JP2000229987A - Production of 2-trialkylsilyl-2,2-difluoroacetic ester - Google Patents
Production of 2-trialkylsilyl-2,2-difluoroacetic esterInfo
- Publication number
- JP2000229987A JP2000229987A JP11030843A JP3084399A JP2000229987A JP 2000229987 A JP2000229987 A JP 2000229987A JP 11030843 A JP11030843 A JP 11030843A JP 3084399 A JP3084399 A JP 3084399A JP 2000229987 A JP2000229987 A JP 2000229987A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- trialkylsilyl
- represented
- ethyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 150000002148 esters Chemical class 0.000 title abstract 4
- -1 difluoromethylene group Chemical group 0.000 claims abstract description 29
- 125000000962 organic group Chemical group 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims abstract description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000003118 aryl group Chemical group 0.000 claims abstract description 5
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims abstract description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims abstract description 5
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims abstract description 5
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims abstract description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical group BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052794 bromium Inorganic materials 0.000 claims abstract description 4
- 229910052801 chlorine Inorganic materials 0.000 claims abstract description 4
- 239000000460 chlorine Substances 0.000 claims abstract description 4
- 125000001072 heteroaryl group Chemical group 0.000 claims abstract description 4
- 229910052740 iodine Chemical group 0.000 claims abstract description 4
- 239000011630 iodine Chemical group 0.000 claims abstract description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 4
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 3
- 125000000304 alkynyl group Chemical group 0.000 claims abstract description 3
- 125000001424 substituent group Chemical group 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- 125000002252 acyl group Chemical group 0.000 claims description 2
- 125000003545 alkoxy group Chemical group 0.000 claims description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 2
- 125000001302 tertiary amino group Chemical group 0.000 claims description 2
- 125000005309 thioalkoxy group Chemical group 0.000 claims description 2
- 125000004665 trialkylsilyl group Chemical group 0.000 claims description 2
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 7
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 abstract description 5
- 150000002894 organic compounds Chemical class 0.000 abstract description 3
- VMVNZNXAVJHNDJ-UHFFFAOYSA-N methyl 2,2,2-trifluoroacetate Chemical compound COC(=O)C(F)(F)F VMVNZNXAVJHNDJ-UHFFFAOYSA-N 0.000 abstract description 2
- 125000001309 chloro group Chemical group Cl* 0.000 abstract 1
- DYAKYYSMROBYNG-UHFFFAOYSA-N ethyl 2,2-difluoro-2-trimethylsilylacetate Chemical compound CCOC(=O)C(F)(F)[Si](C)(C)C DYAKYYSMROBYNG-UHFFFAOYSA-N 0.000 abstract 1
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 17
- 238000000034 method Methods 0.000 description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- 238000006243 chemical reaction Methods 0.000 description 8
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical class OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- STSCVKRWJPWALQ-UHFFFAOYSA-N TRIFLUOROACETIC ACID ETHYL ESTER Chemical compound CCOC(=O)C(F)(F)F STSCVKRWJPWALQ-UHFFFAOYSA-N 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000003115 supporting electrolyte Substances 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000012528 membrane Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 3
- 238000003512 Claisen condensation reaction Methods 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Natural products CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- 229910013684 LiClO 4 Inorganic materials 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- CSJLBAMHHLJAAS-UHFFFAOYSA-N diethylaminosulfur trifluoride Chemical compound CCN(CC)S(F)(F)F CSJLBAMHHLJAAS-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- DTTIQEHOYLOWDU-UHFFFAOYSA-N hexyl 2,2,2-trifluoroacetate Chemical compound CCCCCCOC(=O)C(F)(F)F DTTIQEHOYLOWDU-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- MHCFAGZWMAWTNR-UHFFFAOYSA-M lithium perchlorate Chemical compound [Li+].[O-]Cl(=O)(=O)=O MHCFAGZWMAWTNR-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- SUSQOBVLVYHIEX-UHFFFAOYSA-N phenylacetonitrile Chemical compound N#CCC1=CC=CC=C1 SUSQOBVLVYHIEX-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 150000005621 tetraalkylammonium salts Chemical class 0.000 description 2
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- JARXNQUBGBXALE-UHFFFAOYSA-N C(C)[SiH](CC)CC.Cl Chemical compound C(C)[SiH](CC)CC.Cl JARXNQUBGBXALE-UHFFFAOYSA-N 0.000 description 1
- BNSJULSSXRHPGB-UHFFFAOYSA-N CC[SiH](CC)CC.Br Chemical compound CC[SiH](CC)CC.Br BNSJULSSXRHPGB-UHFFFAOYSA-N 0.000 description 1
- NTIUZMQTVYPKIB-UHFFFAOYSA-N C[SiH](C)C1=CC=CC=C1.Cl Chemical compound C[SiH](C)C1=CC=CC=C1.Cl NTIUZMQTVYPKIB-UHFFFAOYSA-N 0.000 description 1
- 229910020366 ClO 4 Inorganic materials 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- PHXQIAWFIIMOKG-UHFFFAOYSA-N NClO Chemical compound NClO PHXQIAWFIIMOKG-UHFFFAOYSA-N 0.000 description 1
- 229920000557 Nafion® Polymers 0.000 description 1
- 238000006680 Reformatsky reaction Methods 0.000 description 1
- DTQVDTLACAAQTR-UHFFFAOYSA-M Trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-M 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- UUDSRSBRGWIGSG-UHFFFAOYSA-N [SiH3]C(C1=CC=CC=C1)C1=CC=CC=C1.Cl Chemical compound [SiH3]C(C1=CC=CC=C1)C1=CC=CC=C1.Cl UUDSRSBRGWIGSG-UHFFFAOYSA-N 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- CQESPDFZIFJLII-UHFFFAOYSA-N butan-2-yl 2,2,2-trifluoroacetate Chemical compound CCC(C)OC(=O)C(F)(F)F CQESPDFZIFJLII-UHFFFAOYSA-N 0.000 description 1
- CLDYDTBRUJPBGU-UHFFFAOYSA-N butyl 2,2,2-trifluoroacetate Chemical compound CCCCOC(=O)C(F)(F)F CLDYDTBRUJPBGU-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003426 co-catalyst Substances 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical compound I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 description 1
- MJNDVDVTLSBDLB-UHFFFAOYSA-N cyclohexyl 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)OC1CCCCC1 MJNDVDVTLSBDLB-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- RCZMWDYEQIMGDR-UHFFFAOYSA-N ethyl 2,2,4,4,4-pentafluoro-3-oxobutanoate Chemical compound CCOC(=O)C(F)(F)C(=O)C(F)(F)F RCZMWDYEQIMGDR-UHFFFAOYSA-N 0.000 description 1
- 235000019439 ethyl acetate Nutrition 0.000 description 1
- 239000012025 fluorinating agent Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical class FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- LRDFRRGEGBBSRN-UHFFFAOYSA-N isobutyronitrile Chemical compound CC(C)C#N LRDFRRGEGBBSRN-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SAVQQRYWWAGSQW-UHFFFAOYSA-N n-methyl-n-(trifluoro-$l^{4}-sulfanyl)methanamine Chemical compound CN(C)S(F)(F)F SAVQQRYWWAGSQW-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- VLTRZXGMWDSKGL-UHFFFAOYSA-M perchlorate Chemical compound [O-]Cl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-M 0.000 description 1
- DVCMYAIUSOSIQP-UHFFFAOYSA-N phenyl 2,2,2-trifluoroacetate Chemical compound FC(F)(F)C(=O)OC1=CC=CC=C1 DVCMYAIUSOSIQP-UHFFFAOYSA-N 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- VAPOOUIHAISUEO-UHFFFAOYSA-N s-phenyl 2,2,2-trifluoroethanethioate Chemical compound FC(F)(F)C(=O)SC1=CC=CC=C1 VAPOOUIHAISUEO-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- UQJLSMYQBOJUGG-UHFFFAOYSA-N tert-butyl 2,2,2-trifluoroacetate Chemical compound CC(C)(C)OC(=O)C(F)(F)F UQJLSMYQBOJUGG-UHFFFAOYSA-N 0.000 description 1
- KBLZDCFTQSIIOH-UHFFFAOYSA-M tetrabutylazanium;perchlorate Chemical compound [O-]Cl(=O)(=O)=O.CCCC[N+](CCCC)(CCCC)CCCC KBLZDCFTQSIIOH-UHFFFAOYSA-M 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- WGHUNMFFLAMBJD-UHFFFAOYSA-M tetraethylazanium;perchlorate Chemical compound [O-]Cl(=O)(=O)=O.CC[N+](CC)(CC)CC WGHUNMFFLAMBJD-UHFFFAOYSA-M 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、電解還元法による
2−トリアルキルシリル2,2−ジフルオロ酢酸エステ
ルの製造方法に関する。2−トリアルキルシリル2,2
−ジフルオロ酢酸エステルは有機化合物中にジフルオロ
メチレン基を導入する反応試剤または有機化合物の製造
中間体として有用である。The present invention relates to a method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester by an electrolytic reduction method. 2-trialkylsilyl 2,2
-Difluoroacetic acid ester is useful as a reaction reagent for introducing a difluoromethylene group into an organic compound or as an intermediate for producing an organic compound.
【0002】[0002]
【従来の技術】近年、ジフルオロメチレン基を有する化
合物は特有の生物学的活性を持つことからその合成法が
注目されている。これまで、カルボニル基、チオカルボ
ニル基またはチオセタール基にDAST(ジメチルアミ
ノサルファトリフルオライド)や同様の作用をする酸化
的フッ素化剤を反応させてジフルオロメチレン基に変換
することがしばしば行われている。また、ハロジフルオ
ロメチル基を脱ハロゲンしてジフルオロメチレン基とす
る方法もよく知られている。2. Description of the Related Art In recent years, a compound having a difluoromethylene group has a particular biological activity, and therefore its synthetic method has attracted attention. Heretofore, a carbonyl group, a thiocarbonyl group or a thiocetal group is often converted to a difluoromethylene group by reacting it with DAST (dimethylaminosulfur trifluoride) or an oxidizing fluorinating agent having a similar effect. A method of dehalogenating a halodifluoromethyl group to obtain a difluoromethylene group is also well known.
【0003】ジフルオロメチレン基の導入試剤として
は、ジフルオロケテンシリルアセタールがしばしばジフ
ルオロ−βアミノ、βヒドロキシエステルやβ−エトキ
シカルボニルジフルオロメチル−β−ラクタムの温和な
条件での合成に使用されてきた。しかし、ジフルオロケ
テンシリルアセタールは水分や亜鉛塩の存在で不安定で
あり、ハロジフルオロ酢酸塩のリフォーマトスキー反応
で調製して直ぐその場で(in situ)使用しなければなら
ない。As a reagent for introducing a difluoromethylene group, difluoroketene silyl acetal has often been used for the mild synthesis of difluoro-β-amino, β-hydroxyester and β-ethoxycarbonyldifluoromethyl-β-lactam. However, difluoroketene silyl acetals are unstable in the presence of moisture and zinc salts and must be prepared and used in situ in a Reformatsky reaction of halodifluoroacetates.
【0004】トリフルオロ酢酸エチルを電解還元すると
クライゼン縮合生成物が主生成物として得られ2−トリ
アルキルシリル2,2−ジフルオロ酢酸エステルが少量
生成することが文献に記載されている(Novel Trends i
n Electroorg.,Synth., [Pap.Int.Symp.],3rd(1998),Me
eting Date 1997,299-300. Editor:S Torii)。[0004] It has been described in the literature that when ethyl trifluoroacetate is electrolytically reduced, a Claisen condensation product is obtained as a main product and a small amount of 2-trialkylsilyl 2,2-difluoroacetate is formed (Novel Trends i).
n Electroorg., Synth., [Pap.Int.Symp.], 3rd (1998), Me
eting Date 1997,299-300. Editor: S Torii).
【0005】[0005]
【発明が解決しようとする課題】そこで、本発明ではジ
フルオロケテンシリルアセタールと同様の反応に適用で
きる安定であり単離できる化合物である2−トリアルキ
ルシリル2,2−ジフルオロ酢酸エステルを収率よく製
造する方法を提供する。Therefore, in the present invention, 2-trialkylsilyl 2,2-difluoroacetic acid ester, which is a stable and isolable compound applicable to the same reaction as difluoroketene silyl acetal, is obtained in good yield. A method of manufacturing is provided.
【0006】[0006]
【課題を解決するための手段】本発明者らは、トリフル
オロ酢酸エステル類をハロゲン化トリアルキルシランの
存在と特定の条件の下で電解還元すると2−トリアルキ
ルシリル2,2−ジフルオロ酢酸エステルが収率よく得
られることを見いだし本発明に至った。Means for Solving the Problems The present inventors electrolytically reduce trifluoroacetic acid esters in the presence of a halogenated trialkylsilane under specific conditions to obtain 2-trialkylsilyl 2,2-difluoroacetic acid esters. Was found to be obtained in good yield, and the present invention was achieved.
【0007】すなわち、本発明は一般式(1)That is, the present invention provides a compound represented by the general formula (1):
【0008】[0008]
【化3】 Embedded image
【0009】(式中、R1は一価の有機基を表す。)で
表されるトリフルオロ酢酸エステル類を一般式(2) (R2)3SiX (2) (式中、R2はそれぞれ独立にメチル基、エチル基、プ
ロピル基、イソプロピル基またはフェニル基を表し、X
は塩素、臭素またはヨウ素を表す。)で表されるハロゲ
ン化トリアルキルシラン存在下で電解還元することによ
る一般式(3)[0009] (wherein, R 1 represents. A monovalent organic group) Formula (2) (R 2) 3 SiX (2) ( wherein trifluoroacetic acid ester represented by, R 2 is Each independently represents a methyl group, an ethyl group, a propyl group, an isopropyl group or a phenyl group;
Represents chlorine, bromine or iodine. Formula (3) by electrolytic reduction in the presence of a halogenated trialkylsilane represented by
【0010】[0010]
【化4】 Embedded image
【0011】(式中、TASはトリアルキルシリル基を
表し、R1は式(1)のR1と同じ置換基を表す。)で表
される2−トリアルキルシリル2,2−ジフルオロ酢酸
エステルの製造方法である。[0011] (wherein, TAS represents a trialkylsilyl group, R 1 represents. The same substituents as R 1 in formula (1)) 2-trialkylsilyl-difluoro acetic ester represented by It is a manufacturing method of.
【0012】本発明にかかる一般式(1)で表されるト
リフルオロ酢酸エステル類は、特に限定されず、R1で
表される一価の有機基が電解還元反応の条件下で不活性
であればよい。その様な有機基としては、炭素数1〜2
0の分岐を有することもあるアルキル基、アルケニル基
またはアルキニル基、炭素数1〜20の置換基を有する
こともあるシクロアルキル基、炭素数1〜20の置換基
を有することもあるアリール基、一般式(4) −(CH2)n−R3 (4) (式中、R3は炭素数1〜10のシクロアルキル基、ア
リール基、アルコキシル基、チオアルコキシル基、3級
アミノ基、アシル基、アルコキシカルボニル基、複素芳
香族基を表し、nは1以上の整数を表す。)で表される
有機基などを挙げることができる。The trifluoroacetic acid ester represented by the general formula (1) according to the present invention is not particularly limited, and the monovalent organic group represented by R 1 is inactive under the conditions of the electrolytic reduction reaction. I just need. Such organic groups include those having 1-2 carbon atoms.
An alkyl group which may have 0 branches, an alkenyl group or an alkynyl group, a cycloalkyl group which may have a substituent having 1 to 20 carbon atoms, an aryl group which may have a substituent having 1 to 20 carbon atoms, formula (4) - (CH 2) n -R 3 (4) ( wherein, R 3 is a cycloalkyl group having 1 to 10 carbon atoms, an aryl group, an alkoxyl group, thioalkoxyl group, tertiary amino group, an acyl Group, an alkoxycarbonyl group, or a heteroaromatic group, and n represents an integer of 1 or more.).
【0013】一般式(1)で表されるトリフルオロ酢酸
エステル類を具体的に例示すると、トリフルオロ酢酸メ
チル、トリフルオロ酢酸エチル、トリフルオロ酢酸n−
プロピル、トリフルオロ酢酸i−プロピル、トリフルオ
ロ酢酸n−ブチル、トリフルオロ酢酸s−ブチル、トリ
フルオロ酢酸t−ブチル、トリフルオロ酢酸n−ヘキシ
ル、トリフルオロ酢酸シクロヘキシル、トリフルオロ酢
酸フェニル、トリフルオロチオ酢酸S−t−ブチル、ト
リフルオロチオ酢酸S−フェニル、を挙げることができ
るが、これらに限られないのは言うまでもない。Specific examples of the trifluoroacetates represented by the general formula (1) include methyl trifluoroacetate, ethyl trifluoroacetate and n-trifluoroacetate.
Propyl, i-propyl trifluoroacetate, n-butyl trifluoroacetate, s-butyl trifluoroacetate, t-butyl trifluoroacetate, n-hexyl trifluoroacetate, cyclohexyl trifluoroacetate, phenyl trifluoroacetate, trifluorothio St-butyl acetate and S-phenyl trifluorothioacetate can be mentioned, but it goes without saying that they are not limited to these.
【0014】本発明にかかる一般式(3)で表される2
−トリアルキルシリル2,2−ジフルオロ酢酸エステル
は、それぞれ一般式(1)のR1と同じ置換基R1を持つ
対応する2−トリアルキルシリル2,2−ジフルオロ酢
酸エステルである。According to the present invention, 2 represented by the general formula (3)
-Trialkylsilyl 2,2-difluoroacetic acid esters are the corresponding 2-trialkylsilyl 2,2-difluoroacetic acid esters, each having the same substituent R 1 as R 1 in general formula (1).
【0015】本発明に使用するハロゲン化トリアルキル
シランとしては、特に限定されないが、一般式(2) (R2)3SiX (2) において、R2がそれぞれ独立にメチル基、エチル基、
プロピル基、イソプロピル基またはフェニル基を表し、
Xは塩素、臭素またはヨウ素を表すものが好ましい。好
ましいハロゲン化トリアルキルシランとしては、塩化ト
リメチルシラン、塩化トリエチルシラン、塩化フェニル
ジメチルシラン、塩化ジフェニルメチルシラン、臭化ト
リエチルシランなどを挙げることができる。これらの
内、塩化トリメチルシランは入手が容易で最も好まし
い。 本発明の方法において使用する溶媒は、本発明の
電解還元反応条件で不活性であればよく、ニトリル類、
例えば、アセトニトリル、プロピオニトリル、フェニル
アセトニトリル、イソブチロニトリル、ベンゾニトリ
ル、酸アミド類、例えば、ジメチルホルムアミド、ジメ
チルアセトアミド、メチルホルムアミド、ホルムアミ
ド、ヘキサメチルリン酸トリアミド、エーテル類、例え
ば、テトラヒドロフラン、1,2−ジメトキシエタン、
1,4−ジオキサン、ジエチルエーテル、1,2−エポ
キシエタンなどが使用され、アセトニトリル、ジメチル
ホルムアミド、テトラヒドロフランが好ましく、アセト
ニトリルが特に好ましい。The halogenated trialkylsilane used in the present invention is not particularly limited, but in the general formula (2) (R 2 ) 3 SiX (2), R 2 independently represents a methyl group, an ethyl group,
Represents a propyl group, an isopropyl group or a phenyl group,
X preferably represents chlorine, bromine or iodine. Preferred examples of the halogenated trialkylsilane include trimethylsilane chloride, triethylsilane chloride, phenyldimethylsilane chloride, diphenylmethylsilane chloride, and triethylsilane bromide. Of these, trimethylsilane chloride is the most preferable because it is easily available. The solvent used in the method of the present invention may be any type as long as it is inert under the conditions of the electrolytic reduction reaction of the present invention.
For example, acetonitrile, propionitrile, phenylacetonitrile, isobutyronitrile, benzonitrile, acid amides such as dimethylformamide, dimethylacetamide, methylformamide, formamide, hexamethylphosphoric triamide, ethers such as tetrahydrofuran, 1 , 2-dimethoxyethane,
1,4-dioxane, diethyl ether, 1,2-epoxyethane and the like are used, and acetonitrile, dimethylformamide, and tetrahydrofuran are preferable, and acetonitrile is particularly preferable.
【0016】本発明の電解還元は従来から知られている
方法を適用して実施できる。本発明の方法に用いる電解
槽は、陽極陰極分離型のセル、または単一型のセルを使
用できる。分離型セルの場合隔膜としては、公知のイオ
ン交換膜、例えば、ナフィオン(デュポン社、登録商
標)膜、無機材質、例えば、ガラス、セラミックなどの
多孔質膜を例示できる。好ましくは分離型のセルを用い
る。The electrolytic reduction of the present invention can be carried out by applying a conventionally known method. As the electrolytic cell used in the method of the present invention, an anode / cathode separation type cell or a single type cell can be used. In the case of the separation type cell, examples of the membrane include a well-known ion exchange membrane, for example, a Nafion (DuPont, registered trademark) membrane, and a porous membrane of an inorganic material, for example, glass or ceramic. Preferably, a separate cell is used.
【0017】本発明の方法に使用する支持電解質として
はテトラアルキルアンモニウム塩またはリチウム塩が好
ましい。テトラアルキルアンモニウム塩のアルキル基と
してはC1からC6の低級アルキル基が好ましい。塩の陰
イオンとしてはハロゲン化物イオンや過塩素酸イオンや
テトラフルオロホウ酸イオンやp−トルエンスルホナー
トイオンやp−トルエンスルホナートイオンが好まし
い。具体的に本発明の方法に用いられる好ましい支持電
解質としてはテトラエチルアンモニウムテトラフルオロ
ボレート(Et4NBF4)、テトラブチルアンモニウム
テトラフルオロボレート(Bu4NBF4)、臭化テトラ
エチルアンモニウム(Et4NBr)、臭化テトラブチ
ルアンモニウム(Bu4NBr)、過塩素酸テトラエチ
ルアンモニウム(Bu4ClO4)、過塩素酸テトラブチ
ルアンモニウム(Bu4NClO4)、臭化リチウム(L
iBr)等のハロゲン化リチウム、過塩素酸リチウム
(LiClO4)等が挙げられる。これらのなかでも、
特に臭化テトラブチルアンモニウム、過塩素酸リチウム
が好ましい。また、n−Bu4NBr−アセトニトリ
ル、LiClO4−DMF、LiClO4−アセトニトリ
ルの支持電解質−溶媒の系は特に好ましい組み合わせと
して例示することができる。支持電解質の濃度としては
0.01〜10mol/リットルが好ましい。The supporting electrolyte used in the method of the present invention is preferably a tetraalkylammonium salt or a lithium salt. As the alkyl group of the tetraalkylammonium salt, a C 1 to C 6 lower alkyl group is preferable. As the anion of the salt, a halide ion, perchlorate ion, tetrafluoroborate ion, p-toluenesulfonate ion or p-toluenesulfonate ion is preferable. Specifically, preferred supporting electrolytes used in the method of the present invention include tetraethylammonium tetrafluoroborate (Et 4 NBF 4 ), tetrabutylammonium tetrafluoroborate (Bu 4 NBF 4 ), tetraethylammonium bromide (Et 4 NBr), Tetrabutylammonium bromide (Bu 4 NBr), tetraethylammonium perchlorate (Bu 4 ClO 4 ), tetrabutylammonium perchlorate (Bu 4 NClO 4 ), lithium bromide (L
lithium halide such as iBr) and lithium perchlorate (LiClO 4 ). Of these,
Particularly, tetrabutylammonium bromide and lithium perchlorate are preferred. Further, n-Bu 4 NBr- acetonitrile, LiClO 4 -DMF, LiClO 4 - supporting electrolyte acetonitrile - system of the solvent can be exemplified as particularly preferable combination. The concentration of the supporting electrolyte is preferably 0.01 to 10 mol / liter.
【0018】本発明の製造方法に用いられる陽極材料と
しては、特に限定されず、従来公知の材料が広く使用で
きる。分離型セルを使用した場合の陽極材料としては、
鉛、炭素、白金が好ましい。The anode material used in the production method of the present invention is not particularly limited, and conventionally known materials can be widely used. As the anode material when using a separation type cell,
Lead, carbon and platinum are preferred.
【0019】本発明の製造法に用いられる陰極材料とし
ては、特に限定されず、従来公知の材料を広く使用でき
る。好ましいものとしては、鉛、白金、ステンレススチ
ール、亜鉛、マグネシウム、ニッケル、アルミニウム、
および炭素である。The cathode material used in the production method of the present invention is not particularly limited, and conventionally known materials can be widely used. Preferred are lead, platinum, stainless steel, zinc, magnesium, nickel, aluminum,
And carbon.
【0020】本発明の製造方法での電流密度としては1
〜1000mA/cm2が好ましい。本発明の方法で流
す電気の量は理論的には一つのフッ素の還元に2F/m
olであるが、過剰に通電しても差し支えない。通常、
2〜40F/molで実施される。The current density in the manufacturing method of the present invention is 1
〜1000 mA / cm 2 is preferred. The amount of electricity passed by the method of the present invention is theoretically 2 F / m
Although it is ol, it does not matter even if the current is excessively supplied. Normal,
Performed at 2-40 F / mol.
【0021】本発明の製造方法を実施する反応温度は−
40〜100℃の範囲であり、好ましくは−20〜80
℃である。低温においては、ケテンシリルアセタールが
生成しやすくなるため2−トリアルキルシリル2,2−
ジフルオロ酢酸エステルの収率が低下するため好ましく
ない。The reaction temperature for carrying out the production method of the present invention is-
40 to 100 ° C., preferably −20 to 80 ° C.
° C. At a low temperature, ketene silyl acetal is likely to be formed, so that 2-trialkylsilyl 2,2-
It is not preferable because the yield of difluoroacetic acid ester is reduced.
【0022】本発明の方法におけるハロゲン化トリアル
キルシランの使用量は、トリフルオロメチルケトン類の
2〜50モル倍であり、3〜10モル倍程度が好まし
い。明確ではないが、本発明の方法においては、ハロゲ
ン化トリアルキルシランは反応試剤としてだけでなく、
一部は脱離したフッ素イオンの捕捉剤として作用してい
るものと考えられるので、1モル倍以上のハロゲン化ト
リアルキルシランが必要である。さらに、ハロゲン化ト
リアルキルシランの量が2モル倍より少ない場合には、
生成物がクライゼン縮合した生成物を副生するため目的
生成物の収率が低下することがあり好ましくない。ま
た、電解還元に使用する電気量により必要なハロゲン化
トリアルキルシランの量は異なるが、最も好ましい電気
量である2F/mol程度では2モル倍以上であること
が好ましい。The amount of the halogenated trialkylsilane used in the method of the present invention is 2 to 50 times, preferably about 3 to 10 times, that of trifluoromethyl ketones. Although not clear, in the method of the present invention, the halogenated trialkylsilane is not only used as a reaction reagent,
It is considered that a part thereof acts as a scavenger for the detached fluorine ions, so that 1 mol times or more of the halogenated trialkylsilane is required. Furthermore, when the amount of the halogenated trialkylsilane is less than 2 mole times,
Since the product is a by-product of Claisen condensation, the yield of the target product may decrease, which is not preferable. Although the necessary amount of the trialkylsilane halide varies depending on the amount of electricity used for electrolytic reduction, it is preferably at least 2 mol times at the most preferred amount of electricity of about 2 F / mol.
【0023】本発明の方法においては、トリフルオロ酢
酸エステル類の種類によっては生成物が不安定な場合が
あるので、還元反応の終了後または反応前に、陰極室液
に塩基類、例えば、トリメチルアミン、トリエチルアミ
ン、トリプロピルアミン、トリブチルアミンなどの脂肪
族第三アミン、ジメチルアミン、ジエチルアミン、ジプ
ロピルアミンなどの脂肪族第二アミン、メチルアミン、
エチルアミン、プロピルアミンなどの第一アミン、シク
ロヘキシルアミンなどの脂環式アミン、ジメチルアニリ
ン、ジエチルアニリンなどの芳香族アミンなどを添加す
ることが好ましい。In the method of the present invention, since the product may be unstable depending on the kind of trifluoroacetates, bases such as trimethylamine are added to the catholyte after or before the completion of the reduction reaction. , Triethylamine, tripropylamine, aliphatic tertiary amines such as tributylamine, dimethylamine, diethylamine, aliphatic secondary amines such as dipropylamine, methylamine,
It is preferable to add primary amines such as ethylamine and propylamine, alicyclic amines such as cyclohexylamine, and aromatic amines such as dimethylaniline and diethylaniline.
【0024】本発明の方法によって製造される2−トリ
アルキルシリル2,2−ジフルオロ酢酸エステルは、下
式に示すようにフッ素イオンの存在下において親電子試
薬、特に限定されないが例えばベンズアルデヒド、ベン
ゾイルブロマイド、ベンジルクロライドなどとアルキル
化反応を進行させることができる。The 2-trialkylsilyl 2,2-difluoroacetic acid ester produced by the method of the present invention can be used as an electrophilic reagent in the presence of a fluorine ion as shown in the following formula. , Benzyl chloride and the like can proceed the alkylation reaction.
【0025】[0025]
【化5】 Embedded image
【0026】ここで、Eは前記親電子試薬に対応して、
PhCH(OH)−、PhCH2−、PhCO−をそれ
ぞれ表す。F−イオンとしては、テトラブチルアンモニ
ウムフルオライド等の四級アンモニウムフルオライド、
フッ化カリウム等のアルカリ金属フッ化物(ヨウ化銅等
の助触媒を使用することもある。)などを適宜使用でき
る。また、溶媒としてはTHF、DMFなど本発明の方
法において使用される前記溶媒を使用できる。反応温度
は試剤の種類により異なるが、−78〜150℃程度で
ある。Here, E corresponds to the electrophilic reagent,
PhCH (OH) -, PhCH 2 -, respectively represent PhCO-. As the F- ion, a quaternary ammonium fluoride such as tetrabutylammonium fluoride;
An alkali metal fluoride such as potassium fluoride (a co-catalyst such as copper iodide may be used) can be used as appropriate. Further, as the solvent, the above-mentioned solvent used in the method of the present invention such as THF and DMF can be used. The reaction temperature varies depending on the type of the reagent, but is about -78 to 150 ° C.
【0027】以下に実施例をもって本発明を説明する
が、これらの実施態様に限定されるものではない。Hereinafter, the present invention will be described with reference to Examples, but the present invention is not limited to these Examples.
【0028】[0028]
【実施例】〔実施例1〕H型電解セルに臭化テトラブチ
ルアンモニウム(4.8g、12.0mmol、2.4
当量)を陽極側に量り取り、回転子を両極室に入れ、陽
極側に炭素棒、陰極側に鉛板(10cm2)を取り付け
た。アルゴン雰囲気下、アセトニトリルを両極室に35
mlづつ加え、続いてトリフルオロ酢酸エチル(0.7
1g、5.0mmol、1.0当量)、塩化トリメチル
シラン(2.5ml、20.0mmol、4.0当
量)、トリエチルアミン(2.8ml、20.0mmo
l、4.0当量)を加えた。混合物を50℃、定電流8
0mAで2.0F/モル(201分)通電した。通電終
了後、陰極室の反応液を減圧留去し濃縮した。得られた
粘性液体をヘキサンで抽出し濃縮した。得られた液体を
蒸留により精製し目的生成物を収率47%で得た。EXAMPLES Example 1 Tetrabutylammonium bromide (4.8 g, 12.0 mmol, 2.4) was placed in an H-type electrolytic cell.
) Was weighed on the anode side, the rotor was placed in the bipolar chamber, and a carbon rod was attached to the anode side, and a lead plate (10 cm 2 ) was attached to the cathode side. Under an argon atmosphere, acetonitrile was added to the bipolar chamber at 35
ml, followed by ethyl trifluoroacetate (0.7
1 g, 5.0 mmol, 1.0 equiv), trimethylsilane chloride (2.5 ml, 20.0 mmol, 4.0 equiv), triethylamine (2.8 ml, 20.0 mmol)
1, 4.0 equivalents). The mixture was heated at 50 ° C. and constant current
A current of 2.0 F / mol (201 minutes) was applied at 0 mA. After the completion of the current supply, the reaction solution in the cathode chamber was distilled off under reduced pressure and concentrated. The obtained viscous liquid was extracted with hexane and concentrated. The obtained liquid was purified by distillation to obtain a target product in a yield of 47%.
【0029】2−トリメチルシリル2,2−ジフルオロ
酢酸エチル1 H−NMR(200MHz、CDCl3);δ0.23
(s、9H)、1.34(t、3H、J=7.0H
z)、4.31(q、2H、J=7.2Hz)19 F−NMR(188MHz、CDCl3);δ38.
5(s、2F) IR(neat)2976,1756,1372,12
76,1114cm-1 〔実施例2〕トリフルオロ酢酸エチルに代えてトリフル
オロ酢酸t−ブチル(0.85g、5.0mmol、
1.0当量)について実施例1と同じ処理をしたとこ
ろ、2−トリメチルシリル2,2−ジフルオロ酢酸t−
ブチルを収率58%で得た。Ethyl 2-trimethylsilyl 2,2-difluoroacetate 1 H-NMR (200 MHz, CDCl 3 ); δ 0.23
(S, 9H), 1.34 (t, 3H, J = 7.0H
z), 4.31 (q, 2H, J = 7.2 Hz) 19 F-NMR (188 MHz, CDCl 3 );
5 (s, 2F) IR (neat) 2976, 1756, 1372, 12
76,1114Cm -1 Example 2 trifluoroacetic acid t- butyl instead of ethyl trifluoroacetate (0.85 g, 5.0 mmol,
1.0 equivalent), and the same treatment as in Example 1 was carried out. As a result, 2-trimethylsilyl 2,2-difluoroacetic acid t-
Butyl was obtained with a yield of 58%.
【0030】1H−NMR(200MHz、CDC
l3);δ0.22(s、9H)、1.52(s、9
H)19 F−NMR(188MHz、CDCl3);δ38.
9(s、2F) IR(neat)2984,2964,1760,15
96,1462,1398,1292,1112cm-1 〔実施例3〕トリフルオロ酢酸エチルに代えてトリフル
オロ酢酸n−ヘキシル(1.0g、5.0mmol、
1.0当量)について実施例1と同じ処理をしたとこ
ろ、2−トリメチルシリル2,2−ジフルオロ酢酸n−
ヘキシルを収率62%で得た。 1 H-NMR (200 MHz, CDC
l 3 ); δ 0.22 (s, 9H), 1.52 (s, 9
H) 19 F-NMR (188 MHz, CDCl 3 );
9 (s, 2F) IR (neat) 2984, 2964, 1760, 15
96, 1462, 1398, 1292, 1112 cm -1 [Example 3] n-hexyl trifluoroacetate (1.0 g, 5.0 mmol,
1.0 equivalent), and the same treatment as in Example 1 was carried out. As a result, 2-trimethylsilyl 2,2-difluoroacetic acid n-
Hexyl was obtained with a yield of 62%.
【0031】1H−NMR(200MHz、CDC
l3);δ0.23(s、9H)、0.89(t、3
H、J=6.6Hz)、1.30−1.41(m、6
H)、1.62−1.72(m、2H)、4.23
(t、2H、J=6.8Hz)19 F−NMR(188MHz、CDCl3);δ38.
7(s、2F) IR(neat)2968,2868,1756,14
70,1278,1198cm-1 〔実施例4〕反応温度を0℃として実施例3と同じ実験
を行ったところ、2−トリメチルシリル2,2−ジフル
オロ酢酸n−ヘキシルを収率41%で得た。19F−NM
Rで分析したところ反応生成物中には18%の1−n−
ヘキシル−2,2−ジフルオロケテントリメチルシリル
アセタールが生成していた。 1 H-NMR (200 MHz, CDC
l 3 ); δ 0.23 (s, 9H), 0.89 (t, 3
H, J = 6.6 Hz), 1.30-1.41 (m, 6
H) 1.62-1.72 (m, 2H), 4.23
(T, 2H, J = 6.8 Hz) 19 F-NMR (188 MHz, CDCl 3 );
7 (s, 2F) IR (neat) 2968, 2868, 1756, 14
70,1278,1198Cm -1 Example 4 where the reaction temperature was subjected to the same experiment as in Example 3 as a 0 ° C., to obtain a 2-trimethylsilyl difluoro acetate n- hexyl in 41% yield. 19 F-NM
When analyzed by R, 18% of 1-n-
Hexyl-2,2-difluoroketene trimethylsilyl acetal was formed.
【0032】〔参考例1〕塩化トリメチルシランの量を
1.0当量(0.6ml、5.0mmolとし、反応温
度を0℃として実施例1と同じ実験を行ったところ、2
−トリメチルシリル2,2−ジフルオロ酢酸エチルの収
率は5%以下であり、33%のトリフルオロ酢酸エチル
が回収された。19F−MNRで分析したところ反応生成
物中には21%の2−トリフルオロメチルカルボニル
2,2−ジフルオロ酢酸エチルエステルが生成してい
た。REFERENCE EXAMPLE 1 The same experiment as in Example 1 was carried out by setting the amount of trimethylsilane chloride to 1.0 equivalent (0.6 ml, 5.0 mmol, and the reaction temperature to 0 ° C.).
The yield of ethyl trimethylsilyl 2,2-difluoroacetate was 5% or less, and 33% of ethyl trifluoroacetate was recovered. Analysis by 19 F-MNR revealed that 21% of 2-trifluoromethylcarbonyl 2,2-difluoroacetic acid ethyl ester was formed in the reaction product.
【0033】[0033]
【発明の効果】本発明の製造方法によると、原料入手の
容易なトリフルオロ酢酸エステル類を原料として、有機
合成反応において有用な2−トリアルキルシリル2,2
−ジフルオロ酢酸エステルを一段階で収率よく製造でき
るという効果を奏する。According to the production method of the present invention, 2-trifluoroalkylsilyl 2,2 useful in an organic synthesis reaction is obtained from trifluoroacetates which are easily available.
-It has an effect that difluoroacetic acid ester can be produced in one step with high yield.
Claims (2)
フルオロ酢酸エステル類を一般式(2) (R2)3SiX (2) (式中、R2はそれぞれ独立にメチル基、エチル基、プ
ロピル基、イソプロピル基またはフェニル基を表し、X
は塩素、臭素またはヨウ素を表す。)で表されるハロゲ
ン化トリアルキルシラン存在下で電解還元することによ
る一般式(3) 【化2】 (式中、TASはトリアルキルシリル基を表し、R1は
式(1)のR1と同じ置換基を表す。)で表される2−
トリアルキルシリル2,2−ジフルオロ酢酸エステルの
製造方法。1. A compound of the general formula (1) (Wherein R 1 represents a monovalent organic group) represented by the general formula (2) (R 2 ) 3 SiX (2) (wherein R 2 is each independently X represents a methyl group, an ethyl group, a propyl group, an isopropyl group or a phenyl group;
Represents chlorine, bromine or iodine. Formula (3) by electrolytic reduction in the presence of a halogenated trialkylsilane represented by formula (3): (Wherein, TAS represents a trialkylsilyl group, R 1 represents. The same substituents as R 1 in formula (1)) represented by 2-
A method for producing a trialkylsilyl 2,2-difluoroacetic acid ester.
キル基、アリール基、アルケニル基、アルキニル基、複
素芳香族基または一般式(4) −(CH2)n−R3 (4) (式中、R3はシクロアルキル基、アリール基、アルコ
キシル基、チオアルコキシル基、3級アミノ基、アシル
基、アルコキシカルボニル基、複素芳香族基を表し、n
は1以上の整数を表す。)で表される有機基である請求
項1記載の2−トリアルキルシリル2,2−ジフルオロ
酢酸エステルの製造方法。2. The monovalent organic group is an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkynyl group, a heteroaromatic group or a compound of the general formula (4)-(CH 2 ) n -R 3 (4) (wherein, R 3 represents a cycloalkyl group, an aryl group, an alkoxyl group, a thioalkoxyl group, a tertiary amino group, an acyl group, an alkoxycarbonyl group, a heteroaromatic group, and n
Represents an integer of 1 or more. The method for producing a 2-trialkylsilyl 2,2-difluoroacetic acid ester according to claim 1, which is an organic group represented by the formula:
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JP2011184316A (en) * | 2010-03-05 | 2011-09-22 | Central Glass Co Ltd | Method for preparing difluoroacetic acid ester |
JP2012167047A (en) * | 2011-02-14 | 2012-09-06 | Gunma Univ | Method for producing difluoromethyl heteroaryl compound |
US20210246098A1 (en) * | 2018-01-30 | 2021-08-12 | Daikin Industries, Ltd. | Electrolyte, electrochemical device, lithium ion secondary battery, and module |
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1999
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Cited By (9)
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WO2011062033A1 (en) * | 2009-11-18 | 2011-05-26 | セントラル硝子株式会社 | Preparation method for aromatic difluoroacetic acid ester |
JP2011105658A (en) * | 2009-11-18 | 2011-06-02 | Central Glass Co Ltd | Method for producing aromatic difluoroacetic ester |
US8802886B2 (en) | 2009-11-18 | 2014-08-12 | Central Glass Company, Limited | Method for producing aromatic difluoroacetic acid ester |
JP2011184316A (en) * | 2010-03-05 | 2011-09-22 | Central Glass Co Ltd | Method for preparing difluoroacetic acid ester |
JP2012167047A (en) * | 2011-02-14 | 2012-09-06 | Gunma Univ | Method for producing difluoromethyl heteroaryl compound |
US20210246098A1 (en) * | 2018-01-30 | 2021-08-12 | Daikin Industries, Ltd. | Electrolyte, electrochemical device, lithium ion secondary battery, and module |
US11945776B2 (en) * | 2018-01-30 | 2024-04-02 | Daikin Industries, Ltd. | Electrolyte, electrochemical device, lithium ion secondary battery, and module |
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CN114940647B (en) * | 2022-06-06 | 2023-05-26 | 龙岩学院 | Method for synthesizing ethyl fluoroacetate by using double solvents |
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