing from the non-coated surface without intervening (backside exposure), developing and curing to fill the recesses between pixels, the developing process is performed through a normal photomask. A method for producing a color filter, wherein the development is performed under stronger development conditions than the development conditions of the photosensitive resin when exposing from the application surface. 2. A developing solution having a higher concentration than a developing solution used in the developing step when exposing from a coating surface through a normal photomask, and / or a developing time longer than the developing time used in the developing step. The method for producing a color filter according to claim 1, wherein the development is performed using a development time of 10 hours. 3. A color filter manufactured by the method for manufacturing a color filter according to claim 1. 4. The visible light (400 to 8) of a color filter.
3. The average transmittance at 60 nm) is 60%.
The color filter described. 5. At least one of the three color pixel portion dye layers
An ultraviolet absorber is contained in the color dye layer.
5. The color filter according to any one of items 1 to 4. 6. At least one of the three color pixel part dye layers.
The color filter according to any one of claims 3 to 5, wherein a layer containing an ultraviolet absorber is present above or below the color dye layer. 7. The color filter according to claim 3, wherein the substrate having the transparent conductive thin film is a plastic film substrate. 8. A liquid crystal display device using the color filter according to claim 3.