JP2000207725A - MAGNETIC RECORDING MEDIUM AND CoTa ALLOY TARGET - Google Patents

MAGNETIC RECORDING MEDIUM AND CoTa ALLOY TARGET

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Publication number
JP2000207725A
JP2000207725A JP11007322A JP732299A JP2000207725A JP 2000207725 A JP2000207725 A JP 2000207725A JP 11007322 A JP11007322 A JP 11007322A JP 732299 A JP732299 A JP 732299A JP 2000207725 A JP2000207725 A JP 2000207725A
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Japan
Prior art keywords
target
magnetic
cota
recording medium
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11007322A
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Japanese (ja)
Inventor
Tomonori Ueno
友典 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
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Filing date
Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP11007322A priority Critical patent/JP2000207725A/en
Publication of JP2000207725A publication Critical patent/JP2000207725A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a magnetic recording medium and a target suitable for high density recording by improving the magnetic characteristics of a Co based magnetic layer. SOLUTION: Base layers in at least one or more layers are adhered between a non-magnetic substrate and a Co based magnetic layer in this magnetic recording medium, and at least one layer of the base layers is formed of CoTa based alloy in which Ta content is 30-65 at.% and the remainder has Co as the main component. It is preferable that the Ta amount is 45-55 at.%. The target is formed as a CoTa based alloy target being a powder sintered body in which Ta amount is 30-65 at.% and the remainder has Co as the main component, and it is preferable that no metallic Co phase exists substantially.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、磁気ディスク装置
用などの磁気記録媒体およびこれに用いるCoTa系タ
ーゲットに関するものである。
[0001] 1. Field of the Invention [0002] The present invention relates to a magnetic recording medium for a magnetic disk drive or the like and a CoTa-based target used for the same.

【0002】[0002]

【従来の技術】従来Co系磁性層は、高密度な磁気記録
が可能なように発展してきており、その一つの手段とし
て、磁性層の形成にはエピタキシャル成長が利用されて
いる。磁性層をエピタキシャル成長させるため、下地層
の格子定数、結晶配向性および膜の均一性の改良が行わ
れている。たとえば、Co系磁性層は六方最密充填構造
であり、磁化容易方向即ちC軸方向を面内に配向するよ
うにエピタキシャル成長させるために、Co系磁性層の
C軸の格子定数とよく整合する、純CrおよびCr合金
が主流である。
2. Description of the Related Art Conventionally, Co-based magnetic layers have been developed so as to enable high-density magnetic recording. As one of the means, epitaxial growth is used for forming a magnetic layer. In order to epitaxially grow a magnetic layer, the lattice constant, crystal orientation, and film uniformity of an underlayer have been improved. For example, the Co-based magnetic layer has a hexagonal close-packed structure, and is well-matched to the C-axis lattice constant of the Co-based magnetic layer in order to epitaxially grow so that the easy magnetization direction, that is, the C-axis direction is in-plane. Pure Cr and Cr alloys are the mainstream.

【0003】最近、ヨーロッパ特許公開公報 EP07
04839AにB2構造の金属間化合物を下地層とする
構造を採用することにより高保磁力および低ノイズの磁
気記録媒体が得られることが報告されている。特にCo
系磁性層との相性が良いCr系の下地層の更に下層とし
て、微細なB2構造の金属間化合物の層を形成しておけ
ば、下地層となるCr系の層をエピタキシャル成長させ
ることができ、微細なCr系下地層を形成することがで
きる。これによって、その上層となる磁性層も下地層の
微細状態を反映したエピタキシャル成長を起こさせるこ
とができ、高保磁力、低ノイズとなるのである。
Recently, European Patent Publication EP07 / 07
04839A reports that a magnetic recording medium with high coercive force and low noise can be obtained by employing a structure using an intermetallic compound having a B2 structure as an underlayer. Especially Co
If a fine B2 structure intermetallic compound layer is formed as a further lower layer of the Cr-based underlayer having good compatibility with the system-based magnetic layer, the Cr-based layer serving as the underlayer can be epitaxially grown. A fine Cr-based underlayer can be formed. As a result, the overlying magnetic layer can also undergo epitaxial growth reflecting the fine state of the underlying layer, resulting in high coercive force and low noise.

【0004】[0004]

【発明が解決しようとする課題】本発明者がNiAlに
代表されるB2構造を持つ金属間化合物の下地層を検討
したところ、B2構造を持つ金属間化合物の層は下地層
として用いられる純Cr層やCr合金層およびCo系磁
性層との整合性が良好であることを確認した。しかし、
近年の磁気ディスクの高記録密度化に伴い、さらなる高
記録密度化を達成する手段が求められている。
The present inventor has studied an underlayer of an intermetallic compound having a B2 structure typified by NiAl, and found that the layer of the intermetallic compound having a B2 structure is pure Cr used as an underlayer. It was confirmed that the compatibility with the layer, the Cr alloy layer and the Co-based magnetic layer was good. But,
With the recent increase in the recording density of magnetic disks, means for achieving a higher recording density have been demanded.

【0005】また、磁気ディスクの成膜装置は、従来の
インライン型から枚葉型へと移行している。枚葉型の装
置ではターゲット交換頻度が増加するため従来のボンデ
ィング方式に代わり簡易なクリップ方式が採用されてい
る。さらに、生産性向上のため成膜速度が上がりターゲ
ットへの投入電力は増加している。クリップ方式による
冷却能力の低下と投入電力の増加により成膜中のターゲ
ットには大きな熱応力が発生するため、それに耐える高
強度のターゲットが要求されている。本発明の目的は、
Co系磁性層の磁気特性を改善し、高密度記録化に適し
た磁気記録媒体およびCoTa系合金ターゲットを提供
することである。
[0005] Further, the film forming apparatus for magnetic disks has shifted from the conventional in-line type to the single-wafer type. In a single-wafer apparatus, a simple clip method is adopted instead of the conventional bonding method because the frequency of target replacement increases. Further, the film forming speed has been increased to improve productivity, and the power input to the target has been increased. Since a large thermal stress is generated in a target during film formation due to a decrease in cooling capacity and an increase in input power due to the clipping method, a high-strength target capable of withstanding the thermal stress is required. The purpose of the present invention is
An object of the present invention is to provide a magnetic recording medium and a CoTa-based alloy target suitable for high-density recording by improving the magnetic characteristics of a Co-based magnetic layer.

【0006】[0006]

【課題を解決するための手段】本発明者は、磁性層の高
記録密度化のために、下地層およびシード層の検討し、
下地層としてTa量が30〜65at%、残部Coを主
体とするCoTa系合金を用いることにより優れた磁気
特性を持った磁気記録媒体が得られることを見出した。
The present inventors have studied the underlayer and the seed layer in order to increase the recording density of the magnetic layer.
It has been found that a magnetic recording medium having excellent magnetic properties can be obtained by using a CoTa-based alloy having a Ta content of 30 to 65 at% and a balance of Co as a main component as an underlayer.

【0007】すなわち、本発明は、非磁性基板とCo系
磁性層との間に少なくとも1層以上の下地層が被着され
ている磁気記録媒体において、前記下地層のうち少なく
とも1層はTa量が30〜65at%、残部Coを主体
とするCoTa系合金からなることを特徴とする磁気記
録媒体である。好ましくは、Ta量が45〜55at%
である。
That is, according to the present invention, in a magnetic recording medium having at least one underlayer adhered between a nonmagnetic substrate and a Co-based magnetic layer, at least one of the underlayers has a Ta content. Is a CoTa-based alloy whose main component is 30 to 65 at%, with the balance being Co. Preferably, the amount of Ta is 45 to 55 at%.
It is.

【0008】また、本発明者は、Ta量が30〜65a
t%、残部Coを主体とするCoTa系合金下地層を成
膜するために適した高抗折力のターゲットを検討し、粉
末焼結法を用いることにより高抗折力のターゲットが得
られることを見出した。すなわち、本発明のターゲット
は、Ta量が30〜65at%、残部Coを主体とする
粉末焼結体でなることを特徴とするCoTa系合金ター
ゲットである。
Further, the present inventor has found that the Ta amount is 30-65a.
Investigate a target with high bending strength suitable for forming a CoTa-based alloy underlayer mainly composed of t% and the balance Co, and obtain a target with high bending strength by using the powder sintering method. Was found. That is, the target of the present invention is a CoTa-based alloy target characterized in that it is a powder sintered body mainly composed of a powder having a Ta content of 30 to 65 at% and the balance Co.

【0009】[0009]

【発明の実施の形態】上述したように、本発明の重要な
特徴は下地層にTa量が30〜65at%、残部Coを
主体とするCoTa系合金膜を用いたことにより磁気媒
体の磁気特性を改善したことにある。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS As described above, an important feature of the present invention is that the underlayer is made of a CoTa-based alloy film having a Ta content of 30 to 65 at% and the balance being Co. Has been improved.

【0010】図1にBarabashらが報告(O.
M.Barabash、et al.:Crystal
structure of Metals and A
lloys、1986、p247)しているCo−Ta
二元系状態図を示す。Co−Ta二元系は、種々の金属
間化合物が形成される。これらの金属間化合物のうち、
D8構造を持つCoTa(μ)相およびC15構
造を持つCoTa(λ )相が基板上に形成されると
微細な膜が得られ、下地層として用いると磁気特性が改
善される。特に、D8構造を持つCoTa(μ)
相を下地層とすると、磁気特性が著しく改善される。T
a量はD8構造を持つCoTa(μ)相およびC
15構造を持つCo Ta(λ)相が安定な30〜6
5at%が好ましく、D8構造を持つCo Ta
(μ)相の固溶体が安定な45〜55at%がさらに
好ましい。
FIG. 1 reports Barabash et al.
M. Barabash, et al. : Crystal
structure of Metals and A
lloys, 1986, p247) Co-Ta
Figure 2 shows a binary phase diagram. Co-Ta binary system is made of various metals
Intermediate compounds are formed. Of these intermetallic compounds,
D85Co with structure6Ta7(Μ) phase and C15 structure
Co with structure2Ta (λ 2) When the phase is formed on the substrate
A fine film can be obtained.
Be improved. In particular, D85Co with structure6Ta7(Μ)
When the phase is used as the underlayer, the magnetic properties are significantly improved. T
a is D85Co with structure6Ta7(Μ) phase and C
Co with 15 structure 2Ta (λ230) Phase stable
5 at% is preferable, and D85Co with structure 6Ta
745 to 55 at%, in which the solid solution of the (μ) phase is stable,
preferable.

【0011】さらに、添加元素を加えることにより、さ
らなる膜結晶粒径の微細化や格子歪みを与えることも可
能になる。ただし、D8構造を持つCoTa
(μ)相およびC15構造を持つCoTa(λ
相が安定である範囲で添加可能であり、総添加元素量は
10at%以下が好ましい。微細化を促進させる元素と
してはB、C、N、O、Al、Si、Ti、Zr、Hf
などが挙げられ、格子を歪ませる元素としては、V、N
b、Cr、Mo、W、Mn、Fe、Niなどが挙げられ
る。
Further, by adding an additional element, it becomes possible to further reduce the crystal grain size of the film and to give lattice distortion. However, Co 6 with a D8 5 structure Ta
Co 2 Ta (λ 2 ) having 7 (μ) phase and C15 structure
It can be added within a range where the phase is stable, and the total amount of added elements is preferably 10 at% or less. Elements that promote miniaturization include B, C, N, O, Al, Si, Ti, Zr, and Hf.
And V, N
b, Cr, Mo, W, Mn, Fe, Ni and the like.

【0012】Ta量が30〜65at%、残部Coを主
体とするCoTa系合金ターゲットは、ターゲット強度
を考慮すると、溶解法ではなく、粉末焼結法が好まし
い。さらに、ターゲット中にCoが金属相として存在す
るとターゲットが磁性を持ち使用効率等が悪くなるた
め、ターゲット中には、金属Co相が残存していないこ
とが好ましい。金属Coが残存する原料粉末を用いて、
焼結中の拡散や焼結後の熱処理による拡散で、CoとT
aを金属間化合物とすることも可能であるが、Co供給
源としてはCoとTaの金属間化合物からなる合金粉末
を原料粉末とすることが好ましい。金属間化合物からな
る合金粉末を作製する方法としては、溶解・鋳造インゴ
ットを粉砕する方法、アトマイズ法、反応合成法などが
挙げられる。
In the case of a CoTa-based alloy target having a Ta content of 30 to 65 at% and a balance of Co as a main component, a powder sintering method is preferable to a powder sintering method in consideration of the target strength. Furthermore, if Co is present as a metal phase in the target, the target has magnetism and the use efficiency is deteriorated. Therefore, it is preferable that the metal Co phase does not remain in the target. Using the raw material powder in which the metal Co remains,
Co and T by diffusion during sintering or diffusion by heat treatment after sintering
Although a can be an intermetallic compound, it is preferable that an alloy powder composed of an intermetallic compound of Co and Ta be used as a raw material powder as a Co supply source. Examples of a method for producing an alloy powder composed of an intermetallic compound include a method of pulverizing a molten / cast ingot, an atomizing method, and a reaction synthesis method.

【0013】また、添加元素を加える際は、純金属粉末
で添加すること、および、合金粉末中に添加することが
可能であるが、FeやNiといった強磁性元素を添加す
る際は単独粉末添加ではなく合金粉末中に添加するとタ
ーゲットとしての磁性が低下するため好ましい。
When adding an additive element, it is possible to add a pure metal powder and an alloy powder, but when adding a ferromagnetic element such as Fe or Ni, a single powder is added. However, it is preferable to add it to the alloy powder because the magnetism as a target is reduced.

【0014】[0014]

【実施例】(実施例1)Co粉末、Ta粉末、Ti粉
末、Zr粉末、Cr粉末、Mo粉末、W粉末、Nb粉
末、B粉末、Al粉末、Ni粉末およびFe粉末を用い
て、Co−30at%Ta、Co−40at%Ta、C
o−50at%Ta、Co−60at%Ta、Co−4
9at%Ta−2at%Ti、Co−49at%Ta−
2at%Zr、Co−49at%Ta−2at%Cr、
Co−49at%Ta−2at%Mo、Co−49at
%Ta−2at%W、Co−49at%Ta−2at%
Nb、Co−49at%Ta−2at%B、Co−49
at%Ta−2at%Al、Co−49at%Ta−2
at%NiおよびCo−49at%Ta−2at%Fe
となるように粉末混合を行い1200℃、3時間、10
0MPaの条件で焼結させてターゲットを作製した。
(Example 1) Co-, Ta-, Ti-, Zr-, Cr-, Mo-, W-, Nb-, B-, Al-, Ni- and Fe-powder 30at% Ta, Co-40at% Ta, C
o-50at% Ta, Co-60at% Ta, Co-4
9at% Ta-2at% Ti, Co-49at% Ta-
2 at% Zr, Co-49 at% Ta-2 at% Cr,
Co-49at% Ta-2at% Mo, Co-49at
% Ta-2at% W, Co-49at% Ta-2at%
Nb, Co-49at% Ta-2at% B, Co-49
at% Ta-2at% Al, Co-49at% Ta-2
at% Ni and Co-49at% Ta-2at% Fe
The powder was mixed at 1200 ° C. for 3 hours for 10 hours.
The target was produced by sintering under the condition of 0 MPa.

【0015】Ni−PメッキをしたAl基板およびガラ
ス基板上に、基板温度150℃、Ar圧0.66Pa、
DC電力500Wの条件で表1に示す層構成で成膜を行
った。それぞれの基板のVSM(振動試料型磁力計)で
測定した保磁力Hcおよびノイズを評価する目的で保磁
力角形比S(=Hc’/Hc)の計測結果を表2に示
す。ただし、Hc’とは磁気ヒステリシス曲線において
Hcの点での接線と残留磁化Mrの点での垂線の交点の
Hである。このように、下地層にCoTa合金を用いる
ことにより、磁気記録媒体の特性が向上することがわか
る。
[0015] A substrate temperature of 150 ° C, an Ar pressure of 0.66 Pa,
Film formation was performed under the conditions of DC power of 500 W with the layer configuration shown in Table 1. Table 2 shows the measurement results of the coercive force squareness ratio S * (= Hc '/ Hc) for evaluating the coercive force Hc and noise of each substrate measured by a VSM (vibrating sample magnetometer). Here, Hc ′ is H at the intersection of the tangent at the point Hc and the perpendicular at the point of the residual magnetization Mr in the magnetic hysteresis curve. As described above, it can be seen that the characteristics of the magnetic recording medium are improved by using the CoTa alloy for the underlayer.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】(実施例2)Co−50at%Taのアト
マイズ粉を1200℃、3時間、100MPaの条件で
焼結させて作製したターゲット、Co粉末とTa粉末を
Co−50at%Taとなるように粉末混合を行い12
00℃、3時間、100MPaの条件で焼結させて作製
したターゲット、溶解・鋳造法により作製したCo−5
0at%Taターゲットの抗折力を表3に示す。ただ
し、抗折力は、70×5×5(mm)の試験片を用い、
スパン距離50(mm)の3点曲げ試験によって行っ
た。また、それぞれのφ101×4t(mm)のターゲ
ットをAr圧0.66Pa、DC電力500Wの条件で
成膜をした際のターゲット寿命までの時間をCo−50
at%Taのアトマイズ粉を条件1200℃、3時間、
100MPaの条件で焼結させて作製したターゲットを
基準として表3に示す。
Example 2 A target prepared by sintering Co-50 at% Ta atomized powder at 1200 ° C. for 3 hours under the conditions of 100 MPa so that the Co powder and the Ta powder become Co-50 at% Ta. Mix powder 12
Target manufactured by sintering at 100 ° C. for 3 hours at 00 ° C., Co-5 manufactured by melting and casting method
Table 3 shows the bending strength of the 0 at% Ta target. However, the transverse rupture strength was measured using a 70 × 5 × 5 (mm) test piece.
This was performed by a three-point bending test with a span distance of 50 (mm). In addition, when each of the targets of φ101 × 4t (mm) was formed under the conditions of an Ar pressure of 0.66 Pa and a DC power of 500 W, the time until the target life was Co-50.
Atomized powder of at% Ta was prepared at 1200 ° C. for 3 hours.
Table 3 shows a target prepared by sintering under the condition of 100 MPa.

【0019】さらに、Ni−PメッキをしたAl基板お
よびガラス基板上に、基板温度150℃、Ar圧0.6
6Pa、DC電力500Wの条件で表4に示す層構成で
成膜を行った。それぞれの基板のVSM(振動試料型磁
力計)で測定した保磁力Hcおよびノイズを評価する目
的で保磁力角形比S(=Hc’/Hc)の計測結果を
表5に示す。ただし、Hc’とは磁気ヒステリシス曲線
においてHcの点での接線と残留磁化Mrの点での垂線
の交点のHである。粉末焼結法で作製したターゲットが
高抗折力であり、予め合金化したアトマイズ粉末を用い
た合金ターゲットの寿命が長いことがわかる。
Further, a substrate temperature of 150 ° C. and an Ar pressure of 0.6 were placed on the Ni—P plated Al and glass substrates.
Film formation was performed under the conditions of 6 Pa and a DC power of 500 W with the layer configuration shown in Table 4. Table 5 shows the measurement results of the coercive force squareness ratio S * (= Hc '/ Hc) for evaluating the coercive force Hc and noise of each substrate measured by a VSM (vibrating sample magnetometer). Here, Hc ′ is H at the intersection of the tangent at the point Hc and the perpendicular at the point of the residual magnetization Mr in the magnetic hysteresis curve. It can be seen that the target produced by the powder sintering method has high bending strength, and the life of the alloy target using the atomized powder that has been alloyed in advance is long.

【0020】[0020]

【表3】 [Table 3]

【0021】[0021]

【表4】 [Table 4]

【0022】[0022]

【表5】 [Table 5]

【0023】[0023]

【発明の効果】本発明により、非磁性基板とCo系磁性
層との間に少なくとも1層以上の下地層が被着されてい
る磁気記録媒体において、下地層としてTa量が30〜
65at%、残部Coを主体とするCoTa系合金を用
いることにより磁気特性の改善が可能となり、また、T
a量が30〜65at%、残部Coを主体とするCoT
a系合金の高抗折力の粉末焼結ターゲットは磁気記録媒
体に欠くことのできない技術となった。
According to the present invention, in a magnetic recording medium in which at least one or more underlayers are adhered between a nonmagnetic substrate and a Co-based magnetic layer, the amount of Ta as an underlayer is from 30 to 30.
By using a CoTa-based alloy mainly composed of 65 at% and the balance Co, the magnetic properties can be improved.
aT is 30 to 65 at%, CoT mainly composed of the balance Co
The powder sintering target of the high bending strength of the a-based alloy has become an indispensable technology for magnetic recording media.

【図面の簡単な説明】[Brief description of the drawings]

【図1】Co−Ta二元系状態図である。FIG. 1 is a Co-Ta binary phase diagram.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 非磁性基板とCo系磁性層との間に少な
くとも1層以上の下地層が被着されている磁気記録媒体
において、前記下地層のうち少なくとも1層はTa量が
30〜65at%、残部Coを主体とするCoTa系合
金からなることを特徴とする磁気記録媒体。
In a magnetic recording medium having at least one underlayer adhered between a nonmagnetic substrate and a Co-based magnetic layer, at least one of the underlayers has a Ta amount of 30 to 65 at. %, The balance being a CoTa-based alloy mainly composed of Co.
【請求項2】 Ta量が30〜65at%、残部Coを
主体とする粉末焼結体でなることを特徴とするCoTa
系合金ターゲット。
2. A CoTa powder characterized in that it is a powder sintered body having a Ta amount of 30 to 65 at% and a balance of Co as a main component.
Series alloy target.
JP11007322A 1999-01-14 1999-01-14 MAGNETIC RECORDING MEDIUM AND CoTa ALLOY TARGET Pending JP2000207725A (en)

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