JP2000228167A - Shaft seal supporting base having current reflux mechanism - Google Patents
Shaft seal supporting base having current reflux mechanismInfo
- Publication number
- JP2000228167A JP2000228167A JP11030771A JP3077199A JP2000228167A JP 2000228167 A JP2000228167 A JP 2000228167A JP 11030771 A JP11030771 A JP 11030771A JP 3077199 A JP3077199 A JP 3077199A JP 2000228167 A JP2000228167 A JP 2000228167A
- Authority
- JP
- Japan
- Prior art keywords
- shaft
- current
- axis
- shaft seal
- supporting base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010992 reflux Methods 0.000 title abstract 2
- 239000007788 liquid Substances 0.000 claims abstract description 5
- 238000007789 sealing Methods 0.000 claims description 16
- 239000004020 conductor Substances 0.000 claims description 4
- 230000006378 damage Effects 0.000 abstract description 4
- 238000010894 electron beam technology Methods 0.000 description 9
- 238000003825 pressing Methods 0.000 description 8
- 238000005468 ion implantation Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 229910001338 liquidmetal Inorganic materials 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、電流還流機構を有
する軸封支持台に係り、特に、イオン注入装置の帯電抑
制装置における電流回収装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a shaft seal support having a current recirculation mechanism, and more particularly to a current recovery device in a charge suppressing device of an ion implantation device.
【０００２】[0002]
【従来の技術】従来のイオン注入装置においては、打ち
込みに使うイオンを生成し、ビームとして引き出すイオ
ン源、該イオン源からのビームを質量分離器、ビーム走
査器をへてイオン打ち込み室において、ターゲット、例
えば、ウエハにイオンが注入されていた。該注入時にお
いて、該注入イオンによるターゲットの帯電のため、正
規の電位差が保たれず、機能の低下を来したり、さらに
該ウエハがイオンビームにより帯電し、帯電電荷の放電
により破損され、該ウエハ特に、表面酸化膜に穿孔の生
じる恐れがあつた。2. Description of the Related Art In a conventional ion implantation apparatus, an ion source for generating ions to be used for implantation and extracting it as a beam, a beam from the ion source is passed through a mass separator and a beam scanner, and a target is placed in an ion implantation chamber. For example, ions have been implanted into a wafer. At the time of the implantation, due to the charging of the target by the implanted ions, the normal potential difference is not maintained, and the function is reduced.In addition, the wafer is charged by the ion beam and damaged by the discharge of the charged charge, Drilling may occur in the wafer, especially in the surface oxide film.
【０００３】該帯電に対して、種々の防止対策が提案さ
れている。例えば、前記イオンビームの側方に配され、
該イオンビームに対して電子ビームを発生する電子銃を
設け、該電子銃から発射された電子ビームにより該ウエ
ハ上の帯電を中和するものがあった。また、該ウエハ
に、該イオンビームを照射すると同時に、電子シャワを
浴びせて、該ウエハの帯電を防止するものがある。Various measures have been proposed to prevent the charging. For example, disposed on the side of the ion beam,
In some cases, an electron gun for generating an electron beam for the ion beam is provided, and the electron beam emitted from the electron gun neutralizes the charge on the wafer. Further, there is a type in which the wafer is exposed to an electron shower at the same time as being irradiated with the ion beam to prevent the wafer from being charged.
【０００４】上記のような電子線の照射による帯電の防
止は、該イオンビームの帯電を中和することが十分でな
く、さらに、電子銃のフイラメントから汚染物がでると
いう欠点もあった。これらに対する一手法として、該ウ
エハ上の帯電電荷を該ウエハの支持部材を介して逃がす
方法も提案されていた。[0004] The above-described prevention of electrification by irradiation with an electron beam does not sufficiently neutralize the electrification of the ion beam, and further has the disadvantage that contaminants are generated from the filament of the electron gun. As a method for solving these problems, a method has been proposed in which the charged charge on the wafer is released through a support member of the wafer.
【０００５】一方、例えば、イオン注入装置において
は、真空容器内で、イオン注入の対象物を試料台に載置
し、該試料台を回転させながら該ウエハの位置決めを
し、イオンビームを照射し、イオンを注入する。該真空
容器内へ該試料台の回転の運動作用を導入するための回
転駆動軸に関して、真空部と他の、例えば大気圧力部と
の境界部分に封止機能を持たせるものとして、磁気シ−
ル装置がある。On the other hand, for example, in an ion implantation apparatus, an object to be ion-implanted is placed on a sample table in a vacuum vessel, the wafer is positioned while rotating the sample table, and an ion beam is irradiated. , Implant ions. Regarding a rotary drive shaft for introducing the rotational motion of the sample stage into the vacuum vessel, a magnetic seal is provided at a boundary portion between the vacuum section and another section, for example, the atmospheric pressure section, to have a sealing function.
Device.
【０００６】該磁気シ−ル装置を利用している装置に
は、該イオン注入装置のような半導体製造装置やＸ線発
生装置などがあり、これらにおいては、真空雰囲気内や
特殊ガス雰囲気中で電子ビ−ムが使用されたりもしくは
イオン電流が利用されたりしている。このため、電流通
路の確保、すなわち該回転軸を通して電流の還流を行い
電源部との間に定められた電位差を保つ必要がある。Devices using the magnetic seal device include a semiconductor manufacturing device such as the ion implantation device and an X-ray generation device. In these devices, in a vacuum atmosphere or a special gas atmosphere. E-beams or ionic currents are used. For this reason, it is necessary to secure a current path, that is, to circulate the current through the rotating shaft to maintain a predetermined potential difference with the power supply unit.
【０００７】例えば、Ｘ線源装置では、図示しないが高
電圧を保つよう絶縁物を用いて形成した容器壁が用いら
れており電子ビ−ム発生部により電子ビームを発生し供
給されていた。該電子ビ−ムは、対陰極タ−ゲット部分
に衝突し、Ｘ線を放射する。そして、該電子ビ−ムは、
このタ−ゲット部分から再び電流として、前記回転軸を
通り回収され、定められた電位差を保つように構成され
ていた。例えば、該タ−ゲット部分の電位を一定に、例
えばゼロ電位に近くするため、当該タ−ゲットおよびこ
れに連結する回転軸と筐体の部分の電位を同一にし、こ
れをアース電位にしておく方法が取られている。For example, in the X-ray source device, although not shown, a container wall formed of an insulator so as to maintain a high voltage is used, and an electron beam is generated and supplied by an electron beam generator. The electron beam collides with the anti-cathode target portion and emits X-rays. And the electron beam is
The current was again recovered from the target portion as a current through the rotating shaft, and was configured to maintain a predetermined potential difference. For example, in order to make the potential of the target portion constant, for example, close to zero potential, the potential of the target and the rotating shaft connected to the target and the housing portion are made the same, and this is set to the ground potential. The way has been taken.
【０００８】該電流を還流する確実な手段がないと、該
電流は、軸受け部であるベアリングを通じて還流される
ことになる。該還流の電路となるベアリングを構成する
ボ−ルは停止中においてはレ−スとの間が接触している
ので還流される。しかし、回転中においては、該ベアリ
ングのレ−スとボ−ルの間に、潤滑のためのオイルやグ
リ−スの薄膜が形成されているので、該ベアリングのレ
−スとボ−ルの間が絶縁されることになる。このため、
該電流の還流が十分行なえなかったり、さらに放電が惹
起され、該放電を通じて、還流することになる。[0008] Without a reliable means of circulating the current, the current will be circulated through the bearings. The ball constituting the bearing, which serves as an electric circuit for the return, is returned during stoppage because it is in contact with the race. However, during rotation, a thin film of oil or grease for lubrication is formed between the race and the ball of the bearing. The space between them will be insulated. For this reason,
The current cannot be sufficiently refluxed, or further discharge is caused, and the current is refluxed through the discharge.
【０００９】該放電により、該ベアリングのレ−スやボ
−ルの接触表面は変形し、いわゆる電食現象を起こし、
ついには機械的破壊に到ってしまうことがある。この現
象を防止するためは、通常、回転軸に、該電流を還流さ
せるためのスリップリングやブラシを設けて還流を確実
にすると共に、該電流がベアリング部で放電することを
防止している。Due to the discharge, the contact surface of the bearing race or ball is deformed, causing a so-called electrolytic corrosion phenomenon.
Eventually it can lead to mechanical destruction. To prevent this phenomenon, a slip ring or a brush for circulating the electric current is usually provided on the rotating shaft to ensure the circulating current, and to prevent the electric current from being discharged at the bearing portion.
【００１０】このような対策をした従来技術を、図４を
参照して説明する。図４は、従来の電流還流機構を備え
た軸封支持台における集電機構の説明図である。図４分
図（ａ）は、集電機構の断面図、図４分図（ｂ）は、図
４分図（ａ）の集電機構の軸方向のＡ−Ａ′断面図であ
る。図４分図（ｂ）において、軸受けを構成する２個の
ベアリング１１，１３の軸方向の間隔を保持するため、
該ベアリング１１，１３の外側レ−ス１１ａ，１３ａを
規制する円筒カラ−１２の内側に設けた部材１５に燐青
銅製のバネ板１６が取付けられている。図４分図
（ａ），（ｂ）に如く、その端部に炭素含有銅からなる
カ−ボンブラシ１８を搭載し、該ベアリングの内側レ−
ス１１ｂ，１３ｂ内に内装させた回転軸１４に接触させ
ている。[0010] A conventional technique taking such measures will be described with reference to FIG. FIG. 4 is an explanatory diagram of a current collecting mechanism in a shaft sealing support provided with a conventional current return mechanism. FIG. 4A is a cross-sectional view of the current collecting mechanism, and FIG. 4B is an axial cross-sectional view of the current collecting mechanism taken along the line AA ′ of FIG. 4A. In FIG. 4 (b), in order to maintain the axial distance between the two bearings 11 and 13 constituting the bearing,
A spring plate 16 made of phosphor bronze is attached to a member 15 provided inside a cylindrical collar 12 for regulating outer races 11a and 13a of the bearings 11 and 13. As shown in FIGS. 4 (a) and 4 (b), a carbon brush 18 made of carbon-containing copper is mounted on the end thereof, and the inner rail of the bearing is mounted.
The shaft 11b is in contact with the rotating shaft 14 provided inside the shafts 11b and 13b.
【００１１】図４分図（ａ）において、該回転軸１４
が、図示しないイオン注入装置等が使用されている状態
では、回転するために、該ブラシ１８とは回転接触とな
る。なお、カ−ボンブラシ１８の搭載端側と反対端側の
板バネ部は、円筒カラ−１２とネジまたは鋲により固定
されている。図示しないが、回転軸１４の最左部の対陰
極タ−ゲットに衝突した電子ビ−ムは、回転軸１４、カ
−ボン製の接触ブラシ１８、板バネ１６を経て円筒カラ
−１２に到り、固定部分に戻ることになる。このように
して、電流を還流しまた電食を引き起こす電流をベアリ
ングに流さぬようにすることができる。In FIG. 4A, the rotating shaft 14
However, in a state where an ion implantation device or the like (not shown) is used, the brush 18 is in rotational contact with the brush 18 because of rotation. The leaf spring on the side opposite to the mounting end of the carbon brush 18 is fixed to the cylindrical collar 12 with screws or rivets. Although not shown, the electron beam colliding with the leftmost anti-cathode target of the rotary shaft 14 reaches the cylindrical collar 12 via the rotary shaft 14, a carbon contact brush 18, and a leaf spring 16. And return to the fixed part. In this way, it is possible to prevent a current from flowing back and causing an electrolytic corrosion from flowing through the bearing.
【００１２】[0012]
【発明が解決しようとする課題】しかしながら、この従
来技術においては、電流を還流し、且つ電食を引き起こ
す電流の還流については一応の対策がされたが、回転軸
の回転数が大きいときには、該ブラシの接触点の周回速
度が大となり、摺動音が大きくなったり、ブラシの摩耗
速度が早くなってしまうなどの問題点が生じてきた。ま
た、ブラシの摩耗粉を多く生じ、周辺部分を汚したり、
ベアリング油に混入して潤滑性を悪くし、保守間隔が短
くなったりする問題点がある。この技術では、構成上か
らブラシの接触部分を回転軸の外周部としているため、
該回転軸の回転数が上がるほど、該接触部分の周速度が
大きくなり、上記の問題点が、さらに大きくなる。In this prior art, however, some measures have been taken against the current recirculation and the current recirculation that causes electrolytic corrosion. Problems have arisen such as the speed of rotation of the contact point of the brush being large, the sliding noise being loud, and the abrasion speed of the brush being fast. Also, a lot of brush abrasion powder is generated, and the surrounding area is stained,
There is a problem that the lubricating property is deteriorated by being mixed into the bearing oil and the maintenance interval is shortened. In this technology, since the contact portion of the brush is set as the outer peripheral portion of the rotating shaft from the configuration,
As the number of rotations of the rotating shaft increases, the peripheral speed of the contact portion increases, and the above-described problem further increases.
【００１３】このような問題点を回避するには、図５に
示すような技術が提案されている。図５は、従来技術に
おける回転接触子を備えた電流還流機構を有する軸封支
持台の説明図である。図５に示す如く、筐体２をチャン
バ壁（図示しない）へ固定部８の挿通孔を介してボルト
（図示せず）で取付けられている。当該筐体内の軸受１
３、１５、１７で回転可能に支持され、且つ該筐体２か
ら軸方向に両端を突設させた回転軸１４と、該回転軸１
４の一端に固定された試料台と、該回転軸１４の他端の
近傍に設けた駆動部（図示しない）との連結部５とから
なっている。そして、該回転軸１４の駆動連結部５側の
軸端の中心に、押圧板７に取り付けられ、且つ押圧され
る液体金属接点を利用した回転接触子９と、該押圧板７
ａと該筐体間２に導通させる接続線６で構成されてい
る。In order to avoid such a problem, a technique as shown in FIG. 5 has been proposed. FIG. 5 is an explanatory view of a shaft sealing support having a current return mechanism provided with a rotating contact according to the related art. As shown in FIG. 5, the housing 2 is attached to a chamber wall (not shown) with a bolt (not shown) through an insertion hole of the fixing portion 8. Bearing 1 in the housing
A rotating shaft 14 rotatably supported at 3, 15, 17 and having both ends projecting in the axial direction from the housing 2;
4 includes a sample stage fixed to one end of the rotary shaft 4 and a connecting portion 5 for connecting to a driving unit (not shown) provided near the other end of the rotating shaft 14. A rotary contact 9 attached to the pressing plate 7 and using a liquid metal contact to be pressed is provided at the center of the shaft end of the rotary shaft 14 on the drive connecting portion 5 side.
a and a connection line 6 that conducts between the housings 2.
【００１４】このように、回転軸１４の回転中心部分に
接触ブラシ１８を設けることが出来るならば、相対速度
が大きくならず、摩耗や騒音などの軽減が可能となる。
また、前記接触ブラシ１８に替えて市販されている液体
金属接点を利用した回転接触子９（以下、コンタクタと
いう）を利用すれば、該回転接触部の接触ブラシ１８に
おける固体物質同志の接触による騒音の発生が解消出来
るし、液体での接触によるため摩耗がなくなり、接触子
の寿命が飛躍的に延びるなどの利点が得られる。As described above, if the contact brush 18 can be provided at the center of rotation of the rotating shaft 14, the relative speed does not increase, and wear and noise can be reduced.
Also, if a rotary contact 9 (hereinafter referred to as a contactor) using a commercially available liquid metal contact is used instead of the contact brush 18, noise due to contact between solid substances in the contact brush 18 of the rotary contact portion can be obtained. Can be eliminated, wear due to contact with the liquid can be eliminated, and the life of the contact can be greatly extended.
【００１５】しかしながら、該コンタクタ９は、液体金
属を封止し、回転軸９に軸支され回転方向にのみ可動と
なるように、プラスチック容器で構成されている。この
ため、該コンタクタ９は、回転方向には可動可能であ
り、スラスト方向への移動余裕や、回転軸１４の芯ずれ
による歳差運動による許容量が極めて小さい。一方、イ
オン注入装置の回転軸１４は、大きな試料台を備えてい
る偏荷重の起こりやすい構造となっており、回転軸１４
の駆動連結部５等により、振動、心ずれが起こりやすい
構造となっている。このため、回転軸１４の少しの振動
に対しても、該コンタクタ９が破損してしまいやすく、
長信頼化が保てないという問題点があった。However, the contactor 9 is formed of a plastic container which seals the liquid metal and is supported by the rotating shaft 9 so as to be movable only in the rotating direction. For this reason, the contactor 9 is movable in the rotating direction, and the allowance for the movement in the thrust direction and the allowable amount due to the precession due to the misalignment of the rotating shaft 14 are extremely small. On the other hand, the rotating shaft 14 of the ion implantation apparatus has a structure in which a large sample stage is provided and is likely to cause an eccentric load.
By virtue of the drive connecting portion 5 and the like, a structure in which vibration and misalignment easily occur is provided. For this reason, the contactor 9 is easily damaged by a slight vibration of the rotating shaft 14,
There has been a problem that long reliability cannot be maintained.
【００１６】本発明は、かかる従来技術の問題点を解決
するためになされたものであり、スラスト方向への移動
余裕や回転軸の芯ずれによる歳差運動による許容量が大
にし、振動に対する破損を防ぎ、長信頼化を保持する電
流還流機構を備えた軸封支持台を提供することをその目
的とするものである。The present invention has been made in order to solve the problems of the prior art, and has a large margin for movement in the thrust direction and an allowable amount due to precession caused by misalignment of the rotating shaft, and damage to vibration. It is an object of the present invention to provide a shaft seal support having a current recirculation mechanism for preventing the occurrence of a problem and maintaining long reliability.
【００１７】[0017]
【課題を解決するための手段】本発明に係る電流還流機
構を備えた軸封支持台の構成は、真空チャンバ壁との取
付部を有する筐体と、当該筐体内の軸受で回転可能に且
つ軸封されて支持されると共に、該筐体から軸方向に、
一の軸側が真空チャンバに、他の軸側を大気側に突設さ
せた回転軸と、該突設させた真空チャンバ側の回転軸の
一端に設けられた試料台と、該回転軸の他端近傍に設け
た駆動部との連結部と、該回転軸の中心に弾性板で押圧
される液体接点と、該弾性板と該筐体間に導通させる電
導体もしくは接続線でなることを特徴とするものであ
る。前記記載の電流還流機構を備えた軸封支持台におい
て、該弾性板の代わりにスプリングワイヤを用いること
を特徴とするものである。前記記載の電流還流機構を備
えた軸封支持台において、該弾性板の代わりに自在継手
を用いることを特徴とするものである。According to the present invention, there is provided a shaft sealing support provided with a current return mechanism, comprising: a housing having a mounting portion to a vacuum chamber wall; and a rotatable bearing provided in the housing. While being shaft-sealed and supported, in the axial direction from the housing,
A rotating shaft with one shaft side protruding from the vacuum chamber and the other shaft side protruding toward the atmosphere; a sample stage provided at one end of the protruding rotating shaft on the vacuum chamber side; It is characterized by comprising a connection portion with a drive portion provided near the end, a liquid contact point pressed by an elastic plate at the center of the rotating shaft, and a conductor or a connection line for conducting between the elastic plate and the housing. It is assumed that. In the shaft seal support provided with the current return mechanism described above, a spring wire is used instead of the elastic plate. In the shaft seal support provided with the current return mechanism described above, a universal joint is used instead of the elastic plate.
【００１８】[0018]
【発明の実施の形態】〔実施形態 １〕図１ないし図３
を参照して、本発明に係る電流還流機構を備えた軸封支
持台の実施形態を説明する。図１は、本発明に係る電流
還流機構を備えた軸封支持台の一実施形態の説明図、図
２は、図１の電流還流機構を備えた軸封支持台における
弾性押圧板の作用説明図、図３は、本発明に係る電流還
流機構を備えた軸封支持台の他の一実施形態の説明図で
ある。[Embodiment 1] FIGS. 1 to 3
An embodiment of a shaft sealing support provided with a current return mechanism according to the present invention will be described with reference to FIG. FIG. 1 is an explanatory view of an embodiment of a shaft sealing support provided with a current recirculation mechanism according to the present invention. FIG. 2 is a diagram illustrating an operation of an elastic pressing plate in the shaft sealing support having a current recirculation mechanism of FIG. Drawing 3 and Drawing 3 are explanatory views of other embodiments of a shaft seal supporting stand provided with a current return mechanism concerning the present invention.
【００１９】図１に示す本発明に係る電流還流機構を備
えた軸封支持台の実施形態において、図５で説明した従
来技術における電流還流機構を備えた軸封支持台の説明
は、煩瑣となるので省略し、特徴部分を中心に説明す
る。In the embodiment of the shaft seal support provided with the current return mechanism according to the present invention shown in FIG. 1, the description of the shaft seal support provided with the current return mechanism in the prior art described with reference to FIG. 5 is complicated. Therefore, the description will be made with a focus on the characteristic portions.
【００２０】本発明と従来技術とで大きく異なるところ
は、図１分図（ｂ）、図３分図（ａ）、（ｂ）に示す如
く、図４に示す押圧板７ａの代わりに、コイルバネＣや
板バネＳを備えた弾性の押圧板７を用いるものである。
コンタクタ９を回転軸９ａで支持し、該軸９ａを板バネ
Ｓで支承する弾性押圧板７を用い、該コンタクタ９の回
転軸１４の回転に伴う回転運動以外の振れについては、
該弾性押圧板７で自在に追従させる。すなわち、該コン
タクタ９のスラスト方向への移動余裕や該コンダクタ９
の回転軸１４の芯ずれによる歳差運動に対する許容量を
大きくし、振動に強くして、長信頼化が保てないという
問題に対処するものである。The major difference between the present invention and the prior art is that, as shown in FIGS. 1 (b), 3 (a) and 3 (b), a coil spring is used instead of the pressing plate 7a shown in FIG. An elastic pressing plate 7 provided with C and a leaf spring S is used.
The contactor 9 is supported on a rotating shaft 9a, and the elastic pressing plate 7 supporting the shaft 9a with a leaf spring S is used. For the deflection other than the rotational movement accompanying the rotation of the rotating shaft 14 of the contactor 9,
The elastic pressing plate 7 is allowed to follow freely. That is, there is a margin for the movement of the contactor 9 in the thrust direction,
The present invention addresses the problem that the permissible amount of precession due to misalignment of the rotating shaft 14 is increased, the vibration is increased, and the long reliability cannot be maintained.
【００２１】図２分図（ａ）は、板バネＳを備えた弾性
の押圧板の外形図、図２分図（ｂ）、（ｃ）、（ｄ）
は、回転軸１４のコンタクタ９側の変位に対する板バネ
Ｓが追従するイメージの説明図である。使用する板バネ
Ｓは、回転方向には剛性を有し、回転軸１４の偏心運動
に対して、図２分図（ｂ）、（ｃ）、（ｄ）に示す如
く、板バネＳが、弾力性を有することにより、回転軸１
４がＣ1、Ｃ2、Ｃ3軸の方向に偏心し、これに応じて板
バネＳが、Ｓ1、Ｓ2、Ｓ3の如く偏位し、図示しないコ
ンタクタ９に負荷がかからないように動作する。すなわ
ち、回転軸１４の軸センタずれが起こったとき、弓形の
板バネＳが変形し、該コンタクタ９の回転が可能とする
ものである。FIG. 2A is an external view of an elastic pressing plate provided with a leaf spring S, and FIGS. 2B, 2C, and 2D.
FIG. 4 is an explanatory diagram of an image in which a leaf spring S follows a displacement of the rotating shaft 14 on the contactor 9 side. The leaf spring S used has rigidity in the rotation direction, and the leaf spring S responds to the eccentric movement of the rotating shaft 14 as shown in FIGS. 2 (b), (c) and (d). By having elasticity, the rotating shaft 1
4 is eccentric in the directions of the C 1 , C 2 , and C 3 axes, and accordingly, the leaf spring S is displaced as S 1 , S 2 , and S 3 so that a load is not applied to the contactor 9 (not shown). Operate. That is, when the center of the rotary shaft 14 is shifted, the bow-shaped leaf spring S is deformed, and the contactor 9 can be rotated.
【００２２】また、他の方法として、図３分図（ａ）の
ようにスプリングワイヤを用いたり、分図（ｂ）のよう
に、自在継手を使い回転軸１４に、いわゆる”ふれ”が
あっても、コンダクタ９に負荷を与えないようにするこ
とが出来る。ただし、この自在継手を用いる方法につい
ては、電気的接触を確実にするには可動部からフレキシ
ブルワイヤ−Ｆ・Ｗにより、電流通路を確実にする必要
がある。As another method, as shown in FIG. 3A, a spring wire is used, or as shown in FIG. However, a load can not be applied to the conductor 9. However, in the method using the universal joint, it is necessary to secure the electric current path from the movable part by the flexible wire-FW in order to secure the electrical contact.
【００２３】上記本願発明に係る回転接触子による電流
還流機構を備えた軸封支持台の原理を説明する。前述し
た如く、図４に示される軸封支持台では、構成上からブ
ラシの接触部分を回転軸１４の外周部となっているた
め、回転軸１４の回転数が上がるほど、周速度が大きく
なり、上記の欠点が避けられない。このような欠点を回
避するには、回転軸１４の回転中心部分にブラシの接触
部を設ける事ができるならば、相対速度がそれほど大き
くならず摩耗や騒音などの軽減がさらに可能となる。The principle of the shaft sealing support provided with the current return mechanism using the rotating contact according to the present invention will be described. As described above, in the shaft seal support shown in FIG. 4, the contact portion of the brush is an outer peripheral portion of the rotary shaft 14 from the configuration, so that the peripheral speed increases as the rotational speed of the rotary shaft 14 increases. The above drawbacks are inevitable. In order to avoid such a drawback, if a contact portion of the brush can be provided at the center of rotation of the rotating shaft 14, the relative speed is not so large, and wear and noise can be further reduced.
【００２４】また、前述のブラシに替えて液体金属を利
用したコンタクタが市販されており、これを利用すれ
ば、固体物質同志の接触による騒音の発生が解消出来る
し、液体での接触によるため摩耗が無くなり、接触子の
寿命が飛躍的に延びるなどの利点が得られる。In addition, a contactor using liquid metal instead of the above-mentioned brush is commercially available. If this contactor is used, generation of noise due to contact between solid substances can be eliminated, and wear due to contact with liquid can be eliminated. And the advantage that the life of the contact is dramatically extended is obtained.
【００２５】本発明は、図示の如くコイルバネや板バネ
を用いて回転運動以外の振れについては自在に追従させ
て異常方向への力を回避しようとするものである。図１
分図（ａ）において、回転軸１４の最左部の対陰極の試
料台１に衝突した電子ビ−ム（図示せず）による電流
は、回転軸１４、コンタクタ９、板バネ４、接続導体
６、筐体４を経て、固定部分に戻ることになる。According to the present invention, as shown in the drawing, a coil spring or a leaf spring is used to freely follow a run-out other than a rotational movement so as to avoid a force in an abnormal direction. FIG.
In the diagram (a), the current caused by the electron beam (not shown) colliding with the sample stage 1 of the anti-cathode at the leftmost part of the rotating shaft 14 includes the rotating shaft 14, the contactor 9, the leaf spring 4, and the connecting conductor. 6. It returns to the fixed part via the housing 4.
【００２６】[0026]
【発明の効果】上記詳細に説明した本発明の構成によれ
ば、スラスト方向への移動余裕や回転軸の芯ずれによる
歳差運動による許容量が大にし、振動に対する破損を防
ぎ、長信頼化を保持する電流還流機構を備えた軸封支持
台を提供することができる。According to the configuration of the present invention described in detail above, the allowance for the precession due to the thrust-direction moving margin and the misalignment of the rotating shaft is increased, the damage due to vibration is prevented, and the reliability is increased. Can be provided with a shaft sealing support provided with a current recirculation mechanism for holding the shaft.
【図１】本発明に係る電流還流機構を備えた軸封支持台
の一実施形態の説明図である。FIG. 1 is an explanatory view of an embodiment of a shaft sealing support provided with a current return mechanism according to the present invention.
【図２】図１の電流還流機構を備えた軸封支持台におけ
る回転接触子に対する弾性押圧板の作用説明図である。FIG. 2 is an explanatory diagram of an action of an elastic pressing plate on a rotating contact in a shaft sealing support provided with the current recirculation mechanism of FIG. 1;
【図３】本発明に係る電流還流機構を備えた軸封支持台
における回転接触子保持部の他の一実施形態の説明図で
ある。FIG. 3 is an explanatory view of another embodiment of the rotary contact holding portion in the shaft sealing support provided with the current return mechanism according to the present invention.
【図４】従来の電流還流機構を備えた軸封支持台におけ
る集電機構の説明図である。FIG. 4 is an explanatory diagram of a current collecting mechanism in a shaft sealing support provided with a conventional current return mechanism.
【図５】従来技術における電流還流機構を備えた軸封支
持台における回転接触子保持部の説明図である。FIG. 5 is an explanatory view of a rotary contact holding portion in a shaft sealing support provided with a current recirculation mechanism in the prior art.
１…試料台 ２…筐体 ５…駆動部連結部 ６…コンタクタと筐体との固定具 ７…弾性板 ７ａ…固定板 ９…コンタクタ １０…ベアリング固定ボルト Ｓ…板バネ Ｃ…スプリングコイル DESCRIPTION OF SYMBOLS 1 ... Sample stand 2 ... Case 5 ... Drive part connection part 6 ... Fixture of a contactor and a case 7 ... Elastic plate 7a ... Fixing plate 9 ... Contactor 10 ... Bearing fixing bolt S ... Leaf spring C ... Spring coil
Claims (3)
と、当該筐体内の軸受で回転可能に、且つ軸封されて支
持されると共に、該筐体から軸方向に、一の軸側を真空
チャンバ側に、他の軸側を大気側に突設させている回転
軸と、該突設させた真空チャンバ側の回転軸の一端に設
けられたワーク取付け台と、該回転軸の他端近傍に設け
た駆動部との連結部と、該回転軸端面の中心に弾性板で
押圧される液体接点と、該弾性板と該筐体間に導通させ
る導電体もしくは接続線のいずれかでなることを特徴と
する電流還流機構を有する軸封支持台。1. A housing having an attachment portion to a vacuum chamber wall, and supported by a bearing in the housing so as to be rotatable, shaft-sealed, and one axial side from the housing in an axial direction. A work shaft provided on one end of the protruded rotary shaft on the vacuum chamber side, A connection portion with a drive portion provided near the end, a liquid contact point pressed by an elastic plate at the center of the end surface of the rotating shaft, and a conductor or a connection wire that conducts between the elastic plate and the housing. A shaft seal support having a current return mechanism.
封支持台において、該弾性板の代わりにスプリングワイ
ヤを用いることを特徴とする電流還流機構を有する軸封
支持台。2. A shaft sealing support having a current return mechanism according to claim 1, wherein a spring wire is used instead of said elastic plate.
封支持台において、該弾性板の代わりに自在継手を用い
ることを特徴とする電流還流機構を有する軸封支持台。3. The shaft sealing support having a current return mechanism according to claim 1, wherein a universal joint is used in place of the elastic plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11030771A JP2000228167A (en) | 1999-02-09 | 1999-02-09 | Shaft seal supporting base having current reflux mechanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11030771A JP2000228167A (en) | 1999-02-09 | 1999-02-09 | Shaft seal supporting base having current reflux mechanism |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000228167A true JP2000228167A (en) | 2000-08-15 |
Family
ID=12312957
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11030771A Pending JP2000228167A (en) | 1999-02-09 | 1999-02-09 | Shaft seal supporting base having current reflux mechanism |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000228167A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009164133A (en) * | 2002-04-10 | 2009-07-23 | Applied Materials Inc | Multi-directional scanning of movable member and ion beam monitoring arrangement therefor |
| CN103531515A (en) * | 2012-07-06 | 2014-01-22 | 先进科技新加坡有限公司 | Apparatus for supporting a workpiece during processing of the workpiece |
| KR20140038910A (en) * | 2012-09-21 | 2014-03-31 | 노벨러스 시스템즈, 인코포레이티드 | High temperature electrode connections |
-
1999
- 1999-02-09 JP JP11030771A patent/JP2000228167A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009164133A (en) * | 2002-04-10 | 2009-07-23 | Applied Materials Inc | Multi-directional scanning of movable member and ion beam monitoring arrangement therefor |
| CN103531515A (en) * | 2012-07-06 | 2014-01-22 | 先进科技新加坡有限公司 | Apparatus for supporting a workpiece during processing of the workpiece |
| KR20140038910A (en) * | 2012-09-21 | 2014-03-31 | 노벨러스 시스템즈, 인코포레이티드 | High temperature electrode connections |
| KR102165316B1 (en) | 2012-09-21 | 2020-10-14 | 노벨러스 시스템즈, 인코포레이티드 | High temperature electrode connections |
| KR20200119226A (en) * | 2012-09-21 | 2020-10-19 | 노벨러스 시스템즈, 인코포레이티드 | High temperature electrode connections |
| KR102322400B1 (en) | 2012-09-21 | 2021-11-05 | 노벨러스 시스템즈, 인코포레이티드 | High temperature electrode connections |
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