JP2000187345A - Image forming device - Google Patents

Image forming device

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Publication number
JP2000187345A
JP2000187345A JP10365403A JP36540398A JP2000187345A JP 2000187345 A JP2000187345 A JP 2000187345A JP 10365403 A JP10365403 A JP 10365403A JP 36540398 A JP36540398 A JP 36540398A JP 2000187345 A JP2000187345 A JP 2000187345A
Authority
JP
Japan
Prior art keywords
layer
photoreceptor
photoconductive layer
image
photoconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10365403A
Other languages
Japanese (ja)
Inventor
Masamitsu Sasahara
正光 笹原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP10365403A priority Critical patent/JP2000187345A/en
Publication of JP2000187345A publication Critical patent/JP2000187345A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To attain such a high resolution as >=600 dpi. SOLUTION: An electric charge injection blocking layer comprising a-Si and a photoconductive layer are successively laminated on an electrically conductive substrate. Boron atoms are incorporated into the photoconductive layer in a proportion of 0.08-0.7 ppm to silicon atoms to obtain a photoreceptor 8. This photoreceptor 8, a corona charger 9, an exposure unit 10 which irradiates light at >=600 dpi dot density, a developing machine 12, a transfer unit 14, a cleaning means 15 and a de-electrifying means 16 are disposed to obtain the objective image forming device 7.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は水素化アモルファス
シリコンからなる電子写真感光体を搭載して、LEDヘ
ッドやレーザー光でもって露光するようにした画像形成
装置に関するものである。
[0001] 1. Field of the Invention [0002] The present invention relates to an image forming apparatus equipped with an electrophotographic photosensitive member made of hydrogenated amorphous silicon and exposed by an LED head or laser light.

【0002】[0002]

【従来の技術】アモルファスシリコン(以下、アモルフ
ァスシリコンをa−Siと略記する)を光導電層とした
感光体が、すでに製品化されているが、このa−Si感
光体は導電性基板上にグロー放電分解法によりa−Si
からなる電荷注入阻止層と光導電層とを順次積層し、さ
らにアモルファスシリコンカーバイド(以下、a−Si
Cと略記する)からなる表面保護層を被覆した層構成で
あって、この構成でもって半導体レーザープリンタ用感
光体に適用した技術が提案されている(特公平8−14
706号参照)。
2. Description of the Related Art A photoreceptor using amorphous silicon (hereinafter, amorphous silicon is abbreviated as a-Si) as a photoconductive layer has already been commercialized, but the a-Si photoreceptor is formed on a conductive substrate. A-Si by glow discharge decomposition
A charge injection blocking layer made of and a photoconductive layer are sequentially laminated, and amorphous silicon carbide (hereinafter a-Si
C) (which is abbreviated as C), and a technique applied to a photoconductor for a semiconductor laser printer with this configuration has been proposed (Japanese Patent Publication No. 8-14).
No. 706).

【0003】この技術によれば、光導電層をグロー放電
法にて形成するに際しジボランとシランの流量比〔B2
6 〕/〔SiH4 〕を1〜10ppmとしたことで、
帯電保持性が向上し、さらに700nm以上の長波長光
に対し感度が上がるという効果がある。
According to this technique, when forming a photoconductive layer by a glow discharge method, a flow rate ratio of diborane to silane [B 2
By setting H 6 ] / [SiH 4 ] to 1 to 10 ppm,
There is an effect that charge retention is improved, and sensitivity to long wavelength light of 700 nm or more is increased.

【0004】他方、電荷ブロッキング層(電荷注入阻止
層)と電荷輸送層と電荷発生層(光導電層)と表面保護
層とを順次積層したa−Si感光体において、a−Si
光導電層のボロンドーピングレベルを表面保護層側に高
く、電荷輸送層に向かって減少させることで、高感度に
して残留電位を下げ、これによって画像流れ(画像ぼ
け)をなくした技術が提案されているが(特開平3−9
2865号参照)、このa−Si感光体を半導体レーザ
ープリンタ用感光体に適用することは明記されていな
い。
On the other hand, in an a-Si photosensitive member in which a charge blocking layer (charge injection blocking layer), a charge transport layer, a charge generation layer (photoconductive layer) and a surface protection layer are sequentially laminated,
A technique has been proposed in which the boron doping level of the photoconductive layer is increased toward the surface protective layer and decreased toward the charge transport layer, thereby increasing the sensitivity and reducing the residual potential, thereby eliminating image blurring (image blurring). (Japanese Unexamined Patent Application Publication No.
No. 2,865), the application of this a-Si photosensitive member to a photosensitive member for a semiconductor laser printer is not specified.

【0005】[0005]

【発明が解決しようとする課題】上記のとおり、従来の
半導体レーザープリンタ用a−Si感光体においては、
帯電保持性および光感度を向上させるためにa−Si光
導電層にボロンをドーピングしていた。
As described above, in the conventional a-Si photosensitive member for a semiconductor laser printer,
The a-Si photoconductive layer has been doped with boron in order to improve charge retention and photosensitivity.

【0006】しかしながら、近年、半導体レーザープリ
ンタ用感光体にドット径を小さくした高密度画像が求め
られているにもかかわらず、ボロン含有量とドット密度
との関係については、いまだ検討されていなかった。
However, despite the recent demand for high-density images with a reduced dot diameter for photoconductors for semiconductor laser printers, the relationship between boron content and dot density has not yet been studied. .

【0007】本発明者は上記事情に鑑みて高密度画像用
の条件について鋭意研究を重ねた結果、a−Si光導電
層にボロン原子をシリコン原子に対し0.08〜0.7
ppm含有させると600dpi以上のドット密度に適
することを見出した。
In view of the above circumstances, the present inventor has conducted intensive studies on the conditions for high-density images, and has found that boron atoms are contained in the a-Si photoconductive layer in an amount of 0.08 to 0.7 with respect to silicon atoms.
It has been found that when contained in ppm, it is suitable for a dot density of 600 dpi or more.

【0008】したがって本発明は上記知見にもとづいて
完成されたものであり、その目的は高解像度に適したa
−Si層構造をなして、高品質の高密度画像を達成した
画像形成装置を提供することにある。
Accordingly, the present invention has been completed based on the above findings, and its purpose is to provide an a
An object of the present invention is to provide an image forming apparatus having a high quality and high density image by forming a Si layer structure.

【0009】また、本発明の他の目的は高解像度ととも
に、帯電能も高めた画像形成装置を提供することにあ
る。
It is another object of the present invention to provide an image forming apparatus having a high resolution and an improved charging ability.

【0010】[0010]

【課題を解決するための手段】本発明の画像形成装置
は、導電性基板上にa−Siからなる電荷注入阻止層、
光導電層および表面保護層を順次積層した感光体と、感
光体の表面に電荷を付与する帯電手段と、感光体の帯電
領域に対し600dpi以上のドット密度でもって光照
射する露光手段と、これら帯電手段と露光手段とにより
感光体の表面に静電潜像を形成し、この静電潜像に対応
したトナー像を感光体の表面に形成する現像手段と、ト
ナー像を被転写材に転写する転写手段と、この転写後に
感光体表面の残留トナーを除去するクリーニング手段
と、転写後に残余静電潜像を除去する除電手段とを配設
し、上記光導電層にボロン原子(B)をシリコン原子
(Si)に対し0.08〜0.7ppmの比率で含有せ
しめたことを特徴とする。
According to the present invention, there is provided an image forming apparatus comprising: a charge injection preventing layer made of a-Si on a conductive substrate;
A photoconductor in which a photoconductive layer and a surface protection layer are sequentially laminated, a charging unit for applying a charge to the surface of the photoconductor, an exposure unit for irradiating the charged area of the photoconductor with light with a dot density of 600 dpi or more; Developing means for forming an electrostatic latent image on the surface of the photoreceptor by the charging means and exposure means, and forming a toner image corresponding to the electrostatic latent image on the surface of the photoreceptor; and transferring the toner image to a transfer-receiving material Transfer means, a cleaning means for removing the residual toner on the photoreceptor surface after the transfer, and a charge removing means for removing the residual electrostatic latent image after the transfer, and the boron atom (B) is added to the photoconductive layer. It is characterized in that it is contained at a ratio of 0.08 to 0.7 ppm with respect to silicon atoms (Si).

【0011】[0011]

【発明の実施の形態】感光体の構成 図1は発明の実施形態に係る感光体1の層構成であり、
導電性基板2の上にグロー放電分解法によりa−Siか
らなる電荷注入阻止層3およびa−Siからなる光導電
層4とを順次積層し、この光導電層4上に表面保護層5
を積層する。
Diagram 1 of the embodiment of the invention photoreceptor is a layer structure of the photosensitive member 1 according to the embodiment of the invention,
A charge injection blocking layer 3 made of a-Si and a photoconductive layer 4 made of a-Si are sequentially laminated on a conductive substrate 2 by a glow discharge decomposition method, and a surface protective layer 5 is formed on the photoconductive layer 4.
Are laminated.

【0012】導電性基板2には銅、黄銅、SUS、A
l、Niなどの金属導電体、あるいはガラス、セラミッ
クなどの絶縁体の表面に導電性薄膜を被覆したものなど
がある。この導電性基板2はシート状、ベルト状もしく
はウェブ状可とう性導電シートでもよく、このようなシ
ートにはSUS、Al、Niなどの金属シート、あるい
はポリエステル、ナイロン、ポリイミドなどの高分子樹
脂フィルムの上にAl、Niなどの金属もしくは酸化ス
ズ、インジウム・スズ・オキサイド(ITO)などの透
明導電性材料や有機導電性材料を蒸着などにより被覆し
て導電処理したものを用いる。
Copper, brass, SUS, A
Metallic conductors such as 1 and Ni, or insulators such as glass and ceramic, each of which has a surface coated with a conductive thin film. The conductive substrate 2 may be a sheet-shaped, belt-shaped or web-shaped flexible conductive sheet, such as a metal sheet such as SUS, Al, or Ni, or a polymer resin film such as polyester, nylon, or polyimide. A metal such as Al or Ni, or a transparent conductive material such as indium tin oxide (ITO) or an organic conductive material is coated thereon by vapor deposition or the like, and is subjected to a conductive treatment.

【0013】上記電荷注入阻止層3と表面保護層5はa
−Si、a−SiC、アモルファスシリコンナイトライ
ド、アモルファスシリコンオキサイド等をグロー放電分
解法、真空蒸着法、活性反応蒸着法、イオンプレーテイ
ング法、RFスパッタリング法、DCスパッタリング
法、RFマグネトロンスパッタリング法、DCマグネト
ロンスパッタリング法、熱CVD法などで成膜形成す
る。電荷注入阻止層3については、価電子制御用不純物
としてのIII a族元素および/またはVa族元素をドー
ピングしてもよい。
The charge injection blocking layer 3 and the surface protection layer 5 are a
-Si, a-SiC, amorphous silicon nitride, amorphous silicon oxide, etc. by glow discharge decomposition, vacuum evaporation, active reactive evaporation, ion plating, RF sputtering, DC sputtering, RF magnetron sputtering, DC A film is formed by a magnetron sputtering method, a thermal CVD method, or the like. The charge injection blocking layer 3 may be doped with a group IIIa element and / or a group Va element as a valence electron controlling impurity.

【0014】また、電荷注入阻止層3に酸素や窒素を含
有させると、禁制帯幅が大きくなり、これによって電荷
注入阻止という機能上、障壁を高くすることができ、し
かも、酸素を含有させることで基板との密着性が高めら
れる点でよい。ただし、酸素のみではシランガスとの反
応して爆発を引き起こし易いので不活性な窒素も併存さ
せるとよく、実際には一酸化窒素(NO)ガスなどを使
用する。
When the charge injection blocking layer 3 contains oxygen or nitrogen, the forbidden band width is widened, whereby the function of preventing charge injection can be increased, and the barrier can be increased. Thus, the adhesiveness with the substrate can be improved. However, if only oxygen is used, it reacts with the silane gas to easily cause an explosion. Therefore, it is preferable to use inert nitrogen together. In practice, nitrogen monoxide (NO) gas or the like is used.

【0015】そして、光導電層4にボロン原子(B)を
シリコン原子(Si)に対し0.08〜0.7ppmの
範囲にて含有させるとよく、この原子比率B/Siが
0.08ppm未満の場合にはドットの輪郭が滲みはじ
め、0.7ppmを越えると帯電能が減衰する。このよ
うに規定したB原子含有領域は光導電層4の全体に含有
させてもよいが、あるいは光導電層4内の表面保護層5
側に接する領域でもって、B原子含有領域となしてもよ
く、B原子含有領域にて原子比率B/Siを0.08〜
0.7ppmの範囲にする。その場合に、それ以外の領
域におけるB原子の含有量は上記のB原子含有より少な
くても、多くてもよい。
Preferably, the photoconductive layer 4 contains boron atoms (B) in a range of 0.08 to 0.7 ppm with respect to silicon atoms (Si), and the atomic ratio B / Si is less than 0.08 ppm. In the case of (1), the outline of the dots starts to blur, and when the concentration exceeds 0.7 ppm, the charging ability is attenuated. The B atom-containing region defined as described above may be contained in the entire photoconductive layer 4 or may be contained in the surface protective layer 5 in the photoconductive layer 4.
The region adjacent to the side may be a B atom-containing region. In the B atom-containing region, the atomic ratio B / Si is 0.08 to
The range is 0.7 ppm. In that case, the content of B atoms in other regions may be lower or higher than the above B atom content.

【0016】かくして本発明に係る感光体1によれば、
光導電層にB原子を上記のように限定し含有させること
で、600dpi以上のドット密度の高解像度に適し、
高密度画像用の画像形成装置となる。
Thus, according to the photoreceptor 1 according to the present invention,
By limiting and containing B atoms in the photoconductive layer as described above, it is suitable for high resolution with a dot density of 600 dpi or more,
It becomes an image forming apparatus for high-density images.

【0017】また、表面保護層5をa−SiCでもって
形成すると、帯電能および解像度が向上するが、さらに
光導電層4と表面保護層5との間にカーボンを表面保護
層5に比べて少なく含有するa−Siでもって形成した
中間層を介在させることで、帯電能がさらに向上する。
When the surface protective layer 5 is formed of a-SiC, the charging ability and the resolution are improved, but carbon is further provided between the photoconductive layer 4 and the surface protective layer 5 as compared with the surface protective layer 5. By interposing an intermediate layer formed with a-Si containing a small amount, the charging ability is further improved.

【0018】このような中間層のカーボン含有分布を図
3と図4に示す。これらの図において、横軸は層厚方向
であり、aは光導電層4との界面、bは表面保護層5と
の界面を示す。縦軸はカーボンの含有量である。
FIG. 3 and FIG. 4 show the carbon content distribution of such an intermediate layer. In these figures, the abscissa indicates the layer thickness direction, a indicates the interface with the photoconductive layer 4, and b indicates the interface with the surface protective layer 5. The vertical axis is the carbon content.

【0019】図3は光導電層4をたとえばシランガスに
て成膜中にグロー放電を止めないで徐々にメタンガスな
どを導入し、増大させた場合である。図4は光導電層4
の成膜放電を止め、その後にメタンガスなどを導入し、
さらに漸次増大させた場合である。とくに図4に示すよ
うな段差のある界面aを設けることで、帯電能が高くな
り、これによってさらに高い解像性を得ることができ
た。また、界面a(部位a)におけるC/Si原子比率
は50%以下、好適には3〜35%にすると、高い帯電
能が得られる。
FIG. 3 shows a case where the methane gas or the like is gradually introduced and stopped without stopping the glow discharge during the film formation of the photoconductive layer 4 with, for example, silane gas. FIG. 4 shows the photoconductive layer 4
Film formation discharge, and then introduce methane gas etc.
This is a case where it is further increased gradually. In particular, by providing an interface a having a step as shown in FIG. 4, the charging ability was increased, and thereby higher resolution could be obtained. Further, when the C / Si atomic ratio at the interface a (site a) is 50% or less, preferably 3 to 35%, high charging ability is obtained.

【0020】さらにまた、表面保護層5をa−SiCで
形成した場合に、その層厚を10,000〜20,00
0Åにすることで、濃度低下もなく、しかも、黒ベタ画
像のカサツキを抑制することができ、均一な濃度を有す
る黒ベタを印字することができる点で望ましい。なお、
ここでのカサツキとは実印字したときに黒ベタ濃度が均
一にならず、所々に濃度の薄い箇所ができる現象を言
う。
Further, when the surface protection layer 5 is formed of a-SiC, the thickness of the layer is 10,000 to 20,000.
By setting the angle to 0 °, it is desirable in that there is no decrease in density, the roughness of a solid black image can be suppressed, and solid black having a uniform density can be printed. In addition,
Here, the crispness refers to a phenomenon in which, when actual printing is performed, the solid black density is not uniform, and places with low density are formed in some places.

【0021】画像形成装置の構成 図2は本発明の感光体を搭載したプリンター構成の画像
形成装置7であり、8は感光体であり、この感光体8の
周面にコロナ帯電器9と、その帯電後に光照射する露光
器10(LEDヘッドもしくはレーザー光)と、トナー
像を感光体8の表面に形成するためのトナー11を備え
た現像機12と、そのトナー像を被転写材13に転写す
る転写器14と、その転写後に感光体表面の残留トナー
を除去するクリーニング手段15と、その転写後に残余
静電潜像を除去する除電手段16とを配設した構成であ
る。また、17は被転写材13に転写されたトナー像を
熱もしくは圧力により固着するための定着器である。
[0021] Configuration FIG. 2 of the image forming apparatus is an image forming apparatus 7 equipped with a printer constituting the photosensitive member of the present invention, 8 denotes a photosensitive member, a corona charger 9 to the peripheral surface of the photoconductor 8, Exposure device 10 (LED head or laser light) for irradiating light after the charging, developing device 12 provided with toner 11 for forming a toner image on the surface of photoconductor 8, and transferring the toner image to transfer material 13 A transfer unit 14 for transferring, a cleaning unit 15 for removing residual toner on the surface of the photoconductor after the transfer, and a charge removing unit 16 for removing a residual electrostatic latent image after the transfer are provided. Reference numeral 17 denotes a fixing device for fixing the toner image transferred to the transfer material 13 by heat or pressure.

【0022】このカールソン法は次の〜の各プロセ
スを繰り返し経る。 感光体8の周面をコロナ帯電器9により帯電する。 露光器10により画像を600dpi以上のドット
密度でもって光照射することにより、感光体8の表面上
に電位コントラストとしての静電潜像を形成する。 この静電潜像を現像機12により乾式現像あるいは
湿式現像する。この現像によりトナーが静電潜像との静
電引力により感光体表面に付着し、可視化する。 感光体表面のトナー像を紙などの被転写材13の裏
面よりトナーと逆極性の電界を加えて、静電転写し、こ
れにより、画像を被転写材13の上に得る。 感光体表面の残留トナーをクリーニング手段15に
より機械的に除去する。 感光体表面を強い光で全面露光し、除電手段16に
より残余の静電潜像を除去する。
In the Carlson method, the following processes are repeated. The peripheral surface of the photoconductor 8 is charged by the corona charger 9. By irradiating the image with light at a dot density of 600 dpi or more by the exposure device 10, an electrostatic latent image as a potential contrast is formed on the surface of the photoconductor 8. This electrostatic latent image is subjected to dry development or wet development by the developing device 12. Due to this development, the toner adheres to the surface of the photoreceptor by electrostatic attraction with the electrostatic latent image and is visualized. The toner image on the surface of the photoreceptor is electrostatically transferred from the back surface of the transfer material 13 such as paper by applying an electric field having a polarity opposite to that of the toner, whereby an image is obtained on the transfer material 13. The cleaning unit 15 mechanically removes residual toner on the surface of the photoconductor. The entire surface of the photoconductor is exposed to intense light, and the remaining electrostatic latent image is removed by the charge removing means 16.

【0023】[0023]

【実施例】(例1)純度99.9%のAlからなる円筒
状の基板(外径100mm、長手寸法364mm)の上
に表1に示すような成膜条件(この条件は一チェンバ内
での値である)でもってグロー放電分解法により電荷注
入阻止層3、光導電層4(ボロン原子がB/Si原子比
率で0.2ppm含む)および表面保護層5を積層し
た。なお、表面保護層5のガス量および成膜速度に示す
→は経時的に変化した際の最初の値と最後の値を示す。
(Example 1) Film forming conditions as shown in Table 1 on a cylindrical substrate (outer diameter 100 mm, longitudinal dimension 364 mm) made of Al having a purity of 99.9% (this condition is within one chamber). The charge injection blocking layer 3, the photoconductive layer 4 (containing boron atoms in a B / Si atomic ratio of 0.2 ppm) and the surface protective layer 5 were laminated by the glow discharge decomposition method. In addition, → shown in the gas amount and the film formation rate of the surface protective layer 5 indicates the first value and the last value when it changes with time.

【0024】[0024]

【表1】 [Table 1]

【0025】さらに表1の示す層構成に対し図4に示す
中間層を介在させた。この中間層の成膜条件は表2に示
すとおりである。同表において、光導電層4との界面
a、表面保護層5との界面bとの間にある部位s、部位
t(図4に示す)についての成膜条件も示すが、これに
よって部位a〜部位bまでの間を漸次組成比率を変え
る。
Further, an intermediate layer shown in FIG. 4 was interposed in the layer structure shown in Table 1. The conditions for forming the intermediate layer are as shown in Table 2. In the same table, the film forming conditions for the portion a and the portion t (shown in FIG. 4) between the interface a with the photoconductive layer 4 and the interface b with the surface protective layer 5 are also shown. The composition ratio is gradually changed from to the part b.

【0026】[0026]

【表2】 [Table 2]

【0027】そして、光導電層4の層厚を幾とおりにも
変えた各種感光体(試料No.1〜No.9)を作製
し、画像形成装置7に搭載し、ドット径と解像性ならび
に帯電能を判定したところ、表3に示すような結果が得
られた。
Then, various photoconductors (samples No. 1 to No. 9) in which the thickness of the photoconductive layer 4 was changed in various ways were prepared and mounted on the image forming apparatus 7, and the dot diameter and the resolution were measured. When the charging ability was determined, the results shown in Table 3 were obtained.

【0028】解像性の判定は○と×の2とおりの基
準でもって評価した。○印は600dpi以上の解像
性が得られた場合であり、×印はそのような高解像性
が得られなかった場合である。
The resolution was evaluated based on two criteria of ○ and ×. The mark “○” indicates a case where a resolution of 600 dpi or more was obtained, and the mark “X” indicates a case where such a high resolution was not obtained.

【0029】[0029]

【表3】 [Table 3]

【0030】この表から明らかなとおり、試料No.1
〜4のようにドット径が42μm以下の場合(600d
pi以上)には20μm以下の厚みでもって高い解像性
が得られたことがわかる。
As is clear from this table, Sample No. 1
When the dot diameter is 42 μm or less as shown in FIGS.
It can be seen that high resolution was obtained with a thickness of 20 μm or less.

【0031】(例2)つぎに(例1)にて作製した感光
体について、中間層のa部位でのCH4 /SiH4 ガス
流量比率を幾とおりにも変えて(このガス流量比率でも
って40秒成膜し、図4にて層厚x(部位a〜部位s)
に相当する)、a部位でのC/Si原子比率をさまざま
に規定し、さらに光導電層4の層厚も幾とおりにも変え
た各種感光体を作製し、それらの解像性を測定したとこ
ろ、表4に示すような結果が得られた。ただし、C/S
i原子比率が零である場合には、部位sより漸次メタン
ガスを増大することで、図3に示す中間層となした。
(Example 2) Next, with respect to the photoreceptor prepared in (Example 1), the CH 4 / SiH 4 gas flow ratio at the portion a of the intermediate layer was changed in various ways (with this gas flow ratio). A film was formed for 40 seconds, and the layer thickness x (portion a to site s) in FIG.
Various photoconductors were prepared in which the C / Si atomic ratio at the site a was variously defined, and the layer thickness of the photoconductive layer 4 was varied in various ways, and their resolution was measured. However, the results shown in Table 4 were obtained. However, C / S
When the i atomic ratio was zero, the intermediate layer shown in FIG. 3 was formed by gradually increasing the methane gas from the site s.

【0032】[0032]

【表4】 [Table 4]

【0033】表4の結果から明らかなとおり、図3に示
す中間層(C/Si原子比率=0%)である場合にも光
導電層4の厚みを5μmにまで小さくすることで、60
0dpi以上の解像性が得られた。さらに図4の中間層
でもって形成した場合には、光導電層4の厚みを40μ
mにまで大きくすることができ、これによって帯電能を
630Vまで高めることができた。
As is clear from the results in Table 4, even in the case of the intermediate layer (C / Si atomic ratio = 0%) shown in FIG. 3, by reducing the thickness of the photoconductive layer 4 to 5 μm,
A resolution of 0 dpi or more was obtained. Further, when the photoconductive layer 4 is formed with the intermediate layer of FIG.
m, thereby increasing the charging ability to 630 V.

【0034】(例3)図4に示す中間層を介在させ、さ
らにa部位におけるCH4 /SiH4 のガス流量比率を
1.00にして(C/Si原子比率は22.8%)、そ
の成膜時間を幾とおりにも変え(図4にて層厚xで示
す)、さらに光導電層4の層厚も幾とおりにも変えた各
種感光体を作製し、画像形成装置7に搭載し、ドット径
と解像性を判定したところ、表5に示すような結果が得
られた。
(Example 3) The intermediate layer shown in FIG. 4 was interposed, and the gas flow ratio of CH 4 / SiH 4 at site a was set to 1.00 (C / Si atomic ratio was 22.8%). Various photoconductors were prepared by changing the film formation time in various ways (indicated by the layer thickness x in FIG. 4) and further changing the layer thickness of the photoconductive layer 4 in various ways, and mounted on the image forming apparatus 7. When the dot diameter and the resolution were determined, the results shown in Table 5 were obtained.

【0035】[0035]

【表5】 [Table 5]

【0036】表5に示す結果から明らかなとおり、層厚
範囲xを40Åもしくは80Åにしたことで、光導電層
4を40μmの厚みにまで大きくでき、帯電能を高める
ことができた。
As is clear from the results shown in Table 5, by setting the layer thickness range x to 40 ° or 80 °, the photoconductive layer 4 could be increased to a thickness of 40 μm, and the charging ability could be increased.

【0037】(例4)(例3)の感光体について、a部
位におけるCH4 /SiH4 のガス流量比率を1.00
にして(C/Si原子比率は22.8%)、その成膜時
間を40秒にして(層厚x:160Å)、光導電層4の
厚みを20μmにした感光体に対し、光導電層4のボロ
ン量を幾とおりにも変えた各種感光体を作製し(試料N
o.10〜No.19)、それぞれを画像形成装置7に
搭載し、ドット径と解像性を判定したところ、表6に示
すような結果が得られた。なお、ボロン量はSIMSに
よって測定し、その測定結果に基づいてB2 6 /Si
4 ガス流量比率に対し0.8を乗じることでB/Si
原子比率とした。また、解像性の評価である△印は若
干劣化したことで実用上支障がある場合である。
(Example 4) With respect to the photoreceptor of (Example 3), the gas flow ratio of CH 4 / SiH 4 at the portion a was 1.00.
(C / Si atomic ratio is 22.8%), the film formation time is 40 seconds (layer thickness x: 160 °), and the photoconductive layer 4 has a thickness of 20 μm. Various photoconductors in which the amount of boron of Example 4 was changed in various ways were prepared (Sample N).
o. 10-No. 19), each was mounted on the image forming apparatus 7, and the dot diameter and the resolution were determined. The results shown in Table 6 were obtained. The amount of boron was measured by SIMS, and based on the measurement result, B 2 H 6 / Si
By multiplying the H 4 gas flow ratio by 0.8, B / Si
The atomic ratio was used. In addition, the mark “△”, which is the evaluation of the resolution, is a case where there is a practical problem due to slight deterioration.

【0038】[0038]

【表6】 [Table 6]

【0039】本発明の試料No.13〜No.16につ
いては、いずれも600dpi以上の解像性が得られ、
しかも、帯電能が高くなり、ドットの輪郭に滲みがな
く、カブリが生じなかった。しかるに試料No.10〜
No.12ではドットの輪郭に滲みがあり、いわゆる
「ボケ」が発生した。また、試料No.17〜19では
帯電能が減衰することで、カブリが発生した。
Sample No. of the present invention 13-No. Regarding No. 16, a resolution of 600 dpi or more was obtained, and
In addition, the charging ability was increased, the outline of the dots was not blurred, and no fogging occurred. However, the sample No. 10
No. In No. 12, the outline of the dots was blurred, and so-called "blur" occurred. In addition, the sample No. In Nos. 17 to 19, fogging occurred due to the decrease in charging ability.

【0040】(例5)本発明の試料No.4(光導電層
4の層厚:20μm、a部位におけるC/Si原子比
率:11.6%、層厚x:80Å)について、表面保護
層の厚みを幾とおりにも変えて、黒ベタカサツキ度を測
定したところ、表7に示すような結果が得られた。
Example 5 Sample No. of the present invention 4 (layer thickness of photoconductive layer 4: 20 μm, C / Si atomic ratio at site a: 11.6%, layer thickness x: 80 °), the thickness of the surface protective layer was changed in any number of ways, and the degree of black stickiness was changed. Was measured, the results shown in Table 7 were obtained.

【0041】○印はカサツキ画像とならず、濃度の低
下もない優れた画像が得られた場合であり、△印は若
干画像の劣化が認められた場合であり、×印はカサツ
キや濃度低下が顕著に現れ、実用上支障のある場合であ
る。
○ indicates a case where an excellent image was obtained without a rough image and no decrease in density, △ indicates a case where the image was slightly deteriorated, and X indicates a case where the image was rough or the density was reduced. Is remarkable and there is a problem in practical use.

【0042】[0042]

【表7】 [Table 7]

【0043】本発明の試料No.24〜No.26につ
いては、a−SiC表面保護層の厚みを10,000〜
20,000Åにしたことで、カサツキ画像とならず、
さらに濃度低下もない優れた画像が得られた。
Sample No. of the present invention 24-No. For 26, the thickness of the a-SiC surface protective layer was set to 10,000 to
By making it 20,000Å, it will not be a Kasatsu image,
Further, an excellent image without a decrease in density was obtained.

【0044】[0044]

【発明の効果】以上のとおり、本発明の画像形成装置に
よれば、a−Si光導電層にB原子をSi原子に対し
0.08〜0.7ppmの比率で含有させたことで、6
00dpi以上の高解像度が得られた。
As described above, according to the image forming apparatus of the present invention, since the a-Si photoconductive layer contains B atoms at a ratio of 0.08 to 0.7 ppm with respect to Si atoms, 6% is obtained.
High resolution of 00 dpi or more was obtained.

【0045】また、本発明においては、光導電層とa−
SiC表面保護層との間に、カーボンを表面保護層5に
比べて少なく含有するa−Siでもって形成した中間層
を設けることで、とくに光導電層との界面にカーボン量
を段差が生じる程度に含有分布させることで、高解像度
とともに帯電能が高くすることができた。さらにまた、
a−SiC表面保護層の厚みを10,000〜20,0
00Åにしたことで、カサツキ画像とならず、濃度低下
もない優れた画像が得られた。
In the present invention, the photoconductive layer and the a-
By providing an intermediate layer formed of a-Si containing a smaller amount of carbon than the surface protective layer 5 between the SiC surface protective layer and the surface protective layer 5, the level of the carbon can be reduced particularly at the interface with the photoconductive layer. , The charging ability could be increased with high resolution. Furthermore,
The thickness of the a-SiC surface protective layer is from 10,000 to 20,000.
By setting the angle to 00 °, an excellent image was obtained without a rough image and without a decrease in density.

【図面の簡単な説明】[Brief description of the drawings]

【図1】発明の実施形態に係る感光体の層構成を示す断
面図である。
FIG. 1 is a cross-sectional view illustrating a layer configuration of a photoreceptor according to an embodiment of the present invention.

【図2】本発明の画像形成装置の概略図である。FIG. 2 is a schematic diagram of an image forming apparatus of the present invention.

【図3】発明の実施形態に係る感光体における中間層の
カーボン量分布を示す断面図である。
FIG. 3 is a cross-sectional view illustrating a carbon amount distribution of an intermediate layer in the photoconductor according to the embodiment of the present invention.

【図4】発明の実施形態に係る感光体における中間層の
カーボン量分布を示す断面図である。
FIG. 4 is a cross-sectional view showing a carbon amount distribution of an intermediate layer in the photoreceptor according to the embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1、8 感光体 2 基板 3 感光層 5 光導電層 6 表面保護層 7 画像形成装置 9 コロナ帯電器 10 露光器 11 トナー 12 現像機 13 被転写材 14 転写器 15 クリーニング手段 16 除電手段 DESCRIPTION OF SYMBOLS 1, 8 Photoreceptor 2 Substrate 3 Photosensitive layer 5 Photoconductive layer 6 Surface protective layer 7 Image forming apparatus 9 Corona charger 10 Exposure device 11 Toner 12 Developing machine 13 Transfer material 14 Transfer device 15 Cleaning means 16 Static elimination means

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】導電性基板上にアモルファスシリコンから
なる電荷注入阻止層、光導電層および表面保護層を順次
積層した感光体と、該感光体の表面に電荷を付与する帯
電手段と、感光体の帯電領域に対し600dpi以上の
ドット密度でもって光照射する露光手段と、これら帯電
手段と露光手段とにより感光体の表面に静電潜像を形成
し該静電潜像に対応したトナー像を感光体の表面に形成
する現像手段と、該トナー像を被転写材に転写する転写
手段と、この転写後に感光体表面の残留トナーを除去す
るクリーニング手段と、転写後に残余静電潜像を除去す
る除電手段とを配設した画像形成装置であって、前記光
導電層にボロン原子をシリコン原子に対し0.08〜
0.7ppmの比率で含有せしめたことを特徴とする画
像形成装置。
1. A photoconductor in which a charge injection blocking layer made of amorphous silicon, a photoconductive layer, and a surface protection layer are sequentially laminated on a conductive substrate, a charging unit for applying a charge to the surface of the photoconductor, and a photoconductor. Exposure means for irradiating the charged area with light at a dot density of 600 dpi or more, and forming an electrostatic latent image on the surface of the photoreceptor by the charging means and the exposure means, and forming a toner image corresponding to the electrostatic latent image Developing means for forming on the surface of the photoreceptor, transfer means for transferring the toner image to a material to be transferred, cleaning means for removing residual toner on the surface of the photoreceptor after the transfer, and removal of a residual electrostatic latent image after the transfer An image forming apparatus, wherein boron atoms are contained in the photoconductive layer by 0.08 to silicon atoms.
An image forming apparatus characterized in that it is contained at a ratio of 0.7 ppm.
JP10365403A 1998-12-22 1998-12-22 Image forming device Pending JP2000187345A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10365403A JP2000187345A (en) 1998-12-22 1998-12-22 Image forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10365403A JP2000187345A (en) 1998-12-22 1998-12-22 Image forming device

Publications (1)

Publication Number Publication Date
JP2000187345A true JP2000187345A (en) 2000-07-04

Family

ID=18484173

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10365403A Pending JP2000187345A (en) 1998-12-22 1998-12-22 Image forming device

Country Status (1)

Country Link
JP (1) JP2000187345A (en)

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