JP2000169482A - Hydroxyphenyl group-containing organosilicon compound and its production - Google Patents
Hydroxyphenyl group-containing organosilicon compound and its productionInfo
- Publication number
- JP2000169482A JP2000169482A JP11171113A JP17111399A JP2000169482A JP 2000169482 A JP2000169482 A JP 2000169482A JP 11171113 A JP11171113 A JP 11171113A JP 17111399 A JP17111399 A JP 17111399A JP 2000169482 A JP2000169482 A JP 2000169482A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- hydroxyphenyl
- organosilicon compound
- aliphatic unsaturated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004464 hydroxyphenyl group Chemical group 0.000 title claims abstract description 60
- 150000003961 organosilicon compounds Chemical class 0.000 title claims abstract description 45
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 35
- 150000002430 hydrocarbons Chemical class 0.000 claims abstract description 24
- 239000000203 mixture Substances 0.000 claims abstract description 24
- 150000001875 compounds Chemical class 0.000 claims abstract description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 15
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 15
- 239000004215 Carbon black (E152) Substances 0.000 claims abstract description 10
- 125000003342 alkenyl group Chemical group 0.000 claims abstract description 10
- 239000003054 catalyst Substances 0.000 claims abstract description 10
- 229930195733 hydrocarbon Natural products 0.000 claims abstract description 10
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 10
- 238000007259 addition reaction Methods 0.000 claims abstract description 9
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims abstract description 7
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 3
- 239000010703 silicon Substances 0.000 claims abstract description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 claims abstract 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract 2
- -1 2-hydroxyphenyl group Chemical group 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 238000006459 hydrosilylation reaction Methods 0.000 claims description 7
- 238000005828 desilylation reaction Methods 0.000 claims description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 4
- 125000000555 isopropenyl group Chemical group [H]\C([H])=C(\*)C([H])([H])[H] 0.000 claims description 2
- 229920005989 resin Polymers 0.000 abstract description 6
- 239000011347 resin Substances 0.000 abstract description 6
- 125000000217 alkyl group Chemical group 0.000 abstract description 5
- 239000000463 material Substances 0.000 abstract 1
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 15
- 239000003822 epoxy resin Substances 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 238000004566 IR spectroscopy Methods 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
- 229920002379 silicone rubber Polymers 0.000 description 10
- 239000004945 silicone rubber Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000004458 analytical method Methods 0.000 description 8
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- 239000005011 phenolic resin Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000009835 boiling Methods 0.000 description 4
- 239000010410 layer Substances 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012044 organic layer Substances 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- KWEKXPWNFQBJAY-UHFFFAOYSA-N (dimethyl-$l^{3}-silanyl)oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)C KWEKXPWNFQBJAY-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000007809 chemical reaction catalyst Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- ZBMGMUODZNQAQI-UHFFFAOYSA-N dimethyl(prop-2-enyl)silicon Chemical compound C[Si](C)CC=C ZBMGMUODZNQAQI-UHFFFAOYSA-N 0.000 description 2
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- RRAFCDWBNXTKKO-UHFFFAOYSA-N eugenol Chemical compound COC1=CC(CC=C)=CC=C1O RRAFCDWBNXTKKO-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- 125000006038 hexenyl group Chemical group 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920006136 organohydrogenpolysiloxane Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- 235000011152 sodium sulphate Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 description 1
- 125000001989 1,3-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([H])C([*:2])=C1[H] 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- QIRNGVVZBINFMX-UHFFFAOYSA-N 2-allylphenol Chemical compound OC1=CC=CC=C1CC=C QIRNGVVZBINFMX-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- OKQXCDUCLYWRHA-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(C)Cl OKQXCDUCLYWRHA-UHFFFAOYSA-N 0.000 description 1
- MQSZOZMNAJHVML-UHFFFAOYSA-N 3-phenylbut-1-yn-1-ol Chemical compound OC#CC(C)C1=CC=CC=C1 MQSZOZMNAJHVML-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- NPBVQXIMTZKSBA-UHFFFAOYSA-N Chavibetol Natural products COC1=CC=C(CC=C)C=C1O NPBVQXIMTZKSBA-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000005770 Eugenol Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- KDXKERNSBIXSRK-UHFFFAOYSA-N Lysine Natural products NCCCCC(N)C(O)=O KDXKERNSBIXSRK-UHFFFAOYSA-N 0.000 description 1
- 239000004472 Lysine Substances 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- UVMRYBDEERADNV-UHFFFAOYSA-N Pseudoeugenol Natural products COC1=CC(C(C)=C)=CC=C1O UVMRYBDEERADNV-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000005104 aryl silyl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- PFBUKDPBVNJDEW-UHFFFAOYSA-N dichlorocarbene Chemical group Cl[C]Cl PFBUKDPBVNJDEW-UHFFFAOYSA-N 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 229960002217 eugenol Drugs 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical class C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003586 protic polar solvent Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- ZQTYRTSKQFQYPQ-UHFFFAOYSA-N trisiloxane Chemical compound [SiH3]O[SiH2]O[SiH3] ZQTYRTSKQFQYPQ-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Landscapes
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Silicon Polymers (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は同一分子内にヒドロキシ
フェニル基と脂肪族不飽和結合を含有する新規な有機け
い素化合物およびその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel organosilicon compound containing a hydroxyphenyl group and an aliphatic unsaturated bond in the same molecule and a method for producing the same.
【0002】[0002]
【従来の技術】アルケニル基含有オルガノポリシロキサ
ンとオルガノハイドロジェンポリシロキサンを主成分と
して白金系触媒の存在下で硬化するシリコーン組成物
は、付加反応硬化型シリコーン組成物と呼ばれており、
数多くの産業分野で使用されている。ところが、この種
のシリコーン組成物の硬化物はその表面が不活性である
ために、これらの硬化物にエポキシ樹脂、フェノール樹
脂等の各種有機樹脂を接着させることは極めて難しかっ
た。そのため付加反応硬化型シリコーン組成物の硬化物
表面をオゾン処理して、そのオゾン処理された表面に各
種有機樹脂を接触させ硬化させて、これら両者を接着一
体化させる方法が試みられている。しかし、この方法は
経時的に接着性が低下するという欠点があり実用上満足
できる方法ではなかった。そのため付加反応型シリコー
ン組成物の硬化物と各種有機樹脂を接着するための接着
付与剤の出現が望まれていた。このような接着付与剤と
しては、例えば、有機樹脂との接着性を向上させるため
の官能基としてのヒドロキシフェニル基と、付加反応硬
化物中に組み込まれるための官能基としてのアルケニル
基を同一分子中に含有する有機けい素化合物が有効であ
ると考えられるが、このような有機けい素化合物は知ら
れていなかった。尚、ヒドロキシフェニル基含有有機け
い素化合物は知られている(特開平2−166123号
公報、特開平2−225524号公報参照)が、脂肪族
不飽和結合を含有するヒドロキシフェニル基含有有機け
い素化合物は知られていない。2. Description of the Related Art Silicone compositions which are based on alkenyl-containing organopolysiloxanes and organohydrogenpolysiloxanes and which cure in the presence of a platinum-based catalyst are called addition-curable silicone compositions.
Used in many industrial fields. However, since the surface of a cured product of this type of silicone composition is inactive, it has been extremely difficult to bond various organic resins such as an epoxy resin and a phenol resin to the cured product. Therefore, a method has been attempted in which the surface of a cured product of the addition-reaction-curable silicone composition is treated with ozone, and various organic resins are brought into contact with and cured with the ozone-treated surface, and the two are bonded and integrated. However, this method has a drawback that the adhesiveness decreases with time, and is not a practically satisfactory method. Therefore, the appearance of an adhesion imparting agent for adhering a cured product of the addition reaction type silicone composition to various organic resins has been desired. As such an adhesion-imparting agent, for example, a hydroxyphenyl group as a functional group for improving adhesion to an organic resin and an alkenyl group as a functional group for being incorporated into an addition reaction cured product have the same molecule. Although the organosilicon compound contained therein is considered to be effective, such an organosilicon compound has not been known. Incidentally, hydroxyphenyl group-containing organosilicon compounds are known (see JP-A-2-166123 and JP-A-2-225524), but hydroxyphenyl group-containing organosilicon containing an aliphatic unsaturated bond. The compound is not known.
【0003】[0003]
【発明が解決しようとする課題】本発明者らは上記問題
点を解決するため鋭意検討した結果、本発明に到達し
た。即ち、本発明の目的は、同一分子内にヒドロキシフ
ェニル基と脂肪族不飽和結合を含有する新規な有機けい
素化合物およびその製造方法を提供することである。The present inventors have made intensive studies to solve the above-mentioned problems, and as a result, have reached the present invention. That is, an object of the present invention is to provide a novel organosilicon compound containing a hydroxyphenyl group and an aliphatic unsaturated bond in the same molecule, and a method for producing the same.
【0004】[0004]
【課題を解決するための手段】本発明は、一般式:According to the present invention, there is provided a compound represented by the general formula:
【化4】 [式中、Xは脂肪族不飽和基含有1価炭化水素、Zは-C(O)
O-で示されるカルボニルオキシ基またはフェニレン基、
Yはヒドロキシフェニル基、アルキル基置換ヒドロキシ
フェニル基またはアルコキシ基置換ヒドロキシフェニル
基、R1は炭素原子数が2以上の同種または異種の二価炭
化水素基、Rは脂肪族不飽和結合を含まない同種または
異種の一価炭化水素基、Aは炭素原子数が1以上の二価
炭化水素基または式:−R2−O−R2−(式中、R2は二価
炭化水素基である)で示される基である。mおよびpは0
または1であり、nは0〜2であり、qは0〜7の整数で
ある。]で示されるヒドロキシフェニル基含有有機けい
素化合物およびその製造方法に関する。Embedded image [Wherein X is a monovalent hydrocarbon containing an aliphatic unsaturated group, and Z is -C (O)
A carbonyloxy group or a phenylene group represented by O-,
Y is a hydroxyphenyl group, an alkyl-substituted hydroxyphenyl group or an alkoxy-substituted hydroxyphenyl group, R 1 is a same or different divalent hydrocarbon group having 2 or more carbon atoms, and R does not contain an aliphatic unsaturated bond same or different monovalent hydrocarbon group, a is the number of carbon atoms of one or more divalent hydrocarbon group, or a group of the formula: -R 2 -O-R 2 - (in the formula, R 2 is a divalent hydrocarbon radical ). m and p are 0
Or 1, n is 0 to 2, and q is an integer of 0 to 7. And a method for producing the same.
【0005】まず、本発明のヒドロキシフェニル基含有
有機けい素化合物について説明するに、本発明のヒドロ
キシフェニル基含有有機けい素化合は上記一般式で示さ
れる化合物であり、分子中にヒドロキシフェニル基と脂
肪族不飽和結合含有1価炭化水素を含有する。上式中、
Xはアルケニル基であり、ビニル基、アリル基、イソプ
ロペニル基、ヘキセニル基が例示される。Zは-C(O)O-で
示されるカルボニルオキシ基またはフェニレン基であ
り、フェニレン基としてはo-フェニレン基、m-フェニレ
ン基、p-フェニレン基が例示される。Yは置換もしくは
非置換のヒドロキシフェニル基であり、ヒドロキシフェ
ニル基、アルキル基置換ヒドロキシフェニル基またはア
ルコキシ基置換ヒドロキシフェニル基が例示される。水
酸基、アルキル基、アルコキシ基の置換位置は特に限定
されない。このようなアルキル基としてはメチル基、エ
チル基、プロピル基、ブチル基が例示され、アルコキシ
基としてはメトキシ基、エトキシ基、プロポキシ基、ブ
トキシ基が例示される。また置換もしくは非置換のヒド
ロキシフェニル基としては、2-ヒドロキシフェニル基、
4-ヒドロキシフェニル基、3,4-ジヒドロキシフェニル
基、3,5-ジヒドロキシフェニル基等のヒドロキシフェニ
ル基;3,5-ジターシャリーブチル-4-ヒドロキシフェニ
ル基、3-メチル-4-ヒドロキシフェニル基等のアルキル
基置換ヒドロキシフェニル基;4-ヒドロキシ-3-メトキ
シフェニル基、3,5-ジメトキシ-4-ヒドロキシフェニル
基等のアルコキシ基置換ヒドロキシフェニル基が例示さ
れるが、入手の容易さから、Yは2-ヒドロキシフェニル
基および4-ヒドロキシ-3-メトキシフェニル基であるこ
とが好ましい。R1は脂肪族不飽和結合を含まない炭素数
二個以上の同種または異種の二価炭化水素基であり、エ
チレン基、プロピレン基、ブチレン基、ヘキシレン基な
どのアルキレン基、フェニレン基などのアリーレン基が
例示される。Rは脂肪族不飽和結合を含まない同種また
は異種の一価炭化水素基であり、メチル基、エチル基、
ブチル基、ペンチル基、ヘキシル基などのアルキル基;
フェニル基、トリル基、キシリル基などのアリール基;
ベンジル基、フェネチル基などのアラルキル基が例示さ
れる。Aは炭素原子数が1以上の二価炭化水素基または 式:−R2−O−R2− (式中、R2は二価炭化水素基であり、前述したようなア
ルキレン基、アリーレン基が挙げられる。)で示される
基であり、エチレン基、プロピレン基、ブチレン基、ヘ
キシレン基、エチレンオキシプロピレン基が例示され
る。mおよびpは0または1である。nは0〜2であり、q
は0〜7の整数である。First, the hydroxyphenyl group-containing organosilicon compound of the present invention will be described. The hydroxyphenyl group-containing organosilicon compound of the present invention is a compound represented by the above general formula. It contains a monovalent hydrocarbon containing an aliphatic unsaturated bond. In the above formula,
X is an alkenyl group, and examples include a vinyl group, an allyl group, an isopropenyl group, and a hexenyl group. Z is a carbonyloxy group or a phenylene group represented by -C (O) O-, and examples of the phenylene group include an o-phenylene group, an m-phenylene group, and a p-phenylene group. Y is a substituted or unsubstituted hydroxyphenyl group, and examples thereof include a hydroxyphenyl group, an alkyl group-substituted hydroxyphenyl group and an alkoxy group-substituted hydroxyphenyl group. The substitution positions of the hydroxyl group, alkyl group and alkoxy group are not particularly limited. Examples of such an alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group, and examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group. Further, as a substituted or unsubstituted hydroxyphenyl group, a 2-hydroxyphenyl group,
Hydroxyphenyl group such as 4-hydroxyphenyl group, 3,4-dihydroxyphenyl group, 3,5-dihydroxyphenyl group; 3,5-ditert-butyl-4-hydroxyphenyl group, 3-methyl-4-hydroxyphenyl group And the like. Alkyl-substituted hydroxyphenyl groups such as 4-hydroxy-3-methoxyphenyl group and 3,5-dimethoxy-4-hydroxyphenyl group are exemplified. Y is preferably a 2-hydroxyphenyl group and a 4-hydroxy-3-methoxyphenyl group. R 1 is a same or different divalent hydrocarbon group having two or more carbon atoms containing no aliphatic unsaturated bond, and an alkylene group such as an ethylene group, a propylene group, a butylene group, and a hexylene group, and an arylene group such as a phenylene group. Groups are exemplified. R is the same or different monovalent hydrocarbon group containing no aliphatic unsaturated bond, methyl group, ethyl group,
Alkyl groups such as butyl, pentyl and hexyl;
Aryl groups such as phenyl, tolyl and xylyl;
An aralkyl group such as a benzyl group and a phenethyl group is exemplified. A is a divalent hydrocarbon group having 1 or more carbon atoms or a formula: -R 2 -O-R 2- (wherein R 2 is a divalent hydrocarbon group, and an alkylene group or an arylene group as described above. And an ethylene group, a propylene group, a butylene group, a hexylene group, and an ethyleneoxypropylene group. m and p are 0 or 1. n is 0 to 2 and q
Is an integer of 0 to 7.
【0006】このような本発明のヒドロキシフェニル基
含有有機けい素化合物としては、例えば、下記式で示さ
れる化合物が挙げられる。The hydroxyphenyl group-containing organosilicon compound of the present invention includes, for example, a compound represented by the following formula.
【化5】 Embedded image
【化6】 Embedded image
【化7】 Embedded image
【化8】 Embedded image
【化9】 Embedded image
【化10】 Embedded image
【化11】 Embedded image
【化12】 Embedded image
【化13】 Embedded image
【化14】 Embedded image
【化15】 Embedded image
【化16】 Embedded image
【化17】 Embedded image
【化18】 Embedded image
【化19】 Embedded image
【化20】 Embedded image
【化21】 Embedded image
【化22】 Embedded image
【化23】 Embedded image
【化24】 Embedded image
【化25】 Embedded image
【化26】 Embedded image
【化27】 Embedded image
【化28】 Embedded image
【化29】 Embedded image
【化30】 Embedded image
【化31】 Embedded image
【化32】 Embedded image
【化33】 Embedded image
【化34】 Embedded image
【化35】 Embedded image
【化36】 Embedded image
【化37】 Embedded image
【化38】 Embedded image
【化39】 Embedded image
【化40】 Embedded image
【化41】 Embedded image
【化42】 Embedded image
【0007】次に、本発明の本発明のヒドロキシフェニ
ル基含有有機けい素化合物の製造方法について説明す
る。本発明の本発明のヒドロキシフェニル基含有有機け
い素化合物の製造方法は、(A)一般式:Next, a method for producing the hydroxyphenyl group-containing organosilicon compound of the present invention will be described. The method for producing a hydroxyphenyl group-containing organosilicon compound of the present invention according to the present invention comprises:
【化43】 [式中、Xはアルケニル基、Zは-C(O)O-で示されるカルボ
ニルオキシ基またはフェニレン基、Rは脂肪族不飽和結
合を含まない同種または異種の一価炭化水素基、Aは炭
素原子数が1以上の二価炭化水素基または式:−R2−O
−R2−(式中、R2は二価炭化水素基である)で示される
基である。mおよびpは0または1であり、nは0〜2で
あり、qは0〜7の整数である。]で示されるけい素原子
結合水素原子含有有機けい素化合物と、(B)一般式: R3-Y1 [式中、R3は脂肪族不飽和結合含有一価炭化水素基であ
り、Y1は置換もしくは非置換のヒドロキシフェニル基で
ある。]で示される脂肪族不飽和結合含有化合物を、ヒ
ドロシリル化触媒存在下に付加反応させることを特徴と
する、請求項1記載のヒドロキシフェニル基含有有機け
い素化合物の製造方法、および(A)一般式:Embedded image Wherein X is an alkenyl group, Z is a carbonyloxy group or a phenylene group represented by -C (O) O-, R is the same or different monovalent hydrocarbon group containing no aliphatic unsaturated bond, and A is 1 or more divalent hydrocarbon group, or a group of the formula carbon atoms: -R 2 -O
—R 2 — (wherein, R 2 is a divalent hydrocarbon group). m and p are 0 or 1, n is 0 to 2, and q is an integer of 0 to 7. And an organosilicon compound containing a silicon-bonded hydrogen atom represented by the formula: (B) a general formula: R 3 -Y 1 wherein R 3 is an aliphatic unsaturated bond-containing monovalent hydrocarbon group; 1 is a substituted or unsubstituted hydroxyphenyl group. The method for producing a hydroxyphenyl group-containing organosilicon compound according to claim 1, wherein the aliphatic unsaturated bond-containing compound represented by the formula (1) is subjected to an addition reaction in the presence of a hydrosilylation catalyst. formula:
【化44】 [式中、Xはアルケニル基、Zは-C(O)O-で示されるカルボ
ニルオキシ基またはフェニレン基、Rは脂肪族不飽和結
合を含まない同種または異種の一価炭化水素基、Aは炭
素原子数が1以上の二価炭化水素基または式:−R2−O
−R2−(式中、R2は二価炭化水素基である)で示される
基である。mおよびpは0または1であり、nは0〜2で
あり、qは0〜7の整数である。]で示されるけい素原子
結合水素原子含有有機けい素化合物と、(B)一般式: R3-Y2 [式中、R3は脂肪族不飽和結合含有一価炭化水素基であ
り、Y2は置換もしくは非置換のトリオルガノシロキシフ
ェニル基である。]で示される脂肪族不飽和結合含有化
合物を、ヒドロシリル化触媒存在下に付加反応させ、し
かる後、脱シリル化反応することを特徴とする、ヒドロ
キシフェニル基含有有機けい素化合物の製造方法であ
る。Embedded image Wherein X is an alkenyl group, Z is a carbonyloxy group or a phenylene group represented by -C (O) O-, R is the same or different monovalent hydrocarbon group containing no aliphatic unsaturated bond, and A is 1 or more divalent hydrocarbon group, or a group of the formula carbon atoms: -R 2 -O
—R 2 — (wherein, R 2 is a divalent hydrocarbon group). m and p are 0 or 1, n is 0 to 2, and q is an integer of 0 to 7. A silicon-bonded hydrogen atom-containing organosilicon compound represented by the formula: (B) a general formula: R 3 -Y 2 wherein R 3 is an aliphatic unsaturated bond-containing monovalent hydrocarbon group; 2 is a substituted or unsubstituted triorganosiloxyphenyl group. A method for producing a hydroxyphenyl group-containing organosilicon compound, comprising subjecting an aliphatic unsaturated bond-containing compound represented by the formula: to an addition reaction in the presence of a hydrosilylation catalyst, followed by a desilylation reaction. .
【0008】これらの方法において、(A)成分のけい
素原子結合水素原子含有有機けい素化合物は、上式中の
X,Z,A,R,n,m,pは前記と同様である。これらの有機けい
素化合物は従来公知の方法により製造できる。例えば、
水とエーテル混合溶媒存在下に、 式:CH2=C(CH3)COO(CH2)3Si(OCH3)3 で示されるシランに、 式:H(CH3)2SiCl で示されるシランを滴下することにより、 式:CH2=C(CH3)COO(CH2)3Si{OSi(CH3)2H}3 で示されるけい素原子結合水素原子含有有機けい素化合
物が生成することが知られている(米国特許33980
17号参照)。この他にも、メタクリル官能基含有クロ
ロシランを1,1,3,3-テトラメチルジシロキサンの存在下
に加水分解したり、また、メタクリル官能基含有クロロ
シランを加水分解してシラノールとした後、これをジオ
ルガノクロロシランと反応させたりして製造することが
できる。この際、シラノール基の縮合を抑えるために、
発生する塩化水素の捕捉剤としてトリエチルアミン、ピ
リジン等のアミン類を使用することが望ましい。また、
強酸とカルボン酸の存在下、1,1,3,3-テトラメチルジシ
ロキサンと式:CH2=C(CH3)COO(CH2)3Si(OCH3)3 で示され
るシランを反応させることによっても合成できる(特願
平9−117573号参照)。[0008] In these methods, the component (A)
The organosilicon compound containing a hydrogen atom bonded to a hydrogen atom is represented by the above formula
X, Z, A, R, n, m, and p are the same as described above. These organic silicon
The compound can be produced by a conventionally known method. For example,
In the presence of a mixed solvent of water and ether, the formula: CHTwo= C (CHThree) COO (CHTwo)ThreeSi (OCHThree)Three In a silane represented by the formula: H (CHThree)TwoBy dropping silane represented by SiCl, the formula: CHTwo= C (CHThree) COO (CHTwo)ThreeSi {OSi (CHThree)TwoH}Three A silicon-bonded hydrogen-containing organosilicon compound represented by
Products are known to occur (U.S. Pat.
No. 17). In addition, methacrylic functional group-containing
Rosilane in the presence of 1,1,3,3-tetramethyldisiloxane
Hydrolyzed to methacrylic
After hydrolyzing the silane to silanol,
It can be manufactured by reacting with luganochlorosilane.
it can. At this time, in order to suppress condensation of silanol groups,
Triethylamine and pi
It is desirable to use amines such as lysine. Also,
1,1,3,3-Tetramethyldise in the presence of strong acids and carboxylic acids
Loxane and formula: CHTwo= C (CHThree) COO (CHTwo)ThreeSi (OCHThree)Three Indicated by
Can also be synthesized by reacting
Hei 9-117573).
【0009】(B)成分の脂肪族不飽和結合含有フェノ
ール化合物において、上式中、R3は脂肪族不飽和結合含
有一価炭化水素基であり、ビニル基、アリル基、ブテニ
ル基、ヘキセニル基が例示される。これらの中でも入手
のしやすさおよび経済性からアリル基が好ましい。Y1は
置換もしくは非置換のヒドロキシフェニル基であり、こ
のようなY1としては、前述したYで例示されたヒドロキ
シフェニル基が挙げられる。また、Y2は置換もしくは非
置換のトリオルガノシロキシフェニル基であり、このよ
うな有機基としては、前述したYで例示されたヒドロキ
シフェニル基の水酸基がトリメチルシロキシ化された基
が例示される。このような(B)成分としては、特に、
2-アリルフェノール、オイゲノールまたはそれらのトリ
メチルシリルエーテルが好ましい。また、フェノール性
水酸基はヒドロシリル化反応触媒の存在下、けい素原子
結合水素原子と脱水素縮合反応を起こすので、特に高純
度の目的物を必要とする場合は(B)成分としてフェノ
ール性水酸基がトリオルガノシロキシ化された脂肪族不
飽和結合含有化合物を使用するのが好ましい。In the phenolic compound containing an aliphatic unsaturated bond as the component (B), in the above formula, R 3 is a monovalent hydrocarbon group containing an aliphatic unsaturated bond, and is a vinyl group, an allyl group, a butenyl group, or a hexenyl group. Is exemplified. Among these, an allyl group is preferable from the viewpoint of availability and economy. Y 1 is a substituted or unsubstituted hydroxyphenyl group. Examples of such Y 1 include the hydroxyphenyl groups exemplified for Y described above. Y 2 is a substituted or unsubstituted triorganosiloxyphenyl group, and examples of such an organic group include a group in which the hydroxyl group of the hydroxyphenyl group exemplified by Y is trimethylsiloxy. As such a component (B),
2-Allylphenol, eugenol or their trimethylsilyl ethers are preferred. In addition, since the phenolic hydroxyl group causes a dehydrocondensation reaction with a silicon-bonded hydrogen atom in the presence of a hydrosilylation reaction catalyst, a phenolic hydroxyl group is used as the component (B) especially when a high-purity target product is required. Preference is given to using triorganosiloxylated compounds containing aliphatic unsaturated bonds.
【0010】ヒドロシリル化反応用触媒としては、例え
ば、周期率表第8属遷移金属錯体触媒が挙げられる。こ
の中でも白金系触媒が特に有効であり、塩化白金酸およ
びそのアルコール溶液、白金のオレフィン錯体、白金と
ビニル基含有シロキサンとの錯体などの白金化合物が好
ましい。As the catalyst for the hydrosilylation reaction, for example, a transition metal complex catalyst belonging to Group 8 of the periodic table can be used. Of these, platinum-based catalysts are particularly effective, and platinum compounds such as chloroplatinic acid and its alcohol solution, olefin complexes of platinum, and complexes of platinum with vinyl group-containing siloxanes are preferred.
【0011】(A)成分と(B)成分を反応させるに際
しては、(A)成分中のアルケニル基とけい素原子結合
水素原子との付加反応速度を抑制するために、(B)成
分とヒドロシリル化反応用触媒を予め混合し、これに
(A)成分をゆっくり滴下する方法が好ましい。(A)
成分の量と(B)成分の量の比率は、通常、(A)成分
中のけい素原子結合水素原子当量に対する(B)成分中
の脂肪族不飽和結合の当量の比率が0.8以上である範囲
内であり、好ましくは、0.8〜2.00の範囲であり、さら
に好ましいは0.9〜1.5の範囲である。この反応は、有機
溶媒の存在下で行うのが好ましいが、無溶媒で行うこと
もできる。使用される溶媒としては、ベンゼン、トルエ
ン、キシレンのような芳香族類;ペンタン、ヘキサン、
ヘプタン、オクタン、デカンのような脂肪族類;テトラ
ヒドロフラン、ジエチルエーテル、ジブチルエーテルの
ようなエーテル類;アセトン、メチルエチルケトンのよ
うなケトン類;酢酸エチル、酢酸ブチルのようなエステ
ル類;四塩化炭素、トリクロロエタン、ジクロロメチレ
ン、クロロホルムのような塩素化炭化水素類が例示され
る。反応は室温でも行うことができるが、通常、50〜20
0ーCの温度範囲内で行うのが好ましい。反応中は反応溶
液をガスクロマトグラフィー分析(GLC)や赤外分光
分析(IR)を使用して分析し、(A)成分のけい素原
子結合水素原子含有オリゴシロキサンの特性吸収が消失
した時点を反応終了とする。反応終了後、未反応の
(B)成分や有機溶媒などの低沸点物を加熱減圧留去等
の方法で除くことにより、本発明の脂肪族不飽和結合お
よびヒドロキシフェニル基含有有機けい素化合物が得ら
れる。In reacting the component (A) with the component (B), the component (B) is reacted with the hydrosilylation compound in order to suppress the rate of the addition reaction between the alkenyl group and the silicon-bonded hydrogen atom in the component (A). A method is preferred in which the reaction catalyst is mixed in advance and the component (A) is slowly added dropwise thereto. (A)
As for the ratio of the amount of the component to the amount of the component (B), the ratio of the equivalent of the aliphatic unsaturated bond in the component (B) to the equivalent of the silicon-bonded hydrogen atom in the component (A) is usually 0.8 or more. It is in the range, preferably in the range of 0.8 to 2.00, and more preferably in the range of 0.9 to 1.5. This reaction is preferably performed in the presence of an organic solvent, but may be performed without a solvent. Solvents used include aromatics such as benzene, toluene, xylene; pentane, hexane,
Aliphatics such as heptane, octane and decane; ethers such as tetrahydrofuran, diethyl ether and dibutyl ether; ketones such as acetone and methyl ethyl ketone; esters such as ethyl acetate and butyl acetate; carbon tetrachloride and trichloroethane , Dichloromethylene, and chlorinated hydrocarbons such as chloroform. The reaction can be carried out at room temperature, but usually 50 to 20
It is preferable to carry out within a temperature range of 0-C. During the reaction, the reaction solution is analyzed using gas chromatography analysis (GLC) or infrared spectroscopy (IR), and the time when the characteristic absorption of the silicon-bonded hydrogen atom-containing oligosiloxane of the component (A) disappears. The reaction is terminated. After completion of the reaction, the unreacted component (B) and low-boiling substances such as an organic solvent are removed by a method such as distillation under reduced pressure by heating, so that the aliphatic unsaturated bond and hydroxyphenyl group-containing organosilicon compound of the present invention can be obtained. can get.
【0012】(B)成分としてフェノール性水酸基がト
リオルガノシロキシ化された脂肪族不飽和結合化合物を
使用した場合はフェノール性水酸基がトリオルガノシロ
キシ化された付加物が得られるので、このトリオルガノ
シリル基をはずしてヒドロキシフェニル基を再生させる
必要がある。この脱シリル化方法としては従来公知の方
法が使用できるが、トリオルガノシロキシ化された付加
物をアミン化合物またはアンモニアを触媒としてプロト
ン性溶媒の存在下で脱シリル化する方法が好ましい(本
発明者らが平成10年8月28日付で出願した「発明の
名称「アリールシリルエーテル化合物の脱シリル化方法
およびヒドロキシフェニル基含有けい素化合物の製造方
法参照」)。この方法にしたがえば、副反応がなく、高
収率で目的のヒドロキシフェニル基含有有機けい素化合
物が得られる。When an aliphatic unsaturated bond compound in which a phenolic hydroxyl group is triorganosiloxyl is used as the component (B), an adduct in which the phenolic hydroxyl group is triorganosiloxylized is obtained. It is necessary to remove the group and regenerate the hydroxyphenyl group. As the desilylation method, a conventionally known method can be used, but a method of desilylation of the triorganosiloxylated adduct in the presence of a protic solvent using an amine compound or ammonia as a catalyst is preferable (the present inventors). Et al., Filed on Aug. 28, 1998, entitled "Title of Invention" Method for Desilylation of Aryl Silyl Ether Compound and Method for Production of Hydroxyphenyl Group-Containing Silicon Compound "). According to this method, the desired hydroxyphenyl group-containing organosilicon compound is obtained in high yield without side reactions.
【0013】以上のような本発明のヒドロキシフェニル
基含有有機けい素化合物は、同一分子内に脂肪族不飽和
結合含有1価炭化水素基含有するため、付加反応硬化型
シリコーン組成物への相溶性をゆうし、この付加反応硬
化型シリコーン組成物中のオルガノハイドロジェンポリ
シロキサンと反応して硬化する。また、分子内にヒドロ
キシフェニル基を含有するため、この有機けい素化合物
を含有させた付加反応硬化型シリコーン組成物の硬化物
は、その表面にヒドロキシフェニル基を有するシリコー
ン硬化物となり、エポキシ樹脂やフェノール樹脂等の各
種有機樹脂と接着するという特性を有する。したがっ
て、本発明のヒドロキシフェニル基含有有機けい素化合
物は、かかる特性の要求される用途、例えば、付加反応
硬化型シリコーン組成物を各種基材に接着させるための
接着性付与剤として有用である。The hydroxyphenyl group-containing organosilicon compound of the present invention contains an aliphatic unsaturated bond-containing monovalent hydrocarbon group in the same molecule, so that it is compatible with an addition reaction-curable silicone composition. And reacts with the organohydrogenpolysiloxane in the addition reaction-curable silicone composition to cure. In addition, since the compound contains a hydroxyphenyl group in the molecule, a cured product of the addition reaction-curable silicone composition containing the organosilicon compound becomes a cured silicone having a hydroxyphenyl group on the surface thereof, and an epoxy resin or the like. It has the property of bonding to various organic resins such as phenolic resins. Therefore, the hydroxyphenyl group-containing organosilicon compound of the present invention is useful as an application requiring such properties, for example, as an adhesion imparting agent for adhering an addition reaction-curable silicone composition to various substrates.
【0014】[0014]
【参考例】攪拌機、温度計、冷却管、滴下漏斗を備えた
1リットルフラスコに、1,1,3,3-テトラメチルジシロキ
サン73.7グラム(0.55モル)、氷18グラム、水100
グラムおよび濃塩酸50グラムを投入した。これに、メ
タクリロキシプロピルジメチルクロロシラン215.7グラ
ム(1モル)を、反応温度が10℃を超えないように氷浴で
冷却しながら滴下した。滴下終了後、フラスコを静置し
て水層を分離し、得られた有機層を2回水洗した。この
有機層を5%炭酸水素ナトリウム水溶液で2回洗浄し、
さらに2回水洗した。このようにして水層を除いた有機
層に硫酸ナトリウムを加えて乾燥させた後、硫酸ナトリ
ウムを濾別した。次いでこれにフェノチアジン0.6グラ
ムを添加して減圧蒸留し、71〜80ーC/1mmHgの留分198グ
ラムを得た。得られた留分を核磁気共鳴分析(以下、N
MR)および赤外分光分析(以下、IR)により分析した
ところ、下記式1で示されるジシロキサンであることが
判明した。このジシロキサンのガスクロマトグラフィー
(以下、GLC)による純度は99%であった。 式1:[Reference Example] In a 1-liter flask equipped with a stirrer, a thermometer, a condenser, and a dropping funnel, 73.7 g (0.55 mol) of 1,1,3,3-tetramethyldisiloxane, 18 g of ice, and 100 g of water were placed.
Grams and 50 grams of concentrated hydrochloric acid. To this, 215.7 g (1 mol) of methacryloxypropyldimethylchlorosilane was added dropwise while cooling in an ice bath so that the reaction temperature did not exceed 10 ° C. After completion of the dropping, the flask was allowed to stand, and the aqueous layer was separated, and the obtained organic layer was washed twice with water. The organic layer was washed twice with a 5% aqueous sodium hydrogen carbonate solution,
Further, it was washed twice with water. After sodium sulfate was added to the organic layer from which the aqueous layer had been removed in this way and dried, sodium sulfate was separated by filtration. Then, 0.6 g of phenothiazine was added thereto and distilled under reduced pressure to obtain 198 g of a fraction of 71-80-C / 1 mmHg. The obtained fraction was subjected to nuclear magnetic resonance analysis (hereinafter referred to as N
Analysis by MR) and infrared spectroscopy (hereinafter, IR) revealed that the disiloxane was represented by the following formula 1. Gas chromatography of this disiloxane
(Hereinafter, GLC) was 99%. Equation 1:
【化45】 Embedded image
【0015】[0015]
【実施例1】還流冷却器、温度計、滴下漏斗を取り付け
た100ミリリットル3口フラスコに、回転子、下記式2で
示される化合物28.66グラム(0.1212モル)、下記式3で
示される重合禁止剤0.030グラムおよび塩化白金酸と1,3
-ジビニルテトラメチルジシロキサンの錯体のトルエン
溶液(白金金属含有量2重量%)17マイクロリットル
を仕込んだ。次いで80ーCまで加熱した後、参考例1で合
成したジシロキサン30.03グラム(0.1153モル)を
滴下した。滴下終了後80ーCで40分間攪拌した。反応溶
液をGLCおよびIRにより分析して、GLCで原料の
ジシロキサンのシグナルおよびIRでけい素原子結合水
素原子によるシグナルが消失した時点で反応を終了させ
た。反応溶液から未反応の下記式2で示される化合物を
加熱減圧留去して、54.54グラムの残留物を得た。 式2:Example 1 In a 100 ml three-necked flask equipped with a reflux condenser, a thermometer and a dropping funnel, a rotor, 28.66 g (0.1212 mol) of a compound represented by the following formula 2, and a polymerization inhibitor represented by the following formula 3 0.030 g and chloroplatinic acid and 1,3
17 microliters of a toluene solution of a complex of -divinyltetramethyldisiloxane (platinum metal content 2% by weight) was charged. Then, after heating to 80-C, 30.03 g (0.1153 mol) of the disiloxane synthesized in Reference Example 1 was added dropwise. After completion of the dropwise addition, the mixture was stirred at 80-C for 40 minutes. The reaction solution was analyzed by GLC and IR, and the reaction was terminated when the signal of the starting disiloxane by GLC and the signal by the silicon-bonded hydrogen atom by IR disappeared. The unreacted compound of the following formula 2 was distilled off from the reaction solution by heating under reduced pressure to obtain 54.54 g of a residue. Equation 2:
【化46】 式3:Embedded image Equation 3:
【化47】 Embedded image
【0016】次に、還流冷却器、温度計を取り付けた20
0ミリリットル4口フラスコに、上記得られた残留物53.9
0グラム、メタノール45.0グラム、テトラヒドロフラン3
0.0グラム、ジエチルアミン1.24グラムと回転子を投入
し、60ーCで2時間加熱還流した。その後、低沸点物を留
去して残留物46.73グラムを得た。これをNMRおよび
IRにより分析したところ、下記式4で示されるヒドロ
キシフェニル基含有メタクリル官能性有機けい素化合物
であることが判明した。またこの有機けい素化合物のG
LCによる純度は93.9%であった。式4:Next, a reflux condenser and a thermometer were installed.
In a 0 ml 4-neck flask, the residue obtained above was 53.9
0 g, methanol 45.0 g, tetrahydrofuran 3
0.0 g, 1.24 g of diethylamine and a rotor were charged, and the mixture was heated and refluxed at 60 ° C. for 2 hours. Thereafter, low-boiling substances were distilled off to obtain 46.73 g of a residue. When this was analyzed by NMR and IR, it was found to be a hydroxyphenyl group-containing methacryl-functional organosilicon compound represented by the following formula 4. In addition, G of this organosilicon compound
The purity by LC was 93.9%. Equation 4:
【化48】 Embedded image
【0017】[0017]
【実施例2】温度計、滴下漏斗を取り付けた50ミリリ
ットル2口フラスコに、回転子、下記式5で示される化
合物54.54グラム(0.2643モル)、下記式6で示
される重合禁止剤0.005グラムおよび塩化白金酸と1,3-
ジビニルテトラメチルジシロキサンの錯体のトルエン溶
液(白金金属含有量2重量%)3マイクロリットルを仕
込んだ。次いで80ーCまで加熱した後、下記式7で示され
るトリシロキサン4.02グラム(0.0125モル)を滴下し
た。滴下終了後80ーCで90分間攪拌した。反応溶液をG
LCおよびIRにより分析し、GLCで原料のジシロキ
サンのシグナルおよびIRでけい素原子結合水素原子に
よるシグナルが消失した時点で反応が終了したと判断
し、反応溶液から未反応の下記式5で示される化合物を
加熱減圧留去した。次いで、還流冷却器を取り付けてメ
タノール3.00グラム、ジエチルアミン0.20グラムを加え
て55℃で2時間加熱還流した。その後低沸点物を留去す
ることにより、残留物5.85グラムを得た。これをNMR
およびIRにより分析したところ、下記式8で示される
ヒドロキシフェニル基含有メタクリル官能性有機けい素
化合物であることが判明した。またこの有機けい素化合
物のGLCによる純度は93.0%であった。式5:Example 2 In a 50 ml two-necked flask equipped with a thermometer and a dropping funnel, a rotor, 54.54 g (0.2643 mol) of a compound represented by the following formula 5, and a polymerization inhibitor represented by the following formula 6 0.005 grams and chloroplatinic acid plus 1,3-
3 microliters of a toluene solution of a divinyltetramethyldisiloxane complex (platinum metal content: 2% by weight) was charged. Then, after heating to 80-C, 4.02 g (0.0125 mol) of trisiloxane represented by the following formula 7 was added dropwise. After completion of the dropwise addition, the mixture was stirred at 80-C for 90 minutes. Reaction solution G
The reaction was analyzed by LC and IR, and it was judged that the reaction was completed when the signal of the raw material disiloxane by GLC and the signal by the silicon-bonded hydrogen atom disappeared by IR. The resulting compound was evaporated under reduced pressure with heating. Then, a reflux condenser was attached, 3.00 g of methanol and 0.20 g of diethylamine were added, and the mixture was heated and refluxed at 55 ° C. for 2 hours. Thereafter, low-boiling substances were distilled off to obtain 5.85 g of a residue. This is NMR
And IR analysis, it was found to be a hydroxyphenyl group-containing methacryl-functional organosilicon compound represented by the following formula 8. The purity of this organosilicon compound determined by GLC was 93.0%. Equation 5:
【化49】 式6:Embedded image Equation 6:
【化50】 式7:Embedded image Equation 7:
【化51】 式8:Embedded image Equation 8:
【化52】 Embedded image
【0018】[0018]
【実施例3】温度計、滴下漏斗を取り付けた300ミリ
リットル4口フラスコに、前記式2で示される化合物9
5.56グラム(0.4043モル)および塩化白金酸と
1,3-ジビニルテトラメチルジシロキサンの錯体のトルエ
ン溶液(白金金属濃度2重量%)75マイクロリットル
を仕込んだ。次いで90ーCまで加熱して、アリルジメチル
シランのテトラヒドロフラン溶液147.10グラム
(アリルジメチルシラン0.2666モル)を滴下し
た。滴下終了後、90ーCで90分間攪拌し、反応溶液をG
LCおよびIRにより分析したところ、IRでケイ素原
子結合水素原子によるシグナルが消失していた。これに
より反応が終了したと判断し、次いで、冷却後、還流冷
却器を取り付けてメタノール40グラム、ジエチルアミ
ン2グラムを加えて55℃で2時間加熱還流した。その後
低沸点物を加熱減圧留去することにより、残留物38.
94グラムが得られた。これをNMRおよびIRにより
分析したところ、下記式9で示されるヒドロキシフェニ
ル基含有アリル官能性有機けい素化合物であることが判
明した。またこの有機けい素化合物のGLCによる純度
は81.7%であり、残りは下記式10で示されるもの
(式中rは0,2,3である)であった。式9Example 3 A 300 ml four-necked flask equipped with a thermometer and a dropping funnel was charged with the compound 9 represented by the formula 2 above.
5.56 grams (0.4043 mole) and chloroplatinic acid
75 microliters of a toluene solution of a complex of 1,3-divinyltetramethyldisiloxane (a platinum metal concentration of 2% by weight) was charged. Then, the mixture was heated to 90 ° C., and 147.10 g of allyldimethylsilane in tetrahydrofuran (0.2666 mol of allyldimethylsilane) was added dropwise. After dropping, the mixture was stirred at 90-C for 90 minutes,
Analysis by LC and IR revealed that the signal due to the silicon-bonded hydrogen atom disappeared in the IR. Thus, it was judged that the reaction was completed. Then, after cooling, a reflux condenser was attached, 40 g of methanol and 2 g of diethylamine were added, and the mixture was heated and refluxed at 55 ° C. for 2 hours. Thereafter, low-boiling substances were distilled off by heating under reduced pressure to obtain a residue.
94 grams were obtained. When this was analyzed by NMR and IR, it was found to be a hydroxyphenyl group-containing allyl-functional organosilicon compound represented by the following formula 9. The purity of this organosilicon compound determined by GLC was 81.7%, and the remainder was represented by the following formula 10 (where r is 0.2, 3). Equation 9
【化53】 式10Embedded image Equation 10
【化54】 Embedded image
【0019】[0019]
【応用例1】25℃における粘度が2000mm2/s、両末端ビ
ニルジメチルシロキシ基封鎖ポリジメチルシロキサン1
0.01グラム(ビニル基含有量0.74ミリモル)、25℃にお
ける両末端トリメチルシロキシ基封鎖メチルハイドロジ
ェンポリシロキサン0.2272グラム(けい素原子結合水素
原子含有量3.56ミリモル)、フェニルブチノール0.499
ミリグラム、実施例1で得られた式4で示されるヒドロ
キシフェニル基含有メタクリル官能性有機けい素化合物
0.638グラムからなる組成物を調製した。ついで、この
組成物に塩化白金酸と1,3-ジビニルテトラメチルジシロ
キサンの錯体を白金金属量が組成物全量に対して1ppmと
なるような量を添加配合して、付加反応硬化型シリコー
ンゴム組成物を調製した。このシリコーンゴム組成物を
ポリテトラフルオロエチレン製の皿(60mm×60mm×
10mm)に流し込み、次いでこれを150℃のオーブン中
に1時間放置し硬化させて厚さ10 mmのシリコーンゴムシ
ートを得た。次いでこのシリコーンゴムシート表面に、
中央が丸く(直径10mm)くり貫かれた厚さ1mmのポ
リテトラフルオロエチレン製のシートを載せ、そのくり
貫かれた部分に、市販の硬化性エポキシ樹脂[コニシ
(株)製:商品名エポキシ樹脂ボンドE39]を流し込ん
だ。次いでこの上にポリテトラフルオロエチレン製のシ
ートを重ね合わせてその上に重さ600グラムの重りを載
せた。この試験体を150℃のオーブンに入れて、1時間放
置することによりエポキシ樹脂を硬化させ、エポキシ樹
脂とシリコーンゴムが一体化した成形体を得た。この成
形体からエポキシ樹脂を引き剥がして、エポキシ樹脂と
シリコーンゴムとの破断界面を肉眼にて観察したとこ
ろ、その破断界面は全面シリコーンゴム層で破断されて
おり、凝集破壊であることが判明した。これにより、エ
ポキシ樹脂とシリコーンゴムが強固に接着していること
が判明した。また、上記において、市販のエポキシ樹脂
の替りに、エポキシ樹脂/フェノール樹脂を主剤とする
フェノール/エポキシ樹脂を使用した以外は、上記と同
様にしてフェノール/エポキシ樹脂のシリコーンゴムへ
の接着性を調べた。尚、このフェノール・エポキシ樹脂
は、エポキシ樹脂[油化シェルエポキシ(株)製、商品名Y
DF-8170]100重量部、フェノール樹脂[大内新興化学
(株)製、商品名ノクラックNS−510]10重量部、γ
−グリシドキシプロピルトリメトキシシラン5重量部お
よびイミダゾール系硬化剤[旭化成工業(株)製、商品名
ノバキュアーHX-3721]20重量部を均一に混合して調製し
た。この結果、その破断界面は全面シリコーンゴム層で
破断されており、凝集破壊であることが判明した。[Application Example 1] Polydimethylsiloxane 1 having a viscosity of 2,000 mm 2 / s at 25 ° C and vinyldimethylsiloxy groups at both ends.
0.01 g (vinyl group content 0.74 mmol), 0.2272 g (methyl silicon-bonded hydrogen atom content 3.56 mmol) of methyl hydrogen polysiloxane having trimethylsiloxy groups at both ends blocked at 25 ° C, phenylbutynol 0.499
Milligram, hydroxyphenyl group-containing methacryl-functional organosilicon compound of formula 4 obtained in Example 1
A composition consisting of 0.638 grams was prepared. Next, a complex of chloroplatinic acid and 1,3-divinyltetramethyldisiloxane was added to the composition in an amount such that the amount of platinum metal was 1 ppm based on the total amount of the composition, and the addition reaction-curable silicone rubber was added. A composition was prepared. This silicone rubber composition is placed in a polytetrafluoroethylene dish (60 mm × 60 mm ×
10 mm), and then left in an oven at 150 ° C. for 1 hour to cure to obtain a 10 mm thick silicone rubber sheet. Then, on this silicone rubber sheet surface,
Place a 1mm thick polytetrafluoroethylene sheet with a rounded center (diameter 10mm), and put a commercially available curable epoxy resin [KONISHI]
(Trade name: Epoxy resin bond E39). Next, a sheet made of polytetrafluoroethylene was overlaid thereon, and a weight of 600 g was placed thereon. The test body was placed in an oven at 150 ° C. and left for 1 hour to cure the epoxy resin, thereby obtaining a molded body in which the epoxy resin and the silicone rubber were integrated. When the epoxy resin was peeled off from the molded body and the fracture interface between the epoxy resin and the silicone rubber was visually observed, the fracture interface was entirely broken by the silicone rubber layer, and it was found that the fracture interface was cohesive failure. . This proved that the epoxy resin and the silicone rubber were firmly adhered. Further, in the above, the adhesion of the phenol / epoxy resin to the silicone rubber was examined in the same manner as above, except that a phenol / epoxy resin having an epoxy resin / phenol resin as a main component was used instead of a commercially available epoxy resin. Was. The phenol / epoxy resin is an epoxy resin [Yuka Shell Epoxy Co., Ltd., trade name Y
DF-8170] 100 parts by weight, phenol resin [Ouchi Shinko Chemical
Nocrack NS-510 (trade name), 10 parts by weight, γ
-5 parts by weight of glycidoxypropyltrimethoxysilane and 20 parts by weight of an imidazole-based curing agent (trade name: NOVACURE HX-3721 manufactured by Asahi Kasei Kogyo KK) were uniformly mixed and prepared. As a result, the fracture interface was entirely fractured by the silicone rubber layer, and it was found that cohesive failure occurred.
【0020】[0020]
【発明の効果】本発明のヒドロキシフェニル基含有有機
けい素化合物は、同一分子内に脂肪族不飽和結合含有一
価炭化水素基とヒドロキシフェニル基を有する新規な化
合物であり、例えば、付加反応硬化型シリコーン組成物
用接着付与剤として有効である。また、本発明の製造方
法はこのような化合物を生産性良く製造できるという特
徴を有している。The hydroxyphenyl group-containing organosilicon compound of the present invention is a novel compound having an aliphatic unsaturated bond-containing monovalent hydrocarbon group and a hydroxyphenyl group in the same molecule. It is effective as an adhesive for a silicone composition. Further, the production method of the present invention has a feature that such a compound can be produced with high productivity.
【図1】図1は実施例1で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の核磁気共鳴
分析チャートである。FIG. 1 is a nuclear magnetic resonance analysis chart of a hydroxyphenyl group-containing methacryl-functional organosilicon compound synthesized in Example 1.
【図2】図2は実施例1で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の赤外分光分
析チャートである。FIG. 2 is an infrared spectroscopic analysis chart of the hydroxyphenyl group-containing methacryl-functional organosilicon compound synthesized in Example 1.
【図3】図3は実施例2で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の核磁気共鳴
分析チャートである。FIG. 3 is a nuclear magnetic resonance analysis chart of a hydroxyphenyl group-containing methacryl-functional organosilicon compound synthesized in Example 2.
【図4】図4は実施例2で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の赤外分光分
析チャートである。FIG. 4 is an infrared spectroscopic analysis chart of a methacryl-functional organosilicon compound having a hydroxyphenyl group synthesized in Example 2.
【図5】図5は実施例3で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の核磁気共鳴
分析チャートである。FIG. 5 is a nuclear magnetic resonance analysis chart of a hydroxyphenyl group-containing methacryl-functional organosilicon compound synthesized in Example 3.
【図6】図6は実施例3で合成したヒドロキシフェニル
基含有メタクリル官能性有機けい素化合物の赤外分光分
析チャートである。FIG. 6 is an infrared spectroscopic analysis chart of a hydroxyphenyl group-containing methacryl-functional organosilicon compound synthesized in Example 3.
Claims (5)
ニルオキシ基またはフェニレン基、Yは置換もしくは非
置換のヒドロキシフェニル基、R1は炭素原子数が2以上
の同種または異種の二価炭化水素基、Rは脂肪族不飽和
結合を含まない同種または異種の一価炭化水素基、Aは
炭素原子数が1以上の二価炭化水素基または 式:−R2−O−R2− (式中、R2は二価炭化水素基である。)で示される基で
ある。mおよびpは0または1であり、nは0〜2であ
り、qは0〜7の整数である。]で示されるヒドロキシフ
ェニル基含有有機けい素化合物。(1) A general formula: [In the formula, X is an alkenyl group, Z is a carbonyloxy group or a phenylene group represented by -C (O) O-, Y is a substituted or unsubstituted hydroxyphenyl group, and R 1 is the same having 2 or more carbon atoms. or different divalent hydrocarbon radical, R represents monovalent hydrocarbon groups free of aliphatic unsaturation, a is the number of carbon atoms of one or more divalent hydrocarbon group, or a group of the formula: -R 2 - O—R 2 — (wherein, R 2 is a divalent hydrocarbon group). m and p are 0 or 1, n is 0 to 2, and q is an integer of 0 to 7. A hydroxyphenyl group-containing organosilicon compound represented by the formula:
あり、Yが2-ヒドロキシフェニル基または3-メトキシ-4
-ヒドロキシフェニル基である請求項1記載のヒドロキ
シフェニル基含有有機けい素化合物。2. X is an isopropenyl group or an allyl group, and Y is a 2-hydroxyphenyl group or 3-methoxy-4.
2. The hydroxyphenyl group-containing organosilicon compound according to claim 1, which is a -hydroxyphenyl group.
ニルオキシ基またはフェニレン基、Rは脂肪族不飽和結
合を含まない同種または異種の一価炭化水素基、Aは炭
素原子数が1以上の二価炭化水素基または 式:−R2−O−R2− (式中、R2は二価炭化水素基である。)で示される基で
ある。mおよびpは0または1であり、nは0〜2であ
り、qは0〜7の整数である。]で示されるけい素原子結
合水素原子含有有機けい素化合物と、(B)一般式: R3-Y1 [式中、R3は脂肪族不飽和結合含有一価炭化水素基であ
り、Y1は置換もしくは非置換のヒドロキシフェニル基で
ある。]で示される脂肪族不飽和結合含有化合物を、ヒ
ドロシリル化触媒存在下に付加反応させることを特徴と
する、請求項1記載のヒドロキシフェニル基含有有機け
い素化合物の製造方法。(A) A general formula: Wherein X is an alkenyl group, Z is a carbonyloxy group or a phenylene group represented by -C (O) O-, R is the same or different monovalent hydrocarbon group containing no aliphatic unsaturated bond, and A is 1 or more divalent hydrocarbon group, or a group of the formula carbon atoms: -R 2 -O-R 2 - ( wherein, R 2 is a divalent hydrocarbon group.) a group represented by. m and p are 0 or 1, n is 0 to 2, and q is an integer of 0 to 7. And an organosilicon compound containing a silicon-bonded hydrogen atom represented by the formula: (B) a general formula: R 3 -Y 1 wherein R 3 is an aliphatic unsaturated bond-containing monovalent hydrocarbon group; 1 is a substituted or unsubstituted hydroxyphenyl group. 2. The method for producing a hydroxyphenyl group-containing organosilicon compound according to claim 1, wherein the aliphatic unsaturated bond-containing compound is subjected to an addition reaction in the presence of a hydrosilylation catalyst.
はフェニレン基、Rは脂肪族不飽和結合を含まない同種
または異種の一価炭化水素基、Aは炭素原子数が1以上
の二価炭化水素基または式:−R2−O−R2−(式中、R2
は二価炭化水素基である)で示される基である。mおよ
びpは0または1であり、nは0〜2であり、qは0〜7
の整数である。]で示されるけい素原子結合水素原子含
有オリゴシロキサンと、(B)一般式: R3-Y2 [式中、R3は脂肪族不飽和結合含有一価炭化水素基であ
り、Y2はトリオルガノシロキシ化された置換もしくは非
置換のヒドロキシフェニル基である。]で示される脂肪
族不飽和結合含有化合物を、ヒドロシリル化触媒存在下
に付加反応させ、しかる後、脱シリル化反応することを
特徴とする、請求項1記載のヒドロキシフェニル基含有
有機けい素化合物の製造方法。(A) A general formula: Wherein X is an alkenyl group, Z is a -C (O) O-carboxy group or a phenylene group, R is the same or different monovalent hydrocarbon group containing no aliphatic unsaturated bond, and A is the number of carbon atoms. One or more divalent hydrocarbon groups or a formula: —R 2 —O—R 2 — (wherein R 2
Is a divalent hydrocarbon group). m and p are 0 or 1, n is 0 to 2, q is 0 to 7
Is an integer. A silicon atom-bonded hydrogen atom-containing oligosiloxane represented by the formula: (B) a general formula: R 3 -Y 2 wherein R 3 is an aliphatic unsaturated bond-containing monovalent hydrocarbon group, and Y 2 is It is a triorganosiloxylated substituted or unsubstituted hydroxyphenyl group. 2. The hydroxyphenyl group-containing organosilicon compound according to claim 1, wherein the aliphatic unsaturated bond-containing compound is subjected to an addition reaction in the presence of a hydrosilylation catalyst, followed by a desilylation reaction. Manufacturing method.
付与剤である請求項1記載のヒドロキシフェニル基含有
有機けい素化合物。5. The hydroxyphenyl group-containing organosilicon compound according to claim 1, which is an adhesion-promoting agent for an addition reaction-curable silicone composition.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17111399A JP4436486B2 (en) | 1998-09-30 | 1999-06-17 | Hydroxyphenyl group-containing organosilicon compound and process for producing the same |
US09/409,810 US6252029B1 (en) | 1998-09-30 | 1999-09-30 | Hydroxyphenyl group-containing organosilicon compound, and method for manufacturing same |
US09/808,789 US6417309B2 (en) | 1998-09-30 | 2001-03-15 | Curable organosiloxane composition |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10-294580 | 1998-09-30 | ||
JP29458098 | 1998-09-30 | ||
JP17111399A JP4436486B2 (en) | 1998-09-30 | 1999-06-17 | Hydroxyphenyl group-containing organosilicon compound and process for producing the same |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000169482A true JP2000169482A (en) | 2000-06-20 |
JP2000169482A5 JP2000169482A5 (en) | 2008-12-25 |
JP4436486B2 JP4436486B2 (en) | 2010-03-24 |
Family
ID=26493931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17111399A Expired - Lifetime JP4436486B2 (en) | 1998-09-30 | 1999-06-17 | Hydroxyphenyl group-containing organosilicon compound and process for producing the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4436486B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014505067A (en) * | 2011-02-01 | 2014-02-27 | ディーエスエム アイピー アセッツ ビー.ブイ. | Silicone-containing monomers with hydrophilic end groups |
CN106831845A (en) * | 2015-12-07 | 2017-06-13 | 北京康美特科技股份有限公司 | Boracic organo-silicon compound, Preparation Method And The Use |
JP7488265B2 (en) | 2018-12-31 | 2024-05-21 | ダウ シリコーンズ コーポレーション | Method for preparing functional organosilanol compounds |
-
1999
- 1999-06-17 JP JP17111399A patent/JP4436486B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014505067A (en) * | 2011-02-01 | 2014-02-27 | ディーエスエム アイピー アセッツ ビー.ブイ. | Silicone-containing monomers with hydrophilic end groups |
CN106831845A (en) * | 2015-12-07 | 2017-06-13 | 北京康美特科技股份有限公司 | Boracic organo-silicon compound, Preparation Method And The Use |
CN106831845B (en) * | 2015-12-07 | 2021-01-26 | 北京康美特科技股份有限公司 | Boron-containing organosilicon compounds, method for the production and use thereof |
JP7488265B2 (en) | 2018-12-31 | 2024-05-21 | ダウ シリコーンズ コーポレーション | Method for preparing functional organosilanol compounds |
Also Published As
Publication number | Publication date |
---|---|
JP4436486B2 (en) | 2010-03-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3831481B2 (en) | Carbacyltolan derivative, method for producing the same, adhesion promoter, and curable silicone composition | |
EP0530496B1 (en) | Organosilicon compounds and method for preparing same | |
JPH069657A (en) | Organopentasiloxane and its production | |
JP3029686B2 (en) | Organopentasiloxane and method for producing the same | |
JPH08259574A (en) | Radically polymerizable oligosiloxane containing alicyclic epoxy group and its production | |
EP1600450B1 (en) | Silane compound having at least two protected functional groups and method for preparing the same | |
JP4383555B2 (en) | Carbosiloxane dendrimer | |
WO2008020637A1 (en) | Novel epoxy compound and process for production thereof | |
US6417309B2 (en) | Curable organosiloxane composition | |
JP4408982B2 (en) | Phenol group-containing organosilicon compound and method for producing the same | |
JP4436486B2 (en) | Hydroxyphenyl group-containing organosilicon compound and process for producing the same | |
JP2530391B2 (en) | Sterically shielded aminohydrocarbylsilanes and method of making | |
JPH10298288A (en) | Branched siloxane/silalkylene copolymer | |
US5550271A (en) | Bis(bis-silylalkyl) dicarboxylates as adhesion promoters and compositions containing them | |
JP4187843B2 (en) | Silatrane derivative, method for producing the same, adhesion promoter, and curable silicone composition | |
JP2849043B2 (en) | Organosilicon compound | |
JP2797962B2 (en) | Cycloalkyl (2-norbornyl) dialkoxysilane compound | |
JP2827858B2 (en) | Organic silicon compound and method for producing the same | |
JP3193740B2 (en) | Organosilicon compound and method for producing the same | |
EP0470753A2 (en) | Alkoxy-functional organopolysiloxanes and processes for preparing them | |
JP3212248B2 (en) | Method for producing acryloxy group-containing organopolysiloxane | |
JP2000072781A (en) | Desilylation of aryl silyl ether compound and production of phenol group-containing silicon compound | |
JPH05247065A (en) | Organic silicon compound and its production | |
JPH08325381A (en) | Organosilicon compound and its production | |
JP2001354678A (en) | Organosilicon compound and method for producing the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060612 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060613 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081106 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090519 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090715 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090716 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090908 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091104 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20091201 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20091228 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4436486 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130108 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130108 Year of fee payment: 3 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
EXPY | Cancellation because of completion of term |