JP2000229987A - Production of 2-trialkylsilyl-2,2-difluoroacetic ester - Google Patents

Production of 2-trialkylsilyl-2,2-difluoroacetic ester

Info

Publication number
JP2000229987A
JP2000229987A JP11030843A JP3084399A JP2000229987A JP 2000229987 A JP2000229987 A JP 2000229987A JP 11030843 A JP11030843 A JP 11030843A JP 3084399 A JP3084399 A JP 3084399A JP 2000229987 A JP2000229987 A JP 2000229987A
Authority
JP
Japan
Prior art keywords
group
formula
trialkylsilyl
represented
ethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11030843A
Other languages
Japanese (ja)
Other versions
JP3560840B2 (en
Inventor
Kenji Uneyama
健治 宇根山
Takeshi Mizutani
剛 水谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP03084399A priority Critical patent/JP3560840B2/en
Publication of JP2000229987A publication Critical patent/JP2000229987A/en
Application granted granted Critical
Publication of JP3560840B2 publication Critical patent/JP3560840B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To efficiently produce the subject compound useful as a reagent for introducing difluoromethylene group to an organic compound or the like in high purity and high yield by electrolytically reducing a specific trifluoroacetic esters in the presence of a specified halogenated trialkylsilane. SOLUTION: Trifluoroacetic esters of formula I (R1 is a monovalent organic group) such as methyl trifluoroacetate are electrolytically reduced in the presence of a halogenated trialkylsilane of formula II (R2 is methyl, ethyl, propyl, isopropyl or phenyl; and X is chlorine, bromine or iodine) such as trimethylsilane chloride to provide the objective 2-trialkylsilyl-2,2-difluoroacetic ester such as ethyl 2-trimethylsilyl-2,2-difluoroacetate. Preferably, the R1 is an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkynyl group, a heteroaromatic group or the like.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、電解還元法による
2−トリアルキルシリル2,2−ジフルオロ酢酸エステ
ルの製造方法に関する。2−トリアルキルシリル2,2
−ジフルオロ酢酸エステルは有機化合物中にジフルオロ
メチレン基を導入する反応試剤または有機化合物の製造
中間体として有用である。
The present invention relates to a method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester by an electrolytic reduction method. 2-trialkylsilyl 2,2
-Difluoroacetic acid ester is useful as a reaction reagent for introducing a difluoromethylene group into an organic compound or as an intermediate for producing an organic compound.

【0002】[0002]

【従来の技術】近年、ジフルオロメチレン基を有する化
合物は特有の生物学的活性を持つことからその合成法が
注目されている。これまで、カルボニル基、チオカルボ
ニル基またはチオセタール基にDAST(ジメチルアミ
ノサルファトリフルオライド)や同様の作用をする酸化
的フッ素化剤を反応させてジフルオロメチレン基に変換
することがしばしば行われている。また、ハロジフルオ
ロメチル基を脱ハロゲンしてジフルオロメチレン基とす
る方法もよく知られている。
2. Description of the Related Art In recent years, a compound having a difluoromethylene group has a particular biological activity, and therefore its synthetic method has attracted attention. Heretofore, a carbonyl group, a thiocarbonyl group or a thiocetal group is often converted to a difluoromethylene group by reacting it with DAST (dimethylaminosulfur trifluoride) or an oxidizing fluorinating agent having a similar effect. A method of dehalogenating a halodifluoromethyl group to obtain a difluoromethylene group is also well known.

【0003】ジフルオロメチレン基の導入試剤として
は、ジフルオロケテンシリルアセタールがしばしばジフ
ルオロ−βアミノ、βヒドロキシエステルやβ−エトキ
シカルボニルジフルオロメチル−β−ラクタムの温和な
条件での合成に使用されてきた。しかし、ジフルオロケ
テンシリルアセタールは水分や亜鉛塩の存在で不安定で
あり、ハロジフルオロ酢酸塩のリフォーマトスキー反応
で調製して直ぐその場で(in situ)使用しなければなら
ない。
As a reagent for introducing a difluoromethylene group, difluoroketene silyl acetal has often been used for the mild synthesis of difluoro-β-amino, β-hydroxyester and β-ethoxycarbonyldifluoromethyl-β-lactam. However, difluoroketene silyl acetals are unstable in the presence of moisture and zinc salts and must be prepared and used in situ in a Reformatsky reaction of halodifluoroacetates.

【0004】トリフルオロ酢酸エチルを電解還元すると
クライゼン縮合生成物が主生成物として得られ2−トリ
アルキルシリル2,2−ジフルオロ酢酸エステルが少量
生成することが文献に記載されている(Novel Trends i
n Electroorg.,Synth., [Pap.Int.Symp.],3rd(1998),Me
eting Date 1997,299-300. Editor:S Torii)。
[0004] It has been described in the literature that when ethyl trifluoroacetate is electrolytically reduced, a Claisen condensation product is obtained as a main product and a small amount of 2-trialkylsilyl 2,2-difluoroacetate is formed (Novel Trends i).
n Electroorg., Synth., [Pap.Int.Symp.], 3rd (1998), Me
eting Date 1997,299-300. Editor: S Torii).

【0005】[0005]

【発明が解決しようとする課題】そこで、本発明ではジ
フルオロケテンシリルアセタールと同様の反応に適用で
きる安定であり単離できる化合物である2−トリアルキ
ルシリル2,2−ジフルオロ酢酸エステルを収率よく製
造する方法を提供する。
Therefore, in the present invention, 2-trialkylsilyl 2,2-difluoroacetic acid ester, which is a stable and isolable compound applicable to the same reaction as difluoroketene silyl acetal, is obtained in good yield. A method of manufacturing is provided.

【0006】[0006]

【課題を解決するための手段】本発明者らは、トリフル
オロ酢酸エステル類をハロゲン化トリアルキルシランの
存在と特定の条件の下で電解還元すると2−トリアルキ
ルシリル2,2−ジフルオロ酢酸エステルが収率よく得
られることを見いだし本発明に至った。
Means for Solving the Problems The present inventors electrolytically reduce trifluoroacetic acid esters in the presence of a halogenated trialkylsilane under specific conditions to obtain 2-trialkylsilyl 2,2-difluoroacetic acid esters. Was found to be obtained in good yield, and the present invention was achieved.

【0007】すなわち、本発明は一般式(1)That is, the present invention provides a compound represented by the general formula (1):

【0008】[0008]

【化3】 Embedded image

【0009】(式中、R1は一価の有機基を表す。)で
表されるトリフルオロ酢酸エステル類を一般式(2) (R23SiX (2) (式中、R2はそれぞれ独立にメチル基、エチル基、プ
ロピル基、イソプロピル基またはフェニル基を表し、X
は塩素、臭素またはヨウ素を表す。)で表されるハロゲ
ン化トリアルキルシラン存在下で電解還元することによ
る一般式(3)
[0009] (wherein, R 1 represents. A monovalent organic group) Formula (2) (R 2) 3 SiX (2) ( wherein trifluoroacetic acid ester represented by, R 2 is Each independently represents a methyl group, an ethyl group, a propyl group, an isopropyl group or a phenyl group;
Represents chlorine, bromine or iodine. Formula (3) by electrolytic reduction in the presence of a halogenated trialkylsilane represented by

【0010】[0010]

【化4】 Embedded image

【0011】(式中、TASはトリアルキルシリル基を
表し、R1は式(1)のR1と同じ置換基を表す。)で表
される2−トリアルキルシリル2,2−ジフルオロ酢酸
エステルの製造方法である。
[0011] (wherein, TAS represents a trialkylsilyl group, R 1 represents. The same substituents as R 1 in formula (1)) 2-trialkylsilyl-difluoro acetic ester represented by It is a manufacturing method of.

【0012】本発明にかかる一般式(1)で表されるト
リフルオロ酢酸エステル類は、特に限定されず、R1
表される一価の有機基が電解還元反応の条件下で不活性
であればよい。その様な有機基としては、炭素数1〜2
0の分岐を有することもあるアルキル基、アルケニル基
またはアルキニル基、炭素数1〜20の置換基を有する
こともあるシクロアルキル基、炭素数1〜20の置換基
を有することもあるアリール基、一般式(4) −(CH2n−R3 (4) (式中、R3は炭素数1〜10のシクロアルキル基、ア
リール基、アルコキシル基、チオアルコキシル基、3級
アミノ基、アシル基、アルコキシカルボニル基、複素芳
香族基を表し、nは1以上の整数を表す。)で表される
有機基などを挙げることができる。
The trifluoroacetic acid ester represented by the general formula (1) according to the present invention is not particularly limited, and the monovalent organic group represented by R 1 is inactive under the conditions of the electrolytic reduction reaction. I just need. Such organic groups include those having 1-2 carbon atoms.
An alkyl group which may have 0 branches, an alkenyl group or an alkynyl group, a cycloalkyl group which may have a substituent having 1 to 20 carbon atoms, an aryl group which may have a substituent having 1 to 20 carbon atoms, formula (4) - (CH 2) n -R 3 (4) ( wherein, R 3 is a cycloalkyl group having 1 to 10 carbon atoms, an aryl group, an alkoxyl group, thioalkoxyl group, tertiary amino group, an acyl Group, an alkoxycarbonyl group, or a heteroaromatic group, and n represents an integer of 1 or more.).

【0013】一般式(1)で表されるトリフルオロ酢酸
エステル類を具体的に例示すると、トリフルオロ酢酸メ
チル、トリフルオロ酢酸エチル、トリフルオロ酢酸n−
プロピル、トリフルオロ酢酸i−プロピル、トリフルオ
ロ酢酸n−ブチル、トリフルオロ酢酸s−ブチル、トリ
フルオロ酢酸t−ブチル、トリフルオロ酢酸n−ヘキシ
ル、トリフルオロ酢酸シクロヘキシル、トリフルオロ酢
酸フェニル、トリフルオロチオ酢酸S−t−ブチル、ト
リフルオロチオ酢酸S−フェニル、を挙げることができ
るが、これらに限られないのは言うまでもない。
Specific examples of the trifluoroacetates represented by the general formula (1) include methyl trifluoroacetate, ethyl trifluoroacetate and n-trifluoroacetate.
Propyl, i-propyl trifluoroacetate, n-butyl trifluoroacetate, s-butyl trifluoroacetate, t-butyl trifluoroacetate, n-hexyl trifluoroacetate, cyclohexyl trifluoroacetate, phenyl trifluoroacetate, trifluorothio St-butyl acetate and S-phenyl trifluorothioacetate can be mentioned, but it goes without saying that they are not limited to these.

【0014】本発明にかかる一般式(3)で表される2
−トリアルキルシリル2,2−ジフルオロ酢酸エステル
は、それぞれ一般式(1)のR1と同じ置換基R1を持つ
対応する2−トリアルキルシリル2,2−ジフルオロ酢
酸エステルである。
According to the present invention, 2 represented by the general formula (3)
-Trialkylsilyl 2,2-difluoroacetic acid esters are the corresponding 2-trialkylsilyl 2,2-difluoroacetic acid esters, each having the same substituent R 1 as R 1 in general formula (1).

【0015】本発明に使用するハロゲン化トリアルキル
シランとしては、特に限定されないが、一般式(2) (R23SiX (2) において、R2がそれぞれ独立にメチル基、エチル基、
プロピル基、イソプロピル基またはフェニル基を表し、
Xは塩素、臭素またはヨウ素を表すものが好ましい。好
ましいハロゲン化トリアルキルシランとしては、塩化ト
リメチルシラン、塩化トリエチルシラン、塩化フェニル
ジメチルシラン、塩化ジフェニルメチルシラン、臭化ト
リエチルシランなどを挙げることができる。これらの
内、塩化トリメチルシランは入手が容易で最も好まし
い。 本発明の方法において使用する溶媒は、本発明の
電解還元反応条件で不活性であればよく、ニトリル類、
例えば、アセトニトリル、プロピオニトリル、フェニル
アセトニトリル、イソブチロニトリル、ベンゾニトリ
ル、酸アミド類、例えば、ジメチルホルムアミド、ジメ
チルアセトアミド、メチルホルムアミド、ホルムアミ
ド、ヘキサメチルリン酸トリアミド、エーテル類、例え
ば、テトラヒドロフラン、1,2−ジメトキシエタン、
1,4−ジオキサン、ジエチルエーテル、1,2−エポ
キシエタンなどが使用され、アセトニトリル、ジメチル
ホルムアミド、テトラヒドロフランが好ましく、アセト
ニトリルが特に好ましい。
The halogenated trialkylsilane used in the present invention is not particularly limited, but in the general formula (2) (R 2 ) 3 SiX (2), R 2 independently represents a methyl group, an ethyl group,
Represents a propyl group, an isopropyl group or a phenyl group,
X preferably represents chlorine, bromine or iodine. Preferred examples of the halogenated trialkylsilane include trimethylsilane chloride, triethylsilane chloride, phenyldimethylsilane chloride, diphenylmethylsilane chloride, and triethylsilane bromide. Of these, trimethylsilane chloride is the most preferable because it is easily available. The solvent used in the method of the present invention may be any type as long as it is inert under the conditions of the electrolytic reduction reaction of the present invention.
For example, acetonitrile, propionitrile, phenylacetonitrile, isobutyronitrile, benzonitrile, acid amides such as dimethylformamide, dimethylacetamide, methylformamide, formamide, hexamethylphosphoric triamide, ethers such as tetrahydrofuran, 1 , 2-dimethoxyethane,
1,4-dioxane, diethyl ether, 1,2-epoxyethane and the like are used, and acetonitrile, dimethylformamide, and tetrahydrofuran are preferable, and acetonitrile is particularly preferable.

【0016】本発明の電解還元は従来から知られている
方法を適用して実施できる。本発明の方法に用いる電解
槽は、陽極陰極分離型のセル、または単一型のセルを使
用できる。分離型セルの場合隔膜としては、公知のイオ
ン交換膜、例えば、ナフィオン(デュポン社、登録商
標)膜、無機材質、例えば、ガラス、セラミックなどの
多孔質膜を例示できる。好ましくは分離型のセルを用い
る。
The electrolytic reduction of the present invention can be carried out by applying a conventionally known method. As the electrolytic cell used in the method of the present invention, an anode / cathode separation type cell or a single type cell can be used. In the case of the separation type cell, examples of the membrane include a well-known ion exchange membrane, for example, a Nafion (DuPont, registered trademark) membrane, and a porous membrane of an inorganic material, for example, glass or ceramic. Preferably, a separate cell is used.

【0017】本発明の方法に使用する支持電解質として
はテトラアルキルアンモニウム塩またはリチウム塩が好
ましい。テトラアルキルアンモニウム塩のアルキル基と
してはC1からC6の低級アルキル基が好ましい。塩の陰
イオンとしてはハロゲン化物イオンや過塩素酸イオンや
テトラフルオロホウ酸イオンやp−トルエンスルホナー
トイオンやp−トルエンスルホナートイオンが好まし
い。具体的に本発明の方法に用いられる好ましい支持電
解質としてはテトラエチルアンモニウムテトラフルオロ
ボレート(Et4NBF4)、テトラブチルアンモニウム
テトラフルオロボレート(Bu4NBF4)、臭化テトラ
エチルアンモニウム(Et4NBr)、臭化テトラブチ
ルアンモニウム(Bu4NBr)、過塩素酸テトラエチ
ルアンモニウム(Bu4ClO4)、過塩素酸テトラブチ
ルアンモニウム(Bu4NClO4)、臭化リチウム(L
iBr)等のハロゲン化リチウム、過塩素酸リチウム
(LiClO4)等が挙げられる。これらのなかでも、
特に臭化テトラブチルアンモニウム、過塩素酸リチウム
が好ましい。また、n−Bu4NBr−アセトニトリ
ル、LiClO4−DMF、LiClO4−アセトニトリ
ルの支持電解質−溶媒の系は特に好ましい組み合わせと
して例示することができる。支持電解質の濃度としては
0.01〜10mol/リットルが好ましい。
The supporting electrolyte used in the method of the present invention is preferably a tetraalkylammonium salt or a lithium salt. As the alkyl group of the tetraalkylammonium salt, a C 1 to C 6 lower alkyl group is preferable. As the anion of the salt, a halide ion, perchlorate ion, tetrafluoroborate ion, p-toluenesulfonate ion or p-toluenesulfonate ion is preferable. Specifically, preferred supporting electrolytes used in the method of the present invention include tetraethylammonium tetrafluoroborate (Et 4 NBF 4 ), tetrabutylammonium tetrafluoroborate (Bu 4 NBF 4 ), tetraethylammonium bromide (Et 4 NBr), Tetrabutylammonium bromide (Bu 4 NBr), tetraethylammonium perchlorate (Bu 4 ClO 4 ), tetrabutylammonium perchlorate (Bu 4 NClO 4 ), lithium bromide (L
lithium halide such as iBr) and lithium perchlorate (LiClO 4 ). Of these,
Particularly, tetrabutylammonium bromide and lithium perchlorate are preferred. Further, n-Bu 4 NBr- acetonitrile, LiClO 4 -DMF, LiClO 4 - supporting electrolyte acetonitrile - system of the solvent can be exemplified as particularly preferable combination. The concentration of the supporting electrolyte is preferably 0.01 to 10 mol / liter.

【0018】本発明の製造方法に用いられる陽極材料と
しては、特に限定されず、従来公知の材料が広く使用で
きる。分離型セルを使用した場合の陽極材料としては、
鉛、炭素、白金が好ましい。
The anode material used in the production method of the present invention is not particularly limited, and conventionally known materials can be widely used. As the anode material when using a separation type cell,
Lead, carbon and platinum are preferred.

【0019】本発明の製造法に用いられる陰極材料とし
ては、特に限定されず、従来公知の材料を広く使用でき
る。好ましいものとしては、鉛、白金、ステンレススチ
ール、亜鉛、マグネシウム、ニッケル、アルミニウム、
および炭素である。
The cathode material used in the production method of the present invention is not particularly limited, and conventionally known materials can be widely used. Preferred are lead, platinum, stainless steel, zinc, magnesium, nickel, aluminum,
And carbon.

【0020】本発明の製造方法での電流密度としては1
〜1000mA/cm2が好ましい。本発明の方法で流
す電気の量は理論的には一つのフッ素の還元に2F/m
olであるが、過剰に通電しても差し支えない。通常、
2〜40F/molで実施される。
The current density in the manufacturing method of the present invention is 1
〜1000 mA / cm 2 is preferred. The amount of electricity passed by the method of the present invention is theoretically 2 F / m
Although it is ol, it does not matter even if the current is excessively supplied. Normal,
Performed at 2-40 F / mol.

【0021】本発明の製造方法を実施する反応温度は−
40〜100℃の範囲であり、好ましくは−20〜80
℃である。低温においては、ケテンシリルアセタールが
生成しやすくなるため2−トリアルキルシリル2,2−
ジフルオロ酢酸エステルの収率が低下するため好ましく
ない。
The reaction temperature for carrying out the production method of the present invention is-
40 to 100 ° C., preferably −20 to 80 ° C.
° C. At a low temperature, ketene silyl acetal is likely to be formed, so that 2-trialkylsilyl 2,2-
It is not preferable because the yield of difluoroacetic acid ester is reduced.

【0022】本発明の方法におけるハロゲン化トリアル
キルシランの使用量は、トリフルオロメチルケトン類の
2〜50モル倍であり、3〜10モル倍程度が好まし
い。明確ではないが、本発明の方法においては、ハロゲ
ン化トリアルキルシランは反応試剤としてだけでなく、
一部は脱離したフッ素イオンの捕捉剤として作用してい
るものと考えられるので、1モル倍以上のハロゲン化ト
リアルキルシランが必要である。さらに、ハロゲン化ト
リアルキルシランの量が2モル倍より少ない場合には、
生成物がクライゼン縮合した生成物を副生するため目的
生成物の収率が低下することがあり好ましくない。ま
た、電解還元に使用する電気量により必要なハロゲン化
トリアルキルシランの量は異なるが、最も好ましい電気
量である2F/mol程度では2モル倍以上であること
が好ましい。
The amount of the halogenated trialkylsilane used in the method of the present invention is 2 to 50 times, preferably about 3 to 10 times, that of trifluoromethyl ketones. Although not clear, in the method of the present invention, the halogenated trialkylsilane is not only used as a reaction reagent,
It is considered that a part thereof acts as a scavenger for the detached fluorine ions, so that 1 mol times or more of the halogenated trialkylsilane is required. Furthermore, when the amount of the halogenated trialkylsilane is less than 2 mole times,
Since the product is a by-product of Claisen condensation, the yield of the target product may decrease, which is not preferable. Although the necessary amount of the trialkylsilane halide varies depending on the amount of electricity used for electrolytic reduction, it is preferably at least 2 mol times at the most preferred amount of electricity of about 2 F / mol.

【0023】本発明の方法においては、トリフルオロ酢
酸エステル類の種類によっては生成物が不安定な場合が
あるので、還元反応の終了後または反応前に、陰極室液
に塩基類、例えば、トリメチルアミン、トリエチルアミ
ン、トリプロピルアミン、トリブチルアミンなどの脂肪
族第三アミン、ジメチルアミン、ジエチルアミン、ジプ
ロピルアミンなどの脂肪族第二アミン、メチルアミン、
エチルアミン、プロピルアミンなどの第一アミン、シク
ロヘキシルアミンなどの脂環式アミン、ジメチルアニリ
ン、ジエチルアニリンなどの芳香族アミンなどを添加す
ることが好ましい。
In the method of the present invention, since the product may be unstable depending on the kind of trifluoroacetates, bases such as trimethylamine are added to the catholyte after or before the completion of the reduction reaction. , Triethylamine, tripropylamine, aliphatic tertiary amines such as tributylamine, dimethylamine, diethylamine, aliphatic secondary amines such as dipropylamine, methylamine,
It is preferable to add primary amines such as ethylamine and propylamine, alicyclic amines such as cyclohexylamine, and aromatic amines such as dimethylaniline and diethylaniline.

【0024】本発明の方法によって製造される2−トリ
アルキルシリル2,2−ジフルオロ酢酸エステルは、下
式に示すようにフッ素イオンの存在下において親電子試
薬、特に限定されないが例えばベンズアルデヒド、ベン
ゾイルブロマイド、ベンジルクロライドなどとアルキル
化反応を進行させることができる。
The 2-trialkylsilyl 2,2-difluoroacetic acid ester produced by the method of the present invention can be used as an electrophilic reagent in the presence of a fluorine ion as shown in the following formula. , Benzyl chloride and the like can proceed the alkylation reaction.

【0025】[0025]

【化5】 Embedded image

【0026】ここで、Eは前記親電子試薬に対応して、
PhCH(OH)−、PhCH2−、PhCO−をそれ
ぞれ表す。F−イオンとしては、テトラブチルアンモニ
ウムフルオライド等の四級アンモニウムフルオライド、
フッ化カリウム等のアルカリ金属フッ化物(ヨウ化銅等
の助触媒を使用することもある。)などを適宜使用でき
る。また、溶媒としてはTHF、DMFなど本発明の方
法において使用される前記溶媒を使用できる。反応温度
は試剤の種類により異なるが、−78〜150℃程度で
ある。
Here, E corresponds to the electrophilic reagent,
PhCH (OH) -, PhCH 2 -, respectively represent PhCO-. As the F- ion, a quaternary ammonium fluoride such as tetrabutylammonium fluoride;
An alkali metal fluoride such as potassium fluoride (a co-catalyst such as copper iodide may be used) can be used as appropriate. Further, as the solvent, the above-mentioned solvent used in the method of the present invention such as THF and DMF can be used. The reaction temperature varies depending on the type of the reagent, but is about -78 to 150 ° C.

【0027】以下に実施例をもって本発明を説明する
が、これらの実施態様に限定されるものではない。
Hereinafter, the present invention will be described with reference to Examples, but the present invention is not limited to these Examples.

【0028】[0028]

【実施例】〔実施例1〕H型電解セルに臭化テトラブチ
ルアンモニウム(4.8g、12.0mmol、2.4
当量)を陽極側に量り取り、回転子を両極室に入れ、陽
極側に炭素棒、陰極側に鉛板(10cm2)を取り付け
た。アルゴン雰囲気下、アセトニトリルを両極室に35
mlづつ加え、続いてトリフルオロ酢酸エチル(0.7
1g、5.0mmol、1.0当量)、塩化トリメチル
シラン(2.5ml、20.0mmol、4.0当
量)、トリエチルアミン(2.8ml、20.0mmo
l、4.0当量)を加えた。混合物を50℃、定電流8
0mAで2.0F/モル(201分)通電した。通電終
了後、陰極室の反応液を減圧留去し濃縮した。得られた
粘性液体をヘキサンで抽出し濃縮した。得られた液体を
蒸留により精製し目的生成物を収率47%で得た。
EXAMPLES Example 1 Tetrabutylammonium bromide (4.8 g, 12.0 mmol, 2.4) was placed in an H-type electrolytic cell.
) Was weighed on the anode side, the rotor was placed in the bipolar chamber, and a carbon rod was attached to the anode side, and a lead plate (10 cm 2 ) was attached to the cathode side. Under an argon atmosphere, acetonitrile was added to the bipolar chamber at 35
ml, followed by ethyl trifluoroacetate (0.7
1 g, 5.0 mmol, 1.0 equiv), trimethylsilane chloride (2.5 ml, 20.0 mmol, 4.0 equiv), triethylamine (2.8 ml, 20.0 mmol)
1, 4.0 equivalents). The mixture was heated at 50 ° C. and constant current
A current of 2.0 F / mol (201 minutes) was applied at 0 mA. After the completion of the current supply, the reaction solution in the cathode chamber was distilled off under reduced pressure and concentrated. The obtained viscous liquid was extracted with hexane and concentrated. The obtained liquid was purified by distillation to obtain a target product in a yield of 47%.

【0029】2−トリメチルシリル2,2−ジフルオロ
酢酸エチル1 H−NMR(200MHz、CDCl3);δ0.23
(s、9H)、1.34(t、3H、J=7.0H
z)、4.31(q、2H、J=7.2Hz)19 F−NMR(188MHz、CDCl3);δ38.
5(s、2F) IR(neat)2976,1756,1372,12
76,1114cm-1 〔実施例2〕トリフルオロ酢酸エチルに代えてトリフル
オロ酢酸t−ブチル(0.85g、5.0mmol、
1.0当量)について実施例1と同じ処理をしたとこ
ろ、2−トリメチルシリル2,2−ジフルオロ酢酸t−
ブチルを収率58%で得た。
Ethyl 2-trimethylsilyl 2,2-difluoroacetate 1 H-NMR (200 MHz, CDCl 3 ); δ 0.23
(S, 9H), 1.34 (t, 3H, J = 7.0H
z), 4.31 (q, 2H, J = 7.2 Hz) 19 F-NMR (188 MHz, CDCl 3 );
5 (s, 2F) IR (neat) 2976, 1756, 1372, 12
76,1114Cm -1 Example 2 trifluoroacetic acid t- butyl instead of ethyl trifluoroacetate (0.85 g, 5.0 mmol,
1.0 equivalent), and the same treatment as in Example 1 was carried out. As a result, 2-trimethylsilyl 2,2-difluoroacetic acid t-
Butyl was obtained with a yield of 58%.

【0030】1H−NMR(200MHz、CDC
3);δ0.22(s、9H)、1.52(s、9
H)19 F−NMR(188MHz、CDCl3);δ38.
9(s、2F) IR(neat)2984,2964,1760,15
96,1462,1398,1292,1112cm-1 〔実施例3〕トリフルオロ酢酸エチルに代えてトリフル
オロ酢酸n−ヘキシル(1.0g、5.0mmol、
1.0当量)について実施例1と同じ処理をしたとこ
ろ、2−トリメチルシリル2,2−ジフルオロ酢酸n−
ヘキシルを収率62%で得た。
1 H-NMR (200 MHz, CDC
l 3 ); δ 0.22 (s, 9H), 1.52 (s, 9
H) 19 F-NMR (188 MHz, CDCl 3 );
9 (s, 2F) IR (neat) 2984, 2964, 1760, 15
96, 1462, 1398, 1292, 1112 cm -1 [Example 3] n-hexyl trifluoroacetate (1.0 g, 5.0 mmol,
1.0 equivalent), and the same treatment as in Example 1 was carried out. As a result, 2-trimethylsilyl 2,2-difluoroacetic acid n-
Hexyl was obtained with a yield of 62%.

【0031】1H−NMR(200MHz、CDC
3);δ0.23(s、9H)、0.89(t、3
H、J=6.6Hz)、1.30−1.41(m、6
H)、1.62−1.72(m、2H)、4.23
(t、2H、J=6.8Hz)19 F−NMR(188MHz、CDCl3);δ38.
7(s、2F) IR(neat)2968,2868,1756,14
70,1278,1198cm-1 〔実施例4〕反応温度を0℃として実施例3と同じ実験
を行ったところ、2−トリメチルシリル2,2−ジフル
オロ酢酸n−ヘキシルを収率41%で得た。19F−NM
Rで分析したところ反応生成物中には18%の1−n−
ヘキシル−2,2−ジフルオロケテントリメチルシリル
アセタールが生成していた。
1 H-NMR (200 MHz, CDC
l 3 ); δ 0.23 (s, 9H), 0.89 (t, 3
H, J = 6.6 Hz), 1.30-1.41 (m, 6
H) 1.62-1.72 (m, 2H), 4.23
(T, 2H, J = 6.8 Hz) 19 F-NMR (188 MHz, CDCl 3 );
7 (s, 2F) IR (neat) 2968, 2868, 1756, 14
70,1278,1198Cm -1 Example 4 where the reaction temperature was subjected to the same experiment as in Example 3 as a 0 ° C., to obtain a 2-trimethylsilyl difluoro acetate n- hexyl in 41% yield. 19 F-NM
When analyzed by R, 18% of 1-n-
Hexyl-2,2-difluoroketene trimethylsilyl acetal was formed.

【0032】〔参考例1〕塩化トリメチルシランの量を
1.0当量(0.6ml、5.0mmolとし、反応温
度を0℃として実施例1と同じ実験を行ったところ、2
−トリメチルシリル2,2−ジフルオロ酢酸エチルの収
率は5%以下であり、33%のトリフルオロ酢酸エチル
が回収された。19F−MNRで分析したところ反応生成
物中には21%の2−トリフルオロメチルカルボニル
2,2−ジフルオロ酢酸エチルエステルが生成してい
た。
REFERENCE EXAMPLE 1 The same experiment as in Example 1 was carried out by setting the amount of trimethylsilane chloride to 1.0 equivalent (0.6 ml, 5.0 mmol, and the reaction temperature to 0 ° C.).
The yield of ethyl trimethylsilyl 2,2-difluoroacetate was 5% or less, and 33% of ethyl trifluoroacetate was recovered. Analysis by 19 F-MNR revealed that 21% of 2-trifluoromethylcarbonyl 2,2-difluoroacetic acid ethyl ester was formed in the reaction product.

【0033】[0033]

【発明の効果】本発明の製造方法によると、原料入手の
容易なトリフルオロ酢酸エステル類を原料として、有機
合成反応において有用な2−トリアルキルシリル2,2
−ジフルオロ酢酸エステルを一段階で収率よく製造でき
るという効果を奏する。
According to the production method of the present invention, 2-trifluoroalkylsilyl 2,2 useful in an organic synthesis reaction is obtained from trifluoroacetates which are easily available.
-It has an effect that difluoroacetic acid ester can be produced in one step with high yield.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 一般式(1) 【化1】 (式中、R1は一価の有機基を表す。)で表されるトリ
フルオロ酢酸エステル類を一般式(2) (R23SiX (2) (式中、R2はそれぞれ独立にメチル基、エチル基、プ
ロピル基、イソプロピル基またはフェニル基を表し、X
は塩素、臭素またはヨウ素を表す。)で表されるハロゲ
ン化トリアルキルシラン存在下で電解還元することによ
る一般式(3) 【化2】 (式中、TASはトリアルキルシリル基を表し、R1
式(1)のR1と同じ置換基を表す。)で表される2−
トリアルキルシリル2,2−ジフルオロ酢酸エステルの
製造方法。
1. A compound of the general formula (1) (Wherein R 1 represents a monovalent organic group) represented by the general formula (2) (R 2 ) 3 SiX (2) (wherein R 2 is each independently X represents a methyl group, an ethyl group, a propyl group, an isopropyl group or a phenyl group;
Represents chlorine, bromine or iodine. Formula (3) by electrolytic reduction in the presence of a halogenated trialkylsilane represented by formula (3): (Wherein, TAS represents a trialkylsilyl group, R 1 represents. The same substituents as R 1 in formula (1)) represented by 2-
A method for producing a trialkylsilyl 2,2-difluoroacetic acid ester.
【請求項2】 一価の有機基がアルキル基、シクロアル
キル基、アリール基、アルケニル基、アルキニル基、複
素芳香族基または一般式(4) −(CH2n−R3 (4) (式中、R3はシクロアルキル基、アリール基、アルコ
キシル基、チオアルコキシル基、3級アミノ基、アシル
基、アルコキシカルボニル基、複素芳香族基を表し、n
は1以上の整数を表す。)で表される有機基である請求
項1記載の2−トリアルキルシリル2,2−ジフルオロ
酢酸エステルの製造方法。
2. The monovalent organic group is an alkyl group, a cycloalkyl group, an aryl group, an alkenyl group, an alkynyl group, a heteroaromatic group or a compound of the general formula (4)-(CH 2 ) n -R 3 (4) (wherein, R 3 represents a cycloalkyl group, an aryl group, an alkoxyl group, a thioalkoxyl group, a tertiary amino group, an acyl group, an alkoxycarbonyl group, a heteroaromatic group, and n
Represents an integer of 1 or more. The method for producing a 2-trialkylsilyl 2,2-difluoroacetic acid ester according to claim 1, which is an organic group represented by the formula:
JP03084399A 1999-02-09 1999-02-09 Method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester Expired - Fee Related JP3560840B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP03084399A JP3560840B2 (en) 1999-02-09 1999-02-09 Method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP03084399A JP3560840B2 (en) 1999-02-09 1999-02-09 Method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester

Publications (2)

Publication Number Publication Date
JP2000229987A true JP2000229987A (en) 2000-08-22
JP3560840B2 JP3560840B2 (en) 2004-09-02

Family

ID=12314994

Family Applications (1)

Application Number Title Priority Date Filing Date
JP03084399A Expired - Fee Related JP3560840B2 (en) 1999-02-09 1999-02-09 Method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester

Country Status (1)

Country Link
JP (1) JP3560840B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011062033A1 (en) * 2009-11-18 2011-05-26 セントラル硝子株式会社 Preparation method for aromatic difluoroacetic acid ester
JP2011184316A (en) * 2010-03-05 2011-09-22 Central Glass Co Ltd Method for preparing difluoroacetic acid ester
JP2012167047A (en) * 2011-02-14 2012-09-06 Gunma Univ Method for producing difluoromethyl heteroaryl compound
US20210246098A1 (en) * 2018-01-30 2021-08-12 Daikin Industries, Ltd. Electrolyte, electrochemical device, lithium ion secondary battery, and module
CN114940647A (en) * 2022-06-06 2022-08-26 龙岩学院 Method for synthesizing ethyl fluoroacetate by using double solvents

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011062033A1 (en) * 2009-11-18 2011-05-26 セントラル硝子株式会社 Preparation method for aromatic difluoroacetic acid ester
JP2011105658A (en) * 2009-11-18 2011-06-02 Central Glass Co Ltd Method for producing aromatic difluoroacetic ester
US8802886B2 (en) 2009-11-18 2014-08-12 Central Glass Company, Limited Method for producing aromatic difluoroacetic acid ester
JP2011184316A (en) * 2010-03-05 2011-09-22 Central Glass Co Ltd Method for preparing difluoroacetic acid ester
JP2012167047A (en) * 2011-02-14 2012-09-06 Gunma Univ Method for producing difluoromethyl heteroaryl compound
US20210246098A1 (en) * 2018-01-30 2021-08-12 Daikin Industries, Ltd. Electrolyte, electrochemical device, lithium ion secondary battery, and module
US11945776B2 (en) * 2018-01-30 2024-04-02 Daikin Industries, Ltd. Electrolyte, electrochemical device, lithium ion secondary battery, and module
CN114940647A (en) * 2022-06-06 2022-08-26 龙岩学院 Method for synthesizing ethyl fluoroacetate by using double solvents
CN114940647B (en) * 2022-06-06 2023-05-26 龙岩学院 Method for synthesizing ethyl fluoroacetate by using double solvents

Also Published As

Publication number Publication date
JP3560840B2 (en) 2004-09-02

Similar Documents

Publication Publication Date Title
EP2662352B1 (en) Method for Producing Phenylacetamide Compound
US8975448B2 (en) Process for preparing 2,2-difluoroethanol
Elinson et al. Electrochemical transformation of malononitrile and carbonyl compounds into functionally substituted cyclopropanes: electrocatalytic variant of the Wideqvist reaction
US20210230132A1 (en) Preparation of 3-hydroxy-3,6-dimethylhexahydrobenzofuran-2-one and derivatives thereof
US5013412A (en) Process for the electrosynthesis of a beta,gamma-unsaturated ester
JP2000229987A (en) Production of 2-trialkylsilyl-2,2-difluoroacetic ester
Ishifune et al. Electroreduction of aromatics using magnesium electrodes in aprotic solvents containing alcoholic proton donors
JP5313579B2 (en) Process for producing novel fluorinated 1,2-oxathiolane 2,2-dioxide
JP3560790B2 (en) Method for producing 2,2-difluoroenolsilyl ether
JPH09255611A (en) Production of fluorine-containing dicarbonyl compound
US20070004942A1 (en) Method of preparation of an alkyne with an optically active hydroxyl group in the beta or gamma position of a triple bond and intermediates obtained
US4988416A (en) Process for the electrosynthesis of aldehydes
US20100222613A1 (en) Method for producing halogen-substituted benzenedimethanol
JP3435522B2 (en) Process for producing difluorobenzodioxole and chlorofluorobenzodioxole
JP3301210B2 (en) Method for producing aliphatic acid fluoride
JP3560905B2 (en) Method for producing 2-trialkylsilyl 2,2-difluoroacetic acid ester
Kise et al. Electroreductive synthesis of acylsilanes from acylimidazoles
Stepanov Organoelement compounds in the electrochemical synthesis of fluoroorganics
JP2006298872A (en) Manufacturing method of 1-fluoro-1-phenylthioethene
JP4189631B2 (en) Method for producing fluorine-containing fluorosulfonylalkyl vinyl ether
JP4123709B2 (en) Preparation of aromatic acrylonitrile derivatives
JPH0116917B2 (en)
JP4108311B2 (en) Method for producing 1-acyl-1-cyclopropanecarboxylic acid ester derivative
Elinson et al. Stereoselective electrocatalytic cyclization of 3-substituted 2, 2-dicyanocyclopropane-1, 1-dicarboxylic acid esters to form 6-substituted (1 R, 5 R, 6 R)*-4, 4-dialkoxy-5-cyano-2-oxo-3-azabicyclo [3.1. 0] hexane-1-carboxylic acid esters
Yang et al. Defluorinations of fluoroformal and fluoroether to fluorocarbonate and fluoroester

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20040525

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20040526

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090604

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090604

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090604

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100604

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100604

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110604

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110604

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110604

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120604

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120604

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120604

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130604

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130604

Year of fee payment: 9

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130604

Year of fee payment: 9

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees