JP2000239829A - Member with solid lubricating film - Google Patents

Member with solid lubricating film

Info

Publication number
JP2000239829A
JP2000239829A JP11038007A JP3800799A JP2000239829A JP 2000239829 A JP2000239829 A JP 2000239829A JP 11038007 A JP11038007 A JP 11038007A JP 3800799 A JP3800799 A JP 3800799A JP 2000239829 A JP2000239829 A JP 2000239829A
Authority
JP
Japan
Prior art keywords
film
solid lubricating
layer
lubricating film
crn
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11038007A
Other languages
Japanese (ja)
Inventor
Naoaki Kitagawa
直明 北川
Yuki Tsukada
由貴 塚田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP11038007A priority Critical patent/JP2000239829A/en
Publication of JP2000239829A publication Critical patent/JP2000239829A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02TCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T10/00Road transport of goods or passengers
    • Y02T10/80Technologies aiming to reduce greenhouse gasses emissions common to all road transportation technologies
    • Y02T10/86Optimisation of rolling resistance, e.g. weight reduction 

Landscapes

  • Sliding-Contact Bearings (AREA)
  • Rolling Contact Bearings (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a member with a solid lubricating film free from deterioration in adhesion between the solid lubricating film and the member even in the case an inexpensive solid lubricating film is used, capable of obtaining a low friction coefficient over a long period and moreover capable of maintaining high wear resistance. SOLUTION: A CrN film of which film face is orientated in the crystal plane (200) is provided as a 1st layer, and a solid lubricating film is provided as a 2nd layer. The CrN film as the 1st layer is formed by a cathode arc ion plating method in which the pressure of gaseous nitrogen is controlled to 20 to 50 mTorr, and bias voltage is controlled to 0 V. The solid lubricating film as the 2nd layer is an MoS2 film, a WS2 film, an NbS2 film, a mica film, an Sb203 film, a BN film, a WSe film, an MoSe2 film, an Au film or an Ag film formed by an ion plating method, sputtering method or a shot peening method.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、摺動摩耗部品や工
具などに用いるのに適した、低摩擦係数でかつ高耐摩耗
性を有する固体潤滑膜付き部材に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a member provided with a solid lubricating film having a low friction coefficient and high wear resistance, which is suitable for use in sliding wear parts and tools.

【0002】[0002]

【従来の技術】工具や機械部品の摩擦係数を低減して耐
摩耗特性を向上させる手段に、部材表面に固体潤滑膜を
形成する方法が知られている。例えば、機械部品表面に
油を塗布したり、潤滑微粒子を分散させたフィルムやオ
イルで覆ったり、スパッタリング法でMoS2膜などを
形成したりする方法などである。
2. Description of the Related Art A method of forming a solid lubricating film on the surface of a member is known as a means for reducing the coefficient of friction of a tool or a mechanical part to improve the wear resistance. For example, a method of applying oil to the surface of a mechanical component, covering with a film or oil in which lubricating fine particles are dispersed, forming a MoS 2 film by a sputtering method, or the like is used.

【0003】しかしこれら従来の方法では、固体潤滑膜
と部材とが拡散層を形成せず、部材と固体潤滑膜との密
着力が弱かった。また膜自体は耐摩耗性を有しないの
で、長期間使用していると膜が摩耗し、部材表面から膜
が剥離してしまうという欠点があった。
However, in these conventional methods, the solid lubricating film and the member do not form a diffusion layer, and the adhesion between the member and the solid lubricating film is weak. Further, since the film itself does not have abrasion resistance, there has been a defect that the film is worn out after being used for a long time, and the film is peeled off from the member surface.

【0004】また、MoS2などの固体潤滑膜は一般に
密着力が弱くて吸湿性が高く、膜自身が水分を吸着して
粘性をもち、部材から剥離しやすかった。
In addition, a solid lubricating film such as MoS 2 generally has low adhesion and high hygroscopicity, and the film itself has a viscosity by adsorbing moisture and is easily peeled off from a member.

【0005】更に、高速回転するポンプの軸や軸受けな
どでは、特に高摩耗特性と高潤滑性(低摩擦係数)とが
必要で、特に水中、熱水中、高温で使用される部材の固
体潤滑膜にあっては、より高い密着力を必要とする。上
記従来の固体潤滑膜はこのような用途に使えず、高価な
セラミックス材や溶射材などを使用せざるを得なかっ
た。
Further, high-speed rotating pump shafts and bearings require particularly high wear characteristics and high lubricity (low friction coefficient). Particularly, solid lubrication of members used in water, hot water and at high temperatures is required. For films, higher adhesion is required. The above-mentioned conventional solid lubricating film cannot be used for such a purpose, and has to use expensive ceramic materials and thermal spray materials.

【0006】[0006]

【発明が解決しようとする課題】そこで本発明は、安価
な固体潤滑膜を用いても固体潤滑膜と部材との密着力が
低下せず、長期間にわたって低摩擦係数が得られ、しか
も高い耐摩耗性が保持できる固体潤滑膜付き部材を提供
することを目的とする。
SUMMARY OF THE INVENTION Accordingly, the present invention provides a low friction coefficient over a long period of time without lowering the adhesion between the solid lubricating film and the member even if an inexpensive solid lubricating film is used. An object of the present invention is to provide a member with a solid lubricating film that can maintain abrasion.

【0007】[0007]

【課題を解決するための手段】上記目的を解決するため
の本発明の固体潤滑膜付き部材は、膜面が結晶面(20
0)に配向したCrN膜を第1層に、固体潤滑膜を第2
層に備えたことを特徴とする。
According to the present invention, there is provided a member with a solid lubricating film, wherein the film surface has a crystal face (20).
0) as the first layer and the solid lubricating film as the second layer.
Characterized by being provided in a layer.

【0008】本発明の固体潤滑膜付き部材の第1層のC
rN膜は、窒素ガス圧を20〜50mTorr、バイア
ス電圧を0Vとするカソードアークイオンプレーティン
グ法によって形成されることが望ましい。
[0008] C of the first layer of the member with a solid lubricating film of the present invention
The rN film is preferably formed by a cathode arc ion plating method with a nitrogen gas pressure of 20 to 50 mTorr and a bias voltage of 0V.

【0009】また、第2層の固体潤滑膜は、イオンプレ
ーティング法、スパッタリング法、または、ショットピ
ーニング法によって形成された、MoS2膜、WS2膜、
NbS2膜、雲母膜、Sb23膜、BN膜、WSe膜、
MoSe2膜、Au膜、または、Ag膜であることが望
ましい。
The second layer of the solid lubricating film is formed of an MoS 2 film, a WS 2 film, or a MoS 2 film formed by an ion plating method, a sputtering method, or a shot peening method.
NbS 2 film, mica film, Sb 2 O 3 film, BN film, WSe film,
It is desirable that the film be a MoSe 2 film, an Au film, or an Ag film.

【0010】[0010]

【発明の実施の形態】上記構成による本発明の固体潤滑
膜付き部材は、第1層のCrN膜の表面に形成された4
〜7μm程度の微細な凹凸の上に第2層が形成されてい
るので、第1層と第2層との接触面積は大きく、また、
アンカー効果も生じている。このため固体潤滑膜が長期
にわたって使用でき、また、固体潤滑膜が摩耗しても凹
部に堆積している固体潤滑膜が相手材と接触して掘り起
こされ、表面に固体潤滑膜の粒子が染み出てくるので、
更に長期間潤滑性が保たれる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The member with a solid lubricating film according to the present invention having the above-described structure has a structure in which the surface of a first layer CrN film is formed.
Since the second layer is formed on fine irregularities of about 7 μm, the contact area between the first layer and the second layer is large.
An anchor effect also occurs. Therefore, the solid lubricating film can be used for a long period of time, and even if the solid lubricating film is worn, the solid lubricating film deposited in the concave portion comes into contact with the partner material and is dug up, so that particles of the solid lubricating film exude on the surface. Will come
Further, lubricity is maintained for a long time.

【0011】本発明の部材の基材には、従来から機械の
摺動摩耗部品や切削工具などに用いられているものが使
用できる。例えば、金型用のSKD鋼、SKH鋼、SK
S鋼、機械構造用のSC鋼などである。
As the base material of the member of the present invention, those conventionally used for sliding wear parts of machines and cutting tools can be used. For example, SKD steel, SKH steel, SK for molds
S steel, SC steel for machine structures, and the like.

【0012】第1層のCrN膜は、それ自身例えば摩擦
係数:0.3、ビッカス硬さ:1800HVと摩擦特
性、耐食性に優れた膜である。この膜はカソードアーク
式イオンプレーティング法で形成できる。
The CrN film of the first layer is a film having excellent friction characteristics and corrosion resistance, for example, having a friction coefficient of 0.3 and a Viccus hardness of 1800 HV. This film can be formed by a cathodic arc ion plating method.

【0013】このカソードアーク式イオンプレーティン
グ法は、蒸発源である金属ターゲットを陰極、チャンバ
ーを陽極としてこれらの間にアーク放電を起こさせ、金
属蒸気をイオン化し、更に反応ガスもイオンとの衝突に
よりイオン化し、部材表面に積層させて膜を形成すると
いうものである。例えばCrN膜を形成する場合は、金
属ターゲットをCr金属とし、チャンバー内に窒素原子
を含む反応ガスを導入すればよい。
In the cathode arc ion plating method, an arc discharge is generated between a metal target as an evaporation source as a cathode and a chamber as an anode to ionize metal vapor, and the reaction gas also collides with ions. To form a film by laminating on the surface of the member. For example, when a CrN film is formed, the metal target may be Cr metal, and a reaction gas containing nitrogen atoms may be introduced into the chamber.

【0014】カソードアーク式イオンプレーティング法
は、金属のイオン化率が高く、また、複数の蒸発源をチ
ャンバー内の上下左右に設置できるので、複合膜や、大
型形状や複雑形状の部材に均一な厚さの膜が形成でき
る。
In the cathodic arc ion plating method, the metal ionization rate is high, and a plurality of evaporation sources can be set up, down, left and right in the chamber. A film having a thickness can be formed.

【0015】CrN膜の形成条件で、窒素ガス圧20〜
50mTorr、バイアス電圧0Vにすると、CrNの
結晶配向面が(200)になる。この条件では、膜の成
長が柱状晶になり、柱が独立して立つているようにな
る。上方から観察すると高低差が5〜7μmの膜表面と
なり、ピンホール数も多くなる。
Under the conditions for forming the CrN film, a nitrogen gas pressure of 20 to
At 50 mTorr and a bias voltage of 0 V, the crystal orientation plane of CrN becomes (200). Under these conditions, the growth of the film becomes columnar, and the columns stand independently. When observed from above, the film surface has a height difference of 5 to 7 μm, and the number of pinholes increases.

【0016】柱状晶を十分形成するには、窒素ガス圧2
0〜50mTorrで、バイアス0Vとすればよい。バ
イアスを100Vや300Vなどで印加すると膜が緻密
に形成され、柱状晶が見られなくなり、膜表面も平滑に
なってピンホール数も減少してしまうのでよくない。
In order to sufficiently form columnar crystals, a nitrogen gas pressure of 2
The bias may be 0 V at 0 to 50 mTorr. When a bias is applied at 100 V, 300 V, or the like, the film is formed densely, columnar crystals are not observed, the surface of the film becomes smooth, and the number of pinholes is reduced.

【0017】本発明では、形成されたCrN膜表面に、
MoS2、Ag等から選ばれる固体潤滑膜を、イオンプ
レーティング、スパッタリング、またはショットピーニ
ング法で形成する。
In the present invention, on the surface of the formed CrN film,
A solid lubricating film selected from MoS 2 , Ag, or the like is formed by ion plating, sputtering, or shot peening.

【0018】スパッタリング法で固体潤滑膜を形成する
には、直流(DC)スパッタリングと、高周波(RF)
スパッタリング法が選択できる。放電ガスに、Ne、A
r、Kr等の不活性ガスが利用されるが、取り扱いが容
易であるArガスが最も一般的に適用される。放電ガス
圧を1〜4Paに設定することで、緻密で密着力が高い
固体潤滑膜が形成される。
In order to form a solid lubricating film by a sputtering method, direct current (DC) sputtering and high frequency (RF)
A sputtering method can be selected. Ne, A for discharge gas
An inert gas such as r or Kr is used, but Ar gas, which is easy to handle, is most commonly applied. By setting the discharge gas pressure to 1 to 4 Pa, a solid lubricating film having a dense and high adhesion is formed.

【0019】固体潤滑膜の膜厚は、材料によって異なる
が、例えばMoS2では0.1〜4μmがよい。0.1
μm未満では十分な潤滑性は得られず、4μmを超える
と膜のせん断が起こりやすくなり、膜中に多くのAr分
子を含有するので潤滑特性も劣化してくるからである。
The thickness of the solid lubricating film varies depending on the material. For example, MoS 2 is preferably 0.1 to 4 μm. 0.1
If the thickness is less than μm, sufficient lubricating properties cannot be obtained. If the thickness exceeds 4 μm, the film is likely to be sheared, and since the film contains many Ar molecules, the lubricating properties deteriorate.

【0020】ショットピーニング法で固体潤滑膜を形成
するには、第1層を形成した部材に、固体潤滑剤粉末と
合成樹脂粒子とを一定割合で混合した混合体を、乾式ブ
ラスト装置により加工物表面に噴射すればよい。固体潤
滑剤粉末は部材表面に衝突して付着し、樹脂粒子は表面
に衝突すると同時に反発して気体流とともに飛び去る。
このとき、樹脂粒子は表面に付着した固体潤滑粉体を表
面に打ち込み、また擦り込み、密着性の良い固体潤滑膜
が形成される。例えばMoS2の膜では、厚膜が形成さ
れずらいが、膜厚1μm程度で十分である。
In order to form a solid lubricating film by the shot peening method, a mixture obtained by mixing a solid lubricant powder and synthetic resin particles at a fixed ratio to a member on which the first layer is formed is processed by a dry blasting apparatus. What is necessary is just to spray on a surface. The solid lubricant powder collides with and adheres to the member surface, and the resin particles collide with the surface and repel and fly away with the gas flow.
At this time, the resin particles strike and rub the solid lubricating powder adhered to the surface to form a solid lubricating film having good adhesion. For example, with a MoS 2 film, it is difficult to form a thick film, but a film thickness of about 1 μm is sufficient.

【0021】[0021]

【実施例】実施例1 ・・・ 厚さ2mm、20mm角
の工具鋼(SKH51)を基材とし、第1層のCrN膜
形成にはマルチアーク社製カソードアーク式イオンプレ
ーティング装置を用いた。ターゲットとしてCr金属を
チャンバーに取り付け、基板をエタノールで超音波洗浄
した後、真空チャンバー内にセットし、チャンバー内を
2×10-5Torr以下まで排気した。
Example 1 A 2 mm thick, 20 mm square tool steel (SKH51) was used as a base material, and a CrN film as a first layer was formed using a cathode arc type ion plating apparatus manufactured by Multi-Arc. . After a Cr metal was attached to the chamber as a target, the substrate was ultrasonically cleaned with ethanol, then set in a vacuum chamber, and the chamber was evacuated to 2 × 10 −5 Torr or less.

【0022】基材に−500Vのバイアス電圧を印加
し、Cr金属のメタルボンバードで基板表面を洗浄し、
450℃まで加熱し、Crイオンの打ち込みを行った。
次に、チャンバー内に窒素ガスを20mTorrまで導
入し、バイアス電圧を0VとしてCrN膜を厚さ5.9
μm形成した。
A bias voltage of -500 V is applied to the substrate, and the surface of the substrate is washed with a metal bombard of Cr metal.
It was heated to 450 ° C. and implanted with Cr ions.
Next, nitrogen gas was introduced into the chamber to 20 mTorr, the bias voltage was set to 0 V, and the CrN film was formed to a thickness of 5.9.
μm was formed.

【0023】形成したCrN膜には、面積の約0.1%
がピンホールであることが電気化学的手法によって測定
された。膜の表面を光学顕微鏡で観察すると、全面に凹
凸が見られた。また、表面粗さはRmaxで6μm、R
zで3.5μmの凸凹が形成されていた。硬さはビッカ
ス硬度で1800HVであった。
The formed CrN film has an area of about 0.1%
Was determined to be a pinhole by an electrochemical technique. When the surface of the film was observed with an optical microscope, irregularities were observed on the entire surface. The surface roughness is 6 μm in Rmax,
3.5 μm unevenness was formed in z. The hardness was 1800 HV in Viccus hardness.

【0024】続いて、RFマグネトロンスパッタリング
装置(日電アネルバ(株)社製SPF530H)を用い
て第2層を形成した。所定位置に直径5インチの円盤型
二硫化モリブデン(MoS2)ターゲットをセットし、
真空を5×10-4 Paまで引き、Arガスを0.4P
a導入した。放電電力として300W(ターゲットに対
し、2.37W/cm2)投入し、MoS2をArガス雰
囲気で厚さ1.2μm形成した。
Subsequently, a second layer was formed using an RF magnetron sputtering apparatus (SPF530H manufactured by Nidec Anelva Co., Ltd.). A disk-shaped molybdenum disulfide (MoS 2 ) target with a diameter of 5 inches is set at a predetermined position,
Vacuum is pulled down to 5 × 10 -4 Pa and Ar gas is 0.4 P
a was introduced. A discharge power of 300 W (2.37 W / cm 2 with respect to the target) was applied, and MoS 2 was formed to a thickness of 1.2 μm in an Ar gas atmosphere.

【0025】得られた固体潤滑膜付き部材を、直径6m
m、SUS440C製の玉を用いて、荷重10N、周速
度0.5m/sec、直径12mmでボールオンディス
ク試験によって評価した。耐久摩擦回数は、MoS2
無くなる回数とした。また、密着力は、膜にカッターナ
イフを用いて間隔約2mmの碁盤の目状に切り込みを入
れ、粘着テープを貼り、これを一気にひき剥がすことで
評価した。密着力が弱いと粘着テープによって膜が剥離
する。
The obtained member with a solid lubricating film is 6 m in diameter.
m, using a ball made of SUS440C, the load was 10 N, the peripheral speed was 0.5 m / sec, and the diameter was 12 mm. The number of durable rubs was the number of times that MoS 2 disappeared. The adhesion was evaluated by making a cut in a grid pattern with an interval of about 2 mm on the film using a cutter knife, applying an adhesive tape, and peeling it off at once. If the adhesion is weak, the film is peeled off by the adhesive tape.

【0026】比較試料として、ピンホール、凹みをでき
るだけ形成しない電子ビーム式イオンプレーティング装
置を用いて作製した、ビッカス硬度900HVのCrN
膜上に、MoS2膜をスパッタリングしたものについて
も同様の評価をした。
As a comparative sample, a CrN having a Viccus hardness of 900 HV was manufactured using an electron beam ion plating apparatus in which pinholes and depressions were not formed as much as possible.
The same evaluation was performed for a film obtained by sputtering a MoS 2 film on the film.

【0027】本実施例で得られた試料のボールオンデイ
スク試験での耐久摩擦回数は900×102回で、摩擦
係数は0.1であった。密着力試験では、剥離はみられ
なかった。
In the ball-on-disk test of the sample obtained in this example, the number of durable friction was 900 × 10 2 and the friction coefficient was 0.1. No peeling was observed in the adhesion test.

【0028】一方、比較試料では、ボールオンデイスク
試験による耐久摩擦回数は270×102回、摩擦係数
は0.15で、密着力試験では、約50%が剥離した。
On the other hand, in the comparative sample, the number of times of endurance friction in the ball-on-disk test was 270 × 10 2 times, the coefficient of friction was 0.15, and about 50% peeled off in the adhesion test.

【0029】実施例2 ・・・ 厚さ2mm、20mm
角のSUS304を基材とし、マルチアーク社製カソー
ドアーク式イオンプレーティング装置を用いて第1層の
CrN膜を形成した。Crターゲットをチャンバーに取
り付け、基板をエタノールで超音波洗浄した後、真空チ
ャンバー内にセットして2×10-5Torr以下まで排
気した。基板に−500Vのバイアス電圧を印加し、C
rイオンのメタルボンバードで基板表面を洗浄し、45
0℃に加熱し、Crイオンの打ち込みを行った。次に、
2ガスを50mTorrまで導入し、バイアス電圧0
VでCrN膜を23μm形成した。
Example 2 thickness 2 mm, 20 mm
Using the corner SUS304 as a base material, a CrN film as a first layer was formed using a cathode arc type ion plating apparatus manufactured by Multi-Arc. After attaching a Cr target to the chamber and ultrasonic cleaning the substrate with ethanol, the substrate was set in a vacuum chamber and evacuated to 2 × 10 −5 Torr or less. A bias voltage of -500 V is applied to the substrate, and C
Clean the substrate surface with r-ion metal bombardment,
It was heated to 0 ° C. and implanted with Cr ions. next,
N 2 gas was introduced up to 50 mTorr and the bias voltage was 0
V formed a CrN film of 23 μm.

【0030】膜の表面を観察すると全面に5〜7μmの
凸凹が形成されていた。この形成したCrN膜の表面を
観察すると全面に凹凸が見られ、表面粗さはRmaxで
6μm、Rzで3.5μmの凸凹が形成されていた。こ
の膜は、電気化学的手法により、面積の約0.1%がピ
ンホールとして測定された。
When the surface of the film was observed, irregularities of 5 to 7 μm were formed on the entire surface. When the surface of the formed CrN film was observed, irregularities were observed on the entire surface, and the surface roughness was 6 μm in Rmax and 3.5 μm in Rz. About 0.1% of the area of this film was measured as a pinhole by an electrochemical method.

【0031】この試料にMoS2の第2層を形成した。
MoS2粉末と740g、50μmの樹脂ビーズを32
0gを混合し、噴射エアーガンと試料との距離を100
mm、噴射エアー圧を3kgf/cm2として混合粉を
CrN膜上に吹き付け、膜厚1μmのMoS2膜を形成
した。
A second layer of MoS 2 was formed on this sample.
MoS 2 powder and 740 g, 50 μm resin beads 32
0 g, and the distance between the injection air gun and the sample is 100
The mixed powder was sprayed onto the CrN film at a pressure of 3 kgf / cm 2 with a jet air pressure of 3 mm to form a 1 μm-thick MoS 2 film.

【0032】実施例1と同様の密着力試験では、剥離は
みられなかった。また、フアレックス試験では、開始か
ら2000秒経過しても殆ど同じ値で、固体潤滑膜の剥
離もみられなかった。
In the same adhesion test as in Example 1, no peeling was observed. Further, in the flex test, the values were almost the same even after lapse of 2000 seconds from the start, and no peeling of the solid lubricating film was observed.

【0033】比較として、同じ基材にCrN膜を形成せ
ずに同じ方法で膜厚1μmのMoS 2膜を形成した試料
についてフアレックス試験を行ったところ、MoS2
粉状に飛び散り、すぐに基材が露出し、800秒から徐
々にトルクが上昇してしまった。
As a comparison, a CrN film was formed on the same substrate.
1 μm thick MoS TwoSample with film formed
Was subjected to a flex test and found that MoSTwoBut
Splatters in a powder form and immediately exposes the substrate, slowly from 800 seconds
Each time the torque has risen.

【0034】実施例3 ・・・ 実施例1と同様にCr
N膜を23μm形成し、その上に、神港精器製ピアス式
イオンプレーティング装置を用いて、第2層のAg膜を
形成した。装置に銅−モリブデン製ルツボに台形型のA
gを入れ、電子ビーム出力を10kW、40mV、イオ
ン化電流を50mV、20A、バイアス電圧を−200
Vとして30秒成膜し、Ag膜厚を0.5μmとした。
Example 3 Cr as in Example 1
An N film was formed to a thickness of 23 μm, and a second Ag film was formed thereon using a piercing ion plating apparatus manufactured by Shinko Seiki. The equipment is a copper-molybdenum crucible and a trapezoidal A
g, the electron beam output is 10 kW, 40 mV, the ionization current is 50 mV, 20 A, and the bias voltage is -200.
V was deposited for 30 seconds, and the Ag film thickness was 0.5 μm.

【0035】耐久摩耗回数を、ボールオンデイスク試験
(荷重2N)でAg膜が無くなる回数で評価したとこ
ろ、450×102回、摩擦係数は0.45であった。
また、実施例1と同様の密着力試験による剥離はみられ
なかった。
The number of times of endurance wear was evaluated by the number of times that the Ag film disappeared by a ball-on-disk test (load 2N), and it was 450 × 10 2 times and the friction coefficient was 0.45.
Further, no peeling was observed in the same adhesion test as in Example 1.

【0036】比較として電子ビーム式イオンプレーティ
ング装置のCrN膜に、同様の方法で0.5μmのAg
膜を形成した試料では、耐久摩耗回数は170×102
回、摩擦係数は0.5であった。実施例1と同様の密着
力試験では、30%が剥離した。
For comparison, a 0.5 μm Ag was applied to the CrN film of the electron beam ion plating apparatus in the same manner.
In the sample on which the film was formed, the number of durable wear was 170 × 10 2
Twice, the coefficient of friction was 0.5. In the adhesion test similar to that in Example 1, 30% was peeled off.

【0037】実施例4 ・・・ ガスタービンに使用さ
れているグローブ弁は、弁箱にSUS316、グローブ
弁体の摺動部分には、ステライトが盛金されている。使
用温度は350℃で、流体の流れの変化が大きく、摩耗
が激しい。その弁箱内部に、(200)配向したCrN
膜を実施例1と同様にして10μm形成し、実施例2に
あるショットピーニング法でMoS2を1μm形成し
た。この部品をポンプに組み上げ、加速試験として、3
50℃で軸速度7m/secで上下運動させた。その結
果、8時間の加速試験後でも膜の損傷はほとんど観察さ
れなかった。
Embodiment 4 The globe valve used in the gas turbine has SUS316 on the valve box and stellite on the sliding part of the globe valve body. The operating temperature is 350 ° C., the flow of the fluid changes largely, and the wear is severe. Inside the valve box, (200) oriented CrN
A film was formed to 10 μm in the same manner as in Example 1, and MoS 2 was formed to 1 μm by the shot peening method in Example 2. Assemble these parts into a pump and perform 3
It was moved up and down at 50 ° C. at an axial speed of 7 m / sec. As a result, almost no damage to the film was observed even after the 8-hour accelerated test.

【0038】同様に、MoS2を形成していないCrN
膜のみの部品について同様の評価をしたところ、試験後
4時間で膜に摺動傷が発生した。
Similarly, CrN not forming MoS 2
When the same evaluation was performed for the component having only the film, sliding scratches occurred in the film 4 hours after the test.

【0039】[0039]

【発明の効果】本発明により、安価な固体潤滑膜を用い
ても、固体潤滑膜と部材との密着力が低下せず、長期間
にわたって低摩擦係数が得られ、しかも高い耐摩耗性が
保持できる固体潤滑膜付き部材を提供できた。
According to the present invention, even when an inexpensive solid lubricating film is used, the adhesion between the solid lubricating film and the member does not decrease, a low friction coefficient can be obtained over a long period, and high wear resistance is maintained. A member with a solid lubricating film that can be provided.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) F16C 33/12 F16C 33/12 Z 33/66 33/66 A Fターム(参考) 3J011 JA02 LA04 MA02 PA10 QA04 RA10 SE04 SE06 SE07 3J101 DA05 EA02 EA53 EA55 EA78 FA32 4K029 AA02 BA04 BA05 BA21 BA43 BA51 BA58 BA59 BB02 BB07 BC02 BD04 BD05 CA03 CA05 CA13 DC05 DC12 DC39 DD06 FA04 4K044 AA02 BA18 BA19 BB03 BC01 CA13 CA23 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI theme coat ゛ (reference) F16C 33/12 F16C 33/12 Z 33/66 33/66 A F term (reference) 3J011 JA02 LA04 MA02 PA10 QA04 RA10 SE04 SE06 SE07 3J101 DA05 EA02 EA53 EA55 EA78 FA32 4K029 AA02 BA04 BA05 BA21 BA43 BA51 BA58 BA59 BB02 BB07 BC02 BD04 BD05 CA03 CA05 CA13 DC05 DC12 DC39 DD06 FA04 4K044 AA02 BA18 BA19 BB03 BC01 CA13 CA23

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 膜面が結晶面(200)に配向したCr
N膜を第1層に、固体潤滑膜を第2層に備えた固体潤滑
膜付き部材。
1. Cr having a film plane oriented to a crystal plane (200)
A member with a solid lubricating film comprising an N film as a first layer and a solid lubricating film as a second layer.
【請求項2】 第1層のCrN膜は、窒素ガス圧を20
〜50mTorr、バイアス電圧を0Vとするカソード
アークイオンプレーティング法によって形成された請求
項1に記載の固体潤滑膜付き部材。
2. The first CrN film has a nitrogen gas pressure of 20.
The member with a solid lubricating film according to claim 1, which is formed by a cathode arc ion plating method in which the bias voltage is 0 V and a pressure of 50 mTorr.
【請求項3】 第2層の固体潤滑膜は、イオンプレーテ
ィング法、スパッタリング法、または、ショットピーニ
ング法によって形成された請求項1または請求項2に記
載の固体潤滑膜付き部材。
3. The member with a solid lubricating film according to claim 1, wherein the second layer of the solid lubricating film is formed by an ion plating method, a sputtering method, or a shot peening method.
【請求項4】 第2層の固体潤滑膜は、MoS2膜、W
2膜、NbS2膜、雲母膜、Sb23膜、BN膜、WS
e膜、MoSe2膜、Au膜、または、Ag膜である請
求項1〜請求項3のいずれかに記載の固体潤滑膜付き部
材。
4. The solid lubricant film of the second layer is a MoS 2 film, W
S 2 film, NbS 2 film, mica film, Sb 2 O 3 film, BN film, WS
e film, MoSe 2 film, Au film, or a solid lubricating film with member according to any one of claims 1 to 3 is a Ag film.
JP11038007A 1999-02-17 1999-02-17 Member with solid lubricating film Pending JP2000239829A (en)

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