JP2000231180A - Photographic sensitive material processor - Google Patents

Abstract

PROBLEM TO BE SOLVED: To improve the stirring efficiency of a processing liquid by injecting the processing liquid in a direction perpendicular to a photosensitive material transportation direction toward the emulsion surface side and rear surface side of the photographic sensitive material respectively from a processing liquid injection path. SOLUTION: The low part of a development processing rack 220 is provided with an inflow port 237 and the developer delivered by a pump 405 flows into an inflow port 237. The developer flowing into the inflow port 237 is laterally branched by a flow passage 238 which is disposed at a lower part of the development processing rach 220 and is then further branched in two within a flow passage which is disposed at a lower part of the side wall and extends in a direction orthogonal with the flow passage 23. The branched developers respectively ascend perpendicularly in the flow passages in the corresponding positions on a descending flow passage and ascend perpendicularly in the flow passages in the corresponding positions on an ascending flow passage 237 side and are respectively injected into the flow passages 226 and 227 via injection grooves. In such a case, the developers stored in the flow passages 226 and 227 are put into a turbulent state and the injected developers advance along the emulsion surface of a film F.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photographic material processing apparatus for sequentially transporting a photographic material to a plurality of processing racks and supplying a processing solution to the processing rack to process the exposed photographic material. More particularly, the present invention relates to a photographic light-sensitive material processing apparatus suitable for a slit developing system having a cross section in which a conveying path of a photographic light-sensitive material in a processing rack is narrow in a thickness direction of the photographic light-sensitive material and has a wide slit shape in a width direction.

[0002]

2. Description of the Related Art A photographic light-sensitive material processing apparatus basically includes a developing processing tank for storing a developing solution, a bleaching processing tank for storing a bleaching solution, a fixing processing tank for storing a fixing solution, and a stabilizing solution for storing a stabilizing solution. Chemical treatment tank.

At the time of processing, a photographic photosensitive material (hereinafter referred to as a "photosensitive material") such as an exposed film or photographic paper is successively guided into each of the processing tanks, and each of the processing liquids contained in each processing tank is processed. Is conveyed to make it visible.

In the above-mentioned processing, in order to obtain the desired photographic performance possessed by the photosensitive material, it is necessary to maintain each processing solution within a predetermined temperature range. It is necessary to constantly renew the processing solution that comes into contact with the emulsion surface of the light-sensitive material, in other words, it is necessary to devise so that the tired processing solution does not stay in the same place forever.

[0005] Therefore, in a conventional automatic developing apparatus, a processing solution whose temperature has been adjusted is circulated and the processing solution in a processing tank is appropriately stirred.

On the other hand, there has been a remarkable spread of automatic developing apparatuses for minilabs which have responded to the demand for downsizing of photosensitive material processing apparatuses.

[0007] To meet the demand for space saving, processing racks of the slit developing type have been proposed. In the slit developing system, since the processing rack has a narrow cross section in the conveying direction of the photosensitive material, it is possible to obtain a space-saving automatic developing apparatus having a short overall length.

Further, since the volume of the processing space in the processing rack is small, the processing liquid amount is 1/1 compared to the conventional automatic developing apparatus.
It is as small as 0 or less, and the exchange rate of the processing solution by replenishment is high.

Further, in the slit developing method, the liquid surface when the photosensitive material enters and exits the processing liquid has a narrow slit shape, so that the area where the processing liquid comes into contact with air is small, and oxidation and the like occur. The deterioration of the processing solution due to the above can be minimized.

A processing rack and tank assembly for slit processing which can be expected to be further reduced in size and space by applying to such a photosensitive material processing apparatus is disclosed in Japanese Patent No.
No. 641,555.

This configuration is roughly as follows.

That is, when a processing rack is inserted into a processing tank formed in a rectangular parallelepiped box shape, a slit-shaped film formed by the inner wall of the processing tank and the outer wall of the processing rack, and a U-shaped film as a whole. And a processing liquid supply path connected to a space in the processing rack. During processing, the emulsion surface of the film moving through a number of openings provided on the outer wall of the processing rack. The processing liquid is discharged in a jet state from a direction perpendicular to the processing liquid.

It is stated that the opening functions to improve the stirring of the processing solution adjacent to the emulsion side of the film portion.

[0014]

However, in the above configuration, the processing liquid is jetted from the direction perpendicular to the film emulsion surface, so that the processing rack must be thickened. Considering the case where a number of such processing racks are arranged to form a photosensitive material processing apparatus, it is disadvantageous in shortening the overall length of the apparatus, and the degree increases as the number of tanks increases.

In addition, since the large number of openings are provided on the arc-shaped outer wall and have different distances from the emulsion surface of the moving film, it is difficult to make the stirring state uniform in the film width direction. Seem.

Also, during development, it is important to rapidly update the processing solution which comes into contact with the emulsion surface, so that a large number of injection ports are required. However, there is a problem that a considerable amount of the injection liquid is required.

Further, since the processing liquid is jetted from one direction and perpendicular to the moving film emulsion surface, the behavior of the film during transport becomes unstable or the film is shifted in the thickness direction. This may cause unstable behavior of the film.

In order to solve the above-mentioned problem, the inventor of the present invention has to provide a processing liquid injection port in the processing rack on the side facing the emulsion surface of the photosensitive material, instead of providing an end face in the width direction of the transport path of the processing rack. It has been found that the provision on the side can reduce the thickness of the processing rack.

However, even if the processing liquid is jetted from the side parallel to the emulsion surface, the jetted processing liquid flows along the slit-shaped photosensitive material transport path as a whole, and the photosensitive liquid held by the short reader is When the material is inserted into the transport path, the top of the short reader or the rear end of the photosensitive material is not completely regulated in the thickness direction position in the transport path,
In the transport path, the photosensitive material may be deviated in the thickness direction, so that a large amount of the processing liquid flows in a wide flow path of the processing liquid, and a small amount of the processing liquid flows in a narrow flow path of the processing liquid.

Since the flow rate of the processing solution on the emulsion surface side greatly changes due to a slight difference in the position in the thickness direction between the head of the short reader and the rear end of the photosensitive material, the finishing of the photosensitive material is performed every time the photosensitive material is processed. Large differences occur.

In particular, the rear end of the light-sensitive material tends to be deviated to one side, and the processing solution may not flow to the emulsion surface if the emulsion surface adheres to the wall surface of the transport path.

Further, when the processing liquid is injected within the range of the width of the gap on both sides of the photosensitive material transport path, the worst case occurs because the photosensitive material can move within the range of the width of the gap. In this case, the whole amount of the jetted processing solution flows to the emulsion side or the back side of the light-sensitive material, resulting in a remarkable difference in processability.

The present invention has been made in view of the above circumstances, and has as its object the advantage of reducing the overall length of the apparatus as much as possible, especially when a slit processing method is adopted. Another object of the present invention is to provide an apparatus for processing a photographic light-sensitive material having a high processing solution stirring efficiency.

[0024]

The above object of the present invention can be achieved by the following constitutions.

(1) A photographic light-sensitive material having a slit-shaped cross section, which also serves as a processing chamber for the photographic light-sensitive material and a circulation path for the processing liquid, and has a gap on both sides in the width direction for holding the ends of the short reader. A transport path, a processing liquid supply path further provided outside the gap between the photographic photosensitive material transport paths, and a plurality of processing liquid supply paths provided at arbitrary intervals on the photographic photosensitive material transport path, and from the processing liquid supply path. A processing solution injection path for injecting the processing liquid toward the photographic light-sensitive material moving in the photographic light-sensitive material transport path, wherein a plurality of processing racks are arranged in series. The processing liquid ejection paths are provided on both outer sides of the width of the gap, and are respectively directed from the processing liquid injection paths toward the emulsion side and the back side of the photographic light-sensitive material, and in the photographic light-sensitive material transport direction. Almost Photographic photosensitive material processing apparatus characterized by injecting a treatment solution from the corner direction.

(2) A photographic light-sensitive material having a slit-shaped cross section, which also serves as a processing chamber for the photographic light-sensitive material and a circulation path for the processing solution, and has a gap on both sides in the width direction for holding the ends of the short reader. A transport path, a processing liquid supply path further provided outside the gap between the photographic photosensitive material transport paths, and a plurality of processing liquid supply paths provided at arbitrary intervals on the photographic photosensitive material transport path, and from the processing liquid supply path. A processing solution injection path for injecting the processing liquid toward the photographic light-sensitive material moving in the photographic light-sensitive material transport path, wherein a plurality of processing racks are arranged in series. Wherein the processing liquid injection paths provided at a plurality of locations on both sides in the width direction of the photographic photosensitive material transport path have processing racks that are arranged at staggered positions on both sides in the width direction. You Photographic photosensitive material processing apparatus.

(3) The photographic light-sensitive material processing apparatus according to (1) or (2), wherein the slit-shaped cross section of the photographic light-sensitive material conveying path has a shape in which two arcs face each other except for a gap.

(4) The processing rack can be attached to and detached from the photographic material processing apparatus, and when the processing rack is attached to and detached from the photographic material processing apparatus, the photographic material of the processing rack is removed. The photographic light-sensitive material processing apparatus according to any one of (1) to (3), wherein a release port for releasing the processing liquid stored in the transport path is provided at a bottom of the processing rack.

[0029]

DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described with reference to the drawings.

FIG. 1 is a schematic diagram simply showing the internal structure of a photographic light-sensitive material processing apparatus for color negative film (hereinafter referred to as an automatic developing apparatus), and FIG. 2 shows a locked state between a short leader and the color negative film. It is a schematic diagram.

In FIG. 1, an automatic developing apparatus 1 is roughly divided into a film mounting section 10 for mounting an exposed color negative film (hereinafter, simply referred to as a film) while being stored in a patrone, and a film processing section (hereinafter, simply referred to as a processing section). 20) and a drying unit 30.

The processing section 20 comprises a color developing tank (hereinafter simply referred to as a developing tank) 22, a bleaching tank 24, a fixing tank 26, and a stabilizing tank 28.

The processing tanks 22 to 28 are formed by a bottom wall and front, rear, left and right walls (partition plates) perpendicular to the bottom wall, and are formed in a rectangular parallelepiped box shape having an open upper part. .

In FIG. 1, reference numbers are given to the bottom wall 221 of the developing tank 22 and the (left and right) partition plates 222.
For other treatment tanks, reference numerals 241, 2
61 and 281 are attached.

In the processing tanks 22 to 28, a developing processing rack 220, a bleaching processing rack 240, a fixing processing rack 260, and a stabilizing processing rack 280 configured to perform a slit processing are detachably mounted.

Further, when each of the processing racks is mounted, a distance between an outer wall surface of the processing rack and a partition plate and a bottom wall (indicating an inner surface facing the processing rack) forming the processing tank is set.
mm or less.

In this embodiment, the processing rack is mounted on the processing tank. However, according to the present invention, since the processing rack has the function of a conventional processing tank, the processing rack is eliminated. It may be only.

It is sufficient that there is only a simple mounting section for mounting the processing rack.

The details of the structure of the processing rack will be described later.

P1 and P2 are toothed pulleys (hereinafter, simply referred to as pulleys) arranged vertically facing each other in the processing rack, and an endless timing belt B (hereinafter, simply referred to as belt) is interposed between the pulleys. Is suspended, and the teeth of the pulley and the teeth of the inner peripheral surface of the belt are engaged (engaged) to drive the belt B.

In this embodiment, the endless timing belt B is provided only on one side of the short reader S. However, it may be provided on both sides. Conversely, the short reader S and the endless timing belt B are provided on both sides of the endless timing belt B. A conveying path for the photosensitive material may be provided.

A plurality of protrusions T are formed on the outer peripheral surface of the belt B.
(See FIG. 4). As shown in FIG. 2, the small holes H and the protrusions T arranged in a row at a narrow interval on one side in the width direction of the short leader S engage with each other, and the short leader is attached with a splice tape. A transport force is applied to the film F connected to S.

The processing of the film using the automatic developing apparatus having the above-described schematic structure is performed as follows.

A processing solution such as a color developing solution is stored in correspondence with the processing rack, and the temperature of each processing solution is within a temperature range suitable for processing. When the short leader S is attached via a slice tape and the short leader S is inserted into a predetermined portion (described later) of the mounting portion 10, the projections T on the belt B and the small holes H on the short reader S are engaged, and F is conveyed downward.

The film F is conveyed upward at the bottom of the processing rack 220 after being conveyed at the bottom of the processing rack 220, and is sequentially guided to the next processing rack via a crossover between adjacent processing racks to perform the same operation. repeat.

For the film F conveyed through the processing liquid in each processing rack by the short reader S, the circulating processing liquid is applied from both sides (both sides) of the film F as described later. Spraying is directed toward the emulsion side and back side of film F to facilitate processing.

The film F discharged from the stable processing rack 280 is dried in the drying section 30 and discharged to the outside of the photosensitive material processing apparatus or stored and held in a suitable storage section.

FIG. 3 is a front view of a processing rack having a replenishment system and a circulation system including temperature control, FIG. 4 is a side view of the processing rack,
FIG. 5 is a plan sectional view of the processing rack taken along the line AA of FIG. 4, and these figures are appropriately simplified for explanation.

Since the processing racks are basically all the same in structure, the developing processing rack 220 will be described as a reference example.

In the drawings, the same means as the above-mentioned means (members) are denoted by the same reference symbols.

In FIGS. 3 and 4, the developing rack 220 is formed of a rectangular housing, and has a power transmission system D for driving the belt B at the upper part.

The power transmission system D includes a driving sprocket 5
0, a pair of helical gears 51 and 52 provided coaxially with the driving sprocket 50 and located on the opposite side of the development processing rack 220, a pulley P1, a belt B, a pulley P2, and the like.

The turn roller 500 is connected to the developing rack 2
It is rotatably fitted on a shaft J1 that supports a pulley P1 provided on the upper part of the pulley P20.

The turn roller 501 is connected to a shaft J2 that supports a pulley P2 provided below the processing rack 220.
It is fitted so that it can rotate.

The plurality of rollers between the turn roller 500 and the sprocket 50 function when the film with the short leader is introduced into or discharged from the processing rack.

As is apparent from FIG. 5, the development processing rack 2
Reference numeral 20 includes left and right side portions (hereinafter, referred to as left and right side walls) 223 and 224, and a main portion (hereinafter, referred to as a central body) 225 sandwiched between the left and right side walls.

The central body 225 is formed by integrating three divided blocks with the left and right side walls 223 and 224 using screws or the like.

The central body 225 has a slit-like transport path (hereinafter referred to as a path) 226 between the three blocks.
And 227 are formed to allow the U-turn conveyance (movement) of the film F.

That is, the passage 226 is in the film insertion port 2
28 is a descending path of the film F inserted from the processing roller 28, and the path 227 is a turn roller 5 disposed at the lower part of the processing rack.
No. 01 is connected to the descending passage 226 through the passage including the film discharge port 229, and is an ascending passage for the film F.

The passages 226 and 227 are processing chambers for developing the film F. In the processing, a color developing solution (hereinafter simply referred to as a developing solution) filled in the slit is used as described later. This is performed by circulating the developer.

The cross-sectional shape of the passage generally includes an arc portion 230 in which two arcs are opposed to each other, and a gap portion 231 formed of a narrow parallel surface connected to the arcs approaching toward both ends. And the whole is in a slit shape.

The width of the arc portion 230 is large enough to move the film F, and the gap portions 23 on both sides including the arc portion are formed.
1 forms a passage having a width large enough to move both ends in the width direction of the short reader S to which the film F is connected.

In other words, it can be said that the gap 231 has a function as a guide for restricting the movement of the short leader S.

The curvature of the arc portion 230 is determined by the film F
This configuration can prevent the moving film F from contacting the wall surface forming the passage as much as possible, and the amount of the processing liquid accommodated in the slit-shaped passage of the film F can be reduced. Is effective in minimizing.

In FIG. 5, a passage 236 through which the belt B moves is formed in both the descending passage 226 and the ascending passage 227, and are connected via a passage including a pulley P 2 disposed below the developing rack 220. (Belt B,
Pulley P2 is shown in FIG. 4).

The processing in such a configuration is the same as the conventional processing.
Compared to a configuration in which a film is immersed in a large volume of processing solution, the processing is performed within an extremely narrow opening (volume). This type (method) is called a slit development processing or a slit development processing method.

The left and right measurement walls 223 and 224 have a descending passage 2
Flow paths 232 and 233 are provided on the 26 side, and flow paths 234 and 235 are provided on the ascending path 227 side.

A concave portion is provided at a portion of the boundary surface between the left and right side walls 223, 224 and the central body 225 facing the flow paths 232 to 235, and the concave portion is formed by extending the short reader S (or film F) surface. Shield plates 252, 253, 254 and 255 having a pair of small holes h (see FIG. 5) having substantially the same cross-sectional area are embedded in a positional relationship sandwiching the film moving surface.

Dashed lines 600 and 603 connecting the descending passage 226 and the flow passages 232 and 233 via the small holes h of the pair of shielding plates 252 and 253 are flow passages toward the film F moving in the descending passage 226. A groove-like ejection passage (hereinafter, referred to as an ejection groove) formed in the central body 25 is shown so as to be able to eject a developer circulating in the insides 232 and 233 (the passage is a part of the circulation passage).

On the other hand, the ascending passage 227 and the passages 234 and 23
Dashed lines 605 and 607 connecting the line 5 to the film F moving in the rising passage 227 circulate in the flow passages 234 and 235 (the flow passage is a part of the circulation passage) so that the developer can be ejected. 2 shows an injection groove formed in the central body 25.

The specific shape of the injection groove will be described later with reference to FIG.

Injection grooves 600, 603, 605, 607
Are provided at a plurality of positions in the vertical direction along the path of the film F, and the ejection grooves 600 and 603 and 605 and 607 corresponding to both side parts of the film F are alternately shifted in the vertical direction of each path. And are arranged in a staggered pattern.

The position of the injection groove is determined by the gap 231.
In contrast, a further outer position (above and below the gap in FIG. 5. Small holes h are also provided at the same position.

The reason for this is that when the developing solution is sprayed from the inner region of the gap 231, the developing solution does not flow well on both sides of the film, and a difference in processability is likely to occur.

That is, in the embodiment, almost the same amount of the developing solution can be easily supplied with the film interposed therebetween, and the above fear can be eliminated.

Further, each of the injection grooves 600 to 607
Are provided in pairs at approximately the same height with respect to the virtual film moving surface, and are provided so as to be able to spray substantially equal amounts of the developing solution toward the front and back surfaces of the moving film F. ing.

If the cross-sectional shapes of the descending passage 226 and the ascending passage 227 are asymmetrical with respect to the center of the film F conveyance, the cross-sectional area of the two injection grooves is determined by the arc and the film F
And the ratio of the area enclosed by.

This is because even when the short leader S or the film F passes through the descending passage 226 and the ascending passage 227, the short leader S or the film F
Since the processing liquid flows according to the cross-sectional area of the processing liquid passage divided by the above, there is no generation of a force for moving the short reader S or the film F in the thickness direction of the film F,
This is because the short reader S and the film F can be stably transported.

The film F and the injection grooves 600, 603, 60
The relationship with 5, 607 is shown in FIG.

In FIG. 3, the injection grooves are indicated by small holes.

The height level of the small holes formed on the shielding plates 252 to 255 is substantially the same as that of the corresponding injection grooves 600 to 607.

The injection grooves 600 to 607 extend substantially perpendicularly from both sides of the film F, and
The developer is sprayed almost parallel to the surface, and as a result, the developer in contact with the film surface is related so as to be updated as much as possible.

However, the developing solution to be jetted may not be parallel to the surface of the film F but may advance at a certain angle, and is not perpendicular to the side of the film F. The degree of freedom of design is wide, for example, it may be configured to proceed with an inclination in the up and down direction, and furthermore, it may be a combination of the two.

At the bottom of the developing rack 220, an inflow port 2 is provided.
The developer 37 is provided by the pump 405 (see FIG. 3) and flows into the inlet 237.

The developer flowing into the inflow port 237 is branched right and left by a flow path 238 (perforated in a thick bottom wall) provided at the bottom of the development processing rack 220, and then branched to the right and left. Provided at the bottom of the flow path 2
In a flow path extending in a direction orthogonal to 38 (see FIG. 3, a direction perpendicular to the paper surface in FIG. 4), the flow path is further branched into two,
Each of them rises vertically in the flow passages 232 and 233 at a corresponding position on the descending passage 226 side, and rises vertically in the flow passages 234 and 235 at a corresponding position on the ascending passage 227 side. The fuel is injected into the passages 226 and 227 through the respective members.

In the above-described structure, the developer stored in the passages 226 and 227 is caused to be in a turbulent state, and the jetted developer advances along the emulsion surface of the film F, so that the supplied developer is Since it is possible to replace the developing solution that has been fatigued and stays on the emulsion surface of the film F, the processing can be efficiently promoted.

A developer discharge port 239 for circulation is provided on the front wall of the development processing rack 220 and, as shown in FIG.
It is located immediately below the pulley P1 in height, and is provided at a position below the liquid level of the developer stored in the development processing rack 220.

The developer discharged from the discharge port 239 passes through a filter tank and a pump 405, and is supplied to a heating section K indicated by a dashed line.
Is heated (heated) by a heating means 415 that is ON / OFF controlled via a computer based on the temperature detection information of the temperature sensor 417, and the temperature is adjusted to a temperature suitable for processing. 237 for circulation.

From the above, the pump 405, the inlet 237,
Channels 232 to 235, injection grooves 600 to 607, passage 22
6,227, outlet 239, tank 400, pump 40
It is understood that a circulation path 5 for the developer is formed.

A small hole 700 is provided at a position near the film passage on the front and rear walls of the development processing rack 220, and the developer retained near the turn roller 500 is discharged to the development processing tank 22 (see FIG. 1).

The small holes 700 are located below the liquid surface, and one small hole is provided on the descending passage side and two small holes are provided on the ascending passage side, and serve as a liquid escape port for preventing the stagnation of the developing solution. .

That is, especially when the short leader S reaches the upper position of the ascending passage, the short leader S covers almost the entire width of the passage 227, so that there is no place for the exhausted developer used for processing. This is to avoid the danger that the film easily stays near the turn roller 500, and consequently, there is a difference in processability between the leading end and the trailing end of the film.

Incidentally, the configuration relating to the development processing is as follows.

Processing rack dimensions: 5 cm long × 9 cm wide × 65 cm high One orifice setting position on one passage (downward passage or ascending passage): 6 slit widths: 50 mm (excluding the belt transport unit) Gap 231 Width: 5 mm each on both sides Maximum thickness of slit (in the direction orthogonal to the slit width): 8 mm Minimum thickness of slit: 2 mm Radius of curvature of circular arc: 80 mm Total amount of developer used: 1 liter Flow rate of developer: about 2 liter / minute Needless to say, the flow rate of the processing solution must be different depending on the type of the processing solution and the manufacturer.

In FIG. 4, a plurality of orifices 710 communicating with the flow path 238 are provided at the bottom of the developing rack 220.

The orifice 710 is connected to the development processing rack 22.
The developer present in the gap between the outer wall of the processing tank 22 and the inner wall of the processing tank 22 sequentially contributes to returning to the circulation path.

That is, from the pump 405 to the inflow port 23
7. A part of the developing solution sent to the flow path 238 is ejected from the orifice 710 toward the bottom wall 221 of the partition plate, and is stored in a gap between the outer wall of the processing rack 220 and the inner wall of the processing tank 22. The retained developer is raised, discharged to the tank 400 through a communication portion between the discharge port 239 and the tank 400, and merged with the circulation path.

With the above configuration, the film F to be processed
By inserting the short reader S integrally engaged with the film insertion slot 228 through the film insertion port 228, the processing is performed through the above-described process.

Further, a development processing rack 22 as a representative example
The operation within 0 will be specifically described with reference to FIGS.

When the film F moves along the descending passage 226 and reaches the position of the first ejection groove 600, the developing solution ejected from the pair of ejection grooves 600 provided so as to sandwich the film F,
The film can be sprayed on the front and back sides of the film in substantially equal amounts.

The developing solution proceeds along both sides of the film F in a direction substantially perpendicular to one side of the film F, and exhibits a behavior of stirring the developing solution attached to the film surface.

Due to the agitation, the developing solution in the vicinity including the sprayed developing solution causes a turbulent state in a small area, and the developing solution which has been staying on the film surface is renewed to accelerate the developing process. .

Next, when the film surface in the same area as described above reaches a position where the jetting groove 603 is present, the developing solution jetted from the opposite direction accelerates the developing process by the same behavior as described above.

FIG. 8 shows the turbulent state of the developing solution in the developing rack 220.

During this time, the developer constantly circulates and is ejected through the channels 232 to 235 under the temperature control.

The developer stored outside the development processing rack is forcibly taken into the circulation system by the developer ejected from the orifice 710, so that the temperature of the developer is maintained at a predetermined temperature.

Under the action of the developing solution jetted to both sides of the film F, the film F moves without causing any trouble to the image area. Even when the developer reaches the upper portion, the developer near the via hole 700 is discharged little by little to the outside of the development processing rack, so that the stagnation of the tired developer can be prevented from adversely affecting the film.

Therefore, the film can be developed to a uniform development density.

Hereinafter, in other processing racks having the same structure, the film F is subjected to the same action, and finally, the film F having the initial performance is obtained.

FIG. 6 shows the shape of the injection groove formed by machining or die cutting.

FIG. 6 is a schematic diagram for explaining a block (thick plate) having the upper half of the passage 226 in FIG. 5 as viewed from the passage side, and a portion holding the belt B is omitted.

Since the block is substantially the same as the central body, it is hereinafter referred to as a central body 225.

In the figure, the one-dot chain line 650 shown in the horizontal direction is the reference line, and the injection grooves 600 and 603 are the reference line 65.
It is formed asymmetrically with respect to 0.

Since the shapes of the injection grooves are basically the same, description will be made with reference to one injection groove 600.

It goes without saying that grooves corresponding to the injection grooves 600 and 603 are also provided in the central body 225 having the opposing wall surface forming the passage.

The right end 601 of the injection groove 600 (the injection groove 60
3 corresponds to the left end portion 604).
A portion connected to the flow channel 233 via a small hole h provided in the second hole 52.

[0117] The overall shape is as follows:
25, the depth of the groove gradually decreases toward the center.

Looking at the reference line 650, the lower part of the central body is lower than the part above the reference line so that the tip is not easily caught when the short leader S or the film F advances. It is in a state where the plane has been cut deeper (see the side view in FIG. 7).

Note that the shapes of the injection grooves 600 and 603 may be symmetrical with respect to the reference line, and the shapes may be other shapes.

Further, the spray grooves for spraying the developing solution need not always be provided on both sides (in the thickness direction of the film) with respect to the film movement path. For example, only the emulsion surface side may be used. The emulsion side, then the back side, and the side of the film (piece,
Various combinations can be selected, including providing for both types.

The short leader S and the film F conveyed upward in the ascending passage 227 are separated from the endless timing belt B, and are discharged to the next adjacent processing rack along an unshown overrack guide.

In this embodiment, the case where the processing rack is inserted into the processing tank and used is described. However, when the processing tank is eliminated and the processing rack is provided with the function of the processing tank to form a sealed structure. Alternatively, the processing rack may be of a type without a processing tank serving also as a processing tank.

At this time, it is important to prevent leakage of the shaft supporting the roller.

In this case, it is sufficient to arrange only the required number of processing racks in series, so that the size of the apparatus can be further reduced.

Further, in the embodiment, the photosensitive material processing apparatus for a color negative film is taken as an example. However, the technical concept of the present invention is not limited to this. For example, a color reversal film or a roll can be used. The present invention can be applied to an apparatus for other photosensitive materials such as photographic paper.

In particular, since the processing apparatus for a color reversal film has a large number of processing tanks, the effect when the present invention is applied is great.

[0127]

According to the construction in which the processing liquid is sprayed from the side of the photosensitive material to be processed, the thickness of the processing rack (thickness in the transport direction of the photosensitive material) can be made as small as possible, and as a result, the overall length of the photosensitive material processing apparatus Can be reduced in size.

At the same time, the processing liquid in the passage is agitated by using the jetted processing liquid to apply a fresh processing liquid to the emulsion surface of the photosensitive material. Processing can be sufficiently promoted.

[Brief description of the drawings]

FIG. 1 is a schematic diagram simply showing an internal configuration of a photographic photosensitive material processing apparatus for a color negative film according to an embodiment of the present invention.

FIG. 2 is a schematic view showing a locked state between a short leader and a color negative film according to one embodiment of the present invention.

FIG. 3 is a front view of the processing rack according to the embodiment of the present invention.

FIG. 4 is a side view of the processing rack according to the embodiment of the present invention.

FIG. 5 is a plan sectional view of the processing rack taken along line AA of FIG. 4;

FIG. 6 is a schematic view of a block having an upper half of the passage in FIG. 5 as viewed from the passage side.

FIG. 7 is a part of the side view of FIG. 6;

FIG. 8 is a schematic diagram illustrating a stirring (vortex) state of a developer.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Photosensitive material processing apparatus 10 Film mounting part 20 Film processing part 22 Color development processing tank 24 Bleaching processing tank 26 Fixing processing tank 28 Stabilization processing tank 30 Drying part 220, 240, 260, 280 Processing rack 223, 224 Side (side wall) 225 Main part (central body) 226 Descending passage 227 Ascending passage 230 Circular part 231 Gap part 232, 233, 234, 235, 238 Flow path 237 Inlet 239 Discharge port 252 to 255 Shield plate 401 Temperature sensor 403 Heating means 405 Pump 500,501 Turn roller 600,603,605,607 Injection groove F Film S Short leader T Projection

Claims (4)

[Claims] 1. A conveyance of a photosensitive material having a slit-shaped cross section, which also serves as a processing chamber for the photosensitive material and a circulation path for the processing solution, and has a gap on both sides in the width direction for holding the ends of the short reader. Path, a processing liquid supply path provided further outside the gap of the photographic photosensitive material transport path, and a plurality of processing liquid supply paths provided at arbitrary intervals on the photographic photosensitive material transport path, and A processing liquid ejecting path for injecting a processing liquid toward the photographic light-sensitive material moving in the photographic light-sensitive material transport path, wherein a plurality of processing racks are arranged in series and arranged. The processing liquid injection path is provided on both outer sides of the width of the gap,
Photographic light-sensitive material processing, wherein a processing liquid is jetted from the processing liquid jet path toward the emulsion surface side and the back surface side of the photographic light-sensitive material, respectively, and from a direction substantially perpendicular to the conveying direction of the photographic light-sensitive material. apparatus. 2. A conveyance of a photographic material having a slit-shaped cross section, which also serves as a processing chamber for the photographic material and a circulation path for the processing solution, and has a gap on both sides in the width direction for holding the end of the short reader. Path, a processing liquid supply path provided further outside the gap of the photographic photosensitive material transport path, and a plurality of processing liquid supply paths provided at arbitrary intervals on the photographic photosensitive material transport path, and A processing liquid ejecting path for injecting a processing liquid toward the photographic light-sensitive material moving in the photographic light-sensitive material transport path, wherein a plurality of processing racks are arranged in series and arranged. Wherein the processing liquid jet paths provided at a plurality of locations on both sides in the width direction of the photographic photosensitive material transport path have processing racks that are arranged at staggered positions on both sides in the width direction. Photo Photosensitive material processing equipment. 3. The photographic light-sensitive material processing apparatus according to claim 1, wherein the slit-shaped cross section of the photographic light-sensitive material conveying path has a shape in which two arcs face each other except for a gap. 4. The processing rack is detachably mounted on the photographic material processing apparatus, and when the processing rack is mounted on or removed from the photographic material processing apparatus, the processing rack transports the photographic material. 4. The photographic material processing apparatus according to claim 1, wherein a release port for releasing a processing liquid stored in a road is provided at a bottom of the processing rack.