JP2000180388A - X-ray diffraction apparatus and x-ray diffracting and measuring method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain an X-ray diffraction apparatus capable of performing X-ray diffraction and measurement with respect to both of a sample large in crystal grain and a sample small in crystal grain under a proper condition. SOLUTION: An X-ray element support apparatus 11 can support a Solar slit 12 forming a parallel X-ray beam and a collimator forming a fine caliber X-ray beam in a replaceable manner. An X-ray detector 21 can selectively realize a position resolving function measuring the intensity of X-rays taken in linearly by CCD detector 9 at every position of the linear range of X-rays and an intensity averaging function averaging the intensities of linearly taken-in Xrays in the whole or a part of the linear range of X-rays to measure them as one intensity of X-rays. By selecting the solar slit 12 and the collimator and selecting the function of the X-ray detector 21, X-ray diffraction and measurement can be performed under a proper condition regardless of the size of a crystal grain.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray diffractometer which irradiates a sample with X-rays and detects the intensity of the diffracted X-ray diffracted by the sample with an X-ray detector. The present invention also relates to an X-ray diffraction measurement method performed using the X-ray diffraction device.

[0002]

2. Description of the Related Art The above-mentioned X-ray diffraction apparatus is disclosed in
As in the X-ray diffractometer disclosed in Japanese Patent Application Laid-Open No. -041076, a parallel X-ray beam having a large area is incident on a sample, and a solar slit is arranged in front of an X-ray capturing surface of an X-ray detector. There is known an X-ray diffractometer in which measurement is performed while rotating a slit in an X-ray diffraction plane. This X
According to the X-ray diffraction apparatus, there is no need to rotate the X-ray detector, which is a large instrument, around the sample, and as a result,
The effect that the whole structure of the X-ray diffraction apparatus can be formed very small can be obtained.

[0003] By the way, some samples to be measured using an X-ray diffractometer have large crystal grains, such as castings and welded structures, or have been subjected to heat-treated metals or ceramics. Some have small crystal grains. The X-ray diffractometer disclosed in Japanese Patent Publication No. 52-041076 is capable of generating a diffracted X-ray even from a sample having a large crystal grain because a parallel X-ray beam having a large area is incident on the sample. There is an advantage that a sample having such large crystal grains can be measured. However,
When trying to measure a sample having a small crystal grain using this X-ray diffraction apparatus, there is a problem that a satisfactory measurement cannot be performed because the resolution is remarkably reduced.

In the X-ray diffractometer disclosed in Japanese Patent Publication No. 52-041076, a so-called zero-dimensional counter having no position resolving function, such as a scintillation counter, is used as an X-ray detector. In order to measure the X-ray intensity at each angle, the solar slit disposed in front of the counter must be rotated in the X-ray diffraction plane, and as a result, it takes a long time for the measurement. Was.

[0005]

As described above, in the conventional X-ray diffraction apparatus disclosed in Japanese Patent Publication No. 52-041076, both a sample having a large crystal grain and a sample having a small crystal grain are used. There is a problem that measurement cannot be performed by one X-ray diffraction apparatus. In addition, since the measurement is performed while rotating the solar slit, there is a problem that it takes a long time for the measurement.

The present invention has been made in view of the above-mentioned problems in the conventional X-ray diffraction apparatus, and is suitable for both a sample having a large crystal grain and a sample having a small crystal grain. X under which X-ray diffraction measurement can be performed
It is an object to provide a X-ray diffraction apparatus and an X-ray diffraction measurement method.

[0007]

(1) In order to achieve the above object, an X-ray diffractometer according to the present invention comprises an X-ray source for irradiating a sample with X-rays, and the X-ray source. X-ray element support means for supporting an X-ray beam shaping element disposed between the sample and the sample, X-ray detection means including a linear X-ray detection element for linearly capturing diffracted X-rays from the sample, It has a solar slit detachably arranged between the X-ray detecting means and the sample, and a solar slit rotation driving means for rotating the solar slit for measurement in an X-ray diffraction plane. The X-ray element supporting means forms a parallel beam shaping element for shaping the X-rays from the X-ray source into a parallel beam having a large area and a X-ray from the X-ray source into a narrow beam having a small area. The small diameter beam shaping element can be exchanged and supported on the X-ray beam path. Further, the X-ray detecting means includes a position resolving function for measuring the X-ray intensity for each position of the linear region with respect to the X-ray captured linearly by the linear X-ray detecting element; An intensity averaging function of averaging and measuring X-rays taken linearly by the line detection element as one X-ray intensity for all or a part of the linear region is selected and realized.

According to this X-ray diffractometer, the X-ray beam forming element supported on the X-ray optical path by the X-ray element supporting means is exchanged between the parallel beam forming element and the small-diameter beam forming element. Then, by switching the function of the X-ray detecting means between the position resolving function and the intensity averaging function, both a sample having a large crystal grain and a sample having a small crystal grain are measured under appropriate conditions, respectively, and accurate measurement is performed. Measurement results can be obtained.

(2) In the X-ray diffractometer having the above configuration, the parallel beam shaping element can be constituted by using an arbitrary X-ray optical element. For example, it can be constituted by a solar slit. The solar slit is an X-ray optical element formed by stacking a plurality of thin metal plates at appropriate intervals, and restricts the divergence of X-rays incident thereon in a specific direction, and This forms a parallel X-ray beam.

(3) In the X-ray diffraction apparatus having the above configuration, the small-diameter beam shaping element can be constituted by using an arbitrary X-ray optical element. For example, it can be constituted by a collimator.

(4) In the X-ray diffractometer having the above structure, the linear X-ray detecting element is a detecting element capable of capturing X-rays within a linear range.
(Charge Coupled Device) detector, PSPC (Positio
n Sensitive Proportional Counter) or a photodiode array.

The above-mentioned CCD detector is an X-ray detector using a CCD, which is a well-known electronic device, that is, a charge-coupled device. The CCD has, for example, an electrode array formed by arranging a plurality of electrodes in a straight line on a silicon substrate with an oxide film insulating layer interposed therebetween.
What is arranged corresponding to the line inlet is a CCD detector.

When an X-ray is applied to a position corresponding to each of the electrodes constituting the electrode array, electric charges are accumulated under the electrodes and further accumulated by applying a voltage between the electrodes and the substrate one after another. The transferred charge is output to the outside. According to this CCD detector, when X-rays are incident within a linear range in which the electrode array extends, both the X-ray incident position and the X-ray intensity can be detected almost simultaneously.

The PSPC is an X-ray detector, also called a position-sensitive X-ray detector. For example, as shown in FIG. 6, the PSPC has an anode line 27, a cathode line 28, and a signal line 29 inside. When X-rays enter the inside of the PSPC through the X-ray capturing window 31, charges are induced on the cathode lines 28,
A pulse signal corresponding to the charge appears at both ends of the signal line 29, and X-rays are detected by measuring them.

The pulse signals appearing at both ends of the signal line 29 have a time difference proportional to the distance in the length direction x. Therefore, by measuring the time difference between the pulses generated at both ends of the signal line 29, the pulse signal in the length direction x is measured. At which the X-ray incident position can be found. That is, the PSPC is the X-ray capturing window 3
1, the X-ray incident position and the X-ray incidence position within the straight line range in which each line such as the anode line 27 is stretched.
Both line intensities can be detected almost simultaneously.

The above-mentioned photodiode array is formed by arranging a plurality of photodiodes, which are well-known electronic elements, in a straight line. When an X-ray is incident within a linear range in which the photodiode array extends. , And both the X-ray incident position and the X-ray intensity can be detected almost simultaneously.

(5) Next, another X-ray diffraction apparatus according to the present invention comprises an X-ray source for emitting X-rays for irradiating a sample, and an X-ray source arranged between the X-ray source and the sample. A line incident optical system, an X-ray detecting unit including a linear X-ray detecting element that linearly captures diffracted X-rays generated in the sample, a solar slit disposed between the sample and the X-ray detecting unit, Solar slit moving means for moving the solar slit between a position on the X-ray optical path and a retracted position retracted therefrom, and a solar slit rotation driving means for rotating the solar slit for measurement in an X-ray diffraction plane And The X-ray incidence optical system includes a parallel beam shaping element for shaping X-rays from the X-ray source into a parallel beam having a large area, and the X-ray incidence element.
The small-diameter beam shaping element for shaping the X-ray from the source into a small-diameter beam having a small area can be exchanged to move on the X-ray optical path. Further, the X-ray detecting means includes a position resolving function for measuring the X-ray intensity for each position of the linear region with respect to the X-ray captured linearly by the linear X-ray detecting element; An intensity averaging function of averaging and measuring X-rays taken linearly by the line detection element as one X-ray intensity for all or a part of the linear region is selected and realized.

According to this X-ray diffractometer, the X-ray beam shaping element disposed on the X-ray optical path is exchanged between the parallel beam shaping element and the small diameter beam shaping element by the function of the X-ray incident optical system. Correspondingly, by switching the function of the X-ray detecting means between the position resolving function and the intensity averaging function, both the large crystal sample and the small crystal sample are measured under appropriate conditions. Accurate measurement results can be obtained.

(6) Next, the X-ray diffraction measurement method according to the present invention is a method for measuring X-ray diffraction using an X-ray diffraction apparatus having the configuration described in (1) to (4) above.
(A) when the crystal grains of the sample are large, the parallel beam shaping element is supported by the X-ray element support means, and the solar slit is disposed between the sample and the X-ray detection means; Setting the detecting means to realize the intensity averaging function, and rotating the solar slit by the solar slit rotation driving means during measurement,
(B) when the crystal grains of the sample are small, the small-diameter beam shaping element is supported by the X-ray element support means, the solar slit is removed from between the sample and the X-ray detection means, and It is characterized in that the line detecting means is set to a state in which the position resolution function is realized.

According to this X-ray diffraction measuring method, a single X-ray detecting means including a linear X-ray detecting element is used to properly measure both a sample having a large crystal grain and a sample having a small crystal grain. X-ray diffraction measurement can be performed under such conditions, and for a sample having a small crystal, the measurement time can be shortened by utilizing the position resolving function of the linear X-ray detecting element.

[0021]

(First Embodiment) FIGS. 1 and 3 show an embodiment of an X-ray diffraction apparatus according to the present invention.
In particular, FIG. 1 shows a front view and FIG. 3 shows a side view. Further, this X-ray diffraction apparatus is considered to be used as a stress measurement apparatus for non-destructively measuring internal stress generated in a sample S placed on the sample stage 1 using X-rays.

The X-ray diffraction apparatus according to the present embodiment
Drive shaft 2 rotating about the sample axis Z passing through the surface of
And a substrate 4 fixed to the tip of the pivot arm 3. An X-ray tube 6 containing an X-ray focal point F, a solar slit 7 and a linear X-ray
A slit support 8 for supporting a CCD detector 9 as a line detection element is provided.

The X-ray tube 6 is provided with an X-ray element supporting device 11 at an X-ray extraction portion. This X-ray element support device 11
A solar slit 12 as a parallel beam shaping element can be supported on the incident X-ray optical axis _R0 , or FIG.
As shown in (1), a collimator 13 as a small-diameter beam shaping element can be supported on the incident X-ray optical axis _R0 . At the time of actual measurement, the solar slit 12 and the collimator 13 are exchanged as desired and attached to the X-ray element support device 11.

As shown in FIG. 4, the solar slit 12 has a plane including both the incident X-ray optical axis R ₀ and the diffracted X-ray optical axis R ₁ , ie, a plurality of planes extending in a direction perpendicular to the X-ray diffraction plane. It is formed by stacking the metal foils 16 at appropriate intervals in the X-ray diffraction plane direction.

The X-ray element supporting device 11 is not limited to a specific structure, but may have any structure. For example, a structure that holds using a chuck mechanism, a structure that fixes using fasteners such as screws, a structure that holds using pneumatic or hydraulic pressure, and a structure that holds using a power source such as a motor or solenoid And various other structures are conceivable.

In FIG. 1, a slit support 8 is fixed to an output shaft 14a of a pulse motor 14 as a solar slit rotation driving means, and a solar slit 7 is detachably mounted on the slit support 8, ie, detachably fixed. Is done. Therefore, Soller slit 7 can be detached from the slit supporting table 8, as shown in FIG. 2, i.e. from the diffraction X-ray path comprising a diffraction X-ray optical axis R _1. In the present embodiment, the CCD detector 9 does not necessarily need to be detachable from the slit support 8. The pulse motor 14 rotates by an angle corresponding to the pulse signal output from the slit drive circuit 18 shown in FIG. The rotation angle can be measured, for example, by counting the number of pulses of a pulse signal for driving the motor.

The solar slit 7 is, as shown in FIG.
A plane including both the incident X-ray optical axis R ₀ and the diffracted X-ray optical axis R ₁ , that is, a plurality of metal foils 17 extending in a direction perpendicular to the X-ray diffraction plane are arranged at appropriate intervals in the X-ray diffraction plane direction. Formed by stacking.

In FIG. 1, the CCD detector 9 has an electrode array formed by linearly arranging a plurality of electrodes at intervals. The CCD detector 9 is arranged on the slit support 8 so that the built-in electrode array is along the direction of arrow A, that is, along the direction of the diffraction angle of the diffracted X-ray diffracted by the sample S. An X-ray intensity calculation circuit 19 is connected to an output terminal of the CCD detector 9. In the present embodiment, the X-ray detection means 21 is constituted by the CCD detector 9 and the X-ray intensity calculation circuit 19.

The X-ray intensity calculation circuit 19 executes two different calculation modes, a position analysis mode and an intensity averaging mode, in accordance with a command from a host computer (not shown). The position analysis mode is a mode in which the X-ray intensity corresponding to each position of the X-ray intake of the CCD detector 9, that is, the X-ray intensity at each angular position in the diffraction angle direction is individually and independently measured. On the other hand, the intensity averaging mode is a mode in which the X-ray intensity corresponding to each electrode is averaged to calculate one X-ray intensity. At this time, the averaging range in the electrode array may be the entire area of the electrode array, or a partial area of an appropriate range centered on a diffraction angle specific to the sample S which is known in advance. It may be.

The X-ray diffractometer having the above-mentioned structure is used for casting,
Measurement can be performed under appropriate conditions for both a sample having a large crystal grain such as a welded structure and a sample having a small crystal grain such as a heat-treated metal or ceramic. Hereinafter, those measurement methods will be individually described.

(Measurement of Sample with Large Crystal Grains) When measuring a sample with large crystal grains using the X-ray diffractometer of the present embodiment, as shown in FIG. Supports the slit 12. Further, the solar slit 7 is mounted on the slit support 8 between the sample S and the X-ray detection means 21. Further, the X-ray detection means 21 is set in the intensity averaging mode, that is, the X-rays which are linearly captured.
A mode is set in which the X-ray intensity of the line is averaged for all or a part of the linear region and calculated as one X-ray intensity. Here, the partial area is a known sample S
Is a region in an appropriate range centered on the diffraction angle.

After the above settings, the sample S is placed on the sample table 1 and
X-rays are emitted from an X-ray focal point F. The emitted X-ray has a large area, for example, 4 mm × 4
It is shaped into a parallel X-ray beam having an area of about 4 mm × 20 mm and incident on the sample S. When the incident X-ray satisfies the Bragg diffraction condition with respect to the crystal lattice plane of the sample S, X-ray diffraction occurs in the sample S, and the diffracted X-ray reaches the solar slit 7. If the diffracted X-rays have a positional relationship that allows them to pass through the solar slit 7, the diffracted X-rays pass through the solar slit 7 and are captured by the CCD detector 9. In the current state, the CCD detector 9 is set to the intensity averaging mode. Therefore, even if the CCD detector 9 captures an X-ray at any position in the A direction, that is, the diffraction angle direction, the CCD detector 9 converts the X-ray into one X-ray intensity. Is integrated, that is, averaged and output.

When measuring the internal stress of the sample S, the diffraction angle α of the sample S has a substantially constant value in FIG. Therefore, for example, the CC is set so that the diffracted X-ray X ₂ in the standard sample is incident on almost the center of the X-ray capturing surface of the CCD detector 9.
The position of the D detector 9 is adjusted.

At the time of actual measurement, diffraction X-rays from sample S when X-rays are incident on sample S at right angles from X-ray tube 6
The diffraction angle of the X-ray and the diffraction angle when the drive shaft 2 is rotated by, for example, 45 ° and the X-ray is incident on the sample S at an angle of 45 ° are measured, and the sample is determined based on the measured diffraction angles. The internal stress of S is obtained by calculation.

When measuring the diffraction angle as described above, when the solar slit 7 is rotated, the CCD detector 9
The diffraction angle is obtained based on the degree of change in the intensity of the diffracted X-ray detected by the method. Specifically, first, when the slit 7 is arranged as shown by a solid line in FIG.
While a solid line of the diffracted X-rays in the direction of arrow X ₂ is detected by the CCD detector 9 through the solar slit 7, the broken line X
The traveling of the diffracted X-ray like ₃ is blocked by the solar slit 7.

Further, when rotated to a position shown Soller slit 7 by a chain line 7a, the diffracted X-rays is the slit 7 of the arrow X ₃
Through the detected at the CCD detector 9, X-ray of the arrow X ₂ is cut off. Accordingly, when the relationship between the rotation angle B of the slit 7 and the intensity I of the detected X-ray is obtained, a curve as shown in FIG. 5 is obtained, and the diffraction angle of the X-ray can be known from the maximum position of this curve. . Further, since the rotation angle β of the solar slit 7 is equal to the deviation angle γ of the detected diffracted X-ray, the X-ray diffraction angle is directly displayed by the rotation angle.

According to the above measurement, the X-ray diffraction angle is measured by rotating the solar slit 7 and the CCD detector 9 about the motor shaft 14a. This structure is much simpler than the structure in which the CCD detector 9 is rotated about the sample axis Z, and can ensure stable and accurate movement.

(Measurement of Sample with Small Crystal Grains) When measuring a sample with small crystal grains using the X-ray diffraction apparatus of the present embodiment, as shown in FIG. Supports 13. Sample S
The solar slit 7 is removed from the slit support 8 between the X-ray detector 21 and the X-ray detector 21. Further, the X-ray detecting means 21 is operated in the position analysis mode, that is, the X-ray intensity corresponding to each electrode constituting the electrode array extending in the X-ray diffraction direction, that is, the X-ray intensity at each angular position in the diffraction angle direction is individually independent. And set the mode to measurement.

The collimator 13 shapes the X-ray from the X-ray focal point F into an X-ray beam having a small diameter, for example, a diameter of 0.1 mm to 2 mm, and makes the X-ray beam enter a minute area of the sample S. Since the crystal grains of the sample S are small, diffracted X-rays can be reliably taken out from the minute region. The diffracted X-ray travels in the direction of the diffraction angle corresponding to the crystal structure.
If the X-rays fall within the line capturing area, the X-rays are captured by the CCD detector 9 and the X-ray intensity calculation circuit 19
Measure both the diffraction angle and the X-ray intensity simultaneously. The internal stress of the sample S is calculated based on the measured diffraction angle and X-ray intensity. The CCD detector 9 is kept fixed during the measurement.

According to this measurement, there is no need to rotate the solar slit 7 in the direction of the diffraction angle as in the case of the measurement by the optical arrangement of FIG. It is measured at the same time, so that the measurement can be completed in a very short time.

(Second Embodiment) FIG. 7 shows an X-axis according to the present invention.
9 shows another embodiment of the line diffraction apparatus. This X-ray diffractometer differs from the X-ray diffractometer shown in FIGS. 1 and 2 in two major ways. One is that only the solar slit 7 is supported by the slit support 8, and the CCD detector 9 is fixed to the base 4. In this manner, the CCD detector 9 is fixedly arranged, and only the solar slit 7 is used for measurement.
Even when rotating in the X-ray diffraction plane, C
Diffracted X-rays can be detected by the CD detector 9.

Another difference is that a measurement system for measuring a sample having a large crystal grain and a measurement system for measuring a sample having a small crystal grain can be automatically exchanged. is there. Specifically, in FIG. 7, an X-ray incident optical system 22 is provided between an X-ray focal point F and a sample S, and a solar slit 12, a collimator 13, and a positioning device are provided inside the X-ray incident optical system 22. 23 are provided. Positioning device 2
3 can be placed on the incident X-ray optical axis _R0 by exchanging either the solar slit 12 or the collimator 13 according to a command from the host computer 26.

The positioning device 23 can have any structure. For example, after the movement of the solar slit 12 and the collimator 13 is guided by an appropriate guide member, the solar slit 12 and the like are driven by an air cylinder, a motor, and other appropriate power sources. And the like can be used.

In the present embodiment, the pulse motor 14, the slit support 8 and the solar slit 7 of the substrate 4 are used.
Is divided from the other main body part, and the solar slit advance / retreat moving device 24 is connected to the divided part 4a. The solar slit advance / retreat device 24 can advance / retreat the substrate divided portion 4a with respect to the main body of the substrate 4 as indicated by an arrow CC 'according to a command from the host computer 26. When the divided parts 4a progresses moved in the arrow C direction, the Soller slit 7 is located on the diffraction X-ray optical axis R ₁ as indicated by the solid line, the divided parts 4a retreats moved in the arrow C 'direction, Soller slit 7 located a retracted from the diffraction X-ray optical axis R ₁ as indicated by a chain line.

According to the present embodiment, when measuring a sample having a large crystal grain, the positioning device 23 is operated in accordance with a command from the host computer 26 to dispose the solar slit 12 on the incident X-ray optical axis R _0. I do. In addition, the solar slit advance / retreat device 24 is operated by a command from the host computer 26 to operate the sample S and the X-ray detecting means 2.
1 and a solar slit 7 is arranged. Further, the X-ray detecting means 21 is set to an intensity averaging mode, that is, a mode in which the X-ray intensities of the linearly acquired X-rays are averaged and calculated as one X-ray intensity. The details of the X-ray diffraction measurement performed in this state are the same as those described with reference to FIG. 1, and thus description thereof will be omitted.

When measuring a sample having a small crystal grain, the positioning device 23 is operated by a command from the host computer 26 to make the collimator 13 incident X-ray.
It is arranged on the line optical axis _R0 . Host computer 2
Solar slit advance / retreat moving device 24 in accordance with a command from 6
To retract the solar slit 7 from between the sample S and the X-ray detection means 21. Further, the X-ray detecting means 21 is operated in the position analysis mode, that is, the X-ray intensity corresponding to each electrode constituting the electrode array extending in the X-ray diffraction direction, that is, the X-ray intensity at each angular position in the diffraction angle direction is individually independent. And set the mode to measurement. The details of the X-ray diffraction measurement performed in this state are the same as those described with reference to FIG. 2, and a description thereof will be omitted.

According to the present embodiment, as described above,
The combination of the optical elements in the X-ray diffractometer can be automatically set to optimal conditions according to the size of the crystal grains in the sample. It is possible to obtain accurate measurement results by measuring under appropriate conditions.

(Other Embodiments) The present invention has been described with reference to the preferred embodiments. However, the present invention is not limited to the embodiments, and various modifications may be made within the scope of the invention described in the claims. Can be modified. For example, the present invention is not limited to the case where the present invention is used for an X-ray diffractometer for measuring the internal stress of a sample, and can be applied to an X-ray diffractometer for performing other various measurements.

[0049]

According to the X-ray diffractometer and the X-ray diffraction measuring method of the present invention, the crystal grains can be made large by changing the minimum number of parts without changing the main part of the X-ray diffractometer. X-ray diffraction measurement can be performed on both the sample and the sample having small crystal grains under appropriate conditions.

[Brief description of the drawings]

FIG. 1 is a front view showing an embodiment of an X-ray diffraction apparatus according to the present invention.

FIG. 2 is a front view showing a different measurement form by the X-ray diffraction apparatus of FIG.

FIG. 3 is a side view of the X-ray diffraction apparatus of FIG.

FIG. 4 is an enlarged view showing a main part of the apparatus of FIG. 1;

FIG. 5 is a diagram showing an X-ray diffraction pattern showing a measurement result performed using the optical system shown in FIG. 4;

FIG. 6 is a diagram showing a PSPC which is an example of a linear X-ray detection element.

FIG. 7 is a front view showing another embodiment of the X-ray diffraction apparatus according to the present invention.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 Sample stand 2 Drive shaft 3 Revolving arm 4 Substrate 4a Substrate divided part 6 X-ray tube 7 Solar slit 8 Slit support stand 9 CCD detector (linear X-ray detection element) 11 X-ray element support device 12 Solar slit (parallel) Beam shaping element) 13 Collimator (small diameter beam shaping element) 14 Pulse motor (Solar slit rotation driving means) 14a Output shaft 21 X-ray detection means 22 X-ray incidence optical system 23 Positioning device A Electrode array direction B Rotation angle F X-ray Focus (X-ray source) R ₀ Incident X-ray optical axis R ₁ Diffracted X-ray optical axis S Sample Z Sample axis α Diffraction angle β Rotation angle

Claims (6)

[Claims] An X-ray for irradiating a sample with X-rays
X-ray element supporting means for supporting an X-ray beam shaping element disposed between the X-ray source and the sample, and a linear X-ray detecting element for linearly capturing diffracted X-rays generated in the sample -Ray detecting means including: a solar slit detachably disposed between the X-ray detecting means and the sample; and a solar slit rotation driving means for rotating the solar slit for measurement in an X-ray diffraction plane A parallel beam shaping element for shaping the X-rays from the X-ray source into a parallel beam having a large area, and a narrow beam having a small area for the X-rays from the X-ray source. Can be supported on the X-ray optical path by exchanging the narrow beam forming element
The X-ray detecting means includes a position resolving function for measuring an X-ray intensity at each position of a linear region of the X-rays linearly captured by the linear X-ray detecting element; X-rays linearly captured by the element are selected and realized as an intensity averaging function of averaging and measuring as a single X-ray intensity for all or a part of the linear region. Line diffractometer. 2. The X-ray diffraction apparatus according to claim 1, wherein the parallel beam shaping element is a solar slit. 3. The X-ray diffraction apparatus according to claim 1, wherein the small-diameter beam shaping element is a collimator. 4. The method according to claim 1, wherein the linear X-ray detecting element is a CCD (Charge).
Coupled Device (PSD) detector, PSPC (Position Sensit)
an X-ray diffractometer, wherein the X-ray diffractometer is any one of a IVE Proportional Counter) and a photodiode array. 5. An X-ray emitting X-rays for irradiating a sample.
A radiation source, an X-ray incidence optical system disposed between the X-ray source and the sample, and an X-ray detection unit including a linear X-ray detection element that linearly captures diffracted X-rays generated in the sample, A solar slit disposed between the sample and the X-ray detecting means, and a solar slit moving means for moving the solar slit between a position on the X-ray optical path and a retracted position retracted therefrom;
A solar slit rotation driving means for rotating the solar slit for measurement in an X-ray diffraction plane, wherein the X-ray incidence optical system forms X-rays from the X-ray source into a parallel beam having a large area. The parallel beam shaping element to be formed and the narrow beam shaping element for shaping the X-rays from the X-ray source into a narrow beam having a small area can be exchanged and moved on the X-ray optical path, and the X-ray detecting means comprises: A position resolving function for measuring the X-ray intensity for each position of the linear region with respect to the X-ray captured linearly by the linear X-ray detecting element;
Selecting and realizing an intensity averaging function of averaging and measuring X-rays linearly captured by the line detecting element as one X-ray intensity for all or a part of the linear region. X-ray diffractometer. 6. An X-ray diffraction measurement method using at least one of the X-ray diffraction apparatuses according to claim 1, wherein, when a crystal grain of the sample is large, the X-ray element supporting means is used. Supporting the parallel beam shaping element, arranging the solar slit between the sample and the X-ray detecting means, setting the X-ray detecting means to realize an intensity averaging function, and The solar slit is rotationally driven by solar slit rotation driving means. When the crystal grain of the sample is small, the small-diameter beam forming element is supported by the X-ray element supporting means, and the sample and the X-ray detection means are connected to each other. An X-ray diffraction measurement method, wherein the solar slit is removed from between, and the X-ray detection means is set to a state in which the position resolving function is realized.