JP2000223396A5 - - Google Patents

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JP2000223396A5
JP2000223396A5 JP1999021591A JP2159199A JP2000223396A5 JP 2000223396 A5 JP2000223396 A5 JP 2000223396A5 JP 1999021591 A JP1999021591 A JP 1999021591A JP 2159199 A JP2159199 A JP 2159199A JP 2000223396 A5 JP2000223396 A5 JP 2000223396A5
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Japan
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luminous flux
optical axis
optical path
optical
light
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JP1999021591A
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Japanese (ja)
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JP2000223396A (en
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Priority to JP11021591A priority Critical patent/JP2000223396A/en
Priority claimed from JP11021591A external-priority patent/JP2000223396A/en
Priority to US09/300,660 priority patent/US6238063B1/en
Publication of JP2000223396A publication Critical patent/JP2000223396A/en
Publication of JP2000223396A5 publication Critical patent/JP2000223396A5/ja
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【特許請求の範囲】
【請求項1】 コヒーレントな光束を供給する光源から基準光軸に沿って入射する光束の一部を前記基準光軸とほぼ一致する第1の光軸に沿って第1光束として射出させつつ前記基準光軸に沿って入射する光束の一部を前記基準光軸とは異なる方向の第2の光軸に沿って第2光束として射出するためのビームスプリッタと、該ビームスプリッタからの前記第2光束を偶数回に亘って偏向させた後に前記ビームスプリッタへ向けるように形成され前記光源からの光束の時間的可干渉距離以上に設定された光路長を有する遅延光路とを有する分割遅延手段を備え、
前記遅延光路は、前記基準光軸に対してほぼ平行に位置ずれした状態で入射する光束に対しても前記第1光束と前記第2光束とをほぼ同じ光軸に沿って射出させるために、前記第2の光軸に沿って分割された前記第2光束を前記基準光軸から位置ずれした元の入射位置へ戻すように形成されていることを特徴とする照明光学装置。
【請求項2】 前記分割遅延手段は、前記遅延光路の光路中に配置された偶数個の反射部材を有し、
前記ビームスプリッタで前記第2の光軸に沿って分割された前記第2光束は、前記偶数個の反射部材で順次反射された後に前記ビームスプリッタに戻ることを特徴とする請求項1に記載の照明光学装置。
【請求項3】 前記偶数個の反射部材の各々は、光束がS偏光状態で入射するように配置された反射ミラーであることを特徴とする請求項2に記載の照明光学装置。
【請求項4】 前記分割遅延手段は、前記遅延光路に沿った前記ビームスプリッタの分割面から前記分割面までを光学的に共役に結ぶリレー光学系を有することを特徴とする請求項1乃至3のいずれか1項に記載の照明光学装置。
【請求項5】 前記分割遅延手段は、第1段目の分割遅延部から第n段目(nは1よりも大きい整数)の分割遅延部までの複数の分割遅延部を備え、
前記第1段目の分割遅延部は、前記光源から入射する光束を2つの光束に分割し、該2つの光束に第1の光路長差を付与するように構成され、
前記第n段目の分割遅延部は、第(n−1)段目の分割遅延部を介して入射する光束を2つの光束に分割し、該2つの光束に前記第1の光路長差のn倍の光路長差を付与するように構成されていることを特徴とする請求項1乃至4のいずれか1項に記載の照明光学装置
【請求項6】 請求項1乃至5のいずれか1項に記載の照明光学装置と、該照明光学装置の被照明面上に配置されたマスクのパターンを感光性基板に投影露光するための投影光学系とを備え、
前記照明光学装置は、前記分割遅延手段を介した光束に基づいて多数の光源像を形成するためのオプティカルインテグレータと、該オプティカルインテグレータからの光束を前記マスクへ導くための集光光学系とを備えていることを特徴とする露光装置。
【請求項7】 光源からのコヒーレントな光束に基づいて被照明面上に配置されたマスクを照明する照明光学装置と共に用いられる分割遅延光学装置であって、
前記光源から基準光軸に沿って入射する光束の一部を前記基準光軸とほぼ一致する第1の光軸に沿って第1光束として射出させつつ前記基準光軸に沿って入射する光束の一部を前記基準光軸とは異なる方向の第2の光軸に沿って第2光束として射出するためのビームスプリッタと、該ビームスプリッタからの前記第2光束を偶数回に亘って偏向させた後に前記ビームスプリッタへ向けるように形成され前記光源からの光束の時間的可干渉距離以上に設定された光路長を有する遅延光路とを有し、
前記遅延光路は、前記基準光軸に対してほぼ平行に位置ずれした状態で入射する光束に対しても前記第1光束と前記第2光束とをほぼ同じ光軸に沿って射出させるために、前記第2の光軸に沿って分割された前記第2光束を前記基準光軸から位置ずれした元の入射位置へ戻すように形成されていることを特徴とする分割遅延光学装置。
【請求項8】 前記遅延光路の光路中に配置された偶数個の反射部材を有し、
前記ビームスプリッタで前記第2の光軸に沿って分割された前記第2光束は、前記偶数個の反射部材で順次反射された後に前記ビームスプリッタに戻ることを特徴とする請求項7に記載の分割遅延光学装置。
【請求項9】 前記偶数個の反射部材の各々は、光束がS偏光状態で入射するように配置された反射ミラーであることを特徴とする請求項8に記載の分割遅延光学装置。
【請求項10】 前記遅延光路に沿った前記ビームスプリッタの分割面から前記分割面までを光学的に共役に結ぶリレー光学系を有することを特徴とする請求項7乃至9のいずれか1項に記載の分割遅延光学装置。
【請求項11】 第1段目の分割遅延部から第n段目(nは1よりも大きい整数)の分割遅延部までの複数の分割遅延部を備え、
前記第1段目の分割遅延部は、前記光源から入射する光束を2つの光束に分割し、該2つの光束に第1の光路長差を付与するように構成され、
前記第n段目の分割遅延部は、第(n−1)段目の分割遅延部を介して入射する光束を2つの光束に分割し、該2つの光束に前記第1の光路長差のn倍の光路長差を付与するように構成されていることを特徴とする請求項7乃至10のいずれか1項に記載の分割遅延光学装置。
[Claims]
1. Light that supplies a coherent luminous flux.SourceA part of the luminous flux incident along the reference optical axis while ejecting a part of the luminous flux incident along the reference optical axis as the first luminous flux along the first optical axis substantially coincide with the reference optical axis. A beam splitter for ejecting as a second luminous flux along a second optical axis in a direction different from the reference optical axis, and the second luminous flux from the beam splitter after being deflected an even number of times. A split delay hand having a delayed optical path having an optical path length formed to be directed toward a beam splitter and having an optical path length set to be equal to or greater than the temporally interferable distance of a luminous flux from the light source.StepPrepare
The delayed optical path is for emitting the first luminous flux and the second luminous flux along substantially the same optical axis even for a luminous flux incident in a state of being displaced substantially parallel to the reference optical axis. An illumination optical device characterized in that the second light flux divided along the second optical axis is formed so as to return to the original incident position deviated from the reference optical axis.
2. The division delay means has an even number of reflective members arranged in the optical path of the delay optical path.
The first aspect of claim 1, wherein the second luminous flux divided along the second optical axis by the beam splitter is sequentially reflected by the even number of reflecting members and then returned to the beam splitter. Illumination optics.
3. The illumination optical device according to claim 2, wherein each of the even-numbered reflecting members is a reflecting mirror arranged so that a light flux is incident in an S-polarized state.
4. The split delay means has a relay optical system that optically conjugately connects the split plane of the beam splitter to the split plane along the delayed optical path.The illumination optical device according to any one of claims 1 to 3, wherein the illumination optical device is characterized.
5. The division delay means includes a plurality of division delay portions from the division delay portion of the first stage to the division delay portion of the nth stage (n is an integer larger than 1).
The first-stage division delay portion is configured to divide the light flux incident from the light source into two light fluxes and impart a first optical path length difference to the two light fluxes.
The n-th stage division delay portion divides the luminous flux incident through the division delay portion of the (n-1) stage into two light fluxes, and the two light fluxes have a difference in the optical path length of the first stage. The illumination optical device according to any one of claims 1 to 4, wherein the illumination optical device is configured to provide an optical path length difference of n times...
6. The illumination optical device according to any one of claims 1 to 5 and a projection optical system for projecting and exposing a mask pattern arranged on an illuminated surface of the illumination optical device onto a photosensitive substrate are provided. ,
The illumination optical device includes an optical integrator for forming a large number of light source images based on the light flux via the division delay means, and a condensing optical system for guiding the light flux from the optical integrator to the mask. An exposure device characterized by being
7. A split delay optic used with an illumination optic that illuminates a mask placed on an illuminated surface based on a coherent luminous flux from a light source.
A part of the luminous flux incident from the light source along the reference optical axis is emitted as the first luminous flux along the first optical axis substantially coincident with the reference optical axis, and the luminous flux incident along the reference optical axis. A beam splitter for projecting a part as a second luminous flux along a second optical axis in a direction different from the reference optical axis, and the second luminous flux from the beam splitter were deflected an even number of times. It has a delayed optical path that is later formed to direct to the beam splitter and has an optical path length that is set to be greater than or equal to the temporally interferable distance of the luminous flux from the light source.
In the delayed optical path, the first luminous flux and the second luminous flux are emitted along substantially the same optical axis even for a luminous flux incident in a state of being displaced substantially parallel to the reference optical axis. A split delay optical device, characterized in that the second luminous flux divided along the second optical axis is formed so as to return to the original incident position deviated from the reference optical axis.
8. It has an even number of reflective members arranged in the optical path of the delayed optical path.
The second light beam divided along the second optical axis by the beam splitter is sequentially reflected by the even number of reflecting members and then returned to the beam splitter. Split delay optics.
9. The split delay optical device according to claim 8, wherein each of the even number of reflecting members is a reflecting mirror arranged so that a light flux is incident in an S-polarized state.
10. The split delay optics according to any one of claims 7 to 9, further comprising a relay optical system that optically conjugately connects the split plane of the beam splitter to the split plane along the delayed optical path. apparatus.
11. It is provided with a plurality of division delay units from the first stage division delay unit to the nth stage (n is an integer larger than 1) division delay unit.
The first-stage division delay portion is configured to divide the light flux incident from the light source into two light fluxes and impart a first optical path length difference to the two light fluxes.
The n-th stage division delay portion divides the luminous flux incident through the division delay portion of the (n-1) stage into two light fluxes, and the two light fluxes have a difference in the optical path length of the first stage. The split delay optical device according to any one of claims 7 to 10, wherein the optical path length difference of n times is imparted.

JP11021591A 1998-04-27 1999-01-29 Illuminating optical device and aligner provided with the device Pending JP2000223396A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP11021591A JP2000223396A (en) 1999-01-29 1999-01-29 Illuminating optical device and aligner provided with the device
US09/300,660 US6238063B1 (en) 1998-04-27 1999-04-27 Illumination optical apparatus and projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11021591A JP2000223396A (en) 1999-01-29 1999-01-29 Illuminating optical device and aligner provided with the device

Publications (2)

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JP2000223396A JP2000223396A (en) 2000-08-11
JP2000223396A5 true JP2000223396A5 (en) 2008-02-28

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6741394B1 (en) 1998-03-12 2004-05-25 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus and observation apparatus
JP4426913B2 (en) * 2004-07-06 2010-03-03 株式会社小松製作所 Method for adjusting laser device
US7193765B2 (en) * 2005-03-31 2007-03-20 Evans & Sutherland Computer Corporation Reduction of speckle and interference patterns for laser projectors
US7653097B2 (en) * 2007-12-31 2010-01-26 Corning Incorporated Systems and methods for polarization modulation of an optical signal
TW202248769A (en) * 2019-10-16 2022-12-16 美商希瑪有限責任公司 Series of stacked confocal pulse stretchers for speckle reduction

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