JP2000143257A - Production of glass article - Google Patents

Production of glass article

Info

Publication number
JP2000143257A
JP2000143257A JP10316186A JP31618698A JP2000143257A JP 2000143257 A JP2000143257 A JP 2000143257A JP 10316186 A JP10316186 A JP 10316186A JP 31618698 A JP31618698 A JP 31618698A JP 2000143257 A JP2000143257 A JP 2000143257A
Authority
JP
Japan
Prior art keywords
nitrogen
silazane
atmosphere
glass body
porous glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10316186A
Other languages
Japanese (ja)
Inventor
Masahiro Takagi
政浩 高城
Tadashi Enomoto
正 榎本
Shinji Ishikawa
真二 石川
Taku Yamazaki
卓 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Priority to JP10316186A priority Critical patent/JP2000143257A/en
Publication of JP2000143257A publication Critical patent/JP2000143257A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00Other methods of shaping glass
    • C03B19/14Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00Type of glass produced
    • C03B2201/06Doped silica-based glasses
    • C03B2201/20Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/24Doped silica-based glasses doped with non-metals other than boron or fluorine doped with nitrogen, e.g. silicon oxy-nitride glasses

Abstract

PROBLEM TO BE SOLVED: To enhance the heat resistance by incorporating concentrated nitrogen and to increase the viscosity by incorporating silazane into a porous vitreous body and then converting the silazane into nitrogen-contg. silica and further vitrifying the silica. SOLUTION: Silazane having an Si-N coupling is previously incorporated into a porous vitreous body. The body is heated under the conditions where nitrogen is not desorbed from the silazane-contg. porous vitreous body, concretely in the atmosphere contg. a reducing gas contg. an inert gas and nitrogen, and the silazane is converted into nitrogen-contg. silica. The nitrogen-contg. porous vitreous body obtained by the conversion is heated and vitrified to obtain a nitrogen-contg. glass article. The vitrification is also performed in an inert as atmosphere, preferably in an atmosphere contg. nitrogen gas, to secure nitrogen in the glass. Nitrogen is advantageously added in the nitrogen-contg. reducing gas atmosphere before the vitrification to increase the nitrogen content.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はガラス物品製造技術
に関わり、特に窒素含有高純度ガラス物品の製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass article manufacturing technique, and more particularly to a method for manufacturing a nitrogen-containing high-purity glass article.

【0002】[0002]

【従来の技術】ガラス物品は建築材料、各種化学装置材
料、半導体基板材料、光学部品、光ファイバ等の光伝送
媒体等として広範囲に利用されている。最近、ガラス物
品の耐失透性、耐熱変形性を向上する目的で窒素を含有
させたガラスが注目されている。
2. Description of the Related Art Glass articles are widely used as building materials, various chemical equipment materials, semiconductor substrate materials, optical parts, optical transmission media such as optical fibers, and the like. Recently, glass containing nitrogen has been receiving attention for the purpose of improving the devitrification resistance and heat deformation resistance of glass articles.

【0003】例えば特公平7−64580、同7−64
581各号公報には、半導体ウエハー熱処理用容器等に
使用できる窒素含有高純度耐熱性合成石英ガラス部材の
製法として、多孔質シリカ体をアンモニア含有雰囲気中
で加熱処理し、得られた窒素含有多孔質シリカ体を10
モル%以上の酸素ガス含有雰囲気または水蒸気含有不活
性ガス雰囲気で加熱処理して部分脱窒素化し、次いで透
明ガラス化する方法が提案されている。また、特開平5
−279049号、特開平7−300341、特表平1
0−502324各号公報等にも多孔質体をアンモニア
含有雰囲気、あるいは窒素を含有する還元性雰囲気中で
加熱処理して多孔質体に窒素をドープした後加熱焼結す
る窒素含有ガラスの製造方法が提案されている。
For example, Japanese Patent Publication Nos. 7-64580 and 7-64
No. 581 discloses a method for producing a nitrogen-containing high-purity heat-resistant synthetic quartz glass member that can be used for a container for heat-treating a semiconductor wafer or the like. Porous silica body
A method has been proposed in which a partial denitrification is performed by heat treatment in an atmosphere containing an oxygen gas containing not less than mol% or an inert gas containing water vapor, and then a vitrification is performed. Also, Japanese Unexamined Patent Publication No.
No. 279049, JP-A-7-300341, JP-T-Hei-1
Japanese Patent Publication No. 0-502324 also discloses a method for producing a nitrogen-containing glass in which a porous body is subjected to heat treatment in an ammonia-containing atmosphere or a reducing atmosphere containing nitrogen to dope the porous body with nitrogen, and then to heat and sinter the porous body. Has been proposed.

【0004】[0004]

【発明が解決しようとする課題】上記の従来技術では、
得られたガラス中の窒素添加量が少ないという問題があ
る。すなわち、従来技術による窒素添加量は高々0.1
重量%程度であり、この添加量を増加できれば、高温粘
度の上昇や耐熱性を向上できる、という効果が期待でき
る。また、窒素を添加するとガラスの屈折率が上昇する
ので、ロッドレンズ, 光ファイバ用ガラス等の光学部品
への利用が広がる。本発明は窒素添加量を向上できるガ
ラス物品の製造方法を提供しようとするものである。
In the above prior art,
There is a problem that the amount of added nitrogen in the obtained glass is small. That is, the amount of nitrogen added by the prior art is 0.1 at most.
% By weight, and if this amount can be increased, the effect of increasing the high-temperature viscosity and improving the heat resistance can be expected. Further, addition of nitrogen increases the refractive index of the glass, so that it is widely used for optical components such as rod lenses and glass for optical fibers. An object of the present invention is to provide a method for producing a glass article capable of increasing the amount of added nitrogen.

【0005】[0005]

【課題を解決するための手段】本発明は、(1) 多孔質ガ
ラス体中にシラザンを含有させた後に該多孔質ガラス体
中のシラザンの含窒素シリカへの転化処理を行い、得ら
れた含窒素多孔質ガラス体を加熱透明ガラス化すること
を特徴とするガラス物品の製造方法、(2)多孔質ガラス
体中に液状シラザンを含浸させた後、該多孔質ガラス体
中のシラザン溶液の溶媒を揮散させ、次に該多孔質ガラ
ス体中のシラザンの含窒素シリカへの転化処理を行い、
得られた含窒素多孔質ガラス体を加熱透明ガラス化する
ことを特徴とする上記(1) 記載のガラス物品の製造方
法、(3)多孔質ガラス体中にシラザン溶液を含浸させた
後、該多孔質ガラス体中のシラザン溶液の溶媒を揮散さ
せ、次いで該多孔質ガラス体中のシラザンの含窒素シリ
カへの転化処理を行い、得られた含窒素多孔質ガラス体
を加熱透明ガラス化することを特徴とする上記(1) 記載
のガラス物品の製造方法、(4)前記シラザンが炭素原子
を含有するものであることを特徴ととする上記(1)ない
し(3) のいずれかに記載のガラス物品の製造方法、(5)
前記シラザンの転化処理として不活性ガス雰囲気下で加
熱することを特徴とする上記(1) ないし(4) のいずれか
に記載のガラス物品の製造方法、(6)前記シラザンの転
化処理として窒素を含む還元性化合物ガス雰囲気下で加
熱することを特徴とする上記(1) ないし(4) のいずれか
に記載の石英ガラス物品の製造方法、(7)前記シラザン
の転化処理として窒素原子を含む還元性化合物ガス及び
不活性ガスを含有する雰囲気下で加熱することを特徴と
する請求項1ないし請求項4のいずれかに記載の石英ガ
ラス物品の製造方法、(8)前記不活性ガス雰囲気が少な
くとも窒素ガスを含むことを特徴とする上記(5) または
(7)記載のガラス物品の製造方法、(9)前記窒素原子を
含む還元性化合物ガスがアンモニアであることを特徴と
する上記(6) または(7) 記載の石英ガラス物品の製造方
法、(10) 前記溶媒の揮散を酸素が存在しない雰囲気下
で行うことを特徴とする上記(3) 記載のガラス物品の製
造方法、である。
According to the present invention, there is provided (1) a method in which silazane is contained in a porous glass body, and thereafter, the silazane in the porous glass body is converted into nitrogen-containing silica. A method for producing a glass article, characterized in that the nitrogen-containing porous glass body is heated and transparently vitrified, and (2) after impregnating the porous glass body with liquid silazane, the solution of the silazane solution in the porous glass body The solvent is volatilized, and then a conversion treatment of silazane in the porous glass body to nitrogen-containing silica is performed,
The method for producing a glass article according to the above (1), wherein the obtained nitrogen-containing porous glass body is heated and transparently vitrified, (3) after impregnating the porous glass body with a silazane solution, Volatilizing the solvent of the silazane solution in the porous glass body, then performing a conversion treatment of the silazane in the porous glass body to nitrogen-containing silica, and heating and vitrifying the obtained nitrogen-containing porous glass body. The method according to any one of (1) to (3), wherein the method for producing a glass article according to (1), wherein the silazane contains a carbon atom. Glass article manufacturing method, (5)
The method for producing a glass article according to any one of the above (1) to (4), wherein heating is performed under an inert gas atmosphere as the silazane conversion treatment. (6) Nitrogen is used as the silazane conversion treatment. The method for producing a quartz glass article according to any one of the above (1) to (4), wherein heating is performed under an atmosphere of a reducing compound gas containing (7) a reduction including a nitrogen atom as the silazane conversion treatment. The method for producing a quartz glass article according to any one of claims 1 to 4, wherein the heating is performed in an atmosphere containing a reactive compound gas and an inert gas, (8) the inert gas atmosphere is at least The method for producing a glass article according to the above (5) or (7), wherein the method further comprises a nitrogen gas, and (9) the reducing compound gas containing a nitrogen atom is ammonia. Or the quartz gas described in (7) Method for producing a scan article, a method, the manufacture of glass articles (3), wherein the performed under an atmosphere that no oxygen volatilization of (10) wherein the solvent.

【0006】[0006]

【発明の実施の形態】本発明者らは上記従来法のように
気相で窒素を添加する方法とは異なり、多孔質ガラス体
にシラザンを含ませておき、このシラザンを含む多孔質
ガラス体を窒素含有シリカに転化することを考えつき、
本発明に到達した。シラザンは、H3Si[NHSiH2]n NHSiH3
で示される化合物の総称であり、ケイ素原子の数によ
りジシラザン、トリシラザン・・ポリシラザンと呼ばれ
ている。また、側鎖が全て水素のものをペルヒドロシラ
ザン(例えば無機ポリマーの形で存在するペルヒドロポ
リシラザン: [SH2NH]x 等)、水素が有機基で置換され
たもの(例えばヘキサメチルジシラザン:NH[Si(CH3)3]
等)をオルガノシラザンと称する。(ポリ)シラザンを
アンモニア及び N2, Ar 等 の不活性ガス、または真空
中で焼成すると窒化ケイ素(Si3N4)に転化し、大気また
は水蒸気雰囲気中で加熱するとシリカ(SiO2)に転化する
ことが知られている。また、(ポリ)シラザンはトルエ
ン,キシレン等の芳香族炭化水素類、ヘキサン,オクタ
ン等の脂肪族炭化水素類、エーテル類、エステル類等ほ
とんどの有機溶媒に可溶であるため、溶液状で取り扱え
る利点がある。
DETAILED DESCRIPTION OF THE INVENTION The present inventors differ from the conventional method in which nitrogen is added in the gas phase in that the porous glass body contains silazane and the porous glass body containing this silazane. To convert it to nitrogen-containing silica,
The present invention has been reached. Silazane is H 3 Si [NHSiH 2 ] n NHSiH 3
And are called disilazane or trisilazane / polysilazane depending on the number of silicon atoms. In addition, those whose side chains are all hydrogen are perhydrosilazane (for example, perhydropolysilazane existing in the form of an inorganic polymer: [SH 2 NH] x, etc.), and those in which hydrogen is substituted with an organic group (for example, hexamethyldisilazane) : NH [Si (CH 3 ) 3 ]
Etc.) are referred to as organosilazanes. (Poly) silazane is converted to silicon nitride (Si 3 N 4 ) when baked in ammonia or an inert gas such as N 2 or Ar, or in vacuum, and converted to silica (SiO 2 ) when heated in air or steam. It is known to (Poly) silazane is soluble in most organic solvents such as aromatic hydrocarbons such as toluene and xylene, aliphatic hydrocarbons such as hexane and octane, ethers and esters, and can be handled in the form of a solution. There are advantages.

【0007】(作用)従来の多孔質ガラス体に気相で窒
素を添加する技術による場合に窒素添加量が少ないとい
う問題は、次のように考察できる。多孔質ガラス体にお
いてSi-O-Si結合が安定であり、シリカガラスへの気相
での窒素添加で主に形成されるSi-Nの結合は、Si-OH あ
るいはガラス中の欠陥等の部分でのみ主に形成される。
そのためガラス中への窒素添加量が限られてしまう。こ
れに対し本発明では Si-N 結合を有するシラザンを予め
含有させ、シラザン含有多孔質ガラス体を窒素が脱離す
ることのない条件で、具体的には不活性ガス及び/また
は窒素原子を含有する還元性ガスを含む雰囲気下で加熱
して窒素を含有するシリカに転化するので、ガラス多孔
質体中のSi-OH 結合量や欠陥量には関係なく、容易に多
孔質ガラス体への窒素添加量を増加できる。この転化工
程での加熱の雰囲気として窒素ガスまたは/及び窒素原
子含有還元性化合物ガス(例えばアンモニア等)を用い
ると、シラザンの窒素含有シリカへの転化と共に気相状
態での窒素添加効果も副次的に得られると考えられる。
(Operation) The problem that the amount of added nitrogen is small in the conventional technique of adding nitrogen in a gas phase to a porous glass body can be considered as follows. The Si-O-Si bond is stable in the porous glass body, and the bond of Si-N mainly formed by adding nitrogen in the gas phase to silica glass is due to Si-OH or defects such as defects in the glass. Mainly formed only in.
Therefore, the amount of nitrogen added to the glass is limited. On the other hand, in the present invention, a silazane having a Si—N bond is contained in advance, and the silazane-containing porous glass body is free from nitrogen, and specifically contains an inert gas and / or a nitrogen atom. Is converted to silica containing nitrogen by heating in an atmosphere containing a reducing gas, so that nitrogen is easily added to the porous glass regardless of the amount of Si-OH bonds and defects in the porous glass. The amount of addition can be increased. When nitrogen gas and / or a nitrogen-containing reducing compound gas (for example, ammonia or the like) is used as a heating atmosphere in this conversion step, the conversion of silazane to nitrogen-containing silica and the effect of nitrogen addition in the gas phase are also secondary. It is thought that it can be obtained.

【0008】さらに詳しく説明すると、シラザンを酸化
雰囲気中にて加熱処理した場合、シラザン中の Si-H 結
合、 Si-N 結合が Si-O 結合に変化し、SiO2が生成す
る。一方、非酸化性雰囲気にて加熱した場合、 Si-H 結
合が切れ、Si3N4 が生成する。両者の中間雰囲気にて加
熱処理した場合、SiO2, Si3N4 の混合体となる。その
際、SiO2, Si3N4 間でも反応は進行し、N原子はSiO2
ットワークに取り込まれる形になり、窒素含有シリカガ
ラスとなると考えられる。すなわち、本発明によりシラ
ザンから転化する際、完全な窒化ケイ素(Si3N4)ができ
る前に、更に多孔質ガラス粒子自体(SiO2)と反応し、
窒素原子がガラスネットワーク中に入りこむと考えられ
る。
More specifically, when silazane is heated in an oxidizing atmosphere, Si—H bonds and Si—N bonds in the silazane change into Si—O bonds, and SiO 2 is generated. On the other hand, when heated in a non-oxidizing atmosphere, Si-H bonds are broken and Si 3 N 4 is generated. When heat treatment is performed in an intermediate atmosphere between the two, a mixture of SiO 2 and Si 3 N 4 is obtained. At that time, it is considered that the reaction proceeds even between SiO 2 and Si 3 N 4 , and N atoms are taken into the SiO 2 network, resulting in a nitrogen-containing silica glass. That is, when converting from silazane according to the present invention, before complete silicon nitride (Si 3 N 4 ) is formed, it further reacts with the porous glass particles themselves (SiO 2 ),
It is believed that nitrogen atoms enter the glass network.

【0009】上記転化工程の後、得られた窒素含有多孔
質ガラス体を加熱透明ガラス化して窒素含有ガラス物品
を得る。この加熱透明ガラス化工程においてもガラス中
の窒素を確保しておくために不活性ガス雰囲気下、望ま
しくは窒素ガスを含む雰囲気下で加熱する。また、加熱
透明ガラス化の前に窒素原子含有還元性ガス雰囲気での
窒素添加処理を併用すると、窒素含有量の増大にいっそ
う有利である。なお、気相での窒化(窒素添加)作用
は、窒素原子含有還元性雰囲気、または窒素原子含有還
元性化合物ガス及び不活性ガスからなる雰囲気でのみ可
能である。単に不活性ガス雰囲気のみでは例え窒素ガス
を用いても殆ど窒素添加の効果は得られない。窒素ガス
を用いた場合の効果は主にガラス(シラザン)中の窒素
の脱離防止が主となる。従って、窒素含有量を増加させ
るには少なくとも窒素原子含有還元性化合物ガスを含む
雰囲気を用いることが好ましい。
After the above conversion step, the obtained nitrogen-containing porous glass body is heated and vitrified to obtain a nitrogen-containing glass article. Also in this heating transparent vitrification step, heating is performed in an inert gas atmosphere, preferably in an atmosphere containing nitrogen gas, in order to secure nitrogen in the glass. Further, when the nitrogen addition treatment in a nitrogen atom-containing reducing gas atmosphere is used in combination before the heating and vitrification, it is more advantageous to increase the nitrogen content. The nitriding (addition of nitrogen) action in the gas phase is possible only in a reducing atmosphere containing a nitrogen atom or an atmosphere composed of a reducing compound gas containing a nitrogen atom and an inert gas. Simply using an inert gas atmosphere, even if a nitrogen gas is used, hardly provides an effect of nitrogen addition. The effect of using nitrogen gas is mainly to prevent desorption of nitrogen in glass (silazane). Therefore, in order to increase the nitrogen content, it is preferable to use an atmosphere containing at least a nitrogen-containing reducing compound gas.

【0010】本発明において多孔質ガラス体にシラザン
を含ませる具体的手段としては、液状のシラザン中、あ
るいはシラザンを溶媒に溶かした溶液中に多孔質ガラス
体を浸漬する方法がまず挙げられる。シラザンは液状で
多孔質ガラス体中に含ませることができるので、取扱が
容易であり、多孔質ガラス体の嵩密度、シラザンの濃
度、溶液粘度等を選択することにより含浸する量を調整
できる。さらに本発明においては、粉末状のシラザンを
ガラス微粉末と混合し、圧粉法を応用してガラス多孔質
体として添加処理することも考えられる。ただし、シラ
ザン粉末は空気中の酸素との反応が進みやすくなる点に
注意する必要がある。
In the present invention, as a specific means for incorporating silazane in the porous glass body, there is firstly a method of immersing the porous glass body in liquid silazane or a solution in which silazane is dissolved in a solvent. Since the silazane can be contained in the porous glass body in a liquid state, it is easy to handle, and the amount to be impregnated can be adjusted by selecting the bulk density, the silazane concentration, the solution viscosity, and the like of the porous glass body. Further, in the present invention, it is conceivable to mix the powdery silazane with the glass fine powder and to add and process it as a glass porous body by applying a powder compaction method. However, it should be noted that the reaction of the silazane powder with oxygen in the air is likely to proceed.

【0011】以下に、更に詳細に説明する。本発明の多
孔質ガラス体とは、ガラス微粒子が密集しており、その
内部の気孔がつながっている状態のものをいう。このよ
うな多孔質ガラス体の製法としては、例えばVAD法、
OVD法等のガラス原料を気相で酸化反応或いは火炎加
水分解反応等に付すことによりガラス微粒子を合成し、
これを堆積して多孔質体を得る気相合成法の他ゾルゲル
法、圧粉法等も利用できる。ゾルゲル法はシリコンアル
コキシドを出発原料とし、加水分解、重合反応によりゲ
ル化させて多孔質体を得る。また圧粉法はガラス微粒子
(微粉末)を容器中に充填し、周囲より加圧して多孔質
の成形体としたものである。本発明に用いる多孔質ガラ
ス体の嵩密度は例えば0.1〜0.8g/cm3程度、
好ましくは 0.15〜0.7g/cm3、特に好まし
くは0.2〜0.6g/cm3 である。この理由は嵩密
度が余りに低いと液状シラザンまたはシラザン溶液中に
含浸する際に崩れてしまう危険があり、一方、嵩密度が
高すぎると多孔質内部に充分に含浸させることができな
くなるためである。
The details will be described below. The porous glass body of the present invention refers to a state in which glass particles are densely packed and pores inside the glass body are connected. As a method for producing such a porous glass body, for example, a VAD method,
Glass particles are synthesized by subjecting glass materials such as OVD method to oxidation reaction or flame hydrolysis reaction in the gas phase,
A sol-gel method, a compacting method, and the like can be used in addition to a gas phase synthesis method of depositing this to obtain a porous body. In the sol-gel method, a silicon alkoxide is used as a starting material, and gelation is performed by hydrolysis and polymerization to obtain a porous body. In the compacting method, glass fine particles (fine powder) are filled in a container, and pressure is applied from the surroundings to form a porous molded body. The bulk density of the porous glass body used in the present invention is, for example, about 0.1 to 0.8 g / cm 3 ,
It is preferably 0.15 to 0.7 g / cm 3 , particularly preferably 0.2 to 0.6 g / cm 3 . The reason for this is that if the bulk density is too low, there is a risk of collapse during impregnation into the liquid silazane or silazane solution, while if the bulk density is too high, it is not possible to sufficiently impregnate the inside of the porous material. .

【0012】本発明において用いるシラザンは前記した
無機ペルヒドロ(ポリ)シラザン、オルガノシラザンの
いずれでもよい。オルガノシラザン(炭素原子を含有す
るシラザン)を用いると、炭素による還元作用、炭素原
子と窒素原子の置換反応により窒素添加量増大に有利で
ある。具体的なシラザンとしては、例えばペルヒドロシ
ラザン,ヘキサメチルジシラザン、ヘキサメチルシクロ
トリシラザン、オクタメチルシクロテトラシラザン等を
挙げることができる。
The silazane used in the present invention may be any of the aforementioned inorganic perhydro (poly) silazane and organosilazane. The use of organosilazane (silazane containing a carbon atom) is advantageous in increasing the amount of nitrogen added by a reduction action by carbon and a substitution reaction between a carbon atom and a nitrogen atom. Specific examples of the silazane include perhydrosilazane, hexamethyldisilazane, hexamethylcyclotrisilazane, and octamethylcyclotetrasilazane.

【0013】シラザン溶液とする場合の該溶媒としては
前記のように芳香族炭化水素、脂肪族炭化水素、エーテ
ル類、エステル類等殆どの溶媒に可溶であり使用できる
が、アルコール類はシラザンと反応するため好ましくな
い。具体的には、例えばキシレン,トルエン,ヘキサ
ン、オクタン、ジブチルエーテルなどが挙げられる。溶
液に含浸する場合のシラザン溶液濃度は特に限定される
ところはないが、望ましくは10〜 100重量%である。浸
漬する時間についても特に限定されるところはなく、多
孔質ガラス体の状態に応じて適宜選択するが、例えば5
〜20時間程度で十分である。またさらに、粉末状のシラ
ザンを溶媒に溶かしたものを含浸する、或いは粉末状シ
ラザンとガラス微粒子を混合させた後、成形することも
可能である。
As the solvent for preparing the silazane solution, as described above, it can be used because it is soluble in most solvents such as aromatic hydrocarbons, aliphatic hydrocarbons, ethers and esters, but alcohols are It is not preferable because it reacts. Specific examples include xylene, toluene, hexane, octane, dibutyl ether and the like. The concentration of the silazane solution when impregnating the solution is not particularly limited, but is preferably from 10 to 100% by weight. The time for immersion is not particularly limited, and is appropriately selected according to the state of the porous glass body.
About 20 hours is enough. Furthermore, it is also possible to impregnate a powdery silazane dissolved in a solvent, or to mix the powdery silazane and glass fine particles and then mold.

【0014】多孔質ガラス体をシラザン(溶液)中に所
定時間浸漬した後、該多孔質ガラス体を取り出し、溶液
を用いた場合には溶媒を揮散等により除去する。具体的
には例えば減圧または加熱により揮散させるが、シラザ
ン中の窒素原子の脱離を防ぐため、酸素非存在及び乾燥
雰囲気下でより望ましくは還元性雰囲気下で行う。より
具体的には窒素ガス、アルゴンガス、ヘリウムガス等の
不活性ガスあるいはアンモニアガス等の還元ガスを含有
する不活性ガス雰囲気で行う。揮散させる温度は溶媒に
応じて選択するが、通常20〜 100℃程度である。20℃未
満であると、揮散させるのに時間がかかり効率が悪い。
また、100 ℃を越えると、溶媒によっては、引火, 発火
の危険もあり不適である。
After the porous glass body is immersed in a silazane (solution) for a predetermined time, the porous glass body is taken out. When a solution is used, the solvent is removed by volatilization or the like. Specifically, the gas is volatilized by, for example, reduced pressure or heating. However, in order to prevent elimination of nitrogen atoms in the silazane, the reaction is performed in the absence of oxygen and in a dry atmosphere, more preferably in a reducing atmosphere. More specifically, the reaction is performed in an inert gas atmosphere containing an inert gas such as a nitrogen gas, an argon gas, a helium gas, or a reducing gas such as an ammonia gas. The temperature for volatilization is selected according to the solvent, but is usually about 20 to 100 ° C. If the temperature is lower than 20 ° C., it takes a long time to evaporate and the efficiency is poor.
In addition, if the temperature exceeds 100 ° C, there is a danger of ignition or ignition depending on the solvent, which is not suitable.

【0015】次いで多孔質ガラス中に含有させたシラザ
ンを含窒素シリカに転化させる処理(以下「転化処理」
と略記する場合もある)を行なう。転化処理はシラザン
を酸化することのない雰囲気で行う。具体的には窒素ガ
ス,アルゴンガス,ヘリウムガス等の不活性ガス及び/
または窒素原子含有還元性化合物ガスを含む雰囲気が挙
げられる。窒素原子含有還元性化合物ガスとして例えば
アンモニア(NH3),一酸化窒素(NO),酸化二窒素 (N2O)
等が挙げられる。特に好ましくはアンモニアガスであ
り、その理由は窒素原子含有還元性化合物ガスのうちで
最も入手が容易であり、取扱い性にも優れるためであ
る。特に窒素ガス及び/または窒素原子含有還元性化合
物ガスを含む雰囲気下で加熱すると、シラザンの含窒素
シリカへの転化、窒素脱離の防止という作用と共に、気
相での多孔質ガラス体への窒素添加作用も期待できる。
本発明の転化処理における加熱温度は 300℃〜1200℃が
望ましい。300 ℃未満であると、転化処理に時間がかか
り効率が悪い。1200℃を越えると、多孔質ガラス体の焼
結が進行し始め、また、窒素の脱離も生じ始め、透明ガ
ラスを得るのが難しくなる。
Next, a treatment for converting the silazane contained in the porous glass into nitrogen-containing silica (hereinafter referred to as "conversion treatment")
May be abbreviated). The conversion treatment is performed in an atmosphere in which silazane is not oxidized. Specifically, inert gas such as nitrogen gas, argon gas, helium gas and / or
Alternatively, an atmosphere including a nitrogen-containing reducing compound gas may be used. Examples of the nitrogen-containing reducing compound gas include ammonia (NH 3 ), nitric oxide (NO), and nitrous oxide (N 2 O)
And the like. Ammonia gas is particularly preferred because it is the most easily available among the nitrogen-containing reducing compound gases and has excellent handling properties. In particular, when heating is performed in an atmosphere containing nitrogen gas and / or a nitrogen-containing reducing compound gas, silazane is converted into nitrogen-containing silica, nitrogen is prevented from being desorbed, and nitrogen is added to the porous glass body in the gas phase. An addition effect can also be expected.
The heating temperature in the conversion treatment of the present invention is desirably 300 ° C to 1200 ° C. If the temperature is lower than 300 ° C., the conversion process takes a long time and the efficiency is poor. If the temperature exceeds 1200 ° C., sintering of the porous glass body starts to proceed, and desorption of nitrogen also starts to occur, making it difficult to obtain a transparent glass.

【0016】以上のような処理により窒素を含有する多
孔質ガラス体を得た後、加熱透明化して窒素を含有する
ガラス物品とする。加熱透明化温度は通常の条件にて行
うことができる。例えば、不活性ガス雰囲気下で温度14
00℃〜1700℃程度に加熱する。1400℃未満であると、充
分焼結できず、内部に空隙が残る。一方、1700℃を越え
ると、急激に窒素の脱離が生じ、発泡し、透明ガラスを
得るのが難しくなる。不活性ガスとして例えばヘリウ
ム、アルゴン、窒素を使用できる。ヘリウムを用いると
気泡発生防止の点で有利である。また不活性ガスとして
窒素ガス雰囲気を用いれば、ガラス中からの窒素の脱離
を防止できる。また、この加熱透明化処理前に窒素原子
含有還元性化合物ガス雰囲気下で加熱すれば、従来技術
での窒素添加と同様の効果が得られるため、ガラス中の
窒素添加量をさらに増大できる。また加熱透明化処理の
前に、前記公報等に提案されるような、酸素,水蒸気等
の存在下での加熱処理を施せば、添加された窒素を除く
ことができるので、ガラス中の窒素添加量の分布を調整
することも可能である。
After a nitrogen-containing porous glass body is obtained by the above treatment, it is heated and made transparent to obtain a nitrogen-containing glass article. The heating and clearing temperature can be performed under ordinary conditions. For example, a temperature of 14
Heat to about 00 ° C to 1700 ° C. If the temperature is lower than 1400 ° C., sintering cannot be performed sufficiently, and voids remain inside. On the other hand, when the temperature exceeds 1700 ° C., nitrogen is rapidly desorbed, foaming occurs, and it becomes difficult to obtain a transparent glass. For example, helium, argon, and nitrogen can be used as the inert gas. The use of helium is advantageous in preventing the generation of bubbles. When a nitrogen gas atmosphere is used as an inert gas, desorption of nitrogen from the glass can be prevented. In addition, if the heating is performed in a nitrogen atom-containing reducing compound gas atmosphere before the heating / clearing treatment, the same effect as the nitrogen addition in the related art can be obtained, so that the nitrogen addition amount in the glass can be further increased. If the heat treatment is performed in the presence of oxygen, water vapor, or the like as proposed in the above publications before the heat clearing treatment, the added nitrogen can be removed. It is also possible to adjust the distribution of the quantities.

【0017】以上のようにして得られた本発明によるガ
ラス物品は、窒素濃度が〜1000ppm以上という高濃度を
実現できる。このような高濃度窒素量はその耐熱性を示
す指標のひとつである。また、徐冷点(ガラスの粘度が
2.51×1013ポアズとなる温度:徐冷温度ともいう)は12
00℃以上とすることができる。
The glass article according to the present invention obtained as described above can realize a high nitrogen concentration of up to 1000 ppm or more. Such a high concentration of nitrogen is one of the indexes indicating the heat resistance. In addition, the annealing point (the viscosity of the glass
2.51 × 10 13 Poise temperature (also called slow cooling temperature) is 12
It can be set to 00 ° C. or higher.

【0018】以下、本発明を実施例により具体的に説明
するが、本発明はこれに限定されるものではない。
Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited thereto.

【実施例】〔実施例1〕酸素、水素ガスにより形成され
る火炎中に四塩化ケイ素(SiCl4)蒸気を含むアルゴン(A
r)ガスを導入し、VAD法により直径80mmφ、長さ300m
m の多孔質ガラス体(嵩密度:0.3 g/cm3 )を作成
した。前記多孔質ガラス体をペルヒドロポリシラザン
(商品名N110、東燃(株)製)を20重量%含むキシ
レン溶液中に 5時間浸漬し、多孔質ガラス体中にペルヒ
ドロポリシラザン溶液を含浸させた。その後該多孔質ガ
ラス体を溶液中より取り出し、窒素(N2) 気流中にて温
度 100℃に保持し、溶媒であるキシレンを完全に揮散さ
せた。次いで加熱炉内をアンモニア(NH3) と窒素が体積
比で50:50である混合ガス雰囲気に保ち、この加熱炉内
において該多孔質ガラス体を温度 950℃で3 時間保持
し、多孔質ガラス体中のペルヒドロポリシラザンを窒素
含有シリカに転化させた。次に炉内を 100%窒素雰囲気
とし、温度1450℃にて 5時間保持し、該多孔質ガラス体
を透明ガラス化させることにより、含窒素シリカガラス
を作成した。このガラス中の窒素濃度は1.8 重量% (18
000ppm) 、徐冷点は1270℃であった。なお、ガラス中の
窒素濃度は、文献:作花済夫著「オキシナイトライドガ
ラス−酸化物ガラスのブレークスルー−」,第47〜49
頁,(株)内田老鶴圃発行(1989年):の記載に従いキ
エルダール法を利用して測定した。
[Example 1] Argon (A) containing silicon tetrachloride (SiCl 4 ) vapor in a flame formed by oxygen and hydrogen gas
r) Introduce gas, VAD method, diameter 80mmφ, length 300m
m of a porous glass body (bulk density: 0.3 g / cm 3 ). The porous glass body was immersed in a xylene solution containing 20% by weight of perhydropolysilazane (trade name: N110, manufactured by Tonen Corp.) for 5 hours to impregnate the porous glass body with the perhydropolysilazane solution. Thereafter, the porous glass body was taken out of the solution, and kept at a temperature of 100 ° C. in a stream of nitrogen (N 2 ) to completely vaporize xylene as a solvent. Next, the inside of the heating furnace is maintained in a mixed gas atmosphere in which ammonia (NH 3 ) and nitrogen are at a volume ratio of 50:50, and the porous glass body is maintained in the heating furnace at a temperature of 950 ° C. for 3 hours. The perhydropolysilazane in the body was converted to nitrogen-containing silica. Next, the inside of the furnace was set to a 100% nitrogen atmosphere, the temperature was maintained at 1450 ° C. for 5 hours, and the porous glass body was turned into a transparent glass, whereby a nitrogen-containing silica glass was produced. The nitrogen concentration in this glass was 1.8% by weight (18%
000 ppm), and the annealing point was 1270 ° C. In addition, the nitrogen concentration in glass is described in Literature: Mio Sakuhana, "Oxynitride Glass-Breakthrough of Oxide Glass-", Nos. 47-49.
Page, published by Uchida Lao Tsuruho (1989): Kjeldahl method.

【0019】〔実施例2〕実施例1同様にVAD法によ
り作成した多孔質ガラス体を実施例1と同様の20重量%
ぺルヒドロポリシラザン含有キシレン溶液中に5時間浸
漬した後、該溶液中より取り出し、加熱炉内で窒素気流
中にて温度 100℃に保持し、溶媒であるキシレンを完全
に揮散させた。次いで該多孔質ガラス体を、 100%窒素
雰囲気に保った加熱炉内に温度1000℃で2時間保持する
ことにより、該多孔質ガラス体中のペルヒドロポリシラ
ザンを窒素含有シリカに転化させた。次に、該加熱炉内
を 100%ヘリウム雰囲気とし、温度1450℃にて5時間保
持し、該多孔質ガラス体を透明ガラス化させることによ
り、含窒素シリカガラスを作成した。このガラス中の窒
素濃度を実施例1と同様にキエルダール法にて測定した
ところ、1.4 重量% (14000ppm) 、また徐冷点は1250℃
であった。
Example 2 A porous glass body produced by the VAD method in the same manner as in Example 1 was used in the same manner as in Example 1 in an amount of 20% by weight.
After being immersed in a perhydropolysilazane-containing xylene solution for 5 hours, it was taken out of the solution, and kept at a temperature of 100 ° C. in a nitrogen stream in a heating furnace to completely volatilize xylene as a solvent. Next, the porous glass body was kept in a heating furnace maintained at 100% nitrogen atmosphere at a temperature of 1000 ° C. for 2 hours to convert perhydropolysilazane in the porous glass body into nitrogen-containing silica. Next, the inside of the heating furnace was set to a 100% helium atmosphere, kept at a temperature of 1450 ° C. for 5 hours, and the porous glass body was turned into a transparent glass, thereby producing a nitrogen-containing silica glass. When the nitrogen concentration in this glass was measured by the Kjeldahl method in the same manner as in Example 1, the weight was 1.4% by weight (14000 ppm), and the annealing point was 1250 ° C.
Met.

【0020】〔実施例3〕実施例1同様にVAD法によ
り作成した多孔質ガラス体を、ヘキサメチルジシラザン
20重量%のキシレン溶液に5時間浸漬した後取り出し、
窒素100 %雰囲気に保った加熱炉内にて温度950 ℃で3
時間保持した。次いで該加熱炉内をアンモニアと窒素が
体積比で50:50である混合ガス雰囲気に保ち、該多孔質
ガラス体を温度950 ℃で3時間保持した。以上により該
多孔質ガラス体中のヘキサメチルジシラザンを窒素含有
シリカに転化させた後、炉内を 100%ヘリウム雰囲気と
し、温と1450℃にて5時間保持して該多孔質ガラス体を
透明ガラス化させることにより、含窒素シリカガラスを
作成した。このガラス中の窒素濃度を実施例1と同様に
ケルダール法にて測定したところ1.7 重量% (17000pp
m) 、また徐冷点は1265℃であった。
Example 3 A porous glass body produced by the VAD method in the same manner as in Example 1 was replaced with hexamethyldisilazane.
After immersion in a 20 wt% xylene solution for 5 hours, take out
In a heating furnace maintained in a 100% nitrogen atmosphere at a temperature of 950 ° C
Hold for hours. Next, the inside of the heating furnace was kept in a mixed gas atmosphere in which the volume ratio of ammonia and nitrogen was 50:50, and the porous glass body was kept at a temperature of 950 ° C. for 3 hours. After converting hexamethyldisilazane in the porous glass body to nitrogen-containing silica as described above, the furnace was set to a 100% helium atmosphere, and kept at a temperature of 1450 ° C. for 5 hours to make the porous glass body transparent. Nitrogen-containing silica glass was produced by vitrification. When the nitrogen concentration in this glass was measured by the Kjeldahl method in the same manner as in Example 1, it was 1.7% by weight (17000 pp).
m), and the annealing point was 1265 ° C.

【0021】〔比較例1〕実施例1と同様に、VAD法
より作成した多孔質ガラス体をアンモニアと窒素が体積
比で50:50である混合ガス雰囲気とした加熱炉内に設置
し、温度 950℃にて3 時間保持し、窒素転化処理を行っ
た。次に、炉内を 100%窒素雰囲気に変え、温度1450℃
にて5時間保持し、前記多孔質ガラス体を透明化させる
ことにより、含窒素シリカガラスを作成した。このガラ
ス中の窒素濃度を実施例1と同様にケルダール法にて測
定したところ、0.7重量%(7000ppm)、また徐冷点
は1195℃であった。
Comparative Example 1 As in Example 1, a porous glass body prepared by the VAD method was placed in a heating furnace in a mixed gas atmosphere in which ammonia and nitrogen had a volume ratio of 50:50. It was kept at 950 ° C. for 3 hours to perform a nitrogen conversion treatment. Next, the inside of the furnace was changed to a 100% nitrogen atmosphere, and the temperature was changed to 1450 ° C.
For 5 hours to make the porous glass body transparent, thereby producing a nitrogen-containing silica glass. When the nitrogen concentration in this glass was measured by the Kjeldahl method in the same manner as in Example 1, it was 0.7% by weight (7000 ppm) and the annealing point was 1195 ° C.

【0022】[0022]

【発明の効果】以上説明のとおり、本発明によれば、高
濃度に窒素を含有し耐熱性が高く、粘性が上昇した性能
の向上したガラス物品を製造することができる。さらに
本発明は窒素添加量の調整が容易であり、ガラスの屈折
率上昇用添加剤として窒素を多量にしかも添加量の制御
性良く添加することを可能とする。従って本発明は半導
体生産用のるつぼ等ガラスを装置材料として用いる分
野、ロッドレンズや光ファイバ用ガラス等の光学部品製
造分野に広く適用して非常に有利である。
As described above, according to the present invention, it is possible to produce a glass article containing nitrogen at a high concentration, having high heat resistance and having increased viscosity and improved performance. Further, the present invention makes it easy to adjust the amount of nitrogen added, and makes it possible to add a large amount of nitrogen as an additive for increasing the refractive index of glass with good controllability of the amount of addition. Therefore, the present invention is very advantageous when applied widely to the field of using glass such as a crucible for semiconductor production as an apparatus material, and to the field of manufacturing optical parts such as rod lenses and glass for optical fibers.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 石川 真二 神奈川県横浜市栄区田谷町1番地 住友電 気工業株式会社横浜製作所内 (72)発明者 山崎 卓 神奈川県横浜市栄区田谷町1番地 住友電 気工業株式会社横浜製作所内 Fターム(参考) 4G014 AH15 4G021 CA15  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Shinji Ishikawa 1st Tayacho, Sakae-ku, Yokohama-shi, Kanagawa Prefecture Sumitomo Electric Industries, Ltd. Yokohama Works (72) Inventor Taku Yamazaki 1st Tayacho, Sakae-ku, Yokohama-shi, Kanagawa Sumitomo Electric Industry Co., Ltd. Yokohama Works F term (reference) 4G014 AH15 4G021 CA15

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 多孔質ガラス体中にシラザンを含有させ
た後に該多孔質ガラス体中のシラザンの含窒素シリカへ
の転化処理を行い、得られた含窒素多孔質ガラス体を加
熱透明ガラス化することを特徴とするガラス物品の製造
方法。
1. A method for converting a silazane in a porous glass body to nitrogen-containing silica after the silazane is contained in the porous glass body, and heating the resulting nitrogen-containing porous glass body to a transparent vitrification. A method for producing a glass article.
【請求項2】 多孔質ガラス体中に液状シラザンを含浸
させた後、該多孔質ガラス体中のシラザン溶液の溶媒を
揮散させ、次に該多孔質ガラス体中のシラザンの含窒素
シリカへの転化処理を行い、得られた含窒素多孔質ガラ
ス体を加熱透明ガラス化することを特徴とする請求項1
記載のガラス物品の製造方法。
2. After impregnating the porous glass body with liquid silazane, the solvent of the silazane solution in the porous glass body is volatilized, and then the silazane in the porous glass body is converted into nitrogen-containing silica. 2. A conversion treatment is performed, and the obtained nitrogen-containing porous glass body is heated to be transparent and vitrified.
A method for producing the glass article according to the above.
【請求項3】 多孔質ガラス体中にシラザン溶液を含浸
させた後、該多孔質ガラス体中のシラザン溶液の溶媒を
揮散させ、次いで該多孔質ガラス体中のシラザンの含窒
素シリカへの転化処理を行い、得られた含窒素多孔質ガ
ラス体を加熱透明ガラス化することを特徴とする請求項
1記載のガラス物品の製造方法。
3. After impregnating the porous glass body with the silazane solution, the solvent of the silazane solution in the porous glass body is volatilized, and then the silazane in the porous glass body is converted into nitrogen-containing silica. The method for producing a glass article according to claim 1, wherein the treatment is performed, and the obtained nitrogen-containing porous glass body is heated and made vitrified.
【請求項4】 前記シラザンが炭素原子を含有するもの
であることを特徴ととする請求項1ないし請求項3のい
ずれかに記載のガラス物品の製造方法。
4. The method for producing a glass article according to claim 1, wherein the silazane contains a carbon atom.
【請求項5】 前記シラザンの転化処理として不活性ガ
ス雰囲気下で加熱することを特徴とする請求項1ないし
請求項4のいずれかに記載のガラス物品の製造方法。
5. The method for producing a glass article according to claim 1, wherein the conversion of the silazane is performed under an inert gas atmosphere.
【請求項6】 前記シラザンの転化処理として窒素原子
を含む還元性化合物ガス雰囲気下で加熱することを特徴
とする請求項1ないし請求項4のいずれかに記載の石英
ガラス物品の製造方法。
6. The method for producing a quartz glass article according to claim 1, wherein the step of converting the silazane is performed in an atmosphere of a reducing compound gas containing a nitrogen atom.
【請求項7】 前記シラザンの転化処理として窒素原子
を含む還元性化合物ガス及び不活性ガスを含有する雰囲
気下で加熱することを特徴とする請求項1ないし請求項
4のいずれかに記載の石英ガラス物品の製造方法。
7. The quartz according to claim 1, wherein the conversion of the silazane is carried out in an atmosphere containing a reducing compound gas containing a nitrogen atom and an inert gas. A method for manufacturing a glass article.
【請求項8】 前記不活性ガス雰囲気が少なくとも窒素
ガスを含むことを特徴とする請求項5または請求項7記
載のガラス物品の製造方法。
8. The method according to claim 5, wherein the inert gas atmosphere contains at least nitrogen gas.
【請求項9】 前記窒素原子を含む還元性化合物ガスが
アンモニアであることを特徴とする請求項6または請求
項7記載の石英ガラス物品の製造方法。
9. The method for producing a quartz glass article according to claim 6, wherein the reducing compound gas containing a nitrogen atom is ammonia.
【請求項10】 前記溶媒の揮散を酸素が存在しない雰
囲気下で行うことを特徴とする請求項3記載のガラス物
品の製造方法。
10. The method for producing a glass article according to claim 3, wherein the evaporation of the solvent is performed in an atmosphere in which oxygen does not exist.
JP10316186A 1998-11-06 1998-11-06 Production of glass article Pending JP2000143257A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10316186A JP2000143257A (en) 1998-11-06 1998-11-06 Production of glass article

Publications (1)

Publication Number Publication Date
JP2000143257A true JP2000143257A (en) 2000-05-23

Family

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Family Applications (1)

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Country Link
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1580170A1 (en) * 2002-11-29 2005-09-28 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
WO2008104485A1 (en) * 2007-02-27 2008-09-04 Heraeus Quarzglas Gmbh & Co. Kg Optical component made from synthetic quartz glass with enhanced radiation resistance, and method for producing the component
WO2023136349A1 (en) * 2022-01-17 2023-07-20 国立研究開発法人物質・材料研究機構 Method for producing silicon oxynitride glass, method for producing optical waveguide, silicon oxynitride glass, optical waveguide, infrared image furnace, window material, and optical member

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1580170A1 (en) * 2002-11-29 2005-09-28 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
EP1580170A4 (en) * 2002-11-29 2011-12-28 Shinetsu Quartz Prod Method for producing synthetic quartz glass and synthetic quartz glass article
WO2008104485A1 (en) * 2007-02-27 2008-09-04 Heraeus Quarzglas Gmbh & Co. Kg Optical component made from synthetic quartz glass with enhanced radiation resistance, and method for producing the component
WO2023136349A1 (en) * 2022-01-17 2023-07-20 国立研究開発法人物質・材料研究機構 Method for producing silicon oxynitride glass, method for producing optical waveguide, silicon oxynitride glass, optical waveguide, infrared image furnace, window material, and optical member

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