JP2000133493A - Electrode for discharge treatment, discharge treating method and device using the electrode - Google Patents

Electrode for discharge treatment, discharge treating method and device using the electrode

Info

Publication number
JP2000133493A
JP2000133493A JP10300984A JP30098498A JP2000133493A JP 2000133493 A JP2000133493 A JP 2000133493A JP 10300984 A JP10300984 A JP 10300984A JP 30098498 A JP30098498 A JP 30098498A JP 2000133493 A JP2000133493 A JP 2000133493A
Authority
JP
Japan
Prior art keywords
electrode
discharge
discharge treatment
electrodes
support
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10300984A
Other languages
Japanese (ja)
Other versions
JP3846065B2 (en
Inventor
Yoshikazu Kondo
慶和 近藤
Kazuhiro Fukuda
和浩 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP30098498A priority Critical patent/JP3846065B2/en
Publication of JP2000133493A publication Critical patent/JP2000133493A/en
Application granted granted Critical
Publication of JP3846065B2 publication Critical patent/JP3846065B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To stably generate the discharge plasma for a long time and to execute the surface treatment for a short time by lining surface of a conductive base material of at least one of opposite surfaces of a pair of opposite electrodes for discharge treating to a substrate, with an inorganic material hardenable at not more than a predetermined temperature. SOLUTION: The conductive base materials 21A, 22A are metal such as gold, platinum or the like, or a composite material of metal and ceramic. The base materials 21A, 22A are coated with a normal temperature hardenable glass as a dielectric of an inorganic material hardneable at not more than 100 deg.C to manufacture the electrodes 21, 22. The base materials are optionally coated with various glass such as pyrex or the like as the inorganic solid dielectric 21B, 22B meltable at a high temperature, ceramic, or metallic oxide such as titanium oxide or the like. A substrate F for a photographic photosensitive material, is placed between a pair of opposite electrodes 21, 22 to form a discharge treatment chamber 30, and a mixture gas 54 including the Ar gas of at least 60 pressure % is introduced thereto to perform the discharge treatment onto the surface of the substrates F continuously conveyed with above 7.5 kW/m2 of discharge output.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は放電処理用の電極と
該電極を用いた放電処理方法及び放電処理装置に係わ
り、さらに詳しくは、長時間安定して放電プラズマを発
生できる耐久性のよい放電処理用の電極と、この電極を
用いて放電プラズマにより支持対に表面性能のよい放電
処理をする放電処理方法及び放電処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electrode for electric discharge treatment, an electric discharge treatment method and an electric discharge treatment apparatus using the electrode, and more particularly, to a durable electric discharge capable of stably generating a discharge plasma for a long time. The present invention relates to a processing electrode, a discharge processing method and a discharge processing apparatus for performing discharge processing with good surface performance on a supporting pair by discharge plasma using the electrode.

【0002】[0002]

【従来の技術】従来より、0.01から10Torr程
度の圧力の放電プラズマで支持体表面を放電処理する放
電処理装置に用いられる電極が知られているが、この放
電処理装置は真空装置が必要となり装置が複雑となるた
め、その改良として、大気圧または大気圧近傍での放電
プラズマが可能な技術が開示されている。そのため、放
電プラズマを発生させるために電極の表面を固体誘電体
で被覆することが必要となり、その技術が開示されてい
る(特公平2−48626号公報)。
2. Description of the Related Art Conventionally, there has been known an electrode used in a discharge processing apparatus for discharging a surface of a support with discharge plasma at a pressure of about 0.01 to 10 Torr. However, this discharge processing apparatus requires a vacuum apparatus. Since the apparatus becomes complicated, a technique that enables discharge plasma at or near atmospheric pressure is disclosed as an improvement. Therefore, it is necessary to cover the surface of the electrode with a solid dielectric in order to generate discharge plasma, and this technique has been disclosed (Japanese Patent Publication No. 2-48626).

【0003】しかしながら、この固体誘電体が有機系物
質では、物質が経時変化して行き、長時間安定な放電プ
ラズマが得られにくいばかりか、支持体に有機物が付着
して品質に悪影響を及ぼすことがあった。そこで、改良
として、無機系被覆物として、溶融状態に加熱した溶射
材料粉末を金属母材表面に吹き付けて皮膜とするセラミ
ックス溶射法を用いて固体誘電体を形成した電極に関す
る技術が開示されている(特開平6−96718号公
報)。また、ガラスを溶融させて皮膜をつくるガラスラ
イニング法を用いて固体誘電体を金属母材表面に形成し
た電極に関する技術が開示されている。
However, when the solid dielectric material is an organic material, the material changes with time, so that it is difficult to obtain a stable discharge plasma for a long time, and the organic material adheres to the support and adversely affects the quality. was there. Therefore, as an improvement, there has been disclosed a technique relating to an electrode in which a solid dielectric is formed using a ceramic spraying method in which a sprayed material powder heated to a molten state is sprayed onto a metal base material surface to form a film as an inorganic coating. (JP-A-6-96718). Further, there is disclosed a technique relating to an electrode in which a solid dielectric is formed on the surface of a metal base material by using a glass lining method of forming a film by melting glass.

【0004】[0004]

【発明が解決しようとする課題】このように、前記従来
技術の課題として、上記の放電プラズマ発生用の電極
は、いずれもアーク放電防止のために、少なくとも一方
の電極表面上にガラス、セラミックス、プラスチック等
が被覆されて設けられている。しかしセラミックスの溶
射法では、母材の変形は起こりにくいが被覆されたセラ
ミックスの誘電体はポーラス(多孔質)な構造となって
おり、そこに放電が集中し、ピンホールが生じやすく強
い放電が不可能であり、また、均一性に欠けやすく、特
に長時間連続して使用すると、絶縁破壊がおこりグロー
放電からアーク放電に移行しやすい。また、前記ガラス
ライニング法で形成した被覆誘電体も母材との熱収縮率
差が大きく、そのため歪みや撓みが起こり、長期放電処
理が可能な電極製作が不可能であった。以上のように、
従来の電極はいずれも耐久性が低く、長時間安定して放
電プラズマを発生できるものではなかった。
As described above, as a problem of the prior art, all of the above-mentioned electrodes for generating discharge plasma have glass, ceramics, or the like on at least one electrode surface in order to prevent arc discharge. The cover is provided with plastic or the like. However, in the ceramic spraying method, the base material is unlikely to be deformed, but the dielectric of the coated ceramic has a porous structure, and the discharge concentrates there, and pinholes are likely to be generated and strong discharge occurs. It is impossible and lacks uniformity. In particular, when used continuously for a long time, dielectric breakdown occurs and the transition from glow discharge to arc discharge tends to occur. In addition, the coated dielectric formed by the glass lining method also has a large difference in thermal shrinkage from the base material, which causes distortion and bending, making it impossible to produce an electrode capable of long-term discharge treatment. As mentioned above,
All of the conventional electrodes have low durability and cannot stably generate discharge plasma for a long time.

【0005】それを避けるためゴムを使用しても有機物
であるゴムは支持体面に良からぬ影響を与え、また、ど
んどんすり減るので耐久性も悪くやや頻繁な交換が必要
になる。
In order to avoid this, even if rubber is used, the rubber which is an organic substance has a bad effect on the surface of the support, and since it gradually wears out, the durability is poor and the frequent replacement is required.

【0006】本発明は上記の課題に鑑みなされたもの
で、本発明の目的は、長時間安定して放電プラズマを発
生でき、短時間に表面処理ができる放電プラズマ用電極
を提供することにある。また、本発明の目的は、長時間
安定して放電プラズマを発生させ、短時間に表面性能の
よい、表面処理ができる表面処理方法、及び表面処理装
置を提供することにある。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a discharge plasma electrode capable of stably generating discharge plasma for a long time and performing surface treatment in a short time. . Another object of the present invention is to provide a surface treatment method and a surface treatment apparatus which stably generate discharge plasma for a long period of time and have good surface performance in a short time and can perform surface treatment.

【0007】[0007]

【課題を解決するための手段】この目的は次の技術手段
(1)〜(17)項の何れか1項により達成される。
This object is achieved by any one of the following technical means (1) to (17).

【0008】(1) 一対の対向する電極間に支持体を
位置させ、前記電極間に電圧を印加して前記支持体に放
電処理を行う放電処理装置に用いる電極において、一対
の対向する前記電極の少なくとも一方の対向面は導電性
の母材表面に100℃以下で硬化する無機性質の材料を
ライニングすることで被覆したものであることを特徴と
する放電処理用の電極。
(1) A support is positioned between a pair of opposed electrodes, and a voltage is applied between the electrodes to perform a discharge process on the support. Characterized in that at least one of the opposing surfaces is coated with a conductive base material surface by lining an inorganic material which cures at 100 ° C. or lower.

【0009】(2) 前記無機性質材料が常温硬化性の
ガラスであることを特徴とする(1)項に記載の放電処
理用の電極。
(2) The electrode for electric discharge treatment according to the above (1), wherein the inorganic material is a glass which is curable at room temperature.

【0010】(3) 前記電極は大気圧近傍下での放電
処理を行う電極であることを特徴とする(1)又は
(2)項に記載の放電処理用の電極。
(3) The electrode for discharge treatment according to (1) or (2), wherein the electrode is an electrode for performing a discharge treatment near atmospheric pressure.

【0011】(4) 前記電極の少なくとも1つは円筒
型であることを特徴とする(1)〜(3)項の何れか1
項に記載の放電処理用の電極。
(4) At least one of the electrodes has a cylindrical shape.
Item 10. An electrode for electric discharge treatment according to item 9.

【0012】(5) 前記円筒型の電極の少なくとも1
つは支持体と接しながら回転するロール型であることを
特徴とする(4)項に記載の放電処理用の電極。
(5) At least one of the cylindrical electrodes
The electrode for discharge treatment according to item (4), wherein the electrode is a roll type that rotates while being in contact with the support.

【0013】(6) 一対の対向する電極の少なくとも
一方の対向面に、導電性の母材表面が100℃以下で硬
化する無機性質の材料を誘電体としてライニングされた
電極を設け、前記一対の対向する電極間に支持体を位置
させて、放電処理室を構成し、該放電処理室に60圧力
%以上のArガスを含む混合ガスを導入して、前記電極
に電圧を印加させ、大気圧または大気圧近傍の圧力下で
放電プラズマを励起させて放電出力7.5kW/m2
上で連続搬送される支持体表面の放電処理を行うことを
特徴とする放電処理方法。
(6) Provided on at least one of the opposing surfaces of the pair of opposing electrodes is an electrode lined with an inorganic material whose conductive base material surface is cured at 100 ° C. or lower as a dielectric, and A discharge treatment chamber is formed by positioning a support between the opposing electrodes, and a mixed gas containing Ar gas of 60% by pressure or more is introduced into the discharge treatment chamber, and a voltage is applied to the electrodes, and an atmospheric pressure is applied. Alternatively, a discharge treatment method is characterized in that a discharge plasma is excited under a pressure near the atmospheric pressure to perform a discharge treatment on the surface of a support that is continuously conveyed at a discharge output of 7.5 kW / m 2 or more.

【0014】(7) 一対の対向する電極の少なくとも
一方の対向面に、導電性の母材表面が100℃以下で硬
化する無機性質の材料を誘電体としてライニングされた
電極と、前記一対の対向する電極間に支持体を位置させ
て放電処理する放電処理室と、該処理室に60圧力%以
上のArガスを含む混合ガスを導入して充填する充填手
段と、前記電極間に電圧を印加する電圧発生手段とを有
し、大気圧または大気圧近傍の圧力下で、放電プラズマ
を励起させて放電出力7.5kW/m2以上で連続搬送
される支持体表面を放電処理することを特徴とする放電
処理装置。
(7) An electrode lined on at least one of the opposing surfaces of the pair of opposing electrodes with a dielectric material of an inorganic material whose surface is cured at a temperature of 100 ° C. or less; A discharge treatment chamber for performing a discharge treatment by positioning a support between electrodes to be filled, a filling means for introducing and filling a mixed gas containing Ar gas at 60% by pressure or more into the treatment chamber, and applying a voltage between the electrodes. And a discharge generating means for exciting a discharge plasma under an atmospheric pressure or a pressure close to the atmospheric pressure to discharge the surface of a support continuously transported at a discharge output of 7.5 kW / m 2 or more. Discharge treatment device.

【0015】(8) 一対の対向する電極間に支持体を
位置させ、前記電極間に電圧を印加して前記支持体に放
電処理を行う放電処理装置に用いる電極において、一対
の対向する前記電極の少なくとも一方の対向面は、金属
とセラミックスの複合材料を母材とし、該母材表面に誘
電体を被覆したものであることを特徴とする放電処理用
の電極。
(8) In an electrode used in a discharge treatment apparatus for performing a discharge treatment on the support by applying a voltage between the pair of opposed electrodes and positioning a support between the pair of opposed electrodes, Characterized in that at least one of the opposing surfaces is made of a composite material of metal and ceramic as a base material, and the surface of the base material is coated with a dielectric material.

【0016】(9) 前記電極は大気圧近傍下での放電
処理を行う電極であることを特徴とする(8)項に記載
の放電処理用の電極。
(9) The electrode for discharge treatment according to item (8), wherein the electrode is an electrode for performing discharge treatment near atmospheric pressure.

【0017】(10) 前記電極の少なくとも1つは円
筒型であることを特徴とする(8)又は(9)項に記載
の放電処理用の電極。
(10) The electrode for discharge treatment according to the above mode (8) or (9), wherein at least one of the electrodes has a cylindrical shape.

【0018】(11) 前記円筒型の電極の少なくとも
1つは支持体と接しながら回転するロール型であること
を特徴とする(10)項に記載の放電処理用の電極。
(11) The electrode for discharge treatment according to item (10), wherein at least one of the cylindrical electrodes is of a roll type which rotates while being in contact with a support.

【0019】(12) 一対の対向する電極の少なくと
も一方の対向面に、金属とセラミックスの複合材料の母
材表面が誘電体をライニングされた電極を設け、前記一
対の対向する電極間に支持体を位置させて、放電処理室
を構成し、該放電処理室に60圧力%以上のArガスを
含む混合ガスを導入して、前記電極に電圧を印加させ、
大気圧または大気圧近傍の圧力下で放電プラズマを励起
させて放電出力7.5kW/m2以上で連続搬送される
支持体表面を放電処理することを特徴とする放電処理方
法。
(12) Provided on at least one of the opposing surfaces of the pair of opposing electrodes is an electrode having a base material surface of a composite material of metal and ceramic lined with a dielectric, and a support is provided between the pair of opposing electrodes. To form a discharge treatment chamber, a mixed gas containing Ar gas at 60% by pressure or more is introduced into the discharge treatment chamber, and a voltage is applied to the electrode;
A discharge treatment method characterized by exciting a discharge plasma under an atmospheric pressure or a pressure close to the atmospheric pressure and performing a discharge treatment on a surface of a support continuously transported at a discharge output of 7.5 kW / m 2 or more.

【0020】(13) 一対の対向する電極の少なくと
も一方の対向面に、金属とセラミックスの複合材料の母
材表面が誘電体をライニングされた電極と、前記一対の
対向する電極間に支持体を位置させて放電処理する放電
処理室と、該処理室に60圧力%以上のArガスを含む
混合ガスを導入して充填する充填手段と、前記電極間に
電圧を印加する電圧発生手段とを有し、大気圧または大
気圧近傍の圧力下で、放電プラズマを励起させて放電出
力7.5kW/m2以上で連続搬送される支持体表面を
放電処理することを特徴とする放電処理装置。
(13) An electrode having a base material surface of a composite material of a metal and a ceramic lined with a dielectric material on at least one facing surface of the pair of facing electrodes, and a support between the pair of facing electrodes. A discharge processing chamber for performing discharge processing while being positioned; filling means for introducing and filling a mixed gas containing Ar gas at 60% by pressure or more into the processing chamber; and voltage generating means for applying a voltage between the electrodes. And a discharge treatment apparatus that excites discharge plasma at or near atmospheric pressure to discharge the surface of the support that is continuously transported at a discharge output of 7.5 kW / m 2 or more.

【0021】(14) 前記支持体はプラスチックフィ
ルムであることを特徴とする(6)又は(12)項に記
載の放電処理方法。
(14) The discharge treatment method according to the above (6) or (12), wherein the support is a plastic film.

【0022】(15) 前記プラスチックフィルムは感
光性材料用支持体であることを特徴とする(14)項に
記載の放電処理方法。
(15) The method according to the item (14), wherein the plastic film is a support for a photosensitive material.

【0023】(16) 前記支持体はプラスチックフィ
ルムであることを特徴とする(7)又は(13)項に記
載の放電処理装置。
(16) The discharge treatment apparatus according to the above (7) or (13), wherein the support is a plastic film.

【0024】(17) 前記プラスチックフィルムは感
光性材料用支持体であることを特徴とする(16)項に
記載の放電処理装置。
(17) The discharge processing apparatus according to item (16), wherein the plastic film is a support for a photosensitive material.

【0025】本発明者は、放電処理に必要な誘電体を被
覆した電極、その中でも特に円筒電極を製作するための
重要点が、熱収縮差による制作時のひずみ、たわみ、ひ
び割れがなく、かつポーラスのない高精度の無機誘電体
の被覆であることに着目した。
The inventor of the present invention has found that electrodes coated with a dielectric material necessary for electric discharge treatment, and in particular, cylindrical electrodes are important in producing distortion, deflection, and cracks during production due to differences in heat shrinkage, and We focused on the fact that it was a highly accurate inorganic dielectric coating without any porosity.

【0026】即ち常温下での母材に対する誘電体被覆に
よる電極製作においても、若しくは、高温下での母材に
対する誘電体被覆による電極製作においても、母材と誘
電体間の熱膨張の差をなるべく小さくすることが必要で
あり、そのため前者の製作方法においては、誘電体とし
て常温硬化性のガラスを使用することによって達成され
ることが分かり、後者の製作方法においては、母材とし
て(たとえば京セラ(株)社製サーメット(商品名))
のような金属とセラミックの複合材を用いることにより
達成されることが分かった。
In other words, the difference in thermal expansion between the base material and the dielectric material is not limited to the fabrication of the electrode at room temperature by the dielectric coating on the base material or the fabrication of the electrode at a high temperature by the dielectric coating on the base material. It is necessary to reduce the size as much as possible. Therefore, it is understood that the former manufacturing method can be achieved by using a cold-setting glass as a dielectric, and the latter manufacturing method can be realized as a base material (for example, Kyocera). Cermet (trade name) manufactured by Co., Ltd.)
It has been found that this can be achieved by using a metal-ceramic composite material as described above.

【0027】そのようにして作製された電極とそれを用
いた放電処理方法及び放電処理装置が本発明である。
The electrode thus produced, and a discharge treatment method and a discharge treatment apparatus using the same are the present invention.

【0028】[0028]

【発明の実施の形態】本発明の放電処理用の電極と放電
処理方法及び放電処理装置について、以下にその実施の
形態を図を用いて説明するが本発明はこれらに限定され
ない。また、以下の説明には用語等に対する断定的な表
現があるが、本発明の好ましい例を示すもので、本発明
の用語の意義や技術的な範囲を限定するものではない。
BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of a discharge treatment electrode, a discharge treatment method, and a discharge treatment device according to the present invention will be described below with reference to the drawings, but the present invention is not limited thereto. In the following description, although there is a definite expression for a term or the like, it shows a preferable example of the present invention, and does not limit the meaning of the term or the technical scope of the present invention.

【0029】図1は本発明における平板型の電極の一例
を示す断面図で、図2は本発明における平板型の電極の
他の例を示す断面図であり、図3はそれらの電極を用い
た放電処理装置の断面図である。また、図4は本発明に
おける円筒型でロール型の電極の一例を示す斜視図で、
図5は円筒型で固定型の電極の一例を示す斜視図で、図
6及び図7はそれぞれ円筒型の電極を用いた放電処理装
置の断面図である。
FIG. 1 is a cross-sectional view showing one example of the flat electrode of the present invention, FIG. 2 is a cross-sectional view showing another example of the flat electrode of the present invention, and FIG. FIG. 2 is a cross-sectional view of the discharge processing apparatus. FIG. 4 is a perspective view showing an example of a cylindrical and roll-type electrode according to the present invention.
FIG. 5 is a perspective view showing an example of a cylindrical fixed electrode, and FIGS. 6 and 7 are cross-sectional views of a discharge treatment apparatus using a cylindrical electrode.

【0030】図1で、1対の電極は下側の電極21と上
側の電極22で構成され、1対の電極は、電極間に支持
体Fを置き、放電プラズマを発生させ支持体Fの両面に
放電処理をするためのものである。電極21、22の構
造は平行平面型であるが、これに限らず、図6の本発明
の別の放電処理装置の断面図に示すように複数の円筒型
の電極26を直進する支持体の両側に対向させたもの
や、図7の本発明の他の放電処理装置の断面図に示すよ
うに、支持体Fを巻回して搬送回転するロール型の電極
25に対して複数の円筒型で固定型の電極26を対向さ
せたものや、そのほかに図示はしないが円筒対向平面
型、球対向平面型等で用途に応じて適時決定される。こ
のような電極は放電プラズマ処理、コロナ放電処理等の
電極として使用出来る。
In FIG. 1, a pair of electrodes is composed of a lower electrode 21 and an upper electrode 22. The pair of electrodes has a support F placed between the electrodes and generates discharge plasma to generate a discharge plasma. This is for performing discharge treatment on both surfaces. The structure of the electrodes 21 and 22 is a parallel plane type, but is not limited thereto. As shown in a sectional view of another discharge processing apparatus of the present invention in FIG. As shown in the cross-sectional view of the discharge processing apparatus of the present invention in FIG. The fixed electrode 26 is opposed to the electrode 26, and the other is not shown in the drawings. Such an electrode can be used as an electrode for discharge plasma treatment, corona discharge treatment and the like.

【0031】先ず図1,図2に示した平行平面型の電極
及びそれを用いた図3の断面図に示す放電処理方法と放
電処理装置について説明し、その後で上記図4,図5,
図6,図7について詳しく説明する。
First, the parallel plane type electrode shown in FIGS. 1 and 2 and the discharge processing method and apparatus shown in the sectional view of FIG. 3 using the same will be described.
6 and 7 will be described in detail.

【0032】電極21は図1(a)に示すように金属等
の導電性のある母材21aへ100℃以下で硬化する無
機性質の材料の誘電体21bを被覆した組み合わせ、又
は図1(b)に示すように金属とセラミックスとの複合
材料の母材21Aへ高温で溶融するガラス材料等の固体
誘電体21Bを被覆した組み合わせで構成されている。
電極22は上記電極21と同様に次のようになってい
る。
As shown in FIG. 1A, the electrode 21 is a combination of a conductive base material 21a such as a metal and the like coated with a dielectric material 21b of an inorganic material which cures at 100 ° C. or less. As shown in the figure, the base material 21A is a combination of a base material 21A of a composite material of metal and ceramics coated with a solid dielectric 21B such as a glass material that melts at a high temperature.
The electrode 22 has the following configuration, similarly to the electrode 21 described above.

【0033】電極22は図1(a)に示すように金属等
の導電性のある母材22aへ100℃以下で硬化する無
機性質の材料の誘電体22bを被覆した組み合わせ、又
は図1(b)に示すように金属とセラミックスとの複合
材料の母材22Aへ高温で溶融するガラス材料等の固体
誘電体22Bを被覆した組み合わせで構成されている。
The electrode 22 is a combination of a conductive base material 22a such as a metal coated with a dielectric material 22b of an inorganic material which cures at 100 ° C. or lower, as shown in FIG. As shown in (1), the base material 22A is a combination of a base material 22A of a composite material of metal and ceramics coated with a solid dielectric 22B such as a glass material that melts at a high temperature.

【0034】勿論、図1(a)において電極21を図1
(b)の電極21に換えてもよく、図1(b)において
電極22を図1(a)の電極22に換えても良い。
Of course, the electrode 21 in FIG.
The electrode 21 shown in FIG. 1B may be replaced, or the electrode 22 shown in FIG. 1B may be replaced with the electrode 22 shown in FIG.

【0035】ここで、金属等の導電性のある母材21
a、22aは銀、白金、ステンレススチール、アルミニ
ウム等の金属が使われ、金属とセラミックとの複合材料
の母材21A、22Aは、例えば、京セラ(株)社製商
品名サーメットが用いられる。また、100℃以下で硬
化する無機性質の材料の誘電体21b,22bは例えば
常温硬化性のガラスが使われ、高温で溶融するガラス材
料等の固体誘電体21B、22Bは各種ガラス(パイレ
ックス、石英等)、セラミック、金属酸化物(酸化チタ
ニウム、酸化ジルコニウム、酸化アルミニウム)等が用
いられる。
Here, a conductive base material 21 such as a metal is used.
Metals such as silver, platinum, stainless steel, and aluminum are used for a and 22a, and cermet (trade name, manufactured by Kyocera Corporation) is used for the base materials 21A and 22A of the composite material of metal and ceramic. The dielectrics 21b and 22b, which are inorganic materials that cure at a temperature of 100 ° C. or less, are made of, for example, room temperature curable glass, and the solid dielectrics 21B and 22B, such as a glass material that melts at a high temperature, are made of various types of glass (Pyrex, quartz). Etc.), ceramics, metal oxides (titanium oxide, zirconium oxide, aluminum oxide) and the like.

【0036】次に、図2で、1対の電極は下側の電極2
1と上側の電極23で構成されている。電極21は図1
と同一で、また電極23は固体誘電体が設けられていな
い電極である。1対の電極の下側電極21に支持体Fが
置かれ、支持体の片面に放電処理をするためのものであ
る。
Next, in FIG. 2, a pair of electrodes is a lower electrode 2
1 and the upper electrode 23. The electrode 21 is shown in FIG.
And the electrode 23 is an electrode provided with no solid dielectric. The support F is placed on the lower electrode 21 of the pair of electrodes, and one side of the support is subjected to discharge treatment.

【0037】図3は本発明の放電プラズマによる放電処
理装置の一例を示す断面図である。図3で、放電処理装
置は電極21,22、保持部60、ガス充填手段50、
電圧発生手段40、放電処理室30等で構成されてい
る。
FIG. 3 is a sectional view showing an example of a discharge processing apparatus using discharge plasma according to the present invention. In FIG. 3, the discharge processing apparatus includes electrodes 21 and 22, a holding unit 60, a gas filling unit 50,
It comprises a voltage generating means 40, a discharge processing chamber 30, and the like.

【0038】支持体Fは実施形態では写真感光材料支持
体(フィルムともいう)である。電極21,22は図1
(a),(b)等に示すもので、電極間のギャップは例
えば10mm程度となっている。
The support F is a photographic material support (also referred to as a film) in the embodiment. The electrodes 21 and 22 are shown in FIG.
(A), (b) and the like, the gap between the electrodes is, for example, about 10 mm.

【0039】保持部60は支持体Fを電極21、22の
電極間に搬送ローラ対62,63により保持している。
また、支持体Fは搬送ローラ対62,63で駆動されな
がら矢印の方向に搬送されるようになっている。
The holding unit 60 holds the support F between the electrodes 21 and 22 by the pair of conveying rollers 62 and 63.
The support F is transported in the direction of the arrow while being driven by the transport roller pairs 62 and 63.

【0040】ガス充填手段50は不活性ガス及び反応ガ
スの混合ガスを放電処理室30に充填する手段であり、
混合ガスはヘリュム(He)及び/又はアルゴン(A
r)の不活性ガスと窒素(N)、酸素(O)、炭酸ガ
ス、水素、水(H2O)等の反応ガスが含まれている。
なお、比較的安価なアルゴンガスでの放電が望ましい。
The gas filling means 50 is a means for filling the discharge processing chamber 30 with a mixed gas of an inert gas and a reactive gas.
The mixed gas is helium (He) and / or argon (A
r) an inert gas and a reaction gas such as nitrogen (N), oxygen (O), carbon dioxide, hydrogen, and water (H 2 O).
It is desirable to use a relatively inexpensive discharge with argon gas.

【0041】電圧発生手段40は電源41より導電性の
電極部分21a、22a又は21A、22Aに電圧を印
加する。その値は適時決定されるが、例えば電圧が3か
ら5kV程度で、電源周波数は1から100kHzであ
る。
The voltage generating means 40 applies a voltage from the power supply 41 to the conductive electrode portions 21a, 22a or 21A, 22A. The value is determined as appropriate, for example, the voltage is about 3 to 5 kV, and the power supply frequency is 1 to 100 kHz.

【0042】放電処理室30はパイレックスガラス製の
処理容器31で構成され、該処理容器31内に混合ガス
が充填される。なお、実施形態では処理容器31はパイ
レックスガラス製であるが、電極と絶縁がとれていれば
金属製であってもよい。
The discharge processing chamber 30 is composed of a processing vessel 31 made of Pyrex glass, and the processing vessel 31 is filled with a mixed gas. In the embodiment, the processing container 31 is made of Pyrex glass, but may be made of metal as long as it is insulated from the electrodes.

【0043】処理容器31内に電極21、22を所定位
置に配置し、ガス発生装置51で発生させた混合ガス5
4をポンプ55で送り、給気口52より放電処理室30
の処理容器31内に入れ、該処理容器31内を混合ガス
54で充填し排気口53より排出するようにする。次
に、電源41により電極21、22に電圧を印加して放
電プラズマを発生させる。ここで、ロール状のフィルム
61より支持体Fを供給し、搬送ローラ対62、63に
より、放電処理室30内の電極間を搬送させる。支持体
Fは搬送中に放電プラズマにより表面が放電処理され、
その後に排出するようになっている。
The electrodes 21 and 22 are arranged at predetermined positions in the processing vessel 31, and the mixed gas 5 generated by the gas generator 51 is
4 by a pump 55, and the discharge processing chamber 30 through the air supply port 52.
The processing container 31 is filled with the mixed gas 54 and discharged from the exhaust port 53. Next, a voltage is applied to the electrodes 21 and 22 by the power supply 41 to generate discharge plasma. Here, the support F is supplied from the roll-shaped film 61 and transported between the electrodes in the discharge processing chamber 30 by the transport roller pairs 62 and 63. The surface of the support F is subjected to a discharge treatment by a discharge plasma during transportation,
It is then discharged.

【0044】なお、支持体Fの両面に放電処理をする例
について説明したが、下側の電極に支持体Fを載置し、
支持体Fの上側のみを放電処理するようにしてもよい。
Although an example in which the discharge treatment is performed on both surfaces of the support F has been described, the support F is placed on the lower electrode, and
Only the upper side of the support F may be subjected to the discharge treatment.

【0045】図6は複数の円筒型の電極26を直進する
支持体の両側に対向させたものであり、搬送ローラ対6
2,63を介して放電処理室30に等速度で搬送される
支持体Fの両面は均一に放電処理される。前述したもの
と同様の混合ガス54は、給気口52より放電処理室3
0の処理容器31内に入り、該処理容器31内を混合ガ
ス54で充填し排気口53より排出するようにしてあ
る。尚、円筒型の電極26は図5の斜視図に示すように
金属等の導電性のある母材26aへ100℃以下で硬化
する無機性質の材料の誘電体26bを被覆した組み合わ
せ、又は金属とセラミックスとの複合材料の母材26A
へ高温で溶融するガラス材料等の固体誘電体26Bを被
覆した組み合わせで構成されている。
FIG. 6 shows a configuration in which a plurality of cylindrical electrodes 26 are opposed to both sides of a straight-moving support member.
Both surfaces of the support F transported at a constant speed to the discharge processing chamber 30 through the discharge processing chambers 2 and 63 are uniformly discharged. A mixed gas 54 similar to that described above is supplied from the gas supply port 52 to the discharge processing chamber 3.
The processing container 31 is filled with the mixed gas 54 and discharged from the exhaust port 53. As shown in the perspective view of FIG. 5, the cylindrical electrode 26 is a combination of a conductive base material 26a such as a metal coated with a dielectric material 26b of an inorganic material that cures at 100 ° C. or less, or a combination of a metal and a metal. Base material 26A of composite material with ceramics
And a combination of a solid dielectric 26B such as a glass material that melts at a high temperature.

【0046】図7は支持体Fを巻回して搬送回転するロ
ール型の電極25に対して複数の円筒で固定型の電極2
6を対向させたものであり、ロール型の電極25に巻回
してニップローラ65,66で押圧され、支持体Fはガ
イドローラ64,67を介して放電処理室30に出入さ
れ等速度で搬送される。前述したものと同様の混合ガス
の放電処理室30への充填は図3,図6の場合と同じに
してある。これにより電極間間隔が極めて安定したもの
になり、支持体Fには良好な放電処理が行われる。ただ
し支持体は片面のみ放電処理がなされる。尚、円筒でロ
ール型の電極25は図4の斜視図に示すように金属等の
導電性のある母材25aへ100℃以下で硬化する無機
性質の材料の誘電体25bを被覆した組み合わせ、又は
金属とセラミックスとの複合材料の母材25Aへ高温で
溶融するガラス材料等の固体誘電体25Bを被覆した組
み合わせで構成されている。
FIG. 7 shows a plurality of cylindrical fixed electrodes 2 with respect to a roll-shaped electrode 25 on which a support F is wound and conveyed and rotated.
6, the support F is wound around the roll-shaped electrode 25 and pressed by the nip rollers 65 and 66, and the support F is moved into and out of the discharge processing chamber 30 via the guide rollers 64 and 67 and is conveyed at a constant speed. You. The charging of the discharge processing chamber 30 with the mixed gas similar to that described above is performed in the same manner as in FIGS. As a result, the interval between the electrodes becomes extremely stable, and a good discharge treatment is performed on the support F. However, the discharge treatment is performed only on one side of the support. In addition, as shown in the perspective view of FIG. 4, the cylindrical roll-shaped electrode 25 is a combination of a conductive base material 25a such as a metal coated with a dielectric material 25b of an inorganic material that cures at 100 ° C. or lower, or It is configured by combining a base material 25A of a composite material of metal and ceramic with a solid dielectric 25B such as a glass material that melts at a high temperature.

【0047】ポンプ55を含むガス充填手段50の詳細
や、電圧発生手段40は図3と全く同じであるので説明
を省略する。
The details of the gas filling means 50 including the pump 55 and the voltage generating means 40 are exactly the same as those in FIG.

【0048】尚、金属とセラミックの複合母材に対して
は、高温で溶融する誘電体をライニングする代わりに1
00℃以下で硬化する無機性質の材料をライニングして
も良い。
For the composite base material of metal and ceramic, instead of lining a dielectric material that melts at a high temperature, 1
An inorganic material that cures at a temperature of 00 ° C. or less may be lined.

【0049】[0049]

【実施例】母材に対して誘電体被覆を下記表1の手法で
行い、150cm巾の円筒電極を各20本製作し、放電
条件として支持体フィルムFとの間のギャップを1mm
としArガス中で10kHz,200W/mの電圧を印
加して1時間放電処理を続け種々の性能を比較してその
表にまとめた。尚、誘電体厚は1mmにした。
EXAMPLE A dielectric material was coated on a base material by the method shown in Table 1 below, 20 cylindrical electrodes each having a width of 150 cm were manufactured, and a gap between the base material film F and the support film F was set to 1 mm as a discharge condition.
The discharge treatment was continued for 1 hour by applying a voltage of 10 kHz and 200 W / m in Ar gas, and various performances were compared and summarized in the table. The thickness of the dielectric was 1 mm.

【0050】[0050]

【表1】 [Table 1]

【0051】表1の結果に見られるように、導電性のセ
ラミック即ち金属とセラミックの複合材料を母材にして
高温溶融ガラスや常温ガラスをライニングした円筒型の
電極や、金属等の導電性の良い母材に常温ガラスをライ
ニングした円筒型の電極のひび割れは皆無であり、たわ
み量も殆ど無く、放電処理における均一性も良く安定し
ており、耐久性も著しく向上したことが認められる。し
かし、従来のように金属等の導電性の良い母材に高温溶
融ガラスをライニングした円筒型の電極はひび割れがか
なり発生し、たわみ量も大きく放電処理は支持体の幅手
に対して不均一であり耐久性も作業性も悪かった。ま
た、金属母材にセラミックを溶射したものはひび割れや
たわみ量は良好としても、耐久性に乏しく放電処理はア
ーク放電が入り、全く実用にならない状態であった。
As can be seen from the results shown in Table 1, a cylindrical electrode made of a conductive ceramic, that is, a composite material of metal and ceramic as a base material and lined with high-temperature molten glass or room temperature glass, or a conductive material such as metal. It is recognized that the cylindrical electrode in which the room temperature glass was lined with a good base material had no cracks, had almost no deflection, had good uniformity in the discharge treatment, was stable, and had significantly improved durability. However, the conventional cylindrical electrode in which high-temperature molten glass is lined with a highly conductive base material such as a metal has considerable cracks, has a large amount of deflection, and the discharge treatment is not uniform with the width of the support. The durability and workability were poor. Further, a metal base material obtained by spraying ceramic onto the metal base material had a poor durability and an arc discharge in the discharge treatment, even if the cracking and the bending amount were good, so that it was not practical at all.

【0052】[0052]

【発明の効果】本発明により放電処理用の電極は曲がり
等の歪みが無く、ひび割れを生ずることの無い、加工精
度の高いものが得られるようになった。そして電極の耐
久度も向上しより強い放電処理が安定して持続可能にな
った。
According to the present invention, it is possible to obtain an electrode for electric discharge treatment which has no distortion such as bending or the like, does not crack, and has high processing accuracy. The durability of the electrode was also improved, and a stronger discharge treatment became stable and sustainable.

【0053】また、この電極を用いた放電処理方法や放
電処理装置により感光材料等の支持体表面と塗布液との
接着性が増して塗布性が大きく安定向上した。
Further, the adhesion between the surface of a support such as a photosensitive material or the like and the coating solution was increased by the electric discharge treatment method and the electric discharge treatment device using the electrode, and the coatability was greatly improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の平板型の電極の一例を示す断面図であ
る。
FIG. 1 is a cross-sectional view showing an example of a flat electrode of the present invention.

【図2】本発明の平板型の電極の他の例を示す断面図で
ある。
FIG. 2 is a cross-sectional view showing another example of the flat electrode of the present invention.

【図3】本発明の放電プラズマによる放電処理装置の一
例を示す断面図である。
FIG. 3 is a sectional view showing an example of a discharge processing apparatus using discharge plasma according to the present invention.

【図4】本発明の円筒型でロール型の電極の一例を示す
斜視図である。
FIG. 4 is a perspective view showing an example of a cylindrical and roll-type electrode of the present invention.

【図5】本発明の円筒型で固定型の電極の一例を示す斜
視図である。
FIG. 5 is a perspective view showing an example of a cylindrical fixed electrode of the present invention.

【図6】本発明の放電プラズマによる放電処理装置の他
の一例を示す断面図である。
FIG. 6 is a sectional view showing another example of the discharge processing apparatus using discharge plasma of the present invention.

【図7】本発明の放電プラズマによる放電処理装置の別
の一例を示す断面図である。
FIG. 7 is a cross-sectional view showing another example of a discharge processing apparatus using discharge plasma according to the present invention.

【符号の説明】[Explanation of symbols]

21,22,23,25,26 電極 21a,22a,25a,26a 金属等導電性のある
母材 21A,22A,25A,26A 金属とセラミックス
の複合材の母材 21b,22b,25b,26b 100℃以下で硬化
する無機性誘電体(常温硬化性ガラス等) 21B,22B,25B,26B 高温で溶融する固体
誘電体(石英ガラス等) 30 放電処理室 31 処理容器 40 電圧発生手段 41 電源 50 ガス充填手段 51 ガス発生装置 52 給気口 53 排気口 54 混合ガス 60 保持部 61 ロール状のフィルム 62,63 搬送ローラ対 F 基材(写真感光材料用支持体、フィルム)
21, 22, 23, 25, 26 Electrodes 21a, 22a, 25a, 26a Conductive base material such as metal 21A, 22A, 25A, 26A Base material of composite material of metal and ceramics 21b, 22b, 25b, 26b 100 ° C. Inorganic dielectric material that cures below (such as room temperature curable glass) 21B, 22B, 25B, 26B Solid dielectric material that fuses at high temperature (such as quartz glass) 30 Discharge processing chamber 31 Processing container 40 Voltage generating means 41 Power supply 50 Gas filling Means 51 Gas generator 52 Air supply port 53 Exhaust port 54 Mixed gas 60 Holder 61 Rolled film 62, 63 Conveying roller pair F Substrate (photosensitive material support, film)

Claims (17)

【特許請求の範囲】[Claims] 【請求項1】 一対の対向する電極間に支持体を位置さ
せ、前記電極間に電圧を印加して前記支持体に放電処理
を行う放電処理装置に用いる電極において、一対の対向
する前記電極の少なくとも一方の対向面は導電性の母材
表面に100℃以下で硬化する無機性質の材料をライニ
ングすることで被覆したものであることを特徴とする放
電処理用の電極。
1. An electrode used in a discharge treatment apparatus which performs a discharge treatment on a support by applying a voltage between the electrodes and positioning a support between the pair of opposed electrodes, wherein An electrode for discharge treatment, characterized in that at least one of the opposing surfaces is formed by coating a surface of a conductive base material with a material having an inorganic property which cures at 100 ° C. or less by lining.
【請求項2】 前記無機性質材料が常温硬化性のガラス
であることを特徴とする請求項1に記載の放電処理用の
電極。
2. The electrode for electric discharge treatment according to claim 1, wherein the inorganic material is a room temperature curable glass.
【請求項3】 前記電極は大気圧近傍下での放電処理を
行う電極であることを特徴とする請求項1又は2に記載
の放電処理用の電極。
3. The electrode for discharge treatment according to claim 1, wherein the electrode is an electrode for performing discharge treatment near atmospheric pressure.
【請求項4】 前記電極の少なくとも1つは円筒型であ
ることを特徴とする請求項1〜3の何れか1項に記載の
放電処理用の電極。
4. The electrode for discharge treatment according to claim 1, wherein at least one of said electrodes has a cylindrical shape.
【請求項5】 前記円筒型の電極の少なくとも1つは支
持体と接しながら回転するロール型であることを特徴と
する請求項4に記載の放電処理用の電極。
5. The electrode for discharge treatment according to claim 4, wherein at least one of said cylindrical electrodes is a roll type which rotates while being in contact with a support.
【請求項6】 一対の対向する電極の少なくとも一方の
対向面に、導電性の母材表面が100℃以下で硬化する
無機性質の材料を誘電体としてライニングされた電極を
設け、前記一対の対向する電極間に支持体を位置させ
て、放電処理室を構成し、該放電処理室に60圧力%以
上のArガスを含む混合ガスを導入して、前記電極に電
圧を印加させ、大気圧または大気圧近傍の圧力下で放電
プラズマを励起させて放電出力7.5kW/m2以上で
連続搬送される支持体表面の放電処理を行うことを特徴
とする放電処理方法。
6. An electrode lined with at least one opposing surface of a pair of opposing electrodes using a dielectric material made of an inorganic material whose surface is cured at a temperature of 100 ° C. or lower, and the pair of opposing electrodes is provided. A discharge treatment chamber is formed by locating a support between the electrodes to be treated, and a mixed gas containing Ar gas of 60% by pressure or more is introduced into the discharge treatment chamber, and a voltage is applied to the electrodes so that atmospheric pressure or atmospheric pressure is applied. A discharge treatment method comprising: exciting a discharge plasma under a pressure near the atmospheric pressure to perform a discharge treatment on a surface of a support continuously transported at a discharge output of 7.5 kW / m 2 or more.
【請求項7】 一対の対向する電極の少なくとも一方の
対向面に、導電性の母材表面が100℃以下で硬化する
無機性質の材料を誘電体としてライニングされた電極
と、前記一対の対向する電極間に支持体を位置させて放
電処理する放電処理室と、該処理室に60圧力%以上の
Arガスを含む混合ガスを導入して充填する充填手段
と、前記電極間に電圧を印加する電圧発生手段とを有
し、大気圧または大気圧近傍の圧力下で、放電プラズマ
を励起させて放電出力7.5kW/m2以上で連続搬送
される支持体表面を放電処理することを特徴とする放電
処理装置。
7. An electrode lined on at least one of opposing surfaces of a pair of opposing electrodes with a dielectric material of an inorganic material whose surface of a conductive base material is cured at 100 ° C. or lower, and the pair of opposing electrodes A discharge treatment chamber for performing discharge treatment with a support positioned between the electrodes, filling means for introducing and filling a mixed gas containing Ar gas at 60% by pressure or more into the treatment chamber, and applying a voltage between the electrodes. A voltage generating means, wherein the discharge plasma is excited under an atmospheric pressure or a pressure close to the atmospheric pressure, and a discharge treatment is performed on the surface of the support which is continuously conveyed at a discharge output of 7.5 kW / m 2 or more. Discharge treatment equipment.
【請求項8】 一対の対向する電極間に支持体を位置さ
せ、前記電極間に電圧を印加して前記支持体に放電処理
を行う放電処理装置に用いる電極において、一対の対向
する前記電極の少なくとも一方の対向面は、金属とセラ
ミックスの複合材料を母材とし、該母材表面に誘電体を
被覆したものであることを特徴とする放電処理用の電
極。
8. An electrode used in a discharge treatment apparatus for performing a discharge treatment on the support by applying a voltage between the electrodes, wherein the support is positioned between the pair of opposed electrodes, An electrode for discharge treatment, wherein at least one of the opposing surfaces is made of a composite material of metal and ceramic as a base material, and the base material surface is coated with a dielectric.
【請求項9】 前記電極は大気圧近傍下での放電処理を
行う電極であることを特徴とする請求項8に記載の放電
処理用の電極。
9. The electrode for discharge treatment according to claim 8, wherein the electrode is an electrode for performing discharge treatment near atmospheric pressure.
【請求項10】 前記電極の少なくとも1つは円筒型で
あることを特徴とする請求項8又は9に記載の放電処理
用の電極。
10. The electrode according to claim 8, wherein at least one of the electrodes has a cylindrical shape.
【請求項11】 前記円筒型の電極の少なくとも1つは
支持体と接しながら回転するロール型であることを特徴
とする請求項10に記載の放電処理用の電極。
11. The electrode for discharge treatment according to claim 10, wherein at least one of said cylindrical electrodes is a roll type rotating while being in contact with a support.
【請求項12】 一対の対向する電極の少なくとも一方
の対向面に、金属とセラミックスの複合材料の母材表面
が誘電体をライニングされた電極を設け、前記一対の対
向する電極間に支持体を位置させて、放電処理室を構成
し、該放電処理室に60圧力%以上のArガスを含む混
合ガスを導入して、前記電極に電圧を印加させ、大気圧
または大気圧近傍の圧力下で放電プラズマを励起させて
放電出力7.5kW/m2以上で連続搬送される支持体
表面を放電処理することを特徴とする放電処理方法。
12. An electrode having a base material surface of a composite material of a metal and a ceramic lined with a dielectric material is provided on at least one facing surface of a pair of facing electrodes, and a support is provided between the pair of facing electrodes. A discharge processing chamber, and a mixed gas containing Ar gas at 60% by pressure or more is introduced into the discharge processing chamber, a voltage is applied to the electrode, and the pressure is reduced under atmospheric pressure or a pressure close to atmospheric pressure. A discharge treatment method characterized by exciting a discharge plasma and performing a discharge treatment on a surface of a support continuously transported at a discharge output of 7.5 kW / m 2 or more.
【請求項13】 一対の対向する電極の少なくとも一方
の対向面に、金属とセラミックスの複合材料の母材表面
が誘電体をライニングされた電極と、前記一対の対向す
る電極間に支持体を位置させて放電処理する放電処理室
と、該処理室に60圧力%以上のArガスを含む混合ガ
スを導入して充填する充填手段と、前記電極間に電圧を
印加する電圧発生手段とを有し、大気圧または大気圧近
傍の圧力下で、放電プラズマを励起させて放電出力7.
5kW/m2以上で連続搬送される支持体表面を放電処
理することを特徴とする放電処理装置。
13. An electrode in which a base material surface of a composite material of metal and ceramic is lined with a dielectric material on at least one opposing surface of a pair of opposing electrodes, and a support is positioned between the pair of opposing electrodes. A discharge processing chamber for performing discharge processing by charging, a filling means for introducing and filling a mixed gas containing Ar gas at 60% by pressure or more into the processing chamber, and a voltage generating means for applying a voltage between the electrodes. 6. Discharge plasma is excited at atmospheric pressure or a pressure close to atmospheric pressure to discharge output.
An electric discharge treatment apparatus, which performs an electric discharge treatment on the surface of a support continuously transported at 5 kW / m 2 or more.
【請求項14】 前記支持体はプラスチックフィルムで
あることを特徴とする請求項6又は12に記載の放電処
理方法。
14. The discharge treatment method according to claim 6, wherein the support is a plastic film.
【請求項15】 前記プラスチックフィルムは感光性材
料用支持体であることを特徴とする請求項14に記載の
放電処理方法。
15. The method according to claim 14, wherein the plastic film is a support for a photosensitive material.
【請求項16】 前記支持体はプラスチックフィルムで
あることを特徴とする請求項7又は13に記載の放電処
理装置。
16. The discharge treatment apparatus according to claim 7, wherein the support is a plastic film.
【請求項17】 前記プラスチックフィルムは感光性材
料用支持体であることを特徴とする請求項16に記載の
放電処理装置。
17. The discharge processing apparatus according to claim 16, wherein the plastic film is a support for a photosensitive material.
JP30098498A 1998-10-22 1998-10-22 Electrode for discharge treatment, discharge treatment method and discharge treatment apparatus using the electrode Expired - Fee Related JP3846065B2 (en)

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